JP2006349724A - Photosensitive composition, photosensitive lithographic printing plate material, and image forming method for lithographic printing plate material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate material having improved printing durability, linearity, recovery properties from scumming, and peeling property of a laminated paper, and to provide a photosensitive composition for giving the photosensitive lithographic printing plate material, and an image forming method of the lithographic printing plate material using the photosensitive lithographic printing plate material. <P>SOLUTION: The photosensitive composition, containing a compound containing an ethylenic double bond capable of addition polymerization (A), photopolymerization initiator (B), and a polymer binder (C), further contains an ionic liquid. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a photosensitive lithographic printing plate material used in a computer-to-plate system (hereinafter referred to as CTP), a photosensitive composition used therefor, and a method for forming an image of a lithographic printing plate material using the photosensitive lithographic printing plate. In particular, the present invention relates to a photosensitive composition suitable for exposure with a laser beam having a wavelength of 350 to 450 nm, a photosensitive lithographic printing plate material, and a method for forming an image of a lithographic printing plate material using the photosensitive lithographic printing plate.

  In recent years, CTP recording digital image data directly on a photosensitive lithographic printing plate with a laser light source has been developed and is being put to practical use in the technology for producing printing plates for offset printing.

  Among these, in the field of printing that requires a relatively high printing durability, it is known to use a negative photosensitive lithographic printing plate material having a polymerization type photosensitive layer containing a polymerizable compound. (For example, refer to Patent Documents 1 and 2.)

  Furthermore, there is known a printing plate material capable of image exposure with a laser having a wavelength of 350 nm to 450 nm, which has improved safe light properties from the viewpoint of handleability of the printing plate.

  And, a high-power and small-sized blue-violet laser with a wavelength of 390 to 430 nm can be easily obtained, and by developing a photosensitive lithographic printing plate suitable for this laser wavelength, a bright room has been developed. (For example, refer to Patent Documents 3, 4 and 5.)

  Further, in order to improve the sensitivity as a polymerization initiator used in a polymerization type photosensitive layer, for example, trichloro compounds described in JP-A-48-36281, JP-A-54-74887, JP-A-64-35548 are disclosed. S-triazine compounds having a methyl group, for example, iron arene complex compounds and peroxides described in JP-A-59-219307, for example, JP-A-62-1050242, JP-A-62-143044, JP-A-64 It has been proposed to use monoalkyltriarylborate compounds described in JP-A-35548, for example, titanocene compounds described in JP-A-63-41483 and JP-A-2-291.

  However, even in these lithographic printing plate materials, sensitivity and printing durability are still insufficient. The size of dots (halftone dots) based on image output data differs from the size of dots (halftone dots) on the printing plate. There is a problem that the so-called linearity may be insufficient, or the number of print sheets required to recover the stain when there is a stain such as when resuming printing is large.

On the other hand, a photosensitive lithographic printing plate material having a photosensitive layer coated on a support is generally cut into a predetermined size, and then a paper called interleaf is used for the purpose of protecting the photosensitive layer. It is often inserted between printing plate materials, stacked and transported, and used for plate making processes. In this case, an operation for removing the slip sheet is performed in the plate making process. At the time of removing the slip sheet, the slip sheet may adhere to the photosensitive lithographic printing plate material due to static electricity, and it may take time to remove the slip sheet. For the purpose of improving these problems, there are known methods such as providing a specific layer on the back surface of the photosensitive lithographic printing plate material, but there are drawbacks such as an increase in production cost. And even in the planographic printing plate material having the above-described polymerization type photosensitive layer, the peelability of the slip sheet was not sufficient.
JP-A-1-105238 JP-A-2-127404 JP 2000-35673 A JP 2000-98605 A JP 2001-264978 A

  An object of the present invention is to provide a photosensitive lithographic printing plate material having excellent printing durability, linearity, stain recovery, and excellent interleaving paper peeling property, a photosensitive composition that provides this photosensitive lithographic printing plate material, and this photosensitive property. An object of the present invention is to provide an image forming method for a lithographic printing plate material using the lithographic printing plate material.

  A further object of the present invention is suitable for exposure with a laser beam having an emission wavelength in the range of 350 nm to 450 nm, having good safe light properties, excellent printing durability, linearity, and stain recovery, and peeling paper. An object of the present invention is to provide a photosensitive lithographic printing plate material having excellent properties, a photosensitive composition that provides the photosensitive lithographic printing plate material, and an image forming method for the lithographic printing plate material using the photosensitive lithographic printing plate material.

  The above object of the present invention is achieved by the following means.

(Claim 1)
(A) A photosensitive composition containing an ethylenic double bond-containing compound, (B) a photopolymerization initiator, and (C) a polymer binder, which is capable of addition polymerization, wherein the photosensitive composition is further an ionic liquid A photosensitive composition comprising:

(Claim 2)
The photosensitive composition according to claim 1, wherein the ionic liquid is a compound represented by the following general formula (1).

General formula (1): K ⁺ A ⁻
[Wherein K ⁺ represents the following general formula (2)

(Wherein, R ¹ and R ² are the same or different and each represents an alkyl group having 1 to 10 carbon atoms or a hydrogen atom, provided that R ¹ and R ² are not hydrogen atoms at the same time) Alkyl imidazolium cation or the following general formula (3)

(Wherein, R ³ is the same or different and represents an alkyl group having 1 to 10 carbon atoms or a hydrogen atom). A ⁻ represents the following general formula (4)

(In the formula, R ⁴ is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group, a tetrazolyl group, or a sulfonic acid. A tetrazole compound anion represented by the following general formula (5): each group represented by R ⁴ other than a hydrogen atom may have a substituent.

(Wherein R ⁵ and R ⁶ are the same or different and are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group, A group, a tetrazolyl group, or a sulfonic acid group, and each group represented by R ⁵ and R ⁶ other than a hydrogen atom may have a substituent. Formula (6)

(Wherein R ⁷ and R ⁸ are the same or different and are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group) A group, a tetrazolyl group, or a sulfonic acid group, and each group represented by R ⁷ and R ⁸ other than a hydrogen atom may have a substituent. ]
(Claim 3)
The photosensitive composition according to claim 1, wherein the cation constituting the ionic liquid is an ammonium cation.

(Claim 4)
The photosensitive composition according to claim 3, wherein the ammonium cation is an ion represented by the following general formula (7).

[Wherein, R ^{1 to} R ⁴ are the same or different alkyl groups having 1 to 5 carbon atoms, or an alkoxyalkyl group represented by R′—O— (CH ₂ ) n — (R ′ is a methyl group or Represents an ethyl group, and n is an integer of 1 to 4.), and any two groups of R ¹ , R ² , R ³ and R ⁴ may form a ring. However, at least one of R ^{1 to} R ⁴ is the alkoxyalkyl group. ]
(Claim 5)
The photosensitive composition according to claim 4, wherein the ion represented by the general formula (7) is an ion represented by the following general formula (8).

[Wherein R ^{1 to} R ³ represent the same or different alkyl group having 1 to 5 carbon atoms, and any two groups of R ¹ , R ² and R ³ may form a ring. I do not care.
R ′ represents a methyl group or an ethyl group. ]
(Claim 6)
The photosensitive composition according to claim 4, wherein the ion represented by the general formula (8) is an ion represented by the following general formula (9).

[In the formula, Me represents a methyl group, and Et represents an ethyl group. ]
(Claim 7)
The photosensitive composition according to any one of claims 3 to 6, wherein the anion constituting the ionic liquid is a fluorine atom-containing anion.

(Claim 8)
The photosensitive composition according to any one of claims 1 to 7, wherein the photopolymerization initiator (B) contains a biimidazole compound, an iron arene complex compound, or a titanocene compound.

(Claim 9)
The photosensitive composition according to any one of claims 1 to 8, wherein the photosensitive composition contains (D) a dye having an absorption maximum wavelength of 350 to 450 nm.

(Claim 10)
A photosensitive lithographic printing plate material comprising a photosensitive layer comprising a photosensitive composition according to any one of claims 1 to 9 on a support.

(Claim 11)
An image forming method for a lithographic printing plate material, wherein the photosensitive lithographic printing plate material according to claim 10 is subjected to image exposure using a laser beam having an emission wavelength in a range of 350 nm to 450 nm as a light source.

  According to the present invention, a photosensitive lithographic printing plate material having excellent printing durability, linearity, stain recovery, and interleaf separation, a photosensitive composition that provides this photosensitive lithographic printing plate material, and this photosensitive lithographic printing An image forming method for a lithographic printing plate material using a plate material can be provided.

  In addition, according to the present invention, it is suitable for exposure with a laser beam having an emission wavelength in the range of 350 nm to 450 nm, has good safe light properties, excellent printing durability, linearity, stain recovery, and interleaving paper peelability. The photosensitive lithographic printing plate material excellent in the present invention, the photosensitive composition that gives this photosensitive lithographic printing plate material, and the image forming method of the lithographic printing plate material using this photosensitive lithographic printing plate material can be provided.

  Next, the best mode for carrying out the present invention will be described, but the present invention is not limited thereto.

  The present invention relates to a photosensitive composition comprising (A) an addition-polymerizable compound containing an ethylenic double bond, (B) a photopolymerization initiator, and (C) a polymer binder. Furthermore, it contains an ionic liquid.

  The ionic liquid according to the present invention is a salt composed of an ion pair of a cation and an anion, and refers to a compound that is liquid in a temperature range of at least 10 ° C to 30 ° C.

  As the cation constituting the ionic liquid according to the present invention, an ammonium cation such as an alkylimidazolium cation or an aliphatic or alicyclic quaternary ammonium cation is preferably used. As the anion, a tetrazole compound anion, a triazole compound anion, fluorine An atom-containing anion or the like is preferably used.

  Among these, the case where the ionic liquid is a compound represented by the general formula (1) or the general formula (7) is preferable.

(Ionic liquid of general formula (1))
In the general formula (1), K ⁺ represents an N-alkylimidazolium cation or an ammonium cation represented by the general formula (2) or the general formula (3).

  The alkyl groups in the N-alkylimidazolium cation represented by the general formula (2) and the ammonium cation represented by the general formula (3) are those having 1 to 10 carbon atoms, a methyl group, an ethyl group, Examples include propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group and the like.

  Specific examples of the N-alkylimidazolium cation include 1-methyl-3-methylimidazolium cation, 1-methyl-3-ethylimidazolium cation, 1-methyl-3-propylimidazolium cation and the like. -Methyl-3-methylimidazolium cation and 1-methyl-3-ethylimidazolium cation are preferred.

  Specific examples of the ammonium cation include ammonium cation, trimethylammonium cation, ethyldimethylammonium cation, diethylmethylammonium cation, triethylammonium cation, tetramethylammonium cation, triethylmethylammonium cation, and tetraethylammonium cation. Cations and tetraethylammonium cations are preferred.

  The tetrazole compound anion represented by the general formula (4), the triazole compound anion represented by the general formula (5), and the alkyl group in the triazole compound anion represented by the general formula (6) have 1 carbon atom. -10, such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl and the like.

  The cycloalkyl group has 3 to 10 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclononyl group, and a cyclodecyl group.

  In addition, examples of the substituent that each group other than a hydrogen atom may have include an alkyl group, a hydroxyl group, a mercapto group, an amino group, and a carboxyl group.

  Specific examples of the tetrazole compound anion include 1,2,3,4-tetrazole anion, 1H-5-carboxytetrazole anion, 1H-5-mercaptotetrazole anion, 1H-5-aminotetrazole anion, 1H-5-phenyltetrazole Anion, 1H-tetrazole anion, 1H-5-methyltetrazole anion, 5,5′-bi-1H-tetrazole anion, 1,5-bi-1H-tetrazole anion, N-1H-tetrazol-5-yl-1H— Examples include tetrazol-5-amine anion, and 1,2,3,4-tetrazole anion and 5,5′-bi-1H-tetrazole anion are preferable.

  Specific examples of the triazole compound anion include 1,2,3-triazole anion, 4-mercapto-1,2,3-triazole anion, 1,2,4-triazole anion, 3-mercapto-1,2,4- Examples include triazole anion, 3-mercapto-5-methyl-1,2,4-triazole anion, 3,5-dimethyl-1,2,4-triazole anion, and the like, and 1,2,4-triazole anion is preferable.

  The above-mentioned anion component is an anion generated by removing one proton from a tetrazole compound, a triazole compound or a mixture thereof.

  The method for producing these ionic liquids is not particularly limited. For example, a salt composed of an onium cation such as an N-alkylimidazolium cation or an ammonium cation and a hydroxyl anion (that is, a hydroxide of an organic cation), and a tetrazole compound. The triazole compound may be reacted with stirring in a reaction solvent (preferably water) at about room temperature for about 12 to 24 hours. Subsequently, extraction, washing, etc. are performed using an appropriate solvent (preferably diethyl ether, ethyl acetate, etc.), and drying can be performed to obtain a target ionic liquid.

  A salt (organic cation hydroxide) composed of an onium cation and a hydroxyl anion can be obtained by a known method. For example, a salt is formed by reacting an N-alkylimidazole compound, ammonia, an amine compound and the like with an alkyl halide, and then the halogen anion of this salt is converted into a hydroxyl anion using an anion exchange resin or the like. be able to.

(Ionic liquid of general formula (7))
In the general formula (7), R ^{1 to} R ⁴ are the same or different alkyl groups having 1 to 5 carbon atoms, or an alkoxyalkyl group represented by R′—O— (CH ₂ ) n — (R ′ Represents a methyl group or an ethyl group, and n is an integer of 1 to 4.), and any two groups of R ¹ , R ² , R ³ and R ⁴ may form a ring. I do not care. However, at least one of R ^{1 to} R ⁴ is the alkoxyalkyl group.

