JP2006342334A - Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin and printed wiring board - Google Patents
Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin and printed wiring board Download PDFInfo
- Publication number
- JP2006342334A JP2006342334A JP2006107884A JP2006107884A JP2006342334A JP 2006342334 A JP2006342334 A JP 2006342334A JP 2006107884 A JP2006107884 A JP 2006107884A JP 2006107884 A JP2006107884 A JP 2006107884A JP 2006342334 A JP2006342334 A JP 2006342334A
- Authority
- JP
- Japan
- Prior art keywords
- component
- resin composition
- curable resin
- metal foil
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 83
- 239000000758 substrate Substances 0.000 title claims abstract description 58
- -1 prepreg Substances 0.000 title claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 title claims description 68
- 239000002184 metal Substances 0.000 title claims description 68
- 239000011888 foil Substances 0.000 title claims description 40
- 229920005989 resin Polymers 0.000 title claims description 36
- 239000011347 resin Substances 0.000 title claims description 36
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 30
- 239000003822 epoxy resin Substances 0.000 claims abstract description 28
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 23
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 20
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 17
- 239000005011 phenolic resin Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 21
- 239000000835 fiber Substances 0.000 claims description 18
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 18
- 239000007787 solid Substances 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 13
- 125000003700 epoxy group Chemical group 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 8
- 239000007822 coupling agent Substances 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 4
- 150000001356 alkyl thiols Chemical class 0.000 claims description 3
- 150000003573 thiols Chemical class 0.000 claims description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 238000013329 compounding Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 28
- 239000011889 copper foil Substances 0.000 description 21
- 239000002966 varnish Substances 0.000 description 20
- 238000002156 mixing Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 17
- 239000002585 base Substances 0.000 description 16
- 239000004744 fabric Substances 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- 229920001187 thermosetting polymer Polymers 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 238000009413 insulation Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical class SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 4
- VRVRGVPWCUEOGV-UHFFFAOYSA-N 2-aminothiophenol Chemical compound NC1=CC=CC=C1S VRVRGVPWCUEOGV-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- ZRKMQKLGEQPLNS-UHFFFAOYSA-N 1-Pentanethiol Chemical compound CCCCCS ZRKMQKLGEQPLNS-UHFFFAOYSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- FUWUEFKEXZQKKA-UHFFFAOYSA-N beta-thujaplicin Chemical compound CC(C)C=1C=CC=C(O)C(=O)C=1 FUWUEFKEXZQKKA-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- 239000007870 radical polymerization initiator Substances 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 230000002087 whitening effect Effects 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- BHAYFXKTLWGHHO-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.C=CN1CCCC1=O BHAYFXKTLWGHHO-UHFFFAOYSA-N 0.000 description 1
- GUQJTTJZPGRWIK-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.C=CN1CCCC1=O GUQJTTJZPGRWIK-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- UYVCRAVATMDGNZ-UHFFFAOYSA-N 2,4-diethyl-5-methyl-1h-imidazole Chemical compound CCC1=NC(CC)=C(C)N1 UYVCRAVATMDGNZ-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- DSCJETUEDFKYGN-UHFFFAOYSA-N 2-Methoxybenzenethiol Chemical compound COC1=CC=CC=C1S DSCJETUEDFKYGN-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- UCXTZCAIHKDSQQ-UHFFFAOYSA-N 2-hydroperoxy-2-methylpropane 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C(C)(C)(C1=CC=CC=C1)OOC(C)(C)C1=CC=CC=C1.C(C)(C)(C)OO UCXTZCAIHKDSQQ-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- AXBVSRMHOPMXBA-UHFFFAOYSA-N 4-nitrothiophenol Chemical compound [O-][N+](=O)C1=CC=C(S)C=C1 AXBVSRMHOPMXBA-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- COCLLEMEIJQBAG-UHFFFAOYSA-N 8-methylnonyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C(C)=C COCLLEMEIJQBAG-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 1
- TUFYVOCKVJOUIR-UHFFFAOYSA-N alpha-Thujaplicin Natural products CC(C)C=1C=CC=CC(=O)C=1O TUFYVOCKVJOUIR-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- VTXVGVNLYGSIAR-UHFFFAOYSA-N decane-1-thiol Chemical compound CCCCCCCCCCS VTXVGVNLYGSIAR-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- ZONYXWQDUYMKFB-UHFFFAOYSA-N flavanone Chemical compound O1C2=CC=CC=C2C(=O)CC1C1=CC=CC=C1 ZONYXWQDUYMKFB-UHFFFAOYSA-N 0.000 description 1
- 239000013305 flexible fiber Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- SEXOVMIIVBKGGM-UHFFFAOYSA-N naphthalene-1-thiol Chemical compound C1=CC=C2C(S)=CC=CC2=C1 SEXOVMIIVBKGGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- PFBLRDXPNUJYJM-UHFFFAOYSA-N tert-butyl 2-methylpropaneperoxoate Chemical compound CC(C)C(=O)OOC(C)(C)C PFBLRDXPNUJYJM-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229930007845 β-thujaplicin Natural products 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Images
Abstract
Description
本発明は、硬化性樹脂組成物、プリプレグ、基板、金属箔張積層板、樹脂付金属箔及びプリント配線板に関するものである。 The present invention relates to a curable resin composition, a prepreg, a substrate, a metal foil-clad laminate, a resin-coated metal foil, and a printed wiring board.
携帯電話に代表される電子機器の小型化・高性能化に伴い、その中に搭載されるプリント配線板にも薄型化や多層化を含めた高密度化が強く要求されている。プリント配線板を高密度化するためには、その基板材料として、基材となるガラスクロスにエポキシ樹脂やポリイミド樹脂等の熱硬化性樹脂を含浸させ半硬化したプリプレグが好適に採用される。このプリプレグは、その両主面に銅箔などの金属箔を配置して加熱及び加圧成形してなる金属箔張積層板の態様でも用いられる。 With the downsizing and high performance of electronic devices typified by mobile phones, printed wiring boards mounted therein are strongly required to have high density including thinning and multilayering. In order to increase the density of the printed wiring board, a prepreg that is semi-cured by impregnating a glass cloth serving as a base material with a thermosetting resin such as an epoxy resin or a polyimide resin is suitably employed as the substrate material. This prepreg is also used in an embodiment of a metal foil-clad laminate obtained by placing metal foils such as copper foils on both main surfaces and heating and pressing.
プリント配線板の高密度化は、基材となるガラスクロスの厚さをより薄くすること、例えば30μm以下の厚さにすること、で更に好適に成し遂げられるため、そのようなガラスクロスを備えたプリプレグが、昨今開発及び上市されている。これにより、プリント配線板の高密度化はますます進行しているものの、それに伴い、プリント配線板における十分な耐熱性、絶縁信頼性及び配線−基板間の接着性などを確保するのが困難になってきている。 Densification of the printed wiring board can be achieved more suitably by reducing the thickness of the glass cloth as a base material, for example, by making the thickness to 30 μm or less. Prepreg has been developed and marketed recently. As a result, although the density of printed wiring boards is increasing, it is difficult to ensure sufficient heat resistance, insulation reliability, and wiring-to-board adhesion. It has become to.
プリント配線板の作製方法の1つとして、絶縁性の基板の片面又は両面に金属箔を積層してなる金属箔張積層板の金属箔をパターン化する方法がある。通常、金属箔張積層板に用いられる金属箔は、基板との高い密着性を確保するために、基板との接着側の面を粗化されたものが採用される。その結果、基板の厚さは金属箔表面の凹凸の影響で局所的に薄くなる。ところが、上述のようにプリント配線板の基板材料となるプリプレグが薄膜化されて、基板全体の厚さが薄くなると、特に局所的に薄くなった部分における絶縁信頼性が低下することが明らかになった。したがって、金属箔の粗化をある程度抑えてプリント配線板の絶縁信頼性を高く維持すると同時に、配線−基板間の接着性を十分に高くする手法が要求されている。 As one method for producing a printed wiring board, there is a method of patterning a metal foil of a metal foil-clad laminate obtained by laminating a metal foil on one side or both sides of an insulating substrate. In general, the metal foil used for the metal foil-clad laminate has a roughened surface on the side bonded to the substrate in order to ensure high adhesion to the substrate. As a result, the thickness of the substrate is locally reduced due to the unevenness on the surface of the metal foil. However, as described above, when the prepreg, which is the substrate material of the printed wiring board, is thinned and the overall thickness of the substrate is reduced, it becomes clear that the insulation reliability particularly in the locally thinned portion is lowered. It was. Therefore, there is a demand for a technique for suppressing the roughening of the metal foil to some extent while maintaining high insulation reliability of the printed wiring board and at the same time sufficiently increasing the adhesion between the wiring and the substrate.
銅張積層板における銅箔−基材間の接着性の向上を意図した手段としては、例えば特許文献1に、銅箔の表面に水酸基を付与して、カップリング剤を介して銅箔及び基材を積層する手段が提案されている。 As a means intended to improve the adhesion between the copper foil and the substrate in the copper clad laminate, for example, in Patent Document 1, a hydroxyl group is imparted to the surface of the copper foil, and the copper foil and the substrate are coupled via a coupling agent. Means for laminating materials have been proposed.
