JP2006274375A - Aluminum foil to be etched and aluminum electrode foil for electrolytic capacitor - Google Patents

Aluminum foil to be etched and aluminum electrode foil for electrolytic capacitor Download PDF

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JP2006274375A
JP2006274375A JP2005096821A JP2005096821A JP2006274375A JP 2006274375 A JP2006274375 A JP 2006274375A JP 2005096821 A JP2005096821 A JP 2005096821A JP 2005096821 A JP2005096821 A JP 2005096821A JP 2006274375 A JP2006274375 A JP 2006274375A
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foil
aluminum foil
etching
aluminum
specific region
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JP4651430B2 (en
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Masashi Mehata
将志 目秦
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Toyo Aluminum KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an aluminum foil to be etched which provides an electrode foil having both adequate capacitance and excellent formability. <P>SOLUTION: The aluminum foil to be etched has a particular region in one part of the aluminum foil. The particular region has an oxide film having twice the thickness of that in its perimeter. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、電解コンデンサ製造のために用いられるエッチング用アルミニウム箔に関する。さらに、本発明は、エッチング及び陽極酸化処理の後に高い静電容量及び易加工性を達成できる電解コンデンサ用アルミニウム箔に関する。   The present invention relates to an aluminum foil for etching used for manufacturing an electrolytic capacitor. Furthermore, the present invention relates to an aluminum foil for electrolytic capacitors that can achieve high capacitance and easy processability after etching and anodizing treatment.

アルミニウム箔は、エッチング処理を行い、エッチングピットを形成することにより、表面積を増大させることができる。そして、その表面に陽極酸化処理を施すことにより、酸化皮膜を形成し、これが誘電体として機能する。このため、アルミニウム箔をエッチング処理し、その表面に使用電圧に応じた種々の電圧で陽極酸化皮膜を形成することにより、用途に適合する各種のコンデンサを製造することができる。   The aluminum foil can be increased in surface area by etching and forming etching pits. And the surface is anodized to form an oxide film, which functions as a dielectric. For this reason, various capacitors suitable for the application can be manufactured by etching the aluminum foil and forming an anodized film on the surface at various voltages according to the operating voltage.

エッチング処理で形成されるエッチングピットは、陽極酸化電圧に対応した形状に処理される。   The etching pit formed by the etching process is processed into a shape corresponding to the anodic oxidation voltage.

具体的には、中高圧用のコンデンサ用途には、厚い酸化皮膜を形成する必要がある。このため、そのような厚い酸化皮膜でエッチングピットが埋まらないように、中高圧陽極用アルミニウム箔では、主に直流エッチングを行うことによりエッチングピット形状をトンネルタイプとし、電圧に応じた太さに処理される。   Specifically, it is necessary to form a thick oxide film for a medium-high voltage capacitor application. For this reason, in order to prevent the etching pits from being filled with such a thick oxide film, the aluminum pits for medium- and high-pressure anodes are mainly formed by direct-current etching so that the etching pit shape is a tunnel type and processed to a thickness corresponding to the voltage. Is done.

一方、低圧用コンデンサ用途では、細かいエッチングピットが必要であり、主には交流エッチングによって海綿状のエッチングピットを形成させる。   On the other hand, for low-voltage capacitor applications, fine etching pits are required, and spongy etching pits are formed mainly by AC etching.

コンデンサの容量を向上させるためには、単位面積当たりの表面積を拡大することが有効であり、各種エッチング処理及び各種エッチング処理用アルミニウム箔が製造されている。
ところが、上記のように単位面積当りの表面積を拡大した上に陽極酸化皮膜を形成した電極箔は非常に脆くなり、電極にリード端子を固定する際に接合不良が生じたり、小さな形状に巻く際に折れることがある。
In order to improve the capacity of the capacitor, it is effective to increase the surface area per unit area, and various etching treatments and various aluminum foils for etching treatment are manufactured.
However, the electrode foil with an increased surface area per unit area and an anodized film formed as described above becomes very brittle. When the lead terminal is fixed to the electrode, bonding failure occurs, or when it is wound into a small shape. May break.

これらの問題を解決する方法として、アルミニウム箔表面にパターンを形成し、未エッチング部分を生じさせることにより強度を確保すること方法が提案されている。   As a method for solving these problems, a method has been proposed in which a pattern is formed on the surface of an aluminum foil and an unetched portion is generated to ensure strength.