  In the general formula (7), examples of the alkyl group having 1 to 5 carbon atoms include a methyl group, an ethyl group, a propyl group, a 2-propyl group, a butyl group, and a pentyl group, and at least one of R1 to R4. Is preferably a methyl group, an ethyl group or a propyl group, particularly preferably a methyl group or an ethyl group.

Examples of the alkoxyalkyl group represented by R′—O— (CH ₂ ) n— include a methoxy or ethoxymethyl group, a methoxy or ethoxyethyl group, a methoxy or ethoxypropyl group, and a methoxy or ethoxybutyl group. N is an integer of 1 to 4, preferably 2 to 4, and particularly preferably n = 2.

Examples of the cation in which any two groups of R ^{1 to} R ⁴ form a ring include quaternary ammonium ions having an aziridine ring, an azetidine ring, a pyrrolidine ring, a piperidine ring, and the like.

  Among the quaternary ammonium ions represented by the general formula (7), a quaternary ammonium ion having an alkoxyethyl group represented by the general formula (8) is preferable from the viewpoint of linearity and soil recovery properties. A quaternary ammonium ion represented by the formula (9) is even more preferable.

The anion paired with the cation represented by the general formula (7) is not particularly limited, but BF ₄ ⁻ , PF ₆ ⁻ , AsF ₆ ⁻ , SbF ₆ ⁻ , AlCl ₄ ⁻ , HSO ₄ ⁻ , ClO ₄ ⁻ , CH ₃ SO ₃ ⁻ , CF ₃ SO ₃ ⁻ , CF ₃ CO ₂ ⁻ , (CF ₃ SO ₂ ) ₂ N ⁻ , Cl ⁻ , Br ⁻ , I ⁻ , CH ₃ SO ₃ ⁻ , CH ₃ Anions such as C ₆ H ₄ SO ₃ ⁻ , CH ₃ CO ₂ ⁻ , CH ₃ CO ₂ ⁻ , (CN) ₂ N ⁻ and NO ₃ ⁻ can be used.

Among these anions, fluorine atom-containing anions, especially BF ₄ ⁻ , PF ₆ ⁻ , (CF ₃ SO ₂ ) ₂ N ⁻ , CF ₃ SO ₃ ⁻ , CF ₃ CO ₂ ⁻ , (CF ₃ SO ₂ ) _{3 ^{C -, C 2 F 5 SO}} 3 -, (C 2 F 5 SO 2) 2 N -, F · 2.3HF-, SbF 6 - are preferably used, and the like.

  A general method for synthesizing the quaternary ammonium salt is as follows. First, a tertiary amine and an alkyl halide or dialkyl sulfuric acid are mixed and heated as necessary to obtain a quaternary ammonium halide salt. In addition, when using compounds with low reactivity, such as an alkoxy ethyl halide and an alkoxy methyl halide, it is suitable to make it react under pressure using an autoclave.

  The quaternary ammonium halide salt thus obtained is dissolved in an aqueous medium such as water, and reacted with a reagent that generates the necessary anion species such as borohydrofluoric acid or tetrafluorophosphoric acid, thereby producing an anion. An exchange reaction can be carried out to obtain a quaternary ammonium salt.

  The content of the ionic liquid in the photosensitive composition is preferably 0.01% by mass to 20.0% by mass with respect to the solid content of the photosensitive composition in terms of sensitivity and interleaving paper peelability, and is further 0. 0.05 mass% to 10.0 mass% is preferable, and 0.1 mass% to 5.0 mass% is particularly preferable.

  Moreover, from the surface of a sensitivity, 0.2 mass%-80.0 mass% are preferable with respect to a photoinitiator, and it is preferable to contain especially in the range of 1.0 mass%-60.0 mass%.

((A) Addition-polymerizable ethylenic double bond-containing compound)
The (A) addition-polymerizable ethylenic double bond-containing compound according to the present invention is a compound having an ethylenic double bond that can be polymerized by image exposure.

  Addition-polymerizable ethylenic double bond-containing compounds include general radical-polymerizable monomers and polyfunctional compounds having a plurality of addition-polymerizable ethylenic double bonds commonly used in UV curable resins. Monomers and polyfunctional oligomers can be used. The compound is not limited, but preferred examples include 2-ethylhexyl acrylate, 2-hydroxypropyl acrylate, glycerol acrylate, tetrahydrofurfuryl acrylate, phenoxyethyl acrylate, nonylphenoxyethyl acrylate, tetrahydrofurfuryloxyethyl acrylate, tetrahydro Furfuryloxyhexanolide acrylate, acrylate of ε-caprolactone adduct of 1,3-dioxane alcohol, monofunctional acrylic acid esters such as 1,3-dioxolane acrylate, or these acrylates as methacrylate, itaconate, crotonate, maleate Methacrylic acid, itaconic acid, crotonic acid, maleic acid esters such as ethylene glycol diacrylate , Triethylene glycol diacrylate, pentaerythritol diacrylate, hydroquinone diacrylate, resorcin diacrylate, hexanediol diacrylate, neopentyl glycol diacrylate, tripropylene glycol diacrylate, dipentylate of hydroxypentylate neopentyl glycol, Diacrylate of neopentyl glycol adipate, Diacrylate of ε-caprolactone adduct of neopentyl glycol hydroxypivalate, 2- (2-hydroxy-1,1-dimethylethyl) -5-hydroxymethyl-5-ethyl-1, Ε-caprolactone adduct of 3-dioxane diacrylate, tricyclodecane dimethylol acrylate, tricyclodecane dimethylol acrylate Difunctional acrylic acid esters such as diglycidyl ether diacrylate of 1,6-hexanediol, or methacrylic acid, itaconic acid, crotonic acid, maleic acid ester in which these acrylates are replaced with methacrylate, itaconate, crotonate, maleate, For example, trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, trimethylolethane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, dipentaerythritol Ε-caprolactone adduct of hexaacrylate, pyrogallol triacrylate Polyfunctional acrylic acid esters such as propionic acid / dipentaerythritol triacrylate, propionic acid / dipentaerythritol tetraacrylate, hydroxypivalylaldehyde-modified dimethylolpropane triacrylate, or these acrylates with methacrylate, itaconate, crotonate, Examples thereof include methacrylic acid, itaconic acid, crotonic acid, and maleic acid ester instead of maleate.

  Prepolymers can also be used as described above. Examples of the prepolymer include compounds as described below, and a prepolymer obtained by introducing acrylic acid or methacrylic acid into an oligomer having an appropriate molecular weight and imparting photopolymerizability can be preferably used. These prepolymers may be used singly or in combination of two or more, and may be used by mixing with the above-mentioned monomers and / or oligomers.

  Examples of prepolymers include adipic acid, trimellitic acid, maleic acid, phthalic acid, terephthalic acid, hymic acid, malonic acid, succinic acid, glutaric acid, itaconic acid, pyromellitic acid, fumaric acid, glutaric acid, pimelic acid, Polybasic acids such as sebacic acid, dodecanoic acid, tetrahydrophthalic acid, and ethylene glycol, propylene glycol, diethylene glycol, propylene oxide, 1,4-butanediol, triethylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, trimethylol Polyester obtained by introducing (meth) acrylic acid into a polyester obtained by combining polyhydric alcohols such as propane, pentaerythritol, sorbitol, 1,6-hexanediol, 1,2,6-hexanetriol Chlorates such as bisphenol A, epichlorohydrin, (meth) acrylic acid, and epoxy acrylates in which (meth) acrylic acid is introduced into an epoxy resin such as phenol novolac, epichlorohydrin, (meth) acrylic acid, such as ethylene glycol, adipine Acid / tolylene diisocyanate / 2-hydroxyethyl acrylate, polyethylene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate, hydroxyethylphthalyl methacrylate / xylene diisocyanate, 1,2-polybutadiene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate , Trimethylolpropane, propylene glycol, tolylene diisocyanate, 2-hydroxyethyl acrylate In addition, urethane acrylates in which (meth) acrylic acid is introduced into urethane resin, for example, silicone resin acrylates such as polysiloxane acrylate, polysiloxane diisocyanate, 2-hydroxyethyl acrylate, etc., and (meth) acryloyl in oil-modified alkyd resins Examples thereof include prepolymers such as alkyd-modified acrylates having introduced groups and spirane resin acrylates.

  The photosensitive composition of the present invention includes phosphazene monomer, triethylene glycol, isocyanuric acid EO (ethylene oxide) modified diacrylate, isocyanuric acid EO modified triacrylate, dimethylol tricyclodecane diacrylate, trimethylolpropane benzoic acid benzoate. Addition-polymerizable oligomers and prepolymers having monomers such as acid esters, alkylene glycol type acrylic acid-modified, urethane-modified acrylates, and structural units formed from the monomers can be contained.

  Furthermore, examples of the ethylenic monomer that can be used in combination with the present invention include phosphate ester compounds containing at least one (meth) acryloyl group. The compound is not particularly limited as long as it is a compound in which at least part of the hydroxyl group of phosphoric acid is esterified and has a (meth) acryloyl group.

  In addition, JP-A-58-212994, 61-6649, 62-46688, 62-48589, 62-173295, 62-187092, 63- 67189, JP-A-1-244891, and the like. Further, “11290 Chemical Products”, Chemical Industry Daily, p. 286-p. 294, “UV / EB Curing Handbook (raw material)”, Kobunshi Publishing Co., p. The compounds described in 11 to 65 can also be suitably used in the present invention. Of these, compounds having two or more acrylic groups or methacryl groups in the molecule are preferred in the present invention, and those having a molecular weight of 10,000 or less, more preferably 5,000 or less are preferred.

  In the photosensitive composition of the present invention, it is preferable to use an addition-polymerizable ethylenic double bond-containing compound containing a tertiary amino group in the molecule, which is a tertiary amine monomer. Although there is no particular limitation on the structure, a tertiary amine compound having a hydroxyl group modified with glycidyl methacrylate, methacrylic acid chloride, acrylic acid chloride or the like is preferably used. Specifically, polymerizable compounds described in JP-A-1-165613, JP-A-1-203413, and JP-A-1-197213 are preferably used.

  Furthermore, in the present invention, a tertiary amine monomer, a polyhydric alcohol containing a tertiary amino group in the molecule, a diisocyanate compound, and a compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule are used. It is preferred to use a reaction product.

  Examples of the polyhydric alcohol having a tertiary amino group in the molecule include triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, Nn-butyldiethanolamine, N-tert. -Butyldiethanolamine, N, N-di (hydroxyethyl) aniline, N, N, N ', N'-tetra-2-hydroxypropylethylenediamine, p-tolyldiethanolamine, N, N, N', N'-tetra- 2-hydroxyethylethylenediamine, N, N-bis (2-hydroxypropyl) aniline, allyldiethanolamine, 3- (dimethylamino) -1,2-propanediol, 3-diethylamino-1,2-propanediol, N, N -Di (n-propyl) amino-2,3-propanediol, N, N-di (iso-propyl) amino-2,3-propanediol, 3- (N-methyl-N-benzylamino) -1, Although 2-propanediol etc. are mentioned, it is not limited to this.

  Examples of the diisocyanate compound include butane-1,4-diisocyanate, hexane-1,6-diisocyanate, 2-methylpentane-1,5-diisocyanate, octane-1,8-diisocyanate, 1,3-diisocyanate methyl-cyclohexanone. 2,2,4-trimethylhexane-1,6-diisocyanate, isophorone diisocyanate, 1,2-phenylene diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, tolylene-2,4-diisocyanate, tolylene- Examples include 2,5-diisocyanate, tolylene-2,6-diisocyanate, 1,3-di (isocyanatomethyl) benzene, 1,3-bis (1-isocyanato-1-methylethyl) benzene, and the like. Limited to Not.

  Examples of the compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule include the following compounds MH-1 to MH-13, but are not limited thereto.

  Preferably, 2-hydroxyethyl methacrylate (MH-1), 2-hydroxyethyl acrylate (MH-2), 4-hydroxybutyl acrylate (MH-4), 2-hydroxypropylene-1,3-dimethacrylate (MH-) 7), 2-hydroxypropylene-1-methacrylate-3-acrylate (MH-8) and the like.

  These reactions can be carried out in the same manner as a method for synthesizing urethane acrylate by a reaction of a normal diol compound, diisocyanate compound, and hydroxyl group-containing acrylate compound.

  Specific examples of reaction products of polyhydric alcohols containing tertiary amino groups in the molecule, diisocyanate compounds, and compounds containing ethylenic double bonds capable of addition polymerization with hydroxyl groups in the molecule are shown below. Shown in

M-1: reaction product of triethanolamine (1 mol), hexane-1,6-diisocyanate (3 mol), 2-hydroxyethyl methacrylate (3 mol) M-2: triethanolamine (1 mol), isophorone Reaction product of diisocyanate (3 mol) and 2-hydroxyethyl acrylate (3 mol) M-3: Nn-butyldiethanolamine (1 mol), 1,3-bis (1-isocyanato-1-methylethyl) Reaction product of benzene (2 mol) and 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) M-4: Nn-butyldiethanolamine (1 mol), 1,3-di (isocyanatomethyl) ) Reaction of benzene (2 mol), 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) Product M-5: Reaction product of N-methyldiethanolamine (1 mol), tolylene-2,4-diisocyanate (2 mol), 2-hydroxypropylene-1,3-dimethacrylate (2 mol) Acrylates or alkyl acrylates described in JP-A-1-105238 and JP-A-2-127404 can be used.

  The amount of addition-polymerizable ethylenic double bond-containing compound according to the present invention is preferably from 30 to 70% by mass, more preferably from 40 to 60% by mass, based on the nonvolatile component of the photosensitive layer.

