JP2006303355A

JP2006303355A - Cleaning apparatus

Info

Publication number: JP2006303355A
Application number: JP2005126210A
Authority: JP
Inventors: Motoyasu Yoshii; 基也寿芳井
Original assignee: Sharp Corp
Current assignee: Sharp Corp
Priority date: 2005-04-25
Filing date: 2005-04-25
Publication date: 2006-11-02

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning apparatus wherein no drying marks of a cleaning liquid are left on the surface of substrates and the quantity of the cleaning liquid can be saved. SOLUTION: In the cleaning apparatus, a liquid film retaining member 12 is located between a washing tool 14 and air knives 2A, 2B, is opposite to a glass substrate 1 at an interval by a prescribed size, and retains liquid films 15 caused by the cleaning liquid 16 on the surfaces 1A, 1B of the substrate 1. Thus, the liquid film retaining member 12 prevents the cleaning liquid 16 from being polka-dottedly separated at the surface of the substrate 1A, 1B until the substrate 1 is carried from the washing tool 14 to the air knives 2A, 2B. Consequently, the substrate 1 is dried by the air knives 2A, 2B and thereafter, no drying marks are left on the surfaces of the substrate 1, and the surfaces of the substrate 1 can uniformly be dried to prevent deterioration in the surfaces of the substrate 1. COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、基板を洗浄する洗浄装置に関し、一例として、膜形成基板を水で洗浄してから乾燥させるまでの間に基板に水膜を保持する洗浄装置に関する。より詳しくは、一例として、アクティブマトリクス型液晶表示装置に用いられる薄膜トランジスタマトリクス基板などの製造工程でのエッチング、洗浄、乾燥処理の際に使用される洗浄装置に関する。この発明は、例えば、膜形成基板に水膜を保持することで、基板にウォータマークなどの汚染が残ることを防止して、基板欠陥が生じるのを防止する洗浄装置に関する。 The present invention relates to a cleaning apparatus that cleans a substrate, and as an example, relates to a cleaning apparatus that holds a water film on a substrate after the film-formed substrate is cleaned with water and dried. More specifically, as an example, the present invention relates to a cleaning apparatus used in etching, cleaning, and drying processes in a manufacturing process of a thin film transistor matrix substrate used in an active matrix liquid crystal display device. The present invention relates to a cleaning apparatus that prevents, for example, a substrate from being contaminated by holding a water film on a film-formed substrate to prevent contamination such as watermarks from remaining on the substrate.

従来、薄膜トランジスタ基板等のガラス基板を処理する処理装置として、図６Ａに示すように、ローダ１００と処理槽１０１とリンス槽１０２と乾燥槽１０３とアンローダ１０４とを備えたものがある。また、図６Ｂは、上記リンス槽１０２、乾燥槽１０３、アンローダ１０４を側方から見た様子を示し、図６Ｃは、上記リンス槽１０２、乾燥槽１０３、アンローダ１０４を上方から見た様子を示している。上記リンス槽１０２と乾燥槽１０３が洗浄装置を構成している。 Conventionally, as a processing apparatus for processing a glass substrate such as a thin film transistor substrate, there is an apparatus including a loader 100, a processing tank 101, a rinsing tank 102, a drying tank 103, and an unloader 104 as shown in FIG. 6A. FIG. 6B shows a state where the rinsing tank 102, the drying tank 103 and the unloader 104 are viewed from the side, and FIG. 6C shows a state where the rinsing tank 102, the drying tank 103 and the unloader 104 are viewed from above. ing. The rinse tank 102 and the drying tank 103 constitute a cleaning device.

ガラス基板１１１は、ローダ１００からアンローダ１０４まで順次搬送される。このローダ１００から処理槽１０１に搬送されたガラス基板１１１は、この処理槽１０１で洗浄、ウェットエッチング、レジスト剥離等の処理が行われる。次に、図６Ｂに示すように、ガラス基板１１１は、リンス槽１０２に搬送され、リンス液シャワー部１１５により純水等のリンス液１１６が吹き付けられる。これにより、前段の処理槽１０１での処理液がガラス基板１１１から洗い流される。次に、このガラス基板１１１は、搬送ローラ１１４で乾燥槽１０３に搬送され、この乾燥槽１０３において、エアナイフ１１２によって、高圧空気、高圧不活性ガス等が吹き付けられる。これにより、ガラス基板１１１から、リンス液１１６が吹き飛ばされて、ガラス基板１１１の乾燥処理が行われる。そして、この乾燥後のガラス基板１１１は搬送ローラ１１４でアンローダ１０４から搬出される。 The glass substrate 111 is sequentially conveyed from the loader 100 to the unloader 104. The glass substrate 111 conveyed from the loader 100 to the processing tank 101 is subjected to processing such as cleaning, wet etching, and resist peeling in the processing tank 101. Next, as shown in FIG. 6B, the glass substrate 111 is conveyed to the rinsing tank 102, and a rinse liquid 116 such as pure water is sprayed by the rinse liquid shower unit 115. As a result, the processing liquid in the previous processing tank 101 is washed away from the glass substrate 111. Next, the glass substrate 111 is conveyed to the drying tank 103 by the conveying roller 114, and high-pressure air, high-pressure inert gas, or the like is blown by the air knife 112 in the drying tank 103. Thereby, the rinse liquid 116 is blown off from the glass substrate 111, and the drying process of the glass substrate 111 is performed. The dried glass substrate 111 is unloaded from the unloader 104 by the transport roller 114.

この洗浄装置では、図６Ｂに示すように、リンス槽１０２のリンス液シャワー部１１５と乾燥槽１０３のエアナイフ１１２との間にある程度の距離がある。ここで、ガラス基板１１１の最表面に撥水性の膜が露出している場合、上記距離をガラス基板１１１が搬送されている間に、リンス液シャワー部１１５が吐出したリンス液１１６(例えば純水)は上記撥水性の膜で部分的にはじかれて水玉１１３を発生してしまう。この水玉１１３の状態でリンス液１１６がエアナイフ１１２でもって乾燥されると、図６Ｃに示すように、乾燥槽１０３での乾燥のあとにガラス基板１１１にウォータマーク１１７が生じるという問題点がある。 In this cleaning apparatus, as shown in FIG. 6B, there is a certain distance between the rinse liquid shower unit 115 of the rinse tank 102 and the air knife 112 of the drying tank 103. Here, when a water-repellent film is exposed on the outermost surface of the glass substrate 111, the rinsing liquid 116 (for example, pure water) discharged by the rinsing liquid shower unit 115 while the glass substrate 111 is conveyed at the above distance. ) Is partially repelled by the water-repellent film to generate polka dots 113. When the rinsing liquid 116 is dried with the air knife 112 in the state of the polka dots 113, there is a problem in that a watermark 117 is generated on the glass substrate 111 after drying in the drying tank 103 as shown in FIG. 6C.

また、図６Ｂに示すように、リンス槽１０２のリンス液シャワー部１０５と乾燥槽１０３のエアナイフ１１２との間において、ガラス基板１１１の最表面をなす膜がなるべく露出しないようにするためには、大量のリンス液１１６が必要となるという問題点もある。 Further, as shown in FIG. 6B, in order to prevent the film forming the outermost surface of the glass substrate 111 from being exposed as much as possible between the rinsing liquid shower unit 105 of the rinsing tank 102 and the air knife 112 of the drying tank 103. There is also a problem that a large amount of rinsing liquid 116 is required.