ところで、薄いガラスクロス、例えば50μm以下のガラスクロス、を基材として用いたプリプレグは、従来の厚いガラスクロスを用いた場合と比較して、取り扱い時に折れや割れが生じやすい。これは基材であるガラスクロスの可とう性が高いことに起因する。プリプレグが折れたり割れたりすると、ガラスクロスと含浸させた樹脂との間の剥離が発生する。これらプリプレグの折れ及び割れ、並びにガラスクロスと樹脂との間の剥離は、プリプレグの欠陥となり、このプリプレグを用いた積層板の成形不良、及びプリント配線板の絶縁不良の原因となり得る。また、プリプレグの折れ及び割れに伴い、プリプレグの主面や端面からの樹脂粉の脱落も発生する。脱落した樹脂粉は、積層板を形成する際に異物として混入し得るため、好ましくない。 By the way, a prepreg using a thin glass cloth, for example, a glass cloth of 50 μm or less as a base material, is likely to be broken or cracked during handling as compared with the case of using a conventional thick glass cloth. This is due to the high flexibility of the glass cloth as the base material. When the prepreg is broken or cracked, peeling between the glass cloth and the impregnated resin occurs. The bending and cracking of these prepregs and the separation between the glass cloth and the resin become defects in the prepreg, which can cause defective molding of the laminated board using this prepreg and poor insulation of the printed wiring board. Further, with the prepreg being bent and cracked, the resin powder also falls off from the main surface and end surface of the prepreg. The dropped resin powder is not preferable because it can be mixed as a foreign substance when forming the laminated plate.
プリプレグの折れや割れの防止を意図して、例えば特許文献2には、ビニルエステル樹脂組成物をガラスクロスに含浸させた積層板が報告されている。
しかしながら、本発明者らが上記特許文献1、2に記載のものを始めとする従来の手法について詳細に検討を行ったところ、このような従来の手法では、配線又は金属箔−基板間の十分な接着性の確保、及びプリプレグの折れや割れの十分な防止の両方を同時に満足することが困難であると判明した。また、今後、プリント配線板を更に高密度化しようとした際に、従来の手法では、十分に優れた配線又は金属箔−基板間の接着性を確保することも、プリプレグの折れや割れを十分に抑制することも困難であることが明らかになった。 However, when the present inventors have studied in detail the conventional methods including those described in Patent Documents 1 and 2 described above, such a conventional method is not sufficient between the wiring or the metal foil and the substrate. It was proved difficult to satisfy both of ensuring sufficient adhesion and sufficiently preventing the prepreg from being broken or cracked at the same time. In the future, when trying to further increase the density of the printed wiring board, the conventional method is sufficient to ensure sufficiently good wiring or metal foil-substrate adhesion, and to prevent the prepreg from being folded or cracked. It became clear that it was difficult to suppress.
そこで、本発明は上記事情に鑑みてなされたものであり、十分に優れた配線−基板間の接着性と十分な耐熱性とを有するプリント配線板及び折れや割れを十分に抑制し得るプリプレグを形成可能な硬化性樹脂組成物、並びに、この硬化性樹脂組成物を用いたプリプレグ、基板、金属箔張積層板、樹脂付金属箔及びプリント配線板を提供することを目的とする。 Therefore, the present invention has been made in view of the above circumstances, a printed wiring board having sufficiently excellent wiring-to-substrate adhesion and sufficient heat resistance, and a prepreg capable of sufficiently suppressing folding and cracking. An object is to provide a curable resin composition that can be formed, and a prepreg, a substrate, a metal foil-clad laminate, a metal foil with resin, and a printed wiring board using the curable resin composition.
上記目的を達成するために、本発明は、(a)成分:グリシジル(メタ)アクリレート由来のモノマー単位を有するアクリル重合体と、(b)成分:エポキシ樹脂と、(c)成分:フェノール樹脂と、(d)成分:硬化促進剤と、(e)成分:チオール化合物とを含有するプリント配線板用硬化性樹脂組成物を提供する。 In order to achieve the above object, the present invention provides (a) component: an acrylic polymer having monomer units derived from glycidyl (meth) acrylate, (b) component: epoxy resin, and (c) component: phenol resin. , (D) component: A hardening accelerator and (e) component: The curable resin composition for printed wiring boards containing a thiol compound is provided.
この硬化性樹脂組成物は、十分に優れた配線−基板間の接着性と十分な耐熱性とを有するプリント配線板、及び、折れや割れを十分に抑制し得る、すなわち十分優れた可とう性を有するプリプレグを形成することができる。本発明の硬化性樹脂組成物がかかる効果を奏する要因は現在のところ詳細には明らかにされていないが、本発明者らは以下の要因を考えている。ただし、要因はこれに限定されない。 This curable resin composition is a printed wiring board having sufficiently excellent wiring-to-substrate adhesion and sufficient heat resistance, and can sufficiently suppress folding and cracking, that is, sufficiently excellent flexibility. A prepreg having can be formed. Although the factor which the curable resin composition of this invention has this effect is not clarified in detail at present, the present inventors consider the following factors. However, the factor is not limited to this.
すなわち、可とう性を向上させる要因は、主として(a)成分であるアクリル重合体を配合したことにあり、配線−基板間の接着性を向上させる要因は、主として(e)成分であるチオール化合物を配合したことにあると考えられる。そして、上述の(a)〜(e)成分の全てを配合することにより、それら可とう性及び接着性の両方を十分に高いレベルに引き上げていると推測している。 That is, the factor that improves the flexibility is mainly the blending of the acrylic polymer that is the component (a), and the factor that improves the adhesion between the wiring and the substrate is the thiol compound that is the component (e). It is thought that there was blended. And it is speculated that blending all of the above-mentioned components (a) to (e) raises both the flexibility and the adhesiveness to a sufficiently high level.
また、上記構成を備える本発明の硬化性樹脂組成物は、耐熱性に優れている。そのため、この硬化性樹脂組成物を用いて作製したプリプレグ、金属箔張積層板及びプリント配線板等は、はんだ耐熱性等の加工時及び取り扱い時における耐熱性に優れたものとなる。 Moreover, the curable resin composition of this invention provided with the said structure is excellent in heat resistance. Therefore, prepregs, metal foil-clad laminates, printed wiring boards and the like produced using this curable resin composition have excellent heat resistance during processing such as solder heat resistance and handling.
本発明の硬化性樹脂組成物において、(a)成分は、その総量を基準として1〜20質量%のグリシジル(メタ)アクリレート由来のモノマー単位を有することが好ましい。これにより、硬化性樹脂組成物は、更に耐熱性や絶縁特性に優れたものになると共に、より可とう性の高いプリプレグを形成可能となる。 In the curable resin composition of the present invention, the component (a) preferably has 1 to 20% by mass of a monomer unit derived from glycidyl (meth) acrylate based on the total amount. As a result, the curable resin composition is further excellent in heat resistance and insulation properties and can form a prepreg having higher flexibility.
本発明の硬化性樹脂組成物において、(a)成分の重量平均分子量は30000以上であることが好ましい。重量平均分子量をこのように調整することで、硬化性樹脂組成物はその硬化物の可とう性を更に高めることができる。 In the curable resin composition of the present invention, the weight average molecular weight of the component (a) is preferably 30000 or more. By adjusting the weight average molecular weight in this way, the curable resin composition can further enhance the flexibility of the cured product.
本発明の硬化性樹脂組成物において、一層優れた可とう性を硬化物に付与する観点から、硬化性樹脂組成物中の固形分全量を基準として、上記(a)成分の配合割合は10質量%以上であると好ましい。同様の観点から、本発明の硬化性樹脂組成物において、(b)成分は、エポキシ基を1分子当たり2個以上有するものであることが好ましい。更に同様の観点から、本発明の硬化性樹脂組成物において、(c)成分は、フェノール性水酸基を1分子当たり2個以上有するものであることが好ましい。 In the curable resin composition of the present invention, from the viewpoint of imparting more excellent flexibility to the cured product, the blending ratio of the component (a) is 10 masses based on the total solid content in the curable resin composition. % Or more is preferable. From the same viewpoint, in the curable resin composition of the present invention, the component (b) preferably has two or more epoxy groups per molecule. Furthermore, from the same viewpoint, in the curable resin composition of the present invention, the component (c) preferably has two or more phenolic hydroxyl groups per molecule.
本発明の硬化性樹脂組成物において、(b)成分におけるエポキシ基に対する(c)成分におけるフェノール性水酸基のモル比(フェノール性水酸基のモル数/エポキシ基のモル数)が0.5〜1.5となるように、(c)成分が配合されていることが好ましい。これにより本発明の硬化性樹脂組成物は、一層優れた耐熱性や接着性等を発現するという効果を有する傾向にある。 In the curable resin composition of the present invention, the molar ratio of the phenolic hydroxyl group in component (c) to the epoxy group in component (b) (number of moles of phenolic hydroxyl group / number of moles of epoxy group) is 0.5 to 1. The component (c) is preferably blended so as to be 5. Thereby, the curable resin composition of this invention exists in the tendency which has the effect that the further outstanding heat resistance, adhesiveness, etc. are expressed.
また、本発明の硬化性樹脂組成物において、(d)成分はイミダゾール化合物であることが好ましい。こうすることにより、本発明の硬化性樹脂組成物は、その保存安定性を一層高めることができる。 In the curable resin composition of the present invention, the component (d) is preferably an imidazole compound. By carrying out like this, the curable resin composition of this invention can improve the storage stability further.
本発明の硬化性樹脂組成物において、(e)成分は、アルキルチオール、フェニルチオール及びチオール系カップリング剤からなる群より選ばれる1種以上のチオール化合物であることが好ましい。これらのチオール化合物を用いると、金属箔−基板(樹脂)間又は配線−基板(樹脂)間の接着性がより向上するという効果を奏することができる。 In the curable resin composition of the present invention, the component (e) is preferably one or more thiol compounds selected from the group consisting of alkylthiols, phenylthiols, and thiol coupling agents. When these thiol compounds are used, the effect that the adhesiveness between metal foil-board | substrate (resin) or wiring-board | substrate (resin) improves more can be show | played.
