JP2006278685A - Washing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing device that is excellent in productivity and economic efficiency, capable of removing an organic coating film like a resist or the like stuck to an object to be washed such as a spin coater cup, a semiconductor wafer, and a liquid crystal glass substrate in a short period of time, and also, capable of repeatedly using a washing fluid many times without replacing it. <P>SOLUTION: A holding basket for holding the object to be washed is rotatably arranged in a washing chamber. A spraying nozzle is installed in the washing chamber toward the object to be washed. After washing the object to be washed with alkylene carbonate and rinsing it with purified water, the remaining liquid of the object to be washed is removed by jetting out hot air toward the object to be washed. The alkylene carbonate after washing the object to be washed is circulated and reused by decomposing an organic coating film component by ozone in a washing fluid regeneration device. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a cleaning apparatus for an object to be cleaned to which an organic film is attached. In particular, alkylene carbonate is used as a cleaning liquid, and the alkylene carbonate is efficiently brought into contact with the object to be cleaned, thereby reducing the cleaning time. The present invention relates to a cleaning apparatus in which an organic coating component dissolved in alkylene carbonate is decomposed to maintain a cleaning effect for a long time.

  In the manufacturing process of the semiconductor device, the resist is repeatedly applied to the semiconductor wafer in each process. The resist is applied to the semiconductor wafer by rotating the semiconductor wafer with a spin coater and shaking off the resist dropped on the center of the semiconductor wafer by centrifugal force to form a predetermined film thickness on the semiconductor wafer surface. . When applying a resist by spin coating, the resist shaken off by centrifugal force is dropped and collected in a drain cup (spin coater cup), then discharged out of the cup and sent to another processing tank. .

  If such a treatment process is repeated, the remaining resist is gradually deposited on the spin coater cup without being discharged out of the cup. Therefore, the spin coater cup is periodically attached to ethylene glycol, a thinner organic solvent or ozone water. (See Patent Document 1).

  Further, as a method for removing and cleaning an organic film such as a photoresist used for fine processing of an oxide film or a polysilicon film on a semiconductor wafer, for example, sulfuric acid heated to 110 to 140 ° C. called a piranha treatment (3 Or 4 volume) / hydrogen peroxide (1 volume) mixed in a semiconductor wafer for 10 to 20 minutes, in an organic solvent such as n-methylpyrrolidone (NMP), dimethyl sulfoxide (DMSO) or amines After immersing the semiconductor wafer and replacing the organic solvent with isopropyl alcohol (IPA), rinsing with pure water, contacting ozone water or high-concentration ozone gas with the water vapor with the semiconductor wafer, ethylene carbonate and ethylene carbonate A method of immersing in an alkylene carbonate cleaning solution mainly comprising an alkylene carbonate cleaning After washing with a liquid, the method by decomposing organic coating such as a photoresist blowing ozone improves the removal and cleaning performance and the like are known in the in the cleaning liquid.

On the other hand, as a method for promoting cleaning, for example, a method of swinging a cleaning liquid or an object to be cleaned, a method of irradiating an object to be cleaned with ultrasonic waves, a method of combining swinging of a cleaning liquid or an object to be cleaned and ultrasonic irradiation Etc. are generally used.
Japanese Patent Laid-Open No. 2002-205021

  However, each of the conventional cleaning methods has a problem that the cleaning takes time and productivity is low, and the number of times that cleaning with the same cleaning liquid is possible is small.

  The present invention has been made in order to cope with such a problem, and an oil film and a coating film including a resin film such as a resist attached to an object to be cleaned such as a spin coater cup, a semiconductor wafer, and a liquid crystal glass substrate. It is an object of the present invention to provide a cleaning apparatus with excellent productivity and economy that can remove organic coatings such as the above in a short time and can be repeatedly cleaned many times without changing the cleaning liquid.

  The cleaning apparatus according to the present invention includes a cleaning chamber having a drain port at the bottom, a holding cage for holding an object to be cleaned rotatably supported by a vertical rotation shaft in the cleaning chamber, and an injection nozzle in the cleaning chamber. The cleaning liquid spray nozzle header disposed toward the holding basket, the drain in the cleaning chamber and the open / close valve communicate with each other, the cleaning liquid regenerating apparatus for regenerating the cleaning liquid, and the regenerating liquid regenerated in the cleaning liquid regenerating apparatus. And a cleaning liquid recirculation device that pumps the cleaning liquid to the cleaning liquid spray nozzle header.

