JP2006278491A - Irradiating apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an irradiating apparatus which can prevent irradiation unevenness, without complicating the configurations by high irradiation intensity, when an increased precision performs unwanted light irradiation. <P>SOLUTION: A plurality of laser beams by a plurality of laser light sources 11-17 are ejected through an optical fiber bundle 2. Paired cylindrical lens array 4 overlays in the direction of an x axis about these plurality of the laser beams, and the luminance is equalized in the direction of the x axis. After the equalizing, the laser beams glare to the irradiation object 6. Consequently, the irradiation unevenness can be prevented in the irradiation object 6. Moreover, such an equalization optical means can constitute only by the paired cylindrical lens array 4. It is not necessary to use a finely optical element device. Thus, the irradiation apparatus can consist of a simple configuration, without complicating the configuration. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an irradiation apparatus that performs light irradiation on an irradiation object using a plurality of semiconductor lasers as light sources.

  2. Description of the Related Art Conventionally, a method of annealing a silicon thin film using a continuously oscillating laser is known in order to form circuit elements or the like with polycrystalline silicon in a manufacturing process of a liquid crystal display device or an organic EL (ElectroLuminescence) display device, for example. . In this way, the method of annealing with laser light partially irradiates the silicon thin film, so that the entire substrate can be prevented from becoming high temperature, and a glass substrate can be used as the substrate. .

  For example, Patent Document 1 discloses a technique regarding a laser annealing method using an excimer laser or a YAG laser as a laser light source.

  Patent Document 2 discloses a technique regarding a laser annealing method using a semiconductor laser as a laser light source.

  Further, Patent Document 3 discloses a laser annealing method in which a plurality of semiconductor lasers coupled to a plurality of optical fibers and bundled as a laser light source are used, and a micromirror device (DMD; Digital Micromirror Device) is further used. The technology about is disclosed. Specifically, for example, as shown in FIG. 7, the laser light emitted from the bundled semiconductor laser light source 101 is irradiated to the DMD 104 by the lens system 103. The image on the DMD 104 is formed on the irradiation object 106 mounted on the stage 107 and irradiated by the lens systems 105A and 105B.

JP 2003-168646 A JP 2004-87667 A Japanese Patent Laid-Open No. 2004-6440

  By the way, in Patent Document 1, an excimer laser or a YAG laser is used as a laser light source as described above. However, these lasers lack stability when used as a light source, and the configuration of the apparatus becomes large. There was a problem. Therefore, considering these points, it is desirable to use a semiconductor laser as the laser light source.

  In Patent Document 2, a semiconductor laser is used as a laser light source as described above. However, since this semiconductor laser is inferior in laser utilization efficiency compared to a pulse laser annealing apparatus using an excimer laser, there is a problem that the output of the laser is insufficient when a semiconductor laser is used. It was.

  In Patent Document 3, by using the semiconductor laser light source 101 bundled as described above, the output of the laser is enhanced and the irradiation intensity is improved. Further, the use of the DMD 104 has an advantage that high-precision laser annealing with the same accuracy as the number of pixels of the DMD 104 can be performed.

  However, due to arrangement errors when bundling a plurality of semiconductor lasers, individual differences in the emission characteristics of each optical fiber, etc., uneven irradiation to the DMD 104 occurs, and this uneven irradiation finally becomes an irradiation object. There is a problem that non-uniform crystallization occurs on the irradiation target surface in 106.

  Here, Patent Document 3 also describes a configuration using GLV (Grating Light Value) capable of controlling the luminance of irradiation light instead of the DMD 104. However, when such a fine optical element device such as DMD or GLV is used, for example, when such high-precision laser annealing is not required (for example, for a large-sized liquid crystal display device with a pixel pitch not so fine). Etc.), the configuration of the entire apparatus becomes complicated.

  As described above, in the conventional technique, when performing light irradiation that does not require high accuracy, it is difficult to prevent irradiation unevenness without complicating the configuration with high irradiation intensity.

