JP2006247696A - Laser heating apparatus - Google Patents

Laser heating apparatus Download PDF

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JP2006247696A
JP2006247696A JP2005067408A JP2005067408A JP2006247696A JP 2006247696 A JP2006247696 A JP 2006247696A JP 2005067408 A JP2005067408 A JP 2005067408A JP 2005067408 A JP2005067408 A JP 2005067408A JP 2006247696 A JP2006247696 A JP 2006247696A
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laser
heated
axis direction
heating apparatus
diaphragm
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JP4582779B2 (en
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Tadayuki Uematsu
忠之 植松
Takashi Chiba
貴史 千葉
Masao Terada
昌男 寺田
Isao Sakaguchi
功 坂口
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ALFA EC CO Ltd
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ALFA EC CO Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a laser heating apparatus capable of heating a semiconductor substrate or the like uniformly at high temperature. <P>SOLUTION: The apparatus is composed of a laser oscillator 3 which is formed by stacking a plurality of laser diode bars and an optical lens system 5 which is interposed between the laser oscillator and an object 4 to be heated. The optical lens system comprises collimator lenses 6 installed at the laser exit port of each laser diode bar in the fast axis direction of the laser oscillator 3, a convex lens 7 and a fly's eye lens 8 arranged in order toward the object to be heated. Parallel light beams from the collimator lenses are passed through the convex lens and the fly's eye lens and then, after converged, the beams are defocused and made to emit to the object 4 to be heated. In the slow axis direction of the laser oscillator 3, the laser beam from the laser exit port is shaped by a first diaphragm with the output angle unchanged and emitted to the object to be heated. Near the converging point of the optical lens system 5 in the fast axis direction of the laser oscillator, there is provided a second diaphragm 9 that transmits the laser beam. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はレーザ加熱装置、特に半導体基板等を高温で均一に加熱することができるレーザ加熱装置に関するものである。   The present invention relates to a laser heating apparatus, and more particularly to a laser heating apparatus capable of uniformly heating a semiconductor substrate or the like at a high temperature.

従来、半導体基板等を加熱するためにYAGレーザや炭酸ガスレーザ加熱装置を用いてスポット移動方式、線状ビーム照射方式、スキャニング方式で加熱したり、ストライプ幅の広い高出力半導体レーザ加熱装置を用いて加熱していた(特許文献1)。
特開平10−94892号
Conventionally, a YAG laser or a carbon dioxide laser heating device is used to heat a semiconductor substrate or the like using a spot moving method, a linear beam irradiation method, a scanning method, or a high-power semiconductor laser heating device with a wide stripe width. It was heated (Patent Document 1).
JP-A-10-94892

然しながら、上記スポット移動方式及びスキャニング方式はいずれも加熱すべき部分をレーザ光で走査する方式であるから加熱すべき部分の全体にレーザ光を一度に照射することができず、処理効率が落ちる。また、線状ビーム照射方式やストライプ幅の広い高出力半導体レーザ加熱装置においては、線状でしか加熱することができず一度に大きな面積を所望の温度分布で加熱することができないという欠点があった。   However, since both the spot moving method and the scanning method are methods in which a portion to be heated is scanned with a laser beam, the entire portion to be heated cannot be irradiated with the laser beam at a time, resulting in a reduction in processing efficiency. In addition, the linear beam irradiation method and the high-power semiconductor laser heating apparatus with a wide stripe width have the disadvantage that they can only be heated in a linear shape and a large area cannot be heated at a desired temperature distribution at a time. It was.

また、半導体基板等の被加熱物にレーザ光を垂直に照射した場合に、被加熱物からの反射光で半導体レーザ素子が破損するおそれがあった。   In addition, when a laser beam is irradiated perpendicularly to an object to be heated such as a semiconductor substrate, the semiconductor laser element may be damaged by the reflected light from the object to be heated.

また、レーザ光で発熱した被加熱物が発する輻射熱がレーザ発振器側に戻り、半導体レーザ素子の寿命を縮め、長期安定性能が劣っていた。   Further, the radiant heat generated by the heated object generated by the laser light returns to the laser oscillator side, shortening the life of the semiconductor laser element, and the long-term stability performance is inferior.

