JP2006229075A - Laser heating device - Google Patents
Laser heating device Download PDFInfo
- Publication number
- JP2006229075A JP2006229075A JP2005042927A JP2005042927A JP2006229075A JP 2006229075 A JP2006229075 A JP 2006229075A JP 2005042927 A JP2005042927 A JP 2005042927A JP 2005042927 A JP2005042927 A JP 2005042927A JP 2006229075 A JP2006229075 A JP 2006229075A
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- heated
- laser
- lens
- heating apparatus
- ring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0734—Shaping the laser spot into an annular shape
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
本発明はレーザ加熱装置、特に大きな面積を有する半導体基板等を一度の照射で所望の加熱分布で加熱することができるレーザ加熱装置に関するものである。 The present invention relates to a laser heating apparatus, and more particularly to a laser heating apparatus capable of heating a semiconductor substrate having a large area with a desired heating distribution by one irradiation.
従来、レーザ加熱装置のレーザ光を直接半導体基板等の被加熱物に照射する場合は、被加熱物からの反射光が半導体レーザ加熱装置に戻り半導体レーザ素子が破損することがあり、これを防止するため、レーザ光を斜めから被加熱物に照射して、被加熱物を加熱していた(引用文献1)。
然しながら、上記従来のレーザ加熱装置はレーザ光を斜めから被加熱物に照射していたので、被加熱物上に所望の温度分布を得ることが難しかった。 However, since the conventional laser heating apparatus irradiates the object to be heated obliquely with the laser beam, it is difficult to obtain a desired temperature distribution on the object to be heated.
なお、レーザによる被加熱物1の加熱は、小さい面積であれば図13に示すようにレンズ3で集光したレーザ光照射で可能であるが、大面積の場合はミラーによるスキャニングレーザ照射のような大掛かりの装置が必要であった。 Note that the object 1 to be heated by the laser can be heated by laser light focused by the lens 3 as shown in FIG. 13 if the area is small, but in the case of a large area, the scanning laser is irradiated by a mirror. Large-scale equipment was necessary.
また、レーザ光をレンズでデフォーカスしたレーザ光照射では、被加熱物の熱分布は均一ではなく、被加熱物の中心の方が外周に比べて温度が高くなってしまうという欠点があった。 Further, in the laser beam irradiation in which the laser beam is defocused with a lens, the heat distribution of the object to be heated is not uniform, and the temperature at the center of the object to be heated becomes higher than the outer periphery.
本発明は上記の欠点を除くようにしたものである。 The present invention eliminates the above-mentioned drawbacks.
本発明のレーザ加熱装置は、レーザ光源と、このレーザ光源から出るレーザー光をリング状に集光せしめる曲面レンズとよりなることを特徴とする。 The laser heating apparatus according to the present invention includes a laser light source and a curved lens that condenses laser light emitted from the laser light source in a ring shape.
上記曲面レンズは半径方向断面が凸レンズ状のリング体より成る円板状レンズであることを特徴とする。 The curved lens is a disk-shaped lens made of a ring body having a convex lens-like cross section in the radial direction.
また、上記リング体が同心円状に半径方向に複数隣接されていることを特徴とする。 In addition, a plurality of the ring bodies are concentrically adjacent to each other in the radial direction.
また、上記各リング体の断面形状が互いに異なることを特徴とする。 The ring bodies may have different cross-sectional shapes.
本発明のレーザ加熱装置によれば、被加熱物にリング状にレーザ光を照射できるので、被加熱物の表面の加熱温度分布の制御が容易となる。 According to the laser heating apparatus of the present invention, the object to be heated can be irradiated with the laser beam in a ring shape, so that it becomes easy to control the heating temperature distribution on the surface of the object to be heated.
以下図面によって本発明の実施例を説明する。 Embodiments of the present invention will be described below with reference to the drawings.
