JP2006202635A - Copper foil for lithium secondary battery electrode, manufacturing method of copper foil, electrode for lithium secondary battery using copper foil, and lithium secondary battery - Google Patents
Copper foil for lithium secondary battery electrode, manufacturing method of copper foil, electrode for lithium secondary battery using copper foil, and lithium secondary battery Download PDFInfo
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Abstract
Description
本発明は、リチウム２次電池用電極材料としての銅箔、特に負極集電体を堆積して負極を構成する銅箔に関するものである。更に本発明は、該銅箔を用いたリチウム２次電池用電極、およびリチウム２次電池に関するものである。 The present invention relates to a copper foil as an electrode material for a lithium secondary battery, and more particularly to a copper foil that forms a negative electrode by depositing a negative electrode current collector. Furthermore, this invention relates to the electrode for lithium secondary batteries using this copper foil, and a lithium secondary battery.
携帯電話、ビデオカメラなどの電子機器の小型化、充電周期の長期化などの要望により、エネルギー密度が高く、充放電特性に優れ、かつ軽量であるリチウム２次電池（以下、「Ｌｉ電池」と略記することがある）の消費量が増大し、開発も盛んに行われている。
リチウム電池の負極の電極材料としては、一般に集電体として銅箔が使用され、該銅箔の表面に黒鉛などの負極活物質を塗布、乾燥し、その後ロール圧延などで圧着して銅箔表面に活物質を堆積させ、負極電極としている。
負極活物質としては、平均粒径１０μｍ程度のカーボン粉、人造黒鉛、天然黒鉛、コークスなどをバインダーとともに溶剤に分散しスラリー化した液が用いられ、該液を銅箔に塗布した後、乾燥し、さらにロール圧着することにより成形して数十μｍ程度の厚さに形成し負極電極とする。通常、バインダーとしてはＰＶＤＦ（ポリフッ化ビニリデン）が使用され、溶剤としてはＮＭＰ（ノルマルメチルピロリドン）が使用されている。
また、カーボン以外の活物質として、Ｓｎ系合金やＳｉ系合金、金属窒素化物、Ｓｎ−Ｏ化合物、Ｓｉ−Ｏ化合物などが研究開発されている。
Due to demands for downsizing electronic devices such as mobile phones and video cameras, and extending the charging cycle, the lithium secondary battery (hereinafter referred to as “Li battery”) has high energy density, excellent charge / discharge characteristics, and light weight. (Sometimes abbreviated) and the development is actively underway.
As a negative electrode material for a lithium battery, a copper foil is generally used as a current collector, and a negative electrode active material such as graphite is applied to the surface of the copper foil, dried, and then pressed by roll rolling or the like to obtain a copper foil surface. The active material is deposited on the negative electrode.
As the negative electrode active material, carbon powder having an average particle size of about 10 μm, artificial graphite, natural graphite, coke and the like are dispersed in a solvent together with a binder to form a slurry, which is applied to a copper foil and dried. Furthermore, it is formed by roll pressure bonding to form a thickness of about several tens of μm to be a negative electrode. Usually, PVDF (polyvinylidene fluoride) is used as the binder, and NMP (normal methylpyrrolidone) is used as the solvent.
In addition, Sn-based alloys, Si-based alloys, metal nitrides, Sn—O compounds, Si—O compounds, and the like have been researched and developed as active materials other than carbon.
負極集電体用銅箔としては現在８〜２０μｍ厚程度の銅箔が主に用いられているが近年では、電池の高容量化などから使用される銅箔の薄肉化が進行している。
銅箔としては、硫酸銅などを主成分とする溶液からＴｉなどのドラム上に電着させた電解銅箔や肉厚の素条から圧延加工された圧延銅箔が使用されている。
圧延銅箔の製造には、加工油が不可欠であるため、必然的に加工油による汚染があり、活物質との密着性が劣る欠点を有する。また、機械強度の点では電解銅箔よりも優れるとされているが、製造巾が狭いため生産性が劣る問題や薄箔化への対応によるコスト増大の問題がある。
一方、従来の電解銅箔は柱状層からなっており、表面の凹凸が過大であり、加工時のハンドリングや曲げなどの加工による応力集中で屈曲したり、破断する場合がある。これを改善する方法として、粒状層を持ち表面が平滑な電解銅箔が開発され、Ｌｉ電池用集電体としては薄手の電解銅箔へと転換が進められている。
As the copper foil for the negative electrode current collector, a copper foil having a thickness of about 8 to 20 μm is mainly used at present, but in recent years, the thinning of the copper foil used for increasing the capacity of the battery has progressed.