((B) Photopolymerization initiator)
The photopolymerization initiator according to the present invention is a compound capable of initiating polymerization of an (A) polymerizable, ethylenically unsaturated bond-containing compound by image exposure, such as a biimidazole compound, an iron arene complex compound, a titanocene compound. , Polyhalogen compounds, monoalkyltriaryl borate compounds and the like are preferably used. Among these, a biimidazole compound, an iron arene complex compound or a titanocene compound is particularly preferable, and it is particularly preferable that a polyhalogen compound is further included in addition to this.

(Biimidazole compound)
The biimidazole compound according to the present invention is a derivative of biimidazole, and examples thereof include compounds described in JP-A No. 2003-295426.

  In the present invention, it is preferable to contain a hexaarylbiimidazole (HABI, triaryl-imidazole dimer) compound as the biimidazole compound.

  Processes for the production of HABIs are described in DE 1,470,154 and their use in photopolymerizable compositions is described in EP 24,629, EP 107,792, US 4,410,621, EP 215,453 and DE 3, 211 and 312.

  Preferred derivatives are, for example, 2,4,5,2 ′, 4 ′, 5′-hexaphenylbiimidazole, 2,2′-bis (2-chlorophenyl) -4,5,4 ′, 5′-tetraphenylbiimidazole. Imidazole, 2,2'-bis (2-bromophenyl) -4,5,4 ', 5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,5,4' , 5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,5,4 ', 5'-tetrakis (3-methoxyphenyl) biimidazole, 2,2'-bis (2- Chlorophenyl) -4,5,4 ', 5'-tetrakis (3,4,5-trimethoxyphenyl) -biimidazole, 2,5,2', 5'-tetrakis (2-chlorophenyl) -4,4 ' -Bis (3,4-dimethyl) Xylphenyl) biimidazole, 2,2'-bis (2,6-dichlorophenyl) -4,5,4 ', 5'-tetraphenylbiimidazole, 2,2'-bis (2-nitrophenyl) -4,5 , 4 ', 5'-tetraphenylbiimidazole, 2,2'-di-o-tolyl-4,5,4', 5'-tetraphenylbiimidazole, 2,2'-bis (2-ethoxyphenyl) -4,5,4 ', 5'-tetraphenylbiimidazole and 2,2'-bis (2,6-difluorophenyl) -4,5,4', 5'-tetraphenylbiimidazole.

  The amount of HABI is typically in the range of 0.01 to 30% by weight, preferably 0.5 to 20% by weight, based on the total weight of the non-volatile components of the photosensitive composition.

<Iron arene complex compound>
The iron arene complex compound according to the present invention is a compound represented by the following general formula (a).

Formula (a) [A-Fe-B] ⁺ X ⁻
In the formula, A represents a substituted or unsubstituted cyclopentadienyl group or a cyclohexadienyl group. In the formula, B represents a compound having an aromatic ring. In the formula, X ⁻ represents an anion.

Specific examples of the compound having an aromatic ring include benzene, toluene, xylene, cumene, naphthalene, 1-methylnaphthalene, 2-methylnaphthalene, biphenyl, fluorene, anthracene, and pyrene. Examples of X ⁻ include PF ₆ ⁻ , BF ₄ ⁻ , SbF ₆ ⁻ , AlF ₄ ⁻ , CF ₃ SO ₃ ^{− and the} like. Examples of the substituent of the substituted cyclopentadienyl group or cyclohexadienyl group include alkyl groups such as methyl and ethyl groups, cyano groups, acetyl groups, and halogen atoms.

  It is preferable to contain an iron arene complex compound in the ratio of 0.1-20 mass% with respect to the compound which has a group which can superpose | polymerize, More preferably, it is 0.1-10 mass%.

Specific examples of the iron arene complex compound are shown below.
Fe-1: (η6-benzene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-2: (η6-toluene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe— 3: (η6-cumene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-4: (η6-benzene) (η5-cyclopentadienyl) iron (2) hexafluoroarsenate Fe-5 : (Η6-benzene) (η5-cyclopentadienyl) iron (2) tetrafluoroporate Fe-6: (η6-naphthalene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-7: ( η6-anthracene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-8: (η6-pyrene) Lopentagenyl) iron (2) hexafluorophosphate Fe-9: (η6-benzene) (η5-cyanocyclopentadienyl) iron (2) hexafluorophosphate Fe-10: (η6-toluene) (η5-acetylcyclopentazinini ) Iron (2) Hexafluorophosphate Fe-11: (η6-cumene) (η5-cyclopentadienyl) Iron (2) Tetrafluoroborate Fe-12: (η6-benzene) (η5-carboethoxycyclohexadienyl) ) Iron (2) hexafluorophosphate Fe-13: (η6-benzene) (η5-1,3-dichlorocyclohexadienyl) iron (2) hexafluorophosphate Fe-14: (η6-cyanobenzene) (η5- Cyclohexadienyl) iron (2) hexafluorophosphate Fe-15: (η6 Acetophenone) (η5-cyclohexadienyl) iron (2) hexafluorophosphate Fe-16: (η6-methylbenzoate) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-17: (η6-benzenesulfone Amido) (η5-cyclopentadienyl) iron (2) tetrafluoroborate Fe-18: (η6-benzamide) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-19: (η6-cyanobenzene ) (Η5-cyanocyclopentadienyl) iron (2) hexafluorophosphate FE-20: (η6-chloronaphthalene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate Fe-21: (η6-anthracene) ) (Η5-cyanocyclopentadienyl) iron (2) Xafluorophosphate Fe-22: (η6-chlorobenzene) (η5-cyclopentadienyl) iron (2) Hexafluorophosphate Fe-23: (η6-chlorobenzene) (η5-cyclopentadienyl) iron (2) Tetrafluoroborate These compounds are described in Dokl. Akd. It can be synthesized by the method described in Nauk SSSR 149 615 (1963).

  Examples of titanocene compounds include compounds described in JP-A-63-41483 and JP-A-2-291. More preferred specific examples include bis (cyclopentadienyl) -Ti-di-chloride, bis (Cyclopentadienyl) -Ti-bis-phenyl, bis (cyclopentadienyl) -Ti-bis-2,3,4,5,6-pentafluorophenyl, bis (cyclopentadienyl) -Ti-bis -2,3,5,6-tetrafluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,4,6-trifluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,6 -Difluorophenyl, bis (cyclopentadienyl) -Ti-bis-2,4-difluorophenyl, bis (methylcyclopentadienyl) -Ti-bis- , 3,4,5,6-pentafluorophenyl, bis (methylcyclopentadienyl) -Ti-bis-2,3,5,6-tetrafluorophenyl, bis (methylcyclopentadienyl) -Ti-bis -2,6-difluorophenyl (IRUGACURE 727L: manufactured by Ciba Specialty Chemicals), bis (cyclopentadienyl) -bis (2,6-difluoro-3- (py-1-yl) phenyl) titanium (IRUGACURE 784: Ciba Specialty Chemicals), bis (cyclopentadienyl) -bis (2,4,6-trifluoro-3- (pyridin-1-yl) phenyl) titanium bis (cyclopentadienyl) -bis (2, 4,6-trifluoro-3- (2-5-dimethylpy-1-yl) phenyl) titanium and the like It is below.

  The photosensitive composition of the present invention preferably further contains a polyhalogen compound as a photopolymerization initiator.

  The polyhalogen compound is preferably a polyhaloacetyl compound, and more preferably a trihaloacetylamide compound. Examples of the polyhaloacetyl compound include a compound represented by the following general formula (10) or more preferably a compound represented by the following general formula (11).

Formula ^{(10) R 11 -C (X} 10) 2 - (C = O) -R 12
In the formula, X ¹⁰ represents a chlorine atom or a bromine atom. R ¹¹ represents a hydrogen atom, a chlorine atom, a bromine atom, an alkyl group, an aryl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group or a cyano group. R ¹² represents a monovalent substituent. R ¹¹ and R ¹² may be bonded to form a ring.

Formula ^{(11) C (X 11)} 3 - (C = O) -Y 10 -R 13
In the formula, X ¹¹ represents a chlorine atom or a bromine atom. R ¹³ represents a monovalent substituent. Y ¹⁰ represents —O— or —NR ¹⁴ —. R ¹⁴ represents a hydrogen atom or an alkyl group. R ¹³ and R ¹⁴ may combine to form a ring.

  Typical specific examples (BR1 to BR76) of the compound represented by the general formula (6) are listed below, but the present invention is not limited thereto.

  In the polyhalogen compounds represented by the general formulas (10) to (11), polybromine compounds are more preferable.

  The polyhalogen compound preferably used in the present invention further includes a trihalomethyltriazine compound. For example, Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), for example, 2-phenyl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, 2-methyl-4, 6-bis (trichloromethyl) -S-triazine, 2-n-nonyl-4,6-bis (trichloromethyl) -S-triazine, 2- (α, α, β-trichloroethyl) -4, - bis (trichloromethyl) -S- triazine. In addition, compounds described in British Patent 1388492, for example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (4-styrylphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine , 2- (p-methoxystyryl) -4-amino-6-trichloromethyl-S-triazine, etc., compounds described in JP-A-53-133428, such as 2- (4-methoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- (4-ethoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-tria 2- [4- (2-ethoxyethyl) -naphth-1-yl] -4,6-bis-trichloromethyl-S-triazine, 2- (4,7-dimethoxy-naphth-1-yl)- Examples include 4,6-bis-trichloromethyl-S-triazine, 2- (acenaphtho-5-yl) -4,6-bis-trichloromethyl-S-triazine, and the compounds described in German Patent 3337024. be able to. F.F. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), such as 2-methyl-4,6-bis (tribromomethyl) -S-triazine, 2,4,6-tris (tribromomethyl) -S-triazine, 2, 4,6-tris (dibromomethyl) -S-triazine, 2-amino-4-methyl-6-tribromomethyl-S-triazine, 2-methoxy-4-methyl-6-trichloromethyl-S-triazine, etc. be able to.

  Examples of the monoalkyl triaryl borate compound include compounds described in JP-A-62-150242 and JP-A-62-143044, and more preferable specific examples include tetra-n-butylammonium / n-butyl- Trinaphthalen-1-yl-borate, tetra-n-butylammonium / n-butyl-triphenyl-borate, tetra-n-butylammonium / n-butyl-tri- (4-tert-butylphenyl) -borate, tetra -N-butylammonium · n-hexyl-tri- (3-chloro-4-methylphenyl) -borate, tetra-n-butylammonium · n-hexyl-tri- (3-fluorophenyl) -borate, etc. .

  In the present invention, other known photopolymerization initiators may be used in combination as the photopolymerization initiator.

  As content with respect to the photosensitive composition of the photoinitiator which concerns on this invention, 0.1-50.0 mass% is preferable, and it is more preferable that it is 1.0-30.0 mass%.

((C) polymer binder)
Next, the polymer binder will be described.

  Examples of the polymer binder used in the present invention include acrylic polymers, polyvinyl butyral resins, polyurethane resins, polyamide resins, polyester resins, epoxy resins, phenol resins, polycarbonate resins, polyvinyl butyral resins, polyvinyl formal resins, shellacs, and others. Natural resins can be used. Two or more of these may be used in combination.

  A vinyl copolymer obtained by copolymerization of acrylic monomers is preferred. Furthermore, the copolymer composition of the polymer binder is preferably a copolymer of (a) a carboxyl group-containing monomer, (b) a methacrylic acid alkyl ester, or an acrylic acid alkyl ester.

  Specific examples of the carboxyl group-containing monomer include α, β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride and the like. In addition, carboxylic acids such as phthalic acid and 2-hydroxymethacrylate half ester are also preferred.

  Specific examples of alkyl methacrylates and alkyl esters include methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, heptyl methacrylate, octyl methacrylate, nonyl methacrylate. , Decyl methacrylate, undecyl methacrylate, dodecyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, heptyl acrylate, octyl acrylate, nonyl acrylate, acrylic In addition to unsubstituted alkyl esters such as decyl acid, undecyl acrylate and dodecyl acrylate, cyclic alkyl esters such as cyclohexyl methacrylate and cyclohexyl acrylate Substituted alkyl esters such as benzyl methacrylate, 2-chloroethyl methacrylate, N, N-dimethylaminoethyl methacrylate, glycidyl methacrylate, benzyl acrylate, 2-chloroethyl acrylate, N, N-dimethylaminoethyl acrylate, and glycidyl acrylate Also mentioned.

  Furthermore, in the polymer binder of the present invention, monomers described in the following (1) to (14) can be used as other copolymerization monomers.

  1) Monomers having an aromatic hydroxyl group, such as o- (or p-, m-) hydroxystyrene, o- (or p-, m-) hydroxyphenyl acrylate and the like.

  2) Monomers having an aliphatic hydroxyl group, such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N-methylol acrylamide, N-methylol methacrylamide, 4-hydroxybutyl methacrylate, 5-hydroxypentyl acrylate, 5-hydroxypentyl methacrylate , 6-hydroxyhexyl acrylate, 6-hydroxyhexyl methacrylate, N- (2-hydroxyethyl) acrylamide, N- (2-hydroxyethyl) methacrylamide, hydroxyethyl vinyl ether and the like.

  3) A monomer having an aminosulfonyl group, such as m- (or p-) aminosulfonylphenyl methacrylate, m- (or p-) aminosulfonylphenyl acrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p -Aminosulfonylphenyl) acrylamide and the like.

  4) Monomers having a sulfonamide group, such as N- (p-toluenesulfonyl) acrylamide, N- (p-toluenesulfonyl) methacrylamide and the like.