また、図６Ｂに示すように、リンス槽１０２のリンス液シャワー部１１５と乾燥槽１０３のエアナイフ１１２との間において、ガラス基板１１１の表面の膜が露出し、ガラス基板１１１の表面と槽１０２,１０３内の空気が接触することにより、ガラス基板１１１の表面が酸化し、基板欠陥を生じるという問題点もある。 Further, as shown in FIG. 6B, the film on the surface of the glass substrate 111 is exposed between the rinse liquid shower unit 115 of the rinsing tank 102 and the air knife 112 of the drying tank 103, and the surface of the glass substrate 111 and the tank 102, When the air in 103 contacts, there is also a problem that the surface of the glass substrate 111 is oxidized to cause a substrate defect.

次に、他の従来技術による洗浄装置を、図７Ａ,図７Ｂに示す。図７Ａは、上記洗浄装置を側方から見た様子を示し、図７Ｂは、上記洗浄装置を上方から見た様子を示す。この洗浄装置は、例えば、特許文献１(特開平４−３３７６３７号公報)に記載されている。この洗浄装置は、リンス槽１０２の構成は図６Ｂに示した洗浄装置と同じだが、乾燥槽１０３に替えて、リンス部１０５Ａと乾燥部１０５Ｂとを有するリンス乾燥槽１０５を備えた点が、前述の図６Ｂの洗浄装置と異なる。この洗浄装置は、上記乾燥部１０５Ｂと上記リンス槽１０２との間に上記リンス部１０５Ａを備えている。 Next, another conventional cleaning apparatus is shown in FIGS. 7A and 7B. FIG. 7A shows a state in which the cleaning device is viewed from the side, and FIG. 7B shows a state in which the cleaning device is viewed from above. This cleaning apparatus is described in, for example, Patent Document 1 (Japanese Patent Laid-Open No. 4-337637). This cleaning apparatus has the same configuration as the cleaning apparatus shown in FIG. 6B except that the rinse tank 102 includes a rinse drying tank 105 having a rinse section 105A and a drying section 105B instead of the drying tank 103. This differs from the cleaning apparatus shown in FIG. 6B. This cleaning apparatus includes the rinse part 105A between the drying part 105B and the rinse tank 102.

このリンス部１０５Ａは、ピンホール式リンス液シャワー部１１８を有し、このシャワー部１１８はガラス基板１１１にリンス液１１６を吹き付ける。そして、次の乾燥部１０５Ｂは、傾斜配置された搬送ローラ１１４でもってガラス基板１１１を搬送方向に向かって登り勾配となるように傾斜させた状態で、エアナイフ１１２から高圧空気、高圧不活性ガス等をガラス基板１１１に吹き付けて、ガラス基板１１１を乾燥させる。 The rinse part 105 A has a pinhole type rinse liquid shower part 118, and the shower part 118 sprays the rinse liquid 116 on the glass substrate 111. Then, the next drying unit 105B is configured such that high-pressure air, high-pressure inert gas, or the like is supplied from the air knife 112 in a state in which the glass substrate 111 is inclined so as to have an upward gradient toward the conveyance direction by the inclined conveyance rollers 114. Is sprayed onto the glass substrate 111 to dry the glass substrate 111.

図７Ａ,図７Ｂに示す従来の洗浄装置では、ガラス基板１１１がリンス部１０５Ａでの水平搬送から乾燥部１０５Ｂでの傾斜搬送に変わる際に、リンス液１１６が重力によりガラス基板１１１の後端から流れ落ち、エアナイフ１１２の直前の箇所１１９でガラス基板１１１の表面に水膜切れが発生する。この水膜切れの状態でエアナイフ１１２で乾燥されると、図７Ｂに示したように、乾燥あとにウォータマーク１１７が生じる問題点がある。 In the conventional cleaning apparatus shown in FIGS. 7A and 7B, when the glass substrate 111 changes from horizontal conveyance at the rinsing unit 105A to inclined conveyance at the drying unit 105B, the rinsing liquid 116 is caused by gravity from the rear end of the glass substrate 111. Flowing down, a water film break occurs on the surface of the glass substrate 111 at a location 119 immediately before the air knife 112. When the air knife 112 is dried in a state where the water film is cut, there is a problem that a watermark 117 is generated after drying, as shown in FIG. 7B.

また、リンス槽１０２のリンス液シャワー部１０５の後段の乾燥部１０５Ａにピンホール式リンス液シャワー部１１８等を設けているので、大量のリンス液１１６が必要になるという問題点もある。また、前述の如く、ガラス基板１１１が水平搬送から傾斜搬送に変わる際に、リンス液１１６が重力により流れ落ち、ガラス基板１１１の表面に水膜切れの箇所１１９が生じ、ガラス基板１１１の表面が露出し、ガラス基板１１１の表面と乾燥部１０５Ｂの槽内の空気が接触することによりガラス基板１１１の表面が酸化し、基板欠陥を生じるという問題点もある。 In addition, since the pinhole type rinsing liquid shower unit 118 and the like are provided in the drying unit 105A downstream of the rinsing liquid shower unit 105 of the rinsing tank 102, there is a problem that a large amount of rinsing liquid 116 is required. Further, as described above, when the glass substrate 111 changes from horizontal conveyance to inclined conveyance, the rinsing liquid 116 flows down due to gravity, and a water film breakage spot 119 is generated on the surface of the glass substrate 111, and the surface of the glass substrate 111 is exposed. However, when the surface of the glass substrate 111 and the air in the tank of the drying unit 105B come into contact with each other, the surface of the glass substrate 111 is oxidized to cause a substrate defect.

次に、さらに別の従来技術の洗浄装置を、図８Ａ,図８Ｂに示す。図８Ａは、上記洗浄装置を側方から見た様子を示し、図８Ｂは、上記洗浄装置を上方から見た様子を示す。この洗浄装置は、例えば、特許文献２(特開平８−２３６４９８号公報)に記載されている。この洗浄装置は、リンス槽１０２の構成は図６Ｂに示した洗浄装置と同じだが、乾燥槽１０３に替えて、乾燥槽１０３Ａを備えた点が、前述の図６Ｂの洗浄装置と異なる。この乾燥槽１０３Ａは、エアナイフ１１２の直前の段階となる位置に、スリット状リンス液シャワー部１２１を配置した点が、前述の乾燥槽１０３と異なる。このスリット状リンス液シャワー部１２１は、スリット状の噴射孔からリンス液１１６を噴射するものである。この乾燥槽１０３Ａでは、リンス液シャワー部１２１がガラス基板１１１に向かって噴射するリンス液１１６と、上記ガラス基板１１１とが挟む領域が搬送方向に向かって先細りとなっている。なお、１０９は、はね返り隔離板である。 Next, still another conventional cleaning apparatus is shown in FIGS. 8A and 8B. FIG. 8A shows a state in which the cleaning device is viewed from the side, and FIG. 8B shows a state in which the cleaning device is viewed from above. This cleaning apparatus is described in, for example, Patent Document 2 (Japanese Patent Laid-Open No. 8-236498). This cleaning apparatus has the same configuration as the cleaning apparatus shown in FIG. 6B except that the rinsing tank 102 is different from the above-described cleaning apparatus shown in FIG. 6B in that a drying tank 103A is provided instead of the drying tank 103. This drying tank 103A is different from the above-described drying tank 103 in that a slit-like rinse liquid shower unit 121 is disposed at a position immediately before the air knife 112. The slit-like rinsing liquid shower unit 121 ejects the rinsing liquid 116 from the slit-like ejection holes. In the drying tank 103A, a region sandwiched between the rinse liquid 116 sprayed by the rinse liquid shower unit 121 toward the glass substrate 111 and the glass substrate 111 is tapered in the transport direction. Reference numeral 109 denotes a rebound separator.

