JP2006324119A - 電子銃 - Google Patents

電子銃 Download PDF

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Publication number
JP2006324119A
JP2006324119A JP2005146139A JP2005146139A JP2006324119A JP 2006324119 A JP2006324119 A JP 2006324119A JP 2005146139 A JP2005146139 A JP 2005146139A JP 2005146139 A JP2005146139 A JP 2005146139A JP 2006324119 A JP2006324119 A JP 2006324119A
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JP
Japan
Prior art keywords
lens
electron
electron source
magnetic pole
magnetic
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JP2005146139A
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English (en)
Japanese (ja)
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JP2006324119A5 (enExample
Inventor
Hisaya Murakoshi
久弥 村越
Hiroyuki Nishihara
宏幸 西原
Masaki Hasegawa
正樹 長谷川
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP2005146139A priority Critical patent/JP2006324119A/ja
Publication of JP2006324119A publication Critical patent/JP2006324119A/ja
Publication of JP2006324119A5 publication Critical patent/JP2006324119A5/ja
Pending legal-status Critical Current

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JP2005146139A 2005-05-19 2005-05-19 電子銃 Pending JP2006324119A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Publications (2)

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JP2006324119A true JP2006324119A (ja) 2006-11-30
JP2006324119A5 JP2006324119A5 (enExample) 2008-06-26

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JP2005146139A Pending JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

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JP (1) JP2006324119A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010506700A (ja) * 2006-10-18 2010-03-04 日本碍子株式会社 セラミックフィルタの製造方法
WO2010134259A1 (ja) * 2009-05-22 2010-11-25 株式会社 日立ハイテクノロジーズ 電子銃
US7863565B2 (en) 2007-06-19 2011-01-04 Hitachi, Ltd. Electron beam inspection method and electron beam inspection apparatus
WO2011145645A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP2012089506A (ja) * 2010-10-19 2012-05-10 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 単純化粒子エミッタ及びその動作方法
JP2013225521A (ja) * 2013-06-17 2013-10-31 Hitachi High-Technologies Corp 電子銃
JP2014107143A (ja) * 2012-11-28 2014-06-09 Hitachi Ltd 電子銃および荷電粒子線装置
CN105144336A (zh) * 2013-04-25 2015-12-09 株式会社日立高新技术 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置
EP3399537A1 (en) * 2017-05-03 2018-11-07 FEI Company Gun lens design in a charged particle microscope
DE112017007825T5 (de) 2017-09-07 2020-04-23 Hitachi High-Technologies Corporation Elektronenkanone und Elektronenstrahlanwendungsvorrichtung
WO2021125297A1 (ja) * 2019-12-17 2021-06-24 大学共同利用機関法人自然科学研究機構 球面収差調整カソードレンズ、球面収差補正静電型レンズ、電子分光装置、及び光電子顕微鏡
WO2022169653A1 (en) 2021-02-08 2022-08-11 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes
CN116130323A (zh) * 2021-05-27 2023-05-16 中科晶源微电子技术（北京）有限公司 浸没式磁透镜电子枪及其光轴对中的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01157044A (ja) * 1987-12-11 1989-06-20 Jeol Ltd 静磁界重畳型電子銃
JPH06162979A (ja) * 1992-08-27 1994-06-10 Toshiba Corp 磁界界浸型電子銃
JP2001312986A (ja) * 2000-04-26 2001-11-09 Hitachi Ltd 電子銃

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01157044A (ja) * 1987-12-11 1989-06-20 Jeol Ltd 静磁界重畳型電子銃
JPH06162979A (ja) * 1992-08-27 1994-06-10 Toshiba Corp 磁界界浸型電子銃
JP2001312986A (ja) * 2000-04-26 2001-11-09 Hitachi Ltd 電子銃

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010506700A (ja) * 2006-10-18 2010-03-04 日本碍子株式会社 セラミックフィルタの製造方法
US7863565B2 (en) 2007-06-19 2011-01-04 Hitachi, Ltd. Electron beam inspection method and electron beam inspection apparatus
US8288722B2 (en) 2007-06-19 2012-10-16 Hitachi, Ltd. Electron beam inspection method and electron beam inspection apparatus
WO2010134259A1 (ja) * 2009-05-22 2010-11-25 株式会社 日立ハイテクノロジーズ 電子銃
JP2010272381A (ja) * 2009-05-22 2010-12-02 Hitachi High-Technologies Corp 電子銃
US8669535B2 (en) 2009-05-22 2014-03-11 Hitachi High-Technologies Corporation Electron gun
WO2011145645A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP2011243541A (ja) * 2010-05-21 2011-12-01 Hitachi High-Technologies Corp 電子顕微鏡
JP2012089506A (ja) * 2010-10-19 2012-05-10 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 単純化粒子エミッタ及びその動作方法
US10699867B2 (en) 2010-10-19 2020-06-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Simplified particle emitter and method of operating thereof
JP2014107143A (ja) * 2012-11-28 2014-06-09 Hitachi Ltd 電子銃および荷電粒子線装置
CN105144336B (zh) * 2013-04-25 2017-05-03 株式会社日立高新技术 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置
CN105144336A (zh) * 2013-04-25 2015-12-09 株式会社日立高新技术 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置
JP2013225521A (ja) * 2013-06-17 2013-10-31 Hitachi High-Technologies Corp 電子銃
EP3399537A1 (en) * 2017-05-03 2018-11-07 FEI Company Gun lens design in a charged particle microscope
US10410827B2 (en) 2017-05-03 2019-09-10 Fei Company Gun lens design in a charged particle microscope
DE112017007825T5 (de) 2017-09-07 2020-04-23 Hitachi High-Technologies Corporation Elektronenkanone und Elektronenstrahlanwendungsvorrichtung
US11227740B2 (en) 2017-09-07 2022-01-18 Hitachi High-Tech Corporation Electron gun and electron beam application device
WO2021125297A1 (ja) * 2019-12-17 2021-06-24 大学共同利用機関法人自然科学研究機構 球面収差調整カソードレンズ、球面収差補正静電型レンズ、電子分光装置、及び光電子顕微鏡
JPWO2021125297A1 (enExample) * 2019-12-17 2021-06-24
JP7505794B2 (ja) 2019-12-17 2024-06-25 大学共同利用機関法人自然科学研究機構 球面収差調整カソードレンズ、球面収差補正静電型レンズ、電子分光装置、及び光電子顕微鏡
WO2022169653A1 (en) 2021-02-08 2022-08-11 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes
EP4281988A4 (en) * 2021-02-08 2025-06-04 KLA Corporation High resolution electron beam apparatus with dual-aperture schemes
CN116130323A (zh) * 2021-05-27 2023-05-16 中科晶源微电子技术（北京）有限公司 浸没式磁透镜电子枪及其光轴对中的方法

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