また、従来のレーザ加熱装置では速軸方向での被加熱物の照射領域と、遅軸方向での被加熱物の照射領域とが大きく異なる不都合があった。   Further, the conventional laser heating apparatus has a disadvantage that the irradiation area of the object to be heated in the fast axis direction and the irradiation area of the object to be heated in the slow axis direction are greatly different.

本発明は上記の欠点を除くようにしたものである。   The present invention eliminates the above-mentioned drawbacks.

本発明のレーザ加熱装置は、レーザダイオードバーを複数積層せしめて形成したレーザ発振器と、上記レーザ発振器と被加熱物との間に介挿した光学レンズ系とより成り、この光学レンズ系は、レーザ発振器の速軸方向では上記各レーザダイオードバーのレーザ出口に設けたコリメートレンズと、上記被加熱物側に向かうに従って順番に配置せしめた凸レンズ、フライアイレンズとより成り、上記コリメートレンズより出た平行光を、上記凸レンズ、フライアイレンズを通過せしめた後に集光せしめてからデフォーカスして被加熱物に照射せしめ、レーザ発振器の遅軸方向では上記レーザ出口から出た出射角度のままのレーザ光を絞る第1の絞りより成り、上記レーザダイオードバーから出たレーザ光を出射角度のまま上記第1の絞りにより整形し被加熱物に照射せしめることを特徴とする。   The laser heating apparatus of the present invention includes a laser oscillator formed by laminating a plurality of laser diode bars, and an optical lens system interposed between the laser oscillator and an object to be heated. In the direction of the fast axis of the oscillator, a collimating lens provided at the laser exit of each laser diode bar, a convex lens and a fly-eye lens arranged in order toward the object to be heated, and parallel from the collimating lens. The light is focused after passing through the convex lens and fly-eye lens and then defocused to irradiate the object to be heated. In the slow axis direction of the laser oscillator, the laser light remains at the exit angle emitted from the laser exit. The laser beam emitted from the laser diode bar is kept at the emission angle by the first aperture. Shape and wherein the allowed to irradiate the object to be heated.

本発明のレーザ加熱装置においては、上記レーザ発振器の速軸方向では、上記集光されたレーザ光を、そのデフォーカス量を減少するための、または平行光にするための1または複数個の凸レンズを介して被加熱物に照射せしめることを特徴とする。   In the laser heating apparatus of the present invention, in the fast axis direction of the laser oscillator, one or a plurality of convex lenses for reducing the defocus amount of the focused laser beam or making it a parallel beam It is characterized by irradiating an object to be heated through

また、本発明のレーザ加熱装置においては、上記レーザ発振器の遅軸方向では、上記レーザ出口から出たレーザ光を凹レンズにより更に広げることを特徴とする。   In the laser heating apparatus of the present invention, the laser beam emitted from the laser exit is further spread by a concave lens in the slow axis direction of the laser oscillator.

また、上記レーザ発振器の遅軸方向では、上記第1の絞りにより整形したあと、平行光にするための凸レンズを介して被加熱物に照射せしめることを特徴とする。   Further, in the slow axis direction of the laser oscillator, after being shaped by the first diaphragm, the object to be heated is irradiated through a convex lens for making parallel light.

また、上記第1の絞りの開口部のレーザ発振器側の開口面積が上記被加熱物側より大きいことを特徴とする。   The opening area of the first diaphragm aperture on the laser oscillator side is larger than the heated object side.

また、本発明のレーザ加熱装置は、上記レーザ発振器の速軸方向での上記光学レンズ系の集光点近傍に遅軸方向のレーザ光を整形する第2の絞りを有し、この第2の絞りの開口部の被加熱部側の開口面積が、上記レーザ発振器側より大きいことを特徴とする。   The laser heating apparatus of the present invention has a second diaphragm for shaping laser light in the slow axis direction in the vicinity of the condensing point of the optical lens system in the fast axis direction of the laser oscillator. The aperture area of the aperture opening on the heated portion side is larger than that on the laser oscillator side.

また、上記第2の絞りが、熱伝導性の良い材料で形成されていることを特徴とする。   Further, the second diaphragm is formed of a material having good thermal conductivity.

また、上記第2の絞りの被加熱物側の面がセラミックでコートされていることを特徴とする。   The surface of the second diaphragm on the side to be heated is coated with ceramic.

また、上記光学レンズ系及びその集光点近傍の第2の絞りまでを同一レンズホルダ内に設け、上記レンズホルダ部から出たレーザ光をデフォーカス光としたことを特徴とする。   The optical lens system and the second stop near the condensing point are provided in the same lens holder, and the laser light emitted from the lens holder portion is used as defocused light.

本発明のレーザ加熱装置においては、速軸方向のレーザ光を凸レンズを通過させたあとフライアイレンズに通したのでレーザ光を均質化できる。   In the laser heating apparatus of the present invention, since the laser beam in the fast axis direction is passed through the fly-eye lens after passing through the convex lens, the laser beam can be homogenized.

本発明のレーザ加熱装置においては、デフォーカス光を被加熱物に照射せしめたので、一度の照射で被加熱物を短時間に均一に加熱することができる。   In the laser heating apparatus of the present invention, since the object to be heated is irradiated with defocused light, the object to be heated can be uniformly heated in a short time with a single irradiation.

また、上記第2の絞りにより遅軸方向のレーザ光を整形すると共に、上記被加熱物からの反射光がレーザ発振器側に戻るのを軽減せしめ、被加熱物自身の加熱により発する輻射光がレーザ発振器側に入射するのを軽減せしめることができ、レーザ素子の破損を防止することができ、半導体レーザの寿命・性能を著しく向上せしめることができる。   The second aperture shapes the laser beam in the slow axis direction, reduces the return of reflected light from the object to be heated to the laser oscillator side, and emits radiation light generated by heating the object to be heated. The incidence on the oscillator side can be reduced, the laser element can be prevented from being damaged, and the life and performance of the semiconductor laser can be remarkably improved.

また、本発明のレーザ加熱装置においては、速軸方向、遅軸方向とも必要な照射面積が得られた位置に凸レンズを設け、平行光とすることで、レーザ光が無駄なく、被加熱物に照射できるため、装置の余計な箇所を加熱することが少なく、熱ロスがなくなる。   Further, in the laser heating apparatus of the present invention, a convex lens is provided at a position where a necessary irradiation area is obtained in both the fast axis direction and the slow axis direction, and parallel light is used, so that the laser light is not wasted and is to be heated. Since it can irradiate, there is little heating of the extra part of an apparatus and a heat loss is lost.

また、通常は、集光点の光は、絞られずに通過するが、速軸方向での上記光学レンズ系の集光点近傍に第2の絞りを設けたので必要に応じて、レーザ光を必要な形状に整形することも可能である。   Normally, the light at the condensing point passes through without being constricted, but since the second stop is provided near the condensing point of the optical lens system in the fast axis direction, laser light can be transmitted as necessary. It can also be shaped into the required shape.

また、レンズおよび絞りを同一レンズホルダ内に設けたので、コンパクト化を図ることができる。   In addition, since the lens and the diaphragm are provided in the same lens holder, it is possible to reduce the size.

また、レーザダイオードバーの数を増やすことにより、レーザ出力を増やすことができ被加熱物を広範囲に加熱せしめることができ、また、各レーザダイオードの出力を異ならしめたり、ヒータシンク板の厚さを適宜変えて重ねるレーザダイオードバーの間隔を異ならしめたり、レーザダイオードバーを一列でなく、複数列にすることにより、被加熱物を所望の温度分布で加熱することができる。   Also, by increasing the number of laser diode bars, the laser output can be increased and the object to be heated can be heated over a wide range, the output of each laser diode can be made different, and the thickness of the heater sink plate can be adjusted appropriately. The object to be heated can be heated with a desired temperature distribution by changing the interval of the laser diode bars to be stacked differently or by arranging the laser diode bars in a plurality of rows instead of one row.

また、デフォーカス光から必要な面積の箇所で速軸方向、遅軸方向ともに凸レンズを設置し平行光としたので、被加熱物4以外の照射面積を減らしたので、熱ロスを減少できる。   In addition, since convex lenses are provided in both the fast axis direction and the slow axis direction at the necessary area from the defocused light to obtain parallel light, the irradiation area other than the object to be heated 4 is reduced, so that heat loss can be reduced.

以下図面によって本発明の実施例を説明する。   Embodiments of the present invention will be described below with reference to the drawings.

本発明のレーザ加熱装置は、例えば、図1に示すように厚さ0.1mm〜3mmの出力40W〜100Wの連続発振(CW)のレーザダイオードバー1を厚さ1mm〜3mmの銅板からなるヒートシンク板2により挟み込んだものを20枚重ねて構成せしめた出力0.8kW〜2kWのレーザスタックからなるレーザ発振器3と、このレーザ発振器3と被加熱物4間に介挿した光学レンズ系5とにより構成する。   As shown in FIG. 1, the laser heating apparatus according to the present invention includes, for example, a heat sink composed of a copper plate having a thickness of 1 mm to 3 mm and a continuous oscillation (CW) laser diode bar 1 having a thickness of 0.1 mm to 3 mm and an output of 40 W to 100 W. A laser oscillator 3 composed of a laser stack with an output of 0.8 kW to 2 kW composed of 20 sheets sandwiched by plates 2 and an optical lens system 5 interposed between the laser oscillator 3 and the object to be heated 4. Constitute.

また、図2に示すようにレーザ発振器の速軸方向では上記光学レンズ系5を上記各レーザダイオードバー1のレーザ出口に夫々設けたコリメートレンズ6と、上記レーザ発振器3からのレーザが照射される直径2インチのシリコン基板などの被加熱物4と上記コリメートレンズ6との間に、上記被加熱物4側に向って順次に配置せしめた凸レンズ7、フライアイレンズ8、第2の絞り9とにより構成し、上記コリメートレンズ6により平行にされたレーザ光が、上記凸レンズ7を通過し、フライアイレンズ8により、各隣り合うレーザダイオードバー1のピッチ間のレーザ分布が均一とされたあと、レーザ光が集光され、デフォーカスされ、上記被加熱物4に照射されこれを加熱せしめるようにする。   Further, as shown in FIG. 2, in the fast axis direction of the laser oscillator, the collimating lens 6 provided with the optical lens system 5 at the laser exit of each laser diode bar 1 and the laser from the laser oscillator 3 are irradiated. A convex lens 7, a fly-eye lens 8, and a second aperture 9, which are sequentially arranged between the heated object 4 such as a silicon substrate having a diameter of 2 inches and the collimating lens 6 toward the heated object 4. After the laser beam made parallel by the collimator lens 6 passes through the convex lens 7 and the fly eye lens 8 makes the laser distribution between the pitches of the adjacent laser diode bars 1 uniform, The laser beam is condensed, defocused, and irradiated on the object 4 to be heated.

また、図3に示すようにレーザ発振器の遅軸方向では上記レーザダイオードバー1から出たレーザ光を、出射角(約10度)のまま上記第2の絞り9より上記レーザ発振器側に配置した第1の絞り10と第2の絞り9で形を整え上記被加熱物4に照射せしめ加熱せしめるようにする。   Further, as shown in FIG. 3, in the slow axis direction of the laser oscillator, the laser light emitted from the laser diode bar 1 is arranged on the laser oscillator side from the second diaphragm 9 with an emission angle (about 10 degrees). The shape is adjusted by the first diaphragm 10 and the second diaphragm 9, and the object to be heated 4 is irradiated and heated.

なお、上記第1の絞り10の開口11は、レーザ光の遅軸方向の整形を良くするため、図4に示すように被加熱物側から発振器側に向うに従って徐々に開口面積が大きくなるように構成せしめる。   Note that the opening 11 of the first diaphragm 10 has an opening area that gradually increases from the heated object side toward the oscillator side as shown in FIG. 4 in order to improve shaping of the laser beam in the slow axis direction. To make up.

また、上記第2の絞り9の開口12は図5に示すように、上記レーザ発振器側から上記被加熱物側に向うに従って徐々に開口面積が大きくなるように構成せしめる。上記第2の絞り9は遅軸方向のレーザ光を整形すると共に被加熱物4からの反射光や輻射光を広く拡散せしめるために、アルミ板などの熱伝導性の良い材料で構成し、被加熱物側表面をセラミックコートし、微小な凹凸を形成せしめるのが好ましい。   Further, as shown in FIG. 5, the opening 12 of the second diaphragm 9 is configured such that the opening area gradually increases from the laser oscillator side toward the heated object side. The second diaphragm 9 is made of a material having good thermal conductivity such as an aluminum plate in order to shape the slow-axis laser light and diffuse the reflected light and radiant light from the heated object 4 widely. The surface of the heated object is preferably ceramic coated to form minute irregularities.

なお、上記第2の絞り9の開口12は出来るだけ小さくし速軸側集光点位置に設けることが好ましい。   The opening 12 of the second diaphragm 9 is preferably as small as possible and provided at the fast axis side condensing point position.

本発明のレーザ加熱装置においては、上記第2の絞り9により、遅軸側レーザ光を整形すると共に上記被加熱物4からの反射光がレーザ発振器3側に戻るのが軽減され、また、被加熱物4自身の加熱により発する輻射光がレーザ発振器3側に入射するのを軽減せしめることができ、レーザ素子の破損を防止することができ、半導体レーザの寿命・性能を著しく向上せしめることができる。   In the laser heating apparatus of the present invention, the second aperture 9 shapes the slow-axis side laser light and reduces the reflected light from the object to be heated 4 to the laser oscillator 3 side. It is possible to reduce the incidence of radiant light emitted by heating of the heated object 4 on the laser oscillator 3 side, to prevent damage to the laser element, and to significantly improve the life and performance of the semiconductor laser. .

なお、上記コリメートレンズ6、凸レンズ7、フライアイレンズ8、第1の絞り10、集光点近傍の第2の絞り9までを筒状のレンズホルダ(図示せず)内に設け、レーザ発振器の速軸の集光点を上記レンズホルダ内とし、このレンズホルダを上記レーザ発振器3と一体化することで、レンズホルダから出た光の速軸と遅軸が夫々デフォーカス光となり、このデフォーカス光を被加熱物4に照射せしめた結果、一度の照射で被加熱物を短時間に、例えば1000度まで均一に加熱することができ、被加熱物に均一で良好な酸化膜を形成せしめることができる。   The collimating lens 6, the convex lens 7, the fly-eye lens 8, the first diaphragm 10, and the second diaphragm 9 near the condensing point are provided in a cylindrical lens holder (not shown), and the laser oscillator By converging the fast axis in the lens holder and integrating the lens holder with the laser oscillator 3, the fast axis and the slow axis of the light emitted from the lens holder become defocused light, respectively. As a result of irradiating the object to be heated 4 with light, the object to be heated can be uniformly heated to, for example, 1000 degrees in a short time, and a uniform and good oxide film can be formed on the object to be heated. Can do.

また、レーザ発振器の速軸において凸レンズの後にフライアイレンズを設けたので、レーザ光を均一化できる。   Further, since the fly-eye lens is provided after the convex lens on the fast axis of the laser oscillator, the laser light can be made uniform.

また、集光点近傍に第2の絞り9を設けたので、レーザ光を必要な形状に整形できる。   Further, since the second diaphragm 9 is provided in the vicinity of the condensing point, the laser beam can be shaped into a necessary shape.

なお、速軸方向での被加熱物4の照射領域を遅軸方向でのそれと略一致せしめるため、本発明の第2実施例においては、図6に示すように、上記レーザ発振器3の速軸方向で、上記第2の絞り9と上記被加熱物4との間に1または複数個の凸レンズ13を設け、集光されたレーザ光を上記凸レンズ13を通過させてより小さくデフォーカスさせ被加熱物4に照射せしめるようにする。   In order to make the irradiation region of the object to be heated 4 in the fast axis direction substantially coincide with that in the slow axis direction, in the second embodiment of the present invention, as shown in FIG. In the direction, one or a plurality of convex lenses 13 are provided between the second diaphragm 9 and the object 4 to be heated, and the focused laser light passes through the convex lens 13 and is defocused to a smaller extent to be heated. The object 4 is irradiated.

また、図7に示すように、上記レーザ発振器3の遅軸方向で、上記レーザ発振器3と上記第1の絞り10との間に凹レンズ14を設け、レーザ発振器3から出たレーザ光を、上記凹レンズ14を通して広げたあと、上記第1の絞り10と第2の絞り9とでレーザ光の形を整え上記被加熱物4に照射せしめ加熱せしめるようにする。   Further, as shown in FIG. 7, a concave lens 14 is provided between the laser oscillator 3 and the first diaphragm 10 in the slow axis direction of the laser oscillator 3, and the laser light emitted from the laser oscillator 3 is After spreading through the concave lens 14, the shape of the laser beam is adjusted by the first diaphragm 10 and the second diaphragm 9, and the object to be heated 4 is irradiated and heated.

このようにすれば被加熱物4の照射領域を略正方形となし得る。   In this way, the irradiation area of the article to be heated 4 can be made substantially square.

なお、更に上記凸レンズ13、凹レンズ14を上記レンズホルダ内に設けてもよい。   Further, the convex lens 13 and the concave lens 14 may be provided in the lens holder.

なお、速軸方向での被加熱物4の照射領域以外の部分にレーザ光が漏れないように、本発明の第3の実施例においては、図8に示すように、レーザ発振器3の速軸方向では、上記凸レンズ13により範囲を狭めてデフォーカスされたレーザ光から必要な領域範囲の箇所に1または複数個の凸レンズ15を設けて平行光とし、上記被加熱物4に照射せしめるようにする。   In the third embodiment of the present invention, as shown in FIG. 8, the fast axis of the laser oscillator 3 is used so that the laser beam does not leak to a portion other than the irradiation region of the article 4 to be heated in the fast axis direction. In the direction, one or a plurality of convex lenses 15 are provided in the necessary region range from the defocused laser light with the range narrowed by the convex lens 13 so as to be collimated so as to irradiate the object to be heated 4. .

また、図9に示すように、上記レーザ発振器3の遅軸方向では、第2の絞り9でレーザ光の形を整えたあと、レーザ光の必要な領域範囲の箇所に凸レンズ16を設けて平行光とし、上記被加熱物4に照射せしめるようにする。このようにすれば、被加熱物4の照射光をレーザの平行光とすることができ、レーザ光の広がりによって被加熱物以外の箇所が加熱されることがなく、熱ロスを少なくするこができる。   As shown in FIG. 9, in the slow axis direction of the laser oscillator 3, the laser light is shaped by the second diaphragm 9, and then a convex lens 16 is provided at a position in a region range where the laser light is necessary. Light is used to irradiate the object 4 to be heated. If it does in this way, the irradiation light of the to-be-heated material 4 can be made into the parallel light of a laser, and parts other than a to-be-heated material are not heated by the spread of a laser beam, and heat loss can be reduced. it can.

なお、速軸の凸レンズ15、遅軸の凸レンズ16は上記レンズホルダとは別のレンズホルダで位置決めする。   The fast axis convex lens 15 and the slow axis convex lens 16 are positioned by a lens holder different from the lens holder.

本発明のレーザ加熱装置のレーザ発振器の斜視図である。It is a perspective view of the laser oscillator of the laser heating apparatus of this invention. 本発明のレーザ加熱装置の速軸方向説明図である。It is a fast-axis direction explanatory drawing of the laser heating apparatus of this invention. 本発明のレーザ加熱装置の遅軸方向説明図である。It is slow-axis direction explanatory drawing of the laser heating apparatus of this invention. 図2に示す第1の絞りの縦断側面図である。It is a vertical side view of the 1st aperture_diaphragm | restriction shown in FIG. 図2に示す第2の絞りの縦断側面図である。It is a vertical side view of the 2nd aperture_diaphragm | restriction shown in FIG. 本発明のレーザ加熱装置の第2実施例の速軸方向説明図である。It is a fast-axis direction explanatory drawing of 2nd Example of the laser heating apparatus of this invention. 本発明のレーザ加熱装置の第2実施例の遅軸方向説明図である。It is slow axis direction explanatory drawing of 2nd Example of the laser heating apparatus of this invention. 本発明のレーザ加熱装置の第3実施例の速軸方向説明図である。It is a fast-axis direction explanatory drawing of 3rd Example of the laser heating apparatus of this invention. 本発明のレーザ加熱装置の第3実施例の遅軸方向説明図である。It is slow axis direction explanatory drawing of 3rd Example of the laser heating apparatus of this invention.

符号の説明Explanation of symbols

1 レーザダイオードバー
2 ヒートシンク板
3 レーザ発振器
4 被加熱物
5 光学レンズ系
6 コリメートレンズ
7 凸レンズ
8 フライアイレンズ
9 第2の絞り
10 第1の絞り
11 開口
12 開口
13 凸レンズ
14 凹レンズ
15 凸レンズ
16 凹レンズ
DESCRIPTION OF SYMBOLS 1 Laser diode bar 2 Heat sink plate 3 Laser oscillator 4 Heated object 5 Optical lens system 6 Collimating lens 7 Convex lens 8 Fly eye lens 9 2nd aperture 10 1st aperture 11 Opening 12 Opening 13 Convex lens 14 Concave lens 15 Convex lens 16 Concave lens

Claims (11)