  According to this cleaning apparatus, the cleaning liquid that has cleaned the object to be cleaned is regenerated by the cleaning liquid regenerating apparatus, and the cleaning object is washed with the regenerated cleaning liquid, so that the cleaning liquid that has been used once is discarded without being discarded. The object to be cleaned can be washed repeatedly. Furthermore, it is possible to spray the cleaning liquid uniformly on the object to be cleaned by rotating the holding basket holding the object to be cleaned with the spray pressure of the regenerated cleaning liquid.

  Further, the cleaning device of the present invention holds a cleaning chamber having a cleaning liquid drain port and a rinsing liquid drain port at the bottom, and an object to be cleaned that is rotatably supported by a vertical rotating shaft in the cleaning chamber. A branch between a cleaning liquid spray nozzle header and a rinsing liquid spray nozzle header arranged with the spray nozzle facing the holding basket in the cleaning chamber, and a cleaning liquid drain port and a rinsing liquid drain port in the cleaning chamber; A switching valve installed, a cleaning liquid regenerator that communicates with the cleaning liquid drain port in the cleaning chamber via the switching valve, and has an ozone releasing device disposed below, and a cleaning liquid regenerated in the cleaning liquid regenerating apparatus A cleaning liquid recirculation device that pressure-feeds the cleaning liquid spray nozzle header, a rinsing liquid supply device that supplies a rinsing liquid to the rinsing liquid spray nozzle header, and a rinsing liquid drain in the cleaning chamber. A drain pipe communicating via a mouth and the switching valve, characterized by comprising a blowing nozzle disposed toward the holding cage in the cleaning chamber.

  According to this cleaning apparatus, the cleaning liquid can be repeatedly used by regenerating the cleaning liquid for cleaning the object to be cleaned with ozone by the cleaning liquid regenerating apparatus. Furthermore, the holding basket in which the article to be cleaned is held can be rotated by the jet pressure from the jet nozzle or the wind pressure from the blower nozzle, and sprayed uniformly on the article to be cleaned. Furthermore, since washing, rinsing, draining, and drying can be performed with the same apparatus, productivity can be increased without taking up a large work space.

  The cleaning liquid reflux apparatus in the present invention may directly supply the cleaning liquid regenerated in the cleaning liquid regenerating apparatus to the cleaning liquid jet nozzle header, but temporarily stores the regenerated cleaning liquid in the cleaning liquid replenishing tank replenished with a new cleaning liquid, You may make it supply to a cleaning liquid injection nozzle header from this cleaning liquid replenishment tank. By supplying to the cleaning liquid jet nozzle header via the cleaning liquid replenishing tank, when the cleaning power is reduced, a new cleaning liquid is added or replaced and the cleaning is continued, so that the cleaning process can always be performed quickly.

  As the cleaning liquid in the present invention, alkylene carbonates such as ethylene carbonate and propylene carbonate can be suitably used. Ethylene carbonate may be used alone, or propylene carbonate may be added to ethylene carbonate. Since ethylene carbonate has a melting point of 36.4 ° C., it is preferable to use a temperature control device provided in the cleaning liquid regenerator and heated in order to maintain the cleaning liquid at the melting point or higher and improve the cleaning power.

  Further, as the cleaning liquid in the present invention, γ-butyrolactone may be added to ethylene carbonate. The organic film attached to the object to be cleaned can be peeled off at room temperature without heating the cleaning solution, and even if the decomposition with ozone is repeated many times, it can have the same detergency as when ethylene carbonate alone is used. .

  In the cleaning liquid regenerator, an ozone exhaust port for releasing excess ozone is provided in the upper part, and communicates with ozone decomposing means for catalytically decomposing ozone. The ozone exhaust port may be further provided in the cleaning chamber.

  According to the cleaning apparatus of the present invention, the organic film attached to the object to be cleaned can be efficiently peeled and dissolved. Further, since the cleaning liquid contaminated by the dissolution of the organic coating is decomposed and reduced in molecular weight in the cleaning liquid regenerating apparatus, it is possible to maintain a strong cleaning power even if it is repeatedly cleaned many times without replacing the cleaning liquid.

  Furthermore, according to the cleaning apparatus of the present invention, the holding basket that holds the object to be cleaned can be rotated, so that the object to be cleaned can be sprayed uniformly from the spray nozzle.