  The present invention has been made in view of such problems, and its purpose is to prevent uneven irradiation without complicating the configuration with high irradiation intensity when performing light irradiation that does not require high accuracy. It is to provide a possible irradiation device.

  A first irradiation apparatus of the present invention includes a laser light source that emits a plurality of semiconductor laser beams, a first optical unit that condenses a plurality of emitted laser beams emitted from the laser light source, and the first optical device. Uniform optical means for generating a uniform secondary light source based on a plurality of condensed laser beams condensed by the means, and a light beam from the secondary light source generated by the uniform optical means And second optical means for irradiating each of the above.

  The second irradiation apparatus of the present invention includes a laser light source for emitting a plurality of semiconductor laser beams, a first optical means for condensing a plurality of emitted laser beams emitted from the laser light source, and the first optical device. Uniform optical means for generating a uniform secondary light source based on a plurality of condensed laser beams condensed by the means, and a light beam from the secondary light source generated by the uniform optical means A second optical means for irradiating the light beam, a stage on which the irradiation object is mounted, and irradiation of the light beam from the secondary light source by scanning the irradiation object mounted on the stage within the mounting surface Irradiation position control means for moving the positions relative to each other is provided.

  In the irradiation apparatus of the present invention, a plurality of laser beams are emitted by a laser light source composed of a plurality of semiconductor lasers and condensed by a first optical means. A uniformed secondary light source is generated by the uniformizing optical means based on the collected plurality of focused laser beams. The uniform light beam from the secondary light source is irradiated to the irradiation object by the second optical means.

  According to the irradiation apparatus of the present invention, the light source is composed of a plurality of semiconductor lasers, and a plurality of laser beams emitted from the laser light source are superposed to equalize the brightness before irradiating the irradiation object. Therefore, when performing light irradiation that does not require high accuracy, uneven irradiation can be prevented without complicating the configuration with high irradiation intensity.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[First Embodiment]
1 and 2 show a configuration of an irradiation apparatus according to the first embodiment of the present invention. FIG. 1 is a top view from the y-axis direction, and FIG. 2 is a portion AA in FIG. The cross-sectional views of each are shown. This irradiation apparatus applies light based on laser light emitted from a plurality of semiconductor lasers 11 to 17 to the irradiation target surface 61 of the irradiation target 6 mounted on the stage 7 (the x-axis direction is a major axis direction). A plurality of semiconductor lasers 11 to 17, an optical fiber bundle 2 composed of multimode optical fibers 21 to 27 coupled to the semiconductor lasers 11 to 17, and a condenser lens 31. And a cylindrical lens array pair 4, a condenser lens 51, a condenser lens 52, a stage 7, and an irradiation position control unit 8.

  Each of the semiconductor lasers 11 to 17 is constituted by a semiconductor laser that continuously oscillates, and is arranged in an array in one dimension along the x-axis direction. As these semiconductor lasers 11 to 17, a laser beam having a wavelength of 600 to 1700 nm can be used. For example, a high-power semiconductor laser having a wavelength of around 800 nm or a wavelength of It is preferable to use the one near 940 nm. The semiconductor lasers 11 to 17 are respectively coupled to the multimode optical fibers 21 to 27 in the optical fiber bundle 2 as described above, and the laser light from the semiconductor lasers 11 to 17 passes through the optical fiber bundle 2. Is injected through. Therefore, the emission end face of the optical fiber bundle 2 is also arrayed one-dimensionally along the x-axis direction, like the semiconductor lasers 11-17. By configuring the light source of the irradiation device in this way, the uniformity of the irradiation intensity is improved and the light source is further miniaturized. The semiconductor lasers 11 to 17 and the optical fiber bundle 2 correspond to a specific example of “laser light source” in the present invention.

