JP2006320791A5 - - Google Patents

Download PDF

Info

Publication number
JP2006320791A5
JP2006320791A5 JP2005144070A JP2005144070A JP2006320791A5 JP 2006320791 A5 JP2006320791 A5 JP 2006320791A5 JP 2005144070 A JP2005144070 A JP 2005144070A JP 2005144070 A JP2005144070 A JP 2005144070A JP 2006320791 A5 JP2006320791 A5 JP 2006320791A5
Authority
JP
Japan
Prior art keywords
coating
tank
reservoir
liquid
coating liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005144070A
Other languages
Japanese (ja)
Other versions
JP4856892B2 (en
JP2006320791A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2005144070A priority Critical patent/JP4856892B2/en
Priority claimed from JP2005144070A external-priority patent/JP4856892B2/en
Publication of JP2006320791A publication Critical patent/JP2006320791A/en
Publication of JP2006320791A5 publication Critical patent/JP2006320791A5/ja
Application granted granted Critical
Publication of JP4856892B2 publication Critical patent/JP4856892B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (6)

塗布液に被塗布体を浸漬し引上げることによって該被塗布体の表面に塗膜を形成する塗布方法において、
該被塗布体を浸漬する塗布槽と、該塗布槽から溢流した塗布液を受ける回収タンクと、液送手段を有する配管を通して該回収タンクから送られた塗布液を受ける貯留槽とを有する塗布装置を用い、
該貯留槽における塗布液を、該被塗布体を浸漬し引上げる間、常時、該貯留槽から溢流させ、
該貯留槽の塗布液溢流面を、該塗布槽の塗布液溢流面よりも高い位置に保持し、
該貯留槽の塗布液溢流面より低い位置から該塗布槽へ塗布液を流入させる
ことによって、塗布液を循環させることを特徴とする塗布方法。 In the coating method of forming a coating film on the surface of the coated body by dipping and lifting the coated body in a coating solution,
Coating having a coating tank for immersing the該被coating material, a recovery tank for receiving the coating solution overflows from the coating chamber, and a reservoir for receiving a coating liquid sent from the recovery tank through a pipe having a liquid feed means Using the device,
The coating solution of the該貯Tomeso, while Ru immersed pulling the member to be coated, at all times, to overflow from該貯Tomeso,
The coating liquid overflow surface of該貯Tomeso, held at a position higher than the coating liquid overflow surface of the coating bath,
A coating method comprising circulating a coating liquid by allowing the coating liquid to flow into the coating tank from a position lower than the coating liquid overflow surface of the storage tank. 前記回収タンクから送られた塗布液を、前記貯留槽の塗布液溢流面より低い位置から前記貯留槽に流入させる請求項１に記載の塗布方法。 The coating method according to claim 1 which causes flowing the collected coating liquid sent from the tank, the storage tank from a lower position than the coating liquid overflow surface of the reservoir. 前記貯留槽における塗布液流入口と流出口を結ぶ直線が、遮蔽物によって遮蔽されている請求項１または２に記載の塗布方法。 The straight line connecting the application liquid inlet and an outlet in the reservoir The method of coating according to 請 Motomeko 1 or 2 that are shielded by the shield. 前記塗布装置が、前記貯留槽の高さ位置を調整する手段を有する請求項１〜３のいずれかに記載の塗布方法。 The coating device, The coating method according to any one of 請 Motomeko 1-3 that have a means for adjusting the height position of the reservoir. 前記貯留槽で溢流した塗布液が、直接、前記塗布槽には送られず、配管を経由して前記回収タンクもしくは前記貯留槽に戻される請求項１〜４のいずれかに記載の塗布方法。 Coating liquid overflowing in the reservoir is directly the not sent to the coating tank, the said recovery tank also properly through the pipe to one of the 請 Motomeko 1-4 which passed back to the reservoir The coating method as described. 請求項１〜５のいずれかに記載の塗布方法を用いて塗膜を形成する工程を有することを特徴とする電子写真感光体の製造方法。 Process for producing an electrophotographic photoreceptor characterized by having a step of forming a coating film using the coating method of according to any one of claims 1-5.
JP2005144070A 2005-05-17 2005-05-17 Coating method and method for producing electrophotographic photosensitive member Expired - Fee Related JP4856892B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005144070A JP4856892B2 (en) 2005-05-17 2005-05-17 Coating method and method for producing electrophotographic photosensitive member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005144070A JP4856892B2 (en) 2005-05-17 2005-05-17 Coating method and method for producing electrophotographic photosensitive member

Publications (3)

Publication Number Publication Date
JP2006320791A JP2006320791A (en) 2006-11-30
JP2006320791A5 true JP2006320791A5 (en) 2008-07-03
JP4856892B2 JP4856892B2 (en) 2012-01-18

Family

ID=37540853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005144070A Expired - Fee Related JP4856892B2 (en) 2005-05-17 2005-05-17 Coating method and method for producing electrophotographic photosensitive member

Country Status (1)

Country Link
JP (1) JP4856892B2 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5990667A (en) * 1982-11-16 1984-05-25 Canon Inc Coating method
JPH02140751A (en) * 1988-11-22 1990-05-30 Canon Inc Coating device for electrophotographic sensitive body
JPH06195704A (en) * 1992-12-28 1994-07-15 Matsushita Electric Ind Co Ltd Apparatus and method for manufacturing magnetic disk
JPH09122551A (en) * 1995-11-01 1997-05-13 Fuji Electric Co Ltd Coating device
JP3937384B2 (en) * 2000-05-29 2007-06-27 富士通株式会社 Lubricant application processing apparatus and method for applying lubricant to magnetic disk medium
JP2003131408A (en) * 2002-08-12 2003-05-09 Fuji Electric Co Ltd Coating applicator for electrophotographic photoreceptor

Similar Documents

Publication Publication Date Title
US8397751B1 (en) Vortex reducer
US10559480B2 (en) Substrate treatment apparatus and substrate treatment method
JP2014158963A5 (en)
JP2016512163A5 (en)
JP5852479B2 (en) Plating device and method for manufacturing plated material
JP2006320791A5 (en)
CN109722703B (en) Chip component electroplating production line
CN105797796A (en) Automatic-water-replenishing constant-temperature water bath box
TWI548460B (en) Cleaning system, cleaning device, and method of using cleaning device
CN106340460B (en) The plain conductor production method of flexible base board
CN208517552U (en) Degreasing tank is used in a kind of plating
CN102553853B (en) Cleaning device and cleaning method
CN104152879B (en) A kind of manufacture method of the Copper Foil being coated with resistive material
JP6277865B2 (en) Surface treatment equipment
JP2012223697A5 (en)
TW201728374A (en) Apparatus and method for the chemical treatment of a semiconductor substrate
TWI310697B (en)
DE11770632T1 (en) Centrifugal casting using coated sand cores
WO2015039259A3 (en) Air washing and humidifying device having a sound absorber module
JP4496540B2 (en) Method for manufacturing photoconductor drum
JP2011128234A5 (en)
CN208356286U (en) A kind of on-line filtration device of plating solution containing diamond dust
JP4934002B2 (en) Plating method
JP2008075123A (en) Overflowed liquid recovery device of overflow vessel
CN207002874U (en) Silicon wafer wool making cleaning machine reaction etching tank