Embodiments of the present invention will be described below with reference to the drawings.
An example of the cleaning apparatus according to the present invention is shown in FIG. FIG. 2 is a top view of the cleaning apparatus shown in FIG.
The main body portion of the cleaning apparatus is composed of a cleaning chamber 1 and a cleaning liquid regenerator 2 installed separately below the cleaning chamber 1.

  A rack 4 (holding basket) that holds an object to be cleaned 3 such as a spin coater cup is disposed at substantially the center of the cleaning chamber 1. The rack 4 can be independently rotated by a rack rotation shaft 5 and a rack rotation bearing 6 provided in the cleaning chamber 1 in the vertical direction.

  As shown in FIG. 2, the cleaning chamber 1 has a sealed box shape with a door 31 through which the object to be cleaned 3 is put in and out. At least one of the four corners of the cleaning chamber 1 has a predetermined linear shape. A cleaning liquid spray nozzle header 8 having a plurality of spray nozzles 7 arranged at intervals is provided. Similarly, a rinsing liquid spray nozzle header 9 in which a plurality of spray nozzles 7 are arranged is installed in at least one of the four corners of the cleaning chamber 1.

  The injection nozzle 7 is installed on the headers 8 and 9 toward the rack 4, but the header 4 is rotated slightly away from the rack rotation shaft 5 in order to rotate the rack 4 by the injection pressure. 8 and 9 are installed. The ejection nozzle 7 is not particularly limited, but it is preferable that the ejection nozzle 7 can uniformly discharge the cleaning liquid and the rinsing liquid in a narrow region. Preferably, a one-fluid type or two-fluid type spray having a hollow cone or full cone spray pattern is used. A cleaning liquid or a rinsing liquid is supplied to the injection nozzle 7 by the pumps 20 and 27 through a pipe line indicated by an arrow. Reference numeral 26 denotes a rinsing liquid supply conduit.

  A blower nozzle 10 is installed in the upper part of the cleaning chamber 1 toward the object to be cleaned 3. The blower nozzle 10 communicates with the blower 12 via the blower air heater 11. The air flow supplied from the blower 12 is heated by the blower air heater 11 to produce hot air. By blowing this warm air from the blowing nozzle 10 toward the object to be cleaned 3 in the cleaning liquid liquid cutting process or the rinsing liquid liquid cutting process, the cleaning liquid or rinsing liquid adhering to the surface of the object to be cleaned 3 is blown downward. Drain the liquid.

  In the present invention, by rotating the rack 4 with the above-described spray pressure from the spray nozzle 7 and the wind pressure from the blower nozzle 10, liquid or air can be sprayed uniformly over the entire object to be cleaned 3. In order to rotate the rack 4 at a constant rotational speed, a brake device that provides a constant frictional resistance may be dynamically connected to the upper end of the rack rotation shaft 5 outside the cleaning chamber 1.

  A cleaning liquid drain port 13 and a rinsing liquid drain port 14 are opened at the bottom of the cleaning chamber 1, and a switching valve 15 is installed at the branch portion. In the present embodiment, as shown in FIG. 3, the switching valve 15 has an operating portion 32 with a rotary actuator, and the operating portion 32 causes the liquid flow to the cleaning liquid drain port 13 side or the rinse liquid drain port 14 side. Can be switched. The cleaning liquid discharge port 13 communicates with the cleaning liquid regenerator 2, and the rinsing liquid discharge port 14 discharges the rinsing liquid through the drain pipe 16.

  By switching the switching valve 15, the liquid can be passed only to the cleaning liquid drain port 13 side or only to the rinse liquid drain port 14 side. For example, in the cleaning process, the switching valve 15 is switched so that the used cleaning liquid passes through the cleaning liquid drain port 13 to open the cleaning liquid drain port 13 side, and the cleaning liquid containing the organic coating component can be discharged. In the rinsing step, the rinsing liquid drain port 14 is opened by switching the switching valve 15 so that the rinsing liquid passes through the rinsing liquid drain port 14, and the used rinsing liquid can be discharged. By switching the switching valve 15 in this way, it is possible to easily prevent the rinse liquid from being mixed into the cleaning liquid regenerator 2. Note that a plurality of switching valves 15 may be provided depending on the number of drainage ports opened at the bottom of the cleaning chamber. Also, the type is not particularly limited. For example, an electrically operated electromagnetic on-off valve, three-way valve, or the like may be used.