As the copper foil, an electrolytic copper foil electrodeposited on a drum such as Ti from a solution containing copper sulfate as a main component or a rolled copper foil rolled from a thick strip is used.
Since the processing oil is indispensable for the production of the rolled copper foil, the processing oil is inevitably contaminated and has a disadvantage that the adhesion with the active material is inferior. Moreover, although it is said that it is superior to an electrolytic copper foil in terms of mechanical strength, there are problems of inferior productivity due to a narrow manufacturing width and a problem of cost increase by dealing with thin foils.
On the other hand, the conventional electrolytic copper foil is composed of a columnar layer, and has an excessively uneven surface, and may be bent or broken due to stress concentration due to processing such as handling or bending during processing. As a method for improving this, an electrolytic copper foil having a granular layer and a smooth surface has been developed, and a current electrolytic copper foil for a Li battery is being converted to a thin electrolytic copper foil.
電解銅箔は、通常Ｔｉなどで製造されたドラムをカソードとして硫酸銅浴などの銅めっき浴中でドラムを回転しながら電着、剥離を行い製箔される。この時に銅箔のドラムに接触していた面をシャイニー面（以下Ｓ面）、反対面をマット面（以下Ｍ面）と呼ぶ。Ｓ面はいわばドラム表面のレプリカであり、通常バフなどで研磨されたドラム表面の形状を写し取っていてシャープなS面を示すが、Ｍ面は銅めっき浴の種類・電解条件により平滑から凹凸の大なものまで種々製造されている。このためＳ面とＭ面との表面形状が異なっているのが通常である。また、結晶粒径もＴｉなどのドラムに初期析出した時点と厚く電着された時点で異なり、初期は細かいものとなっているが、後半では粗くなることもある。
また、電池用銅箔としてはこの後、クロメート処理、有機防錆処理などが施される場合が多い。
Electrodeposited copper foil is usually made by performing electrodeposition and peeling while rotating a drum in a copper plating bath such as a copper sulfate bath using a drum made of Ti or the like as a cathode. The surface in contact with the copper foil drum at this time is called a shiny surface (hereinafter referred to as S surface), and the opposite surface is referred to as a mat surface (hereinafter referred to as M surface). The S surface is a so-called replica of the drum surface, and it shows the sharp S surface, which is usually the shape of the drum surface polished by buffing, etc., but the M surface is smooth and uneven depending on the type of copper plating bath and the electrolysis conditions. Various products are manufactured up to large ones. For this reason, the surface shapes of the S surface and the M surface are usually different. In addition, the crystal grain size is different at the time of initial deposition on a drum such as Ti and at the time of thick electrodeposition, and is initially fine, but may be coarse in the latter half.
In addition, the copper foil for batteries is often subjected to chromate treatment, organic rust prevention treatment, and the like thereafter.
上述したように、電解銅箔のＳ面とＭ面の形状（表面粗さ）が異なっているため、Ｌｉ電池用集電体としてこのような銅箔を用いると活物質の付着が銅箔両面で異なるという問題が生じる。例えば、銅箔が柱状層の場合、Ｓ面の表面粗さＲｚは１〜３μｍ程度であり、Ｍ面の表面粗さＲｚは５μｍ以上である。粒状層の場合はＳ面、Ｍ面ともＲｚを１〜３μｍ程度に制御することは可能であるが、シャープなＳ面と平滑めっきされたなだらかなＭ面との差があり、表面粗さを整えるだけでは活物質を両面で揃えることは極めて困難であった。 As described above, since the shapes (surface roughness) of the S surface and the M surface of the electrolytic copper foil are different, when such a copper foil is used as a current collector for a Li battery, the active material adheres to both sides of the copper foil. The problem arises that they are different. For example, when the copper foil is a columnar layer, the surface roughness Rz of the S surface is about 1 to 3 μm, and the surface roughness Rz of the M surface is 5 μm or more. In the case of a granular layer, it is possible to control Rz to about 1 to 3 μm on both the S and M planes, but there is a difference between the sharp S plane and the smooth plated smooth M plane, and the surface roughness is reduced. It was extremely difficult to arrange active materials on both sides simply by arranging them.