本発明は、繊維基材と、これに含浸している上述の硬化性樹脂組成物とを有するプリプレグを提供する。また、本発明は、上記プリプレグを加熱及び加圧して得られる基板を提供し、さらには、その基板と、当該基板の少なくとも一方面上に設けられた金属箔とを備える金属箔張積層板を提供する。これらプリプレグ、基板及び金属箔張積層板は、本発明の硬化性樹脂組成物を用いて形成されているため、折れや割れが発生し難い。更に、これらプリプレグ、基板及び金属箔張積層板を用いて作製されたプリント配線板は、配線−基板間の接着性に十分優れたものとなる。 The present invention provides a prepreg having a fiber substrate and the above-described curable resin composition impregnated therein. The present invention also provides a substrate obtained by heating and pressing the prepreg, and further comprising a metal foil-clad laminate comprising the substrate and a metal foil provided on at least one surface of the substrate. provide. Since these prepregs, substrates, and metal foil-clad laminates are formed using the curable resin composition of the present invention, they are unlikely to break or crack. Furthermore, the printed wiring board produced using these prepregs, substrates, and metal foil-clad laminates is sufficiently excellent in adhesion between the wiring and the substrate.
また、本発明は、上述の硬化性樹脂組成物からなる樹脂膜と、当該樹脂膜の少なくとも一方面上に設けられた金属箔とを備える樹脂付金属箔を提供する。この樹脂付金属箔は、耐熱性に優れると共に、配線−基板間の接着性が十分に高いものとなる。また、この樹脂付金属箔は、可とう性にも十分優れている。 Moreover, this invention provides the metal foil with resin provided with the resin film which consists of the above-mentioned curable resin composition, and the metal foil provided on the at least one surface of the said resin film. This metal foil with resin is excellent in heat resistance and has sufficiently high adhesion between the wiring and the substrate. Moreover, this metal foil with resin is sufficiently excellent in flexibility.
本発明は、上記基板と、当該基板の少なくとも一方面上に設けられ、金属からなる配線パターンとを備えるプリント配線板を提供する。本発明のプリント配線板は、絶縁部分に上述の硬化性樹脂組成物の硬化物を用いているため、十分優れた配線−基板間の接着性を示す。また、このプリント配線板は高い耐熱性を有する。 The present invention provides a printed wiring board comprising the substrate and a wiring pattern provided on at least one surface of the substrate and made of metal. Since the printed wiring board of this invention uses the hardened | cured material of the above-mentioned curable resin composition for an insulation part, it shows the adhesiveness between wiring-board | substrate sufficiently excellent. Moreover, this printed wiring board has high heat resistance.
本発明によれば、十分に優れた配線−基板間の接着性と十分な耐熱性とを有するプリント配線板及び折れや割れを十分に抑制し得るプリプレグを形成可能な硬化性樹脂組成物、並びに、この硬化性樹脂組成物を用いたプリプレグ、基板、金属箔張積層板、樹脂付金属箔及びプリント配線板を提供することができる。 According to the present invention, a printed wiring board having sufficiently excellent wiring-to-substrate adhesion and sufficient heat resistance, a curable resin composition capable of forming a prepreg capable of sufficiently suppressing folding and cracking, and A prepreg, a substrate, a metal foil-clad laminate, a resin-coated metal foil, and a printed wiring board using the curable resin composition can be provided.
以下、必要に応じて図面を参照しつつ、本発明の好適な実施形態について詳細に説明する。なお、図面中、同一要素には同一符号を付すこととし、重複する説明は省略する。また、上下左右等の位置関係は、特に断らない限り、図面に示す位置関係に基づくものとする。更に、図面の寸法比率は図示の比率に限られるものではない。また、本明細書における「(メタ)アクリレート」とは「アクリレート」及びそれに対応する「メタクリレート」を意味する。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings as necessary. In the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted. Further, the positional relationship such as up, down, left and right is based on the positional relationship shown in the drawings unless otherwise specified. Further, the dimensional ratios in the drawings are not limited to the illustrated ratios. Further, “(meth) acrylate” in the present specification means “acrylate” and “methacrylate” corresponding thereto.
図1は、本発明のプリプレグの好適な一実施形態を示す部分斜視図である。図1に示すプリプレグ100は、繊維基材と、これに含浸している硬化性樹脂組成物とで構成されるシート状のプリプレグである。
FIG. 1 is a partial perspective view showing a preferred embodiment of the prepreg of the present invention. A
プリプレグ100中の繊維基材は、任意に折り曲げ可能な、可とう性を有する繊維基材であり、その厚みは100μm以下であることが好ましい。これにより、後述するような特定組成の硬化性樹脂組成物と組み合わせたときに、得られる基板の可とう性が相乗的に大きくなり、任意に折り曲げることが極めて容易となる。また、基板の可とう性をさらに大きくするため、この厚みは50μm以下であることがより好ましく、40μm以下であることが更に好ましく、30μm以下であることが特に好ましい。一方、繊維基材の厚みの下限は特に制限はないが、5μm以上であることが好ましく、10μm以上であることがより好ましい。ここで、繊維基材を用いていることにより、基板の製造プロセスにおける加熱、吸湿等に伴う寸法変化は十分に小さい。
The fiber base material in the
繊維基材の形態としては、金属箔張積層板や多層プリント配線板を製造する際に一般的に用いられるもの等から適宜選択できるが、通常、織布や不織布等の繊維基材が用いられる。繊維基材を構成する繊維としては、ガラス、アルミナ、アスベスト、ボロン、シリカアルミナガラス、シリカガラス、チラノ、炭化ケイ素、窒化ケイ素、ジルコニア等の無機繊維や、アラミド、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルサルフォン、カーボン、セルロース等の有機繊維、あるいはこれらの混抄系が挙げられる。これらのなかでも、ガラス繊維が好ましい。特に、繊維基材としてはガラスクロス(ガラス繊維の織布)が好ましく用いられる。 The form of the fiber base material can be appropriately selected from those generally used when producing metal foil-clad laminates and multilayer printed wiring boards, but usually fiber base materials such as woven fabrics and nonwoven fabrics are used. . The fibers constituting the fiber substrate include glass, alumina, asbestos, boron, silica alumina glass, silica glass, tyranno, silicon carbide, silicon nitride, zirconia, and other inorganic fibers, aramid, polyetheretherketone, polyetherimide , Organic fibers such as polyethersulfone, carbon and cellulose, or mixed papers thereof. Among these, glass fiber is preferable. In particular, glass cloth (glass fiber woven fabric) is preferably used as the fiber base material.
プリプレグ100中の硬化性樹脂組成物は、(a)成分:グリシジル(メタ)アクリレート由来のモノマー単位を有するアクリル重合体と、(b)成分:エポキシ樹脂と、(c)成分:フェノール樹脂と、(d)成分:硬化促進剤と、(e)成分:チオール化合物とを含有するものである。
The curable resin composition in the
((a)成分)
(a)成分であるグリシジル(メタ)アクリレート由来のモノマー単位を有するアクリル重合体は、グリシジル(メタ)アクリレート由来のモノマー単位を必須成分として有していれば特に限定されない。グリシジル(メタ)アクリレートは、通常、ラジカルを発生させることでその(メタ)アクリル基を付加重合して重合体を生成する。
((A) component)
The acrylic polymer having a monomer unit derived from glycidyl (meth) acrylate as the component (a) is not particularly limited as long as it has a monomer unit derived from glycidyl (meth) acrylate as an essential component. Glycidyl (meth) acrylate usually generates a polymer by addition polymerization of its (meth) acrylic group by generating radicals.
(a)成分であるアクリル重合体において、グリシジル(メタ)アクリレート由来のモノマー単位以外のモノマー単位としては、例えば、グリシジル基以外の置換基を有していてもよいアルキル(メタ)アクリレート由来のモノマー単位が挙げられる。そのアルキル(メタ)アクリレートにおいて、アルキル基は置換基を有していてもよい炭素数1〜20のアルキル基であることが好ましい。アルキル基の置換基としては、脂環式基、水酸基、含窒素環状基等が挙げられる。 In the acrylic polymer as the component (a), as the monomer unit other than the monomer unit derived from glycidyl (meth) acrylate, for example, a monomer derived from alkyl (meth) acrylate which may have a substituent other than glycidyl group Units are listed. In the alkyl (meth) acrylate, the alkyl group is preferably an alkyl group having 1 to 20 carbon atoms which may have a substituent. Examples of the substituent for the alkyl group include an alicyclic group, a hydroxyl group, and a nitrogen-containing cyclic group.
上記アルキル(メタ)アクリレートとしては、例えば、アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ブチル、アクリル酸ヘキシル、アクリル酸2−エチルヘキシル、アクリル酸イソブチル、アクリル酸エチレングリコールメチルエーテル、アクリル酸シクロヘキシル、アクリル酸2−ヒドロキシエチル、アクリル酸2−ヒドロキシプロピル、アクリル酸イソボルニル、アクリル酸アミド、アクリル酸イソデシル、アクリル酸オクタデシル、アクリル酸ラウリル、アクリル酸アリル、アクリル酸N−ビニルピロリドン、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸プロピル、メタクリル酸ブチル、メタクリル酸ヘキシル、メタクリル酸2−エチルヘキシル、メタクリル酸イソブチル、メタクリル酸エチレングリコールメチルエーテル、メタクリル酸シクロヘキシル、メタクリル酸2−ヒドロキシエチル、メタクリル酸2−ヒドロキシプロピル、メタクリル酸イソボルニル、メタクリル酸アミド、メタクリル酸イソデシル、メタクリル酸オクタデシル、メタクリル酸ラウリル、メタクリル酸アリル、メタクリル酸N−ビニルピロリドン、メタクリル酸ジメチルアミノエチルが挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いられる。 Examples of the alkyl (meth) acrylate include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, isobutyl acrylate, ethylene glycol methyl ether acrylate, and acrylic acid. Cyclohexyl, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, isobornyl acrylate, amide acrylate, isodecyl acrylate, octadecyl acrylate, lauryl acrylate, allyl acrylate, N-vinylpyrrolidone acrylate, methyl methacrylate , Ethyl methacrylate, propyl methacrylate, butyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, isobutyl methacrylate, ethyl methacrylate Glycol methyl ether, cyclohexyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, isobornyl methacrylate, methacrylic acid amide, isodecyl methacrylate, octadecyl methacrylate, lauryl methacrylate, allyl methacrylate, N methacrylate -Vinylpyrrolidone and dimethylaminoethyl methacrylate are mentioned. These are used singly or in combination of two or more.