  In the cleaning liquid regenerator 2, a temperature control device such as a heater 17 for heating the cleaning liquid to an appropriate temperature is disposed. When ethylene carbonate is used alone as the cleaning liquid, the melting point is 36.4 ° C., and therefore the temperature is kept at 36.4 ° C. or higher. Further, an ozone release device 18 (ozone release device) in which a large number of discharge ports are provided in a hollow tube is disposed at the bottom of the cleaning liquid regenerating device 2. The ozone discharger 18 communicates with an ozone supply pipe 19 that supplies ozone, releases ozone into the used cleaning liquid in the cleaning liquid regenerator 2, and decomposes organic film components dissolved in the cleaning liquid. To do. The cleaning liquid that has been decomposed and regenerated is supplied to the cleaning liquid jet nozzle header 8 by a pump 20 (cleaning liquid recirculation device) via a pipe line indicated by an arrow in FIG. The cleaning liquid regenerated in the cleaning liquid regenerator 2 may be supplied directly to the cleaning liquid jet nozzle header 8. However, when the cleaning effect of the cleaning liquid is reduced, a new cleaning liquid is used to perform the cleaning process quickly. It is also possible to temporarily store the regenerated cleaning liquid in the cleaning liquid replenishing tank in which is supplied and supply the cleaning liquid from the cleaning liquid replenishing tank to the cleaning liquid injection nozzle header 8.

  When the cleaning power of the cleaning liquid in the cleaning liquid regenerator 2 is reduced, the valve 21 provided below is opened and the waste cleaning liquid is sent to the waste cleaning liquid tank 22.

  An ozone exhaust port 23 is opened above each of the cleaning chamber 1 and the cleaning liquid regenerator 2. Excess ozone is sucked from the ozone exhaust port 23, passes through the ozone exhaust pipe 24, is sent to the ozone gas processing tower 25 (ozone decomposition means), is contact-decomposed, and is released into the atmosphere.

  The above-described cleaning method of the object to be cleaned by the cleaning apparatus is performed as follows, for example. In the present invention, the object to be cleaned is cleaned by a cleaning process, a cleaning liquid draining process, a rinsing process, a rinsing liquid draining process and a cleaning liquid ozone treatment process.

<Washing process>
The cleaning liquid injected into the cleaning liquid regenerator 2 is discharged from the spray nozzle 7 of the cleaning liquid spray nozzle header 8 by the pump 20. The cleaning liquid preferably has an injection amount of 30 to 60 L / min and an injection pressure of 0.1 to 0.5 MPa. The rack is rotated at 10 to 50 rpm by the jetting pressure of the cleaning liquid, and the cleaning liquid is uniformly discharged and cleaned on the entire object to be cleaned 3 held in the rack 4. At this time, the switching valve 15 at the bottom of the cleaning chamber 1 is switched to open the cleaning liquid drain port 13 side, and the used cleaning liquid containing the organic coating component is sent to the cleaning liquid regenerator 2. The cleaning liquid sent to the cleaning liquid regenerator 2 is subjected to a decomposition treatment of the organic film component by ozone, supplied to the cleaning liquid injection nozzle header 8 by the pump 20, and then injected again.

  Note that when the object to be cleaned 3 is held in the rack 4 and the object to be cleaned 3 has a bowl shape such as a spin coater cup for resist coating, It is desirable to arrange so that they do not match.

  When ethylene carbonate is used alone as the cleaning liquid, it is preferably heated and used by the heater 17 in the cleaning liquid regenerator 2 or the like. Specifically, it is preferable to use it by heating to a melting point of ethylene carbonate of 36.4 ° C. or higher, and in particular, to prevent solidification during circulation of the cleaning liquid, the deformation of the object to be cleaned 3 by heat is 40 ° C. or higher. In order to prevent this, it is more preferable to use the product by heating in a temperature range of 80 ° C. or lower.

  Further, as the cleaning liquid, γ-butyrolactone may be added to ethylene carbonate. It can have a cleaning power equivalent to that when ethylene carbonate is used alone at room temperature without heating the cleaning liquid. Ethylene carbonate and γ-butyrolactone are preferably blended at a weight ratio of 85/15 (ethylene carbonate 85 wt%, γ-butyrolactone 15 wt%) to 55/45 (ethylene carbonate 55 wt%, γ-butyrolactone 45 wt%).

  The cleaning time is usually from 1 minute to 5 minutes, but it is desirable to change depending on the degree of adhesion of the organic coating. For example, if the amount of organic coating attached is small and the time from the attachment to cleaning is short, it can be cleaned in a short time. If the organic coating is dried and solidified over time, or the amount of organic coating deposited is large, the cleaning time needs to be extended.

