JP2006288009A - 高周波電源装置 - Google Patents
高周波電源装置 Download PDFInfo
- Publication number
- JP2006288009A JP2006288009A JP2005101594A JP2005101594A JP2006288009A JP 2006288009 A JP2006288009 A JP 2006288009A JP 2005101594 A JP2005101594 A JP 2005101594A JP 2005101594 A JP2005101594 A JP 2005101594A JP 2006288009 A JP2006288009 A JP 2006288009A
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- JP
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- Prior art keywords
- reflection coefficient
- load
- value
- frequency power
- arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 238000001514 detection method Methods 0.000 claims abstract description 31
- 230000007423 decrease Effects 0.000 claims description 2
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 21
- 230000010355 oscillation Effects 0.000 description 15
- 230000003321 amplification Effects 0.000 description 8
- 238000003199 nucleic acid amplification method Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
Images
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- Plasma Technology (AREA)
- Inverter Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005101594A JP2006288009A (ja) | 2005-03-31 | 2005-03-31 | 高周波電源装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005101594A JP2006288009A (ja) | 2005-03-31 | 2005-03-31 | 高周波電源装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006288009A true JP2006288009A (ja) | 2006-10-19 |
| JP2006288009A5 JP2006288009A5 (enrdf_load_stackoverflow) | 2008-04-03 |
Family
ID=37409344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005101594A Withdrawn JP2006288009A (ja) | 2005-03-31 | 2005-03-31 | 高周波電源装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006288009A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011524601A (ja) * | 2008-02-14 | 2011-09-01 | エム ケー エス インストルメンツ インコーポレーテッド | アーク事象を定量的に測定するための確率的モデルを用いてアークを検出するための広帯域サンプリングの適用 |
-
2005
- 2005-03-31 JP JP2005101594A patent/JP2006288009A/ja not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011524601A (ja) * | 2008-02-14 | 2011-09-01 | エム ケー エス インストルメンツ インコーポレーテッド | アーク事象を定量的に測定するための確率的モデルを用いてアークを検出するための広帯域サンプリングの適用 |
| US8581597B2 (en) | 2008-02-14 | 2013-11-12 | Msk Instruments, Inc. | Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080219 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080219 |
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| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20101203 |