(a)成分であるアクリル重合体は、グリシジル(メタ)アクリレート由来のモノマー単位を、(a)成分の総量を基準として1〜20質量%有していると好ましく、1〜15質量%有しているとより好ましい。1質量%未満では耐熱性が低下する傾向にあり、20質量%を超えると可とう性が低下する傾向にある。 The acrylic polymer as the component (a) preferably has 1 to 20% by mass, preferably 1 to 15% by mass of the monomer unit derived from glycidyl (meth) acrylate based on the total amount of the component (a). It is more preferable. If it is less than 1% by mass, the heat resistance tends to decrease, and if it exceeds 20% by mass, the flexibility tends to decrease.
(a)成分の重量平均分子量は30000以上であると好ましく、30000〜2000000であるとより好ましい。アクリル重合体の重量平均分子量が30000未満であっても2000000を超えても、プリプレグや基板の可とう性が低下する傾向にある。ここで、上記の重量平均分子量は、ゲル浸透クロマトグラフィー(GPC)分析によって測定される値であって、標準ポリスチレン換算値のことを意味する。GPC分析は、例えば、カラムとして「GL8300 MDT−5」(日立化成(株)製、商品名)を用い、テトラヒドロフラン(THF)を溶離液として用いて行うことができる。 (A) The weight average molecular weight of a component is preferable in it being 30000 or more, and it is more preferable in it being 30000-2 million. If the weight average molecular weight of the acrylic polymer is less than 30,000 or more than 2,000,000, the flexibility of the prepreg or the substrate tends to decrease. Here, said weight average molecular weight is a value measured by gel permeation chromatography (GPC) analysis, and means a standard polystyrene equivalent value. The GPC analysis can be performed, for example, using “GL8300 MDT-5” (trade name, manufactured by Hitachi Chemical Co., Ltd.) as a column and tetrahydrofuran (THF) as an eluent.
(a)成分であるアクリル重合体は、例えば、グリシジルアルキル(メタ)アクリレートを、これと共重合可能な他のモノマーと共重合することによって得られる。共重合の際の共重合比を調整することで、グリシジル(メタ)アクリレート由来のモノマー単位を、(a)成分の総量を基準にして所定範囲内で有するアクリル重合体を得ることができる。また、(a)成分であるアクリル重合体は、市販品を入手して用いてもよい。市販品は、例えば、グリシジル(メタ)アクリレート由来のモノマー単位を(a)成分の総量を基準にして1〜20質量%の範囲で有しており、重量平均分子量が30000以上である「HTR860P3」(ナガセケムテックス株式会社製、商品名、エポキシ価3.05)が挙げられる。 The acrylic polymer as component (a) is obtained, for example, by copolymerizing glycidyl alkyl (meth) acrylate with another monomer copolymerizable therewith. By adjusting the copolymerization ratio at the time of copolymerization, an acrylic polymer having monomer units derived from glycidyl (meth) acrylate within a predetermined range based on the total amount of component (a) can be obtained. Moreover, you may obtain and use a commercial item for the acrylic polymer which is (a) component. The commercially available product has, for example, a monomer unit derived from glycidyl (meth) acrylate in a range of 1 to 20% by mass based on the total amount of the component (a), and a weight average molecular weight of 30,000 or more “HTR860P3” (Manufactured by Nagase ChemteX Corporation, trade name, epoxy value 3.05).
なお、アクリル重合体は、グリシジル(メタ)アクリレートや、グリシジル基以外の置換基を有していてもよいアルキル(メタ)アクリレートの他、アクリロニトリル等に由来するモノマー単位を有していてもよい。 In addition, the acrylic polymer may have a monomer unit derived from acrylonitrile or the like in addition to glycidyl (meth) acrylate or an alkyl (meth) acrylate which may have a substituent other than the glycidyl group.
(a)成分であるアクリル重合体は、例えば、ラジカルを発生させるラジカル重合開始剤を用いたラジカル重合により得られる。ラジカル重合開始剤としては、アゾビスイソブチロニトリル(AIBN)、過安息香酸tert−ブチル、過酸化ベンゾイル、過酸化ラウロイル、過硫酸カリウムなどの過硫酸塩、クメンヒドロペルオキシド、t−ブチルヒドロペルオキシド、ジクミルペルオキシド、ジt―ブチルペルオキシド、2,2’−アゾビス−2,4−ジメチルバレロニトリル、t―ブチルペルイソブチレート、t―ブチルペルピバレート、過酸化水素/第一鉄塩、過硫酸塩/酸性亜硫酸ナトリウム、クメンヒドロペルオキシド/第一鉄塩、過酸化ベンゾイル/ジメチルアニリン等が挙げられる。これらを単独で用いてもよいし、複数種を組み合わせてもよい。 The acrylic polymer as component (a) is obtained, for example, by radical polymerization using a radical polymerization initiator that generates radicals. Radical polymerization initiators include persulfates such as azobisisobutyronitrile (AIBN), tert-butyl perbenzoate, benzoyl peroxide, lauroyl peroxide, potassium persulfate, cumene hydroperoxide, t-butyl hydroperoxide Dicumyl peroxide, di-t-butyl peroxide, 2,2′-azobis-2,4-dimethylvaleronitrile, t-butyl perisobutyrate, t-butyl perpivalate, hydrogen peroxide / ferrous salt, Examples thereof include persulfate / sodium acid sulfite, cumene hydroperoxide / ferrous salt, benzoyl peroxide / dimethylaniline, and the like. These may be used alone or in combination of two or more.
上記(a)成分として、同一の重量平均分子量、同一種類のモノマー単位、同一割合のグリシジル(メタ)アクリレート由来のモノマー単位を有するアクリル重合体を単独で用いてもよく、互いに重量平均分子量の異なるアクリル重合体、互いに異なる種類のモノマー単位を有するアクリル重合体、及び/又は、グリシジル(メタ)アクリレート由来のモノマー単位を互いに異なる割合で有するアクリル重合体を2種以上組み合わせて用いてもよい。 As the component (a), acrylic polymers having the same weight average molecular weight, the same type of monomer units, and the same proportion of monomer units derived from glycidyl (meth) acrylate may be used alone, and the weight average molecular weights are different from each other. Two or more kinds of acrylic polymers, acrylic polymers having different types of monomer units, and / or acrylic polymers having glycidyl (meth) acrylate-derived monomer units in different proportions may be used.
硬化性樹脂組成物において、(a)成分であるアクリル重合体の配合割合は、硬化性樹脂組成物中の固形分全量を基準として、10質量%以上であると好ましく、10〜60質量%であるとより好ましい。アクリル重合体の配合割合が10質量%未満であると、硬化性樹脂組成物の硬化物の可とう性が低下する傾向にあると共に耐熱性が低下する傾向にある。また、アクリル重合体の配合割合が60質量%を超えると、プリプレグを形成した際に、ガラスクロス等の繊維基材中に空隙が残りやすくなる傾向にある。 In the curable resin composition, the blending ratio of the acrylic polymer as the component (a) is preferably 10% by mass or more based on the total solid content in the curable resin composition, and is 10 to 60% by mass. More preferably. When the blending ratio of the acrylic polymer is less than 10% by mass, the flexibility of the cured product of the curable resin composition tends to decrease and the heat resistance tends to decrease. Moreover, when the blending ratio of the acrylic polymer exceeds 60% by mass, voids tend to remain in the fiber base material such as glass cloth when the prepreg is formed.
((b)成分)
(b)成分であるエポキシ樹脂は、架橋性官能基としてのエポキシ基を1分子当たり2個以上有するポリエポキシ化合物からなるエポキシ樹脂であると好ましい。エポキシ樹脂としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、脂環式エポキシ樹脂、グリシジルエステル型エポキシ樹脂、グリシジルアミン型エポキシ樹脂、ヒダントイン型エポキシ樹脂、イソシアヌレート型エポキシ樹脂、脂肪族鎖状エポキシ樹脂が挙げられる。これらのエポキシ樹脂は、ハロゲン化されていてもよく、水素添加されていてもよい。これらのエポキシ樹脂は、単独で又は2種以上を組み合わせて使用してもよい。また、これらのエポキシ樹脂は、常法により合成されてもよく、市販品を入手してもよい。
((B) component)
The epoxy resin as the component (b) is preferably an epoxy resin composed of a polyepoxy compound having two or more epoxy groups per molecule as a crosslinkable functional group. Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolak type epoxy resin, bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin. And alicyclic epoxy resins, glycidyl ester type epoxy resins, glycidyl amine type epoxy resins, hydantoin type epoxy resins, isocyanurate type epoxy resins, and aliphatic chain epoxy resins. These epoxy resins may be halogenated or hydrogenated. These epoxy resins may be used alone or in combination of two or more. Moreover, these epoxy resins may be synthesized by a conventional method, or commercially available products may be obtained.