この図８Ａ,図８Ｂに示す従来の洗浄装置では、リンス槽１０２のリンス液シャワー部１１５とエアナイフ１１２の直前の位置にあるスリット状リンス液シャワー部１２１との間にある程度の距離がある。この距離をガラス基板１１１が搬送されている間に、ガラス基板１１１の表面の撥水性の膜が露出してしまい、リンス液１１６(例えば純水)は部分的にはじかれて水玉１１３を発生してしまう。この水玉１１３の状態でリンス液１１６がエアナイフ１１２でもって乾燥されると、ガラス基板１１１の表面に、図８Ｂに示すようにウォータマーク１１７が生じるという問題点がある。 In the conventional cleaning apparatus shown in FIGS. 8A and 8B, there is a certain distance between the rinsing liquid shower unit 115 of the rinsing tank 102 and the slit-like rinsing liquid shower unit 121 located immediately before the air knife 112. While the glass substrate 111 is transported over this distance, the water-repellent film on the surface of the glass substrate 111 is exposed, and the rinsing liquid 116 (for example, pure water) is partially repelled to generate polka dots 113. End up. When the rinse liquid 116 is dried with the air knife 112 in the state of the polka dots 113, there is a problem that a watermark 117 is generated on the surface of the glass substrate 111 as shown in FIG. 8B.

また、リンス槽１０２のリンス液シャワー部１１５の他にエアナイフ１１２の直前の位置にあるスリット状リンス液シャワー部１２１を設けているので、大量のリンス液１１６が必要になるという問題点もある。また、上述の如く、リンス槽１０２のリンス液シャワー部１１５とスリット状リンス液シャワー部１２１との間において、ガラス基板１１１の表面の膜が露出し、ガラス基板１１１の表面と乾燥槽１０３Ａ内の空気が接触することによりガラス基板１１１の表面が酸化し、基板欠陥を生じるという問題点もある。
特開平４−３３７６３７号公報特開平８−２３６４９８号公報 Further, since the slit-like rinsing liquid shower unit 121 located immediately before the air knife 112 is provided in addition to the rinsing liquid shower unit 115 of the rinsing tank 102, there is a problem that a large amount of the rinsing liquid 116 is required. Further, as described above, the film on the surface of the glass substrate 111 is exposed between the rinsing liquid shower portion 115 and the slit-like rinsing liquid shower portion 121 of the rinsing tank 102, and the surface of the glass substrate 111 and the inside of the drying tank 103A are exposed. There is also a problem in that the surface of the glass substrate 111 is oxidized by the contact of air, causing a substrate defect.
JP-A-4-337737 JP-A-8-236498

そこで、この発明の課題は、基板表面に洗浄液の乾燥跡を残さないと共に、洗浄液を節約できる洗浄装置を提供することにある。 Accordingly, an object of the present invention is to provide a cleaning apparatus that does not leave a drying trace of the cleaning liquid on the substrate surface and can save the cleaning liquid.

上記課題を解決するため、この発明の洗浄装置は、洗浄液で基板を洗浄する洗浄ツールと、
上記洗浄ツールに対して上記基板の搬送方向に所定の間隔を隔てて配置されていると共に上記基板を乾燥させる乾燥ツールと、
上記洗浄ツールと上記乾燥ツールとの間に配置されると共に上記基板に対して所定寸法を隔てて対向して、上記基板の表面に上記洗浄液による液膜を保持する液膜保持部材とを備えることを特徴としている。 In order to solve the above problems, a cleaning device of the present invention includes a cleaning tool for cleaning a substrate with a cleaning liquid,
A drying tool which is disposed at a predetermined interval in the transport direction of the substrate with respect to the cleaning tool and dries the substrate;
A liquid film holding member that is disposed between the cleaning tool and the drying tool and that faces the substrate with a predetermined dimension therebetween and holds a liquid film from the cleaning liquid on the surface of the substrate; It is characterized by.

この発明の洗浄装置によれば、上記液膜保持部材は、上記洗浄ツールと上記乾燥ツールとの間に配置されると共に上記基板に対して所定寸法を隔てて対向して、上記基板の表面に上記洗浄液による液膜を保持する。したがって、上記液膜保持部材は、基板が洗浄ツールから乾燥ツールまで搬送されるまでの間に、上記基板の表面で洗浄液が水玉状に分離されるのを防止できる。よって、乾燥ツールで基板を乾燥させた後に、基板の表面に乾燥跡を残さないようにすることができると共に、基板表面を均等に乾燥でき基板表面の劣化を防げる。 According to the cleaning apparatus of the present invention, the liquid film holding member is disposed between the cleaning tool and the drying tool, and is opposed to the substrate with a predetermined dimension on the surface of the substrate. A liquid film by the cleaning liquid is retained. Therefore, the liquid film holding member can prevent the cleaning liquid from being separated into polka dots on the surface of the substrate before the substrate is transported from the cleaning tool to the drying tool. Therefore, after drying a board | substrate with a drying tool, while being able to keep a trace of drying on the surface of a board | substrate, a board | substrate surface can be dried uniformly and deterioration of a board | substrate surface can be prevented.

また、上記液膜保持部材は、上記洗浄ツールと乾燥ツールとの間において、基板に対向して基板表面に洗浄液による液膜を保持するから、基板表面が露出しないための大量の洗浄液が必要となることもなくなる。 Further, since the liquid film holding member holds the liquid film by the cleaning liquid on the substrate surface facing the substrate between the cleaning tool and the drying tool, a large amount of cleaning liquid is required to prevent the substrate surface from being exposed. It will never be.

したがって、この発明の洗浄装置によれば、基板表面に洗浄液の乾燥跡を残さないと共に、洗浄液を節約できる洗浄装置を実現できる。 Therefore, according to the cleaning apparatus of the present invention, it is possible to realize a cleaning apparatus that does not leave a drying trace of the cleaning liquid on the substrate surface and can save the cleaning liquid.

また、一実施形態の洗浄装置では、上記液膜保持部材は、平板状である。 In one embodiment, the liquid film holding member has a flat plate shape.

この実施形態の洗浄装置によれば、上記液膜保持部材は平板状であるので、基板との間に洗浄液による液膜を効率よく保持できる。 According to the cleaning apparatus of this embodiment, since the liquid film holding member has a flat plate shape, the liquid film by the cleaning liquid can be efficiently held between the substrate and the substrate.

また、一実施形態の洗浄装置では、上記液膜保持部材は、上記基板に対して、５乃至１０ｍｍの寸法を隔てて対向するように配置される。 In the cleaning apparatus of one embodiment, the liquid film holding member is disposed to face the substrate with a dimension of 5 to 10 mm.

この実施形態の洗浄装置によれば、上記液膜保持部材は、上記基板に対して、５ｍｍ以上の寸法を隔てて対向しているので、上記基板が例えば薄膜トランジスタマトリクス基板などの場合に、製造工程での膜厚の増加(最大５ｍｍ程度)に対応できる。また、上記液膜保持部材は、上記基板に対して、１０ｍｍ以下の寸法を隔てて対向しているので、洗浄液の必要量を抑えつつ、洗浄液(例えば水)の粘性によって基板の略全面に液(水)膜を保持することができる。 According to the cleaning apparatus of this embodiment, the liquid film holding member is opposed to the substrate with a dimension of 5 mm or more, so that when the substrate is, for example, a thin film transistor matrix substrate, a manufacturing process is performed. It is possible to cope with an increase in film thickness (up to about 5 mm). Further, since the liquid film holding member is opposed to the substrate with a dimension of 10 mm or less, the liquid film holding member is applied to substantially the entire surface of the substrate by the viscosity of the cleaning liquid (for example, water) while suppressing the necessary amount of the cleaning liquid. (Water) film can be retained.

また、一実施形態の洗浄装置では、上記液膜保持部材と上記基板との間に、洗浄液を供給する洗浄液供給部を備える。 In one embodiment, a cleaning liquid supply unit that supplies a cleaning liquid is provided between the liquid film holding member and the substrate.