  5) Acrylamide or methacrylamides such as acrylamide, methacrylamide, N-ethylacrylamide, N-hexylacrylamide, N-cyclohexylacrylamide, N-phenylacrylamide, N- (4-nitrophenyl) acrylamide, N-ethyl-N- Phenylacrylamide, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylamide and the like.

  6) Monomers containing fluorinated alkyl groups such as trifluoroethyl acrylate, trifluoroethyl methacrylate, tetrafluoropropyl methacrylate, hexafluoropropyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, heptadecafluorodecyl methacrylate, N- Butyl-N- (2-acryloxyethyl) heptadecafluorooctylsulfonamide and the like.

  7) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether and the like.

  8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate and the like.

  9) Styrenes such as styrene, methyl styrene, chloromethyl styrene and the like.

  10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.

  11) Olefins such as ethylene, propylene, i-butylene, butadiene, isoprene and the like.

  12) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine and the like.

  13) Monomers having a cyano group, such as acrylonitrile, methacrylonitrile, 2-pentenenitrile, 2-methyl-3-butenenitrile, 2-cyanoethyl acrylate, o- (or m-, p-) cyanostyrene.

  14) A monomer having an amino group, such as N, N-diethylaminoethyl methacrylate, N, N-dimethylaminoethyl acrylate, N, N-dimethylaminoethyl methacrylate, polybutadiene urethane acrylate, N, N-dimethylaminopropyl acrylamide, N, N-dimethylacrylamide, acryloylmorpholine, Ni-propylacrylamide, N, N-diethylacrylamide and the like.

  Further, other monomers that can be copolymerized with these monomers may be copolymerized.

  Furthermore, the polymer binder of the present invention is preferably a vinyl polymer having a carboxyl group and a polymerizable double bond in the side chain. For example, an unsaturated bond-containing vinyl copolymer obtained by addition-reacting a compound having a (meth) acryloyl group and an epoxy group in the molecule to a carboxyl group present in the molecule of the vinyl copolymer. Is also preferred as a polymer binder.

  Specific examples of the compound containing both an unsaturated bond and an epoxy group in the molecule include glycidyl acrylate, glycidyl methacrylate, and an epoxy group-containing unsaturated compound described in JP-A No. 11-271969. In addition, an unsaturated bond-containing vinyl copolymer obtained by adding a compound having a (meth) acryloyl group and an isocyanate group in the molecule to a hydroxyl group present in the molecule of the vinyl polymer is also high. Preferred as a molecular binder. Compounds having both an unsaturated bond and an isocyanate group in the molecule include vinyl isocyanate, (meth) acrylic isocyanate, 2- (meth) acryloyloxyethyl isocyanate, m- or p-isopropenyl-α, α'-dimethylbenzyl. Isocyanates are preferred, and (meth) acrylic isocyanate, 2- (meth) acryloyloxyethyl isocyanate and the like can be mentioned.

  A known method can be used for the addition reaction of a compound having a (meth) acryloyl group and an epoxy group in the molecule to a carboxyl group present in the molecule of the vinyl copolymer. For example, the reaction temperature is 20 to 100 ° C., preferably 40 to 80 ° C., particularly preferably at the boiling point (under reflux) of the solvent used, and the reaction time is 2 to 10 hours, preferably 3 to 6 hours. Can do. Examples of the solvent to be used include those used in the polymerization reaction of the vinyl copolymer. In addition, after the polymerization reaction, the solvent can be used as it is for the introduction reaction of the alicyclic epoxy group-containing unsaturated compound without removing the solvent. The reaction can be performed in the presence of a catalyst and a polymerization inhibitor as necessary.

  Here, the catalyst is preferably an amine-based or ammonium chloride-based material, and specifically, the amine-based material is triethylamine, tributylamine, dimethylaminoethanol, diethylaminoethanol, methylamine, ethylamine, n-propylamine. , Isopropylamine, 3-methoxypropylamine, butylamine, allylamine, hexylamine, 2-ethylhexylamine, benzylamine, and the like, and ammonium chloride-based substances include triethylbenzylammonium chloride and the like.

  When using these as a catalyst, what is necessary is just to add in 0.01-20.0 mass% with respect to the alicyclic epoxy group containing unsaturated compound to be used. In addition, as polymerization inhibitors, hydroquinone, hydroquinone monomethyl ether, tert-butyl hydroquinone, 2,5-di-tert-butyl hydroquinone, methyl hydroquinone, p-benzoquinone, methyl-p-benzoquinone, tert-butyl-p-benzoquinone 2,5-diphenyl-p-benzoquinone and the like, and the amount used is 0.01 to 5.0% by mass with respect to the alicyclic epoxy group-containing unsaturated compound to be used. The progress of the reaction may be determined by measuring the acid value of the reaction system and stopping the reaction when the acid value becomes zero.

  A known method can be used for the addition reaction of a compound having a (meth) acryloyl group and an isocyanate group in the molecule to a hydroxyl group present in the molecule of the vinyl polymer. For example, the reaction temperature is usually 20 to 100 ° C., preferably 40 to 80 ° C., particularly preferably at the boiling point (under reflux) of the solvent used, and the reaction time is usually 2 to 10 hours, preferably 3 to 6 hours. It can be carried out. Examples of the solvent to be used include solvents used in the polymerization reaction of the polymer copolymer. Further, after the polymerization reaction, the solvent can be used as it is for the introduction reaction of the isocyanate group-containing unsaturated compound without removing the solvent. The reaction can be performed in the presence of a catalyst and a polymerization inhibitor as necessary. Here, the catalyst is preferably a tin-based or amine-based substance, and specific examples include dibutyltin laurate and triethylamine.

  The catalyst is preferably added in the range of 0.01 to 20.0 mass% with respect to the compound having a double bond to be used. In addition, as polymerization inhibitors, hydroquinone, hydroquinone monomethyl ether, tert-butyl hydroquinone, 2,5-di-tert-butyl hydroquinone, methyl hydroquinone, p-benzoquinone, methyl-p-benzoquinone, tert-butyl-p-benzoquinone 2,5-diphenyl-p-benzoquinone and the like, and the amount used is usually 0.01 to 5.0% by mass with respect to the isocyanate group-containing unsaturated compound to be used. The progress of the reaction may be determined by determining the presence or absence of an isocyanato group in the reaction system using an infrared absorption spectrum (IR), and stopping the reaction when the absorption disappears.

  The vinyl polymer having a carboxyl group and a polymerizable double bond in the side chain is preferably 50 to 100% by mass, and more preferably 100% by mass in the total polymer binder.

  The content of the polymer binder in the photosensitive layer is preferably in the range of 10 to 90% by mass, more preferably in the range of 15 to 70% by mass, and use in the range of 20 to 50% by mass from the viewpoint of sensitivity. Particularly preferred.

(Dye having an absorption maximum wavelength of 350 to 450 nm)
The photosensitive composition of the present invention preferably contains a sensitizing dye having an absorption maximum in a wavelength range of 350 to 450 nm.

  Examples of these dyes include cyanine, merocyanine, porphyrin, spiro compound, ferrocene, fluorene, fulgide, imidazole, perylene, phenazine, phenothiazine, acridine, azo compound, diphenylmethane, triphenylmethane, triphenylamine, coumarin derivative, quinacridone, Examples include indigo, styryl, pyrylium compounds, pyromethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, ketoalcohol borate complexes, and the like.

  Of these sensitizing dyes, a coumarin dye represented by the following general formula (A) is preferably used.

Wherein, R ³¹ to R ³⁶ represents a hydrogen atom, a substituent group. Examples of the substituent include an alkyl group (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, etc.), A cycloalkyl group (eg, cyclopentyl group, cyclohexyl group, etc.), an alkenyl group (eg, vinyl group, allyl group, etc.), an alkynyl group (eg, ethynyl group, propargyl group, etc.), an aryl group (eg, phenyl group, naphthyl group). Etc.), heteroaryl group (for example, furyl group, thienyl group, pyridyl group, pyridazyl group, pyrimidyl group, pyrazyl group, triazyl group, imidazolyl group, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxazolyl group, quinazolyl group , Phthalazyl groups, etc.), heterocyclic groups (eg , Pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (for example, methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.), cycloalkoxy Group (eg, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (eg, phenoxy group, naphthyloxy group, etc.), alkylthio group (eg, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group) Group, dodecylthio group etc.), cycloalkylthio group (eg cyclopentylthio group, cyclohexylthio group etc.), arylthio group (eg phenylthio group, naphthylthio group etc.), alkoxycarbonyl group (eg methyl Xycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, etc.), aryloxycarbonyl group (eg, phenyloxycarbonyl group, naphthyloxycarbonyl group, etc.), sulfamoyl group (eg, Aminosulfonyl group, methylaminosulfonyl group, dimethylaminosulfonyl group, butylaminosulfonyl group, hexylaminosulfonyl group, cyclohexylaminosulfonyl group, octylaminosulfonyl group, dodecylaminosulfonyl group, phenylaminosulfonyl group, naphthylaminosulfonyl group, 2 -Pyridylaminosulfonyl group, etc.), acyl group (for example, acetyl group, ethylcarbonyl group, propylcarbonyl group, pentylcarbonyl group, cyclohexyl group) A silcarbonyl group, an octylcarbonyl group, a 2-ethylhexylcarbonyl group, a dodecylcarbonyl group, a phenylcarbonyl group, a naphthylcarbonyl group, a pyridylcarbonyl group, etc.), an acyloxy group (for example, an acetyloxy group, an ethylcarbonyloxy group, a butylcarbonyloxy group) Octylcarbonyloxy group, dodecylcarbonyloxy group, phenylcarbonyloxy group, etc.), amide group (for example, methylcarbonylamino group, ethylcarbonylamino group, dimethylcarbonylamino group, propylcarbonylamino group, pentylcarbonylamino group, cyclohexylcarbonyl) Amino group, 2-ethylhexylcarbonylamino group, octylcarbonylamino group, dodecylcarbonylamino group, phenylcarbonylamino group, naphthylca Bonylamino group, etc.), carbamoyl group (for example, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, propylaminocarbonyl group, pentylaminocarbonyl group, cyclohexylaminocarbonyl group, octylaminocarbonyl group, 2-ethylhexylaminocarbonyl group) , Dodecylaminocarbonyl group, phenylaminocarbonyl group, naphthylaminocarbonyl group, 2-pyridylaminocarbonyl group, etc.), ureido group (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octylureido group, dodecyl group) Ureido group, phenylureido group, naphthylureido group, 2-pyridylaminoureido group, etc.), sulfinyl group (for example, methylsulfinyl group, ethyls) Finyl group, butylsulfinyl group, cyclohexylsulfinyl group, 2-ethylhexylsulfinyl group, dodecylsulfinyl group, phenylsulfinyl group, naphthylsulfinyl group, 2-pyridylsulfinyl group, etc.), alkylsulfonyl group (for example, methylsulfonyl group, ethylsulfonyl group) , Butylsulfonyl group, cyclohexylsulfonyl group, 2-ethylhexylsulfonyl group, dodecylsulfonyl group, etc.), arylsulfonyl group (phenylsulfonyl group, naphthylsulfonyl group, 2-pyridylsulfonyl group etc.), amino group (for example, amino group, ethyl group) Amino group, dimethylamino group, butylamino group, cyclopentylamino group, 2-ethylhexylamino group, dodecylamino group, anilino group, naphthylamino group, 2-pyridyla Mino group, etc.), halogen atoms (for example, fluorine atom, chlorine atom, bromine atom etc.), cyano group, nitro group, hydroxy group and the like. These substituents may be further substituted with the above substituents. In addition, a plurality of these substituents may be bonded to each other to form a ring.

Among these, particularly preferred is a coumarin having an amino group, an alkylamino group, a dialkylamino group, an arylamino group, a diarylamino group or an alkylarylamino group as R ³⁵ . In this case, an alkyl group substituted with an amino group that forms a ring with the substituents of R ³⁴ and R ³⁶ can also be preferably used.

Further, either or both of R ³¹ and R ³² are alkyl groups (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group). Group, tetradecyl group, pentadecyl group etc.), cycloalkyl group (eg cyclopentyl group, cyclohexyl group etc.), alkenyl group (eg vinyl group, allyl group etc.), aryl group (eg phenyl group, naphthyl group etc.), Heteroaryl group (for example, furyl group, thienyl group, pyridyl group, pyridazyl group, pyrimidyl group, pyrazyl group, triazyl group, imidazolyl group, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxazolyl group, quinazolyl group, phthalazyl group Etc.), heterocyclic groups (eg, pyrrolidyl group, imida Zolidyl group, morpholyl group, oxazolidyl group etc.), alkoxycarbonyl group (eg methyloxycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group etc.), aryloxycarbonyl group (eg , Phenyloxycarbonyl group, naphthyloxycarbonyl group, etc.), acyl group (for example, acetyl group, ethylcarbonyl group, propylcarbonyl group, pentylcarbonyl group, cyclohexylcarbonyl group, octylcarbonyl group, 2-ethylhexylcarbonyl group, dodecylcarbonyl group) , Phenylcarbonyl group, naphthylcarbonyl group, pyridylcarbonyl group, etc.), acyloxy group (for example, acetyloxy group, ethylcarbonyloxy group, butylcarbonyl) Xy group, octylcarbonyloxy group, dodecylcarbonyloxy group, phenylcarbonyloxy group, etc.), carbamoyl group (for example, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, propylaminocarbonyl group, pentylaminocarbonyl group, cyclohexyl) Aminocarbonyl group, octylaminocarbonyl group, 2-ethylhexylaminocarbonyl group, dodecylaminocarbonyl group, phenylaminocarbonyl group, naphthylaminocarbonyl group, 2-pyridylaminocarbonyl group, etc.), sulfinyl group (for example, methylsulfinyl group, ethylsulfinyl group) Group, butylsulfinyl group, cyclohexylsulfinyl group, 2-ethylhexylsulfinyl group, dodecylsulfinyl group, phenylsulfinyl group Group, naphthylsulfinyl group, 2-pyridylsulfinyl group, etc.), alkylsulfonyl group (eg, methylsulfonyl group, ethylsulfonyl group, butylsulfonyl group, cyclohexylsulfonyl group, 2-ethylhexylsulfonyl group, dodecylsulfonyl group, etc.), aryl Sulfonyl group (phenylsulfonyl group, naphthylsulfonyl group, 2-pyridylsulfonyl group, etc.), halogen atom (for example, fluorine atom, chlorine atom, bromine atom, etc.), cyano group, nitro group, halogenated alkyl group (trifluoromethyl group) , Tribromomethyl group, trichloromethyl group, etc.).