レーザダイオードバーを複数積層せしめて形成したレーザ発振器と、上記レーザ発振器と被加熱物との間に介挿した光学レンズ系とより成り、この光学レンズ系は、レーザ発振器の速軸方向では上記各レーザダイオードバーのレーザ出口に設けたコリメートレンズと、上記被加熱物側に向かうに従って順番に配置せしめた凸レンズ、フライアイレンズとより成り、上記コリメートレンズより出た平行光を、上記凸レンズ、フライアイレンズを通過せしめた後に集光せしめてからデフォーカスして被加熱物に照射せしめ、レーザ発振器の遅軸方向では上記レーザ出口から出た出射角度のままのレーザ光を絞る第1の絞りより成り、上記レーザダイオードバーから出たレーザ光を出射角度のまま上記第1の絞りにより整形し被加熱物に照射せしめることを特徴とするレーザ加熱装置。   A laser oscillator formed by laminating a plurality of laser diode bars, and an optical lens system interposed between the laser oscillator and an object to be heated. It consists of a collimating lens provided at the laser exit of the laser diode bar, a convex lens and a fly-eye lens arranged in order toward the object to be heated, and parallel light emitted from the collimating lens is converted into the convex lens, fly-eye. After passing through the lens, the light is condensed and then defocused to irradiate the object to be heated. In the slow axis direction of the laser oscillator, the laser beam is composed of a first diaphragm that squeezes the laser light at the exit angle from the laser exit. The laser beam emitted from the laser diode bar is shaped by the first diaphragm at the emission angle to irradiate the object to be heated. Laser heating apparatus, characterized in that. 上記レーザ発振器の速軸方向では、上記集光されたレーザ光を、そのデフォーカス量を減少するための1または複数個の凸レンズを介して被加熱物に照射せしめることを特徴とする請求項1記載のレーザ加熱装置。   2. The object to be heated is irradiated with the focused laser beam through one or a plurality of convex lenses for reducing the defocus amount in the fast axis direction of the laser oscillator. The laser heating apparatus as described. 上記レーザ発振器の速軸方向では、上記集光されたレーザ光を平行光にするための1または複数個の凸レンズを介して被加熱物に照射せしめることを特徴とする請求項1記載のレーザ加熱装置。   2. The laser heating according to claim 1, wherein in the fast axis direction of the laser oscillator, the object to be heated is irradiated through one or a plurality of convex lenses for making the condensed laser light into parallel light. apparatus. 上記レーザ発振器の遅軸方向では、上記レーザ出口から出たレーザ光を凹レンズにより更に広げることを特徴とする請求項1、2または3記載レーザ加熱装置。   4. The laser heating apparatus according to claim 1, wherein the laser beam emitted from the laser exit is further expanded by a concave lens in the slow axis direction of the laser oscillator. 上記レーザ発振器の遅軸方向では、上記第1の絞りにより整形したあと、平行光にするための凸レンズを介して被加熱物に照射せしめることを特徴とする請求項1、2、3または4記載のレーザ加熱装置。   5. The object to be heated is irradiated in a slow axis direction of the laser oscillator through a convex lens for making parallel light after shaping by the first diaphragm. Laser heating device. 上記第1の絞りの開口部のレーザ発振器側の開口面積が上記被加熱物側より大きいことを特徴とする請求項1、2、3、4または5記載のレーザ加熱装置。   6. The laser heating apparatus according to claim 1, wherein an opening area on the laser oscillator side of an opening of the first diaphragm is larger than that on the object to be heated. 上記レーザ発振器の速軸方向での上記光学レンズ系の集光点近傍に遅軸方向のレーザ光を整形する第2の絞りを有することを特徴とする請求項1、2、3、4、5または6記載のレーザ加熱装置。   2. A second stop for shaping laser light in the slow axis direction in the vicinity of the condensing point of the optical lens system in the fast axis direction of the laser oscillator. Or the laser heating apparatus of 6. 上記第2の絞りの開口部の被加熱部側の開口面積が、上記レーザ発振器側より大きいことを特徴とする請求項7記載のレーザ加熱装置。   8. The laser heating apparatus according to claim 7, wherein an opening area on the heated portion side of the opening portion of the second diaphragm is larger than that on the laser oscillator side. 上記第2の絞りが熱伝導性の良い材料で形成されていることを特徴とする請求項7または8記載のレーザ加熱装置。   9. The laser heating apparatus according to claim 7, wherein the second diaphragm is made of a material having good thermal conductivity. 上記第2の絞りの被加熱物側の面がセラミックでコートされていることを特徴とする請求項7、8または9記載のレーザ加熱装置。   10. The laser heating apparatus according to claim 7, 8 or 9, wherein the surface of the second diaphragm on the side to be heated is coated with ceramic. 上記光学レンズ系及びその集光点近傍の第2の絞りまでを同一レンズホルダ内に設け、上記レンズホルダ部から出たレーザ光をデフォーカス光としたことを特徴とする請求項1、2、3、4、5、6、7、8、9または10記載のレーザ加熱装置。   The optical lens system and a second stop near the condensing point are provided in the same lens holder, and the laser beam emitted from the lens holder portion is defocused light. The laser heating apparatus according to 3, 4, 5, 6, 7, 8, 9 or 10.
JP2005067408A 2005-02-10 2005-03-10 Laser heating device Expired - Fee Related JP4582779B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106941240A (en) * 2017-05-18 2017-07-11 温州泛波激光有限公司 Semiconductor laser
WO2019066291A1 (en) * 2017-09-29 2019-04-04 주식회사 루트로닉 Laser diode module
RU211718U1 (en) * 2021-01-17 2022-06-20 Общество с ограниченной ответственностью "Научно-производственное объединение "ДЕЛЬТА" Device for laser cleaning of metal products

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106941240A (en) * 2017-05-18 2017-07-11 温州泛波激光有限公司 Semiconductor laser
CN106941240B (en) * 2017-05-18 2023-07-21 温州泛波激光有限公司 Semiconductor laser
WO2019066291A1 (en) * 2017-09-29 2019-04-04 주식회사 루트로닉 Laser diode module
RU211718U1 (en) * 2021-01-17 2022-06-20 Общество с ограниченной ответственностью "Научно-производственное объединение "ДЕЛЬТА" Device for laser cleaning of metal products

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