  The condenser lens 31 is a lens having positive power, and condenses the x-axis direction component of the light beam (see FIG. 1) and also converts the y-axis direction component into a parallel light beam (see FIG. 2). In addition, the arrangement and focal length of the condenser lens 31 are such that a plurality of laser beams emitted from the emission end face of the optical fiber bundle 2 are selected in accordance with the following cylindrical lens array 41. The condenser lens 31 corresponds to a specific example of “first optical means” and “second condenser optical system” in the present invention.

  The cylindrical lens array pair 4 includes a pair of cylindrical lens arrays 41 and 42, and the cylindrical lens arrays 41 and 42 are respectively arranged in an array along the x-axis direction. With such a configuration, the cylindrical lens array pair 4 superimposes a plurality of light beams to make each luminance uniform in the x-axis direction (see FIG. 1), and also forms a secondary light source on the cylindrical lens array 42. It is like that. The cylindrical lens array pair 4 corresponds to a specific example of “homogenizing optical means” in the present invention.

  The condenser lens 51 is a lens having a positive power and irradiates the irradiation object 6 with the x-axis direction components of a plurality of light beams superimposed on each other (see FIG. 1). The condensing lens 52 is also a lens having positive power, and condenses the y-axis direction components of a plurality of light beams and irradiates the irradiation object 6 (see FIG. 2). The condenser lens 51 and the condenser lens 52 correspond to a specific example of “second optical means” in the invention. The condenser lens 51 corresponds to a specific example of “first condenser optical system” in the present invention, and the condenser lens 52 corresponds to a specific example of “first condenser optical system” in the present invention.

  The irradiation object 6 is an object to which the irradiation target surface 61 is irradiated with irradiation light (as described above, a linear beam having the x-axis direction as the long axis direction). Specifically, for example, a liquid crystal display device, Examples include TFT (Thin Film Transistor) panels in organic EL display devices. Moreover, the stage 7 mounts the irradiation target object 6 as mentioned above. The irradiation position control unit 8 controls the operation of the stage 7 in the Y direction. By scanning the irradiation target 6 with the mounting surface, the irradiation position of the irradiation light is relatively moved in the y-axis direction. It has become. The irradiation position control unit 8 corresponds to a specific example of “irradiation position control means” in the present invention.

  Next, the operation of the irradiation apparatus having such a configuration will be described separately in the x-axis direction (FIG. 1) and the y-axis direction (FIG. 2).

  First, in the x-axis direction, a plurality of laser beams emitted from the emission end face of the optical fiber bundle 2 are collected by the condenser lens 31 and incident on the cylindrical lens array pair 4. Here, as described above, each of the collected laser beams irradiates the cylindrical lens array 41. Therefore, the plurality of laser beams are superimposed on the cylindrical lens array 41. , The brightness becomes uniform.

  The plurality of laser beams uniformized in this way forms a secondary light source on the cylindrical lens array 42. The light beam emitted from the secondary light source is irradiated by the condenser lens 51 in a state of being superimposed on the irradiation target surface 61 of the irradiation target 6.

  On the other hand, in the y-axis direction, each of the plurality of laser beams emitted from the emission end face of the optical fiber bundle 2 is converted into a parallel light beam by the condenser lens 31, and the irradiation target surface 61 of the irradiation target object 6 by the condenser lens 52. Are irradiated in a focused state.

  In this way, the irradiation object 6 is irradiated with a plurality of laser beams whose luminance is uniform, with the x-axis direction being the major axis direction and the y-axis direction being the minor axis direction. Further, in this state, the stage 7 on which the irradiation object 8 is mounted is moved in the Y direction by the irradiation position control unit 8 so that the irradiation object 6 is two-dimensionally within the mounting surface. Irradiated.

  As described above, according to the present embodiment, a plurality of laser beams respectively emitted from the laser light sources 11 to 17 via the optical fiber bundle 2 are superposed in the x-axis direction in the cylindrical lens array pair 4, Since the irradiation target 6 is irradiated after the luminance is made uniform in the x-axis direction, uneven irradiation on the irradiation target 6 can be prevented.