  Preferable specific examples include, but are not limited to, the following compounds.

  In addition to the above specific examples, coumarin derivatives of B-1 to B-22 in JP-A-8-129258, coumarin derivatives of D-1 to D-32 in JP-A-2003-21901, JP-A-2002-363206 No. 1 to 21 Coumarin Derivatives, JP-A No. 2002-363207 No. 1 to 40 Coumarin Derivatives, JP-A No. 2002-363208 No. 1 to 34 Coumarin Derivatives, JP-A No. 2002-363209 No. 1 56 coumarin derivatives and the like can also be preferably used.

  Hereinafter, various additives that can be added to the photosensitive composition in the present invention, a support as a photosensitive lithographic printing plate, a protective layer, application of the photosensitive composition to the support, an image of the photosensitive lithographic printing plate The recording method and the like will be described sequentially.

(Various additives)
In the photosensitive composition of the present invention, in addition to the above-described components, in order to prevent unnecessary polymerization of an ethylenic double bond monomer that can be polymerized during production or storage of a photosensitive lithographic printing plate, It is desirable to add a polymerization inhibitor. Suitable polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol) 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxylamine cerium salt, 2-t-butyl-6- (3-t-butyl-2-hydroxy-5) -Methylbenzyl) -4-methylphenyl acrylate and the like.

  The addition amount of the polymerization inhibitor is preferably about 0.01% to about 5% with respect to the mass of the total solid content of the composition. If necessary, higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to prevent polymerization inhibition due to oxygen, or it may be unevenly distributed on the surface of the photosensitive layer during the drying process after coating. Good. The amount of the higher fatty acid derivative added is preferably about 0.5% to about 10% of the total composition.

  Moreover, a coloring agent can also be used and a conventionally well-known thing can be used conveniently as a coloring agent including a commercially available thing. Examples include those described in the revised new edition “Pigment Handbook”, edited by Japan Pigment Technology Association (Seikodo Shinkosha), Color Index Handbook, and the like.

  Examples of the pigment include black pigment, yellow pigment, red pigment, brown pigment, purple pigment, blue pigment, green pigment, fluorescent pigment, and metal powder pigment. Specifically, inorganic pigments (titanium dioxide, carbon black, graphite, zinc oxide, Prussian blue, cadmium sulfide, iron oxide, and lead, zinc, barium and calcium chromates) and organic pigments (azo-based, thioindigo) , Anthraquinone, anthanthrone, and triphendioxazine pigments, vat dye pigments, phthalocyanine pigments and derivatives thereof, quinacridone pigments, and the like.

  Among these, it is preferable to select and use a pigment having substantially no absorption in the absorption wavelength region of the spectral sensitizing dye corresponding to the exposure laser to be used. In this case, an integrating sphere at the laser wavelength to be used is used. It is preferable that the reflection absorption of the used pigment is 0.05 or less. Moreover, as an addition amount of a pigment, 0.1-10 mass% is preferable with respect to solid content of the said composition, More preferably, it is 0.2-5 mass%.

  From the viewpoints of pigment absorption in the above-mentioned photosensitive wavelength region and visible image properties after development, violet pigments and blue pigments are preferably used. Such as, for example, cobalt blue, cerulean blue, alkali blue lake, phonatone blue 6G, Victoria blue lake, metal-free phthalocyanine blue, phthalocyanine blue first sky blue, indanthrene blue, indico, dioxane violet, iso Violanthrone Violet, Indanthrone Blue, Indanthrone BC and the like can be mentioned. Among these, phthalocyanine blue and dioxane violet are more preferable.

  Moreover, the said composition can contain surfactant as a coating property improving agent in the range which does not impair the performance of this invention. Of these, fluorine-based surfactants are preferred.

  In order to improve the physical properties of the cured film, additives such as an inorganic filler, a plasticizer such as dioctyl phthalate, dimethyl phthalate, and tricresyl phosphate may be added. These addition amounts are preferably 10% or less of the total solid content.

  The solvent used in the photosensitive layer coating solution prepared for providing the photosensitive layer according to the present invention includes, for example, alcohol: polyhydric alcohol derivatives such as sec-butanol, isobutanol, and n-hexanol. , Benzyl alcohol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1,5-pentanediol, ethers: propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, ketones, aldehydes: di Preferred examples include acetone alcohol, cyclohexanone, methylcyclohexanone, and esters: ethyl lactate, butyl lactate, diethyl oxalate, methyl benzoate and the like.

  Although the photosensitive composition according to the present invention has been described above, the photosensitive lithographic printing plate material according to the present invention is prepared by mixing and preparing the above-mentioned compositions so as to have the above ratios, and coating this on an aluminum support. It is constituted by doing.

(Protective layer: oxygen barrier layer)
A protective layer can be provided on the upper side of the photosensitive layer according to the present invention, if necessary.

  This protective layer (oxygen barrier layer) is preferably highly soluble in a developer (described below, generally an aqueous alkali solution) described below, and specific examples include polyvinyl alcohol and polyvinyl pyrrolidone. Polyvinyl alcohol has an effect of suppressing permeation of oxygen, and polyvinyl pyrrolidone has an effect of ensuring adhesion with an adjacent photosensitive layer.

  In addition to the above two polymers, polysaccharides, polyethylene glycol, gelatin, glue, casein, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, hydroxyethyl starch, gum arabic, sucrose octaacetate, ammonium alginate, sodium alginate as required Water-soluble polymers such as polyvinylamine, polyethylene oxide, polystyrene sulfonic acid, polyacrylic acid, and water-soluble polyamide can also be used in combination.

  When a protective layer is provided on the photosensitive lithographic printing plate material of the present invention, the peeling force between the photosensitive layer and the protective layer is preferably 35 mN / mm or more, more preferably 50 mN / mm or more, and even more preferably 75 mN / mm or more. It is. Preferred examples of the protective layer composition include those described in Japanese Patent Application No. 8-161645.

  Peeling force is measured by applying a predetermined width of adhesive tape with a sufficiently large adhesive force on the protective layer and peeling it with the protective layer at an angle of 90 degrees with respect to the plane of the photosensitive lithographic printing plate material. Can be obtained.

  The protective layer can further contain a surfactant, a matting agent and the like as required. The protective layer composition is dissolved in a suitable solvent, applied onto the photosensitive layer and dried to form a protective layer. The main component of the coating solvent is particularly preferably water or alcohols such as methanol, ethanol, i-propanol.

  When providing a protective layer, the thickness is preferably from 0.1 to 5.0 μm, particularly preferably from 0.5 to 3.0 μm.

(Support)
The photosensitive composition of the present invention is provided on a support to constitute a photosensitive lithographic printing plate material. In the present invention, a support having a hydrophilic surface is used.

  As the support having a hydrophilic surface, a support having a hydrophilic surface layer and a substrate having a hydrophilic layer containing a hydrophilic substance can be used.

  Examples of the support according to the present invention include a metal plate, a plastic film, paper treated with a polyolefin, a composite base material obtained by appropriately bonding the above materials, and the like.

  The thickness of the support is not particularly limited as long as it can be attached to a printing press, but a thickness of 50 to 500 μm is generally easy to handle.

  As the support according to the present invention, a metal plate obtained by hydrophilizing the substrate surface is preferably used.

  Examples of the metal plate include iron, stainless steel, and aluminum. In the present invention, aluminum or an aluminum alloy (hereinafter referred to as an aluminum plate) is particularly preferable because of the relationship between specific gravity and rigidity. Those subjected to any of the known roughening treatment, anodic oxidation treatment, and surface hydrophilization treatment (so-called aluminum grained plate) are more preferred.

  Various aluminum alloys can be used as the support, and for example, alloys of metals such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, nickel, titanium, sodium, iron, and aluminum are used. .

  Prior to roughening (graining treatment), the support is preferably subjected to a degreasing treatment in order to remove the rolling oil on the surface. As the degreasing treatment, a degreasing treatment using a solvent such as trichlene or thinner, an emulsion degreasing treatment using an emulsion such as kesilon or triethanol, or the like is used. In addition, an alkaline aqueous solution such as caustic soda can be used for the degreasing treatment. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed only by the degreasing treatment can be removed. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, smut is generated on the surface of the support. It is preferable to perform the treatment.

  As a roughening method, roughening is performed by electrolysis, but before that, roughening can be performed by, for example, a mechanical method.

The mechanical roughening method used is not particularly limited, but a brush polishing method and a honing polishing method are preferable. The roughening by the brush polishing method is, for example, by rotating a rotating brush using a bristle having a diameter of 0.2 to 0.8 mm, and for example, volcanic ash particles having a particle size of 10 to 100 μm on water. While supplying the uniformly dispersed slurry, the brush can be pressed. The roughening by honing polishing is performed by, for example, uniformly dispersing volcanic ash particles having a particle size of 10 to 100 μm in water, injecting pressure from a nozzle, and causing the surface to collide obliquely with the support surface. Can do. Further, for example, abrasive particles having a particle size of 10 to 100 μm are applied to the support surface so as to be present at a density of 2.5 × 10 ³ to 10 × 10 ³ particles / cm ² at intervals of 100 to 200 μm. Roughening can also be performed by laminating the sheets and applying a pressure to transfer the rough surface pattern of the sheet.

After the surface is roughened by the mechanical surface roughening method, it is preferable to immerse in an aqueous solution of acid or alkali in order to remove the abrasive that has digged into the surface of the support, formed aluminum scraps, and the like. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like. Examples of the base include sodium hydroxide and potassium hydroxide. Among these, it is preferable to use an aqueous alkali solution such as sodium hydroxide. The dissolution amount of aluminum in the support surface, 0.5 to 5 g / m ² is preferred. After the immersion treatment with an alkaline aqueous solution, it is preferable to neutralize by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.

As a roughening method, roughening by electrolysis is performed. In this method, the surface is electrochemically roughened in an acidic electrolytic solution, and the acidic electrolytic solution has an effective value of 30 A in a hydrochloric acid or nitric acid solution having a concentration of 0.4% by mass to 2.8% by mass. / dm ² or more 100A / dm ² or less at a current density of 10 seconds to 120 seconds, performing electrolytic graining. The concentration of hydrochloric acid or nitric acid is more preferably 1% by mass or more and 2.3% by mass or less. Current density is more preferably 30A / dm ² or more 80A / dm ² or less, further preferably 40A / dm ² or more 75A / dm ² or less.

The temperature at which the electrolytic surface-roughening method is performed is not particularly limited, but is preferably in the range of 5 ° C. to 80 ° C., more preferably in the range of 10 ° C. to 60 ° C. The applied voltage is not particularly limited, but is preferably performed by applying a voltage in the range of 1 to 50 volts, and more preferably in the range of 10 to 30 volts. Quantity of electricity is not particularly limited, it is preferable to use a range of 5000 C / dm ^2, still preferably selected from the range of 100~2000c / dm ^2.

  If necessary, nitrates, chlorides, amines, aldehydes, phosphoric acid, chromic acid, boric acid, acetic acid, oxalic acid, and the like can be added to the electrolytic solution.

After the surface is roughened by the electrolytic surface roughening method, it is preferably immersed in an acid or alkaline aqueous solution in order to remove aluminum scraps on the surface. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like. Examples of the base include sodium hydroxide and potassium hydroxide. Among these, it is preferable to use an alkaline aqueous solution. The dissolution amount of aluminum in the support surface, 0.5 to 5 g / m ² is preferred. In addition, it is preferable that after the immersion treatment with an alkaline aqueous solution, neutralization treatment is performed by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.

  Following the electrolytic surface roughening treatment, an anodic oxidation treatment can be performed. There is no restriction | limiting in particular in the method of the anodizing process which can be used in this invention, A well-known method can be used.

By performing the anodizing treatment, an oxide film is formed on the support. For the anodizing treatment, a method of electrolyzing an aqueous solution containing sulfuric acid and / or phosphoric acid at a concentration of 10 to 50% as an electrolytic solution at a current density of 1 to 10 A / dm ² is preferably used. A method of electrolysis at a high current density in sulfuric acid described in Japanese Patent No. 1,412,768, a method of electrolysis using phosphoric acid described in Japanese Patent No. 3,511,661, chromic acid, Examples thereof include a method using a solution containing one or more oxalic acid, malonic acid and the like. The formed anodic oxidation coating amount is suitably 1 to 50 mg / dm ² , preferably 10 to 40 mg / dm ² . The anodized coating amount is obtained by, for example, immersing an aluminum plate in a chromic phosphate solution (85% phosphoric acid solution: 35 ml, prepared by dissolving 20 g of chromium (IV) oxide in 1 L of water) to dissolve the oxide film, It is determined from the measurement of mass change before and after dissolution of the coating on the plate.