例えば、特許文献1には、純度99.9質量%以上のアルミニウム箔の片面若しくは両面にアルカリ除去型レジストインキにより線幅0.1〜5mm、線間隔0.5〜10mmの多線状パターンを3〜20%の面積比で塗布形成したことを特徴とする電解コンデンサ電極用アルミニウム箔が開示されている。しかしながら、この方法では、エッチング後にレジストインキ部の除去工程が必要であり、それだけ操作が煩雑になる。   For example, in Patent Document 1, a multiline pattern having a line width of 0.1 to 5 mm and a line interval of 0.5 to 10 mm is formed on one side or both sides of an aluminum foil having a purity of 99.9% by mass or more with an alkali-removable resist ink. An aluminum foil for electrolytic capacitor electrodes, characterized by being applied and formed at an area ratio of 3 to 20%, is disclosed. However, this method requires a step of removing the resist ink portion after etching, and the operation becomes complicated accordingly.

特許文献2には、純度99.9質量%以上のアルミニウム箔の両面に皮膜耐電圧が2〜20Vである酸化皮膜を縞状に形成させた電解コンデンサ電極用アルミニウム箔が開示されている。しかしながら、上記の箔を得る方法として挙げられている手段は、アルミニウム箔の表面に適切なエネルギー及び波長のレーザー光を照射であり、この方法では、得られた酸化皮膜が不均一になりやすく、十分な未エッチング部分を形成できないという問題がある。
特開昭60−31217号公報 特開昭62−198112号公報
Patent Document 2 discloses an aluminum foil for electrolytic capacitor electrodes, in which an oxide film having a withstand voltage of 2 to 20 V is formed in stripes on both surfaces of an aluminum foil having a purity of 99.9% by mass or more. However, the means listed as a method for obtaining the above foil is irradiation of laser light having an appropriate energy and wavelength on the surface of the aluminum foil. In this method, the obtained oxide film tends to be non-uniform, There is a problem that a sufficient unetched portion cannot be formed.
JP-A-60-31217 JP-A 62-198112

このように、上記のいずれの電解コンデンサ用アルミニウム箔も、電極箔としたときにその静電容量を維持した上でリード端子固定の際の接合不良や小形状への巻き取りの際の破損不良を低減させるという点では十分なものとは言えず、加工の容易性も含めてさらなる改良の余地がある。   In this way, any of the above aluminum foils for electrolytic capacitors can be used as electrode foils while maintaining their capacitance, and inadequate bonding when fixing lead terminals or defective damage when winding into small shapes. It is not sufficient in terms of reducing the amount of material, and there is room for further improvement including ease of processing.

従って、本発明の主な目的は、良好な静電容量と優れた加工性とを兼ね備えた電極箔を与えるエッチング用アルミニウム箔を提供することにある。   Accordingly, a main object of the present invention is to provide an aluminum foil for etching that provides an electrode foil having both a good electrostatic capacity and excellent workability.

本発明者は、従来技術の問題点を解決するために鋭意研究を重ねた結果、特定条件下でアルミニウム箔を製造することによって上記目的を達成できることを見出し、本発明を完成するに至った。   As a result of intensive studies to solve the problems of the prior art, the present inventor has found that the above object can be achieved by producing an aluminum foil under specific conditions, and has completed the present invention.

すなわち、本発明は、下記のエッチング用アルミニウム箔及び電解コンデンサ用アルミニウム電極箔に係る。
1. エッチングに供されるアルミニウム箔であって、当該アルミニウム箔の一部に特定領域を有し、当該特定領域は、その酸化皮膜厚みがその周囲の酸化皮膜厚みの2倍以上であることを特徴とするエッチング用アルミニウム箔。
2. 前記特定領域の酸化皮膜厚みが50Å以上である、前記項1に記載のエッチング用アルミニウム箔。
3. 前記特定領域の総面積がアルミニウム箔の10%以下である、前記項1又は2に記載のエッチング用アルミニウム箔。
4. 前記特定領域が陽極酸化処理を施すことによって形成されたものである、前記項1〜3のいずれかに記載のエッチング用アルミニウム箔。
5. 陽極酸化処理が、電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させながら通電することによって行われる、前記項4に記載のエッチング用アルミニウム箔。
6. 電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させながら通電することにより前記接触部分の陽極酸化処理を行う工程を含む、前記項1に記載のエッチング用アルミニウム箔を製造する方法。
7. 電解液を含浸した柔軟性多孔体を表面に備えたローラーを回転させながらアルミニウム箔を通過させることにより、電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させる、前記項6に記載の方法。
8. 前記項1〜6のいずれかに記載のエッチング用アルミニウム箔をエッチング処理した後、陽極酸化処理することにより得られる電解コンデンサ用アルミニウム電極箔。
9. 前記特定領域を芯部としてロール状に巻かれている、前記項8に記載の電解コンデンサ用アルミニウム電極箔。
10. 前記特定領域にリード端子が固定されている、前記項8又は9に記載の電解コンデンサ用アルミニウム電極箔。
That is, the present invention relates to the following aluminum foil for etching and aluminum electrode foil for electrolytic capacitors.
1. An aluminum foil to be used for etching, having a specific region in a part of the aluminum foil, wherein the specific region has an oxide film thickness that is twice or more the thickness of the surrounding oxide film. Aluminum foil for etching.
2. Item 2. The aluminum foil for etching according to Item 1, wherein the oxide film thickness in the specific region is 50 mm or more.
3. Item 3. The aluminum foil for etching according to Item 1 or 2, wherein the total area of the specific region is 10% or less of the aluminum foil.
4). Item 4. The aluminum foil for etching according to any one of Items 1 to 3, wherein the specific region is formed by anodizing.
5. Item 5. The aluminum foil for etching according to Item 4, wherein the anodizing treatment is performed by energizing the flexible porous body impregnated with the electrolytic solution while contacting a part of the aluminum foil.
6). Item 2. The method for producing an etching aluminum foil according to Item 1, comprising a step of anodizing the contact portion by energizing a flexible porous body impregnated with an electrolytic solution while being in contact with a portion of the aluminum foil. .
7). In item 6, the flexible porous body impregnated with the electrolytic solution is brought into contact with a part of the aluminum foil by passing the aluminum foil while rotating a roller having a flexible porous body impregnated with the electrolytic solution on the surface. The method described.
8). The aluminum electrode foil for electrolytic capacitors obtained by etching the aluminum foil for etching according to any one of Items 1 to 6 and then anodizing the aluminum foil.
9. Item 9. The aluminum electrode foil for electrolytic capacitors according to Item 8, which is wound in a roll shape with the specific region as a core.
10. Item 10. The aluminum electrode foil for electrolytic capacitors according to Item 8 or 9, wherein a lead terminal is fixed to the specific region.

本発明のエッチング用アルミニウム箔によれば、酸化皮膜厚みがその他の部分よりも厚い特定領域を有することから、従来法で得られる電極箔と同等の静電容量を維持しつつ、加工性に優れた電極箔を提供することができる。   According to the aluminum foil for etching of the present invention, since the oxide film has a specific region thicker than other portions, it has excellent workability while maintaining the same capacitance as the electrode foil obtained by the conventional method. An electrode foil can be provided.

また、本発明の製造方法では、比較的簡便な方法で部分的な陽極酸化処理を行うことができるので、本発明のエッチング用アルミニウム箔を効率的に生産することができる。   Moreover, in the manufacturing method of this invention, since a partial anodizing process can be performed by a comparatively simple method, the aluminum foil for etching of this invention can be produced efficiently.

本発明のエッチング用アルミニウム箔(以下「エッチング用Al箔」ともいう。)は、エッチングに供されるアルミニウム箔であって、当該アルミニウム箔の一部に特定領域を有し、当該特定領域は、その酸化皮膜厚みがその周囲の酸化皮膜厚みの2倍以上であることを特徴とする。
(1)エッチング用Al箔における特定領域
特定領域は、アルミニウム箔の所望の位置に形成すれば良い。また、特定領域は、アルミニウム箔上の少なくとも一方の面に形成すれば良い。
The aluminum foil for etching of the present invention (hereinafter also referred to as “Al foil for etching”) is an aluminum foil subjected to etching, and has a specific region in a part of the aluminum foil, The oxide film thickness is more than twice the thickness of the surrounding oxide film.
(1) Specific area | region in Al foil for etching What is necessary is just to form a specific area | region in the desired position of aluminum foil. The specific region may be formed on at least one surface on the aluminum foil.

特定領域の形状(平面形状)は限定的でなく、例えば多角形、方形、円形、楕円形、不定形等のいずれでも良い。また、特定領域をストライプ状又は網目状に形成することもできる。この場合には、エッチング用Al箔全体の強度を上げることもできる。   The shape (planar shape) of the specific region is not limited, and may be any shape such as a polygon, a rectangle, a circle, an ellipse, and an indefinite shape. Further, the specific region can be formed in a stripe shape or a mesh shape. In this case, the strength of the etching Al foil as a whole can be increased.

特定領域の総面積は、一般的にはアルミニウム箔の10%以下、特に5%以下とすることが望ましい。前記総面積が、アルミニウム箔の10%を超えると、得られるエッチング箔の静電容量が低下するおそれがある。なお、前記総面積の下限値は限定されないが、通常は0.01%以上とすれば良い。   In general, the total area of the specific region is desirably 10% or less, particularly 5% or less of the aluminum foil. When the total area exceeds 10% of the aluminum foil, there is a possibility that the capacitance of the obtained etching foil is lowered. The lower limit value of the total area is not limited, but is usually 0.01% or more.

また、1つ当たりの特定領域の面積の下限値は、形成可能であれば特に限定されないが、一般に5mm以上とすれば良い。また、上限値は、100mm以下とすれば良い。 Further, the lower limit value of the area of each specific region is not particularly limited as long as it can be formed, but it may be generally 5 mm 2 or more. Moreover, what is necessary is just to let an upper limit be 100 mm < 2 > or less.

このようなエッチング用Al箔は、静電容量が高く、特定領域のエッチングピットの密度が少なく、成長速度が遅いため、エッチング後に陽極酸化処理を施して電極箔としたときに特定領域の強度を周囲組織のそれよりも高くすることができる。   Such an Al foil for etching has a high capacitance, a low density of etching pits in a specific region, and a slow growth rate. Therefore, the strength of the specific region is increased when anodization is performed after etching to form an electrode foil. Can be higher than that of surrounding tissue.

(2)エッチング用Al箔の組成等
エッチング用Al箔の組成は限定的ではないが、特にアルミニウム純度が「JIS H 2111」に記載された方法に準じて測定された値で99質量%以上のものが好ましい。このようなアルミニウム箔としては、Pb、Si、Fe、Cu、Mn、Mg、Cr、Zn、Ti、V、Ga、Ni及びBの少なくとも1種の有意又は不可避の不純物元素を必要範囲内において配合又は規制したアルミニウム箔も包含される。
(2) Composition of Al foil for etching, etc. The composition of the Al foil for etching is not limited, but in particular, the aluminum purity is 99% by mass or more as measured by the method described in “JIS H 2111”. Those are preferred. As such an aluminum foil, at least one significant or unavoidable impurity element of Pb, Si, Fe, Cu, Mn, Mg, Cr, Zn, Ti, V, Ga, Ni and B is blended within a necessary range. Or regulated aluminum foil is also included.

具体的なエッチング用Al箔の組成としては、例えばSi:5〜150ppm、Fe:5〜150ppm及びCu:20〜200ppm含有するアルミニウム箔を好適に用いることができる。   As a specific composition of the Al foil for etching, for example, an aluminum foil containing Si: 5 to 150 ppm, Fe: 5 to 150 ppm and Cu: 20 to 200 ppm can be preferably used.

エッチング用Al箔の厚みは限定的でないが、通常は20〜200μm、特に50〜150μmとすることが望ましい。
(3)エッチング用Al箔の調製
所定の組成を有するアルミニウム溶湯を調製し、これを鋳造して得られた鋳塊を450〜660℃で均質化処理した後、熱間圧延及び冷間圧延を施すことにより圧延箔を得ることができる。また、所定の組成を有するアルミニウム溶湯を調製し、これを直接鋳造圧延した後冷間圧延により圧延箔を得ることもできる。これらの場合の圧延箔の厚みは限定的ではないが、一般的に20〜200μmとすることが好ましい。
The thickness of the etching Al foil is not limited, but is usually 20 to 200 μm, and preferably 50 to 150 μm.
(3) Preparation of Al foil for etching After preparing a molten aluminum having a predetermined composition and homogenizing an ingot obtained by casting the aluminum ingot at 450 to 660 ° C., hot rolling and cold rolling are performed. By applying, a rolled foil can be obtained. It is also possible to prepare a molten aluminum having a predetermined composition, directly cast and roll it, and then cold rolled to obtain a rolled foil. The thickness of the rolled foil in these cases is not limited, but is generally preferably 20 to 200 μm.

上記圧延箔は工程途中で適宜焼鈍しても良く、圧延箔を焼鈍して軟質箔としても良い。300℃以上で焼鈍する場合、焼鈍雰囲気は真空又は不活性ガスとすることが望ましい。   The rolled foil may be appropriately annealed during the process, or the rolled foil may be annealed to form a soft foil. When annealing at 300 ° C. or higher, the annealing atmosphere is preferably a vacuum or an inert gas.

エッチング用Al箔は、硬質箔、軟質箔のいずれを問わず、前記所定の特定領域を形成できる限り、その製法は特に制限されない。例えば、アルミニウム原料から圧延箔を経て所定のアルミニウム箔を製造するに際し、熱間圧延工程より後のいずれかの工程において、前記特定領域を形成するための工程を実施すれば良い。   Regardless of whether the Al foil for etching is a hard foil or a soft foil, the production method is not particularly limited as long as the predetermined specific region can be formed. For example, when a predetermined aluminum foil is manufactured from an aluminum raw material through a rolled foil, a process for forming the specific region may be performed in any process after the hot rolling process.

特定領域の形成方法としては、熱間圧延工程より後のいずれかの工程で、アルミニウム箔の一部に熱的、機械的又は化学的な処理を施すことにより所定の酸化皮膜を付与すれば良い。特に、本発明では、陽極酸化処理により特定領域を形成する方法が好ましい。   As a method of forming the specific region, a predetermined oxide film may be applied by performing thermal, mechanical, or chemical treatment on a part of the aluminum foil in any step after the hot rolling step. . In particular, in the present invention, a method of forming a specific region by anodizing treatment is preferable.

陽極酸化処理の方法としては限定的でなく、例えば印刷法を利用した湿式又は乾式エッチング処理、スタンプ法を利用した腐食処理等のように所望の寸法精度で加工できる方法であれば特に限定されない。   The method of the anodizing treatment is not particularly limited, and is not particularly limited as long as it can be processed with a desired dimensional accuracy such as a wet or dry etching treatment using a printing method or a corrosion treatment using a stamp method.

より具体的には、エッチング用Al箔を陽極とし、特定領域に電解液を接触させて陽極酸化を行う方法が好ましい。電解液は、陽極酸化皮膜を形成することができれば特に限定されず、リン酸、硫酸、ホウ酸、シュウ酸溶液などが好適に使用される。   More specifically, a method of performing anodization by using an Al foil for etching as an anode and bringing an electrolytic solution into contact with a specific region is preferable. The electrolytic solution is not particularly limited as long as an anodic oxide film can be formed, and phosphoric acid, sulfuric acid, boric acid, oxalic acid solution and the like are preferably used.

本発明では、電解液を含浸した柔軟性多孔体(例えば、多孔性樹脂、発泡体、スポンジ等)をアルミニウム箔の一部に接触させながら通電する方法を好適に採用することができる。この方法では、柔軟性多孔体を所望の形状・寸法に設計することにより、それに対応した形状・寸法を有する特定領域を比較的容易かつ確実に形成することができる。これにより、従来技術で必要とされたマスキング等の処理を省略することができる。   In the present invention, a method of energizing a flexible porous body impregnated with an electrolytic solution (for example, a porous resin, a foam, a sponge, etc.) while being in contact with a part of the aluminum foil can be suitably employed. In this method, by designing the flexible porous body to have a desired shape and size, a specific region having a shape and size corresponding to it can be formed relatively easily and reliably. As a result, processing such as masking required in the prior art can be omitted.

さらに、本発明では、電解液を含浸した柔軟性多孔体を表面に備えたローラーを回転させながらアルミニウム箔を通過させることにより、電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させれば、連続的に特定領域を形成することができる。このときの通電方法(電圧印加方法)としては、例えば導電性のローラー(軸)を電源(−極)に接続し、アルミニウム箔を巻き取る軸を電源(+極)に接続すれば良い。これらの工程を含む方法は、本発明のエッチング用Al箔の製造方法に包含される。   Furthermore, in the present invention, the flexible porous body impregnated with the electrolytic solution is brought into contact with a part of the aluminum foil by passing the aluminum foil while rotating the roller having the flexible porous body impregnated with the electrolytic solution on the surface. By doing so, the specific region can be formed continuously. As an energization method (voltage application method) at this time, for example, a conductive roller (shaft) may be connected to a power source (− pole), and a shaft for winding an aluminum foil may be connected to a power source (+ pole). The method including these steps is included in the method for producing an Al foil for etching according to the present invention.

エッチング用Al箔における酸化皮膜厚みの平均値は100Å以下、好ましくは50Å以下、さらに好ましくは20Å以下である。酸化皮膜厚みが100Åより大きくなると静電容量が低下するおそれがある。なお、下限値は、特に限定されないが、通常5Åである。   The average value of the oxide film thickness in the Al foil for etching is 100 mm or less, preferably 50 mm or less, and more preferably 20 mm or less. If the thickness of the oxide film exceeds 100 mm, the capacitance may be reduced. The lower limit is not particularly limited, but is usually 5 mm.

エッチング用Al箔の特定領域における酸化皮膜厚み(平均値)は、その周囲の酸化皮膜厚みの平均値の2倍以上、好ましくは5倍以上である。エッチング用Al箔の特定領域における酸化皮膜厚みの平均値は、その周囲の酸化皮膜厚みの平均値の2倍より小さいと、特定領域が十分な強度を持たないおそれがある。   The oxide film thickness (average value) in the specific region of the Al foil for etching is at least twice the average value of the thickness of the surrounding oxide film, preferably at least five times. If the average value of the oxide film thickness in the specific region of the Al foil for etching is smaller than twice the average value of the thickness of the surrounding oxide film, the specific region may not have sufficient strength.

特定領域は、エッチング処理及び陽極酸化処理を施し電極箔としたときに強度が要求される部分として利用することが望ましい。電極箔としたときに強度が要求される部分としては、例えば巻き込みの芯部、リード端子の固定部等となるような部位が挙げられる。   It is desirable to use the specific region as a portion where strength is required when an etching process and an anodizing process are performed to form an electrode foil. Examples of the portion that requires strength when the electrode foil is used include a portion that becomes a winding core portion, a lead terminal fixing portion, and the like.

本発明のエッチング用Al箔に対し、必要に応じて脱脂、表面調整等の公知の処理を施した後、常法に従ってエッチング処理及び陽極酸化処理を実施すれば、本発明の電解コンデンサ用アルミニウム電極箔を得ることができる。すなわち、本発明のエッチング用Al箔に上記処理を施して得られたアルミニウム箔は、電解コンデンサ用アルミニウム電極箔として好適に用いることができる。   If the Al foil for etching of the present invention is subjected to known treatments such as degreasing and surface adjustment as necessary, then the etching treatment and anodizing treatment are carried out according to a conventional method, and then the aluminum electrode for electrolytic capacitors of the present invention A foil can be obtained. That is, the aluminum foil obtained by performing the above-described treatment on the etching Al foil of the present invention can be suitably used as an aluminum electrode foil for electrolytic capacitors.

以下に実施例及び従来例を示し、本発明の特徴をさらに明確にする。ただし、本発明の範囲は、これら実施例に限定されるものではない。   Examples and conventional examples are shown below to further clarify the features of the present invention. However, the scope of the present invention is not limited to these examples.

以下の実施例と従来例に従って電解コンデンサ用アルミニウム箔を作製した。なお、実施例と比較するために比較例1を作製した。   Aluminum foil for electrolytic capacitors was produced according to the following examples and conventional examples. In addition, Comparative Example 1 was prepared for comparison with Examples.

1)各実施例等では、まずエッチング用アルミニウム箔を作製し、得られたアルミニウム箔を、次に示す条件でエッチング処理し、次いでホウ酸水溶液(65g/L)中で200Vの陽極酸化処理を施して電極箔とした。
<エッチング処理条件>
・一次エッチング
エッチング液:塩酸及び硫酸の混合液(塩酸濃度:1モル/L、硫酸濃度:3モル/L、80℃)
電解:DC200mA/cm×2分
・二次エッチング
エッチング液:塩酸及びシュウ酸の混合液(塩酸濃度:2モル/L、シュウ酸濃度:0.01モル/L、80℃)
電解:DC50mA/cm×9分
2)得られたアルミニウム箔について、13質量%アジピン酸アンモニウム水溶液(液温25℃)で、対極を同純度アルミニウム箔として、測定領域にDC0.4mAの定電流を流し、電圧−時間曲線の屈曲点の電圧(V)を測定し、次式に従って酸化皮膜厚みを求めた。
1) In each example, an aluminum foil for etching is first prepared, and the obtained aluminum foil is etched under the following conditions, and then an anodizing treatment of 200 V is performed in an aqueous boric acid solution (65 g / L). To give an electrode foil.
<Etching treatment conditions>
Primary etching Etching solution: Mixed solution of hydrochloric acid and sulfuric acid (hydrochloric acid concentration: 1 mol / L, sulfuric acid concentration: 3 mol / L, 80 ° C.)
Electrolysis: DC 200 mA / cm 2 × 2 minutes ・ Secondary etching Etching solution: Mixed solution of hydrochloric acid and oxalic acid (hydrochloric acid concentration: 2 mol / L, oxalic acid concentration: 0.01 mol / L, 80 ° C.)
Electrolysis: DC 50 mA / cm 2 × 9 min 2) About the obtained aluminum foil, with a 13% by mass ammonium adipate aqueous solution (liquid temperature 25 ° C.), with the counter electrode as the same purity aluminum foil, a constant current of DC 0.4 mA in the measurement region The voltage (V) at the inflection point of the voltage-time curve was measured, and the oxide film thickness was determined according to the following formula.

<酸化皮膜厚み>
酸化皮膜厚み(Å)=13(Å/V)×屈曲点の電圧(V)・・・ (式)
3)得られた電極箔について、その静電容量及び強度を次のように測定した。
<Oxide film thickness>
Oxide film thickness (Å) = 13 (Å / V) × bending point voltage (V) (formula)
3) About the obtained electrode foil, the electrostatic capacitance and intensity | strength were measured as follows.

<静電容量>
LCRメーターを用い、ホウ酸アンモニウム水溶液(8g/L)にて測定した。なお、測定面積はそれぞれ30mm×30mmとし、測定面積における特定領域の割合がアルミニウム箔総面積における特定領域の割合とほぼ等しくなるように、20枚以上の平均値を求め、従来例を100としたときの相対値で示した。
<Capacitance>
It measured with the ammonium borate aqueous solution (8g / L) using the LCR meter. In addition, each measurement area was 30 mm × 30 mm, and an average value of 20 sheets or more was obtained so that the ratio of the specific area in the measurement area was substantially equal to the ratio of the specific area in the total area of the aluminum foil, and the conventional example was set to 100. It was shown as a relative value.

<強度>
・折曲強度
周囲の2倍以上の酸化皮膜厚みを持つ特定領域が被折曲部分になるようにした上で、JIS P 8115に準じて、MIT形自動折曲試験機により測定した。曲率半径1mm、荷重250g、折曲角度左右各90°の条件とし、90°の折曲を1回として切断されるまでの回数を測定した。周囲と異なる集合組織を持つ部位がない場合は、任意の部位を測定した。
・リード端子固定強度
周囲の2倍以上の酸化皮膜厚みを持つ特定領域が被固定部分になるようにし、25mm×50mmの電極箔に厚さ150μm、幅2mm、固定長さ7mm、全長20mmの平角純アルミニウム線をリード端子として2個所スポット溶接した。10個の試料を作成し、リード端子固定状態を目視で観察し、次のA〜Cで評価した。周囲の2倍以上の酸化皮膜厚みを持つ部位がない場合は、任意の部位を被試験部分とした。
<Strength>
-Bending strength The specific region having an oxide film thickness of twice or more of the surrounding area was a bent portion, and was measured with an MIT type automatic bending tester in accordance with JIS P8115. The number of times until cutting was performed with a 90 ° bend as one time was measured under the conditions of a curvature radius of 1 mm, a load of 250 g, and a bending angle of 90 ° to the left and right. When there was no site having a texture different from the surrounding, an arbitrary site was measured.
・ Lead terminal fixation strength A specific area with an oxide film thickness more than twice the surrounding area becomes the fixed part, and the electrode foil of 25 mm x 50 mm is 150 μm thick, 2 mm wide, 7 mm long, and 20 mm long. Spot welding was performed at two locations using pure aluminum wires as lead terminals. Ten samples were prepared, the lead terminal fixing state was observed visually, and evaluated by the following AC. When there was no site having an oxide film thickness more than twice that of the surrounding area, an arbitrary site was used as a part to be tested.

A:リード端子全てが圧着され、電極箔に破損がない
B:リード端子全てが圧着されているが、電極箔に亀裂がある
C:リード端子又は電極箔に脱落部分がある
(従来例)
アルミニウム溶湯(Si:20ppm、Fe:10ppm、Cu:50ppm、残部:Al及び不可避不純物)を半連続鋳造して、厚さ500mmの鋳塊を得た。この鋳塊を550℃で均質化処理をした後、熱間圧延により5mmとし、続いて冷間圧延を実施して100μmとすることによりエッチング用アルミニウム箔を得た。また、このアルミニウム箔を前記の方法によって処理することにより電極箔を得た。これらアルミニウム箔及び電極箔の評価結果を表1に示す。
A: All lead terminals are crimped and the electrode foil is not damaged B: All lead terminals are crimped, but the electrode foil is cracked C: The lead terminal or electrode foil has a drop-off portion (conventional example)
Molten aluminum (Si: 20 ppm, Fe: 10 ppm, Cu: 50 ppm, balance: Al and inevitable impurities) was semi-continuously cast to obtain an ingot having a thickness of 500 mm. The ingot was homogenized at 550 ° C., then hot rolled to 5 mm, and then cold rolled to 100 μm to obtain an etching aluminum foil. Moreover, the electrode foil was obtained by processing this aluminum foil by the said method. Table 1 shows the evaluation results of these aluminum foils and electrode foils.

(実施例1)
従来例で得られた100μmの冷間圧延箔に対し、電極箔としたときに所望の位置及び形状になる部位の片面に1容量%ホウ酸水溶液を含浸した多孔質樹脂を押し当て、DC5Vの電圧を10秒間印加した後、温水洗浄及び乾燥してエッチング用アルミニウム箔を得た。また、このアルミニウム箔を前記の方法によって処理することにより電極箔を得た。これらアルミニウム箔及び電極箔の評価結果を表1に示す。
Example 1
A porous resin impregnated with a 1% by volume boric acid aqueous solution was pressed against one side of the part that would be the desired position and shape when used as an electrode foil against the 100 μm cold rolled foil obtained in the conventional example. A voltage was applied for 10 seconds, followed by washing with hot water and drying to obtain an aluminum foil for etching. Moreover, the electrode foil was obtained by processing this aluminum foil by the said method. Table 1 shows the evaluation results of these aluminum foils and electrode foils.

図1に得られた電極箔の模式図を示す。幅500mm長さ300mのロール状電極箔から、幅20mm長さ600mmを切り出して電極箔製品単位とする。電極箔製品単位の中で、リード線取付け部分にあたる左上部5mm×5mmを特定領域とした。   The schematic diagram of the electrode foil obtained in FIG. 1 is shown. From a rolled electrode foil having a width of 500 mm and a length of 300 m, a width of 20 mm and a length of 600 mm are cut out to form an electrode foil product unit. In the electrode foil product unit, the upper left part 5 mm × 5 mm corresponding to the lead wire attachment portion was defined as a specific region.

(実施例2)
DC10Vの電圧を10秒間印加したほかは実施例1と同様にして、アルミニウム箔及び電極箔を得た。評価結果を表1に示す。
(Example 2)
Aluminum foil and electrode foil were obtained in the same manner as in Example 1 except that a voltage of DC 10 V was applied for 10 seconds. The evaluation results are shown in Table 1.

(実施例3)
DC20Vの電圧を10秒間印加したほかは実施例1と同様にして、アルミニウム箔及び電極箔を得た。評価結果を表1に示す。
(Example 3)
An aluminum foil and an electrode foil were obtained in the same manner as in Example 1 except that a voltage of DC 20 V was applied for 10 seconds. The evaluation results are shown in Table 1.

(比較例1)
DC2Vの電圧を1秒間印加したほかは実施例1と同様にして、アルミニウム箔及び電極箔を得た。評価結果を表1に示す。
(Comparative Example 1)
An aluminum foil and an electrode foil were obtained in the same manner as in Example 1 except that a voltage of DC 2 V was applied for 1 second. The evaluation results are shown in Table 1.

Figure 2006274375
Figure 2006274375

実施例1で得られた電極箔の模式図(平面図)を示す。The schematic diagram (plan view) of the electrode foil obtained in Example 1 is shown.

符号の説明Explanation of symbols

(1)電極箔
(2)周囲とは異なる酸化皮膜厚みを持つ部分
(3)最終製品単位となる部分
(1) Electrode foil (2) Part with oxide film thickness different from the surroundings (3) Part to be the final product unit

Claims (10)

エッチングに供されるアルミニウム箔であって、当該アルミニウム箔の一部に特定領域を有し、当該特定領域は、その酸化皮膜厚みがその周囲の酸化皮膜厚みの2倍以上であることを特徴とするエッチング用アルミニウム箔。 An aluminum foil to be used for etching, having a specific region in a part of the aluminum foil, wherein the specific region has an oxide film thickness that is twice or more the thickness of the surrounding oxide film. Aluminum foil for etching. 前記特定領域の酸化皮膜厚みが50Å以上である、請求項1に記載のエッチング用アルミニウム箔。 The aluminum foil for etching according to claim 1, wherein the oxide film thickness in the specific region is 50 mm or more. 前記特定領域の総面積がアルミニウム箔の10%以下である、請求項1又は2に記載のエッチング用アルミニウム箔。 The aluminum foil for etching according to claim 1 or 2 whose total area of said specific field is 10% or less of aluminum foil. 前記特定領域が陽極酸化処理を施すことによって形成されたものである、請求項1〜3のいずれかに記載のエッチング用アルミニウム箔。 The aluminum foil for etching according to any one of claims 1 to 3, wherein the specific region is formed by anodizing. 陽極酸化処理が、電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させながら通電することによって行われる、請求項4に記載のエッチング用アルミニウム箔。 The aluminum foil for etching according to claim 4, wherein the anodizing treatment is performed by energizing the flexible porous body impregnated with the electrolytic solution while contacting a part of the aluminum foil. 電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させながら通電することにより前記接触部分の陽極酸化処理を行う工程を含む、請求項1に記載のエッチング用アルミニウム箔を製造する方法。 The method for producing an aluminum foil for etching according to claim 1, comprising a step of anodizing the contact portion by energizing the flexible porous body impregnated with the electrolytic solution while being in contact with a portion of the aluminum foil. . 電解液を含浸した柔軟性多孔体を表面に備えたローラーを回転させながらアルミニウム箔を通過させることにより、電解液を含浸した柔軟性多孔体をアルミニウム箔の一部に接触させる、請求項6に記載の方法。 The flexible porous body impregnated with the electrolytic solution is brought into contact with a part of the aluminum foil by passing the aluminum foil while rotating a roller having a flexible porous body impregnated with the electrolytic solution on the surface thereof. The method described. 請求項1〜6のいずれかに記載のエッチング用アルミニウム箔をエッチング処理した後、陽極酸化処理することにより得られる電解コンデンサ用アルミニウム電極箔。 An aluminum electrode foil for electrolytic capacitors obtained by etching the aluminum foil for etching according to any one of claims 1 to 6 and then anodizing it. 前記特定領域を芯部としてロール状に巻かれている、請求項8に記載の電解コンデンサ用アルミニウム電極箔。 The aluminum electrode foil for electrolytic capacitors according to claim 8, which is wound in a roll shape with the specific region as a core portion. 前記特定領域にリード端子が固定されている、請求項8又は9に記載の電解コンデンサ用アルミニウム電極箔。 The aluminum electrode foil for electrolytic capacitors according to claim 8 or 9, wherein a lead terminal is fixed to the specific region.
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JPH04220104A (en) * 1990-11-09 1992-08-11 Toyo Alum Kk Aluminum foil with hologram relief pattern and manufacture thereof
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JP5940222B2 (en) * 2013-08-01 2016-06-29 昭和電工株式会社 Anode body of solid electrolytic capacitor element and manufacturing method thereof
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