JP2006264831A - Film separating method and film separating device - Google Patents

Film separating method and film separating device Download PDF

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JP2006264831A
JP2006264831A JP2005082905A JP2005082905A JP2006264831A JP 2006264831 A JP2006264831 A JP 2006264831A JP 2005082905 A JP2005082905 A JP 2005082905A JP 2005082905 A JP2005082905 A JP 2005082905A JP 2006264831 A JP2006264831 A JP 2006264831A
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substrate
film
peeling
roller
peeling means
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JP4231018B2 (en
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Ryosuke Kawamura
亮輔 河村
Shiyuugo Imaoka
修剛 今岡
Toshiaki Ayabe
利明 綾部
Satoshi Yamamoto
悟史 山本
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SANKI PREC KK
SANKI PRECISION KK
Hitachi Plant Technologies Ltd
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SANKI PREC KK
SANKI PRECISION KK
Hitachi Industries Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To prevent deterioration of the quality of a base plate by preventing damage to the base plate due to vibration and deformation, when a film is separated from the base plate. <P>SOLUTION: When a tip of the base plate 1 reaches an initial separating means 50 on a conveying path, the base plate 1 is sandwiched by rollers 32 from a direction vertical to the conveying path and a front part of the base plate 1 is held by a clamp tool 21. By the initial separating means 50, a tip part of the film 3 attached on the surface of the base plate 1 is partially separated. The tip part of the film 3 partially separated by the initial separating means 50 is held by a main separating means 60, and is moved to the downstream side on the conveying path by the clamp tool 21 while the front part is held by the clamp tool 21. The base plate 1 is sandwiched by rollers 42 from a direction vertical to the conveying path to release holding of the front part by the clamp tool 21. After the clamp tool 21 is retreated, the film 3 is totally separated from the base plate 1 conveyed to the downstream side on the conveying path by the main separating means 60. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、搬送路上を搬送される基板の表面に貼られたフィルムの先端部を初期剥離手段で部分的に剥離し、その部分的に剥離した箇所から主剥離手段でフィルムを全面的に剥離するフィルム剥離方法とフィルム剥離装置に関するものである。   In the present invention, the tip of the film affixed to the surface of the substrate conveyed on the conveying path is partially peeled off by the initial peeling means, and the film is peeled off entirely by the main peeling means from the partially peeled portion. The present invention relates to a film peeling method and a film peeling apparatus.

従来のフィルム剥離方法として、粘着テ−プによりフィルムをレジスト膜面から浮き上がらせた後にフィルムクランパ−でフィルムを把持しフィルムを剥離する方法(特許文献1参照)や、基板とフィルムの前端部の間に圧縮気体を噴射して初期剥離を行なう基板搬送路における噴射ノズルの下流に基板を挟む押さえロ−ラを設け、基板の振動を防止しつつフィルムを全面的に剥離する方法(特許文献2参照)などがある。   As a conventional film peeling method, after the film is lifted from the resist film surface by an adhesive tape, the film is gripped by a film clamper (see Patent Document 1), or the front end of the substrate and the film A method of peeling the film entirely while preventing vibration of the substrate by providing a holding roller that sandwiches the substrate downstream of the spray nozzle in the substrate transport path in which the compressed gas is jetted in between to perform initial peeling (Patent Document 2) See).

特開平6−278936号公報JP-A-6-278936 特開2000−203759号公報JP 2000-203759 A

粘着テ−プでフィルムの初期剥離を行なう上記前者の従来技術では、基板が薄く基板両面にフィルムが貼り付けられている場合、基板とフィルムの貼付力の微少な差や粘着テ−プがフィルムに粘着する位置の差等により、基板の上面と下面にフィルム剥離荷重の差を生じて、基板が粘着テ−プ剥離方向の上面側または下面側に変形することがある。   In the former prior art in which the film is initially peeled off with an adhesive tape, when the substrate is thin and the film is attached to both sides of the substrate, a slight difference in the adhesive force between the substrate and the film or the adhesive tape Due to the difference in the position of sticking to the substrate, a difference in film peeling load is generated between the upper surface and the lower surface of the substrate, and the substrate may be deformed to the upper surface side or the lower surface side in the adhesive tape peeling direction.

変形した基板をフィルムの剥離をしながら下流に搬送すると、搬送方向にある搬送ロ−ラに基板が衝突し、損傷するなどの問題があった。   When the deformed substrate is transported downstream while peeling off the film, there is a problem that the substrate collides with the transport roller in the transport direction and is damaged.

また、気体を噴射して初期剥離を行なう上記後者の従来技術では、フィルムを初期剥離してできる隙間の大きさが上面と下面で差が生じていたり、上面,下面の気体噴射力に差がある場合には、基板は気体噴射中に基板振動防止用ロ−ラに挟まれていないため、基板が変形したり振動して、搬送ロ−ラに基板が衝突し、損傷するなどの問題があった。   In the latter prior art in which gas is injected to perform initial peeling, there is a difference in the size of the gap formed by initial peeling of the film between the upper surface and the lower surface, or there is a difference in gas injection force between the upper and lower surfaces. In some cases, since the substrate is not sandwiched between the substrate vibration prevention rollers during gas injection, the substrate may be deformed or vibrated, causing the substrate to collide with the transfer roller and be damaged. there were.

それゆえ本発明の目的は、フィルムの初期剥離段階からフィルムを基板から剥離しながら搬送する段階において、基板が損傷することがなく、基板の品質を阻害しないフィルム剥離方法とフィルム剥離装置を提供することにある。   SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a film peeling method and a film peeling apparatus that do not impair the quality of the substrate without damaging the substrate in the stage of transporting the film while peeling from the substrate from the initial peeling stage of the film. There is.