  In the present invention, the support is preferably treated with a sodium silicate solution having a temperature of 20 ° C. or more and 50 ° C. or less after the anodizing treatment. The temperature is preferably 20 ° C. or higher and 50 ° C. or lower, and more preferably 20 ° C. or higher and 45 ° C. or lower. If it is less than 20 ° C., it may become dirty and recovery may be worsened. Further, if it is higher than 50 ° C., the printing durability may be deteriorated. The concentration of sodium silicate is not particularly limited, but is preferably 0.01% or more and 35% or less, and more preferably 0.1% or more and 5% or less.

  In the present invention, the support is preferably treated with a polyvinylphosphonic acid solution having a temperature of 20 ° C. or more and 70 ° C. or less after the anodizing treatment. The temperature is preferably 20 ° C. or higher and 70 ° C. or lower, and more preferably 30 ° C. or higher and 65 ° C. or lower. If it is less than 20 ° C., it may become dirty and recovery may be worsened. On the other hand, if it is higher than 70 ° C., the printing durability may be deteriorated. The concentration of the polyvinylphosphonic acid solution is not particularly limited, but is preferably 0.01% or more and 35% or less, and more preferably 0.1% or more and 5% or less.

  Examples of the plastic film used as the support include polyethylene terephthalate, polyethylene naphthalate, polyimide, polyamide, polycarbonate, polysulfone, polyphenylene oxide, and cellulose esters.

  In the present invention, among these plastic films, polyester films such as polyethylene terephthalate (hereinafter sometimes abbreviated as PET) and polyethylene naphthalate (hereinafter sometimes abbreviated as PEN) are preferably used as the base material. The

  Furthermore, it is preferable to use a support obtained by the method described in JP-A No. 10-10676 and having a thermal dimensional change rate of from 0.001% to 0.04% at 120 ° C. for 30 seconds.

  A preferable polyester film is an unstretched polyester film, a uniaxially stretched polyester film, or a biaxially stretched polyester film.

  Of these, a longitudinally stretched polyester film uniaxially stretched in the film extrusion direction (longitudinal direction) is particularly preferred.

(Applying undercoat layer to support)
In the polyester film support, easy adhesion treatment and undercoat layer coating can be performed in order to give various functions.

  Examples of the easy adhesion treatment include corona discharge treatment, flame treatment, plasma treatment, and ultraviolet irradiation treatment.

  As the undercoat layer, a layer containing gelatin or latex is preferably provided on the polyester film support. Among them, the antistatic undercoat layer described in paragraph Nos. 0044 to 0116 of JP-A-7-191433 is preferably used. Further, a conductive layer such as a conductive polymer-containing layer described in paragraph Nos. 0031 to 0073 of JP-A-7-20596 or a metal oxide-containing layer described in paragraph Nos. 0074 to 0081 of JP-A-7-20596 is provided. It is preferable. The conductive layer may be coated on either side as long as it is on the polyester film support, but it is preferably coated on the opposite side of the image forming functional layer with respect to the support. When this conductive layer is provided, the chargeability is improved, the adhesion of dust and the like is reduced, and white spots failure during printing is greatly reduced.

(Hydrophilic layer)
In the present invention, when the above plastic film is used as a substrate, a hydrophilic layer is provided on the substrate to form a substrate having a hydrophilic surface.

  In this case, the hydrophilic layer preferably has a porous structure.

  In order to form a hydrophilic layer having a porous structure, the following materials for forming a hydrophilic matrix are preferably used.

  As a material for forming the hydrophilic matrix, a metal oxide is preferable.

(Metal oxide)
The metal oxide preferably contains fine metal oxide particles, and examples thereof include colloidal silica, alumina sol, titania sol, and other metal oxide sols. The form of the metal oxide fine particles may be spherical, needle-like, feather-like or any other form. The average particle diameter is preferably in the range of 3 to 100 nm, and several kinds of metal oxides having different average particle diameters are used. Fine particles can be used in combination. The surface of the particles may be surface treated.

  The metal oxide fine particles can be used as a binder by utilizing the film forming property. The decrease in hydrophilicity is less than when an organic binder is used, and it is suitable for use in a hydrophilic layer.

(Colloidal silica)
Among these, colloidal silica can be particularly preferably used. Colloidal silica has the advantage of high film-forming properties even under relatively low temperature drying conditions, and can provide good strength. The colloidal silica preferably includes necklace-like colloidal silica, which will be described later, and fine particle colloidal silica having an average particle size of 20 nm or less, and the colloidal silica preferably exhibits alkalinity as a colloidal solution.

  Necklace-shaped colloidal silica is a general term for an aqueous dispersion of spherical silica whose primary particle diameter is of the order of nm, and spherical colloidal silica having a primary particle diameter of 10 to 50 nm bonded to a length of 50 to 400 nm. It means colloidal silica in the form of “pearl necklace”.

  The pearl necklace shape (that is, a pearl necklace shape) means that the image of the state in which the silica particles of colloidal silica are connected and linked has a shape like a pearl necklace.

  In the present invention, porous metal oxide particles having a particle size of less than 1 μm can be contained as a porous material having a hydrophilic layer matrix structure.

(Porous metal oxide particles)
As the porous metal oxide particles, the following porous silica, porous aluminosilicate particles, or zeolite particles can be preferably used.

(Porous silica, porous silica, porous aluminosilicate particles)
The porous silica particles are generally produced by a wet method or a dry method. In the wet method, the gel obtained by neutralizing the aqueous silicate solution can be obtained by drying and pulverizing, or by pulverizing the precipitate deposited by neutralization. In the dry method, silicon tetrachloride is burned together with hydrogen and oxygen to obtain silica. These particles can be controlled in their porosity and particle size by adjusting the production conditions. As the porous silica particles, those obtained from a wet gel are particularly preferable.

  The porous aluminosilicate particles are produced, for example, by the method described in JP-A-10-71764. That is, amorphous composite particles synthesized by hydrolysis using aluminum alkoxide and silicon alkoxide as main components. The ratio of alumina to silica in the particles can be synthesized in the range of 1: 4 to 4: 1. In addition, those produced as composite particles of three or more components by adding an alkoxide of another metal during production can also be used in the present invention. These composite particles can also control the porosity and particle size by adjusting the production conditions.

  The porosity of the particles is preferably 0.5 ml / g or more in terms of pore volume, more preferably 0.8 ml / g or more, and further preferably 1.0 to 2.5 ml / g. preferable. The pore volume is closely related to the water retention of the coating film. The larger the pore volume, the better the water retention, the less likely to get dirty during printing, and the greater the water volume latitude, but more than 2.5 ml / g When it becomes large, the particles themselves become very brittle, so that the durability of the coating film is lowered. Conversely, if the pore volume is less than 0.5 ml / g, the printing performance may be slightly insufficient.

(Measurement method of pore volume)
Here, the pore volume is measured by using Autosorb-1 (manufactured by Cantachrome) and assuming that the voids of the powder are filled with nitrogen by nitrogen adsorption measurement using a constant volume method. Thus, the relative pressure is calculated from the nitrogen adsorption amount at 0.998.

(Zeolite particles)
Zeolite is a crystalline aluminosilicate, and is a porous body having regular three-dimensional network voids having a pore diameter of 0.3 nm to 1 nm.

  Further, the hydrophilic layer matrix structure constituting the hydrophilic layer can contain layered clay mineral particles. Examples of the layered mineral particles include kaolinite, halloysite, talc, smectite (montmorillonite, beidellite, hectorite, sabonite, etc.), clay minerals such as vermiculite, mica (mica), chlorite, hydrotalcite, layered polysilicic acid. Examples thereof include salts (kanemite, macatite, ialite, magadiite, kenyaite, etc.). In particular, the higher the charge density of the unit layer (unit layer), the higher the polarity and the higher the hydrophilicity. The charge density is preferably 0.25 or more, more preferably 0.6 or more. Examples of the layered mineral having such a charge density include smectite (charge density 0.25 to 0.6; negative charge), vermiculite (charge density 0.6 to 0.9; negative charge) and the like. In particular, synthetic fluoromica is preferable because it can be obtained with stable quality such as particle size. Further, among the synthetic fluorine mica, those that are swellable are preferable, and those that are free swell are more preferable.

  Also used are intercalation compounds of the above-mentioned layered minerals (pillar crystals, etc.), those subjected to ion exchange treatment, and those subjected to surface treatment (silane coupling treatment, compounding treatment with organic binder, etc.) can do.

  As the size of the flat lamellar mineral particles, the average particle diameter (maximum length of the particles) is less than 1 μm in the state of being contained in the layer (including the case where the swelling process and the dispersion peeling process have been performed). The aspect ratio is preferably 50 or more. When the particle size is in the above range, the continuity and flexibility in the planar direction, which are the characteristics of the thin layered particles, are imparted to the coating film, and it is difficult for cracks to occur, and a tough coating film can be obtained in a dry state. Moreover, in the coating liquid containing many particulate matters, sedimentation of particulate matter can be suppressed by the thickening effect of the layered clay mineral. When the particle diameter is larger than the above range, the coating film may be non-uniform, and the strength may be locally reduced. On the other hand, when the aspect ratio is not more than the above range, the number of tabular grains with respect to the addition amount is reduced, the viscosity is insufficient, and the effect of suppressing sedimentation of the particulate matter is reduced.

  The content of the layered mineral particles is preferably 0.1 to 30% by mass, and more preferably 1 to 10% by mass based on the entire layer. In particular, swellable synthetic fluorinated mica and smectite are preferable because they are effective even when added in a small amount. The layered mineral particles may be added as a powder to the coating solution, but in order to obtain a good degree of dispersion even with a simple preparation method (no need for a dispersion step such as media dispersion), the layered mineral particles are used alone. It is preferable to prepare the gel swollen in water and add it to the coating solution.

A silicate aqueous solution can also be used as the other additive material in the hydrophilic layer matrix constituting the hydrophilic layer. Alkali metal silicates such as silicate Na, silicate K, and silicate Li are preferred, and the SiO ₂ / M ₂ O ratio is in a range where the pH of the entire coating solution does not exceed 13 when silicate is added. It is preferable to select such that the inorganic particles are not dissolved.

  Further, an inorganic polymer or an organic-inorganic hybrid polymer by a so-called sol-gel method using a metal alkoxide can also be used. The formation of an inorganic polymer or an organic-inorganic hybrid polymer by the sol-gel method is described in, for example, “Application of the sol-gel method” (Sakuo Sakuo / Agne Jofusha) or is described in this document. Known methods described in the cited documents can be used.

  In the present invention, a water-soluble resin may be contained. Examples of water-soluble resins include polysaccharides, polyethylene oxide, polypropylene oxide, polyvinyl alcohol, polyethylene glycol (PEG), polyvinyl ether, styrene-butadiene copolymer, and conjugated diene polymer latex of methyl methacrylate-butadiene copolymer. Examples thereof include resins such as acrylic polymer latex, vinyl polymer latex, polyacrylamide, and polyvinylpyrrolidone. As the water-soluble resin used in the present invention, it is preferable to use a polysaccharide.

  As polysaccharides, starches, celluloses, polyuronic acids, pullulans and the like can be used, but cellulose derivatives such as methyl cellulose salts, carboxymethyl cellulose salts, hydroxyethyl cellulose salts are particularly preferable, and sodium salts and ammonium salts of carboxymethyl cellulose are preferable. More preferred. This is because an effect of forming the surface shape of the hydrophilic layer in a preferable state can be obtained by including the polysaccharide in the hydrophilic layer.

  The surface of the hydrophilic layer preferably has a concavo-convex structure with a pitch of 0.1 to 20 μm like the aluminum grain of the PS plate, and this concavo-convex improves water retention and image area retention. Such a concavo-convex structure can be formed by adding an appropriate amount of a filler having an appropriate particle size to the hydrophilic layer matrix. However, the above-mentioned alkaline colloidal silica and the above-mentioned water-soluble solution are added to the hydrophilic layer coating solution. It is preferable that a structure having better printability can be obtained by forming a phase separation when the hydrophilic polysaccharide is applied and dried.

  The shape of the concavo-convex structure (such as pitch and surface roughness) is determined by the type and amount of alkaline colloidal silica, the type and amount of water-soluble polysaccharides, the type and amount of other additives, the solid content concentration of the coating solution, and the wetness. It is possible to appropriately control the film thickness, drying conditions, and the like.

  In the present invention, the water-soluble resin added to the hydrophilic matrix structure part is preferably present in a state where at least a part thereof is water-soluble and can be eluted in water. This is because even if it is a water-soluble material, when it is cross-linked by a cross-linking agent or the like and becomes insoluble in water, its hydrophilicity is lowered and printability may be deteriorated. Further, it may further contain a cationic resin. Examples of the cationic resin include polyalkylene polyamines such as polyethylene amine and polypropylene polyamine or derivatives thereof, tertiary amino groups and quaternary ammonium groups. Examples thereof include acrylic resin and diacrylamine. The cationic resin may be added in the form of fine particles, and examples thereof include a cationic microgel described in JP-A-6-161101.

  In addition, the coating liquid used for coating the hydrophilic layer can contain a water-soluble surfactant for the purpose of improving the coatability, and a Si-based or F-based surfactant can be added. Although it can be used, it is particularly preferable to use a surfactant containing Si element because there is no fear of causing printing stains. The content of the surfactant is preferably 0.01 to 3% by mass, more preferably 0.03 to 1% by mass of the entire hydrophilic layer (solid content as the coating solution).

  The hydrophilic layer can contain a phosphate. In the present invention, since the hydrophilic layer coating solution is preferably alkaline, the phosphate is preferably added as trisodium phosphate or disodium hydrogen phosphate. By adding phosphate, the effect of improving the mesh opening at the time of printing can be obtained. The addition amount of phosphate is preferably 0.1 to 5% by mass, and more preferably 0.5 to 2% by mass as an effective amount excluding hydrate.

(Application)
The prepared photosensitive composition (coating solution for photopolymerizable photosensitive layer) can be coated on a support by a conventionally known method and dried to prepare a photosensitive lithographic printing plate material. Examples of coating methods for the coating liquid include air doctor coater method, blade coater method, wire bar method, knife coater method, dip coater method, reverse roll coater method, gravure coater method, cast coating method, curtain coater method and extrusion coater method. I can list them.

  If the drying temperature of the photosensitive layer is low, sufficient printing durability cannot be obtained. If the drying temperature is too high, not only marangoni is produced but also fogging of non-image areas occurs. The preferable drying temperature range is preferably 60 to 160 ° C., more preferably 80 to 140 ° C., and particularly preferably 90 to 120 ° C.

(Image forming method)
As a light source for forming an image on the photosensitive lithographic printing plate material according to the present invention, it is preferable to use a laser beam having an emission wavelength of 350 to 450 nm.

  As a light source for exposing the photosensitive lithographic printing plate material of the present invention, for example, a He—Cd laser (441 nm), a combination of Cr: LiSAF and SHG crystal (430 nm) as a solid laser, KNbO 3 as a semiconductor laser system, a ring A resonator (430 nm), AlGaInN (350 nm to 450 nm), an AlGaInN semiconductor laser (commercially available InGaN semiconductor laser 400 to 410 nm) and the like can be mentioned.

  Laser exposure is suitable for direct writing without using a mask material because light exposure can be performed in the form of a beam according to image data.

  When a laser is used as a light source, it is easy to reduce the exposure area to a very small size, and high-resolution image formation is possible.

  Laser scanning methods include cylindrical outer surface scanning, cylindrical inner surface scanning, and planar scanning. In the cylindrical outer surface scanning, laser exposure is performed while rotating a drum around which the planographic printing plate material is wound, and the rotation of the drum is the main scanning, and the movement of the laser light is the sub scanning. In cylindrical inner surface scanning, a lithographic printing plate material is fixed to the inner surface of a drum, a laser beam is irradiated from the inner side, and part or all of the optical system is rotated to perform main scanning in the circumferential direction. Sub scanning is performed in the axial direction by linearly moving a part or all of the part in parallel with the axis of the drum. In plane scanning, a laser beam main scan is performed by combining a polygon mirror, a galvanometer mirror, and an fθ lens, and a sub-scan is performed by moving a recording medium. Cylindrical outer surface scanning and cylindrical inner surface scanning are easier to increase the accuracy of the optical system and are suitable for high-density recording.

In the present invention, image recording is preferably performed with a plate surface energy (energy on the plate material) of 10 mJ / cm ² or more, and the upper limit is 500 mJ / cm ² . More preferably, it is 10-300 mJ / cm < ² >. For this energy measurement, for example, a laser power meter PDGDO-3W manufactured by OphirOptics can be used.

(Developer)
The exposed portion of the imaged photosensitive layer is cured. By developing this with an alkaline developer, the unexposed area is removed and a printing plate is produced. As such a developer, a conventionally known alkaline aqueous solution can be used. For example, sodium silicate, potassium, ammonium; dibasic sodium phosphate, potassium, ammonium; sodium bicarbonate, potassium, ammonium; sodium carbonate, potassium, ammonium; sodium bicarbonate, potassium, ammonium An alkali developer using an inorganic alkaline agent such as sodium borate, potassium, ammonium; sodium hydroxide, potassium, ammonium and lithium;

  Also, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, mono-i-propylamine, di-i-propylamine, tri-i-propylamine, butylamine, monoethanolamine, diethanolamine, triethanolamine, Organic alkali agents such as mono-i-propanolamine, di-i-propanolamine, ethyleneimine, ethylenediamine, and pyridine can also be used.

  These alkali agents are used alone or in combination of two or more. In addition, an organic solvent such as an anionic surfactant, an amphoteric surfactant or alcohol can be added to the developer as necessary.

(Automatic processor)
It is advantageous to use an automatic processor for developing the photosensitive lithographic printing plate material. The automatic developing machine is preferably provided with a mechanism for automatically replenishing the required amount of the developing replenisher to the developing bath, and preferably provided with a mechanism for discharging the developer exceeding a certain amount, preferably the developing bath. Is provided with a mechanism for automatically replenishing the required amount of water, preferably a mechanism for detecting plate passing is provided, preferably a mechanism for estimating the processing area of the plate based on detection of plate passing. Preferably, a mechanism for controlling the replenishment amount and / or replenishment timing of the replenisher and / or water to be replenished based on the detection of the printing plate and / or the estimation of the processing area is provided. Is provided with a mechanism for controlling the temperature of the developer, preferably a mechanism for detecting the pH and / or conductivity of the developer, preferably based on the pH and / or conductivity of the developer. Trying to replenish The amount of replenisher supplied and / or water and / or mechanism for controlling the replenishment timing is given that. The developer concentrate preferably has a function of once diluting and stirring with water. When there is a rinsing step after the development step, the rinsing water after use can be used as dilution water for the concentrate of the development concentrate.

  The automatic processor may have a pretreatment unit that immerses the plate in the pretreatment liquid before the development step. The pretreatment unit is preferably provided with a mechanism for spraying the pretreatment liquid on the plate surface, and preferably provided with a mechanism for controlling the temperature of the pretreatment liquid to an arbitrary temperature of 25 to 55 ° C. Is provided with a mechanism for rubbing the plate surface with a roller-like brush. Water or the like is used as the pretreatment liquid.

(Post-processing)
A lithographic printing plate developed with a developer having such a composition is subjected to a post-treatment with a washing water, a rinse solution containing a surfactant, a finisher or a protective gum solution mainly composed of gum arabic or starch derivatives. The These treatments can be used in various combinations. For example, the treatment with a rinsing solution containing development->washing-> surfactant or the development->washing-> finisher solution is preferable because of less fatigue of the rinse solution and the finisher solution. Furthermore, a countercurrent multistage process using a rinse liquid or a finisher liquid is also a preferred embodiment.

  These post-processing are generally performed using an automatic developing machine including a developing unit and a post-processing unit. As the post-treatment liquid, a method of spraying from a spray nozzle or a method of immersing and conveying in a treatment tank filled with the treatment liquid is used. A method is also known in which a fixed amount of a small amount of washing water is supplied to the plate surface after the development, and the waste solution is reused as dilution water for the developing solution stock solution. In such automatic processing, processing can be performed while each replenisher is replenished with each replenisher according to the processing amount, operating time, and the like. In addition, a so-called disposable treatment method in which treatment is performed with a substantially unused post-treatment liquid is also applicable. The lithographic printing plate obtained by such processing is loaded on an offset printing machine and used for printing a large number of sheets.

  (Gum solution)

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, the aspect of this invention is not limited to this. In the examples, “parts” represents “parts by mass” unless otherwise specified.

Example 1
<< Polymer binder: Synthesis of acrylic copolymer 1 >>
A three-necked flask under a nitrogen stream is charged with 30 parts of methacrylic acid, 50 parts of methyl methacrylate, 20 parts of ethyl methacrylate, 500 parts of isopropyl alcohol and 3 parts of α, α'-azobisisobutyronitrile. The mixture was reacted for 6 hours in an oil bath at 0 ° C. Then, after refluxing at the boiling point of isopropyl alcohol for 1 hour, 3 parts of triethylammonium chloride and 25 parts of glycidyl methacrylate were added and reacted for 3 hours to obtain an acrylic copolymer 1. The weight average molecular weight measured using GPC was about 35,000, and the glass transition temperature (Tg) measured using DSC (differential thermal analysis) was about 85 ° C.

[Production of support]
Using a JIS A 1050 aluminum plate having a thickness of 0.30 mm and a width of 1030 mm, the treatment was continuously performed as follows.

(A) The aluminum plate was etched by spraying at a caustic soda concentration of 2.6 mass%, an aluminum ion concentration of 6.5 mass%, and a temperature of 70 ° C. to dissolve the aluminum plate by 0.3 g / m ² . Thereafter, washing with water was performed by spraying.

  (B) A desmut treatment was performed by spraying with a 1% by mass aqueous solution of nitric acid having a temperature of 30 ° C. (including 0.5% by mass of aluminum ions), and then washed with water by spraying.

(C) An electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time contains 1.1% by mass of hydrochloric acid, 0.5% by mass of aluminum ions, and 0.5% by mass of acetic acid. The temperature was 21 ° C. The AC power source was subjected to electrochemical surface roughening treatment using a sine wave alternating current having a time TP of 2 msec until the current value reached a peak from zero, using a carbon electrode as a counter electrode. The current density was an effective value of 50 A / dm ² and the energization amount was 900 C / dm ² . Then, water washing by spraying was performed.

  (D) A desmut treatment was performed for 10 seconds with a phosphoric acid concentration 20 mass% aqueous solution (containing 0.5 mass% of aluminum ions) at a temperature of 60 ° C., followed by washing with water by spraying.

  (E) An anodizing apparatus of an existing two-stage feed electrolytic treatment method (first and second electrolysis unit length 6 m, first feed unit length 3 m, second feed unit length 3 m, first and second feed electrode lengths 2.4 m each ) Was used to perform anodizing at a sulfuric acid concentration of 170 g / liter (containing 0.5 mass% of aluminum ions) at a temperature of 38 ° C. Thereafter, washing with water was performed by spraying.

  At this time, in the anodizing device, the current from the power source flows to the first power supply electrode provided in the first power supply unit, flows to the plate-like aluminum via the electrolytic solution, An oxide film is formed on the surface, passes through the electrolytic electrode provided in the first power feeding portion, and returns to the power source.

On the other hand, the current from the power source flows to the second power feeding electrode provided in the second power feeding portion, similarly flows to the plate-like aluminum via the electrolytic solution, and an oxide film is formed on the surface of the plate-like aluminum by the second electrolysis portion. Although the amount of electricity fed from the power source to the first feeding unit and the amount of electricity fed from the power source to the second feeding unit are the same, the feeding current density on the oxide film surface in the second feeding unit is about It was 25 A / dm ² . In the 2nd electric power feeding part, it came to feed from the oxide film surface of 1.35 g / m < ² >. The final oxide film amount was 2.7 g / m ² . Furthermore, after spray water washing, it was immersed in 0.4 mass% polyvinylphosphonic acid solution for 30 seconds, and was hydrophilized. The temperature was 85 ° C. Thereafter, it was washed with spray water and dried with an infrared heater.
At this time, the center line average roughness (Ra) of the surface was 0.65 μm.

(Preparation of photosensitive lithographic printing plate material)
On the above support, a photopolymerizable photosensitive layer coating solution having the following composition was coated with a wire bar so that the dried solution was 1.5 g / m ² and dried at 95 ° C. for 1.5 minutes. Got.

Further, on the photopolymerization photosensitive layer coating sample, an oxygen barrier layer coating solution having the following composition was coated with a wire bar so as to be 1.8 g / m ² at the time of drying, and dried at 75 ° C. for 1.5 minutes. Photosensitive lithographic printing plate samples 1 to 22 having an oxygen blocking layer on the layer were prepared.

(Photopolymerizable photosensitive layer coating solution 1)
Ethylene double bond-containing monomer (1-17 (below)) 27.0 parts Ethylene double bond-containing monomer (NK ester 4G: Shin-Nakamura Chemical Co., Ltd.)
14.0 parts Spectral sensitizing dye (dye-1 (below)) 3 parts Ionic liquid (described in Table 1) 4.0 parts Photopolymerization initiator (described in Table 1) 4.0 parts Acrylic copolymer 1 45.0 parts Phthalocyanine pigment (MHI454: manufactured by Gokoku Color Co., Ltd.) 6.0 parts 2-t-butyl-6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate ( Sumilizer GS: manufactured by Sumitomo 3M Co., Ltd.) 0.5 part Fluorosurfactant (FC-4430; manufactured by Sumitomo 3M Co.) 0.5 part Methyl ethyl ketone 80 parts Cyclohexanone 820 parts

(Oxygen barrier coating liquid)
Polyvinyl alcohol (GL-05: manufactured by Nippon Synthetic Chemical Co., Ltd.) 79 parts Polyvinylpyrrolidone (PVP K-30: manufactured by ASP Japan) 10 parts Polyethyleneimine (Lupazole WF: manufactured by BASF) 5 parts Cation-modified polyvinyl Alcohol (Kuraray C polymer: Kuraray Co., Ltd.) 5 parts Surfactant (Surfinol 465: Nissin Chemical Industry Co., Ltd.) 0.5 parts Water 900 parts <Developer composition>
A Potassium silicate 8.0 parts New Coal B-13SN (manufactured by Nippon Emulsifier Co., Ltd.) 2.0 parts Pronon # 204 (Nippon Yushi Co., Ltd.) 1.0 part Caustic potash pH = 12.9 Production)
Bleached kraft pulp was beaten and a synthetic sizing agent was added in an amount of 0.3% by mass to a paper stock diluted to a concentration of 4%, and aluminum sulfate was added until the pH reached 5.5. This paper stock was coated with 3.0% by weight of a paper strength agent mainly composed of starch to make a paper, and the density was 0.8 g / cm ³ , the smoothness was 90 seconds, and the moisture was 5.0% by weight, 40 g / m ^2. A photosensitive printing plate material slip sheet was prepared.