  Further, such a homogenizing optical means can be constituted by only the cylindrical lens array pair 4, and it is not necessary to use a fine optical element device such as DMD or GLV. When performing light irradiation, the irradiation apparatus can be configured with a simple configuration without complicating the configuration.

  In addition, since the plurality of semiconductor lasers 11 to 17 are coupled by the optical fiber bundle 2 and are arranged in the x-axis direction as a light source, the irradiation intensity of the laser beam to be irradiated is improved and the irradiation region is Since it can be enlarged, the irradiation processing capability of the irradiation apparatus can be improved. Therefore, it is possible to configure an irradiation apparatus suitable for laser annealing. In this case, since the laser beam can be made uniform in the x-axis direction, and there is no need to consider the accuracy of the array arrangement of the plurality of semiconductor lasers 11 to 17, the y-axis direction is used for these array arrangements. Therefore, only the accuracy of the above needs to be considered.

[Second Embodiment]
Next, a second embodiment of the present invention will be described. The configuration of the irradiation apparatus of the present embodiment is basically the same as that of the first embodiment. The difference from the first embodiment is the configuration of the first optical means in the present invention, that is, the configuration of the condenser lens 31 portion in the first embodiment.

  3 and 4 show the configuration of the irradiation apparatus according to the present embodiment. FIG. 3 is a top view from the y-axis direction, and FIG. 4 is a cross-sectional view taken along the line BB in FIG. Respectively. That is, FIG. 3 and FIG. 4 correspond to FIG. 1 and FIG. 2 in the first embodiment, respectively. In these drawings, the same components as those in the first embodiment are denoted by the same reference numerals, and description thereof will be omitted as appropriate.

  The irradiation apparatus according to the present embodiment includes a field lens 32, a collimator lens 33, and a condenser lens 34 instead of the condenser lens 31 in the first embodiment. Here, the field lens 32, the collimator lens 33, and the condenser lens 34 correspond to a specific example of "first optical means" in the present invention.

  The field lens 32 is a lens having a positive power, and condenses a plurality of light beams in the x-axis direction (see FIG. 3). On the other hand, the collimator lens 33 converts the plurality of light beams into parallel light beams in the y-axis direction (see FIG. 4). The condenser lens 34 collects a plurality of light beams slightly condensed by the field lens 32 in the x-axis direction (see FIG. 3). The field lens 32 corresponds to a specific example of “first collimator lens” in the present invention, the collimator lens 33 corresponds to a specific example of “second collimator lens” in the present invention, and the condenser lens 34 This corresponds to a specific example of “second condensing optical system” in the present invention.

  With this configuration, in the irradiation apparatus according to the present embodiment, the plurality of laser beams emitted from the emission end face of the optical fiber bundle 2 are respectively separated in the x-axis direction and the y-axis direction by the field lens 32 and the collimator lens 33. The direction is controlled separately, and the irradiation object 6 is irradiated.

  As described above, according to the present embodiment, a plurality of laser beams emitted from the emission end face of the optical fiber bundle 2 are respectively separated in the x-axis direction and the y-axis direction by the field lens 32 and the collimator lens 33. In addition to the effects of the first embodiment, the degree of freedom in design can be improved, and the configuration of the optical path when configuring the irradiation apparatus can be easily adjusted.

[Third Embodiment]
Next, a third embodiment of the present invention will be described. The configuration of the irradiation apparatus of the present embodiment is basically the same as that of the second embodiment. What is different from the second embodiment is the configuration of the second optical means in the present invention, that is, the configuration of the condenser lens 51 and the condenser lens 52 in the second embodiment.

  5 and 6 show the configuration of the irradiation apparatus according to the present embodiment. FIG. 5 is a top view from the y-axis direction, and FIG. 6 is a cross-sectional view taken along the line CC in FIG. Respectively. That is, FIGS. 5 and 6 correspond to FIGS. 1 and 2 in the first embodiment, and FIGS. 3 and 4 in the second embodiment, respectively. In these drawings, the same components as those in the first and second embodiments are denoted by the same reference numerals, and description thereof will be omitted as appropriate.