  Normally, in the conventional case of performing rocking cleaning using ethylene carbonate as a cleaning liquid, a cleaning time of at least about 20 minutes is required. However, according to the present invention, the cleaning effect equivalent to or higher than 5 minutes can be achieved. Is possible.

<Cleaning liquid draining process>
After cleaning with the cleaning liquid is completed, in order to remove the cleaning liquid adhering to the inner surface of the cleaning chamber 1 and the object to be cleaned 3 and reduce the amount of the cleaning liquid taken out, the air is blown to the inner surface of the cleaning chamber 1 and the object to be cleaned 3 to drain the cleaning liquid. I do. A blower nozzle 10 communicating with the blower 12 through a pipe is installed in the upper part of the cleaning chamber 1. By removing the cleaning liquid adhering to the object 3 to be cleaned, the amount of cleaning liquid taken out can be reduced, and the reduction of the cleaning liquid due to circulating cleaning can be suppressed.

<Rinsing process>
After the cleaning liquid is completely drained, rinsing with pure water is performed for 5 to 20 minutes. The pure water supplied from the rinsing liquid supply device is discharged from the spray nozzle 7 of the rinse liquid spray nozzle header 9 by the pump 27. The rinsing liquid preferably has an injection amount of 5 to 20 L / min and an injection pressure of 0.1 to 0.5 MPa. The rack is rotated at 10 to 50 rpm by the spraying pressure of the rinsing liquid, and the rinsing liquid is sprayed uniformly on the entire object to be cleaned 3 held in the rack 4 and attached with the cleaning liquid. At this time, in order to prevent the waste rinsing liquid from entering the cleaning liquid regenerator 2, the switching valve 15 is switched to open the rinsing liquid discharge port 14 side, and the rinsing liquid is discharged to the cleaning chamber 1 via the drain pipe 16. Drain out.

  As the rinsing liquid, pure water having a specific resistance value of 1 MΩ · cm or more is preferable. The temperature of the rinsing liquid is preferably in the range of 25 to 80 ° C. so as to prevent deformation of the article to be cleaned 3 due to heat and to be advantageous in the rinsing liquid draining process of the next process.

<Rinsing liquid draining process>
After the rinsing with the rinsing liquid (pure water) is completed, the article to be cleaned 3 is dried with hot air of about 60 ° C. for 20 to 40 minutes. Here, the blowing nozzle 10 used in the cleaning liquid draining step is also used. At this time, it is preferable that it is 0.1 to 0.8 m < ³ > / min. The rack 4 is rotated at 10 to 50 rpm by this air volume, and the hot air is uniformly blown to the whole object to be cleaned 3 held in the rack 4 to be dried.

<Ozone treatment process for cleaning liquid>
In the cleaning liquid regenerator 2, the organic coating component (organic matter) in the cleaning liquid is decomposed by ozone released from the ozone discharger 18. The ozone releaser 18 is preferably disposed at the bottom of the cleaning liquid regenerator 2 in order to efficiently decompose organic matter, and discharges air bubbles evenly over as wide an area as possible. Such a decomposition process is performed in each process of a rinse process and a rinse liquid draining process. The cleaning liquid after the decomposition treatment is reused again as a cleaning liquid in the cleaning process.

  On the other hand, surplus ozone gas released from the ozone discharger 18 is sent to the ozone gas treatment tower 25 through the ozone exhaust port 23 at the top of the cleaning chamber 1 and the cleaning liquid regenerator 2 and decomposed to be harmless to the atmosphere. Released. Examples of methods for decomposing excess ozone include activated carbon adsorption decomposition method, heat decomposition method, catalytic decomposition method (manganese dioxide, ferrous oxide, nickel oxide, etc.), chemical solution cleaning method (sodium hydroxide aqueous solution, etc.), chemical solution, etc. A reduction method (reducing agent) and the like can be mentioned, and although not particularly limited, it is preferable to use a catalytic decomposition method from the viewpoint of handling and cost.

  Each of the above steps is programmed in advance in a computer, and these steps are sequentially performed automatically or semi-automatically.

  The cleaning apparatus of the present invention is not particularly limited with respect to an object to be cleaned, and can be applied to an object to be cleaned to which an organic film such as an oil film or a coating including a resin film such as a resist is attached.