((c)成分)
(c)成分であるフェノール樹脂は、架橋性官能基としてのフェノール性水酸基を1分子当たり2個以上有する多官能のフェノール樹脂であると好ましい。フェノール樹脂としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールS、ポリビニルフェノール等のフェノール化合物、及び、フェノール、クレゾール、アルキルフェノール、カテコール、ビスフェノールA、ビスフェノールS等のフェノール化合物と、ホルムアルデヒド、サリチルアルデヒド等のアルデヒド類との縮合物(すなわち、ノボラック型フェノール樹脂)、並びにこれらのハロゲン化物が挙げられる。これらのフェノール樹脂は、1種を単独で又は2種以上を組み合わせて用いることができる。また、これらのフェノール樹脂は、常法により合成されてもよく、市販品を入手してもよい。
(Component (c))
The phenol resin as component (c) is preferably a polyfunctional phenol resin having two or more phenolic hydroxyl groups per molecule as a crosslinkable functional group. Examples of the phenolic resin include phenolic compounds such as bisphenol A, bisphenol F, bisphenol S, and polyvinylphenol, and phenolic compounds such as phenol, cresol, alkylphenol, catechol, bisphenol A, and bisphenol S, and formaldehyde, salicylaldehyde, and the like. Examples include condensates with aldehydes (that is, novolak-type phenol resins), and halides thereof. These phenol resins can be used individually by 1 type or in combination of 2 or more types. Moreover, these phenol resins may be synthesized by a conventional method, or commercially available products may be obtained.
硬化性樹脂組成物において、(c)成分であるフェノール樹脂の配合割合は、(b)成分におけるエポキシ基に対する(c)成分におけるフェノール性水酸基のモル比(フェノール性水酸基のモル数/エポキシ基のモル数)が0.5〜1.5となるような配合割合であることが好ましい。 In the curable resin composition, the blending ratio of the phenol resin as the component (c) is the molar ratio of the phenolic hydroxyl group in the component (c) to the epoxy group in the component (b) (number of moles of phenolic hydroxyl group / epoxy group). The blending ratio is preferably such that the number of moles) is 0.5 to 1.5.
((d)成分)
(d)成分である硬化促進剤は、上記(a)〜(c)成分間の硬化反応を促進させるような触媒機能を有するものであれば、特に限定されない。硬化促進剤としては、例えば、アミン化合物、イミダゾール化合物、有機リン化合物、アルカリ金属化合物、アルカリ土類金属化合物、第四級アンモニウム塩等が挙げられるが、これらに限定されるものではない。また、これらの硬化促進剤は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
(Component (d))
The curing accelerator as the component (d) is not particularly limited as long as it has a catalytic function that promotes the curing reaction between the components (a) to (c). Examples of the curing accelerator include, but are not limited to, amine compounds, imidazole compounds, organic phosphorus compounds, alkali metal compounds, alkaline earth metal compounds, quaternary ammonium salts, and the like. Moreover, these hardening accelerators may be used individually by 1 type, and may be used in combination of 2 or more type.
これらの中で、保存安定性の観点から、硬化促進剤としてイミダゾール化合物を配合することが好ましい。イミダゾール化合物としては、例えば、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−ウンデシルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−ヘプタデシルイミダゾール、4,5−ジフェニルイミダゾール、2−メチルイミダゾリン、2−フェニルイミダゾリン、2−ウンデシルイミダゾリン、2−ヘプタデシルイミダゾリン、2−イソプロピルイミダゾール、2,4−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−エチルイミダゾリン、2−イソプロピルイミダゾリン、2,4−ジメチルイミダゾリン、2−フェニル−4−メチルイミダゾリン、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−エチル−4−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾリウムトリメリテイト、1−シアノエチル−2−フェイルイミダゾリウムトリメリテイト、2,4−ジアミノ−6−〔2’−ウンデシルイミダゾリル−(1’)〕−エチル−s−トリアジン、2−フェニル−4,5−ジヒドロキシメチルイミダゾール及び2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、イミノ基がアクリロニトリル、フェニレンジイソシアネート、トルイジンイソシアネート、ナフタレンジイソシアネート、メチレンビスフェニルイソシアネート、及びメラミンアクリレートでマスクされたイミダゾールが挙げられる。これらイミダゾール化合物は、1種を単独で又は2種以上を組み合わせて用いられる。 In these, it is preferable to mix | blend an imidazole compound as a hardening accelerator from a viewpoint of storage stability. Examples of the imidazole compound include imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2- Heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl-4 -Methylimidazole, 2-ethylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4-methylimidazoline, 1-cyanoethyl-2-methylimidazole, 1-sia Ethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2- Feirimidazolium trimellitate, 2,4-diamino-6- [2'-undecylimidazolyl- (1 ')]-ethyl-s-triazine, 2-phenyl-4,5-dihydroxymethylimidazole and 2-phenyl Examples include -4-methyl-5-hydroxymethylimidazole, imidazole whose imino group is masked with acrylonitrile, phenylene diisocyanate, toluidine isocyanate, naphthalene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate. It is. These imidazole compounds are used alone or in combination of two or more.
硬化性樹脂組成物における硬化促進剤の配合割合は、(b)成分であるエポキシ樹脂100質量部に対して、0.01〜5質量部が好ましく、0.01〜3質量部がより好ましい。硬化促進剤の配合割合が、0.01質量部未満であると硬化不足を生じやすく、5質量部を超えると硬化性樹脂組成物の保存安定性が低下する傾向にある。 0.01-5 mass parts is preferable with respect to 100 mass parts of epoxy resins which are (b) components, and, as for the mixture ratio of the hardening accelerator in curable resin composition, 0.01-3 mass parts is more preferable. If the blending ratio of the curing accelerator is less than 0.01 parts by mass, insufficient curing tends to occur, and if it exceeds 5 parts by mass, the storage stability of the curable resin composition tends to decrease.
(d)成分である硬化促進剤は、常法により合成してもよく、市販品を入手してもよい。 (D) The hardening accelerator which is a component may be synthesize | combined by a conventional method, and a commercial item may be obtained.
((e)成分)
(e)成分であるチオール化合物は、特に限定されないが、アルキルチオール、フェニルチオール及びチオール系カップリング剤からなる群より選ばれる1種以上のチオール化合物であると好ましい。
((E) component)
The thiol compound as the component (e) is not particularly limited, but is preferably one or more thiol compounds selected from the group consisting of alkyl thiols, phenyl thiols, and thiol coupling agents.
具体的なチオール化合物としては、例えばn−ブチルメルカプタン、1−デカンチオール、エンタンチオール、ヒノキチオール、2−メトキシベンゼンチオール、チオフェノール、1−ナフタレンチオール、p−ニトロチオフェノール、1−オクタンチオール、1−ペンタンチオール、1−プロパンチオール、o−アミノチオフェノール、2−ベンゾチアゾールチオール、1−ブタンチオール、2−ヒドロキシエチルメルカプタン、γ−メルカプトプロピルトリメトキシシラン等が挙げられる。これらの中では、本発明の効果をより有効に発揮する観点から、γ−メルカプトプロピルトリメトキシシランが好ましい。これらのチオール化合物は、1種を単独で又は2種類以上を組み合わせて用いられる。また、これらのチオール化合物は、常法により合成及び/又は調製してもよく、市販品を入手してもよい。 Specific examples of the thiol compound include n-butyl mercaptan, 1-decanethiol, entanethiol, hinokitiol, 2-methoxybenzenethiol, thiophenol, 1-naphthalenethiol, p-nitrothiophenol, 1-octanethiol, Examples thereof include 1-pentanethiol, 1-propanethiol, o-aminothiophenol, 2-benzothiazolethiol, 1-butanethiol, 2-hydroxyethyl mercaptan, and γ-mercaptopropyltrimethoxysilane. Among these, γ-mercaptopropyltrimethoxysilane is preferable from the viewpoint of more effectively exerting the effects of the present invention. These thiol compounds are used alone or in combination of two or more. Moreover, these thiol compounds may be synthesized and / or prepared by a conventional method, and commercially available products may be obtained.
硬化性樹脂組成物における(e)成分の配合割合は、(b)成分であるエポキシ樹脂100質量部に対して、0.05〜10質量部が好ましく、0.05〜5質量部がより好ましい。(e)成分の配合割合が、0.05質量部未満であると配線又は金属箔と絶縁基板との間の接着性が低下する傾向にあり、10質量部を超えると耐熱性等が低下する傾向にある。 The mixing ratio of the component (e) in the curable resin composition is preferably 0.05 to 10 parts by mass, more preferably 0.05 to 5 parts by mass with respect to 100 parts by mass of the epoxy resin (b). . When the blending ratio of the component (e) is less than 0.05 parts by mass, the adhesion between the wiring or metal foil and the insulating substrate tends to decrease, and when it exceeds 10 parts by mass, the heat resistance and the like decrease. There is a tendency.
硬化性樹脂組成物は、以上のような成分の他、必要に応じて、イソシアネートやメラミン等の架橋剤、シリカ等の無機充填剤、導電性粒子、カップリング剤、顔料、レベリング剤、消泡剤、イオントラップ剤等を含有していてもよい。 In addition to the components described above, the curable resin composition may include a crosslinking agent such as isocyanate and melamine, an inorganic filler such as silica, a conductive particle, a coupling agent, a pigment, a leveling agent, and an antifoam as necessary. An agent, an ion trap agent and the like may be contained.
本実施形態の硬化性樹脂組成物は、上記(a)〜(e)成分を一体不可分に含有することにより、これを用いた金属箔張積層板の金属箔−基板間やプリント配線板の配線−基板間に十分優れた接着性を付与する。例えば、本実施形態の硬化性樹脂組成物を用いた銅箔張積層板について、所定の方法により銅箔−基板間の引き剥がし強さを測定すると、その値が0.8kN/m以上となり、より好適なものでは1.2kN/m以上となる。ここで所定の方法とは以下に説明する方法である。 The curable resin composition of the present embodiment contains the above components (a) to (e) inseparably, so that the metal foil-clad laminate using the metal foil-substrate and wiring of a printed wiring board are used. -Give sufficiently good adhesion between the substrates. For example, for the copper foil-clad laminate using the curable resin composition of the present embodiment, when the peel strength between the copper foil and the substrate is measured by a predetermined method, the value becomes 0.8 kN / m or more, More preferable is 1.2 kN / m or more. Here, the predetermined method is a method described below.
