JP2006229188A5 - - Google Patents

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Publication number
JP2006229188A5
JP2006229188A5 JP2005320856A JP2005320856A JP2006229188A5 JP 2006229188 A5 JP2006229188 A5 JP 2006229188A5 JP 2005320856 A JP2005320856 A JP 2005320856A JP 2005320856 A JP2005320856 A JP 2005320856A JP 2006229188 A5 JP2006229188 A5 JP 2006229188A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005320856A
Other versions
JP4660354B2 (ja
JP2006229188A (ja
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Publication date
Application filed filed Critical
Priority to JP2005320856A priority Critical patent/JP4660354B2/ja
Priority claimed from JP2005320856A external-priority patent/JP4660354B2/ja
Priority to EP06250026A priority patent/EP1681726A1/en
Priority to US11/330,520 priority patent/US7648906B2/en
Publication of JP2006229188A publication Critical patent/JP2006229188A/ja
Publication of JP2006229188A5 publication Critical patent/JP2006229188A5/ja
Application granted granted Critical
Publication of JP4660354B2 publication Critical patent/JP4660354B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2005320856A 2005-01-18 2005-11-04 導電性薄膜の加工方法及び装置 Expired - Fee Related JP4660354B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005320856A JP4660354B2 (ja) 2005-01-18 2005-11-04 導電性薄膜の加工方法及び装置
EP06250026A EP1681726A1 (en) 2005-01-18 2006-01-05 Method and apparatus for processing a conductive thin film
US11/330,520 US7648906B2 (en) 2005-01-18 2006-01-11 Method and apparatus for processing a conductive thin film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005010072 2005-01-18
JP2005320856A JP4660354B2 (ja) 2005-01-18 2005-11-04 導電性薄膜の加工方法及び装置

Publications (3)

Publication Number Publication Date
JP2006229188A JP2006229188A (ja) 2006-08-31
JP2006229188A5 true JP2006229188A5 (ja) 2008-07-24
JP4660354B2 JP4660354B2 (ja) 2011-03-30

Family

ID=36000809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005320856A Expired - Fee Related JP4660354B2 (ja) 2005-01-18 2005-11-04 導電性薄膜の加工方法及び装置

Country Status (3)

Country Link
US (1) US7648906B2 (ja)
EP (1) EP1681726A1 (ja)
JP (1) JP4660354B2 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007096031A (ja) * 2005-09-29 2007-04-12 Showa Shell Sekiyu Kk Ｃｉｓ系薄膜太陽電池モジュール及びその製造方法
DE102006051942A1 (de) * 2006-11-01 2008-05-08 Sulfurcell Solartechnik Gmbh Verfahren zur Messung des Schichtwiderstandes von mindestens zweischichtigen elektronischen Bauelementen über Trenngräben
US20080153280A1 (en) * 2006-12-21 2008-06-26 Applied Materials, Inc. Reactive sputter deposition of a transparent conductive film
US20080241356A1 (en) * 2007-04-02 2008-10-02 Jianming Fu Photovoltaic devices manufactured using crystalline silicon thin films on glass
KR101072379B1 (ko) * 2007-07-20 2011-10-11 엘지디스플레이 주식회사 리프트오프 방법 및 이를 이용한 액정표시장치용 어레이기판의 제조방법
US7988871B2 (en) * 2007-07-20 2011-08-02 Lg Display Co., Ltd. Method of lifting off and fabricating array substrate for liquid crystal display device using the same
US20100190275A1 (en) * 2009-01-29 2010-07-29 Applied Materials, Inc. Scribing device and method of producing a thin-film solar cell module
WO2010086042A1 (en) * 2009-01-29 2010-08-05 Applied Materials Inc. Scribing device and method of producing a thin-film solar cell module
EP2214215A1 (en) * 2009-01-29 2010-08-04 Applied Materials Inc., A Corporation Of The State Of Delaware Scribing Device and Method of Producing a Thin-Film Solar Cell Module
US20140352144A1 (en) 2013-06-03 2014-12-04 Carestream Health, Inc. Methods for improving electrical isolation of patterned transparent conductive films
KR20150052920A (ko) * 2013-11-06 2015-05-15 삼성에스디아이 주식회사 태양 전지 제조용 스크라이빙 장치
CN112808528A (zh) * 2021-01-04 2021-05-18 胡民杰 一种基于自动化控制的防漏胶点胶装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60111479A (ja) * 1983-11-22 1985-06-17 Taiyo Yuden Co Ltd 非晶質シリコン太陽電池の製造方法
US4599154A (en) * 1985-03-15 1986-07-08 Atlantic Richfield Company Electrically enhanced liquid jet processing
JPS6340338A (ja) * 1986-08-05 1988-02-20 Toa Nenryo Kogyo Kk 電解スクライブ法及び装置
JPS6362254A (ja) * 1986-09-02 1988-03-18 Fuji Electric Co Ltd 複合光電池の薄膜層切断方法
JP2590918B2 (ja) * 1987-08-22 1997-03-19 富士電機株式会社 非晶質半導体装置の製造方法
JP2874986B2 (ja) * 1990-09-03 1999-03-24 出光興産株式会社 電極のパターン形成方法
US5090121A (en) * 1990-10-30 1992-02-25 Texas Instruments Incorporated Apparatus and method for fabricating cirucit pattern on conductive surface of circuit board
JPH07130701A (ja) 1993-11-05 1995-05-19 Fuji Electric Co Ltd 透明導電膜のパターニング方法
JP3755551B2 (ja) * 1996-06-25 2006-03-15 株式会社カネカ 太陽電池の短絡部除去方法及び該短絡部除去装置
DE19715048C2 (de) * 1997-04-11 1999-08-19 Bosch Gmbh Robert Verfahren zum Strukturieren einer transparenten, elektrisch leitfähigen Schicht
JP3382524B2 (ja) * 1997-12-09 2003-03-04 シャープ株式会社 ラジカル反応を利用した局所的加工装置及びラジカル反応を利用した局所的加工方法によって作製される機能素子
JP3492213B2 (ja) 1998-09-30 2004-02-03 シャープ株式会社 薄膜太陽電池の製造方法
JP2000252490A (ja) * 1999-03-04 2000-09-14 Matsushita Electric Ind Co Ltd 集積型薄膜太陽電池およびその製造方法
EP1041649A1 (de) * 1999-03-29 2000-10-04 ANTEC Solar GmbH Verfahren zur Herstellung eines Dünnschichtsolarmoduls und eine Durchtrennungsvorrichtung
JP2001119048A (ja) 1999-10-22 2001-04-27 Sharp Corp 集積型薄膜太陽電池の製造方法
JP4473995B2 (ja) * 1999-11-29 2010-06-02 キヤノン株式会社 半導体素子の製造方法
JP4194728B2 (ja) 2000-01-25 2008-12-10 シャープ株式会社 集積型薄膜太陽電池
JP4979878B2 (ja) * 2002-01-25 2012-07-18 コナルカ テクノロジーズ インコーポレイテッド 色素増感太陽電池の構造及び材料

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