  The irradiation apparatus of the present embodiment has a configuration in which a diaphragm 53 and a relay lens pair 54 are further added to the irradiation apparatus of the second embodiment. That is, the “second optical means” in the present invention is configured by the diaphragm 53 and the relay lens pair 54 in addition to the condenser lens 51 and the condenser lens 52 in the second embodiment.

  The diaphragm 53 is disposed at a conjugate position of the irradiation target surface 61 with respect to the relay lens pair 54 in the x-axis direction, and the irradiation region in the x-axis direction of a plurality of light beams with respect to the irradiation target 6 is controlled by controlling the opening. Can be adjusted (see FIG. 5). The relay lens pair 54 is composed of a pair of relay lenses 54A and 54B, each having power only in the x-axis direction.

  With such a configuration, the irradiation apparatus of the present embodiment operates as follows.

  First, in the x-axis direction (FIG. 5), a plurality of laser beams uniformized by the cylindrical lens array pair 4 are respectively collected by the condenser lens 51 and irradiated to the position of the diaphragm 53. Further, the aerial image generated at the position of the diaphragm 53 is formed on the irradiation target surface 61 by the pair of relay lenses 54A and 54B having power only in the x-axis direction as described above. At this time, by controlling the aperture of the diaphragm 53 as described above, the irradiation region in the x-axis direction in the plurality of light beams with respect to the irradiation target 6 is adjusted.

  On the other hand, in the y-axis direction (FIG. 6), the plurality of laser beams made uniform by the cylindrical lens array pair 4 are transmitted through the condenser lens 51 and the relay lens pair 54, respectively, and are irradiated by the condenser lens 52. 6 is irradiated in a focused state.

  As described above, according to the present embodiment, since the diaphragm 53 and the relay lens pair 54 are further provided in the configuration of the second embodiment, in addition to the effects of the second embodiment, a long It is possible to control the irradiation area in the axial direction (x-axis direction) and irradiate only the necessary area. Therefore, for example, when the irradiation object 6 is a TFT panel or the like as described above, it is possible to control the irradiation area according to the pixel pitch, which is particularly advantageous.

  In this embodiment, as shown in FIGS. 5 and 6, the pair of relay lenses 54A and 54B is configured to be a double-sided tencentric system each having a positive power. The configuration of the lens is not limited to this, and may be configured to relay using, for example, a single lens.

  The relay lens can be constituted by either an enlargement system or a reduction system, but is preferably constituted by a reduction system. This is because the irradiation area can be controlled with higher accuracy when configured by the reduction system than when configured by the expansion system.

  While the present invention has been described with reference to the first to third embodiments, the present invention is not limited to these embodiments, and various modifications can be made.

  For example, in the above-described embodiment, an example in which the plurality of semiconductor lasers 11 to 17 and the optical fiber bundle 2 are all arranged in a one-dimensional array in the x-axis direction has been described. Is not limited to a one-dimensional array, and may be arranged in a two-dimensional array.

  In the above embodiment, an example in which a laser light source is configured by combining a plurality of semiconductor lasers 11 to 17 by the optical fiber bundle 2 has been described. The semiconductor lasers 11 to 17 may be coupled to each other.

  Moreover, in the said embodiment, the irradiation apparatus was comprised by the laser light source which consists of several semiconductor lasers 11-17 and the optical fiber bundle 2, several lens optical system, the stage 7, and the irradiation position control part 8. Although an example of the case has been described, the irradiation apparatus of the present invention may be configured by a laser light source and a plurality of lens optical systems excluding the stage 7 and the irradiation position control unit 8.

  Furthermore, in the above-described embodiment, the configuration of each lens optical system in the irradiation apparatus has been specifically described. However, the configuration of each lens system is not limited to these cases, and in addition to these lenses (or Instead of these lenses), other lenses or the like may be arranged.