まず、硬化性樹脂組成物を0.04mmの厚みを有するガラスクロスに、硬化性樹脂組成物中の固形分とガラスクロスとの質量比で7:10となるように含浸してプリプレグを作製する。次いで、このプリプレグの両面に厚みが18μmで十点平均表面粗さ(Rz)が2.0〜3.0の銅箔を配置し、更に両側から170℃、4.0MPaの条件で90分間加熱及び加圧を行って、両面銅張積層板を得る。この両面銅張積層板の銅箔を部分的にエッチングして、1mm幅の銅箔ラインを形成する。次に、銅箔ラインを接着面に対して90°方向に50mm/分の速度で引き剥がして、その際の荷重を測定し、最大荷重を引き剥がし強さとする。 First, a prepreg is prepared by impregnating a glass cloth having a thickness of 0.04 mm with a curable resin composition so that the mass ratio of the solid content in the curable resin composition to the glass cloth is 7:10. . Next, a copper foil having a thickness of 18 μm and a 10-point average surface roughness (Rz) of 2.0 to 3.0 is disposed on both sides of the prepreg, and further heated at 170 ° C. and 4.0 MPa for 90 minutes from both sides. And pressurization is performed to obtain a double-sided copper-clad laminate. The copper foil of this double-sided copper clad laminate is partially etched to form a 1 mm wide copper foil line. Next, the copper foil line is peeled off at a speed of 50 mm / min in the direction of 90 ° with respect to the bonding surface, the load at that time is measured, and the maximum load is peeled off to be the strength.
また、本実施形態の硬化性樹脂組成物は、上述の(a)〜(e)成分の複合的作用により、その乾燥物や硬化物に十分優れた可とう性を付与する。さらには、本実施形態の硬化性樹脂組成物は高い耐熱性を有する硬化物を形成することができる。 In addition, the curable resin composition of the present embodiment imparts sufficiently excellent flexibility to the dried product and the cured product due to the combined action of the components (a) to (e) described above. Furthermore, the curable resin composition of the present embodiment can form a cured product having high heat resistance.
プリプレグ100は、例えば、硬化性樹脂組成物が溶媒に溶解又は分散しているワニスを繊維基材に含浸し、80℃〜200℃の加熱によりワニスから溶剤を除去して、製造することができる。プリプレグ100においては、ワニスに使用した溶媒が残存していてもよいが、ワニスに含まれていた溶媒のうち80質量%以上が除去されていることが好ましい。また、ワニスは、ワニス中の硬化性樹脂組成物の量が、ワニス中の硬化性樹脂組成物及び繊維基材の合計質量を基準として、30〜80質量%となるような比率で繊維基材に含浸することが好ましい。
The
上述の熱硬化性樹脂組成物をワニス化する際に用いられる溶媒は特に限定するものではない。溶媒としては、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類、トルエン、キシレン、メシチレン等の芳香族炭化水素類、メタノール、エタノール、ブタノール等のアルコール類、エチルセロソルブ、ブチルセロソルブ、エチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、カルビトール、ブチルカルビトール等のエーテル類、メトキシエチルアセテート、エトキシエチルアセテート、ブトキシエチルアセテート、酢酸エチル等のエステル類、プロピレングリコールモノメチルエーテルアセテート等のエーテルアセテート類、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン等の含窒素類等の溶媒が挙げられる。これらは1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。 The solvent used when varnishing the above-mentioned thermosetting resin composition is not particularly limited. Examples of the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, aromatic hydrocarbons such as toluene, xylene, and mesitylene, alcohols such as methanol, ethanol, and butanol, ethyl cellosolve, butyl cellosolve, and ethylene glycol. Monomethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethers such as carbitol, butyl carbitol, esters such as methoxyethyl acetate, ethoxyethyl acetate, butoxyethyl acetate, ethyl acetate, propylene glycol monomethyl ether acetate, etc. Ether acetates, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2- The solvent of the nitrogen Motorui such as pyrrolidone and the like. These may be used individually by 1 type and may be used in combination of 2 or more type.
なお、硬化性樹脂組成物がそれ自体流動性を有している場合、溶媒を用いてワニス化しなくてもよい。この場合、硬化性樹脂組成物を繊維基材に含浸した後、硬化性樹脂組成物が流動しなくなるまで所定温度で加熱することが好ましい。 In addition, when curable resin composition itself has fluidity | liquidity, it is not necessary to varnish using a solvent. In this case, after impregnating the fiber base material with the curable resin composition, it is preferable to heat at a predetermined temperature until the curable resin composition does not flow.
図2は、本発明の金属箔張積層板の好適な一実施形態を示す部分断面図である。図2に示す金属箔張積層板200は、1枚のプリプレグ100を加熱及び加圧して得られる基板30と、基板30の両面に密着して設けられた2枚の金属箔10とで構成される。
FIG. 2 is a partial cross-sectional view showing a preferred embodiment of the metal foil-clad laminate of the present invention. A metal foil-clad
金属箔張積層板200は、例えば、プリプレグ100の両面に金属箔を重ね、これを加熱及び加圧して、プリプレグ100中の硬化性樹脂組成物を硬化することによって得られる。このときの加熱は、好ましくは100〜250℃、より好ましくは100〜200℃の範囲の温度で行う。また、加圧は、好ましくは0.5MPa〜20MPa、より好ましくは1MPa〜8MPa(10kgf/cm2〜80kgf/cm2)の範囲の圧力で行う。
The metal foil-clad
金属箔10としては、銅箔やアルミニウム箔が一般的に用いられるが、銅箔が好ましい。銅箔としては、銅張積層板に通常用いられている、3〜200μmの厚さのものを使用できるが、金属箔張積層板の柔軟性を高めるために、その厚さは3〜18μmであることがより好ましい。あるいは、ニッケル、ニッケル−リン、ニッケル−スズ合金、ニッケル−鉄合金、鉛、鉛−スズ合金等を中間層とし、この両面に0.5〜15μmの銅層と10〜300μmの銅層を設けた3層構造の複合箔あるいはアルミニウムと銅箔とを複合した2層構造の複合箔を用いることもできる。
As the
金属箔張積層板の実施形態は、上記のような態様に限定されない。例えば、複数枚のプリプレグ100を用いて、基板を多層の繊維強化樹脂層からなるものとしてもよいし、基板の片側のみに金属箔を設けてもよい。
The embodiment of the metal foil-clad laminate is not limited to the above aspect. For example, a plurality of
本実施形態の金属箔張積層板は、優れたはんだ耐熱性を示すものである。例えば、288℃のはんだ浴中に、この金属箔張積層板を浸漬すると、浸漬してから金属箔張積層板に膨れの発生が認められるまで60秒以上経過し、より好適なものでは180秒以上経過する。 The metal foil-clad laminate of the present embodiment exhibits excellent solder heat resistance. For example, when this metal foil-clad laminate is immersed in a solder bath at 288 ° C., 60 seconds or more elapse after the immersion until the occurrence of swelling in the metal foil-clad laminate is recognized, and more preferably 180 seconds. More than has passed.
本実施形態の樹脂付金属箔は、上述の硬化性樹脂組成物からなる樹脂膜と、当該樹脂膜の少なくとも一方面上に設けられた金属箔とを備えるものである。かかる樹脂付金属箔は、上述の金属箔10と同様の金属箔上に硬化性樹脂組成物又は硬化性樹脂組成物のワニスを塗布して、所定温度で加熱することにより得られる。あるいは予め硬化性樹脂組成物をフィルム状に成形して得られる樹脂フィルムを、金属箔上に配置して所定温度、所定圧力で加熱及び加圧して、樹脂付金属箔を作製してもよい。
The metal foil with resin of the present embodiment includes a resin film made of the curable resin composition described above and a metal foil provided on at least one surface of the resin film. Such a metal foil with resin is obtained by applying a curable resin composition or a varnish of the curable resin composition on a metal foil similar to the
図3は、本発明のプリント配線板の好適な一実施形態を示す部分断面図である。図3に示すプリント配線板300は、上記の基板30と、基板30の両面に設けられパターン化された金属箔で形成される配線パターン11とで主として構成されている。また、基板30をその主面に略直行する方向に貫通する複数の貫通孔70が形成されており、この貫通孔70の孔壁には所定の厚さの金属めっき層60が形成されている。プリント配線板300は、上記の金属箔張積層板200に配線パターンを形成して得られる。配線パターンの形成は、サブトラクティブ法等の従来公知の方法によって行うことができる。プリント配線板300は、いわゆるフレキシブルプリント配線板として特に好適に用いられる。
FIG. 3 is a partial cross-sectional view showing a preferred embodiment of the printed wiring board of the present invention. A printed
以上、本発明の好適な実施形態について説明したが、本発明は上記実施形態に限定されるものではない。 The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment.
以下、実施例によって本発明を更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples.
(実施例1)
以下の(a)〜(e)成分を配合後、混合撹拌し、そこにメチルエチルケトンを添加して、25℃における粘度が700cPとなるように調整し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(a)成分:HTR860P3(グリシジルアクリレートを含有するアクリル重合体、ナガセケムテックス社製、商品名)を樹脂固形分で15質量部、
(b)成分:エピコート5051(臭素化ビスフェノールA型エポキシ樹脂、ジャパンエポキシレジン社製、商品名、エポキシ基当量600〜650g/eq)を樹脂固形分で100質量部、
(c)成分:VP6371(ノボラック型フェノール樹脂、日立化成工業社製、商品名、フェノール性水酸基当量104〜108g/eq)を樹脂固形分で20質量部、
(d)成分:硬化促進剤として2E4MZ(イミダゾール化合物、四国化成工業社製、商品名)を0.5質量部、
(e)成分:チオール化合物としてγ−メルカプトプロピルトリメトキシシランを2質量部。
Example 1
After blending the following components (a) to (e), mixing and stirring the mixture, adding methyl ethyl ketone thereto, adjusting the viscosity at 25 ° C. to 700 cP, the printed circuit board thermosetting resin composition A varnish was obtained.