この実施形態の洗浄装置によれば、洗浄液供給部が、液膜保持部材と基板との間に洗浄液を供給するので、液膜保持部材と基板との間に常に確実に洗浄液の液膜を保持できる。 According to the cleaning apparatus of this embodiment, since the cleaning liquid supply unit supplies the cleaning liquid between the liquid film holding member and the substrate, the liquid film of the cleaning liquid is always reliably held between the liquid film holding member and the substrate. it can.

また、一実施形態の洗浄装置では、上記基板の搬送方向は、鉛直方向、または、水平方向と鉛直方向との中間の傾斜方向である。 Moreover, in the cleaning apparatus of one embodiment, the transport direction of the substrate is a vertical direction or an inclined direction between the horizontal direction and the vertical direction.

この実施形態によれば、基板の搬送方向が鉛直方向である場合には、重力によって、洗浄とリンスの効果を向上させつつ、搬送時に上記液膜保持部材でもって基板表面に洗浄液による液膜を保持して液膜切れを防止できる。また、基板の搬送方向が、傾斜方向である場合には、鉛直方向へ搬送する場合に比べて、液膜切れが起こり難くなる。なお、基板の搬送方向を水平方向とした場合には、重力による液膜切れは殆んど無く、基板を安定かつ容易に搬送できる。 According to this embodiment, when the transport direction of the substrate is a vertical direction, the liquid film by the cleaning liquid is applied to the substrate surface by the liquid film holding member during transport while improving the effect of cleaning and rinsing by gravity. Holding it can prevent the liquid film from being cut. Further, when the substrate transport direction is an inclined direction, the liquid film is less likely to be cut than when the substrate is transported in the vertical direction. When the substrate transport direction is the horizontal direction, there is almost no liquid film breakage due to gravity, and the substrate can be transported stably and easily.

この発明の洗浄装置によれば、液膜保持部材は、洗浄ツールと乾燥ツールとの間に配置されると共に基板に対して所定寸法を隔てて対向して、基板の表面に洗浄液による液膜を保持する。したがって、液膜保持部材は、基板が洗浄ツールから乾燥ツールまで搬送されるまでの間に、基板の表面で洗浄液が水玉状に分離されるのを防止できる。よって、乾燥ツールで基板を乾燥させた後に、基板の表面に乾燥跡を残さないようにすることができると共に、基板表面を均等に乾燥でき基板表面の劣化を防げる。また、液膜保持部材は、洗浄ツールと乾燥ツールとの間において、基板に対向して基板表面に洗浄液による液膜を保持するから、基板表面が露出しないための大量の洗浄液が必要となることもなくなり、洗浄液を節約できる。 According to the cleaning apparatus of the present invention, the liquid film holding member is disposed between the cleaning tool and the drying tool and is opposed to the substrate with a predetermined dimension therebetween, and the liquid film by the cleaning liquid is applied to the surface of the substrate. Hold. Therefore, the liquid film holding member can prevent the cleaning liquid from being separated into polka dots on the surface of the substrate before the substrate is transported from the cleaning tool to the drying tool. Therefore, after drying a board | substrate with a drying tool, while being able to keep a trace of drying on the surface of a board | substrate, a board | substrate surface can be dried uniformly and deterioration of a board | substrate surface can be prevented. In addition, since the liquid film holding member holds the liquid film by the cleaning liquid on the substrate surface facing the substrate between the cleaning tool and the drying tool, a large amount of cleaning liquid is required to prevent the substrate surface from being exposed. This eliminates the need for cleaning solution.

以下、この発明を図示の実施の形態により詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to the illustrated embodiments.

(第１の実施の形態)
図１の斜視図に、この発明の洗浄装置の第１実施形態が備えるリンス/乾燥槽５５の要部の概略構成を示す。また、図２Ａの側面図に、この実施形態の洗浄装置を側方から見た様子を示し、図２Ｂの上面図に、この実施形態の洗浄装置を上方から見た様子を示す。 (First embodiment)
The schematic structure of the principal part of the rinse / drying tank 55 with which 1st Embodiment of the cleaning apparatus of this invention is provided is shown in the perspective view of FIG. 2A shows a side view of the cleaning device of this embodiment, and FIG. 2B shows a top view of the cleaning device of this embodiment viewed from above.

図２Ａおよび図２Ｂに示すように、この実施形態の洗浄装置は、ガラス基板１の搬送方向(進行方向)に沿って順に、処理槽５１とリンス/乾燥槽５５を有する。この処理槽５１は、上記搬送方向に配列された搬送ローラ５４,５４と、この搬送ローラ５４で搬送されるガラス基板１に向かって洗浄液１６を吹き付ける洗浄ツール１４を有する。この実施形態では、洗浄液１６を水とした。 As shown in FIGS. 2A and 2B, the cleaning apparatus of this embodiment includes a processing tank 51 and a rinse / drying tank 55 in order along the transport direction (traveling direction) of the glass substrate 1. The processing tank 51 includes transport rollers 54 and 54 arranged in the transport direction, and a cleaning tool 14 that sprays the cleaning liquid 16 toward the glass substrate 1 transported by the transport roller 54. In this embodiment, the cleaning liquid 16 is water.

また、上記リンス/乾燥槽５５は、上記搬送方向に配列された搬送ローラ５４Ａ,５４Ａ,５４Ｂ,５４Ｂと、この搬送ローラ５４Ａ,５４Ａで搬送されるガラス基板１の上下両面１Ａ,１Ｂに対して所定間隔を隔てて対向するように配置された液膜保持部材１２を有する。また、上記リンス/乾燥槽５５は、液膜保持部材１２に対して搬送方向に隣接する乾燥ツールとしてのエアナイフ２Ａ,２Ｂを有する。このエアナイフ２Ａと２Ｂは、搬送されるガラス基板１の上方と下方に配置され、ガラス基板１の上面１Ａと下面１Ｂに向かって空気を吹き付ける。 The rinsing / drying tank 55 is provided for the transport rollers 54A, 54A, 54B, 54B arranged in the transport direction and the upper and lower surfaces 1A, 1B of the glass substrate 1 transported by the transport rollers 54A, 54A. It has the liquid film holding member 12 arrange | positioned so that it may oppose at predetermined intervals. The rinse / drying tank 55 includes air knives 2A and 2B as drying tools adjacent to the liquid film holding member 12 in the transport direction. The air knives 2A and 2B are arranged above and below the glass substrate 1 to be conveyed, and blow air toward the upper surface 1A and the lower surface 1B of the glass substrate 1.

図１に示すように、この液膜保持部材１２は、全体として、搬送方向(進行方向)に延びる四角形の筒形状である。この液膜保持部材１２は、図２Ａに示すように、ガラス基板１の上側に位置する上側部１２Ａと、ガラス基板１の下側に位置する下側部１２Ｂを有する。図１に示すように、上側部１２Ａと下側部１２Ｂは、幅方向の両側の側部１２Ｃ,１２Ｄでつながっている。この上側部１２Ａは、ガラス基板１の上面１Ａに対して所定寸法を隔てて対向する対向面１２Ａ-１を有し、下側部１２Ｂは、ガラス基板１の下面１Ｂに対して所定寸法を隔てて対向する対向面１２Ｂ-１とを有する。 As shown in FIG. 1, the liquid film holding member 12 as a whole has a rectangular cylindrical shape extending in the transport direction (traveling direction). As shown in FIG. 2A, the liquid film holding member 12 has an upper part 12 A located on the upper side of the glass substrate 1 and a lower side part 12 B located on the lower side of the glass substrate 1. As shown in FIG. 1, the upper side portion 12A and the lower side portion 12B are connected by the side portions 12C and 12D on both sides in the width direction. The upper portion 12A has a facing surface 12A-1 that faces the upper surface 1A of the glass substrate 1 with a predetermined dimension and the lower portion 12B has a predetermined dimension with respect to the lower surface 1B of the glass substrate 1. And opposed surface 12B-1.