It is a top view showing the structure of the irradiation apparatus which concerns on the 1st Embodiment of this invention. It is sectional drawing showing the structure of the irradiation apparatus shown in FIG. It is a top view showing the structure of the irradiation apparatus which concerns on the 2nd Embodiment of this invention. It is sectional drawing showing the structure of the irradiation apparatus shown in FIG. It is a top view showing the structure of the irradiation apparatus which concerns on the 3rd Embodiment of this invention. It is sectional drawing showing the structure of the irradiation apparatus shown in FIG. It is a top view showing an example of the structure of the conventional irradiation apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 11-17 ... Semiconductor laser, 2 ... Optical fiber bundle, 21-27 ... Multimode optical fiber, 31 ... Condenser lens, 32 ... Field lens, 33 ... Collimator lens, 34 ... Condenser lens, 4 ... Pair of cylindrical lens array, 41 , 42 ... Cylindrical lens array, 51 ... Condenser lens, 52 ... Condensing lens, 53 ... Aperture, 54 ... Relay lens pair, 54A, 54B ... Relay lens, 6 ... Irradiation target, 61 ... Irradiation target surface, 7 ... Stage , 8... Irradiation position controller, x... X axis, y... Y axis, Y.

Claims (10)

A laser light source for emitting a plurality of semiconductor laser beams;
First optical means for condensing a plurality of emitted laser beams emitted from the laser light source;
Homogenizing optical means for generating a secondary light source that is made uniform based on a plurality of focused laser beams condensed by the first optical means;
An irradiation apparatus comprising: a second optical unit that irradiates the irradiation target with a light beam from the secondary light source generated by the uniformizing optical unit. The irradiation apparatus according to claim 1, wherein the laser light source includes a plurality of semiconductor lasers arranged in an array along the first direction. The irradiation apparatus according to claim 2, wherein the uniformizing optical unit includes a pair of cylindrical lens arrays arranged in an array along the first direction. The second optical means includes
A first condenser optical system that superimposes and irradiates the components in the first direction in the light flux from the secondary light source;
A first condensing optical system that condenses and irradiates a component in a second direction orthogonal to the first direction in the light flux from the secondary light source. Item 4. The irradiation apparatus according to Item 3. The first optical unit condenses the component in the first direction in the plurality of emitted laser beams and uses the second capacitor in the second direction as a parallel light beam in the plurality of emitted laser beams. The irradiation apparatus according to claim 4, comprising an optical system. The first optical means includes
A first collimator lens having a parallel light beam as a component in the first direction in the plurality of emitted laser beams;
A second collimator lens having a parallel light beam as a component in the second direction in the plurality of emitted laser beams;
And a second condensing optical system that condenses the components in the first direction in the plurality of emitted laser beams converted into parallel light beams by the first collimator lens. The irradiation apparatus according to claim 4. The irradiation apparatus according to claim 6, wherein the second optical unit includes a diaphragm that adjusts an irradiation region in the first direction with respect to the irradiation object. The laser light source has a plurality of multimode optical fibers respectively coupled to a plurality of semiconductor lasers,
2. The irradiation apparatus according to claim 1, wherein the plurality of emitted laser beams are obtained by emitting the plurality of semiconductor laser beams through the plurality of multimode optical fibers, respectively. A laser light source for emitting a plurality of semiconductor laser beams;
First optical means for condensing a plurality of emitted laser beams emitted from the laser light source;
Homogenizing optical means for generating a secondary light source that is made uniform based on a plurality of focused laser beams condensed by the first optical means;
Second optical means for irradiating the irradiation object with a light beam from the secondary light source generated by the uniformizing optical means;
A stage on which the irradiation object is mounted;
Irradiation apparatus comprising: irradiation position control means for relatively moving the irradiation position of the light beam from the secondary light source by scanning an irradiation object mounted on the stage within a mounting surface. . The irradiation apparatus according to claim 9, wherein the irradiation apparatus is configured as a laser annealing apparatus that performs an annealing process on the irradiation object by irradiating the irradiation object with a light beam from the secondary light source.

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