(A) Component: 15 parts by mass of HTR860P3 (acrylic polymer containing glycidyl acrylate, manufactured by Nagase ChemteX Corporation, trade name) in terms of resin solids,
(B) component: Epicoat 5051 (brominated bisphenol A type epoxy resin, manufactured by Japan Epoxy Resin Co., Ltd., trade name, epoxy group equivalent 600 to 650 g / eq) in 100 parts by mass of resin solids,
(C) Component: 20 parts by mass of VP 6371 (novolac type phenol resin, manufactured by Hitachi Chemical Co., Ltd., trade name, phenolic hydroxyl group equivalent of 104 to 108 g / eq) in terms of resin solids,
(D) Component: 0.5 part by mass of 2E4MZ (imidazole compound, manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name) as a curing accelerator,
(E) Component: 2 parts by mass of γ-mercaptopropyltrimethoxysilane as a thiol compound.
(実施例2)
(a)成分の配合量を樹脂固形分で15質量部に代えて樹脂固形分で120質量部とした以外は実施例1と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Example 2)
(A) The varnish of the thermosetting resin composition for printed wiring boards was changed in the same manner as in Example 1 except that the blending amount of the component was changed to 15 parts by mass with resin solids and 120 parts by mass with resin solids. Obtained.
(実施例3)
以下の(a)〜(e)成分を配合後、混合撹拌し、そこにメチルエチルケトンを添加して、25℃における粘度が700cPとなるように調整し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(a)成分:HTR860P3(グリシジルアクリレートを含有するアクリル重合体、ナガセケムテックス社製、商品名)を樹脂固形分で30質量部、
(b)成分:エピコート828(ビスフェノールA型エポキシ樹脂、ジャパンエポキシレジン社製、商品名、エポキシ基当量184〜194g/eq)を樹脂固形分で100質量部、
(c)成分:ファイヤーガード2000(臭素化ビスフェノールA、帝人化成社製、商品名、フェノール性水酸基当量274〜278g/eq)を樹脂固形分で150質量部、
(d)成分:硬化促進剤として2E4MZ(イミダゾール化合物、四国化成工業社製、商品名)を0.5質量部、
(e)成分:チオール化合物としてγ−メルカプトプロピルトリメトキシシランを1質量部。
(Example 3)
After blending the following components (a) to (e), mixing and stirring the mixture, adding methyl ethyl ketone thereto, adjusting the viscosity at 25 ° C. to 700 cP, the printed circuit board thermosetting resin composition A varnish was obtained.
(A) Component: 30 parts by mass of HTR860P3 (acrylic polymer containing glycidyl acrylate, manufactured by Nagase ChemteX Corporation, trade name) in terms of resin solids,
(B) component: Epicoat 828 (bisphenol A type epoxy resin, manufactured by Japan Epoxy Resin Co., Ltd., trade name, epoxy group equivalent 184 to 194 g / eq) in 100 parts by mass of resin solids,
(C) component: Fireguard 2000 (brominated bisphenol A, manufactured by Teijin Chemicals Ltd., trade name, phenolic hydroxyl group equivalent: 274 to 278 g / eq) in resin solids of 150 parts by mass,
(D) Component: 0.5 part by mass of 2E4MZ (imidazole compound, manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name) as a curing accelerator,
(E) Component: 1 part by mass of γ-mercaptopropyltrimethoxysilane as a thiol compound.
(実施例4)
(a)成分の配合量を樹脂固形分で30質量部に代えて樹脂固形分で250質量部とした以外は実施例3と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
Example 4
(A) The varnish of the thermosetting resin composition for printed wiring boards was changed in the same manner as in Example 3 except that the blending amount of the component was changed to 30 parts by mass with resin solids and 250 parts by mass with resin solids. Obtained.
(実施例5)
(e)成分をγ−メルカプトプロピルトリメトキシシラン2質量部に代えてo−アミノチオフェノール2質量部とした以外は実施例2と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Example 5)
(E) Varnish of thermosetting resin composition for printed wiring boards in the same manner as in Example 2 except that 2 parts by mass of γ-mercaptopropyltrimethoxysilane was used instead of 2 parts by mass of o-aminothiophenol. Got.
(実施例6)
(e)成分をγ−メルカプトプロピルトリメトキシシラン2質量部に代えて、γ−メルカプトプロピルトリメトキシシランを1質量部及び、o−アミノチオフェノールを1質量部とした以外は実施例2と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Example 6)
(E) As in Example 2, except that 2 parts by mass of γ-mercaptopropyltrimethoxysilane was used instead of 1 part by mass of γ-mercaptopropyltrimethoxysilane and 1 part by mass of o-aminothiophenol. Thus, a varnish of a thermosetting resin composition for a printed wiring board was obtained.
(比較例1)
(a)成分及び(e)成分を配合しない以外は実施例1と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Comparative Example 1)
A varnish of a thermosetting resin composition for a printed wiring board was obtained in the same manner as in Example 1 except that the component (a) and the component (e) were not blended.
(比較例2)
(a)成分を配合しない以外は実施例1と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Comparative Example 2)
(A) The varnish of the thermosetting resin composition for printed wiring boards was obtained like Example 1 except not mix | blending a component.
(比較例3)
(e)成分を配合しない以外は実施例1と同様にして、プリント配線板用熱硬化性樹脂組成物のワニスを得た。
(Comparative Example 3)
(E) The varnish of the thermosetting resin composition for printed wiring boards was obtained like Example 1 except not mix | blending a component.
[プリプレグ及び金属箔張積層板の作製]
上記実施例及び比較例で調製したワニスを、それぞれ、厚さ0.04mmのガラスクロス「#1037」(旭シュエーベル株式会社製、商品名)に、ワニスの固形分とガラスクロスとの質量比が7:10となるように含浸塗工機により含浸後、150℃で5分間熱風乾燥することにより溶媒を除去して、プリプレグを得た。得られたプリプレグの両面に、厚みが18μmの電解銅箔「F2−WS−18」(古河サーキットフォイル株式会社製、商品名、十点平均表面粗さRz=2.0〜3.0)をその接着面がプリプレグと合わさるように重ねた積層体を、両側から170℃で90分間、圧力4.0MPaの真空プレス条件で加熱及び加圧して、金属箔張積層板である両面銅張積層板を作製した。
[Preparation of prepreg and metal foil-clad laminate]
The varnishes prepared in the above Examples and Comparative Examples were each made into 0.04 mm thick glass cloth “# 1037” (trade name, manufactured by Asahi Schwer, Inc.), and the mass ratio between the solid content of the varnish and the glass cloth was After impregnation with an impregnation coating machine so as to be 7:10, the solvent was removed by drying with hot air at 150 ° C. for 5 minutes to obtain a prepreg. On both surfaces of the obtained prepreg, an electrolytic copper foil “F2-WS-18” having a thickness of 18 μm (manufactured by Furukawa Circuit Foil Co., Ltd., trade name, 10-point average surface roughness Rz = 2.0 to 3.0). Double-sided copper-clad laminates that are metal foil-clad laminates by heating and pressurizing the laminated body so that the adhesive surfaces are combined with the prepreg from both sides at 170 ° C. for 90 minutes under a vacuum pressure of 4.0 MPa. Was made.
<プリプレグ及び両面銅張積層板の評価>
〔可とう性の評価〕
プリプレグ、及び両面銅張積層板の銅箔を全面エッチングした配線板から、それぞれ幅10mm×長さ100mmのサイズの試験片を切り出した。これらの試験片の上に5mm厚の矩形のアルミ板を、その長さ方向が試験片の長さ方向と直交するように配置した。そして、アルミ板の縁端部を支点として、そこから試験片を上方に90°折り曲げた際の、クラックの発生の有無を観察して、以下のとおり評価した。結果を表1、2に示す。
○:異常なし、
△:一部クラックにより白化、
×:全面クラックにより白化。
<Evaluation of prepreg and double-sided copper-clad laminate>
[Evaluation of flexibility]
Test pieces each having a width of 10 mm and a length of 100 mm were cut out from the prepreg and a wiring board obtained by etching the copper foil of the double-sided copper-clad laminate. A rectangular aluminum plate having a thickness of 5 mm was placed on these test pieces so that the length direction thereof was orthogonal to the length direction of the test pieces. Then, using the edge of the aluminum plate as a fulcrum, the presence or absence of cracks was observed when the test piece was bent upward 90 ° therefrom, and evaluated as follows. The results are shown in Tables 1 and 2.
○: No abnormality
Δ: Whitening due to some cracks
X: Whitening due to cracks on the entire surface.
〔はんだ耐熱性の評価〕
両面銅張積層板を50mm四方の正方形に切り出して試験片を得た。その試験片を288℃のはんだ浴中に浸漬して、その時点から試験片の膨れが目視で認められる時点までに経過した時間を測定した。結果を表1、2に示す。
[Evaluation of solder heat resistance]
A double-sided copper-clad laminate was cut into a 50 mm square to obtain a test piece. The test piece was immersed in a solder bath at 288 ° C., and the time elapsed from that point to the point when the swelling of the test piece was visually observed was measured. The results are shown in Tables 1 and 2.