リチウム電池にとって最も重要な特性である充放電サイクル寿命特性と充電初期の電池容量は、負極電極によって大きく影響され、活物質を両面に同じように設けることができる、表面状態が均等な銅箔の提供が要求されている。
本発明は、Ｌｉ電池の負極集電体として用いられる銅箔の問題点を解決し、優れた充放電サイクル寿命特性と充電初期の高い電池容量の保持を可能とする負極集電体用電極として最適な銅箔を提供し、加えて該銅箔の製造方法、リチウム２次電池用電極、リチウム２次電池の提供を目的とする。
The charge / discharge cycle life characteristics and the battery capacity at the initial stage of charge, which are the most important characteristics for a lithium battery, are greatly influenced by the negative electrode, and the active material can be provided on both sides in the same way. Offering is required.
The present invention solves the problems of copper foil used as a negative electrode current collector of a Li battery, and as an electrode for a negative electrode current collector capable of maintaining excellent charge / discharge cycle life characteristics and a high battery capacity at the beginning of charge. An object of the present invention is to provide an optimal copper foil, and additionally to provide a method for producing the copper foil, an electrode for a lithium secondary battery, and a lithium secondary battery.
本発明は、上記の問題点に鑑み鋭意研究の結果、粒状晶を持つ銅箔の両面をエッチングにより粗度と形状を制御することでその解決を図ったものであり、エッチング後の表面粗さＲｚを０．５〜３．０μｍとすることで優れた集電体としての機能を発揮する銅箔の開発に成功したものである。
本発明のリチウム２次電池電極用銅箔は、電気化学的または化学的にリチウムを吸蔵・放出可能な負極活物質を、集電体としての銅箔上に堆積して形成するリチウム２次電池用電極材料としての銅箔であって、前記銅箔は粒状晶からなり、該銅箔の両表面（表裏両面）の表面粗さＲｚが、０．５μｍ〜３．０μｍである。
前記銅箔の両表面はエッチングにより表面粗さＲｚが、０．５μｍ〜３．０μｍに仕上げられている。
As a result of intensive studies in view of the above problems, the present invention aims to solve this problem by controlling the roughness and shape of both sides of a copper foil having a granular crystal by etching. Surface roughness after etching It succeeded in the development of the copper foil which exhibits the function as the outstanding electrical power collector by setting Rz to 0.5-3.0 micrometers.
The copper foil for a lithium secondary battery electrode of the present invention is a lithium secondary battery formed by depositing a negative electrode active material capable of electrochemically or chemically absorbing and releasing lithium on a copper foil as a current collector. It is copper foil as an electrode material for a metal, Comprising: The said copper foil consists of granular crystals, and the surface roughness Rz of both the surfaces (front and back both surfaces) of this copper foil is 0.5 micrometer-3.0 micrometers.
Both surfaces of the copper foil are finished to a surface roughness Rz of 0.5 μm to 3.0 μm by etching.
また、前記銅箔のエッチングを施す領域は、１μｍ以上の結晶粒が面積比で１０％以上存在することが望ましい。 Further, it is desirable that the area where the copper foil is etched has crystal grains of 1 μm or more in an area ratio of 10% or more.
本発明のリチウム２次電池電極用銅箔の製造方法は、粒状晶からなる電解銅箔を６０℃以上にて、式１を満たすＬＭＰ値が７０００以上となる加熱処理を施した後エッチング粗化処理を施し、両表面の表面粗さＲｚを、０．５μｍ〜３．０μｍに仕上げるものである。
式１：ＬＭＰ＝（Ｔ＋２７３）＊（２０＋Ｌｏｇｔ）
なお、式１において、Ｔは温度（℃）、ｔは時間（Ｈｒ）である。
上記銅箔を電解で製造する場合には、銅の電解浴やめっき条件によっても制御がある程度可能ではあるが、より安定した製造は、粒状晶からなる電解銅箔を６０℃以上にて、式１を満たすＬＭＰ値が７０００以上となる加熱処理を施す製造方法である。
The method for producing a copper foil for a lithium secondary battery electrode according to the present invention comprises subjecting an electrolytic copper foil composed of granular crystals to a heat treatment at 60 ° C. or higher and an LMP value satisfying Formula 1 of 7000 or higher, followed by etching roughening Processing is performed to finish the surface roughness Rz of both surfaces to 0.5 μm to 3.0 μm.