図１に示すように、上記液膜保持部材１２の上側部１２Ａの後端部付近には、幅方向に所定の間隔を隔てて複数の貫通穴１７が形成されている。そして、この複数の貫通穴１７を覆うように、上側部１２Ａに洗浄液供給部としての純水供給部１３が取り付けられている。この純水供給部１３は、例えば、配管(図示せず)でもって純水を供給するための純水タンク等に連結されている。この純水供給部１３は、上記複数の貫通穴１７を経由して、液膜保持部材１２とガラス基板１との間に、純水を供給する。これにより、液膜保持部材１２は、搬送されるガラス基板１の両面１Ａ,１Ｂに水膜１５を保持する。 As shown in FIG. 1, a plurality of through holes 17 are formed in the width direction near the rear end portion of the upper portion 12A of the liquid film holding member 12 with a predetermined interval in the width direction. And the pure water supply part 13 as a washing | cleaning liquid supply part is attached to 12 A of upper parts so that these several through-holes 17 may be covered. The pure water supply unit 13 is connected to, for example, a pure water tank for supplying pure water by piping (not shown). The pure water supply unit 13 supplies pure water between the liquid film holding member 12 and the glass substrate 1 through the plurality of through holes 17. Thereby, the liquid film holding member 12 holds the water film 15 on both surfaces 1A and 1B of the glass substrate 1 being conveyed.

また、水膜保持部材１２とガラス基板１とは、水膜１５の厚さが最小となるように最も近づいた位置に設けられる。例えば、水膜保持部材１２の上側部１２Ａの主要部１２ＡＡとガラス基板１との間の距離、および、水膜保持部材１２の下側部１２Ｂの主要部１２ＢＢとガラス基板１との間の距離は、５ｍｍ以上かつ１０ｍｍ以下に設定される。この距離を５ｍｍ以上かつ１０ｍｍ以下に設定したことで、水の粘性により水を基板１の上面１Ａ,１Ｂの全面に広げて、水膜１５が保持されるのに必要な水膜の厚さを確保しつつ、水膜の厚さを最小にして、液膜保持部材１２の対向面１２Ａ-１,対向面１２Ｂ-１とガラス基板１の上面１Ａ,１Ｂとの間の距離を最小にできる。また、上記距離を５ｍｍ以上に設定したことで、上記基板１が例えば薄膜トランジスタマトリクス基板などの場合に、製造工程で上記基板の膜圧が最大５ｍｍ程度増加することに対処できる。 Further, the water film holding member 12 and the glass substrate 1 are provided at the closest positions so that the thickness of the water film 15 is minimized. For example, the distance between the main portion 12AA of the upper side portion 12A of the water film holding member 12 and the glass substrate 1 and the distance between the main portion 12BB of the lower side portion 12B of the water film holding member 12 and the glass substrate 1 Is set to 5 mm or more and 10 mm or less. By setting this distance to 5 mm or more and 10 mm or less, the thickness of the water film required to hold the water film 15 is increased by spreading the water over the entire upper surface 1A, 1B of the substrate 1 due to the viscosity of the water. While ensuring, the thickness of the water film can be minimized, and the distances between the facing surfaces 12A-1 and 12B-1 of the liquid film holding member 12 and the top surfaces 1A and 1B of the glass substrate 1 can be minimized. Further, by setting the distance to 5 mm or more, when the substrate 1 is, for example, a thin film transistor matrix substrate, the film pressure of the substrate can be increased by about 5 mm at the maximum in the manufacturing process.

また、図２Ａに示すように、上記水膜保持部材１２は、処理槽５１の洗浄ツール１４の直後の出口５１Ａの近傍からエアナイフ２Ａ,２Ｂの直前の位置付近まで延在している。そして、この水膜保持部材１２は、搬送方向の寸法が上記ガラス基板１の搬送方向の寸法と略同等である。 Further, as shown in FIG. 2A, the water film holding member 12 extends from the vicinity of the outlet 51A immediately after the cleaning tool 14 of the processing tank 51 to the vicinity of the position immediately before the air knives 2A and 2B. And the dimension of this water film holding member 12 is substantially equivalent to the dimension of the conveyance direction of the said glass substrate 1 in the conveyance direction.

また、図２Ａに示すように、この水膜保持部材１２の上側部１２Ａは、搬送方向の後端で主要部１２ＡＡから下方に突出している突出部１２０を有し、下側部１２Ｂは、搬送方向の後端で主要部１２ＢＢから上方に突出している突出部１２１を有している。また、上記上側部１２Ａは、搬送方向の前端で主要部１２ＡＡから下方に突出している突出部１２２を有し、下側部１２Ｂは、搬送方向の前端で主要部１２ＢＢから上方に突出している突出部１２３を有している。この水膜保持部材１２の上側部１２Ａの突出部１２０,１２２および下側部１２Ｂの突出部１２１,１２３は、主要部１２ＡＡ,１２ＢＢの水膜１５を堰き止めて、流出を防ぐ役目をする。 As shown in FIG. 2A, the upper portion 12A of the water film holding member 12 has a protruding portion 120 that protrudes downward from the main portion 12AA at the rear end in the transport direction, and the lower portion 12B is transported. It has a protruding portion 121 protruding upward from the main portion 12BB at the rear end in the direction. The upper portion 12A has a protruding portion 122 that protrudes downward from the main portion 12AA at the front end in the transport direction, and the lower portion 12B is a protrusion that protrudes upward from the main portion 12BB at the front end in the transport direction. Part 123. The protruding portions 120 and 122 of the upper side portion 12A and the protruding portions 121 and 123 of the lower side portion 12B of the water film holding member 12 serve to block the water film 15 of the main portions 12AA and 12BB and prevent outflow.

上記水膜保持部材１２によれば、洗浄ツール１４とエアナイフ２Ａ,２Ｂとの間で、ガラス基板１の両面１Ａ,１Ｂに常に水膜１５を保持できる。したがって、基板１が洗浄ツール１４から乾燥ツールであるエアナイフ１２まで搬送されるまでの間に、上記基板１の表面１Ａ,１Ｂで洗浄液が水玉状に分離されるのを防止できる。よって、乾燥ツールとしてのエアナイフ２Ａ,２Ｂから基板１の表面１Ａ,１Ｂに高圧空気、高圧不活性ガス等を吹き付けて、基板１の両面１Ａ,１Ｂを乾燥させた後に、基板１の表面１Ａ,１Ｂに乾燥跡を残さないようにすることができる。また、基板表面１Ａ,１Ｂを均等に乾燥でき基板表面１Ａ,１Ｂの劣化を防止できる。 According to the water film holding member 12, the water film 15 can always be held on both surfaces 1A and 1B of the glass substrate 1 between the cleaning tool 14 and the air knives 2A and 2B. Therefore, it is possible to prevent the cleaning liquid from being separated into polka dots on the surfaces 1A and 1B of the substrate 1 before the substrate 1 is transported from the cleaning tool 14 to the air knife 12 as a drying tool. Therefore, after drying both surfaces 1A and 1B of the substrate 1 by blowing high-pressure air, high-pressure inert gas, etc. onto the surfaces 1A and 1B of the substrate 1 from the air knives 2A and 2B as drying tools, the surfaces 1A and 1B of the substrate 1 are dried. It is possible not to leave a dry mark on 1B. In addition, the substrate surfaces 1A and 1B can be evenly dried, and deterioration of the substrate surfaces 1A and 1B can be prevented.

なお、上記実施形態では、洗浄液１６を水としたが、水以外の洗浄液としてもよい。また、上記実施形態では、基板をガラス基板としたがガラス基板に限らず、様々な種類の基板であってもよい。 In the above embodiment, the cleaning liquid 16 is water, but a cleaning liquid other than water may be used. Moreover, in the said embodiment, although the board | substrate was used as the glass substrate, not only a glass substrate but various kinds of board | substrates may be sufficient.

(第２の実施の形態)
次に、図３の斜視図、図４Ａの側面図、図４Ｂの上面図に、この発明の洗浄装置の第２実施形態を示す。この第２実施形態は、第１実施形態が備えた純水供給部１３を備えていない点が前述の第１実施形態と異なる。また、この第２実施形態は、第１実施形態の液膜保持部材１２とは異なる液膜保持部材４２を備える点が前述の第１実施形態と異なる。この第２実施形態は、上記２つの点以外は前述の第１実施形態と同様であるので、この第２実施形態では、第１実施形態と異なる点を説明する。 (Second embodiment)
Next, the second embodiment of the cleaning device of the present invention is shown in the perspective view of FIG. 3, the side view of FIG. 4A, and the top view of FIG. 4B. This 2nd Embodiment differs from the above-mentioned 1st Embodiment by the point which is not provided with the pure water supply part 13 with which 1st Embodiment was provided. The second embodiment is different from the first embodiment described above in that the liquid film holding member 42 is different from the liquid film holding member 12 of the first embodiment. Since the second embodiment is the same as the first embodiment except for the two points described above, the second embodiment will be described with respect to differences from the first embodiment.

図３,図４Ａに示すように、この第２実施形態では、液膜保持部材４２は、上側部４２Ａと下側部４２Ｂを有し、この上側部４２Ａと下側部４２Ｂは、ガラス基板１の上側と下側とに分かれている点で、前述の第１実施形態の上側部１２Ａ,１２Ｂと異なるが、その他の点では、前述の第１実施形態の上側部１２Ａ,１２Ｂと同様である。 As shown in FIGS. 3 and 4A, in the second embodiment, the liquid film holding member 42 has an upper part 42A and a lower part 42B, and the upper part 42A and the lower part 42B are formed on the glass substrate 1. Is different from the upper portions 12A and 12B of the first embodiment described above in that it is divided into an upper side and a lower side, but is otherwise the same as the upper portions 12A and 12B of the first embodiment described above. .

すなわち、この第２実施形態では、上記液膜保持部材４２によれば、洗浄ツール１４とエアナイフ２Ａ,２Ｂとの間で、ガラス基板１の両面１Ａ,１Ｂに常に水膜１５を保持できる。したがって、基板１が洗浄ツール１４から乾燥ツールであるエアナイフ２Ａ,２Ｂまで搬送されるまでの間に、上記基板１の表面１Ａ,１Ｂで洗浄液が水玉状に分離されるのを防止できる。よって、乾燥ツールとしてのエアナイフ２Ａ,２Ｂから高圧空気や高圧不活性ガス等を基板１の両面１Ａ,１Ｂに吹き付けて、基板１の両面１Ａ,１Ｂを乾燥させた後に、基板１の表面１Ａ,１Ｂに乾燥跡を残さないようにすることができる。また、基板表面１Ａ,１Ｂを均等に乾燥でき基板表面１Ａ,１Ｂの劣化を防止できる。 That is, in the second embodiment, the liquid film holding member 42 can always hold the water film 15 on both surfaces 1A and 1B of the glass substrate 1 between the cleaning tool 14 and the air knives 2A and 2B. Therefore, it is possible to prevent the cleaning liquid from being separated into polka dots on the surfaces 1A and 1B of the substrate 1 before the substrate 1 is transported from the cleaning tool 14 to the air knives 2A and 2B which are drying tools. Therefore, after air surfaces 2A and 1B of substrate 1 are dried by blowing high-pressure air, high-pressure inert gas, or the like from air knives 2A and 2B as drying tools onto both surfaces 1A and 1B of substrate 1, surfaces 1A and 1B of substrate 1 are dried. It is possible not to leave a dry mark on 1B. In addition, the substrate surfaces 1A and 1B can be evenly dried, and deterioration of the substrate surfaces 1A and 1B can be prevented.

なお、上記液膜保持部材４２の上側部４２Ａと下側部４２Ｂは、それぞれ、リンス乾燥槽５５Ｎ内の位置を保持するための部材(図示せず)でもって、リンス乾燥槽５５Ｎに固定される。 The upper side portion 42A and the lower side portion 42B of the liquid film holding member 42 are each fixed to the rinse drying tank 55N by members (not shown) for holding the position in the rinse drying tank 55N. .

(第３の実施の形態)
次に、図５Ａ,図５Ｂを参照して、この発明の洗浄装置の第３実施形態を説明する。図５Ａはこの第３実施形態の洗浄装置を側方から見た様子を示す模式的な側面図であり、図５Ｂは上記洗浄装置を正面から見た様子を示す模式的な正面図である。 (Third embodiment)
Next, with reference to FIG. 5A and FIG. 5B, 3rd Embodiment of the washing | cleaning apparatus of this invention is described. FIG. 5A is a schematic side view showing a state in which the cleaning device of the third embodiment is viewed from the side, and FIG. 5B is a schematic front view showing the state in which the cleaning device is viewed from the front.

図５Ａおよび図５Ｂに示すように、この実施形態の洗浄装置は、ガラス基板７３を搬送する方向を、下から上への鉛直方向としている縦型搬送洗浄装置である。この第３実施形態は、ガラス基板７３の搬送方向(進行方向)に沿って順に、処理槽７１とリンス/乾燥槽７２を有する。この処理槽７１は、このガラス基板７３の両側面に配置されると共にガラス基板７３を上記搬送方向に搬送するための搬送ローラ(図示せず)を備える。また、この処理槽７１は、上記搬送ローラで下から上へ搬送されるガラス基板７３に向かって洗浄液７５を吹き付ける洗浄ツール７６を有する。この実施形態では、洗浄液７５を水とした。 As shown in FIGS. 5A and 5B, the cleaning apparatus of this embodiment is a vertical transport cleaning apparatus in which the direction in which the glass substrate 73 is transported is the vertical direction from bottom to top. The third embodiment includes a processing tank 71 and a rinsing / drying tank 72 in order along the conveyance direction (traveling direction) of the glass substrate 73. This processing tank 71 is provided on both side surfaces of the glass substrate 73 and includes a transport roller (not shown) for transporting the glass substrate 73 in the transport direction. Further, the processing tank 71 has a cleaning tool 76 for spraying the cleaning liquid 75 toward the glass substrate 73 transported from the bottom to the top by the transport roller. In this embodiment, the cleaning liquid 75 is water.

また、上記リンス/乾燥槽７２は、処理槽７１と同様の搬送ローラ(図示せず)と、この搬送ローラで搬送されるガラス基板７３の両面７３Ａ,７３Ｂに対して所定間隔を隔てて対向するように配置された液膜保持部材７７Ａ,７７Ｂを有する。また、このリンス/乾燥槽７２は、液膜保持部材７７Ａ,７７Ｂに対して搬送方向に隣接する乾燥ツールとしてのエアナイフ７８Ａ,７８Ｂを有する。このエアナイフ７８Ａ,７８Ｂは、搬送されるガラス基板７３の面７３Ａ,面７３Ｂに対向するように配置され、搬送されるガラス基板７３の面７３Ａと面７３Ｂに向かって高圧空気(または高圧不活性ガス等)を吹き付ける。 The rinsing / drying tank 72 is opposed to a conveying roller (not shown) similar to the processing tank 71 and both surfaces 73A and 73B of the glass substrate 73 conveyed by the conveying roller with a predetermined interval. The liquid film holding members 77A and 77B are arranged as described above. The rinse / dry tank 72 has air knives 78A and 78B as drying tools adjacent to the liquid film holding members 77A and 77B in the transport direction. The air knives 78A and 78B are arranged so as to face the surfaces 73A and 73B of the glass substrate 73 to be conveyed, and high-pressure air (or high-pressure inert gas) toward the surfaces 73A and 73B of the glass substrate 73 to be conveyed. Etc.).