〔基板に対する銅箔の接着性の評価〕
両面銅張積層板の銅箔を部分的にエッチングして、1mm幅の銅箔ラインを形成した。次に、銅箔ラインを、接着面に対して90°方向に50mm/分の速度で引き剥がして、その際の荷重を測定し、最大荷重を引き剥がし強さ(銅箔接着性)とした。結果を表1、2に示す。
[Evaluation of adhesion of copper foil to substrate]
The copper foil of the double-sided copper clad laminate was partially etched to form a 1 mm wide copper foil line. Next, the copper foil line was peeled off at a speed of 50 mm / min in the direction of 90 ° with respect to the bonding surface, the load at that time was measured, and the maximum load was peeled off to determine the strength (copper foil adhesiveness). . The results are shown in Tables 1 and 2.
表1、2に示した結果から明らかなように、実施例1〜6の硬化性樹脂組成物によれば、比較例1〜3の硬化性樹脂組成物と比較して折り曲げ特性、耐熱性及び銅箔との接着性を同時に発現できることが確認された。 As is clear from the results shown in Tables 1 and 2, according to the curable resin compositions of Examples 1 to 6, the bending characteristics, heat resistance and the curable resin compositions of Comparative Examples 1 to 3 were compared. It was confirmed that the adhesiveness with the copper foil can be expressed simultaneously.
10…金属箔、11…配線パターン、30…基板、60…金属めっき層、70…貫通孔、100…プリプレグ、200…金属箔張積層板、300…プリント配線板。
DESCRIPTION OF
Claims (14)
(b)成分:エポキシ樹脂と、
(c)成分:フェノール樹脂と、
(d)成分:硬化促進剤と、
(e)成分:チオール化合物と、
を含有するプリント配線板用硬化性樹脂組成物。 (A) component: an acrylic polymer having a monomer unit derived from glycidyl (meth) acrylate;
(B) component: an epoxy resin;
(C) component: phenolic resin,
(D) component: a curing accelerator;
(E) component: a thiol compound;
A curable resin composition for printed wiring boards, comprising:
当該基板の少なくとも一方面上に設けられた、金属からなる配線パターンと、
を備えるプリント配線板。
A substrate according to claim 11;
A wiring pattern made of metal provided on at least one surface of the substrate;
A printed wiring board comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006107884A JP4839934B2 (en) | 2005-05-13 | 2006-04-10 | Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin, and printed wiring board |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005141229 | 2005-05-13 | ||
JP2005141229 | 2005-05-13 | ||
JP2006107884A JP4839934B2 (en) | 2005-05-13 | 2006-04-10 | Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin, and printed wiring board |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011170438A Division JP2012025161A (en) | 2005-05-13 | 2011-08-03 | Metal foil with resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006342334A true JP2006342334A (en) | 2006-12-21 |
JP4839934B2 JP4839934B2 (en) | 2011-12-21 |
Family
ID=37639520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006107884A Active JP4839934B2 (en) | 2005-05-13 | 2006-04-10 | Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin, and printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4839934B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009028271A1 (en) * | 2007-08-28 | 2009-03-05 | Three Bond Co., Ltd. | Photocurable and thermosetting composition, cured product thereof, and curing method |
JP2011127074A (en) * | 2009-12-21 | 2011-06-30 | Risho Kogyo Co Ltd | Prepreg, laminated board, and metal foil-clad laminate |
WO2011125821A1 (en) * | 2010-03-31 | 2011-10-13 | 太陽ホールディングス株式会社 | Thermosetting resin composition and printed wiring board |
JP2012177877A (en) * | 2011-02-04 | 2012-09-13 | Sekisui Chem Co Ltd | White-colored substrate and display device |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04132729A (en) * | 1990-09-25 | 1992-05-07 | Sanyo Chem Ind Ltd | Flattening material and curing thereof |
WO2001060938A1 (en) * | 2000-02-15 | 2001-08-23 | Hitachi Chemical Co., Ltd. | Adhesive composition, process for producing the same, adhesive film made with the same, substrate for semiconductor mounting, and semiconductor device |
JP2002060716A (en) * | 2000-08-24 | 2002-02-26 | Hitachi Chem Co Ltd | Low-elastic adhesive, low-elastic adhesive member, substrate for loading semiconductor having low-elastic adhesive member and semiconductor device using the same |
JP2002060467A (en) * | 2000-08-15 | 2002-02-26 | Jsr Corp | Thermosetting resin composition and its cured item |
JP2002222819A (en) * | 2001-01-29 | 2002-08-09 | Hitachi Chem Co Ltd | Adhesive film, substrate for loading semiconductor chip and semiconductor device |
JP2002226800A (en) * | 2001-02-05 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive sheet, method for using the same and semiconductor device |
JP2004051689A (en) * | 2002-07-17 | 2004-02-19 | Sumitomo Chem Co Ltd | Prepreg and substrate material |
-
2006
- 2006-04-10 JP JP2006107884A patent/JP4839934B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04132729A (en) * | 1990-09-25 | 1992-05-07 | Sanyo Chem Ind Ltd | Flattening material and curing thereof |
WO2001060938A1 (en) * | 2000-02-15 | 2001-08-23 | Hitachi Chemical Co., Ltd. | Adhesive composition, process for producing the same, adhesive film made with the same, substrate for semiconductor mounting, and semiconductor device |
JP2002060467A (en) * | 2000-08-15 | 2002-02-26 | Jsr Corp | Thermosetting resin composition and its cured item |
JP2002060716A (en) * | 2000-08-24 | 2002-02-26 | Hitachi Chem Co Ltd | Low-elastic adhesive, low-elastic adhesive member, substrate for loading semiconductor having low-elastic adhesive member and semiconductor device using the same |
JP2002222819A (en) * | 2001-01-29 | 2002-08-09 | Hitachi Chem Co Ltd | Adhesive film, substrate for loading semiconductor chip and semiconductor device |
JP2002226800A (en) * | 2001-02-05 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive sheet, method for using the same and semiconductor device |
JP2004051689A (en) * | 2002-07-17 | 2004-02-19 | Sumitomo Chem Co Ltd | Prepreg and substrate material |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009028271A1 (en) * | 2007-08-28 | 2009-03-05 | Three Bond Co., Ltd. | Photocurable and thermosetting composition, cured product thereof, and curing method |
JP2011127074A (en) * | 2009-12-21 | 2011-06-30 | Risho Kogyo Co Ltd | Prepreg, laminated board, and metal foil-clad laminate |
WO2011125821A1 (en) * | 2010-03-31 | 2011-10-13 | 太陽ホールディングス株式会社 | Thermosetting resin composition and printed wiring board |
JP2012177877A (en) * | 2011-02-04 | 2012-09-13 | Sekisui Chem Co Ltd | White-colored substrate and display device |
Also Published As
Publication number | Publication date |
---|---|
JP4839934B2 (en) | 2011-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5082373B2 (en) | Resin composition for printed wiring board, prepreg, substrate, metal foil-clad laminate, metal foil with resin, and printed wiring board | |
JP6041069B2 (en) | Resin composition, prepreg, metal foil-clad laminate, resin composite sheet, and printed wiring board | |
JP2007146121A (en) | Viscoelastic resin composition, metal foil-clad laminate using same, prepreg, resin-coated metal foil, and resin film | |
KR101560518B1 (en) | Insulating resin material and multilayer substrate | |
JP7287432B2 (en) | Resin composition, prepreg, resin-coated metal foil, laminate, printed wiring board, and method for producing resin composition | |
JP4586609B2 (en) | Curable resin composition, prepreg, substrate, metal foil-clad laminate and printed wiring board | |
JP5260458B2 (en) | Epoxy resin composition for prepreg and prepreg, laminate and multilayer board using the same | |
JP2008007756A (en) | Viscoelastic resin composition, prepreg, conductor-clad laminate, resin-coated metal foil, and resin film | |
JP2010209140A (en) | Prepreg, metal-clad laminate and printed circuit board | |
JP2006137942A (en) | Prepreg, laminated plate, metal foil-clad laminated plate and printed circuit board using the same | |
JP5935845B2 (en) | Prepreg | |
JP2013023666A (en) | Epoxy resin material, cured product, and plasma-roughened cured product | |
JP4839934B2 (en) | Curable resin composition, prepreg, substrate, metal foil-clad laminate, metal foil with resin, and printed wiring board | |
JP6996500B2 (en) | Prepreg, prepreg with metal foil, laminated board, metal-clad laminated board and printed circuit board | |
JP5799174B2 (en) | Insulating resin film, pre-cured product, laminate and multilayer substrate | |
JP2009185170A (en) | Prepreg, metal-clad laminate and printed wiring board | |
JP6972651B2 (en) | Resin composition, prepreg, metal foil with resin, laminated board and printed wiring board | |
JP6451204B2 (en) | Resin composition, prepreg, metal foil with resin, and laminate and printed wiring board using these | |
JP5056099B2 (en) | Curable resin composition, resin-impregnated base material, prepreg, substrate, metal foil with adhesive layer and printed wiring board | |
JP2012025161A (en) | Metal foil with resin | |
JP2006219664A (en) | Curable resin composition, prepreg, substrate, metal foil-clad laminated plate, metal foil with resin, and printed wiring board | |
JP2008266513A (en) | Curable resin composition, prepreg, laminate, metal foil with adhesive layer, film sheet, and printed wiring board using these materials | |
JP2006219669A (en) | Curable resin composition, prepreg, substrate, metal foil-clad laminated plate, metal foil with resin, and printed wiring board | |
JP7070074B2 (en) | Resin composition, prepreg, metal leaf with resin, laminated board and printed wiring board | |
JP2013258201A (en) | Copper clad laminate sheet and manufacturing method therefor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081224 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101008 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101019 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101216 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110607 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110803 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110906 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110919 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 4839934 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141014 Year of fee payment: 3 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141014 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |