JP2006237450A - Semiconductor package and semiconductor device - Google Patents

Semiconductor package and semiconductor device Download PDF

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JP2006237450A
JP2006237450A JP2005052722A JP2005052722A JP2006237450A JP 2006237450 A JP2006237450 A JP 2006237450A JP 2005052722 A JP2005052722 A JP 2005052722A JP 2005052722 A JP2005052722 A JP 2005052722A JP 2006237450 A JP2006237450 A JP 2006237450A
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high frequency
frequency switch
package
die pad
semiconductor chip
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Kazumasa Kohama
一正 小浜
Tominori Hino
臣教 日野
Akihisa Sakaemori
昭久 栄森
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Sony Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/2612Auxiliary members for layer connectors, e.g. spacers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor
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    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
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    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high frequency switch IC package capable of reducing parasitic capacity generated between a ground electrode formed on a package substrate and a high frequency circuit, and capable of obtaining a fine high frequency characteristic. <P>SOLUTION: The high frequency switch IC package is provided with a high frequency IC, a lead frame having a die pad on which the high frequency switch IC is mounted and a lead terminal for connecting the high frequency switch IC to another circuit, and mold resin for sealing the high frequency switch IC and the lead frame to apply ground potential to the die pad. The high frequency switch IC is mounted on the die pad through a spacer consisting of epoxy resin. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は半導体パッケージ及び半導体装置に関する。詳しくは、グランド電位が印加された金属板若しくはダイパッド部から半導体チップ表面に形成された回路までの距離を大きくすることによって、寄生容量の低減を図ろうとした半導体パッケージ及び半導体装置に係るものである。   The present invention relates to a semiconductor package and a semiconductor device. More specifically, the present invention relates to a semiconductor package and a semiconductor device that attempt to reduce parasitic capacitance by increasing the distance from a metal plate or die pad portion to which a ground potential is applied to a circuit formed on the surface of the semiconductor chip. .

従来、ガリウム・砒素(GaAs)系等の化合物半導体層を有する化合物半導体系の電界効果トランジスタ(FET)は、電子移動度が高く良好な高周波特性を有するので、携帯電話などの移動体通信機器に広く用いられている(例えば、特許文献1参照。)。
以下、移動体通信機器用高周波ICの一種である高周波スイッチICを用いた高周波スイッチICパッケージについて説明する。
Conventionally, compound semiconductor field effect transistors (FETs) having a compound semiconductor layer such as gallium arsenide (GaAs) have high electron mobility and good high frequency characteristics, so that they are suitable for mobile communication devices such as cellular phones. Widely used (see, for example, Patent Document 1).
Hereinafter, a high frequency switch IC package using a high frequency switch IC which is a kind of high frequency IC for mobile communication devices will be described.

図7は従来の高周波スイッチICパッケージを説明するための模式的な断面図であり、ここで示す高周波スイッチICパッケージ101は、42アロイや銅合金等で形成され、必要に応じてNiめっき、Agめっき、Auめっき、半田めっき等が必要な部位に施されたリードフレーム102のダイパッド部102a上に上記した様な化合物半導体系のFETを有する高周波スイッチIC103が導電性接着剤等により接着されている。また、高周波スイッチIC上の電極部(図示せず)はAu細線等のボンディングワイヤー104でリードフレームのリード端子102bに接続されており、更に、高周波スイッチICを外部から保護するために、封止体としての封止樹脂(例えば、エポキシ樹脂)105で高周波スイッチICは封止されている。   FIG. 7 is a schematic cross-sectional view for explaining a conventional high-frequency switch IC package. A high-frequency switch IC package 101 shown here is formed of 42 alloy, copper alloy, or the like, and is optionally plated with Ni or Ag. A high-frequency switch IC 103 having a compound semiconductor FET as described above is adhered to the die pad portion 102a of the lead frame 102 where plating, Au plating, solder plating, or the like is applied, with a conductive adhesive or the like. . Further, an electrode portion (not shown) on the high frequency switch IC is connected to the lead terminal 102b of the lead frame by a bonding wire 104 such as an Au thin wire, and further sealed to protect the high frequency switch IC from the outside. The high frequency switch IC is sealed with a sealing resin (for example, epoxy resin) 105 as a body.

ここで、高周波スイッチICパッケージでは高周波特性を引き出すために、高周波スイッチICの直下にグランド電位を印加することが多く、具体的には、高周波スイッチICパッケージ101を実装する実装基板(多層基板)106の最表層である第1層107に金属板108を配置し、この金属板にグランド電位を印加することによって高周波スイッチICの直下へのグランド電位の印加を実現している。   Here, in the high frequency switch IC package, in order to extract high frequency characteristics, a ground potential is often applied immediately below the high frequency switch IC, and specifically, a mounting substrate (multilayer substrate) 106 on which the high frequency switch IC package 101 is mounted. The metal plate 108 is arranged on the first layer 107, which is the outermost layer of this, and the ground potential is applied to the metal plate, thereby realizing the application of the ground potential immediately below the high frequency switch IC.

特開平9−17955号公報Japanese Patent Laid-Open No. 9-17955

ところで、実装基板に配置された金属板(以下、グランド電極と称する)と高周波スイッチICの表面に形成された高周波回路(以下、単に「高周波回路」と称する。)との間には必然的に寄生容量が生じるのであるが、この寄生容量は高周波回路の高周波特性を劣化させる一因となるため、できる限り寄生容量を低減することが求められている。   By the way, a metal plate (hereinafter referred to as a ground electrode) disposed on the mounting substrate and a high frequency circuit (hereinafter simply referred to as a “high frequency circuit”) formed on the surface of the high frequency switch IC inevitably. Although parasitic capacitance is generated, this parasitic capacitance contributes to deterioration of the high-frequency characteristics of the high-frequency circuit. Therefore, it is required to reduce the parasitic capacitance as much as possible.

本発明は以上の点に鑑みて創案されたものであって、半導体チップ表面に形成された回路と実装基板のグランド電極との間に生じる寄生容量を低減することができる半導体パッケージ及び半導体装置を提供することを目的とするものである。   The present invention has been devised in view of the above points, and provides a semiconductor package and a semiconductor device capable of reducing parasitic capacitance generated between a circuit formed on the surface of a semiconductor chip and a ground electrode of a mounting substrate. It is intended to provide.

上記の目的を達成するために、本発明に係る半導体パッケージでは、半導体チップと、該半導体チップが搭載されるダイパッド部及び前記半導体チップを他の回路に接続する外部端子を有するリードフレームと、前記半導体チップ及び前記リードフレームを封止する封止樹脂とを備え、前記ダイパッド部にグランド電位が印加される半導体パッケージにおいて、前記半導体チップは前記ダイパッド部にスペーサを介して搭載されると共に、前記ダイパッド部と前記半導体チップが絶縁されている。   In order to achieve the above object, in a semiconductor package according to the present invention, a semiconductor chip, a lead pad having a die pad portion on which the semiconductor chip is mounted and an external terminal for connecting the semiconductor chip to another circuit, A semiconductor package including a semiconductor chip and a sealing resin for sealing the lead frame, wherein a ground potential is applied to the die pad portion, the semiconductor chip is mounted on the die pad portion via a spacer, and the die pad The part and the semiconductor chip are insulated.

ここで、半導体チップがダイパッド部にスペーサを介して搭載されると共に、ダイパッド部と半導体チップが絶縁されているために、半導体チップ表面に形成された回路とダイパッド部との間に発生する寄生容量を小さくすることができる。   Here, since the semiconductor chip is mounted on the die pad part via the spacer and the die pad part and the semiconductor chip are insulated, the parasitic capacitance generated between the circuit formed on the surface of the semiconductor chip and the die pad part. Can be reduced.

また、本発明に係る半導体パッケージでは、絶縁性材料から構成された絶縁体と、該絶縁体に搭載された半導体チップと、該半導体チップを他の回路に接続する外部端子を有するリードフレームと、前記半導体チップ、前記絶縁体及び前記リードフレームを封止する封止樹脂とを備える。   Further, in the semiconductor package according to the present invention, an insulator made of an insulating material, a semiconductor chip mounted on the insulator, a lead frame having an external terminal for connecting the semiconductor chip to another circuit, A sealing resin for sealing the semiconductor chip, the insulator, and the lead frame;

ここで、半導体チップが絶縁性材料から構成された絶縁体に搭載されたことによって、半導体チップ表面に形成された回路とグランド電極との間に発生する寄生容量を小さくすることができると共に、半導体パッケージの小型化、薄型化が実現できる。   Here, by mounting the semiconductor chip on an insulator made of an insulating material, the parasitic capacitance generated between the circuit formed on the surface of the semiconductor chip and the ground electrode can be reduced, and the semiconductor The package can be made smaller and thinner.

また、上記の目的を達成するために、本発明に係る半導体装置では、絶縁性材料から構成された絶縁体と、該絶縁体に搭載された半導体チップと、該半導体チップを他の回路に接続する外部端子を有するリードフレームと、前記半導体チップ、前記絶縁体及び前記リードフレームを封止する封止樹脂とを有する半導体パッケージと、該半導体パッケージを実装する実装基板とを備える半導体装置であって、前記実装基板は多層構造であり、最表層である第1層に前記半導体パッケージが実装されると共に、第2層以降の層にグランド電位が印加された金属板を有する。   In order to achieve the above object, in a semiconductor device according to the present invention, an insulator made of an insulating material, a semiconductor chip mounted on the insulator, and the semiconductor chip connected to another circuit A semiconductor device comprising a lead frame having external terminals, a semiconductor package having a sealing resin for sealing the semiconductor chip, the insulator and the lead frame, and a mounting substrate for mounting the semiconductor package. The mounting substrate has a multi-layer structure, and the semiconductor package is mounted on the first layer which is the outermost layer, and a metal plate to which a ground potential is applied is applied to the second and subsequent layers.

ここで、実装基板が多層構造であり、最表層である第1層に半導体パッケージが実装されると共に、第2層以降の層にグランド電位が印加された金属板を有することによって、半導体チップ表面に形成された回路とグランド電極との間に発生する寄生容量を小さくすることができる。   Here, the mounting substrate has a multilayer structure, the semiconductor package is mounted on the first layer which is the outermost layer, and the surface of the semiconductor chip is provided with a metal plate to which the ground potential is applied to the second and subsequent layers. The parasitic capacitance generated between the circuit formed in the circuit and the ground electrode can be reduced.

以上述べてきた如く、本発明の半導体パッケージ及び半導体装置では、半導体チップ表面に形成された回路とグランド電極との間に発生する寄生容量の低減を図ることができ、良好な高周波特性を得ることができる。   As described above, in the semiconductor package and the semiconductor device of the present invention, the parasitic capacitance generated between the circuit formed on the surface of the semiconductor chip and the ground electrode can be reduced, and good high frequency characteristics can be obtained. Can do.

以下、本発明の実施の形態について図面を参照しながら説明し、本発明の理解に供する。
図1は本発明を適用した半導体パッケージの一例である高周波スイッチICパッケージを説明するための模式的な断面図であり、ここで示す高周波スイッチICパッケージ1は、42アロイや銅合金等で形成され、必要に応じてNiめっき、Agめっき、Auめっき、半田めっき等が必要な部位に施されたリードフレーム2のダイパッド部2aにエポキシ樹脂からなるスペーサ10を介して高周波スイッチIC3が搭載されている。また、上記した従来の高周波スイッチICパッケージと同様に、高周波スイッチIC上の電極部(図示せず)はAu細線等のボンディングワイヤー4でリードフレームのリード端子2bに接続されており、更に、高周波スイッチICを外部から保護するために、封止体としてのエポキシ樹脂5で高周波スイッチICは封止されている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings to facilitate understanding of the present invention.
FIG. 1 is a schematic cross-sectional view for explaining a high-frequency switch IC package which is an example of a semiconductor package to which the present invention is applied. The high-frequency switch IC package 1 shown here is made of 42 alloy, copper alloy or the like. The high-frequency switch IC 3 is mounted on the die pad portion 2a of the lead frame 2 that is subjected to Ni plating, Ag plating, Au plating, solder plating, or the like as required, via a spacer 10 made of epoxy resin. . Similarly to the conventional high-frequency switch IC package described above, an electrode part (not shown) on the high-frequency switch IC is connected to the lead terminal 2b of the lead frame by a bonding wire 4 such as an Au fine wire, In order to protect the switch IC from the outside, the high frequency switch IC is sealed with an epoxy resin 5 as a sealing body.

なお、上記した様な高周波スイッチICパッケージを、グランド電位が印加される金属板8とダイパッド部がはんだ材11を介して導通する様に実装基板(多層基板)6の最表層である第1層7に実装することによって、ダイパッド部にはグランド電位が印加されることとなる。   In the high frequency switch IC package as described above, the first layer which is the outermost layer of the mounting substrate (multilayer substrate) 6 is formed so that the metal plate 8 to which the ground potential is applied and the die pad portion are conducted through the solder material 11. As a result, the ground potential is applied to the die pad portion.

なお、上記した本発明を適用した高周波スイッチICパッケージは、リードフレームのダイパッド部にエポキシ樹脂からなるスペーサをマウントした後に、スペーサ上に高周波スイッチICを搭載し(図2(a)参照。)、高周波スイッチIC上の電極部とリードフレームのリード端子とをボンディングワイヤーで電気的に接続し(図2(b)参照。)、続いてトランスファーモールド技術によって高周波スイッチICをエポキシ樹脂で封止することによって得ることができる(図2(c)参照。)。   In the high frequency switch IC package to which the present invention is applied, after mounting a spacer made of epoxy resin on the die pad portion of the lead frame, the high frequency switch IC is mounted on the spacer (see FIG. 2A). The electrode part on the high frequency switch IC and the lead terminal of the lead frame are electrically connected with a bonding wire (see FIG. 2B), and then the high frequency switch IC is sealed with epoxy resin by a transfer molding technique. (See FIG. 2C).

上記した本発明を適用した高周波スイッチICパッケージでは、高周波回路とダイパッド部との間に発生する寄生容量を小さくすることができる。
即ち、図7で示す従来の高周波スイッチICパッケージ構造の様にリードフレームのダイパッド部に高周波スイッチICが搭載された場合には、高周波回路とダイパッド部との間に発生する寄生容量は、高周波スイッチICの容量値Cと等しい。これに対して、図1で示す様にスペーサを介してダイパッド部に高周波スイッチICが搭載された場合には、高周波回路とダイパッド部との間に発生する寄生容量は、高周波スイッチICの容量値Cとスペーサの容量値Cとを直列に接続した全体の容量値となる。
そして、一般にコンデンサ容量Cは、他のコンデンサ容量C'と並列に接続された場合には、全体の容量値はコンデンサ容量Cよりも大きくなり、他のコンデンサ容量C'と直列に接続された場合には、全体の容量値はコンデンサ容量Cよりも小さくなることが知られている。
従って、上記した様に、スペーサを介してダイパッド部に高周波スイッチICが搭載された本発明を適用した高周波スイッチICパッケージでは、高周波回路とダイパッド部との間に発生する寄生容量を小さくすることができる。
In the high frequency switch IC package to which the present invention is applied, the parasitic capacitance generated between the high frequency circuit and the die pad portion can be reduced.
That is, when the high frequency switch IC is mounted on the die pad portion of the lead frame as in the conventional high frequency switch IC package structure shown in FIG. 7, the parasitic capacitance generated between the high frequency circuit and the die pad portion is the high frequency switch. equal to the capacitance value C 1 of the IC. On the other hand, when the high frequency switch IC is mounted on the die pad portion via the spacer as shown in FIG. 1, the parasitic capacitance generated between the high frequency circuit and the die pad portion is the capacitance value of the high frequency switch IC. the C 1 and the capacitance value of the total of the capacitance values C 2 connected in series of the spacer.
In general, when the capacitor capacitance C is connected in parallel with another capacitor capacitance C ′, the overall capacitance value is larger than the capacitor capacitance C, and when the capacitor capacitance C is connected in series with another capacitor capacitance C ′. It is known that the overall capacitance value is smaller than the capacitor capacitance C.
Therefore, as described above, in the high frequency switch IC package to which the present invention in which the high frequency switch IC is mounted on the die pad portion through the spacer, the parasitic capacitance generated between the high frequency circuit and the die pad portion can be reduced. it can.

ところで、高周波回路とダイパッド部との間にスペーサを用いずに絶縁性接着剤により容量を持たせることも考えられるが、例えばエポキシ樹脂だと通常20μm程度しか高さを持たせることができない。
また、粘性の高い樹脂を数百μmの高さに形成することも可能であるが、接着力の低下や、ディスペンス装置にて塗布する際はエアーの巻き込みによりボイドが発生しやすくなる。更に、高周波ICチップを実装する際にチップが傾き、チップの電極とリードフレームの端子を精度よく接続することが困難になる。
そこで、本案は樹脂成型によりスペーサを形成し、例えば400μm程度の厚みのスペーサを形成した。
By the way, it is conceivable to provide a capacity with an insulating adhesive without using a spacer between the high-frequency circuit and the die pad portion. However, for example, an epoxy resin can usually have a height of only about 20 μm.
In addition, it is possible to form a highly viscous resin with a height of several hundreds of μm, but voids are likely to be generated due to a decrease in adhesive force or air entrainment when applied with a dispensing device. Furthermore, when the high frequency IC chip is mounted, the chip is inclined, and it becomes difficult to accurately connect the electrode of the chip and the terminal of the lead frame.
Therefore, in the present proposal, a spacer is formed by resin molding, for example, a spacer having a thickness of about 400 μm is formed.

ここで、(1)スペーサを介さずに高周波スイッチICをダイパッド部に搭載した場合、(2)高周波スイッチICを200μm厚さのスペーサを介してダイパッド部に搭載した場合、(3)高周波スイッチICを400μm厚さのスペーサを介してダイパッド部に搭載した場合、(4)高周波スイッチICを600μm厚さのスペーサを介してダイパッド部に搭載した場合のそれぞれについて、各高周波スイッチICに800MHzの周波数を有する信号情報を入力した際の挿入損失、2次及び3次高調波特性を表1に示す。   Here, (1) When the high frequency switch IC is mounted on the die pad portion without a spacer, (2) When the high frequency switch IC is mounted on the die pad portion via a spacer having a thickness of 200 μm, (3) The high frequency switch IC Is mounted on the die pad portion via a spacer having a thickness of 400 μm, and (4) each of the high frequency switch ICs having a frequency of 800 MHz is mounted on the die pad portion via a spacer having a thickness of 600 μm. Table 1 shows insertion loss, second-order and third-order harmonic characteristics when the signal information is input.

Figure 2006237450
Figure 2006237450

表1から、本発明を適用した高周波スイッチICパッケージ、即ち、スペーサを介して高周波スイッチICをダイパッド部に搭載した高周波スイッチICパッケージでは、挿入損失が減少し、2次及び3次高調波特性に良い傾向が出現し、良好な高周波特性を奏することが分かる。   From Table 1, in the high-frequency switch IC package to which the present invention is applied, that is, the high-frequency switch IC package in which the high-frequency switch IC is mounted on the die pad portion through the spacer, the insertion loss is reduced, and the second and third harmonic characteristics. It can be seen that a good tendency appears and that good high-frequency characteristics are exhibited.

図3は本発明を適用した半導体パッケージの他の一例である高周波スイッチICパッケージを説明するための模式的な断面図であり、ここで示す高周波スイッチICパッケージは、エポキシ樹脂からなる絶縁体12に高周波スイッチICが接着剤により接着されている。また、高周波スイッチIC上の電極部(図示せず)はAu細線等のボンディングワイヤーでリードフレームのリード端子に接続されており、更に高周波スイッチICを外部から保護するために、封止体としてのエポキシ樹脂で高周波スイッチICは封止されている。ここで、本実施例では、ダイパッド部を有しないリードフレームを用いて高周波スイッチICパッケージを構成している。また、本実施例では、上記した従来の高周波スイッチICパッケージに搭載している高周波スイッチICよりも薄型の高周波スイッチICを搭載している。
なお、図3では、グランド電位が印加される金属板が設けられた実装基板に高周波スイッチICパッケージを実装した状態を図示している。
FIG. 3 is a schematic cross-sectional view for explaining a high-frequency switch IC package which is another example of a semiconductor package to which the present invention is applied. The high-frequency switch IC package shown here is formed on an insulator 12 made of an epoxy resin. The high frequency switch IC is bonded with an adhesive. In addition, an electrode portion (not shown) on the high frequency switch IC is connected to a lead terminal of the lead frame by a bonding wire such as an Au thin wire, and further, as a sealing body to protect the high frequency switch IC from the outside. The high frequency switch IC is sealed with epoxy resin. Here, in this embodiment, the high frequency switch IC package is configured using a lead frame that does not have a die pad portion. In this embodiment, a high-frequency switch IC that is thinner than the high-frequency switch IC mounted in the above-described conventional high-frequency switch IC package is mounted.
FIG. 3 illustrates a state in which the high frequency switch IC package is mounted on a mounting substrate provided with a metal plate to which a ground potential is applied.

上記した本発明を適用した高周波スイッチICパッケージは、リードフレーム及び裏面にエポキシ樹脂からなる絶縁体を接着剤により接着した高周波スイッチICをテープ13上の所定位置に配置し(図4(a)参照。)、高周波スイッチIC上の電極部とリードフレームのリード端子とをボンディングワイヤーで電気的に接続し(図4(b)参照。)、続いてトランスファーモールド技術によって高周波スイッチICをエポキシ樹脂で封止した後にテープを剥離することによって得ることができる(図4(c)参照。)。   In the high-frequency switch IC package to which the present invention is applied, the high-frequency switch IC in which an insulator made of epoxy resin is bonded to the lead frame and the back surface with an adhesive is arranged at a predetermined position on the tape 13 (see FIG. 4A). ), The electrode part on the high frequency switch IC and the lead terminal of the lead frame are electrically connected with a bonding wire (see FIG. 4B), and then the high frequency switch IC is sealed with epoxy resin by transfer molding technology. It can be obtained by peeling off the tape after stopping (see FIG. 4C).

なお、上記した本発明を適用した高周波スイッチICパッケージは、接着剤を用いて絶縁体に高周波スイッチICを接着しているが、リードフレーム及び裏面をエポキシ樹脂によって被覆した高周波スイッチICをテープ上の所定位置に配置した後に、ワイヤーボンディング及び樹脂封止を行うことによって、接着剤を用いずに絶縁体に高周波スイッチICチップが搭載された構成としても良い。   In the high frequency switch IC package to which the present invention is applied, the high frequency switch IC is bonded to an insulator using an adhesive. However, the high frequency switch IC in which the lead frame and the back surface are covered with an epoxy resin is placed on the tape. It is good also as a structure by which the high frequency switch IC chip is mounted in the insulator without using an adhesive agent by performing wire bonding and resin sealing after arrange | positioning in a predetermined position.

上記した本発明を適用した高周波スイッチICパッケージでは、高周波回路とダイパッドとの間に発生する寄生容量を小さくすることができる。
即ち、図7で示す従来の高周波スイッチICパッケージ構造の場合には、ダイパッド部とグランド電位が印加された金属板が接続されているためにダイパッド部にもグランド電位が印加されることとなり、高周波回路と金属板との間に発生する寄生容量は、ダイパッド部と高周波回路との間に発生する寄生容量である高周波スイッチICの容量値と等しい。なお、後述する様に、高周波スイッチICの厚みを薄くした場合には、高周波スイッチICの容量値は大きくなるために、本実施例の高周波スイッチICパッケージに搭載された高周波スイッチICの容量値Cは従来の高周波スイッチICパッケージに搭載された高周波スイッチICの容量値Cよりも大きくなる。
これに対して、図3で示す絶縁体に高周波スイッチICが搭載された本発明を適用した高周波スイッチICパッケージの場合には、高周波回路と金属板との間に発生する寄生容量は、高周波スイッチICの容量値Cと絶縁体の容量値Cとを直列に接続した全体の容量値となる。
ここで、高周波スイッチICを薄型化し、容量値Cが容量値Cよりも大きくなったとしても、容量値Cと容量値Cとが直列に接続されているために、絶縁体に高周波スイッチICが搭載された本発明を適用した高周波スイッチICパッケージでは、高周波回路と金属板との間に発生する寄生容量を小さくすることができる。
In the high frequency switch IC package to which the present invention is applied, the parasitic capacitance generated between the high frequency circuit and the die pad can be reduced.
That is, in the case of the conventional high-frequency switch IC package structure shown in FIG. 7, since the die pad portion and the metal plate to which the ground potential is applied are connected, the ground potential is also applied to the die pad portion. The parasitic capacitance generated between the circuit and the metal plate is equal to the capacitance value of the high frequency switch IC which is a parasitic capacitance generated between the die pad portion and the high frequency circuit. As will be described later, since the capacitance value of the high frequency switch IC increases when the thickness of the high frequency switch IC is reduced, the capacitance value C of the high frequency switch IC mounted in the high frequency switch IC package of the present embodiment. 4 is larger than the capacitance value C 1 of the high-frequency switch IC mounted on a conventional high-frequency switch IC package.
On the other hand, in the case of the high frequency switch IC package to which the present invention in which the high frequency switch IC is mounted on the insulator shown in FIG. 3 is applied, the parasitic capacitance generated between the high frequency circuit and the metal plate is high frequency switch. the capacitance value of the whole which connects the capacitance value C 3 of the capacitance value C 4 and the insulator of the IC in series.
Here, even if the high-frequency switch IC is thinned and the capacitance value C 4 is larger than the capacitance value C 1 , the capacitance value C 4 and the capacitance value C 3 are connected in series. In the high frequency switch IC package to which the present invention is mounted, in which the high frequency switch IC is mounted, the parasitic capacitance generated between the high frequency circuit and the metal plate can be reduced.

なお、本実施例では、高周波スイッチICパッケージの実装を行う最表層である第1層7にグランド電位が印加された金属板が配置された場合を例に挙げて説明を行ったが、図5で示す様に、実装基板の第n層(n≧2)にグランド電位が印加された金属板を配置することによって、高周波回路と金属板との間に発生する寄生容量をより一層小さくすることができる。
即ち、第n層に金属板を配置した場合には、高周波回路と金属板との間に発生する寄生容量は、高周波スイッチICの容量値と絶縁体の容量値とを直列に接続した全体の容量値と、実装基板の第1層から第(n−1)層までの各容量値を直列に接続した全体の容量値とを直列に接続した全体の容量値となる。従って、上記した様に、実装基板の第n層(n≧2)にグランド電位が印加された金属板を配置することによって、高周波回路と金属板との間に発生する寄生容量をより一層小さくすることができるのである。
In this embodiment, the case where a metal plate to which a ground potential is applied is arranged on the first layer 7 which is the outermost layer on which the high-frequency switch IC package is mounted has been described as an example. As shown in the figure, by arranging a metal plate to which a ground potential is applied in the nth layer (n ≧ 2) of the mounting substrate, the parasitic capacitance generated between the high frequency circuit and the metal plate can be further reduced. Can do.
That is, when a metal plate is arranged in the nth layer, the parasitic capacitance generated between the high frequency circuit and the metal plate is the entire capacitance value of the high frequency switch IC and the capacitance value of the insulator connected in series. The capacitance value and the overall capacitance value obtained by connecting the capacitance values from the first layer to the (n−1) th layer of the mounting substrate in series are the overall capacitance values obtained by connecting in series. Therefore, as described above, the parasitic capacitance generated between the high-frequency circuit and the metal plate is further reduced by arranging the metal plate to which the ground potential is applied in the nth layer (n ≧ 2) of the mounting substrate. It can be done.

また、上記した本発明を適用した高周波スイッチICパッケージでは、高周波スイッチICパッケージの小型化、薄型化が実現する。
即ち、リードフレームは、高周波スイッチIC上の電極部とリード端子のワイヤーボンディング時に印加される超音波振動等に耐えることができる様にある程度の厚みが必要とされるのに対して、絶縁体は高周波スイッチICと金属板を絶縁しさえすれば良いため、絶縁体の厚みはリードフレームの厚みと比較して薄くすることが可能である。従って、高周波スイッチICをリードフレームのダイパッド部に搭載する場合と比較して、高周波スイッチICを絶縁体に搭載する場合の方が高周波スイッチICパッケージの小型、薄型化が実現するのである。
In the high frequency switch IC package to which the present invention is applied, the high frequency switch IC package can be reduced in size and thickness.
That is, the lead frame is required to have a certain thickness so that it can withstand the ultrasonic vibration applied at the time of wire bonding between the electrode portion on the high frequency switch IC and the lead terminal, while the insulator is Since it is only necessary to insulate the high frequency switch IC and the metal plate, the thickness of the insulator can be made thinner than the thickness of the lead frame. Therefore, compared with the case where the high frequency switch IC is mounted on the die pad portion of the lead frame, the case where the high frequency switch IC is mounted on the insulator realizes a reduction in size and thickness of the high frequency switch IC package.

なお、高周波スイッチICパッケージの小型化、薄型化については、図6で示す様に、従来の高周波スイッチICパッケージの構造のままで、単に高周波スイッチICの厚みを薄くすることによっても実現することが可能である様にも思えるが、単に高周波スイッチICの厚みを薄くしたのでは、高周波回路とダイパッド部との間の寄生容量の増大を招いてしまう。即ち、一般的なコンデンサ容量Cは、コンデンサの電極面積をS、電極間隔(誘電体材料の厚さ)をd、誘電材料の誘電率をεとした場合に、C=ε×S/dで表され、電極間隔dが大きくなればコンデンサ容量は小さくなる。従って、単に高周波スイッチICの厚みを薄くしたのでは、電極間隔dに該当するダイパッド部と高周波スイッチICとの距離が小さくなってしまい高周波回路とダイパッド部との間の寄生容量の増大を招いてしまうのである。
これに対して、本発明を適用した高周波スイッチICパッケージでは、絶縁体に高周波スイッチICを搭載することで高周波回路と金属板との間に発生する寄生容量の低減を図っており、小型化、薄型化の要求に応じて高周波スイッチICの厚みを小さくしたとしても、高周波回路と金属板との間に発生する寄生容量が問題とされることは少ないと考えられる。
The miniaturization and thinning of the high frequency switch IC package can also be realized by simply reducing the thickness of the high frequency switch IC while maintaining the structure of the conventional high frequency switch IC package as shown in FIG. Although it seems to be possible, simply reducing the thickness of the high-frequency switch IC leads to an increase in parasitic capacitance between the high-frequency circuit and the die pad portion. That is, the general capacitor capacity C is C = ε × S / d, where S is the electrode area of the capacitor, d is the electrode interval (thickness of the dielectric material), and ε is the dielectric constant of the dielectric material. As shown, the capacitor capacitance decreases as the electrode spacing d increases. Therefore, if the thickness of the high-frequency switch IC is simply reduced, the distance between the die pad portion corresponding to the electrode interval d and the high-frequency switch IC is reduced, leading to an increase in parasitic capacitance between the high-frequency circuit and the die pad portion. It ends up.
On the other hand, in the high-frequency switch IC package to which the present invention is applied, the parasitic capacitance generated between the high-frequency circuit and the metal plate is reduced by mounting the high-frequency switch IC on the insulator. Even if the thickness of the high-frequency switch IC is reduced according to the demand for thinning, it is considered that the parasitic capacitance generated between the high-frequency circuit and the metal plate is rarely a problem.

ここで、(1)従来の高周波スイッチICパッケージを最表層に金属板が配置された実装基板に実装した場合、(2)従来の高周波スイッチICパッケージを第2層に金属板が配置された実装基板に実装した場合、(3)図3に示す本発明を適用した高周波スイッチICパッケージを最表層に金属板が配置された実装基板に実装した場合、(4)図3に示す本発明を適用した高周波スイッチICパッケージを第2層に金属板が配置された実装基板に実装した場合のそれぞれについて、各高周波スイッチICに900MHz及び1800MHzの周波数を有する信号情報を入力した際の挿入損失を表2に示し、2次及び3次高調波特性を表3に示す。   Here, (1) when a conventional high-frequency switch IC package is mounted on a mounting board having a metal plate disposed on the outermost layer, (2) a conventional high-frequency switch IC package is mounted with a metal plate disposed on the second layer. When mounted on a substrate, (3) When a high-frequency switch IC package to which the present invention shown in FIG. 3 is applied is mounted on a mounting substrate having a metal plate disposed on the outermost layer, (4) Applying the present invention shown in FIG. Table 2 shows insertion loss when signal information having frequencies of 900 MHz and 1800 MHz is input to each high frequency switch IC for each case where the high frequency switch IC package is mounted on a mounting substrate in which a metal plate is disposed on the second layer. Table 3 shows the second and third harmonic characteristics.

Figure 2006237450
Figure 2006237450

Figure 2006237450
Figure 2006237450

表2及び表3から、本発明を適用した高周波スイッチICパッケージでは、挿入損失が減少し2次高調波特性に良い傾向が出現し、良好な高周波特性を奏することが分かる。   From Tables 2 and 3, it can be seen that in the high-frequency switch IC package to which the present invention is applied, the insertion loss is reduced, a good tendency appears in the second-order harmonic characteristics, and good high-frequency characteristics are exhibited.

更に表2及び表3から、本発明を適用した高周波スイッチICパッケージを最表層に金属板が配置された実装基板に実装するよりも、第2層に金属板が配置された実装基板に実装した方が良好な高周波特性を奏することも分かる。   Further, from Table 2 and Table 3, the high frequency switch IC package to which the present invention is applied is mounted on the mounting substrate on which the metal plate is arranged on the second layer, rather than on the mounting substrate on which the metal plate is arranged on the outermost layer. It can also be seen that the high frequency characteristics are better.

本発明を適用した高周波スイッチICパッケージ(1)を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the high frequency switch IC package (1) to which this invention is applied. 高周波スイッチパッケージ(1)の製造方法を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the manufacturing method of a high frequency switch package (1). 本発明を適用した高周波スイッチICパッケージ(2)を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the high frequency switch IC package (2) to which this invention is applied. 高周波スイッチICパッケージ(2)の製造方法を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the manufacturing method of a high frequency switch IC package (2). 実装基板の変形例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the modification of a mounting substrate. 高周波スイッチICの厚みを薄くした従来の高周波スイッチICパッケージを説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the conventional high frequency switch IC package which made thickness of high frequency switch IC thin. 従来の高周波スイッチICパッケージを説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the conventional high frequency switch IC package.

符号の説明Explanation of symbols

1 高周波スイッチICパッケージ
2 リードフレーム
2a ダイパッド部
2b リード端子
3 高周波スイッチIC
4 ボンディングワイヤー
5 エポキシ樹脂
6 実装基板(多層基板)
7 第1層
8 金属板
10 スペーサ
11 はんだ材
12 絶縁体
DESCRIPTION OF SYMBOLS 1 High frequency switch IC package 2 Lead frame 2a Die pad part 2b Lead terminal 3 High frequency switch IC
4 Bonding wire 5 Epoxy resin 6 Mounting board (Multilayer board)
7 First layer 8 Metal plate 10 Spacer 11 Solder material 12 Insulator

Claims (3)

半導体チップと、該半導体チップが搭載されるダイパッド部及び前記半導体チップを他の回路に接続する外部端子を有するリードフレームと、前記半導体チップ及び前記リードフレームを封止する封止樹脂とを備え、前記ダイパッド部にグランド電位が印加される半導体パッケージにおいて、
前記半導体チップは前記ダイパッド部にスペーサを介して搭載されると共に、前記ダイパッド部と前記半導体チップが絶縁されている
ことを特徴とする半導体パッケージ。
A semiconductor chip, a die pad portion on which the semiconductor chip is mounted, a lead frame having an external terminal for connecting the semiconductor chip to another circuit, and a sealing resin for sealing the semiconductor chip and the lead frame, In a semiconductor package in which a ground potential is applied to the die pad portion,
The semiconductor chip is mounted on the die pad portion via a spacer, and the die pad portion and the semiconductor chip are insulated.
絶縁性材料から構成された絶縁体と、
該絶縁体に搭載された半導体チップと、
該半導体チップを他の回路に接続する外部端子を有するリードフレームと、
前記半導体チップ、前記絶縁体及び前記リードフレームを封止する封止樹脂とを備える
ことを特徴とする半導体パッケージ。
An insulator composed of an insulating material;
A semiconductor chip mounted on the insulator;
A lead frame having external terminals for connecting the semiconductor chip to another circuit;
A semiconductor package comprising: a sealing resin for sealing the semiconductor chip, the insulator, and the lead frame.
絶縁性材料から構成された絶縁体と、該絶縁体に搭載された半導体チップと、該半導体チップを他の回路に接続する外部端子を有するリードフレームと、前記半導体チップ、前記絶縁体及び前記リードフレームを封止する封止樹脂とを有する半導体パッケージと、
該半導体パッケージを実装する実装基板とを備える半導体装置であって、
前記実装基板は多層構造であり、最表層である第1層に前記半導体パッケージが実装されると共に、第2層以降の層にグランド電位が印加された金属板を有する
半導体装置。
An insulator made of an insulating material, a semiconductor chip mounted on the insulator, a lead frame having an external terminal for connecting the semiconductor chip to another circuit, the semiconductor chip, the insulator, and the lead A semiconductor package having a sealing resin for sealing the frame;
A semiconductor device comprising a mounting substrate for mounting the semiconductor package,
The mounting substrate has a multilayer structure, and includes a metal plate in which the semiconductor package is mounted on a first layer that is an outermost layer, and a ground potential is applied to the second and subsequent layers.
JP2005052722A 2005-02-28 2005-02-28 Semiconductor package and semiconductor device Pending JP2006237450A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014167871A1 (en) * 2013-04-10 2014-10-16 株式会社村田製作所 Semiconductor device
CN104682937A (en) * 2013-12-03 2015-06-03 株式会社东芝 Semiconductor device
JP2015213151A (en) * 2014-04-16 2015-11-26 株式会社村田製作所 Semiconductor package and semiconductor module including the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0236542A (en) * 1988-07-26 1990-02-06 Hitachi Ltd Semiconductor device and its manufacture
JPH04113639A (en) * 1990-09-03 1992-04-15 Nec Ic Microcomput Syst Ltd Semiconductor device
JPH098205A (en) * 1995-06-14 1997-01-10 Dainippon Printing Co Ltd Resin sealed semiconductor device
JP2003264348A (en) * 2002-03-07 2003-09-19 Sony Corp High frequency module

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0236542A (en) * 1988-07-26 1990-02-06 Hitachi Ltd Semiconductor device and its manufacture
JPH04113639A (en) * 1990-09-03 1992-04-15 Nec Ic Microcomput Syst Ltd Semiconductor device
JPH098205A (en) * 1995-06-14 1997-01-10 Dainippon Printing Co Ltd Resin sealed semiconductor device
JP2003264348A (en) * 2002-03-07 2003-09-19 Sony Corp High frequency module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014167871A1 (en) * 2013-04-10 2014-10-16 株式会社村田製作所 Semiconductor device
CN104682937A (en) * 2013-12-03 2015-06-03 株式会社东芝 Semiconductor device
JP2015213151A (en) * 2014-04-16 2015-11-26 株式会社村田製作所 Semiconductor package and semiconductor module including the same

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