Hereinafter, the present invention will be described in detail based on examples.
The cleaning apparatus used in this embodiment has the configuration shown in FIG. The cleaning chamber is a 600 mm × 600 mm × 560 Hmm sealed box with a door of 480 mm × 410 mm. In the cleaning chamber, one cleaning liquid spray nozzle header and one rinse liquid spray nozzle header are installed at the corner. Each nozzle header is provided with five spray nozzles. In the central portion of the cleaning chamber, a rack of 550 mm × 550 mm × 190 Hmm that can accommodate two sets of 8-inch resist coating spin coater cups is rotatably provided. The cleaning liquid regenerator installed below the cleaning chamber is manufactured using a SUS plate having a thickness of 600 mm × 390 mm × 280 Hmm (internal volume: about 65 L) and a SUS-316 material having a thickness of 1 mm.

(Example 1)
Ethylene carbonate 46L (about 60 kg) dissolved by heating at 50 ° C. was poured into the cleaning liquid regenerator. This was heated up to 60 degreeC with the heater. A set of 8-inch resist coating spin coater cups to which about 40 g of novolak-type resist is adhered are accommodated in a rack, the cleaning liquid drain side of the switching valve is opened, and ejected from a spray nozzle by a pump for 30 seconds. The spin coater cup was washed. At this time, the amount of cleaning liquid sprayed was 40 L / min, and the spraying pressure was 0.2 MPa. The rack was rotated at 30 rpm by this spraying pressure, and the entire spin coater cup was cleaned.

After washing with ethylene carbonate, blow off the liquid for 5 minutes with 0.5 m ³ / min air to drain off the ethylene carbonate solution adhering to the wall surface of the washing chamber, spin coater cup, rack, spray nozzle, etc. It was. Thereafter, the rinsing liquid discharge port side of the switching valve is opened, and pure water having a specific resistance value of 1 MΩ · cm is injected into the spin coater cup at 10 L / min and 0.1 MPa for 10 minutes from the rinsing pump. Was rotated at 30 rpm and rinsed so that pure water was applied to the entire spin coater cup.

After rinsing, in order to blow off pure water adhering to the wall surface of the cleaning chamber, spin coater cup, rack, spray nozzle, etc., warm air of 60 ° C. is supplied for 30 minutes at 0.5 m ³ / min. The rack was rotated at 30 rpm, and hot air was blown over the entire spin coater cup. As a result, the novolak resist adhering to the spin coater cup was completely removed, and the spin coater cup could be removed from the cleaning chamber.

In each of the rinsing process and the rinsing liquid draining process, the cleaning liquid regenerating apparatus uses the ozone discharge pipe to release ozone at 8 L / min, 60 g / Nm ³ in order to decompose the novolak resist dissolved in ethylene carbonate in the cleaning process. For 40 minutes. The ethylene carbonate that became reddish brown by dissolution of the novolak resist became a light yellow transparent liquid, and it was confirmed that the novolak resist was decomposed by ozone.

(Example 2)
The ethylene carbonate solution used in Example 1 was dissolved by heating at 50 ° C., and 46 L (about 60 kg) was poured into the cleaning liquid regeneration tank. This was heated up to 60 degreeC with the heater. A set of 8-inch resist coating spin coater cups to which about 40 g of novolak-type resist is adhered are accommodated in a rack, the cleaning liquid drain side of the switching valve is opened, and ejected from a spray nozzle by a pump for 30 seconds. The spin coater cup was washed. At this time, the spraying amount of the cleaning liquid was 40 L / min and the spraying pressure was 0.2 MPa, and the rack was rotated at 30 rpm by this spraying pressure, so that the entire spin coater cup was sprayed.

After washing with ethylene carbonate, to blow off the ethylene carbonate solution adhering to the wall of the washing chamber, spin coater cup, rack, spray nozzle, etc., blow off the liquid with 0.5 m ³ / min of air for 5 minutes. went. Thereafter, the rinsing liquid discharge port side of the switching valve is opened, and pure water having a specific resistance value of 1 MΩ · cm is injected into the spin coater cup at 10 L / min and 0.1 MPa for 10 minutes from the rinsing pump. Was rotated at 30 rpm and rinsed so that pure water was applied to the entire spin coater cup.

After rinsing, hot air of 60 ° C. is supplied at 0.5 m ³ / min for 30 minutes to dry the pure water adhering to the wall surface of the cleaning chamber, spin coater cup, rack, spray nozzle, etc. The rack was rotated at 30 rpm with this air volume, and hot air was blown over the entire spin coater cup. As a result, the spin coater cup taken out from the cleaning chamber completely removed the adhering novolac resist, and the pure water in the rinsing could be taken out by drying.

In each of the rinsing process and the rinsing liquid draining process, the cleaning liquid regenerating apparatus uses 40 g at 60 g / Nm ³ at 8 L / min from the ozone discharge pipe in order to decompose the novolak resist dissolved in ethylene carbonate in the cleaning process. Feed for minutes. Due to the dissolution of the novolak resist, the reddish brown ethylene carbonate turned into a pale yellow transparent liquid, and it was confirmed that the novolac resist was decomposed by ozone.

(Example 3)
6.4 kg of a novolak resist was dissolved and 60 kg of an ethylene carbonate solution subjected to ozone treatment at 30 g / hr for 480 hr was dissolved by heating at 50 ° C. and poured into a cleaning liquid regenerator. The temperature was raised to 60 ° C. with a heater. One set of 8-inch resist coating spin coater cup with about 40 g of novolak resist attached is housed in the rack, the switching valve is opened on the side of the cleaning liquid discharge port, and ejected from the spray nozzle by a pump for 90 seconds. The coater cup was washed. At this time, the spraying amount of the cleaning liquid was 40 L / min and the spraying pressure was 0.2 MPa, and the rack was rotated at 30 rpm by this spraying pressure, so that the entire spin coater cup was sprayed.

After washing with ethylene carbonate, blow off the liquid with air of 0.5 m ³ / min in order to drain the ethylene carbonate solution adhering to the wall surface of the washing chamber, spin coater cup, rack, spray nozzle, etc. Went for a minute. Thereafter, the rinsing liquid discharge port side of the switching valve is opened, and pure water having a specific resistance value of 1 MΩ · cm is injected into the spin coater cup at 10 L / min and 0.1 MPa for 10 minutes from the rinsing pump. Was rotated at 30 rpm and rinsed so that pure water was applied to the entire spin coater cup.

After rinsing, hot air of 60 ° C. is supplied at 0.5 m ³ / min for 30 minutes to dry the pure water adhering to the wall surface of the cleaning chamber, spin coater cup, rack, spray nozzle, etc. The rack was rotated at 30 rpm with this air volume, and hot air was blown over the entire spin coater cup. As a result, the novolac resist adhering to the spin coater cup taken out from the cleaning chamber was completely removed, and the pure water in the rinsing could be taken out by drying.

In each of the rinsing process and the rinsing liquid draining process, the cleaning liquid regenerating apparatus uses 40 g at 60 g / Nm ³ at 8 L / min from the ozone discharge tube in order to decompose the novolak resist dissolved in ethylene carbonate in the cleaning process. Feed for minutes. The ethylene carbonate that became reddish brown by dissolution of the novolak resist became a light yellow transparent liquid, and it was confirmed that the novolak resist was decomposed by ozone.

(Example 4)
26 kg of γ-butyrolactone was added to 60 kg of ethylene carbonate to prepare a mixed liquid, and 46 L was injected into the cleaning liquid regenerator using this as a cleaning liquid. This washing solution was used at room temperature. A set of 8-inch resist-coated spin coater cups with about 40 g of novolak-type resist attached is housed in the rack, and the cleaning liquid drain side of the switching valve is opened and ejected from the injection nozzle by a pump for 30 seconds. The coater cup was washed. At this time, the spraying amount of the cleaning liquid was 40 L / min and the spraying pressure was 0.2 MPa, and the rack was rotated at 30 rpm by this spraying pressure, so that the entire spin coater cup was sprayed.

After cleaning with the cleaning liquid, in order to drain the cleaning liquid adhering to the wall surface of the cleaning chamber, the spin coater cup, the rack, the spray nozzle, etc., the liquid was blown off with air of 0.5 m ³ / min for 5 minutes. Thereafter, the rinsing liquid discharge port side of the switching valve is opened, and pure water having a specific resistance value of 1 MΩ · cm is injected into the spin coater cup at 10 L / min and 0.1 MPa for 10 minutes from the rinsing pump. Was rotated at 30 rpm and rinsed so that pure water was applied to the entire spin coater cup.

After rinsing, in order to dry the pure water adhering to the wall surface of the cleaning chamber, the spin coater cup, the rack, the spray nozzle, etc., warm air of 60 ° C. is supplied at 0.5 m ³ / min for 30 minutes. The rack was rotated at 30 rpm depending on the air volume, and hot air was blown over the entire spin coater cup. As a result, the novolac resist adhering to the spin coater cup taken out from the cleaning chamber was completely removed, and the pure water in the rinsing could be taken out by drying.

In each of the rinsing process and the rinsing liquid draining process, the cleaning liquid regenerator uses the ozone discharge tube at 60 g / Nm ³ for 40 minutes to decompose the novolak resist dissolved in the cleaning liquid in the cleaning process. Supplied. Due to the dissolution of the novolac resist, the reddish brown cleaning liquid became a pale yellow transparent liquid, and it was confirmed that the novolac resist was decomposed by ozone.

It is sectional drawing which shows an example of the washing | cleaning apparatus which concerns on this invention. It is a top view of the washing | cleaning apparatus shown in FIG. It is a partial enlarged view of the switching valve shown in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Cleaning chamber, 2 ... Cleaning liquid regenerating apparatus, 3 ... Object to be cleaned, 4 ... Rack, 5 ... Rack rotating shaft, 6 ... Rack rotating bearing, 7 ... Injection nozzle, 8 ... Cleaning liquid injection nozzle header, 9 ... Rinsing liquid Injecting nozzle header, 10 ... Air blowing nozzle, 11 ... Air heater for air blowing, 12 ... Air blower, 13 ... Cleaning liquid drain port, 14 ... Rinsing liquid drain port, 15 ... Switching valve, 16 ... Drain piping, 17 ... Heater, DESCRIPTION OF SYMBOLS 18 ... Ozone discharge device, 19 ... Ozone supply pipe, 20 ... Pump, 21 ... Valve, 22 ... Waste washing liquid tank, 23 ... Ozone exhaust port, 24 ... Ozone exhaust pipe, 25 ... Ozone treatment tower, 26 ... Rinsing liquid supply pipe 27 ... pump, 31 ... door, 32 ... acting part

Claims (7)

A cleaning chamber having a drain at the bottom;
A holding basket that holds an object to be cleaned that is rotatably supported by a vertical rotation shaft in the cleaning chamber,
A cleaning liquid spray nozzle header disposed in the cleaning chamber with the spray nozzle facing the holding basket;
A cleaning liquid regenerator for regenerating the cleaning liquid, which is communicated with the drainage port in the cleaning chamber via an on-off valve;
A cleaning apparatus comprising: a cleaning liquid recirculation device that pumps the cleaning liquid regenerated in the cleaning liquid regeneration apparatus to the cleaning liquid spray nozzle header. A cleaning chamber having a cleaning liquid drain and a rinse liquid drain at the bottom;
A holding basket that holds an object to be cleaned that is rotatably supported by a vertical rotation shaft in the cleaning chamber,
A cleaning liquid spray nozzle header and a rinsing liquid spray nozzle header arranged with the spray nozzle facing the holding basket in the cleaning chamber;
A switching valve installed at a branch between the cleaning liquid drain and the rinse liquid drain in the cleaning chamber;
A cleaning liquid regenerator that communicates with the cleaning liquid drain port in the cleaning chamber via the switching valve, and that is provided with an ozone releasing device at the bottom;
A cleaning liquid recirculation device that pumps the cleaning liquid regenerated in the cleaning liquid regenerator to the cleaning liquid injection nozzle header;
A rinsing liquid supply device for supplying a rinsing liquid to the rinsing liquid injection nozzle header;
A drain pipe communicating with the rinse liquid drain port in the cleaning chamber via the switching valve;
A cleaning apparatus comprising: a blowing nozzle disposed in the cleaning chamber toward the holding basket.   2. The cleaning liquid refluxing apparatus pumps the cleaning liquid to the cleaning liquid injection nozzle header via a cleaning liquid replenishing tank that can supply a new cleaning liquid different from the cleaning liquid in the cleaning liquid regenerating apparatus. Or the cleaning apparatus of 2.   The cleaning apparatus according to claim 1, further comprising a temperature adjusting device that maintains a temperature of the cleaning liquid at a predetermined temperature.   The cleaning apparatus according to any one of claims 1 to 4, wherein the cleaning liquid regenerator has an ozone exhaust port in an upper part thereof.   The cleaning apparatus according to claim 1, wherein the cleaning liquid is made of alkylene carbonate mainly composed of ethylene carbonate.   6. The cleaning apparatus according to claim 1, wherein the cleaning liquid is obtained by adding γ-butyrolactone to ethylene carbonate.

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