(Interleaving paper peeling test using an automatic interleaving machine)
The photosensitive lithographic printing plate material prepared above and the slip sheet were brought into close contact with each other by corona discharge of -10 kV. Next, the sheet is cut into a sheet of 1030 mm × 800 mm, and the slip sheet is sucked with a suction cup with an automatic slip sheet peeling device in an environment of 25 ° C. and a relative humidity of 50% RH, and it is judged visually whether only the slip sheet can be peeled off. did.

(Evaluation of stain recovery)
Using a plate setter (manufactured by ECRM) equipped with a light source of 405 nm under the condition that the exposure energy on the printing plate is 50 μJ / cm ² , exposure is performed at 2400 dpi (dpi represents the number of dots per 2.54 cm). Went. After exposure, a preheating part for heat-treating the photosensitive lithographic printing plate at 105 ° C. for 10 seconds, a pre-water washing part for removing the oxygen blocking layer before development, a development part filled with a developer of the above composition, and a developer adhered to the plate surface Developed with a CTP automatic developing machine (PHW23-V: manufactured by Technigraph) equipped with a washing section for removing water, and a gum solution for protecting the image area (GW-3: manufactured by Mitsubishi Chemical Corporation) Processing was carried out to obtain a lithographic printing plate. Development temperature / time is 28 ° C. for 30 seconds.

  The produced lithographic printing plate was coated with a printing press (DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.), printing ink (Toyo King High Echo M Red manufactured by Toyo Ink Co., Ltd.) and dampening water (Tokyo Ink Co., Ltd.). ) H liquid SG-51 concentration 1.5%).

  Wipe with a cleaner after 1000 sheets were continuously printed, printing resumed after 1 hour, and the number of non-image areas free of background stain was measured and used as an index for stain recovery.

(Evaluation of printing durability)
Using a plate setter (manufactured by ECRM) equipped with a light source of 405 nm under the condition that the exposure energy on the printing plate is 50 μJ / cm ² , exposure is performed at 2400 dpi (dpi represents the number of dots per 2.54 cm). Went. After exposure, a preheating part for heat-treating the photosensitive lithographic printing plate at 105 ° C. for 10 seconds, a pre-water washing part for removing the oxygen blocking layer before development, a development part filled with a developer of the above composition, and a developer adhered to the plate surface Developed with a CTP automatic developing machine (PHW23-V: manufactured by Technigraph) equipped with a washing section for removing water, and a gum solution for protecting the image area (GW-3: manufactured by Mitsubishi Chemical Corporation) Processing was carried out to obtain a lithographic printing plate.

  The prepared lithographic printing plate was coated with a printing press (DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.), printing ink (Toyo King High Echo M Red manufactured by Toyo Ink Co., Ltd.) and dampening water (Tokyo Ink Co., Ltd.). ) Manufactured H liquid SG-51 density 1.5%), and after continuous printing 600 sheets, wipe the plate surface with a cleaner to reduce the number of prints where the highlight part is thin and the shadow part is entangled. It was used as an index of printing force.

  One printing durability refers to the operation of wiping with a cleaner after 600 continuous printings. The more it is, the better. The cleaner used was an Ultra Plate Cleaner (Distributor: Dainichi Seika Co., Ltd.).

(Evaluation of linearity)
A halftone dot image of 175 lines was drawn at an increment of 1% from 0% to 100% at 2400 dpi (dpi represents the number of dots per 2.54 cm). When exposure was performed with an exposure energy that reproduced 3%, a halftone dot output image that should be 80% was taken with a 1000 × optical microscope, and the area% of the image area calculated was defined as linearity. The closer to 80%, the better.

  The results are shown in Table 1. From Table 1, it can be seen that the photosensitive lithographic printing plate material of the present invention is excellent in printing durability, linearity and stain recovery, and excellent in interleaving paper peelability.

Fe-1: (η6-cumene) (η5-cyclopentadienyl) iron (2) hexafluorophosphate HABI-1: bisimidazole: 2,2′-bis (o-chlorophenyl) -4, 4 ′, 5, 5'-tetraphenylbiimidazole

(Example 2)
<< Polymer binder: Synthesis of acrylic copolymer 1 >>
A three-necked flask under a nitrogen stream is charged with 30 parts of methacrylic acid, 50 parts of methyl methacrylate, 20 parts of ethyl methacrylate, 500 parts of isopropyl alcohol and 3 parts of α, α'-azobisisobutyronitrile. The mixture was reacted for 6 hours in an oil bath at 0 ° C. Then, after refluxing at the boiling point of isopropyl alcohol for 1 hour, 3 parts of triethylammonium chloride and 25 parts of glycidyl methacrylate were added and reacted for 3 hours to obtain an acrylic copolymer 1. The weight average molecular weight measured using GPC was about 35,000, and the glass transition temperature (Tg) measured using DSC (differential thermal analysis) was about 85 ° C.

[Production of support]
Using a JIS A 1050 aluminum plate having a thickness of 0.30 mm and a width of 1030 mm, the treatment was continuously performed as follows.

(A) The aluminum plate was etched by spraying at a caustic soda concentration of 2.6 mass%, an aluminum ion concentration of 6.5 mass%, and a temperature of 70 ° C. to dissolve the aluminum plate by 0.3 g / m ² . Thereafter, washing with water was performed by spraying.

  (B) A desmut treatment was performed by spraying with a 1% by mass aqueous solution of nitric acid having a temperature of 30 ° C. (including 0.5% by mass of aluminum ions), and then washed with water by spraying.

(C) An electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time contains 1.1% by mass of hydrochloric acid, 0.5% by mass of aluminum ions, and 0.5% by mass of acetic acid. The temperature was 21 ° C. The AC power source was subjected to electrochemical surface roughening treatment using a sine wave alternating current having a time TP of 2 msec until the current value reached a peak from zero, using a carbon electrode as a counter electrode. The current density was an effective value of 50 A / dm ² and the energization amount was 900 C / dm ² . Then, water washing by spraying was performed.

  (D) A desmut treatment was performed for 10 seconds with a phosphoric acid concentration 20 mass% aqueous solution (containing 0.5 mass% of aluminum ions) at a temperature of 60 ° C., followed by washing with water by spraying.

  (E) An anodizing apparatus of an existing two-stage feed electrolytic treatment method (first and second electrolysis unit length 6 m, first feed unit length 3 m, second feed unit length 3 m, first and second feed electrode lengths 2.4 m each ) Was used to perform anodizing at a sulfuric acid concentration of 170 g / liter (containing 0.5 mass% of aluminum ions) at a temperature of 38 ° C. Thereafter, washing with water was performed by spraying.

  At this time, in the anodizing device, the current from the power source flows to the first power supply electrode provided in the first power supply unit, flows to the plate-like aluminum via the electrolytic solution, An oxide film is formed on the surface, passes through the electrolytic electrode provided in the first power feeding portion, and returns to the power source.

On the other hand, the current from the power source flows to the second power feeding electrode provided in the second power feeding portion, similarly flows to the plate-like aluminum via the electrolytic solution, and an oxide film is formed on the surface of the plate-like aluminum by the second electrolysis portion. Although the amount of electricity fed from the power source to the first feeding unit and the amount of electricity fed from the power source to the second feeding unit are the same, the feeding current density on the oxide film surface in the second feeding unit is about It was 25 A / dm ² . In the 2nd electric power feeding part, it came to feed from the oxide film surface of 1.35 g / m < ² >. The final oxide film amount was 2.7 g / m ² . Furthermore, after spray water washing, it was immersed in 0.4 mass% polyvinylphosphonic acid solution for 30 seconds, and was hydrophilized. The temperature was 85 ° C. Thereafter, it was washed with spray water and dried with an infrared heater.
At this time, the center line average roughness (Ra) of the surface was 0.65 μm.

(Preparation of photosensitive lithographic printing plate material)
On the above support, a photopolymerizable photosensitive layer coating solution having the following composition was coated with a wire bar so that the dried solution was 1.5 g / m ² and dried at 95 ° C. for 1.5 minutes. Got.

Further, on the photopolymerization photosensitive layer coating sample, an oxygen barrier layer coating solution having the following composition was coated with a wire bar so as to be 1.8 g / m ² at the time of drying, and dried at 75 ° C. for 1.5 minutes. Photosensitive lithographic printing plate samples 101 to 136 having an oxygen blocking layer on the layer were prepared.

(Photopolymerizable photosensitive layer coating solution 1)
Ethylene double bond-containing monomer (1-17 (above)) 27.0 parts Ethylene double bond-containing monomer (NK ester 4G: Shin-Nakamura Chemical Co., Ltd.)
14.0 parts Spectral sensitizing dye (dye-1 (above)) 3 parts Ionic liquid (described in Table 1) 4.0 parts Photopolymerization initiator (described in Table 1) 4.0 parts Acrylic copolymer 1 45.0 parts Phthalocyanine pigment (MHI454: manufactured by Gokoku Color Co., Ltd.) 6.0 parts 2-t-butyl-6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate ( Sumilyzer GS: manufactured by Sumitomo 3M Co., Ltd.) 0.5 parts Surfactant (EDAPLAN LA411) 0.5 parts Methyl ethyl ketone 80 parts Cyclohexanone 820 parts (oxygen barrier layer coating solution)
Polyvinyl alcohol (GL-05: manufactured by Nippon Synthetic Chemical Co., Ltd.) 79 parts Polyvinylpyrrolidone (PVP K-30: manufactured by ASP Japan) 10 parts Polyethyleneimine (Lupazole WF: manufactured by BASF) 5 parts Cation-modified polyvinyl Alcohol (Kuraray C polymer: Kuraray Co., Ltd.) 5 parts Surfactant (Surfinol 465: Nissin Chemical Industry Co., Ltd.) 0.5 parts Water 900 parts <Developer composition>
A Potassium silicate 8.0 parts New Coal B-13SN (Nippon Emulsifier Co., Ltd.) 2.0 parts Pronon # 204 (Nippon Yushi Co., Ltd.) 1.0 part Caustic potash pH = 12.9 Evaluation similar to Example 1 was performed using the characteristic lithographic printing plate material.

  The results are shown in Table 3. From Table 3, it can be seen that the photosensitive lithographic printing plate material of the present invention is excellent in printing durability, linearity, stain recovery, and excellent in slipping property.

Claims (11)

(A) A photosensitive composition containing an ethylenic double bond-containing compound, (B) a photopolymerization initiator, and (C) a polymer binder, which is capable of addition polymerization, wherein the photosensitive composition is further an ionic liquid A photosensitive composition comprising: The photosensitive composition according to claim 1, wherein the ionic liquid is a compound represented by the following general formula (1).
General formula (1): K ⁺ A ⁻
[Wherein K ⁺ represents the following general formula (2)

(Wherein, R ¹ and R ² are the same or different and each represents an alkyl group having 1 to 10 carbon atoms or a hydrogen atom, provided that R ¹ and R ² are not hydrogen atoms at the same time) Alkyl imidazolium cation or the following general formula (3)

(Wherein, R ³ is the same or different and represents an alkyl group having 1 to 10 carbon atoms or a hydrogen atom). A ⁻ represents the following general formula (4)

(In the formula, R ⁴ is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group, a tetrazolyl group, or a sulfonic acid. A tetrazole compound anion represented by the following general formula (5): each group represented by R ⁴ other than a hydrogen atom may have a substituent.

(Wherein R ⁵ and R ⁶ are the same or different and are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group, A group, a tetrazolyl group, or a sulfonic acid group, and each group represented by R ⁵ and R ⁶ other than a hydrogen atom may have a substituent. Formula (6)

(Wherein R ⁷ and R ⁸ are the same or different and are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a hydroxyl group, a mercapto group, an amino group, a carboxyl group) A group, a tetrazolyl group, or a sulfonic acid group, and each group represented by R ⁷ and R ⁸ other than a hydrogen atom may have a substituent. ] The photosensitive composition according to claim 1, wherein the cation constituting the ionic liquid is an ammonium cation. The photosensitive composition according to claim 3, wherein the ammonium cation is an ion represented by the following general formula (7).

[Wherein, R ^{1 to} R ⁴ are the same or different alkyl groups having 1 to 5 carbon atoms, or an alkoxyalkyl group represented by R′—O— (CH ₂ ) n — (R ′ is a methyl group or Represents an ethyl group, and n is an integer of 1 to 4.), and any two groups of R ¹ , R ² , R ³ and R ⁴ may form a ring. However, at least one of R ^{1 to} R ⁴ is the alkoxyalkyl group. ] The photosensitive composition according to claim 4, wherein the ion represented by the general formula (7) is an ion represented by the following general formula (8).

[Wherein R ^{1 to} R ³ represent the same or different alkyl group having 1 to 5 carbon atoms, and any two groups of R ¹ , R ² and R ³ may form a ring. I do not care.
R ′ represents a methyl group or an ethyl group. ] The photosensitive composition according to claim 4, wherein the ion represented by the general formula (8) is an ion represented by the following general formula (9).

[In the formula, Me represents a methyl group, and Et represents an ethyl group. ] The photosensitive composition according to any one of claims 3 to 6, wherein the anion constituting the ionic liquid is a fluorine atom-containing anion. The photosensitive composition according to any one of claims 1 to 7, wherein the photopolymerization initiator (B) contains a biimidazole compound, an iron arene complex compound, or a titanocene compound. The photosensitive composition according to any one of claims 1 to 8, wherein the photosensitive composition contains (D) a dye having an absorption maximum wavelength of 350 to 450 nm. A photosensitive lithographic printing plate material comprising a photosensitive layer comprising a photosensitive composition according to any one of claims 1 to 9 on a support. An image forming method for a lithographic printing plate material, wherein the photosensitive lithographic printing plate material according to claim 10 is subjected to image exposure using a laser beam having an emission wavelength in a range of 350 nm to 450 nm as a light source.