上記目的を達成する本発明フィルム剥離方法の特徴とするところは、搬送路上を搬送される基板の表面に貼られたフィルムの先端部を初期剥離手段で部分的に剥離し、その部分的に剥離した箇所から主剥離手段で該フィルムを全面的に剥離するフィルム剥離方法において、基板の先端が搬送路における初期剥離手段に達したところで、該基板を該搬送路に垂直な方向から第一のローラで挟持するとともに該基板の前部をクランプ具で把持し、該初期剥離手段により該基板の表面に貼られたフィルムの先端部を部分的に剥離し、該初期剥離手段で部分的に剥離したフィルムの先端部を主剥離手段で把持し、該クランプ具で該前部を把持したまま該基板を該クランプ具により搬送路上を下流側に移動させ、該基板を該搬送路に垂直な方向から第二のローラで挟持して該クランプ具による該前部の把持を解き、該クランプ具が退避した後に、該主剥離手段で搬送路上を下流側に搬送される該基板から該フィルムを全面的に剥離することにある。   A feature of the film peeling method of the present invention that achieves the above-mentioned object is that the leading edge of the film attached to the surface of the substrate conveyed on the conveying path is partially peeled by the initial peeling means, and the film is partially peeled off. In the film peeling method in which the film is peeled entirely from the spot by the main peeling means, when the tip of the substrate reaches the initial peeling means in the conveyance path, the first roller is removed from the direction perpendicular to the conveyance path. And holding the front part of the substrate with a clamp, partially peeling the tip of the film attached to the surface of the substrate by the initial peeling means, and partially peeling by the initial peeling means Grasping the leading edge of the film with the main peeling means, moving the substrate downstream on the transport path with the clamp tool while gripping the front part with the clamp tool, and moving the substrate from the direction perpendicular to the transport path second The film is peeled entirely from the substrate transported downstream on the transport path by the main stripping means after the front end of the clamp tool is released by being clamped by a roller and the clamp tool is retracted. There is.

また、上記目的を達成する本発明フィルム剥離装置の特徴とするところは、搬送路上を搬送される基板の表面に貼られたフィルムの先端部を部分的に剥離する初期剥離手段とその部分的に剥離した箇所から該フィルムを全面的に剥離する主剥離手段を有するフィルム剥離装置において、先端が該搬送路における該初期剥離手段に到達した該基板を該搬送路に垂直な方向から挟持する第一のローラと、該基板の前部を把持して下流側に移動させてから該把持を解き退避するクランプ具と、該クランプ具が該把持を解く前に該基板を該搬送路に垂直な方向から挟持する第二のローラとを設けてあり、該主剥離手段は該初期剥離手段で部分的に剥離したフィルムの先端部を把持して該基板が搬送路上を下流側に搬送する間に該フィルムを全面的に剥離するようになされていることにある。   Moreover, the place which characterizes the film peeling apparatus of this invention which achieves the said objective is that the initial peeling means which peels off the front-end | tip part of the film affixed on the surface of the board | substrate conveyed on a conveyance path partially, and its part In a film peeling apparatus having a main peeling means for peeling the film entirely from the peeled place, a first holding the substrate that has reached the initial peeling means in the transport path from a direction perpendicular to the transport path. A roller for holding the front part of the substrate and moving it downstream, then releasing the grip and retreating the substrate before the clamp device releases the grip. A second roller that is sandwiched between the main peeling means, and the main peeling means grips the leading edge of the film partially peeled by the initial peeling means while the substrate is conveyed downstream on the conveyance path. Strip film completely In that it is made as to.

本発明によれば、フィルム初期剥離段階で基板をローラで挟むとともに基板の前部をクランプ具で把持することにより、初期剥離時に発生する基板の変形や振動を防ぎ、フィルムを剥離しながらクランプ具が移動することで基板の搬送ロ−ラへの衝突がなくなり、基板の品質を阻害することなくフィルムの剥離ができる。   According to the present invention, the substrate is sandwiched between rollers at the initial film peeling stage, and the front part of the substrate is held by the clamp tool, thereby preventing the deformation and vibration of the substrate that occurs during the initial film peeling, and the clamp tool while peeling the film. The movement of the film eliminates the collision of the substrate with the transfer roller, and the film can be peeled without impairing the quality of the substrate.

以下、本発明の実施形態を図に従って説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1と図2は本発明の一実施形態になるフィルム剥離装置の概略構造を示す平面図と正面図、図3は図1に示した実施形態で基板を第一ローラ機構で拘束する状況を示す要部斜視図、図4と図5は図1に示した実施形態における基板把持機構の概略構造を示す拡大正面図と部分的斜視図である。   1 and 2 are a plan view and a front view showing a schematic structure of a film peeling apparatus according to an embodiment of the present invention, and FIG. 3 shows a situation in which the substrate is restrained by a first roller mechanism in the embodiment shown in FIG. FIG. 4 and FIG. 5 are an enlarged front view and a partial perspective view showing a schematic structure of the substrate gripping mechanism in the embodiment shown in FIG.

尚、以下の説明においては、図1と図2に示すフィルム剥離装置は基板の上下各面からフィルムを剥離するようになっていることから、搬送路上の基板より上側に位置して上面側のフィルムを剥離するものについて引用符号に添字A、また、基板より下側に位置して下面側のフィルムを剥離するものについては添字Bを付加し、総称する場合は添字を除くものとする。   In the following description, since the film peeling apparatus shown in FIGS. 1 and 2 is designed to peel the film from the upper and lower surfaces of the substrate, it is positioned above the substrate on the transport path and on the upper surface side. Subscript A is added to the reference sign for those that peel off the film, and subscript B is added for those that peel the film on the lower surface side located below the substrate.