図５Ａおよび図５Ｂに示すように、上記液膜保持部材７７Ａは、ガラス基板７３と略同等の長さを有していると共に、ガラス基板７３と略同等の幅寸法を有している。また、液膜保持部材７７Ｂも、ガラス基板７３と略同等の長さを有していると共に、ガラス基板７３と略同等の幅寸法を有している。 As shown in FIGS. 5A and 5B, the liquid film holding member 77 A has a length substantially the same as the glass substrate 73 and a width dimension substantially the same as the glass substrate 73. In addition, the liquid film holding member 77 B has a length substantially equal to that of the glass substrate 73 and a width dimension substantially equivalent to that of the glass substrate 73.

この液膜保持部材７７Ａは、上下方向の両端に、対向する液膜保持部材７７Ｂに向かって突き出した突出部７７Ａ-１と７７Ａ-２と、この突出部７７Ａ-１と７７Ａ-２との間の主要部７７Ａ-３とを有する。この主要部７７Ａ-３は、搬送されてくるガラス基板７３の面７３Ａに所定寸法を隔てて対向する対向面Ｓ１を有する。この所定寸法は、液膜保持部材７７Ａの主要部７７Ａ-３とガラス基板７３の面７３Ａとの間の液膜８０Ａの厚さができるだけ小さくなるように、一例として、５ｍｍ〜１０ｍｍの範囲内の値に設定する。また、上記突出部７７Ａ-１は、ガラス基板７３の面７３Ａの近傍まで達しており、主要部７７Ａ-３とガラス基板７３の面７３Ａから洗浄液７５が下方へ漏れ難くしている。一方、上側の突出部７７Ａ-２は、主要部７７Ａ-３よりもガラス基板７３の面７３Ａに接近しており、洗浄液７５が上方へあふれ出るのを防いでいる。 The liquid film holding member 77A has protrusions 77A-1 and 77A-2 protruding toward the opposite liquid film holding member 77B at both ends in the vertical direction, and between the protrusions 77A-1 and 77A-2. Main part 77A-3. The main portion 77A-3 has a facing surface S1 that faces the surface 73A of the glass substrate 73 being conveyed with a predetermined dimension therebetween. The predetermined dimension is, for example, within a range of 5 mm to 10 mm so that the thickness of the liquid film 80A between the main portion 77A-3 of the liquid film holding member 77A and the surface 73A of the glass substrate 73 is as small as possible. Set to value. Further, the protrusion 77A-1 reaches the vicinity of the surface 73A of the glass substrate 73, and the cleaning liquid 75 is unlikely to leak downward from the main portion 77A-3 and the surface 73A of the glass substrate 73. On the other hand, the upper protruding portion 77A-2 is closer to the surface 73A of the glass substrate 73 than the main portion 77A-3, and prevents the cleaning liquid 75 from overflowing upward.

一方、上記液膜保持部材７７Ｂは、上下方向の両端に、対向する液膜保持部材７７Ａに向かって突き出した突出部７７Ｂ-１と７７Ｂ-２と、この突出部７７Ｂ-１と７７Ｂ-２との間の主要部７７Ｂ-３とを有する。この主要部７７Ｂ-３は、搬送されてくるガラス基板７３の面７３Ｂに所定寸法を隔てて対向する対向面Ｓ２を有する。この所定寸法は、液膜保持部材７７Ｂの主要部７７Ｂ-３とガラス基板７３の面７３Ｂとの間の液膜８０Ｂの厚さができるだけ小さくなるように、一例として、５ｍｍ〜１０ｍｍの範囲内の値に設定する。また、上記突出部７７Ｂ-１は、ガラス基板７３の面７３Ｂの近傍まで達しており、主要部７７Ｂ-３とガラス基板７３の面７３Ｂから洗浄液７５が下方へ漏れ難くしている。一方、上側の突出部７７Ｂ-２は、主要部７７Ｂ-３よりもガラス基板７３の面７３Ｂに接近しており、洗浄液７５が上方へあふれ出るのを防いでいる。 On the other hand, the liquid film holding member 77B has protrusions 77B-1 and 77B-2 protruding toward the opposite liquid film holding member 77A at both ends in the vertical direction, and the protrusions 77B-1 and 77B-2. And a main portion 77B-3. The main portion 77B-3 has a facing surface S2 that faces the surface 73B of the glass substrate 73 being conveyed with a predetermined dimension therebetween. This predetermined dimension is, for example, within a range of 5 mm to 10 mm so that the thickness of the liquid film 80B between the main portion 77B-3 of the liquid film holding member 77B and the surface 73B of the glass substrate 73 is as small as possible. Set to value. The protrusion 77B-1 reaches the vicinity of the surface 73B of the glass substrate 73, and the cleaning liquid 75 is difficult to leak downward from the main portion 77B-3 and the surface 73B of the glass substrate 73. On the other hand, the upper protruding portion 77B-2 is closer to the surface 73B of the glass substrate 73 than the main portion 77B-3, and prevents the cleaning liquid 75 from overflowing upward.

図５Ａ,図５Ｂに示すように、液膜保持部材７７Ａ,７７Ｂは、突出部７７Ａ-１,７７Ｂ-１と主要部７７Ａ-３,７７Ｂ-３との間に、幅方向に所定の間隔を隔てて複数の貫通穴８２Ａ,８２Ｂが形成されている。そして、この複数の貫通穴８２Ａ,８２Ｂを覆うように、液膜保持部材７７Ａ,７７Ｂに純水供給部８３Ａ,８３Ｂが取り付けられている。この純水供給部８３Ａ,８３Ｂは、上記複数の貫通穴８２Ａ,８２Ｂを経由して、液膜保持部材７７Ａ,７７Ｂとガラス基板７３との間に、純水を供給する。この純水供給部８３Ａ,８３Ｂは、配管等で純水供給タンク(図示せず)に接続されている。 As shown in FIGS. 5A and 5B, the liquid film holding members 77A and 77B have a predetermined interval in the width direction between the projecting portions 77A-1 and 77B-1 and the main portions 77A-3 and 77B-3. A plurality of through holes 82A and 82B are formed at a distance. And the pure water supply parts 83A and 83B are attached to the liquid film holding members 77A and 77B so as to cover the plurality of through holes 82A and 82B. The pure water supply parts 83A and 83B supply pure water between the liquid film holding members 77A and 77B and the glass substrate 73 via the plurality of through holes 82A and 82B. The pure water supply units 83A and 83B are connected to a pure water supply tank (not shown) by piping or the like.

図５Ａに示すように、この液膜保持部材７７Ａ,７７Ｂは、処理槽７１の出口７１Ａ近傍からエアナイフ７８Ａ,７８Ｂの近傍にまで達している。したがって、この液膜保持部材７７Ａ,７７Ｂによれば、洗浄ツール７６とエアナイフ７８Ａ,７８Ｂとの間で、ガラス基板７３の両面７３Ａ,７３Ｂに常に液膜８０Ａ,８０Ｂを保持できる。 As shown in FIG. 5A, the liquid film holding members 77A and 77B reach from the vicinity of the outlet 71A of the processing tank 71 to the vicinity of the air knives 78A and 78B. Therefore, according to the liquid film holding members 77A and 77B, the liquid films 80A and 80B can always be held on both surfaces 73A and 73B of the glass substrate 73 between the cleaning tool 76 and the air knives 78A and 78B.

したがって、この実施形態によれば、ガラス基板７３が洗浄ツール７６から乾燥ツールとしてのエアナイフ７８Ａ,７８Ｂまで搬送されるまでの間に、ガラス基板７３の表面７３Ａ,７３Ｂで洗浄液７５が水玉状に分離されるのを防止できる。よって、この実施形態の洗浄装置のように、縦型搬送を行うことに起因して、水平に搬送を行う場合に比べて、重力によってガラス基板７３の両面７３Ａ,７３Ｂで液膜切れが起こり易い場合であっても、乾燥ツールとしてのエアナイフ７８Ａ,７８Ｂが噴出する高圧空気や高圧不活性ガス等でガラス基板７３の両面７３Ａ,７３Ｂを乾燥させた後に乾燥跡を残さないようにすることができる。また、基板表面７３Ａ,７３Ｂを均等に乾燥でき、基板表面７３Ａ,７３Ｂの劣化を防止できる。 Therefore, according to this embodiment, the cleaning liquid 75 is separated into polka dots on the surfaces 73A and 73B of the glass substrate 73 until the glass substrate 73 is conveyed from the cleaning tool 76 to the air knives 78A and 78B as drying tools. Can be prevented. Therefore, as in the cleaning apparatus of this embodiment, due to the vertical conveyance, the liquid film breakage is likely to occur on both surfaces 73A and 73B of the glass substrate 73 due to gravity, compared to the case where the conveyance is performed horizontally. Even if it is a case, after drying both surfaces 73A and 73B of the glass substrate 73 with the high-pressure air which the air knives 78A and 78B as a drying tool spout, high-pressure inert gas, etc., it is possible to leave no drying marks. . Further, the substrate surfaces 73A and 73B can be evenly dried, and the deterioration of the substrate surfaces 73A and 73B can be prevented.

また、この実施形態では、上記液膜保持部材７７Ａ,７７Ｂで液膜を薄い状態で保持するので、洗浄液７５の消費量を節約できる。したがって、基板７３が大型化した場合にも、洗浄液(あるいはリンス液)７５の消費量を最小限に抑えることができる。 In this embodiment, since the liquid film is held in a thin state by the liquid film holding members 77A and 77B, the consumption of the cleaning liquid 75 can be saved. Therefore, even when the substrate 73 is enlarged, the consumption of the cleaning liquid (or rinsing liquid) 75 can be minimized.

なお、上記実施形態では、洗浄液７５を水としたが、水以外の洗浄液としてもよい。また、上記実施形態では、ガラス基板７３を上下方向に略垂直方向に搬送する場合を説明したが、鉛直方向と水平方向との間の傾斜方向にガラス基板７３を搬送する場合にもこの発明を適用可能である。 In the above embodiment, the cleaning liquid 75 is water. However, a cleaning liquid other than water may be used. Moreover, although the said embodiment demonstrated the case where the glass substrate 73 was conveyed to an up-down direction in a substantially perpendicular direction, this invention is applied also when conveying the glass substrate 73 in the inclination direction between a perpendicular direction and a horizontal direction. Applicable.

この発明の洗浄装置の第１実施形態が備えるリンス/乾燥槽の要部の概略構成を示す斜視図である。It is a perspective view which shows schematic structure of the principal part of the rinse / drying tank with which 1st Embodiment of the cleaning apparatus of this invention is provided. 上記第１実施形態の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that the washing | cleaning apparatus of the said 1st Embodiment was seen from the side. 上記第１実施形態の洗浄装置を上方から見た様子を示す上面図である。It is a top view which shows a mode that the washing | cleaning apparatus of the said 1st Embodiment was seen from upper direction. この発明の洗浄装置の第２実施形態が備えるリンス/乾燥槽の要部の概略構成を示す斜視図である。It is a perspective view which shows schematic structure of the principal part of the rinse / drying tank with which 2nd Embodiment of the cleaning apparatus of this invention is provided. 上記第２実施形態の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that the washing | cleaning apparatus of the said 2nd Embodiment was seen from the side. 上記第２実施形態の洗浄装置を上方から見た様子を示す上面図である。It is a top view which shows a mode that the washing | cleaning apparatus of the said 2nd Embodiment was seen from upper direction. この発明の洗浄装置の第３実施形態の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that the cleaning apparatus of 3rd Embodiment of this invention was seen from the side. 上記第３実施形態の洗浄装置を正面から見た様子を示す正面図である。It is a front view which shows a mode that the washing | cleaning apparatus of the said 3rd Embodiment was seen from the front. 従来の洗浄装置の構成を示す図である。It is a figure which shows the structure of the conventional washing | cleaning apparatus. 上記従来の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that the said conventional cleaning apparatus was seen from the side. 上記従来の洗浄装置を上方から見た様子を示す上面図である。It is a top view which shows a mode that the said conventional cleaning apparatus was seen from upper direction. 他の従来の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that the other conventional washing | cleaning apparatus was seen from the side. 上記他の従来の洗浄装置を上方から見た様子を示す上面図である。It is a top view which shows a mode that said other conventional washing | cleaning apparatus was seen from upper direction. さらに別の従来の洗浄装置を側方から見た様子を示す側面図である。It is a side view which shows a mode that another conventional washing | cleaning apparatus was seen from the side. 上記さらに別の従来の洗浄装置を上方から見た様子を示す上面図である。It is a top view which shows a mode that the said another another conventional cleaning apparatus was seen from upper direction.

Explanation of symbols

１、７３ガラス基板
１Ａ上面
１Ｂ下面
２Ａ、２Ｂ、７８Ａ、７８Ｂエアナイフ(乾燥ツール)
１２、４２、７７Ａ、７７Ｂ液膜保持部材
１２Ａ、４２Ａ上側部
１２Ｂ、４２Ｂ下側部
１２ＡＡ、１２ＢＢ、７７Ａ-３、７７Ｂ-３主要部
１２Ａ-１、１２Ｂ-１対向面
１４、７６洗浄ツール
１５水膜
１６、７５洗浄液
１７貫通穴
５１、７１処理槽
５４搬送ローラ
５５、７２リンス/乾燥槽
７３Ａ、７３Ｂ面
８０Ａ、８０Ｂ液膜 1, 73 Glass substrate 1A Upper surface 1B Lower surface 2A, 2B, 78A, 78B Air knife (drying tool)
12, 42, 77A, 77B Liquid film holding member 12A, 42A Upper part 12B, 42B Lower part 12AA, 12BB, 77A-3, 77B-3 Main part 12A-1, 12B-1 Opposing surface 14, 76 Cleaning tool 15 Water film 16, 75 Cleaning liquid 17 Through hole 51, 71 Processing tank 54 Transport roller 55, 72 Rinse / drying tank 73A, 73B Surface 80A, 80B Liquid film

Claims

A cleaning tool for cleaning the substrate with the cleaning liquid;
A drying tool which is disposed at a predetermined interval in the transport direction of the substrate with respect to the cleaning tool and dries the substrate;
A liquid film holding member that is disposed between the cleaning tool and the drying tool and that faces the substrate with a predetermined dimension therebetween and holds a liquid film from the cleaning liquid on the surface of the substrate; A cleaning device characterized by.

The cleaning device according to claim 1,
The liquid film holding member has a flat plate shape.

The cleaning apparatus according to claim 2,
The liquid film holding member is
A cleaning apparatus, wherein the cleaning apparatus is arranged to face the substrate with a dimension of 5 to 10 mm therebetween.

The cleaning device according to claim 1,
A cleaning apparatus comprising a cleaning liquid supply unit that supplies a cleaning liquid between the liquid film holding member and the substrate.

The cleaning device according to claim 1,
The substrate transporting direction is a vertical direction or an inclination direction intermediate between a horizontal direction and a vertical direction.