JP2006273994A - Cerium-based abrasive and its intermediate, and method for producing these - Google Patents
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本発明はセリウム系研摩材及びセリウム系研摩材中間体並びにセリウム系研摩材中間体の製造方法及びセリウム系研摩材の製造方法に関する。 The present invention relates to a cerium-based abrasive, a cerium-based abrasive intermediate, a method for producing a cerium-based abrasive intermediate, and a method for producing a cerium-based abrasive.
希土類元素であるセリウムを必須としたセリウム系研摩材は、ハードディスク（ＨＤ）用、フォトマスク用、液晶（ＬＣＤ）用などのガラス基板や、半導体基板の研摩に用いられている。このセリウム系研摩材には、研摩速度が高く、研摩精度に優れていること等の特性が要求される。 A cerium-based abrasive that essentially uses cerium, which is a rare earth element, is used for polishing glass substrates and semiconductor substrates for hard disks (HD), photomasks, liquid crystals (LCD), and the like. This cerium-based abrasive is required to have characteristics such as a high polishing speed and excellent polishing accuracy.
このようなセリウム系研摩材の製造方法として、希土類塩含有希土類原料と希土類塩との反応における化学量論よりも過剰量の炭酸水素アンモニウムとを水に混ぜて加熱し、沈澱生成する希土類水酸化炭酸塩を焼成する方法が知られている（特許文献１参照）。 As a method for producing such a cerium-based abrasive, a rare earth hydroxide that precipitates by mixing and heating water with an excess of ammonium hydrogen carbonate in excess of the stoichiometry in the reaction between the rare earth salt-containing rare earth material and the rare earth salt. A method of firing carbonate is known (see Patent Document 1).
この特許文献１に記載の製造方法により得られたセリウム系研摩材は、ある程度の高い研摩速度を実現できるものの、研摩精度の点においては十分に満足できるものとは言えなかった。 Although the cerium-based abrasive obtained by the production method described in Patent Document 1 can achieve a certain high polishing speed, it cannot be said that the polishing accuracy is sufficiently satisfactory.
そこで、本発明は高い研摩速度を実現するとともに、研摩精度の非常に優れたセリウム系研摩材を提供することを目的とし、このような優れた研摩特性を備えるセリウム系研摩材を容易に製造可能な研摩材中間体を提供するものである。また、本発明は、これらのセリウム系研摩材及びその中間体を容易に得ることができる製造方法を提供することを目的とする。さらに、本発明のセリウム系研摩材を用いて研摩することにより、表面粗さ及び表面微小うねりの小さなガラス基板を提供することを目的とする。 Therefore, the present invention aims to provide a cerium-based abrasive with high polishing speed and an extremely excellent polishing accuracy, and can easily manufacture a cerium-based abrasive having such excellent polishing characteristics. An abrasive material intermediate is provided. Moreover, an object of this invention is to provide the manufacturing method which can obtain these cerium type abrasives and its intermediate body easily. Furthermore, it aims at providing the glass substrate with small surface roughness and surface microwaviness by grinding | polishing using the cerium type abrasive | polishing material of this invention.
上記課題を解決するために、本発明に係るセリウム系研摩材は、ＴＲＥＯ（全酸化希土含有量）中の酸化セリウム含有率（ＣｅＯ２／ＴＲＥＯ）が３０質量％以上であるセリウム系研摩材において、レーザ回折散乱法粒子径分布測定の体積基準の積算分率における５０％径（Ｄ５０）が０．１〜０．５μｍであり、走査型電子顕微鏡による研摩材の観察画像における研摩材粒子を円形近似して測定した個数平均粒子径（ＤＳＥＭ）に対する５０％径（Ｄ５０）の比（Ｄ５０／ＤＳＥＭ）が１．０〜２．０であるものとした。このような特徴を備えるセリウム系研摩材であれば、高い研摩速度を実現できるとともに、非常に優れた研摩精度を実現可能となる。 In order to solve the above problems, the cerium-based abrasive according to the present invention is a cerium-based abrasive whose cerium oxide content (CeO 2 / TREO) in TREO (total rare earth oxide content) is 30% by mass or more. , The 50% diameter (D 50 ) in the volume-based cumulative fraction of laser diffraction scattering method particle size distribution measurement is 0.1 to 0.5 μm, and the abrasive particles in the observation image of the abrasive with a scanning electron microscope The ratio (D 50 / D SEM ) of the 50% diameter (D 50 ) to the number average particle diameter (D SEM ) measured by circular approximation was 1.0 to 2.0. With a cerium-based abrasive having such characteristics, a high polishing speed can be realized and a very excellent polishing accuracy can be realized.
本発明に係るセリウム系研摩材の特徴のひとつは、レーザ回折散乱法粒子径分布測定の体積基準の積算分布における５０％径（Ｄ５０）が０．１〜０．５μｍである。このＤ５０が０．１μｍ未満になると研摩速度が低下する傾向になり、０．５μｍを超えると研摩後の研摩面における表面粗さ（Ｒa）が大きくなる傾向となる。この５０％径（Ｄ５０）は、０．１５〜０．４μｍであることがさらに望ましいものである。加えて、本発明に係るセリウム系研摩材のもうひとつの特徴は、走査型電子顕微鏡による研摩材の観察画像における研摩材粒子を円形近似して測定した個数平均粒子径（ＤＳＥＭ）に対する５０％径（Ｄ５０）の比（Ｄ５０／ＤＳＥＭ）が１．０〜２．０である。このＤ５０／ＤＳＥＭの値が２．０を超えると、研摩後の研摩面表面の表面粗度（Ｒａ）が大きくなる傾向がある。また、このＤ５０／ＤＳＥＭの値は、１．０〜１．７であることがより好ましく、１．０〜１．５であることがさらに望ましいものである。尚、５０％径（Ｄ５０）は凝集粒子から測定されるものであるため、通常、個数平均粒子径（ＤＳＥＭ）の値より大きな値となる。 One of the features of the cerium-based abrasive according to the present invention is that the 50% diameter (D 50 ) in the volume-based integrated distribution of laser diffraction scattering method particle size distribution measurement is 0.1 to 0.5 μm. Will tend to the D 50 is lowered and the polishing rate is less than 0.1 [mu] m, the surface roughness of the polished surface after polishing exceeds 0.5μm is (Ra) tends to increase. The 50% diameter (D 50 ) is more preferably 0.15 to 0.4 μm. In addition, another feature of the cerium-based abrasive according to the present invention is that it is 50% of the number average particle diameter (D SEM ) measured by circular approximation of the abrasive particles in the observed image of the abrasive with a scanning electron microscope. The ratio of the diameter (D 50 ) (D 50 / D SEM ) is 1.0 to 2.0. When the value of D 50 / D SEM exceeds 2.0, the surface roughness (Ra) of the polished surface after polishing tends to increase. Further, the value of D 50 / D SEM is more preferably 1.0 to 1.7, and further preferably 1.0 to 1.5. Since the 50% diameter (D 50 ) is measured from the aggregated particles, it is usually a value larger than the value of the number average particle diameter (D SEM ).
本発明における、走査型電子顕微鏡（ＳＥＭ）の観察画像による個数平均粒子径（ＤＳＥＭ）は、ＳＥＭの観察画像を画像解析ソフト（例えば、旭化成エンジニアリング（株）製ＩＰ−１０００ＰＣ）を用いて円形近似して測定し、その測定値より算出するものである。この個数平均粒子径（ＤＳＥＭ）を算出する場合、測定精度を保つためには少なくとも４０個以上の粒子を測定する必要があり、１００個以上の粒子について測定することが望ましい。また、この円形近似する際のＳＥＭ観察画像としては、走査型電子顕微鏡で直接観察している画像またはその画像を電子的に保存した画像を使用することが好ましいが、走査型電子顕微鏡の観察画像を撮影した写真をスキャナーで読み込んだものを使用してもよい。 In the present invention, the number average particle diameter (D SEM ) based on the observation image of the scanning electron microscope (SEM) is circular using the observation image of the SEM using image analysis software (for example, IP-1000PC manufactured by Asahi Kasei Engineering Corp.). Approximately measured and calculated from the measured value. When calculating the number average particle diameter (D SEM ), it is necessary to measure at least 40 particles in order to maintain measurement accuracy, and it is desirable to measure 100 particles or more. In addition, as the SEM observation image at the time of this circular approximation, it is preferable to use an image directly observed with a scanning electron microscope or an image in which the image is stored electronically. You may use a photo taken with a scanner.
そして、本発明に係るセリウム系研摩材は、ＳＥＭの観察画像を円形近似して測定した粒子径の標準偏差（σＳＥＭ）が、ＤＳＥＭ値の４０％以下であることが好ましい。より好ましくは３５％以下で、３０％以下であることがさらに望ましい。つまり、ＳＥＭの観察画像を円形近似して測定した粒子径の標準偏差（σＳＥＭ）と、個数平均粒子径（ＤＳＥＭ）とにより算出されるＣＶＳＥＭ（＝σＳＥＭ÷ＤＳＥＭ×１００）が、４０％以下が好ましいものといえる。従って、このＣＶＳＥＭ値は、３５％以下がより好ましく、３０％以下であることがさらに望ましいものである。このＣＶＳＥＭが、４０％を超えると、研摩後の研摩表面の微小うねりが大きくなる傾向となる。 In the cerium-based abrasive according to the present invention, the standard deviation (σ SEM ) of the particle diameter measured by circularly approximating the SEM observation image is preferably 40% or less of the D SEM value. More preferably, it is 35% or less, and more preferably 30% or less. That is, the CV SEM (= σ SEM ÷ D SEM × 100) calculated from the standard deviation (σ SEM ) of the particle diameter measured by circular approximation of the SEM observation image and the number average particle diameter (D SEM ) is 40% or less is preferable. Therefore, the CV SEM value is more preferably 35% or less, and further preferably 30% or less. When the CV SEM exceeds 40%, the fine waviness of the polished surface after polishing tends to increase.
また、上記した本発明に係るセリウム系研摩材の中間体としては、セリウム系希土類水酸化炭酸塩を主成分とするセリウム系研摩材中間体において、ＴＲＥＯ（全酸化希土含有量）中の酸化セリウム含有率（ＣｅＯ２／ＴＲＥＯ）が３０質量％以上であり、レーザ回折散乱法粒子径分布測定の体積基準の積算分率における５０％径（Ｄ５０ ＊）が０．１〜０．５μｍであるとともに、走査型電子顕微鏡による研摩材の観察画像における研摩材粒子を円形近似して測定した個数平均粒子径（ＤＳＥＭ ＊）に対する前記５０％径（Ｄ５０ ＊）の比（Ｄ５０ ＊／ＤＳＥＭ ＊）が１．０〜２．０であるものが好ましい。このような研摩材中間体から得られるセリウム系研摩材であれば、高い研摩速度、非常に優れた研摩精度を実現できるからである。この本発明に係るセリウム系研摩材中間体は、その特徴が上記本発明のセリウム系研摩材と同様であり、各所定数値範囲を満足しない中間体であると、非常に優れた研摩特性を備える、上記本発明に係るセリウム系研摩材を得られなくなる。そして、本発明のセリウム系研摩材中間体は、Ｘ線による回折分析した際に、希土類水酸化炭酸塩のピークが確認できる形態を有している。このＸ線回折において、希土類モノオキシ炭酸塩のピークは確認できないほうが好ましいが、確認されたものであってもよい。希土類モノオキシ炭酸塩のピーク確認できる場合、ＣｕＫα１線に基づくＸ線回折にて２θ＝１５．９°付近のモノオキシ炭酸塩のピーク高さよりも２θ＝１７．８°付近の水酸化炭酸塩のピークのピーク高さのほうが高いものの形態が好ましい。そして、ＣｕＫα１線に基づくＸ線回折にて２θ＝１０．４°付近の炭酸塩のピークが観察されない形態であることが好ましい。 In addition, as the intermediate of the cerium-based abrasive according to the present invention, a cerium-based abrasive intermediate containing cerium-based rare earth hydroxide hydroxide as a main component is oxidized in TREO (total oxidized rare earth content). The cerium content (CeO 2 / TREO) is 30% by mass or more, and the 50% diameter (D 50 * ) in the volume-based cumulative fraction of the laser diffraction scattering method particle size distribution measurement is 0.1 to 0.5 μm. In addition, the ratio (D 50 * /) of the 50% diameter (D 50 * ) to the number average particle diameter (D SEM * ) measured by circular approximation of the abrasive particles in the observation image of the abrasive with a scanning electron microscope D SEM * ) is preferably 1.0 to 2.0. This is because a cerium-based abrasive obtained from such an abrasive intermediate can achieve a high polishing speed and a very good polishing accuracy. The cerium-based abrasive intermediate according to the present invention has the same characteristics as the cerium-based abrasive of the present invention, and has an excellent polishing characteristic when the intermediate does not satisfy each predetermined numerical range. The cerium-based abrasive according to the present invention cannot be obtained. The cerium-based abrasive intermediate of the present invention has a form in which the peak of rare earth hydroxide carbonate can be confirmed when diffraction analysis is performed by X-ray. In this X-ray diffraction, it is preferable that the peak of the rare earth monooxycarbonate cannot be confirmed, but it may be confirmed. When the peak of rare earth monooxycarbonate can be confirmed, the peak of hydroxide carbonate near 2θ = 17.8 ° than the peak height of monooxycarbonate near 2θ = 15.9 ° by X-ray diffraction based on CuKα 1 line A form having a higher peak height is preferred. And, it is preferable that the carbonate peak near 2θ = 10.4 ° is not observed in the X-ray diffraction based on the CuKα 1 line.
上述した本発明のセリウム系研摩材及びその中間体は、ストークス径で２μｍ以上の粗粒子を５００ｐｐｍ以下で含有していることが好ましい。このような粗粒子を５００ｐｐｍよりも多く含有していると、研摩後の研摩面における表面粗度（Ｒａ）が大きくなり、研摩傷が発生しやすくなる。また、ＴＲＥＯ（全酸化希土含有量）中の酸化セリウム含有率（ＣｅＯ２／ＴＲＥＯ）は、３０質量％以上あることが必要で、好ましくは５０質量％以上である。３０質量％未満であると、研摩速度が低くなる。この酸化セリウム含有率（ＣｅＯ２／ＴＲＥＯ）の上限値は特に制限はないが、原料価格などを考慮すると、９９．９９質量％以下であることが望ましい。そして、フッ素含有量（Ｆ／ＴＲＥＯ）は０．５質量％以下、好ましくは０．２質量％以下で、さらに好ましくは０．１質量％以下である。 It is preferable that the cerium-based abrasive and the intermediate thereof according to the present invention described above contain 500 ppm or less of coarse particles having a Stokes diameter of 2 μm or more. When such coarse particles are contained in an amount of more than 500 ppm, the surface roughness (Ra) on the polished surface after polishing is increased and polishing scratches are likely to occur. Further, the cerium oxide content (CeO 2 / TREO) in TREO (total rare earth oxide content) needs to be 30% by mass or more, preferably 50% by mass or more. If it is less than 30% by mass, the polishing rate will be low. The upper limit of the cerium oxide content (CeO 2 / TREO) is not particularly limited, but is preferably 99.99% by mass or less in consideration of raw material prices and the like. And fluorine content (F / TREO) is 0.5 mass% or less, Preferably it is 0.2 mass% or less, More preferably, it is 0.1 mass% or less.
上記した本発明に係るセリウム系研摩材は、以下の製造方法により得られたセリウム系研摩材中間体により製造することができる。この本発明に係るセリウム系研摩材中間体の製造方法は、アルカリ金属炭酸塩、アルカリ金属炭酸水素塩、炭酸アンモニウム及び炭酸水素アンモニウムからなる群から選択された少なくとも１種の炭酸系沈澱剤の水溶液と、ＣｅＯ２／ＴＲＥＯが３０質量％以上である希土類化合物の水溶液とを、化学量論的に炭酸系沈澱剤が過剰となるように混合して沈澱を生成し、該混合液を固液分離することなく６０℃以上に加熱することを特徴とする。 The cerium-based abrasive according to the present invention described above can be manufactured using a cerium-based abrasive intermediate obtained by the following manufacturing method. The method for producing the cerium-based abrasive intermediate according to the present invention comprises an aqueous solution of at least one carbonate-based precipitant selected from the group consisting of alkali metal carbonates, alkali metal bicarbonates, ammonium carbonates and ammonium bicarbonates. And a rare earth compound aqueous solution of CeO 2 / TREO of 30% by mass or more are mixed stoichiometrically so that the carbonic acid precipitating agent is excessive to produce a precipitate, and the mixed solution is subjected to solid-liquid separation. It is characterized by heating to 60 ° C. or higher without performing.
この中間体の製造方法では、水溶液の混合の際に、化学量論的に炭酸系沈澱剤が過剰となるようにする点と、沈澱生成後、該混合液を固液分離することなく６０℃以上に加熱する点との２点が重要である。このような製造方法によれば、微粒の沈澱が生成され易くなり、その生成される沈殿粒子がより微粒となるとともに粒子形状も丸みを帯びるようになる。つまり、この中間体の製造方法において、化学量論的に炭酸系沈澱剤を過剰にしない状態で水溶液を混合すると、角張った大きな粒子が沈殿生成してしまう。また、固液分離して６０℃以上に加熱しても、角張った粒子からなる中間体が製造されることになる。 In this intermediate production method, the carbonic acid precipitating agent is stoichiometrically excessive during mixing of the aqueous solution, and after the precipitation is generated, the mixed solution is 60 ° C. without solid-liquid separation. Two points, the point of heating as described above, are important. According to such a manufacturing method, fine precipitates are easily generated, and the generated precipitated particles become finer and the particle shape is rounded. That is, in this intermediate production method, when the aqueous solution is mixed in a state where the carbonic acid precipitating agent is not excessively stoichiometrically, large angular particles are precipitated. Moreover, even if it separates into solid and liquid and it heats to 60 degreeC or more, the intermediate body which consists of angular particles will be manufactured.
本発明者らの研究によると、セリウム系研摩材の中間体を製造する際、炭酸系沈殿剤を過剰にすることなく水溶液を混合して、角張った粒子を沈殿生成し、その後、固液分離することなく加熱処理すると、ある程度の微粒な粒子からなる中間体が得られるものの、その粒子形状は、本発明に係るセリウム系研摩材中間体の製造方法により得られた中間体のそれよりも、角張った粒子となることを確認している。また、逆に、本発明のように炭酸系沈殿剤を過剰に混合して微細な粒子を沈殿生成させた後に、固液分離を行ってしまうと、得られる中間体の粒子が角張ったものとなることも確認している。このような角張った粒子からなる中間体を原料として、焙焼や粉砕の処理を行って製造されたセリウム系研摩材では、中間体の段階での粒子形状が影響して、研摩時の研摩精度を低下させることが想定される。 According to the study of the present inventors, when producing an intermediate of a cerium-based abrasive, an aqueous solution is mixed without excess of a carbonic acid precipitating agent to form angular particles, and then solid-liquid separation is performed. When the heat treatment is carried out, an intermediate composed of a certain amount of fine particles is obtained, but the particle shape is more than that of the intermediate obtained by the method for producing a cerium-based abrasive intermediate according to the present invention. It has been confirmed that the particles become angular. On the other hand, if the solid-liquid separation is performed after the carbonic acid precipitating agent is excessively mixed and the fine particles are precipitated as in the present invention, the resulting intermediate particles are angular. It has also confirmed that. For cerium-based abrasives that are produced by using an intermediate made of such angular particles as a raw material and then subjected to roasting and pulverization treatment, the particle shape at the intermediate stage affects the polishing accuracy during polishing. Is assumed to be reduced.
本発明のセリウム系研摩材中間体の製造方法において、その混合液は、炭酸系沈殿剤の少なくとも一部と希土類化合物水溶液の少なくとも一部が混合されたものであって、沈澱を生成してスラリーとなっているものでもよい。また、本発明における化学量論とは、炭酸系沈澱剤水溶液と希土類化合物水溶液が反応して希土類炭酸塩を生成する反応と、希土類化合物水溶液が含有する過剰な酸と炭酸系沈澱剤の中和反応との両方を考慮するものとする。ただし、過剰な酸は少なければ無視することができる。例えば、希土類化合物水溶液のＴＲＥＯ濃度が低い場合でも、ｐＨが２以上あれば無視できるのである。この希土類化合物水溶液が含有する過剰な酸の量は、例えばブロモクレゾールグリーン―メチルレッド溶液を指示薬とした中和滴定により求めることができる。 In the method for producing a cerium-based abrasive intermediate according to the present invention, the mixed solution is a mixture of at least a part of a carbonic acid precipitant and at least a part of an aqueous rare earth compound solution. It may be what is. The stoichiometry in the present invention is a reaction in which a carbonate-based precipitant aqueous solution and a rare-earth compound aqueous solution react to form a rare-earth carbonate, and neutralization of excess acid and carbonate-based precipitant contained in the rare-earth compound aqueous solution. Both the reaction and the reaction shall be considered. However, the excess acid can be ignored if it is small. For example, even if the TREO concentration of the rare earth compound aqueous solution is low, it can be ignored if the pH is 2 or more. The amount of excess acid contained in the rare earth compound aqueous solution can be determined, for example, by neutralization titration using a bromocresol green-methyl red solution as an indicator.
本発明に係るセリウム系研摩材中間体の製造方法では、炭酸系沈澱剤の水溶液と、希土類化合物の水溶液との混合においては、化学量論的に炭酸系沈澱剤が過剰となるようにすることが重要である。そのため、混合液は化学量論的に炭酸系沈澱剤が常に過剰であることが好ましいが、混合する希土類化合物水溶液の総量８０％を混合に供用された後は、希土類化合物水溶液の方が化学量論的に過剰となってもよいものである。混合する希土類化合物水溶液の総量の８０％を混合に供用した後は、化学量論的に炭酸系沈澱剤を過剰にするという製造条件は、混合する希土類化合物水溶液の総量が８０％未満の混合状態の時期に比べて、生成される沈澱粒子の性状に与える影響が少ない。そして、水溶液を混合して沈殿生成させている時間のすべてにおいて、常に炭酸系沈澱剤の化学量が過剰になっているようにした方が、角張った粒子の沈殿生成がさらに抑制することができるものとなる。本発明に係るセリウム系研摩材中間体の製造方法では、上述したような混合状態となるのであれば、水溶液の混合方法には特に制限はないが、実用的には次のような混合を行うことが好ましい。 In the method for producing the cerium-based abrasive intermediate according to the present invention, the carbonic acid precipitation agent is stoichiometrically excessive in the mixing of the aqueous solution of the carbonic acid precipitation agent and the aqueous solution of the rare earth compound. is important. Therefore, it is preferable that the mixed solution always has an excess of the carbonic acid-based precipitating agent stoichiometrically, but after the total amount of the rare earth compound aqueous solution to be mixed is used for mixing, the rare earth compound aqueous solution is more stoichiometric. It may be excessive in theory. After 80% of the total amount of the rare earth compound aqueous solution to be mixed is used for mixing, the production condition of stoichiometrically excess the carbonic acid precipitant is the mixed state in which the total amount of the rare earth compound aqueous solution to be mixed is less than 80%. Compared to this period, the effect on the properties of the generated precipitated particles is small. And, in all the time during which the aqueous solution is mixed to form precipitates, it is possible to further suppress the formation of precipitates of angulated particles if the chemical amount of the carbonic acid precipitation agent is always excessive. It will be a thing. In the method for producing a cerium-based abrasive intermediate according to the present invention, the mixing method of the aqueous solution is not particularly limited as long as it is in the mixed state as described above, but in practice, the following mixing is performed. It is preferable.
本発明のセリウム系研摩材中間体の製造方法における水溶液の混合は、前記炭酸系沈澱剤の水溶液を攪拌しながら希土類化合物の水溶液を添加することにより行う方法が採用できる。この混合方法によれば、混合に供用する炭酸系沈澱剤の水溶液総量が、化学量論的に、混合に供用する全希土類化合物の水溶液の総量の８０％以下となっている場合を除いて、混合液は、希土類化合物水溶液総量の少なくとも８０％を添加するまで、炭酸系沈澱剤が化学量論的に過剰になった状態を維持することが可能となる。混合に供用する炭酸系沈澱剤水溶液の総量が、混合に供用する全希土類化合物水溶液の総量よりも、化学量論的に過剰であれば、混合液では常に炭酸系沈澱剤が過剰な状態となる。 In the method for producing the cerium-based abrasive intermediate of the present invention, the aqueous solution can be mixed by adding an aqueous solution of a rare earth compound while stirring the aqueous solution of the carbonic acid precipitant. According to this mixing method, unless the total amount of the aqueous solution of the carbonic acid precipitant used for mixing is stoichiometrically 80% or less of the total amount of the aqueous solution of all rare earth compounds used for mixing, The mixed solution can maintain a stoichiometric excess of the carbonic acid precipitating agent until at least 80% of the total amount of the rare earth compound aqueous solution is added. If the total amount of carbonated precipitant aqueous solution used for mixing is stoichiometrically greater than the total amount of all rare earth compound aqueous solutions used for mixing, the mixed solution will always be in excess of carbonated precipitant. .
また、別の混合方法としては、炭酸系沈澱剤の水溶液と、希土類化合物の水溶液とを、同時に混合容器に投入することにより行ってもよい。この同時添加による混合を行う場合、混合に供用する希土類化合物水溶液の総量の少なくとも８０％を添加するまで、化学量論的に炭酸系沈澱剤が過剰となるような状態を維持することが必要となる。例えば、水を始液として、炭酸系沈殿剤水溶液と希土類化合物水溶液とを、常に化学量論的に炭酸系沈殿剤水溶液が過剰となる比率で添加する。具体的には、炭酸系沈殿剤水溶液総量を、希土類化合物水溶液総量よりも化学量論的に過剰な状態として、両水溶液を添加して同時にその添加を終了させるか、或いは炭酸系沈殿剤水溶液の添加が先に終了するように所定の添加速度で添加していく方法がある。また、別の態様としては、炭酸系沈殿剤水溶液の一部を予め混合容器などに始液として投入しておき、その混合容器へ、残りの炭酸系沈殿剤水溶液と希土類化合物水溶液とを同時に添加する方法がある。この場合も炭酸系沈殿剤水溶液総量を、希土類化合物水溶液総量よりも化学量論的に過剰な状態としておくことが好ましく、両水溶液が同時にその添加を終了させるか、或いは炭酸系沈殿剤水溶液の添加が先に終了するように所定の添加速度で添加していくことが好ましい。このようにすると、炭酸系沈殿剤水溶液を容易に過剰な状態にすることができる。但し、始液として希土類化合物水溶液の一部或いは全部を使用すると、少なくとも混合の初期時点では、希土類化合物水溶液が過剰となる状態が生じてしまうため、本願発明に係るセリウム系研摩材中間体を得ることが困難となる。さらに、同時添加ではないものの類似の添加態様として、例えば、水又は炭酸系沈殿剤水溶液の一部を始液とし、炭酸系沈殿剤水溶液と希土類化合物水溶液とを交互に添加する方法がある。このような添加方法の場合、添加操作の間、混合液において、炭酸系沈殿剤水溶液が希土類化合物水溶液よりも化学量論的に過剰な状態を維持できるように添加量を調整すればよい。 Further, as another mixing method, an aqueous solution of a carbonic acid precipitant and an aqueous solution of a rare earth compound may be put into a mixing container at the same time. When mixing by this simultaneous addition, it is necessary to maintain a stoichiometric excess of the carbonaceous precipitation agent until at least 80% of the total amount of the rare earth compound aqueous solution used for mixing is added. Become. For example, starting from water, an aqueous carbonate-based precipitant solution and an aqueous rare-earth compound solution are always added in a stoichiometrically excess ratio. Specifically, the total amount of the carbonate-based precipitant aqueous solution is stoichiometrically excessive with respect to the total amount of the rare-earth compound aqueous solution, and both aqueous solutions are added and the addition is terminated at the same time. There is a method of adding at a predetermined addition rate so that the addition is completed first. As another aspect, a part of the carbonate-based precipitant aqueous solution is previously charged into a mixing container or the like as a starting liquid, and the remaining carbonate-based precipitant aqueous solution and the rare earth compound aqueous solution are simultaneously added to the mixing container. There is a way to do it. In this case as well, the total amount of the carbonate-based precipitant aqueous solution is preferably stoichiometrically surpassed by the total amount of the rare-earth compound aqueous solution, and both the aqueous solutions finish the addition at the same time, or the addition of the carbonate-based precipitant aqueous solution. It is preferable to add at a predetermined addition rate so as to finish first. In this way, the carbonic acid precipitant aqueous solution can be easily made excessive. However, if a part or the whole of the rare earth compound aqueous solution is used as the starting liquid, the state in which the rare earth compound aqueous solution becomes excessive occurs at least at the initial stage of mixing. Therefore, the cerium-based abrasive intermediate according to the present invention is obtained. It becomes difficult. Furthermore, although not simultaneously added, as a similar addition mode, for example, there is a method in which a part of water or a carbonic acid precipitant aqueous solution is used as a starting liquid, and a carbonic acid precipitant aqueous solution and a rare earth compound aqueous solution are added alternately. In the case of such an addition method, during the addition operation, the addition amount may be adjusted so that the carbonated precipitant aqueous solution can maintain a stoichiometrically excessive state as compared with the rare earth compound aqueous solution in the mixed solution.
また、本発明者等の研究によると、希土類化合物の水溶液を攪拌しているところへ、炭酸系沈澱剤の水溶液を添加する混合方法では、混合時の少なくとも初期においては、混合液は化学量論的に希土類化合物が過剰となるため本発明を達成することが困難である。つまり、この混合方法によると、角張った大きい粒子の沈澱が生成し、後の６０℃以上の加熱処理を行っても微粒なものとなるが、上述した本発明における混合方法の場合よりは、大きな粒子で、しかも角張った粒子からなる中間体となる。そして、このような中間体を用いて製造したセリウム系研摩材では、研摩精度が低くなることを確認している。炭酸系沈澱剤を化学量論量の３倍以上添加すれば粒子形状を若干制御することもできるが、上述した本発明における混合方法の場合と比べると、粒子が大きく、角張ったものとなるのである。尚、ここでは、希土類化合物水溶液総量のすべて（１００％）を始液にするという方法を典型例としているが、このような方法においては、上述した「希土類化合物水溶液総量の少なくとも８０％を添加するまで」という条件は適用されない。つまり、「希土類化合物の水溶液総量の少なくとも８０％を添加するまで」という条件においては、始液に、希土類化合物水溶液を用いないということが前提となっているからである。 Further, according to the study by the present inventors, in the mixing method in which the aqueous solution of the carbonic acid precipitant is added to the stirring of the aqueous solution of the rare earth compound, the mixed solution is stoichiometrically at least at the initial stage of mixing. In particular, since the rare earth compound becomes excessive, it is difficult to achieve the present invention. That is, according to this mixing method, precipitates of large angular particles are generated and become fine particles even after subsequent heat treatment at 60 ° C. or higher, but larger than in the case of the mixing method in the present invention described above. It is an intermediate consisting of particles and angular particles. And it has confirmed that the grinding | polishing precision becomes low in the cerium type abrasive | polishing material manufactured using such an intermediate body. The particle shape can be slightly controlled by adding a carbonic acid-based precipitating agent at least three times the stoichiometric amount, but the particles are larger and angular compared to the mixing method in the present invention described above. is there. Here, a typical example is a method in which all (100%) of the total amount of the rare earth compound aqueous solution is used as the starting solution, but in such a method, at least 80% of the total amount of the rare earth compound aqueous solution is added. The condition “to” does not apply. That is, the condition “until at least 80% of the total amount of the rare earth compound aqueous solution is added” is based on the premise that the rare earth compound aqueous solution is not used as the starting liquid.
本発明のセリウム系研摩材中間体の製造方法における水溶液の混合では、水溶液の液温を高くしすぎると大きな粒子の沈澱が生成し易くなる。また、このような大きな粒子として沈殿した混合液を、後に６０℃以上の加熱処理（浸漬加熱粉砕）を行っても、大きい粒子は残存したままとなり、このような研摩材中間体を用いて製造された研摩材では、研摩精度が低くなる傾向となる。そのため、沈澱（通常、炭酸塩の沈殿）生成時の液温としては、浸漬加熱粉砕時の温度より５℃以上低いことが好ましく、１０℃以上低いことがより好ましく、２０℃以上低いことがさらに望ましいものである。具体的には、この沈澱（通常、炭酸塩の沈殿）生成時の液温としては、５５℃以下が好ましく、４０℃以下がより好ましく、３０℃以下がさらに望ましい。高い研摩精度を実現できる研摩材を製造するためには、液温は低いほうが好ましいため、基本的には加熱を行わないほうが望ましいといえる。ただし、加熱しない場合、例えば、０℃未満になってしまう場合にあっては、０℃以上になるように加熱することが望ましいものである。 In the mixing of the aqueous solution in the method for producing the cerium-based abrasive intermediate of the present invention, precipitation of large particles tends to occur when the temperature of the aqueous solution is too high. Moreover, even if the mixed liquid precipitated as such large particles is later subjected to a heat treatment (immersion heating and pulverization) at 60 ° C. or higher, the large particles remain and are produced using such an abrasive intermediate. In the polished material, the polishing accuracy tends to be low. Therefore, the liquid temperature at the time of precipitation (usually carbonate precipitation) is preferably 5 ° C. or higher, more preferably 10 ° C. or lower, more preferably 20 ° C. or lower than the temperature at the time of immersion heating and pulverization. Is desirable. Specifically, the liquid temperature at the time of producing this precipitate (usually, carbonate precipitate) is preferably 55 ° C. or lower, more preferably 40 ° C. or lower, and further preferably 30 ° C. or lower. In order to produce a polishing material that can achieve high polishing accuracy, it is preferable that the liquid temperature is basically low because the liquid temperature is preferably low. However, when it is not heated, for example, when it becomes less than 0 ° C., it is desirable to heat it to be 0 ° C. or higher.
本発明のセリウム系研摩材中間体の製造方法では、炭酸系沈澱剤として、アルカリ金属炭酸塩、炭酸水素塩炭酸アンモニウム、炭酸水素アンモニウムを用いることができ、これら沈殿剤は無水物でも水和物でも良い。アルカリ金属としては通常、Ｎａ、Ｋ、Ｌｉなど挙げられるが、コストの点でＮａが好ましい。 In the method for producing a cerium-based abrasive intermediate of the present invention, alkali metal carbonate, hydrogen carbonate ammonium carbonate, or ammonium hydrogen carbonate can be used as the carbonate precipitating agent. These precipitants may be anhydrous or hydrated. But it ’s okay. Examples of the alkali metal usually include Na, K, and Li, but Na is preferable from the viewpoint of cost.
また、混合する水溶液濃度は０．２ｍｏｌ／Ｌ〜２．０ｍｏｌ／Ｌが好ましく、０．５ｍｏｌ／Ｌ〜１．５ｍｏｌ／Ｌがさらに好ましい。水溶液濃度が０．２ｍｏｌ／Ｌ未満になると、排水量が増えすぎて実用的でなくなる。逆に、２．０ｍｏｌ／Ｌを超えると、沈澱生成反応が不均一となり、粗粒子を多く含む沈澱が生成し易くなる。 The concentration of the aqueous solution to be mixed is preferably 0.2 mol / L to 2.0 mol / L, and more preferably 0.5 mol / L to 1.5 mol / L. When the concentration of the aqueous solution is less than 0.2 mol / L, the amount of drainage increases so that it is not practical. On the other hand, when it exceeds 2.0 mol / L, the precipitate formation reaction becomes non-uniform, and a precipitate containing a large amount of coarse particles is easily generated.
そして、混合する際の水溶液量は、希土類化合物水溶液の希土類元素と反応して希土類炭酸塩を生成する反応の化学量論、及び希土類化合物水溶液が含有する過剰の酸を中和する反応の化学量論の合計に対して３倍未満とるようにすることが好ましい。つまり、希土類化合物水溶液量に対する炭酸系沈殿剤の水溶液量が、０．９５倍〜２．５倍であることが好ましく、１．０倍〜２．０倍となるようとより好ましく、１．１倍〜１．５倍の液量とすることが特に望ましい。希土類化合物水溶液量に対する炭酸系沈殿剤の水溶液量が０．９５倍未満になると、 沈澱中への希土類元素の回収率が低下し、水溶液中に希土類元素が多く残留する傾向となる。上述した希土類化合物の水溶液が含有する過剰な酸の量は、例えばブロモクレゾールグリーン―メチルレッド溶液を指示薬とした中和滴定により求めることができ、希土類化合物水溶液の過剰な酸の量が少なければ、炭酸系沈澱剤の量を決定する際に、その酸を中和する反応を無視することができる。例えば、希土類化合物水溶液のＴＲＥＯ濃度が低い場合でも、ｐＨが２以上あれば無視できるのである。 The amount of the aqueous solution at the time of mixing is the stoichiometry of the reaction that reacts with the rare earth element of the rare earth compound aqueous solution to generate the rare earth carbonate, and the stoichiometry of the reaction that neutralizes the excess acid contained in the rare earth compound aqueous solution. It is preferable to make it less than three times the total of theories. That is, the amount of the carbonic acid precipitating agent with respect to the amount of the rare earth compound aqueous solution is preferably 0.95 to 2.5 times, more preferably 1.0 to 2.0 times, It is particularly desirable that the liquid amount be double to 1.5 times. When the amount of the carbonic acid precipitant aqueous solution is less than 0.95 times the amount of the rare earth compound aqueous solution, the recovery rate of the rare earth element in the precipitation is lowered, and a large amount of the rare earth element tends to remain in the aqueous solution. The amount of excess acid contained in the aqueous solution of the rare earth compound described above can be determined by, for example, neutralization titration using a bromocresol green-methyl red solution as an indicator, and if the amount of excess acid in the rare earth compound aqueous solution is small, In determining the amount of carbonate-based precipitant, the reaction that neutralizes the acid can be ignored. For example, even if the TREO concentration of the rare earth compound aqueous solution is low, it can be ignored if the pH is 2 or more.
混合に供用する希土類化合物の水溶液は、例えば、モナザイト精鉱やバストネサイト精鉱などのセリウム含有希土類精鉱を、硫酸分解法やアルカリ分解法にて分解し、分別沈澱や分別溶解等の処理を行ってウラン、トリウム、カルシウム、バリウム、鉄、リン等の不純物を低減・除去することにより希土類溶液を得て、必要に応じて有機溶媒を用いた溶媒抽出にてネオジムやランタン等を低減してＣｅＯ２／ＴＲＥＯを高めたものを用いることができる。また、このようにして得られた塩酸系の希土類溶液を煮詰めて、冷却・固化させた塩化希土を、水または希薄塩酸にて再溶解したものを用いても良い。さらには、中国等から入手可能な、セリウム系希土類炭酸塩を塩酸等の酸にて溶解して得た、水溶液を用いることもできる。この混合に供用する希土類化合物の水溶液濃度としては、ＴＲＥＯで１０ｇ／Ｌ〜２５０ｇ／Ｌであることが好ましく、２０ｇ／Ｌ〜２００ｇ／Ｌがより好ましい。ＴＲＥＯが１０ｇ／Ｌ未満であると、排水量が増えすぎて実用的でなくなる。逆に、２５０ｇ／Ｌを超えると、全体的には微粒の沈殿を生成し易いものの、反応が不均一となることがあり、粗粒子も生成し易くなる。 The aqueous solution of rare earth compounds used for mixing is, for example, decomposition of cerium-containing rare earth concentrates such as monazite concentrate or bastonite concentrate by sulfuric acid decomposition method or alkali decomposition method, and fractional precipitation or fractional dissolution To obtain a rare earth solution by reducing and removing impurities such as uranium, thorium, calcium, barium, iron, phosphorus, etc., and if necessary, reduce neodymium, lanthanum, etc. by solvent extraction using an organic solvent Thus, it is possible to use a material in which CeO 2 / TREO is increased. Alternatively, a hydrochloric acid-based rare earth solution obtained as described above is boiled and cooled and solidified, which is redissolved with water or dilute hydrochloric acid, may be used. Furthermore, an aqueous solution obtained by dissolving cerium-based rare earth carbonates available from China or the like with an acid such as hydrochloric acid can also be used. The aqueous solution concentration of the rare earth compound used for this mixing is preferably 10 g / L to 250 g / L, more preferably 20 g / L to 200 g / L as TREO. If TREO is less than 10 g / L, the amount of drainage increases so that it is not practical. On the other hand, when it exceeds 250 g / L, although it is easy to produce fine precipitates as a whole, the reaction may be non-uniform and coarse particles are also likely to be produced.
本発明のセリウム系研摩材中間体の製造方法における水溶液の混合では、その混合時間を５分〜１２００分とすることが好ましく、１０分〜６００分がより好ましく、２０分〜３００分がさらに望ましい。この混合時間とは、炭酸系沈殿剤水溶液又は希土類化合物水溶液の少なくとも一方を添加している時間をいう。混合時間が５分間未満であると、超微粒の粒子を含む不均一な粒子からなる沈殿を生成する。そのため、そのような沈殿生成から得た中間体を用いて製造したセリウム系研摩材では、研摩速度が低下するとともに研摩精度も若干低下するものとなる。一方、混合時間が１２００分間を超えると、沈殿における粒子が大きくなりなりすぎ、そのような中間体から製造されたセリウム系研摩材では、研摩精度が大きく低下することになる。 In the mixing of the aqueous solution in the method for producing the cerium-based abrasive intermediate of the present invention, the mixing time is preferably 5 minutes to 1200 minutes, more preferably 10 minutes to 600 minutes, and even more preferably 20 minutes to 300 minutes. . This mixing time refers to the time during which at least one of the carbonic acid precipitant aqueous solution or the rare earth compound aqueous solution is added. When the mixing time is less than 5 minutes, a precipitate composed of non-uniform particles including ultrafine particles is generated. Therefore, in the cerium-based abrasive produced using the intermediate obtained from such precipitation, the polishing speed is lowered and the polishing accuracy is slightly lowered. On the other hand, when the mixing time exceeds 1200 minutes, the particles in the precipitate become too large, and the polishing accuracy is greatly reduced in the cerium-based abrasive produced from such an intermediate.
上記した本発明のセリウム系研摩材中間体の製造方法において、水溶液の混合により生成される沈澱の形態は、基本的には希土類炭酸塩である。つまり、６０℃以上に加熱する前の沈殿状態では、希土類炭酸塩の形態となっており、Ｘ線回折にてその沈殿物を測定した際に、モノオキシ炭酸塩や希土類水酸化炭酸塩のピークが観察されるものであってもてもよい。しかしながら、６０℃以上に加熱する前の沈殿状態で希土類水酸化炭酸塩になっていると、６０℃以上に加熱しても微粒化しないため、６０℃以上に加熱する前の沈殿は、Ｘ線回折で測定した際、希土類水酸化炭酸塩のピークは観察されないものか、観察されたとしても僅かであることが好ましい。炭酸系沈殿剤水溶液を化学量論の４倍を超えて使用すると、６０℃以上に加熱する前の沈殿状態で希土類水酸化炭酸塩となり易くなる傾向があるので好ましい添加比率ではない。 In the above-described method for producing the cerium-based abrasive intermediate of the present invention, the form of the precipitate formed by mixing the aqueous solution is basically a rare earth carbonate. That is, in the precipitation state before heating to 60 ° C. or higher, it is in the form of a rare earth carbonate, and when the precipitate is measured by X-ray diffraction, the peaks of monooxy carbonate and rare earth hydroxide carbonate are present. It may be observed. However, if the rare earth hydroxide carbonate is in a precipitated state before heating to 60 ° C. or higher, it will not atomize even if heated to 60 ° C. or higher. When measured by diffraction, it is preferable that the rare earth hydroxide carbonate peak is not observed or is small even if observed. If the carbonate-based precipitant aqueous solution is used in excess of 4 times the stoichiometry, it tends to be a rare earth hydroxide carbonate in a precipitated state before being heated to 60 ° C. or higher, so this is not a preferred addition ratio.
上記した本発明のセリウム系研摩材中間体の製造方法において、す溶液の混合後、該混合液を固液分離することなく、６０℃以上に加熱処理（浸漬加熱粉砕）するものであるが、この「固液分離」とは、沈殿とろ液とに実質的に分離しないこという。ただし、ろ過を行った場合であっても、ろ過した沈澱とろ液とを再度混ぜ合せた混合液を加熱する場合は、実質的に固液分離していないこととみなして、本発明における「固液分離」を行っていないことに該当するものとする。通常、混合終了後の混合液はその全量を６０℃以上に加熱するものであるが、例えば、混合液の固形成分に比べて液成分が非常に多い場合には、加熱コストを削減するために、ある程度の沈降をさせて上澄液の一部を抜出して加熱しても良い。また、逆に、固形成分が液成分に比べて非常に多い場合には水を加えることにより調整することも可能である。この加熱温度は、６０℃以上が必要で、好ましくは８０℃以上である。６０℃未満であると加熱処理による微粒化効果が不十分になる傾向がある。上限温度は特に限定されないが、加熱のために用いる圧力容器等の機器準備が不要な点から、スラリーを構成する水溶液（スラリー中の固形分を除いた液体部分）の１気圧での沸点以下であることが好ましく、さらに、安全面を考慮すると１００℃以下にすることが好ましいものである。また、加熱時間は、０．５〜２４時間が好ましく、１〜１６時間がより好ましく、１．５〜１２時間がさらに望ましい。０．５時間未満であると、加熱による微粒化効果が不十分になり易い。一方、２４時間を超える加熱処理をしても、微粒化の効果を更に向上させることができない。 In the above-described method for producing the cerium-based abrasive intermediate of the present invention, after mixing the soot solution, the mixture is subjected to heat treatment (immersion heating and pulverization) at 60 ° C. or higher without solid-liquid separation. This “solid-liquid separation” means that the precipitate and the filtrate are not substantially separated. However, even when filtration is performed, when a mixed solution obtained by mixing the filtered precipitate and the filtrate again is heated, it is considered that solid-liquid separation has not been substantially performed, and “solid” This shall correspond to not performing “liquid separation”. Usually, the mixed liquid after mixing is heated to 60 ° C. or higher, but for example, when the liquid component is very large compared to the solid component of the mixed liquid, in order to reduce the heating cost Alternatively, a part of the supernatant may be drawn out by being settled to some extent and heated. Conversely, when the solid component is much more than the liquid component, it can be adjusted by adding water. The heating temperature needs to be 60 ° C. or higher, preferably 80 ° C. or higher. When the temperature is less than 60 ° C., the atomization effect by the heat treatment tends to be insufficient. The upper limit temperature is not particularly limited, but is less than the boiling point at 1 atm of the aqueous solution constituting the slurry (liquid portion excluding the solid content in the slurry) from the point that preparation of equipment such as a pressure vessel used for heating is unnecessary. It is preferable that the temperature is 100 ° C. or lower in view of safety. The heating time is preferably 0.5 to 24 hours, more preferably 1 to 16 hours, and further preferably 1.5 to 12 hours. If it is less than 0.5 hour, the atomization effect by heating tends to be insufficient. On the other hand, even if the heat treatment exceeds 24 hours, the effect of atomization cannot be further improved.
本発明のセリウム系研摩材中間体の製造方法により得られる中間体は、Ｘ線による回折分析した際に、希土類水酸化炭酸塩のピークが確認できる形態を有している。このＸ線回折において、希土類モノオキシ炭酸塩のピークは確認できないほうが好ましいが、確認されたものであってもよい。希土類モノオキシ炭酸塩のピーク確認できる場合、ＣｕＫα１線に基づくＸ線回折にて２θ＝１５．９°付近のモノオキシ炭酸塩のピーク高さよりも２θ＝１７．８°付近の水酸化炭酸塩のピークのピーク高さのほうが高いものの形態が好ましい。そして、ＣｕＫα１線に基づくＸ線回折にて２θ＝１０．４°付近の炭酸塩のピークが観察されない形態であることが好ましい。 The intermediate obtained by the method for producing a cerium-based abrasive intermediate of the present invention has a form in which a peak of rare earth hydroxide carbonate can be confirmed when diffraction analysis is performed by X-ray. In this X-ray diffraction, it is preferable that the peak of the rare earth monooxycarbonate cannot be confirmed, but it may be confirmed. When the peak of rare earth monooxycarbonate can be confirmed, the peak of hydroxide carbonate near 2θ = 17.8 ° than the peak height of monooxycarbonate near 2θ = 15.9 ° by X-ray diffraction based on CuKα 1 line A form having a higher peak height is preferred. And, it is preferable that the carbonate peak near 2θ = 10.4 ° is not observed in the X-ray diffraction based on the CuKα 1 line.
上記した本発明のセリウム系研摩材中間体の製造方法においては、混合終了後６０℃以上での加熱処理終了前に、炭酸系沈澱剤、アンモニア、又は希土類化合物水溶液と炭酸系沈澱剤を混合したとき生じる希土類の沈澱以外に生じる塩（例えば、塩化アンモニウム、塩化ナトリウム、硝酸アンモニウム等）を添加することができる。この場合、ｐＨは１３以下、好ましくは１２以下、さらに好ましくは１１以下になるように添加すればよい。ｐＨが１３を超えると、水酸化物が生成し易くなり、焙焼した際に異常成長した粒子が発生する恐れがある。また、加熱処理終了前に或いは後に、湿式の機械的粉砕を行ってもよい。 In the above-described method for producing the cerium-based abrasive intermediate of the present invention, a carbonic acid-based precipitant, ammonia, or a rare earth compound aqueous solution and a carbonic acid-based precipitant are mixed after the mixing process and before the heat treatment at 60 ° C. or higher. In addition to the rare earth precipitates that sometimes occur, salts that occur (eg, ammonium chloride, sodium chloride, ammonium nitrate, etc.) can be added. In this case, it may be added so that the pH is 13 or less, preferably 12 or less, more preferably 11 or less. When pH exceeds 13, it becomes easy to produce | generate a hydroxide and there exists a possibility that the particle | grains which grew abnormally when roasting may generate | occur | produce. Alternatively, wet mechanical pulverization may be performed before or after the heat treatment.
上記した本発明のセリウム系研摩材中間体の製造方法においては、加熱処理後の混合液をそのまま或いは冷却後、ろ過を行い、得られた中間体を水洗するものである。また、上述した機械的粉砕を行う場合には、機械粉砕処理の後にろ過等を行って、固液分離を行えばよい。水洗は、付着している塩類やアルカリを低減させるものであるが、具体的には塩素、アルカリ金属、アンモニア等を低減させるように行うものである。 In the above-described method for producing the cerium-based abrasive intermediate of the present invention, the mixed solution after the heat treatment is filtered as it is or after cooling, and the obtained intermediate is washed with water. Moreover, when performing the mechanical pulverization mentioned above, solid-liquid separation may be performed by performing filtration or the like after the mechanical pulverization treatment. Washing with water is to reduce adhered salts and alkali, and specifically, to reduce chlorine, alkali metals, ammonia and the like.
本発明に係るセリウム系研摩材は、上記した製造方法により得られたセリウム系研摩材中間体を用いて製造することができる。具体的には、上記したセリウム系研摩材中間体を焙焼するものである。この焙焼処理の前に乾燥処理を行ってもよく、焙焼後、粉砕、分級してもよいものである。 The cerium-based abrasive according to the present invention can be manufactured using the cerium-based abrasive intermediate obtained by the above-described manufacturing method. Specifically, the cerium-based abrasive intermediate described above is roasted. A drying process may be performed before this baking process, and after baking, it may be pulverized and classified.
このセリウム系研摩材中間体を焙焼する場合、焙焼温度を３００〜１１００℃とすることが好ましい。４００〜１０５０℃の焙焼温度範囲がより好ましく、４５０〜１０００℃であることがさらに望ましい温度範囲である。また、この焙焼温度は、ＣｅＯ２／ＴＲＥＯの値を考慮して決定するほうがよく、例えば、ＣｅＯ２／ＴＲＥＯ≧９９質量％の場合では３００〜８００℃が好ましく、４００〜７５０℃がより好ましく、４５０〜７００℃がさらに好ましい温度範囲である。焙焼温度範囲が好ましく、ＣｅＯ２／ＴＲＥＯが５０質量％〜７０質量％の場合では、７００〜１１００℃が好ましく、８００〜１０５０℃がより好ましく、９００〜１０００℃がさらに好ましい温度範囲である。焙焼温度が３００℃未満であると、研摩速度が低いセリウム系研摩材となり、１１００℃を超えると、研摩材粒子が粗大になり、中間体を微粒にした効果が喪失し、研摩精度の低下を引き起こす。また、焙焼時間としては、０．２〜７２時間とすればよく、好ましくは０．５〜６０時間で、１〜４８時間の焙焼であるとさらに望ましい。０．２時間未満の焙焼時間では、研摩速度の低いセリウム系研摩材となる可能性が高くなり、７２時間以上の焙焼を行っても、研摩材特性などにはほとんど変化がなく、熱エネルギーの無駄となり、製造コスト的に好ましくない。 When roasting this cerium-based abrasive intermediate, the roasting temperature is preferably set to 300 to 1100 ° C. A roasting temperature range of 400 to 1050 ° C is more preferred, and a more desirable temperature range is 450 to 1000 ° C. The roasting temperature is preferably determined in consideration of the value of CeO 2 / TREO. For example, when CeO 2 / TREO ≧ 99% by mass, 300 to 800 ° C. is preferable, and 400 to 750 ° C. is more preferable. 450 to 700 ° C. is a more preferable temperature range. Roasting temperature range is preferred, in the case CeO 2 / TREO is 50% to 70% by weight, preferably from 700 to 1100 ° C., more preferably from 800 to 1050 ° C., a further preferred temperature range is 900 to 1000 ° C.. When the roasting temperature is less than 300 ° C, the cerium-based abrasive has a low polishing rate. When the roasting temperature exceeds 1100 ° C, the abrasive particles become coarse and the effect of making the intermediate particles finer is lost, resulting in a decrease in polishing accuracy. cause. The roasting time may be 0.2 to 72 hours, preferably 0.5 to 60 hours, and more preferably 1 to 48 hours. A roasting time of less than 0.2 hours increases the possibility of becoming a cerium-based abrasive with a low polishing rate. Even if roasting is performed for 72 hours or more, there is almost no change in the abrasive properties and the like. Energy is wasted, which is not preferable in terms of manufacturing cost.
上記した本発明に係るセリウム系研摩材を用いてガラス基板を研摩すると、算術平均表面粗さＲａが０．４ｎｍ以下であるとともに算術平均微小うねりが０．５ｎｍ以下である表面となるガラス基板を実現することができる。ハードディスク用、フォトマスク用、液晶やプラズマディスプレイのフラットパネルディスプレイ用などのガラス基板には、表面粗度及び表面微小うねりの小さいものが要求されているが、本発明に係るセリウム系研摩材を用いて研摩すれば、これらの各種用途のガラス基板に極めて好適な表面性状を実現できるのである。このガラス基板の算術平均表面粗さＲａは０．４ｎｍ以下とあることが実用的で、好ましくは０．３ｎｍ以下、さらに望ましくは０．２ｎｍ以下であり、算術平均微小うねりは０．５ｎｍ以下であることが実用的で、好ましくは０．４ｎｍ以下、さらに望ましくは０．３ｎｍ以下である。 When a glass substrate is polished using the cerium-based abrasive according to the present invention described above, a glass substrate that has a surface with an arithmetic average surface roughness Ra of 0.4 nm or less and an arithmetic average microwaviness of 0.5 nm or less. Can be realized. Glass substrates for hard disks, photomasks, and flat panel displays for liquid crystals and plasma displays are required to have low surface roughness and small surface waviness, but use the cerium-based abrasive according to the present invention. If polished, it is possible to realize surface properties that are extremely suitable for glass substrates for these various uses. The arithmetic average surface roughness Ra of this glass substrate is practically 0.4 nm or less, preferably 0.3 nm or less, more preferably 0.2 nm or less, and the arithmetic average microwaviness is 0.5 nm or less. It is practical, preferably 0.4 nm or less, more desirably 0.3 nm or less.
以上説明したように、本発明によれば、高い研摩速度と、研摩精度の非常に優れたセリウム系研摩材を実現できる。そして、このような優れた研摩特性を備えるセリウム系研摩材を容易に製造可能な研摩材中間体を容易に製造可能となる。また、本発明に係るセリウム系研摩材を用いてガラス基板を研摩することで、表面粗さ及び表面微小うねりの非常に小さな表面性状を有する、各種用途に好適なガラス基板を実現することができる。 As described above, according to the present invention, it is possible to realize a cerium-based abrasive having a high polishing speed and excellent polishing accuracy. And it becomes possible to easily manufacture an abrasive intermediate that can easily manufacture a cerium-based abrasive having such excellent polishing characteristics. In addition, by polishing a glass substrate using the cerium-based abrasive according to the present invention, it is possible to realize a glass substrate suitable for various uses, having a surface property with very small surface roughness and surface waviness. .
本発明の最良の実施形態について、実施例及び比較例を参照しながら詳説する。尚、以下の実施例及び比較例は、２種類の中国産希土類炭酸塩を原料としたものである。この２種類の中国産希土類炭酸塩（Ａ、Ｂ）についての各組成を表１に示す。 The best embodiment of the present invention will be described in detail with reference to examples and comparative examples. In the following examples and comparative examples, two kinds of Chinese rare earth carbonates are used as raw materials. Table 1 shows the respective compositions of these two kinds of Chinese rare earth carbonates (A, B).
まず最初に、以下で説明する実施例及び比較例のセリウム系研摩材中間体を製造するための、希土類化合物水溶液の製造方法について説明する。中間体を製造する際に用いた希土類化合物水溶液は、図１に示す製造フローに従って作製した。希土類化合物水溶液の作製手順は、表１に示す炭酸塩原料Ａ２２２０ｋｇを３５％塩酸１５５０Ｌに溶解し、その後原料Ａを少量ずつ加えてｐＨ３．０に調整し、その溶解液をろ過し、希土類化合物水溶液の原液を得た。表１に示す炭酸塩原料Ｂでは、原料Ｂ２２２ｋｇと３５％塩酸１５５Ｌとして、同様な手順で希土類化合物水溶液の原液を得た。このときの原料Ａにより得られた原液中のＴＲＥＯは２８５ｇ／Ｌで、原料Ｂでの原液では２７９ｇ／Ｌであった。また、この２つの原液のＴＲＥＯ中の希土類酸化物の含有量は、原料である中国産希土類炭酸塩ＡまたはＢの含有量と同じであった。そして、各原液を水で希釈することにより、混合に用いる希土類化合物水溶液（ＴＲＥＯ５０ｇ／Ｌ）を作製した。但し、後述する比較例２及び３に用いた希土類化合物水溶液は、ＴＲＥＯは５５ｇ／Ｌであった。 First, a method for producing a rare earth compound aqueous solution for producing cerium-based abrasive intermediates of Examples and Comparative Examples described below will be described. The rare earth compound aqueous solution used in the production of the intermediate was produced according to the production flow shown in FIG. The production procedure of the rare earth compound aqueous solution is as follows. Dissolve 2220 kg of carbonate raw material A shown in Table 1 in 1550 L of 35% hydrochloric acid, then add raw material A little by little to adjust the pH to 3.0, filter the solution, A stock solution of was obtained. In the carbonate raw material B shown in Table 1, a stock solution of a rare earth compound aqueous solution was obtained in the same procedure as 222 kg of raw material B and 155 L of 35% hydrochloric acid. The TREO in the stock solution obtained from the raw material A at this time was 285 g / L, and the stock solution in the raw material B was 279 g / L. Further, the content of rare earth oxides in TREO of these two stock solutions was the same as the content of Chinese rare earth carbonate A or B as a raw material. Each stock solution was diluted with water to prepare a rare earth compound aqueous solution (TREO 50 g / L) used for mixing. However, the rare earth compound aqueous solution used in Comparative Examples 2 and 3 described later had a TREO of 55 g / L.
次に、実施例、比較例のセリウム系研摩材中間体の製法及びそれを用いたセリウム系研摩材の製法について説明する。研摩材中間体及びそれを用いた研摩材の製法フローを図２に示す。まず、研摩材中間体の製造の基本的な手順を説明すると、炭酸系沈殿剤として、炭酸水素アンモニウム、炭酸ナトリウムを用い、所定濃度の沈殿剤水溶液を作製し、上記希土類化合物水溶液と各種の方法にて混合し、沈殿生成させ、その後所定の加熱処理を行って、浸漬加熱粉砕処理をし、ろ過、水洗を行うものとした。表２及び表３に示す各実施例、各比較例は、混合方法、混合に使用した水溶液量、混合時の水溶液温度、混合時間、固液分離処理の有無、加熱処理の有無及びその処理条件、機械的粉砕処理の有無に関し、各条件を種々組み合わせて中間体を製造した。 Next, a method for producing a cerium-based abrasive intermediate of Examples and Comparative Examples and a method for producing a cerium-based abrasive using the same will be described. An abrasive intermediate and a manufacturing flow of the abrasive using the same are shown in FIG. First, the basic procedure for producing an abrasive intermediate will be described. A precipitant aqueous solution having a predetermined concentration is prepared using ammonium bicarbonate and sodium carbonate as a carbonic acid precipitating agent, and the rare earth compound aqueous solution and various methods are prepared. The mixture was mixed to form a precipitate, followed by a predetermined heat treatment, immersion heat pulverization treatment, filtration, and water washing. Each Example and each Comparative Example shown in Table 2 and Table 3 are the mixing method, the amount of aqueous solution used for mixing, the aqueous solution temperature during mixing, the mixing time, the presence or absence of solid-liquid separation treatment, the presence or absence of heat treatment, and the treatment conditions. The intermediates were produced by various combinations of the conditions with or without mechanical pulverization.
ここで、表２及び表３に示す各中間体製造条件について説明する。混合方法としては、沈殿剤水溶液と希土類化合物水溶液とを、正添加、逆添加、同時添加の３種類の方法を行った。正添加とは、撹拌した希土類化合物水溶液に沈殿剤水溶液を添加して混合するもので、逆添加は撹拌した沈殿剤水溶液に希土類化合物水溶液を添加して混合する方法である。また、同時添加とは、混合容器に、希土類化合物水溶液と沈殿剤水溶液と同時に投入して混合する方法である。また、表中の始液とは、例えば逆添加の混合で説明すると、混合容器に予め投入しておく水溶液としての沈殿剤水溶液をいう。同時添加の場合では、始液が既に投入された状態の混合容器に対して、沈殿剤水溶液と希土類混合物水溶液を同時に添加する混合する方法も行った。このときの沈殿剤水溶液における始液の割合は、沈殿剤水溶液のうち始液に使用した割合を示すものである。例えば、表２の実施例１の場合、混合に供用する沈殿剤水溶液のすべてを始液に用いているため、始液の割合が１００％として記載している。 Here, each intermediate manufacturing condition shown in Table 2 and Table 3 is demonstrated. As a mixing method, three kinds of methods of normal addition, reverse addition, and simultaneous addition were performed on the precipitant aqueous solution and the rare earth compound aqueous solution. The normal addition is a method in which a precipitant aqueous solution is added to and mixed with the stirred rare earth compound aqueous solution, and the reverse addition is a method in which the rare earth compound aqueous solution is added to and mixed with the stirred precipitant aqueous solution. Simultaneous addition is a method in which a rare earth compound aqueous solution and a precipitant aqueous solution are simultaneously added to a mixing vessel and mixed. Further, the starting solution in the table means, for example, a precipitant aqueous solution as an aqueous solution that is put in a mixing container in advance when described by reverse addition mixing. In the case of simultaneous addition, a mixing method was also performed in which a precipitant aqueous solution and a rare earth mixture aqueous solution were simultaneously added to a mixing vessel in which the starting liquid had already been charged. The ratio of the starting liquid in the precipitant aqueous solution at this time indicates the ratio used for the initial liquid in the precipitant aqueous solution. For example, in the case of Example 1 in Table 2, since all of the precipitant aqueous solution used for mixing is used as the starting liquid, the ratio of the starting liquid is described as 100%.
混合液の液温については、基本的には加熱を行わない状態、即ち液温約２０℃とし、それ以外として混合液を加熱して３０〜９０℃の液にした。固液分離については、本願発明に対応する実施例に関してはすべて固液分離を行わず、比較例では、混合後沈殿生成させた混合液をろ過して、加熱処理を行ったものも製造した。そして、機械的粉砕処理は、浸漬加熱粉砕処理後の混合液を、直径０．８ｍｍのジルコニアボールを用いたビーズミルに一回通液して粉砕処理を行ったものである。 About the liquid temperature of a liquid mixture, it was the state which does not heat fundamentally, ie, liquid temperature was about 20 degreeC, and the liquid mixture was heated to 30-90 degreeC as it was otherwise. Regarding solid-liquid separation, solid-liquid separation was not performed for all the examples corresponding to the present invention, and in the comparative example, a mixed liquid that had been precipitated after mixing was filtered and heat-treated. In the mechanical pulverization treatment, the mixed solution after the immersion heat pulverization treatment is passed through a bead mill using zirconia balls having a diameter of 0.8 mm once to perform the pulverization treatment.
表２及び表３には、各中間体製造条件を異なる実施例１〜１８、比較例１〜１１を示している。各製造条件により得られた研摩材中間体について、ＣｅＯ２／ＴＲＥＯの測定、Ｘ線回折分析、レーザ回折散乱法粒子径分布測定、走査電子顕微鏡（ＳＥＭ）による粒子径測定を行い、表２及び表３に示す各評価数値データを得た。以下に、各測定について説明する。 Tables 2 and 3 show Examples 1 to 18 and Comparative Examples 1 to 11 with different intermediate production conditions. About the abrasive intermediate obtained under each production condition, CeO 2 / TREO measurement, X-ray diffraction analysis, laser diffraction scattering particle size distribution measurement, particle size measurement by scanning electron microscope (SEM) were performed, and Table 2 and Each evaluation numerical data shown in Table 3 was obtained. Below, each measurement is demonstrated.
レーザ回折散乱法による平均粒径（Ｄ ５０ ）の測定
レーザー回折・散乱法粒子径分布測定装置（（株）堀場製作所製：ＬＡ−９２０）を使用して粒度分布を測定することにより、平均粒径（Ｄ50：小粒径側からの体積基準の積算分率における５０％径＜メジアン径＞）を求めた。尚、表２及び表３では、中間体より得られた５０％径をＤ50 ＊として＊を付し、研摩材より測定された５０％径（表４及び表５の研摩材の場合は＊付さない：Ｄ50）と区別をしている＜表中の他の数値についても、＊の有無により区別している＞。
Measurement of average particle diameter (D 50 ) by laser diffraction / scattering method By measuring the particle size distribution using a laser diffraction / scattering method particle diameter distribution measuring apparatus (Horiba, Ltd .: LA-920), the average particle diameter is measured. The diameter (D 50 : 50% diameter in the volume-based integrated fraction from the small particle diameter side <median diameter>) was determined. In Tables 2 and 3, the 50% diameter obtained from the intermediate was marked with * as D 50 * , and the 50% diameter measured from the abrasive (in the case of the abrasives in Tables 4 and 5, * Not attached: D 50 ) is distinguished (other numerical values in the table are also distinguished by the presence / absence of *).
ＳＥＭによる粒子径測定
フィールドエミッション走査型電子顕微鏡（日本電子（株）社製ＪＳＭ−６３３０Ｆ）により各中間体を観察し、その観察画像を電子的に保存した画像を用いて、各中間体粒子を円形近似して測定することにより個数平均粒子径（ＤＳＥＭ ＊）を算出した。このＤＳＥＭ ＊は、ＳＥＭの観察画像を画像解析ソフト
（ 旭化成エンジニアリング（株）製 ＩＰ−１０００ＰＣ ） を用いて円形近似して測定したものである。また、以下の式からＣＶ値（％）を計算した。
Particle size measurement by SEM Each intermediate is observed with a field emission scanning electron microscope (JSM-6330F, manufactured by JEOL Ltd.), and each intermediate particle is obtained using an image in which the observation image is stored electronically. The number average particle diameter ( DSEM * ) was calculated by measuring in a circular approximation. This D SEM * is obtained by measuring a SEM observation image by circular approximation using image analysis software (IP-1000PC manufactured by Asahi Kasei Engineering Co., Ltd.). Further, the CV value (%) was calculated from the following formula.
続いて、上記した各研摩材中間体を用いて製造したセリウム系研摩材について説明する。製造したセリウム系研摩材は、表２及び表３で示した各研摩材中間体を用い、表４及び表５に示すように製造条件としての乾燥及び焙焼の温度、時間を様々変更して製造したものである。そして、製造した各研摩材について、ＣｅＯ２／ＴＲＥＯの測定、Ｘ線回折分析、レーザ回折散乱法粒子径分布測定、走査電子顕微鏡（ＳＥＭ）による粒子径測定、研摩評価（研摩速度、研摩面傷評価、研摩面粗度、表面微小うねり測定）を行い、表４及び表５に示す各評価数値データを得た。以下に、各測定について説明する。尚、レーザ回折散乱法及びＳＥＭによる粒子径測定については上記中間体の測定と同様である。 Then, the cerium type abrasive | polishing material manufactured using each above-mentioned each abrasive | polishing material intermediate body is demonstrated. The produced cerium-based abrasives use the respective abrasive intermediates shown in Tables 2 and 3, and variously change the drying and roasting temperatures and times as production conditions as shown in Tables 4 and 5. It is manufactured. Then, for each abrasive material manufactured, measurement of CeO 2 / TREO, X-ray diffraction analysis, a laser diffraction scattering method particle size distribution measurement, particle size measurement by a scanning electron microscope (SEM), polishing evaluation (polishing rate, polishing surface flaws Evaluation, polished surface roughness, surface microwaviness measurement) were performed, and each evaluation numerical data shown in Tables 4 and 5 was obtained. Below, each measurement is demonstrated. The particle size measurement by laser diffraction scattering method and SEM is the same as the measurement of the intermediate.
研摩速度
研摩機として、研摩試験機（ＨＳＰ−２Ｉ型、台東精機（株）製）を用意した。この研摩試験機は、スラリー状の研摩材を研摩対象面に供給しながら、当該研摩対象面を研摩パッドで研摩するものである。研摩材スラリーの砥粒濃度は、１００ｇ／Ｌとした（分散媒は水のみ）。そして、本研摩試験では、スラリー状の研摩材を５リットル／分の割合で供給することとし、研摩材を循環使用した。なお、研摩対象物は６５ｍｍφの平面パネル用ガラスとした。また、研摩パッドはポリウレタン製のものを使用した。研摩面に対する研摩パッドの圧力は９．８ｋＰａ（１００ｇ／ｃｍ2）とし、研摩試験機の回転速度は１００ｍｉｎ−１（ｒｐｍ）に設定し、所定時間研摩をした。そして、研摩速度は、特定時間の研摩処理を行い、研摩前後のガラス重量を測定して研摩によるガラス重量の減少量を求め、この値に基づき研摩値を求めた。そして、表４及び表５に示す研摩速度の評価値は、表４の比較例１の研摩材により得られた研摩値を基準（１００）とし、他の研摩速度の評価値を算定したものである。
Polishing speed A polishing tester (HSP-2I type, manufactured by Taito Seiki Co., Ltd.) was prepared as a polishing machine. This polishing tester polishes the polishing target surface with a polishing pad while supplying a slurry-like polishing material to the polishing target surface. The abrasive grain concentration of the abrasive slurry was 100 g / L (dispersion medium was water only). In this polishing test, a slurry-like abrasive was supplied at a rate of 5 liters / minute, and the abrasive was circulated. The polishing object was 65 mmφ flat panel glass. A polishing pad made of polyurethane was used. The polishing pad pressure on the polishing surface was 9.8 kPa (100 g / cm 2 ), the rotation speed of the polishing tester was set at 100 min −1 (rpm), and polishing was performed for a predetermined time. The polishing speed was determined by performing a polishing process for a specific time, measuring the glass weight before and after polishing to determine the reduction in glass weight due to polishing, and determining the polishing value based on this value. And the evaluation value of the polishing speed shown in Table 4 and Table 5 is based on the polishing value obtained by the polishing material of Comparative Example 1 in Table 4 as a reference (100), and the evaluation value of the other polishing speed is calculated. is there.
研摩面傷評価
上記した研摩後のガラス表面について、３０万ルクスのハロゲンランプを照射し、反射法にてガラス表面を観察して、傷の程度（大きさおよび個数）を見極めて点数化し、１００点満点からの減点方式にて評価点を定めた。各表では、９５点以上を◎、９４〜９０点を○、８９〜８５点を△、８４点以下を×として記載している。
Evaluation of scratches on the polished surface The glass surface after polishing was irradiated with a 300,000 lux halogen lamp, the glass surface was observed by a reflection method, and the degree (size and number) of scratches was determined and scored. Evaluation points were determined by the deduction method from the full marks. In each table, 95 points or more are described as ◎, 94 to 90 points as ◯, 89 to 85 points as Δ, and 84 points or less as ×.
研摩面粗度
上記の研摩後のガラス表面について、原子間力顕微鏡 （
ＡＦＭ ）を用いて、研摩表面の中の１０μｍ×１０μｍ積面について算術平均表面粗さ（Ｒａ：ｎｍ）を測定した。
Polished surface roughness <br/> The glass surface after the above polishing was analyzed using an atomic force microscope (
AFM) was used to measure the arithmetic average surface roughness (Ra: nm) for a 10 μm × 10 μm product surface in the polished surface.
表面微小うねり
研摩表面の微小うねり測定は、３次元表面構造解析顕微鏡（Ｚｙｇｏ社製ＮｅｗＶｉｅｗ２００）を用い、測定波長を０．２〜１．４ｍｍとして基板表面の所定領域を白色光で走査して測定し、算術平均微小うねりを求めた。
Surface micro-waviness Measurement of micro-waviness on the polished surface is performed using a three-dimensional surface structure analysis microscope (New View 200, manufactured by Zygo) with a measurement wavelength of 0.2 to 1.4 mm and a predetermined region of the substrate surface with white light. Scanned and measured to determine the arithmetic mean microwaviness.
表２〜表５で示す各評価数値データから判るように、本願発明に基づく実施例の研摩材では、研摩速度が高く、研摩精度にも優れることが判明した。一方、各比較例の研摩材では、研摩速度或いは研摩精度のいずれかが十分な特性でないことが確認された。この結果は、研摩材中間体の時点で、実施例と比較例との各特性値が異なることに対応したものと考えられる。 As can be seen from the respective evaluation numerical data shown in Tables 2 to 5, it was found that the polishing materials of the examples based on the present invention have a high polishing speed and excellent polishing accuracy. On the other hand, it was confirmed that either the polishing speed or the polishing accuracy was not sufficient in the polishing materials of the comparative examples. This result is considered to correspond to the fact that the characteristic values of the example and the comparative example are different at the time of the abrasive intermediate.
Claims (10)
レーザ回折散乱法粒子径分布測定の体積基準の積算分率における５０％径（Ｄ５０）が０．１〜０．５μｍであり、走査型電子顕微鏡による研摩材の観察画像における研摩材粒子を円形近似して測定された個数平均粒子径（ＤＳＥＭ）に対する前記５０％径（Ｄ５０）の比（Ｄ５０／ＤＳＥＭ）が１．０〜２．０であることを特徴とするセリウム系研摩材。 In the cerium-based abrasive having a cerium oxide content (CeO 2 / TREO) in TREO (total rare earth oxide content) of 30% by mass or more,
The 50% diameter (D 50 ) in the volume-based cumulative fraction of laser diffraction scattering method particle size distribution measurement is 0.1 to 0.5 μm, and the abrasive particles in the observation image of the abrasive with a scanning electron microscope are circular. Cerium-based polishing characterized in that the ratio (D 50 / D SEM ) of the 50% diameter (D 50 ) to the number average particle diameter (D SEM ) measured approximately is 1.0 to 2.0 Wood.
ＴＲＥＯ（全酸化希土含有量）中の酸化セリウム含有率（ＣｅＯ２／ＴＲＥＯ）が３０質量％以上であり、
レーザ回折散乱法粒子径分布測定の体積基準の積算分率における５０％径（Ｄ５０ ＊）が０．１〜０．５μｍであるとともに、走査型電子顕微鏡による研摩材の観察画像における研摩材粒子を円形近似して測定した個数平均粒子径（ＤＳＥＭ ＊）に対する前記５０％径（Ｄ５０ ＊）の比（Ｄ５０ ＊／ＤＳＥＭ ＊）が１．０〜２．０であることを特徴とするセリウム系研摩材中間体。 In the cerium-based abrasive intermediate with cerium-based rare earth hydroxide carbonate as the main component,
The cerium oxide content rate (CeO 2 / TREO) in TREO (total rare earth oxide content) is 30% by mass or more,
The 50% diameter (D 50 * ) in the volume-based cumulative fraction of laser diffraction scattering method particle size distribution measurement is 0.1 to 0.5 μm, and the abrasive particles in the observation image of the abrasive with a scanning electron microscope The ratio (D 50 * / D SEM * ) of the 50% diameter (D 50 * ) to the number average particle diameter (D SEM * ) measured by approximating a circle is 1.0 to 2.0. A cerium-based abrasive intermediate.
該混合液を固液分離することなく６０℃以上に加熱することを特徴とするセリウム系研摩材中間体の製造方法。 An aqueous solution of at least one carbonate-based precipitant selected from the group consisting of alkali metal carbonates, alkali metal hydrogen carbonates, ammonium carbonates and ammonium hydrogen carbonates, and a rare earth compound having a CeO 2 / TREO of 30% by mass or more. The aqueous solution is mixed stoichiometrically with the carbonic acid precipitating agent in excess to produce a precipitate,
A method for producing a cerium-based abrasive intermediate, wherein the mixed liquid is heated to 60 ° C. or higher without performing solid-liquid separation.
A glass substrate polished by the cerium-based abrasive according to claim 1 or 2, wherein the arithmetic average surface roughness Ra is 0.4 nm or less and the arithmetic average microwaviness is 0.5 nm or less.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010506743A (en) * | 2006-10-16 | 2010-03-04 | キャボット マイクロエレクトロニクス コーポレイション | Glass polishing composition and method |
| WO2012101871A1 (en) | 2011-01-25 | 2012-08-02 | コニカミノルタホールディングス株式会社 | Fine abrasive particles and process for producing same |
| JP2015110513A (en) * | 2010-03-09 | 2015-06-18 | エルジー・ケム・リミテッド | Crystalline cerium oxide and method for producing the same |
| CN113368884A (en) * | 2021-06-15 | 2021-09-10 | 南京工程学院 | Limited-area catalyst for catalytic oxidation of carbon monoxide and preparation method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010506743A (en) * | 2006-10-16 | 2010-03-04 | キャボット マイクロエレクトロニクス コーポレイション | Glass polishing composition and method |
| KR101477826B1 (en) * | 2006-10-16 | 2015-01-02 | 캐보트 마이크로일렉트로닉스 코포레이션 | Glass polishing compositions and methods |
| JP2015110513A (en) * | 2010-03-09 | 2015-06-18 | エルジー・ケム・リミテッド | Crystalline cerium oxide and method for producing the same |
| WO2012101871A1 (en) | 2011-01-25 | 2012-08-02 | コニカミノルタホールディングス株式会社 | Fine abrasive particles and process for producing same |
| US9222009B2 (en) | 2011-01-25 | 2015-12-29 | Konica Minolta, Inc. | Fine abrasive particles and method for producing same |
| CN113368884A (en) * | 2021-06-15 | 2021-09-10 | 南京工程学院 | Limited-area catalyst for catalytic oxidation of carbon monoxide and preparation method thereof |
| CN113368884B (en) * | 2021-06-15 | 2023-06-09 | 南京工程学院 | Limited domain type catalyst for carbon monoxide catalytic oxidation and preparation method thereof |
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