図1,図2に示すフィルム剥離装置100は、搬送用ローラ10,基板把持機構20,第一ローラ機構30,第二ローラ機構40,初期剥離手段50,フィルム剥離搬送手段60,フィルム回収容器70,制御装置80等から構成される。   The film peeling apparatus 100 shown in FIGS. 1 and 2 includes a transport roller 10, a substrate gripping mechanism 20, a first roller mechanism 30, a second roller mechanism 40, an initial peeling means 50, a film peeling and conveying means 60, and a film collection container 70. , Control device 80 and the like.

搬送用ローラ10は基板1を搬送するため水平に複数個並べられ、基板1の搬送路を形成し、基板1を矢印Aで示すようにフィルム剥離装置100の左側(投入口)から右側(排出口)に向かって搬送する。尚、搬送用ローラ10は、適宜な間隔をおいて基板1を挟んで下流に向けて移動させたり移動を停止させたりするピンチローラを含んでいるが、図を簡略化するためにピンチローラの図示は省略し、総称して搬送用ローラ10と呼ぶ。   A plurality of transfer rollers 10 are arranged horizontally to transfer the substrate 1 to form a transfer path for the substrate 1, and the substrate 1 is moved from the left side (input port) to the right side (discharge port) of the film peeling apparatus 100 as indicated by an arrow A. Transport toward the exit. Note that the transport roller 10 includes a pinch roller that moves toward the downstream with the substrate 1 interposed therebetween at an appropriate interval or stops the movement, but in order to simplify the drawing, The illustration is omitted, and is collectively referred to as a conveyance roller 10.

フィルム剥離装置100の排出口側下部には制御装置80があり、制御装置80は、CPU,外部記憶装置,入出力装置,入出力制御装置,プログラムを記録したROM,及び各部の状況などに関する一時的なデータを記録するRAMなどを含むコンピュータにより構成される。   A control device 80 is provided at the lower part on the discharge port side of the film peeling apparatus 100. The control device 80 is a temporary controller that relates to a CPU, an external storage device, an input / output device, an input / output control device, a ROM that stores a program, and the status of each unit. A computer including a RAM or the like for recording typical data.

制御装置80は、入出力装置を介して与えられた制御条件とデータ及び搬送路に設置した基板位置検出用の光学式センサなどのセンサや各部の作動状況を把握するセンサやエンコ−ダの検出値などに基づいてROMに記録されたプログラムに従って装置のシーケンス制御を行い、フィルム剥離のために搬送用ローラ1,基板把持機構20,初期剥離手段50,フィルム剥離搬送手段60などにおける各ローラ駆動用のモータやエアーシリンダなどの駆動手段などへ制御指令を出力する。   The control device 80 detects the control conditions and data given via the input / output device, sensors such as an optical sensor for detecting the substrate position installed in the transport path, and sensors and encoders that grasp the operating status of each part. The sequence control of the apparatus is performed in accordance with the program recorded in the ROM based on the value, etc., for driving each roller in the transport roller 1, the substrate gripping mechanism 20, the initial peeling means 50, the film peeling and conveying means 60, etc. for film peeling. Control commands are output to driving means such as motors and air cylinders.

尚、シーケンス制御は以下の動作説明の通りであり、高度な演算や判断などの処理をしないので、そのフローの図示は省略する。   Note that the sequence control is as described in the following operation, and does not perform processing such as high-level calculations and determinations, so the flow is not shown.

図4に示すように、基板1の上面および下面にはレジスト膜2が接着されており、さらにレジスト膜2上には基板1が製造工程で処理される際にレジスト膜2を保護するため保護フィルム3が積層し貼られている。レジスト膜2は熱処理により基板1の表面に接着され、保護フィルム3はレジスト膜2自体が持つ粘着性でレジスト膜2に貼られている。   As shown in FIG. 4, a resist film 2 is bonded to the upper and lower surfaces of the substrate 1, and the resist film 2 is protected to protect the resist film 2 when the substrate 1 is processed in the manufacturing process. A film 3 is laminated and pasted. The resist film 2 is adhered to the surface of the substrate 1 by heat treatment, and the protective film 3 is attached to the resist film 2 with the adhesive property of the resist film 2 itself.

レジスト膜2と保護フィルム3は、基板1の搬送方向である長手方向において基板1の寸法より短くて基板1の前端部と後端部は露出しており、基板1の搬送方向と直交する幅方向は基板1の寸法に一致している。   The resist film 2 and the protective film 3 are shorter than the dimension of the substrate 1 in the longitudinal direction, which is the conveyance direction of the substrate 1, and the front end portion and the rear end portion of the substrate 1 are exposed, and the width is orthogonal to the conveyance direction of the substrate 1. The direction coincides with the dimension of the substrate 1.

複数の搬送用ローラ10よりなる基板1の搬送路の途中に設けられた基板把持機構20,初期剥離手段50およびフィルム剥離搬送手段60は、基板1の幅方向における両端部側に設けてある。   The substrate gripping mechanism 20, the initial peeling unit 50, and the film peeling / carrying unit 60 provided in the middle of the conveyance path of the substrate 1 composed of the plurality of conveyance rollers 10 are provided on both end sides in the width direction of the substrate 1.

基板把持機構20は、図3乃至図5に示すように、基板1の前端における幅方向両端部を把持するもので、基板上面のL型のクランプ具21Aと基板下面のL型のクランプ具21Bが基板面上下方向に移動させるシリンダ22に連結されている。   As shown in FIGS. 3 to 5, the substrate gripping mechanism 20 grips both ends in the width direction at the front end of the substrate 1, and an L-shaped clamp tool 21A on the upper surface of the substrate and an L-type clamp tool 21B on the lower surface of the substrate. Is connected to a cylinder 22 that moves in the vertical direction of the substrate surface.