本発明のレーザ加熱装置は図1及び図2に示すように、高出力半導体レーザ等のレーザ光源(図示せず)と、上記レーザ光源から出たレーザ光2を円板状の半導体基板等の被加熱物4の表面に円板状の曲面レンズ5を介して照射せしめる。上記曲面レンズ5は例えば図2に示すように半径方向断面が凸レンズ状のリング体5aにより形成せしめる。
As shown in FIGS. 1 and 2, the laser heating apparatus of the present invention is configured to irradiate a laser light source (not shown) such as a high-power semiconductor laser and a
本発明のレーザ加熱装置は上記のような構成であるから、上記レーザ光源から出たレーザ光2は上記曲面レンズ5を通過して図3に示すようにリング状に集光され、上記レーザ光2の焦点位置に設置した被加熱物4の表面をリング状に照射し、上記被加熱物4を加熱する。
Since the laser heating apparatus of the present invention has the above-described configuration, the
上記のように本発明のレーザ加熱装置によれば、被加熱物4の外縁付近にリング状にレーザ光2を照射せしめることができるので、被加熱物4の中心が高温となるという問題を解決できる。
As described above, according to the laser heating apparatus of the present invention, the
また、上記曲面レンズ5と上記被加熱物4との位置を変え、上記被加熱物4に照射されるレーザ光2のリングの幅や、上記被加熱物4のレーザ光を照射せしめる場所を調整することにより基板を更に均一に加熱できるようになる。
Further, the positions of the
図4及び図5は本発明のレーザ加熱装置の第2の実施例を示し、この第2の実施例においては、第1の実施例の半径方向断面が凸レンズ状のリング体を同心円状に、半径方向に2個隣接して形成した曲面レンズ6を用いる。
4 and 5 show a second embodiment of the laser heating apparatus of the present invention. In this second embodiment, the radial cross section of the first embodiment is a concentric circle with a convex lens shape. Two
本発明の第2の実施例のレーザ加熱装置においては、上記レーザ光源から出たレーザ光2を上記曲面レンズ6を通過せしめて図6に示すように同心円状の2重のリング状に集光せしめ、上記レーザ光の焦点位置に設置した被加熱物4を2重のリング状に照射し、上記被加熱物4を加熱せしめる。
In the laser heating apparatus according to the second embodiment of the present invention, the
この第2の実施例においては、被加熱物4が大きい場合であっても、被加熱物に同心円状の2重のリング状のレーザ光2を照射せしめるので、被加熱物4の表面の加熱温度分布の制御が容易となり、また、上記曲面レンズ6と上記被加熱物4との位置を変え、上記被加熱物4に照射したレーザ光2のリングの幅や、上記被加熱物4のレーザ光を照射せしめる場所を調整することにより基板を均一に加熱できるようになる。
In this second embodiment, even if the object to be heated 4 is large, the object to be heated is irradiated with the concentric double ring-
なお、図7及び図8に示すように、上記曲面レンズ6の内側のリング体6aの厚さを、外側のリング体6bの厚さに比べて小さくし、上記曲面レンズ6の外側のリング体6bを通過したレーザ光2の焦点位置に被加熱物4を配置し、図9に示すように、上記外側のリング体6bを通過したレーザ光2による外側リング7と、上記内側のリング体6aを通過したレーザ光2がデフォーカスして形成された内側リング8とによる2重のリング状のレーザ光を用いて、被加熱物4の表面の加熱温度分布を制御せしめてもよい。
7 and 8, the thickness of the
また、同心円状の上記リング体を3個以上用いれば更に大きい被加熱物の表面の加熱温度分布を制御せしめることができる。 Further, if three or more concentric ring bodies are used, the heating temperature distribution on the surface of the object to be heated can be controlled.
この場合、上記曲面レンズの複数のリング体の厚さなどの断面形状を夫々異ならしめて被加熱物の表面の加熱温度分布を制御せしめてもよい。 In this case, the heating temperature distribution on the surface of the object to be heated may be controlled by changing the cross-sectional shapes such as the thicknesses of the plurality of ring bodies of the curved lens.
また、上記各リング体の半径方向の幅を異ならしめて被加熱物に照射される各リングの直径を調整せしめ、被加熱物の表面の加熱温度分布を制御せしめてもよい。 Moreover, the diameter of each ring irradiated to a to-be-heated material may be adjusted by varying the radial width of each ring body to control the heating temperature distribution on the surface of the to-be-heated material.
また、上記被加熱物に照射される各リングの直径は他のレンズを組み合わせることにより調整せしめてもよい。 Moreover, you may adjust the diameter of each ring irradiated to the said to-be-heated object by combining another lens.
また、上記曲面レンズは球面レンズ、非球面レンズ、円柱を軸方向に2つに割った形をしているシリンドリカルレンズであってもよく、またこれらを組み合わせたレンズであってもよい。 The curved lens may be a spherical lens, an aspherical lens, a cylindrical lens having a cylindrical shape divided into two in the axial direction, or a lens combining these.
本発明の第3の実施例においては図10及び図11に示すように、レーザ光源と被加熱物4との間に、上記レーザ光源から出たレーザ光2をリング状に集光せしめる、半径方向断面が凸レンズ状の曲面レンズ9と、上記曲面レンズ9を通過し上記リング状に集光されたレーザ光2をコリメート(平行光に)するリング状のシリンドリカルレンズ10と、上記シリンドリカルレンズ10を通過したリング状の上記レーザ光2のリング径を拡大せしめる凹レンズ11を設ける。
In the third embodiment of the present invention, as shown in FIG. 10 and FIG. 11, the radius for condensing the
本発明の第3の実施例においては、上記レーザ光源1から出たレーザ光2を上記曲面レンズ9を通過せしめてリング状に集光せしめ、この集光したリング状のレーザ光2を上記シリンドリカルレンズ10により再びコリメートし、上記凹レンズ11により上記リング状のレーザ光2のリング径を拡大せしめて、図12に示すように、上記被加熱物4にリング状に照射し、被加熱物4を加熱せしめる。
In the third embodiment of the present invention, the
この第3の実施例によっても被加熱物4の表面の加熱温度分布の制御が容易となる。
This third embodiment also makes it easy to control the heating temperature distribution on the surface of the
なお、上記シリンドリカルレンズ10を通過したレーザ光2のリングの直径が上記被加熱物よりも小さいような場合には、上記凹レンズ11を省略せしめてもよい。
If the diameter of the ring of the
また、上記凹レンズ11を通過したレーザ光を更にコリメートするためのレンズ(図示せず)を設けてもよい。
Further, a lens (not shown) for further collimating the laser light that has passed through the
1 被加熱物
2 レーザ光
3 レンズ
4 被加熱物
5 曲面レンズ
5a 凸レンズ状のリング体
6 曲面レンズ
6a 内側のリング体
6b 外側のリング体
7 外側リング
8 内側リング
9 曲面レンズ
10 シリンドリカルレンズ
11 凹レンズ
DESCRIPTION OF SYMBOLS 1 Object to be heated 2 Laser light 3
Claims (4)
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JP2005042927A JP4247495B2 (en) | 2005-02-18 | 2005-02-18 | Laser heating device |
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JP2005042927A JP4247495B2 (en) | 2005-02-18 | 2005-02-18 | Laser heating device |
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JP2006229075A true JP2006229075A (en) | 2006-08-31 |
JP4247495B2 JP4247495B2 (en) | 2009-04-02 |
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JP2011040670A (en) * | 2009-08-18 | 2011-02-24 | Tokyo Electron Ltd | Polymer removing device and polymer removing method |
WO2012153785A1 (en) * | 2011-05-11 | 2012-11-15 | 株式会社ブイ・テクノロジー | Lens, and laser processing device equipped with same |
WO2013051424A1 (en) * | 2011-10-07 | 2013-04-11 | 株式会社ブイ・テクノロジー | Device for laser-machining glass substrate |
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