フィルム剥離装置100の固定板23に固定されたリニアガイドの固定部24にスライドブッシュ25を介して可動部26を結合してあり、この可動部26にシリンダ22を上下移動させるシリンダ27を設けてある。   A movable portion 26 is coupled to a linear guide fixed portion 24 fixed to a fixed plate 23 of the film peeling apparatus 100 via a slide bush 25, and a cylinder 27 for moving the cylinder 22 up and down is provided on the movable portion 26. is there.

固定板22にはシリンダ28を装着されしてあり、シリンダ28の出力軸はリニアガイドの可動部26と結合してある。従って、クランプ具21は基板搬送方向に直交する上下方向にシリンダ27で移動するとともに、シリンダ28で基板搬送方向に移動するようになっている。   A cylinder 28 is mounted on the fixed plate 22, and the output shaft of the cylinder 28 is coupled to the movable portion 26 of the linear guide. Accordingly, the clamp 21 is moved by the cylinder 27 in the vertical direction orthogonal to the substrate transport direction, and is moved by the cylinder 28 in the substrate transport direction.

第一ローラ機構30は基板把持機構20の上流側に設けてあり、フィルム剥離装置100の固定部に設けたシリンダ31とその出力軸の先端に設けてある圧接ローラ32とで構成される。   The first roller mechanism 30 is provided on the upstream side of the substrate gripping mechanism 20, and includes a cylinder 31 provided at a fixed portion of the film peeling apparatus 100 and a pressure contact roller 32 provided at the tip of the output shaft.

第二ローラ機構40は基板把持機構20の下流側に設けてあり、フィルム剥離装置100の固定部に設けたシリンダ41とその出力軸の先端に設けてある圧接ローラ42とで構成される。   The second roller mechanism 40 is provided on the downstream side of the substrate gripping mechanism 20, and includes a cylinder 41 provided at a fixed portion of the film peeling apparatus 100 and a pressure roller 42 provided at the tip of the output shaft.

シリンダ31,41の作動で上下の両圧接ローラ32,42は基板1の上下各面に向けて移動して基板1を挟持するけれども基板1の下流側への移動に合わせて回転し、基板1の下流側への搬送の障害にならぬようになっている。   By the operation of the cylinders 31 and 41, the upper and lower pressure contact rollers 32 and 42 move toward the upper and lower surfaces of the substrate 1 to sandwich the substrate 1, but rotate in accordance with the downstream movement of the substrate 1. It does not become a hindrance to transport to the downstream side.

下側の第一ローラ機構30Bと第二ローラ機構40Bにおける圧接ローラ32B,42Bは、搬送用のローラ10を流用して、上側の圧接ローラ32A,42Aをシリンダ31A,41Aで上下させるだけにしても良い。   The pressure rollers 32B and 42B in the lower first roller mechanism 30B and the second roller mechanism 40B are simply used by using the conveying roller 10 and moving the upper pressure rollers 32A and 42A up and down by the cylinders 31A and 41A. Also good.

図5に示すように、上側の第二ローラ機構40における圧接ローラ42Aの幅方向の寸法を下側の第二ローラ機構40における圧接ローラ42Bよりも短くしているが、同じ長さでも構わない。   As shown in FIG. 5, the dimension in the width direction of the pressure roller 42A in the upper second roller mechanism 40 is shorter than the pressure roller 42B in the lower second roller mechanism 40, but it may be the same length. .

基板の上下各面に貼り付けてあるフィルムの初期剥離手段50は、図1,図2に示すようにフィルム3の幅方向の先端近くに2列対向して上下の分を含めて合計4箇所設けている。   As shown in FIGS. 1 and 2, the initial peeling means 50 for the film attached to the upper and lower surfaces of the substrate is a total of four locations, including the upper and lower portions, facing two rows near the front end of the film 3 in the width direction. Provided.

初期剥離機構の一例は、フィルム剥離装置100の固定部に設けてあるシリンダ51とその出力軸先端に設けた粘着ローラ52とからなるものである。   An example of the initial peeling mechanism is composed of a cylinder 51 provided at a fixed portion of the film peeling apparatus 100 and an adhesive roller 52 provided at the tip of the output shaft.

フィルム剥離搬送手段60は、図1,図2に示すように、基板1の幅方向において両初期剥離手段50の内側に上下の分を含めて合計4箇所設けている。   As shown in FIGS. 1 and 2, the film peeling / conveying means 60 is provided in a total of four locations including the upper and lower portions inside the initial peeling means 50 in the width direction of the substrate 1.

一例として、各箇所において2本の無端ベルトを反対方向に回転させ、同一方向に移動する2本の無端ベルトの間に初期剥離手段50が剥離した保護フィルム3の初期剥離部から挟んで搬送するようになっている。   As an example, two endless belts are rotated in opposite directions at each location, and are transported by being sandwiched from the initial peeling portion of the protective film 3 peeled off by the initial peeling means 50 between the two endless belts moving in the same direction. It is like that.

フィルム剥離搬送手段60は、基板1が搬送方向に移動する際に、基板1から保護フィルム3の全体を前端部から剥ぎ取り、フィルム剥離装置100の入口側に設けてあるフィルム回収容器70に送り込む。   When the substrate 1 moves in the transport direction, the film peeling / conveying means 60 peels the entire protective film 3 from the substrate 1 from the front end and sends it to the film collection container 70 provided on the inlet side of the film peeling apparatus 100. .

以下、上記のように構成された装置の動作を説明する。
基板1は、図1,図2の矢印A方向にフィルム剥離装置100の投入口から搬送用ローラ10によりフィルム剥離装置100の出口に向かって搬送されていく。
Hereinafter, the operation of the apparatus configured as described above will be described.
The substrate 1 is conveyed toward the exit of the film peeling apparatus 100 by the conveying roller 10 from the inlet of the film peeling apparatus 100 in the direction of arrow A in FIGS.

基板1が初期剥離手段50の所定位置に到達すると、図示していない光学式センサにより検知され、図3,図4に示すように第一ローラ機構30の圧接ロ−ラ32が矢印B方向にシリンダ31の作動により移動し、基板1を拘束する。   When the substrate 1 reaches a predetermined position of the initial peeling means 50, it is detected by an optical sensor (not shown), and the pressure roller 32 of the first roller mechanism 30 is moved in the direction of arrow B as shown in FIGS. It moves by the operation of the cylinder 31 to restrain the substrate 1.

基板1が拘束されると、図4,図5に示すように、基板把持機構20のシリンダ27,28の作動によりクランプ具21が基板1の前端部に向けて接近し、シリンダ22の作動によりクランプ具21は矢印C方向に移動して基板1における幅方向のフィルム前端両側の基板端部付近を把持する。   When the substrate 1 is constrained, as shown in FIGS. 4 and 5, the clamping tool 21 approaches toward the front end portion of the substrate 1 by the operation of the cylinders 27 and 28 of the substrate holding mechanism 20, and the operation of the cylinder 22 The clamping tool 21 moves in the direction of arrow C and grips the vicinity of the substrate end portions on both sides of the film front end in the width direction in the substrate 1.

クランプ具21で基板幅方向のフィルム前端両側の基板端部付近を把持したら、第一ローラ機構30の圧接ロ−ラ32で基板1を拘束したまま、初期剥離手段50のシリンダ51で粘着ローラ52を基板幅方向のフィルム前端両側で上下各面の保護フィルム3に接着させ、その後シリンダ51を引き戻すことにより上下各面の保護フィルム3を初期剥離させる。   When the clamp tool 21 grips the vicinity of the substrate end on both sides of the front end of the film in the substrate width direction, the adhesive roller 52 is fixed by the cylinder 51 of the initial peeling means 50 while the substrate 1 is restrained by the pressure roller 32 of the first roller mechanism 30. Is adhered to the protective film 3 on each of the upper and lower surfaces on both sides of the front end of the film in the substrate width direction, and then the protective film 3 on each of the upper and lower surfaces is initially peeled by pulling back the cylinder 51.

保護フィルム3の初期剥離をした箇所をフィルム剥離搬送手段60に把持させ、保護フィルム3を剥離しながら基板1の搬送を開始する。   The portion where the protective film 3 is initially peeled is held by the film peeling / conveying means 60, and the substrate 1 is started to be conveyed while peeling the protective film 3.

搬送用ロ−ラ10による基板1の下流側への搬送と同時に基板把持機構20のシリンダ28で基板1を把持したクランプ具21も矢印D方向(図4,図5)に同期移動させる。基板1の前端部が第二ローラ機構40の圧接ロ−ラ42に到達すると、保護フィルム3の剥離及び基板1の搬送を一旦停止し、シリンダ22の作動によりクランプ具21を矢印Cとは逆方向に可動させ、基板1の把持を開放し、シリンダ28を矢印D方向にさらに作動させ、クランプ具21が基板1の前端部に接触しない位置でシリンダ27によりクランプ具21を矢印E方向に作動させ、基板搬送面よりも高い位置に基板把持機構20を作動させ、クランプ具21を基板1の搬送路から退避させる。   Simultaneously with the conveyance of the substrate 1 to the downstream side by the conveyance roller 10, the clamp tool 21 that grasps the substrate 1 with the cylinder 28 of the substrate grasping mechanism 20 is also moved synchronously in the direction of arrow D (FIGS. 4 and 5). When the front end portion of the substrate 1 reaches the pressure roller 42 of the second roller mechanism 40, the peeling of the protective film 3 and the conveyance of the substrate 1 are temporarily stopped, and the clamping tool 21 is reversed from the arrow C by the operation of the cylinder 22. The cylinder 28 is further operated in the direction of arrow D, and the clamp tool 21 is operated in the direction of arrow E by the cylinder 27 at a position where the clamp tool 21 does not contact the front end of the board 1. Then, the substrate gripping mechanism 20 is operated at a position higher than the substrate transport surface, and the clamp tool 21 is retracted from the transport path of the substrate 1.

その後、第二ローラ機構40のシリンダ41を矢印F方向に作動させ、圧接ロ−ラ42により基板1を押さえた後、フィルムの剥離及び基板の搬送を再開させる。   Thereafter, the cylinder 41 of the second roller mechanism 40 is operated in the direction of arrow F, and after the substrate 1 is pressed by the pressure roller 42, the film peeling and the substrate transport are resumed.

基板把持機構20から開放された基板1は、フィルム剥離搬送手段60の前後に設けられた圧接ロ−ラ32,42によって挟まれ搬送されながら,フィルム剥離搬送手段60により保護フィルム3が基板1から剥離され、基板搬送A方向に搬送される。   The substrate 1 released from the substrate gripping mechanism 20 is sandwiched and conveyed between the pressure rollers 32 and 42 provided before and after the film peeling and conveying means 60, and the protective film 3 is removed from the substrate 1 by the film peeling and conveying means 60. It peels and it is conveyed in the board | substrate conveyance A direction.

フィルム剥離搬送手段60で剥離された保護フィルム3は、矢印G方向に搬送排出され、回収容器70に収納される。   The protective film 3 peeled off by the film peeling / conveying means 60 is conveyed and discharged in the direction of arrow G and stored in the collection container 70.

保護フィルム3を剥離した基板1は、搬送用ローラ10でフィルム剥離装置100の後段に設けた洗浄処理工程などを行なう装置に搬送される。   The substrate 1 from which the protective film 3 has been peeled is transported by a transport roller 10 to an apparatus for performing a cleaning process step provided at a subsequent stage of the film peeling apparatus 100.

以上説明したように、本実施形態では基板1上に貼られた保護フィルム3の初期剥離段階において基板1を圧接ロ−ラ32により拘束し、基板前端部を基板把持機構20のクランプ具21により把持して基板1を搬送し、圧接ロ−ラ42で基板1を挟むことにより、フィルム剥離荷重を基板搬送方向の上流側と下流側の圧接ロ−ラ32,42で受けて基板1の変形を防止し、基板1の搬送時に搬送用ロ−ラ10などへの衝突を防ぐことで基板10の損傷を防ぎ、高品質な状態で基板のフィルム剥離ができる。   As described above, in the present embodiment, the substrate 1 is restrained by the pressure roller 32 and the front end of the substrate is clamped by the clamp tool 21 of the substrate gripping mechanism 20 in the initial peeling stage of the protective film 3 stuck on the substrate 1. The substrate 1 is gripped and conveyed, and the substrate 1 is sandwiched between the pressure rollers 42, whereby the film peeling load is received by the pressure rollers 32 and 42 on the upstream side and the downstream side in the substrate conveyance direction, and the substrate 1 is deformed. And preventing the substrate 10 from colliding with the transfer roller 10 when the substrate 1 is transferred, thereby preventing the substrate 10 from being damaged and allowing the film to be peeled off in a high quality state.

特に、薄板基板の場合、基板とフィルムの接着力の差、粘着テ−プが基板表面に貼り付いているフィルムに粘着する位置の差等により生じるフィルム剥離時の変形を防ぐことができる。   In particular, in the case of a thin substrate, it is possible to prevent deformation at the time of film peeling caused by a difference in adhesion between the substrate and the film, a difference in position where the adhesive tape adheres to the film attached to the substrate surface, and the like.

薄い基板で基板自身の剛性が小さいために基板の撓みが大きくなり、また、下側の保護フィルム3の剥離手段を設置する場所の確保のために搬送用ロ−ラ10の間隔が大きくなっても、本実施形態では圧接ローラ32,42で基板1の撓みを防ぎ搬送用ロ−ラ10への衝突を防ぎながら、基板1を搬送し保護フィルム1を剥離することができる。   Since the substrate itself is small and the rigidity of the thin substrate is small, the flexure of the substrate increases, and the space between the transfer rollers 10 increases to secure a place for installing the peeling means of the lower protective film 3. In this embodiment, the substrate 1 can be transported and the protective film 1 can be peeled off while the press rollers 32 and 42 prevent the substrate 1 from being bent and prevent the substrate 1 from colliding with the transport roller 10.

圧縮空気などを基板幅方向端面に噴射し薄い基板1から保護フィルム3を初期剥離した場合、基板1の上面と下面に噴射する風力差,噴射角度差,基板幅方向位置差などにより基板面で風力が乱れ、基板1が振動や変形するなどの問題が生じていたが、本実施形態では圧接ロ−ラ32,42により基板1を拘束し、基板前端部を基板把持機構のクランプ具21で把持することにより、基板の振動や変形を防止して確実な初期剥離を得ることができる。   When the protective film 3 is peeled off from the thin substrate 1 by injecting compressed air or the like onto the end surface in the substrate width direction, the difference between the wind force, the injection angle difference, the substrate width direction position difference, etc. However, in this embodiment, the substrate 1 is restrained by the pressure rollers 32 and 42 and the front end of the substrate is clamped by the clamp 21 of the substrate gripping mechanism. By gripping the substrate, vibration and deformation of the substrate can be prevented and reliable initial peeling can be obtained.

本発明の他の実施形態を図6乃至図8の要部概略斜視図で説明する。
各図において、図1〜図5に示した実施形態と同一機能部材には同一符号を付けて、その説明を省略する。
Another embodiment of the present invention will be described with reference to schematic perspective views of main parts of FIGS.
In each figure, the same reference numerals are given to the same functional members as those in the embodiment shown in FIGS. 1 to 5, and the description thereof is omitted.

図6の実施形態では、基板把持機構20を基板幅方向の中央前端部近傍に設け基板把持機構20のクランプ具21の両側に第二ローラ機構40の圧接ロ−ラ42を設けている。本実施形態は、基板1から保護フィルム3を初期剥離する手段を基板幅方向の前端角部に設置した場合などに好都合である。   In the embodiment of FIG. 6, the substrate gripping mechanism 20 is provided in the vicinity of the center front end in the substrate width direction, and the pressure roller 42 of the second roller mechanism 40 is provided on both sides of the clamp 21 of the substrate gripping mechanism 20. This embodiment is convenient when a means for initially peeling the protective film 3 from the substrate 1 is installed at the front end corner in the substrate width direction.

図7の実施形態では、基板幅方向の基板前端部に複数以上に分割された基板把持機構20のクランプ具21を設け、各クランプ具21の間に第二ローラ機構40の圧接ロ−ラ42を設けている。この実施形態は、基板1を各クランプ具21で把持し圧接ロ−ラ42で挟持する箇所が多いので、基板1が薄い場合に好都合である。   In the embodiment of FIG. 7, the clamp tool 21 of the substrate gripping mechanism 20 divided into a plurality of parts is provided at the front end of the substrate in the substrate width direction, and the pressure roller 42 of the second roller mechanism 40 is interposed between the clamp tools 21. Is provided. This embodiment is convenient when the substrate 1 is thin because there are many places where the substrate 1 is gripped by the clamps 21 and held by the pressure roller 42.

図8の実施形態では、基板1の前端部全幅を把持する基板把持機構20のクランプ具21を用い、第二ローラ機構40としてフィルム剥離装置100の固定具43にシリンダ44を装着し、このシリンダ44に連結したロ−ラ支持金具45に圧接ロ−ラ46を設けている。   In the embodiment of FIG. 8, the clamp tool 21 of the substrate gripping mechanism 20 that grips the full width of the front end of the substrate 1 is used, and the cylinder 44 is mounted on the fixture 43 of the film peeling apparatus 100 as the second roller mechanism 40. A pressure contact roller 46 is provided on a roller support bracket 45 connected to 44.

圧接ロ−ラ46はシリンダ44で降下されており、基板2が圧接ロ−ラ46上に到達するとシリンダ44が矢印H方向に作動し、圧接ロ−ラ46が上昇して基板1を下側から支持するとともに、シリンダ41で圧接ロ−ラ42が降下されて圧接ロ−ラ46との間に基板1を挟持する。この実施形態は、基板幅の小さい基板1から保護フィルム3を剥離する場合などに適用すると良い。   The pressure roller 46 is lowered by the cylinder 44. When the substrate 2 reaches the pressure roller 46, the cylinder 44 operates in the direction of the arrow H, and the pressure roller 46 is lifted to bring the substrate 1 downward. The pressure roller 42 is lowered by the cylinder 41 and the substrate 1 is sandwiched between the pressure roller 46. This embodiment is preferably applied to the case where the protective film 3 is peeled from the substrate 1 having a small substrate width.

本発明は、以上の実施形態に限らず、次ぎのように実施してもよい。
(1)クランプ具21は、基板1の前端部でなく、前方側端部を把持してもよい。
(2)クランプ具21の駆動は、シリンダに代えてサーボモ−タなどで駆動してもよい。
(3)基板把持機構20の駆動部は、搬送路の下側に配置してもよい。
(4)図8の圧接ロ−ラ46は、基板1の撓み防止用の基板支持ロ−ラとして、さらに複数個設置してもよい。
(5)初期剥離手段50およびフィルム剥離搬送手段60については、気体噴射方式のものを採用してもよい。
(6)基板1の上面あるいは下面の片側に貼られたフィルムを剥離させるものでもよい。
(7)基板1は、ガラス,セラミック,樹脂,半導体などの基板でもよい。
(8)基板から剥離するフィルムは、レジスト膜の保護フィルムでなくてもよい。
The present invention is not limited to the above embodiment, and may be implemented as follows.
(1) The clamp tool 21 may hold the front end portion instead of the front end portion of the substrate 1.
(2) The clamp tool 21 may be driven by a servo motor or the like instead of the cylinder.
(3) The drive unit of the substrate gripping mechanism 20 may be disposed below the transport path.
(4) A plurality of pressure contact rollers 46 in FIG. 8 may be installed as substrate support rollers for preventing the substrate 1 from bending.
(5) About the initial peeling means 50 and the film peeling conveyance means 60, you may employ | adopt the thing of a gas injection system.
(6) The film pasted on one side of the upper surface or the lower surface of the substrate 1 may be peeled off.
(7) The substrate 1 may be a substrate such as glass, ceramic, resin, or semiconductor.
(8) The film peeled from the substrate may not be a resist film protective film.

本発明の一実施形態になるフィルム剥離装置の概略構造を示す平面図である。It is a top view which shows schematic structure of the film peeling apparatus which becomes one Embodiment of this invention. 図1に示したフィルム剥離装置の概略構造を示す正面図である。It is a front view which shows schematic structure of the film peeling apparatus shown in FIG. 図1の実施形態で基板を第一ローラ機構で拘束する状況を示す要部斜視図である。It is a principal part perspective view which shows the condition which restrains a board | substrate with the 1st roller mechanism in embodiment of FIG. 図1の実施形態で基板を基板把持機構で把持する状況を示す要部正面図である。It is a principal part front view which shows the condition which hold | grips a board | substrate with a board | substrate holding | grip mechanism in embodiment of FIG. 図1の実施形態で基板を基板把持機構で把持する状況を示す要部斜視図である。It is a principal part perspective view which shows the condition which hold | grips a board | substrate with a board | substrate holding | grip mechanism in embodiment of FIG. 本発明の他の実施形態になるフィルム剥離装置における基板把持機構と第一ローラ機構を示す要部斜視図である。It is a principal part perspective view which shows the board | substrate holding | grip mechanism and 1st roller mechanism in the film peeling apparatus which becomes other embodiment of this invention. 本発明の他の実施形態になるフィルム剥離装置における基板把持機構と第一ローラ機構を示す要部斜視図である。It is a principal part perspective view which shows the board | substrate holding | grip mechanism and 1st roller mechanism in the film peeling apparatus which becomes other embodiment of this invention. 本発明の他の実施形態になるフィルム剥離装置における基板把持機構と第一ローラ機構を示す要部斜視図である。It is a principal part perspective view which shows the board | substrate holding | grip mechanism and 1st roller mechanism in the film peeling apparatus which becomes other embodiment of this invention.

符号の説明Explanation of symbols

1…基板
2…レジスト膜
3…保護フィルム
10…搬送用ローラ
20…基板把持機構
21…クランプ具
30…第一ロ−ラ機構
32…圧接ロ−ラ
40…第二ロ−ラ機構
42…圧接ロ−ラ
50…初期剥離手段
60…フィルム剥離搬送手段
70…フィルム回収容器
80…制御装置
100…フィルム剥離装置
1 ... Board
2 ... Resist film
3 ... Protective film
10 ... Conveying roller
20 ... Substrate gripping mechanism
21 ... Clamp tool
30 ... First roller mechanism
32 ... Pressure contact roller
40. Second roller mechanism
42. Pressure welding roller
50. Initial peeling means
60. Film peeling and conveying means
70 ... Film collection container
80 ... Control device
100 ... Film peeling device

Claims (4)

搬送路上を搬送される基板の表面に貼られたフィルムの先端部を初期剥離手段で部分的に剥離し、その部分的に剥離した箇所から主剥離手段で該フィルムを全面的に剥離するフィルム剥離方法において、
基板の先端が搬送路における初期剥離手段に達したところで、該基板を該搬送路に垂直な方向から第一のローラで挟持するとともに該基板の前部をクランプ具で把持し、該初期剥離手段により該基板の表面に貼られたフィルムの先端部を部分的に剥離し、該初期剥離手段で部分的に剥離したフィルムの先端部を主剥離手段で把持し、該クランプ具で該前部を把持したまま該基板を該クランプ具により搬送路上を下流側に移動させ、該基板を該搬送路に垂直な方向から第二のローラで挟持して該クランプ具による該前部の把持を解き、該クランプ具が退避した後に、該主剥離手段で搬送路上を下流側に搬送される該基板から該フィルムを全面的に剥離することを特徴とするフィルム剥離方法。
Film peeling that partially peels off the tip of the film affixed to the surface of the substrate transported on the transport path with the initial peeling means, and peels the film entirely with the main peeling means from the partially peeled portion In the method
When the leading edge of the substrate reaches the initial peeling means in the conveyance path, the substrate is clamped by a first roller from a direction perpendicular to the conveyance path, and the front portion of the substrate is held by a clamp tool, and the initial peeling means To partially peel off the tip of the film attached to the surface of the substrate, hold the tip of the film partially peeled off by the initial peeling means with the main peeling means, and While holding the substrate, the substrate is moved downstream on the conveyance path by the clamp tool, the substrate is clamped by a second roller from a direction perpendicular to the conveyance path, and the front part is grasped by the clamp tool. A film peeling method characterized in that after the clamping tool is retracted, the main peeling means peels the film entirely from the substrate conveyed downstream on the conveyance path.
搬送路上を搬送される基板の表面に貼られたフィルムの先端部を部分的に剥離する初期剥離手段とその部分的に剥離した箇所から該フィルムを全面的に剥離する主剥離手段を有するフィルム剥離装置において、
先端が該搬送路における該初期剥離手段に到達した該基板を該搬送路に垂直な方向から挟持する第一のローラと、該基板の前部を把持して下流側に移動させてから該把持を解き退避するクランプ具と、該クランプ具が該把持を解く前に該基板を該搬送路に垂直な方向から挟持する第二のローラとを設けてあり、該主剥離手段は該初期剥離手段で部分的に剥離したフィルムの先端部を把持して該基板が搬送路上を下流側に搬送する間に該フィルムを全面的に剥離するようになされていることを特徴とするフィルム剥離装置。
Film peeling having an initial peeling means for partially peeling the tip of the film affixed to the surface of the substrate conveyed on the conveyance path and a main peeling means for peeling the film from the partially peeled portion In the device
The first roller that holds the substrate that has reached the initial peeling means in the transport path from the direction perpendicular to the transport path, and grips the front part of the substrate and moves it to the downstream side before the grip And a second roller for clamping the substrate from a direction perpendicular to the transport path before the clamping device releases the grip, and the main peeling means is the initial peeling means. A film peeling apparatus characterized in that the film is peeled completely while gripping the leading edge of the film partially peeled in step (b) and the substrate is transported downstream on the transport path.
請求項2に記載のフィルム剥離装置において、該クランプ具は該基板の先端部若しくは基板幅方向の両縁端部を把持するものであることを特徴とするフィルム剥離装置。   The film peeling apparatus according to claim 2, wherein the clamping tool is configured to grip a tip portion of the substrate or both edge portions in the substrate width direction. 請求項2に記載のフィルム剥離装置において、
該搬送路における該基板の位置を検出するセンサ、該初期剥離手段と該主剥離手段と該クランプ具と該第一のローラおよび第二のローラにおけるそれぞれの作動状態を検出するセンサ、該各センサの検出結果に基づいて該各センサが設けられた各部材を順次作動させる制御手段が設けられたことを特徴とするフィルム剥離装置。
In the film peeling apparatus of Claim 2,
A sensor for detecting the position of the substrate in the transport path, a sensor for detecting respective operation states of the initial peeling means, the main peeling means, the clamp, the first roller and the second roller, and the sensors A film peeling apparatus characterized in that a control means for sequentially operating each member provided with each sensor based on the detection result is provided.
JP2005082905A 2005-03-23 2005-03-23 Film peeling method and film peeling apparatus Expired - Fee Related JP4231018B2 (en)

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JP2007254030A (en) * 2006-03-20 2007-10-04 Adtec Engineeng Co Ltd Film peeling-off device
JP2009023788A (en) * 2007-07-19 2009-02-05 Hitachi Plant Technologies Ltd Film peeling device
JP2009029525A (en) * 2007-07-24 2009-02-12 Hitachi Plant Technologies Ltd Film peeling device
JP2010003819A (en) * 2008-06-19 2010-01-07 Nitta Ind Corp Peeling tool and peeling method
CN102064087A (en) * 2010-10-22 2011-05-18 上海技美电子科技有限公司 Dyestripping method, dyestripping device and dyestripping equipment
CN107351517A (en) * 2016-05-10 2017-11-17 日立成套设备机械股份有限公司 Film peeling apparatus
JP2023001911A (en) * 2021-06-21 2023-01-06 志聖工業股▲ふん▼有限公司 Film stripping-off machine and film stripping-off method
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