Formula 1: LMP = (T + 273) * (20 + Logt)
In Equation 1, T is temperature (° C.) and t is time (Hr).
When the copper foil is produced by electrolysis, it can be controlled to some extent depending on the electrolytic bath and plating conditions of copper, but more stable production can be achieved by using an electrolytic copper foil made of granular crystals at 60 ° C. or higher. 1 is a manufacturing method in which an LMP value satisfying 1 is 7000 or higher.
本発明は、リチウム２次電池にとって最も重要な特性である優れた充放電サイクル寿命特性と充電初期の高い電池容量の保持を可能とし、活物質が両面に同じように付着する表面状態が均等な銅箔とその製造方法を提供することができる。
また、本発明銅箔を電極材料とすることにより、優れた充放電サイクル寿命特性と充電初期の高い電池容量の保持が可能なリチウム電池用電極、リチウム２次電池を提供することができる。
The present invention makes it possible to maintain excellent charge / discharge cycle life characteristics, which are the most important characteristics for a lithium secondary battery, and a high battery capacity at the beginning of charging, and an even surface state where the active material adheres equally to both surfaces. Copper foil and its manufacturing method can be provided.
Further, by using the copper foil of the present invention as an electrode material, it is possible to provide a lithium battery electrode and a lithium secondary battery capable of maintaining excellent charge / discharge cycle life characteristics and a high battery capacity at the beginning of charging.
本発明は、粒状晶からなる銅箔表面をエッチングにより両表面の表面粗さＲｚを、０．５μｍ〜３．０μｍに仕上げる。
本発明において、粒状晶からなる電解銅箔をエッチング処理するのは、エッチング処理では銅箔表面の粒界が選択的に溶解されるため、粒状晶を持つ電解銅箔は、柱状晶に比べてエッチング後の表面の凹凸が均一となるためである。
しかし、電解銅箔を採用する場合、銅箔が粒状晶であっても、電解銅箔製造時の初期電着層の結晶粒は細かいため、その結晶粒の細かい部分の厚さが大であり、エッチング量が少ないと、エッチング後の凹凸がＳ面、Ｍ面で異なる場合がある。このように、エッチング領域での結晶粒径が細かすぎると適度な表面調整（粗化）ができず、十分な活物質との付着強度が得られないことがあるため、エッチング領域の結晶粒径の平均値が０．３μｍ以上である電解銅箔を用いることが好ましい。
さらには、エッチング領域内に結晶粒径が１μｍ以上の結晶粒が面積比で１０％以上あるとより均一な表面凹凸が得られ、特に好ましい。
In the present invention, the surface roughness Rz of both surfaces is finished to 0.5 μm to 3.0 μm by etching the surface of the copper foil made of granular crystals.
In the present invention, the electrolytic copper foil made of granular crystals is etched because the grain boundaries on the surface of the copper foil are selectively dissolved in the etching treatment, so the electrolytic copper foil having granular crystals is compared with the columnar crystals. This is because the surface unevenness after etching becomes uniform.
However, when adopting electrolytic copper foil, even if the copper foil is a granular crystal, the initial electrodeposition layer has a fine crystal grain, so the thickness of the fine part of the crystal grain is large. When the etching amount is small, unevenness after etching may be different between the S surface and the M surface. As described above, if the crystal grain size in the etching region is too small, appropriate surface adjustment (roughening) cannot be performed, and sufficient adhesion strength with the active material may not be obtained. It is preferable to use an electrolytic copper foil whose average value is 0.3 μm or more.
Furthermore, it is particularly preferable that crystal grains having a crystal grain size of 1 μm or more in the etching region have an area ratio of 10% or more because a more uniform surface unevenness can be obtained.
ここで「エッチング領域」とは銅箔断面での厚さ方向でのエッチングされる領域である。
また、結晶粒径の測定は、ＥＢＳＤ（Electron Back Scattering Diffraction）により簡便に銅箔表面からの深さ分布が測定可能である。
Here, the “etching region” is a region to be etched in the thickness direction at the copper foil cross section.
Moreover, the measurement of the crystal grain diameter can measure the depth distribution from the copper foil surface simply by EBSD (Electron Back Scattering Diffraction).
銅箔表面をエッチング処理するエッチング粗化液は、特に限定されるものではなく公知の浴が使用可能である。このエッチング粗化液として、無機または有機酸と酸化剤と添加剤を含有する液が多数記載提案されている。例えば特許文献１（特許２７４０７６８号）では、無機酸＋過酸化水素＋トリアゾールなどの腐食防止剤＋界面活性剤が記載されている。また、特許文献２（特開平１０−９６０８８号公報）には、無機酸＋過酸化物＋アゾール＋ハロゲン化物を含有する液が開示されている。
通常は酸と酸化剤にキレート剤などの添加剤を付与した浴であり、銅の結晶粒界を優先的に溶解するものである。例えば、前記特許文献に開示されている液組成の他に、メック株式会社のＣＺ−８１００、同８１０１、三菱ガス化学株式会社のＣＰＥ−９００などの市販品が採用できる。
The etching roughening solution for etching the copper foil surface is not particularly limited, and a known bath can be used. As the etching roughening solution, many solutions containing inorganic or organic acids, oxidizing agents and additives have been proposed. For example, Patent Document 1 (Japanese Patent No. 2740768) describes a corrosion inhibitor such as an inorganic acid + hydrogen peroxide + triazole + a surfactant. Patent Document 2 (Japanese Patent Laid-Open No. 10-96088) discloses a liquid containing inorganic acid + peroxide + azole + halide.
Usually, it is a bath in which an additive such as a chelating agent is added to an acid and an oxidizing agent, and preferentially dissolves the copper grain boundaries. For example, in addition to the liquid composition disclosed in the above-mentioned patent document, commercially available products such as CZ-8100 and 8101 of MEC Co., Ltd. and CPE-900 of Mitsubishi Gas Chemical Co., Ltd. can be adopted.
エッチング量は、銅表面に付着する負極活物質の種類、形状により適宜選定すればよいが、０．５〜３．０μｍ程度が好ましい。エッチング量が０．５μｍ未満であると充分な粗化表面が得られないことがあり、表裏に形状の差が残ってしまうなどの問題が発生することがある。一方３．０μｍを越えてエッチングしても活物質との密着性の向上は少なく、熱履歴による応力集中での破断が発生しやすくなり、また資源のロスや廃液処理費の増大につながるなどの不利益が発生する恐れがあるためである。
ここで「エッチング量」とは、エッチング前後の重量変化と銅箔の表面積から計算された値の平均値である。
The etching amount may be appropriately selected depending on the type and shape of the negative electrode active material adhering to the copper surface, but is preferably about 0.5 to 3.0 μm. If the etching amount is less than 0.5 μm, a sufficiently roughened surface may not be obtained, and problems such as a difference in shape between the front and back may occur. On the other hand, even if etching exceeds 3.0 μm, there is little improvement in adhesion to the active material, breakage due to stress concentration due to thermal history is likely to occur, and it leads to loss of resources and increased waste liquid treatment costs, etc. This is because there is a risk of disadvantage.
Here, the “etching amount” is an average value calculated from the weight change before and after etching and the surface area of the copper foil.
本発明において、少なくとも表面が粒状晶からなり、エッチング領域の平均粒径が０．３μｍ以上である電解銅箔を作製するには、加熱処理温度５０℃以上の雰囲気中に製箔された電解銅箔を保持する。特に、５０℃以上で、式１に示すＬＭＰ値が７０００以上となる加熱処理を施すことにより優れた未処理電解銅箔とすることができる。
式１：ＬＭＰ＝（Ｔ＋２７３）（２０＋Ｌｏｇｔ）
Ｔは温度（℃）、ｔは時間（Ｈｒ）
ここで、加熱処理温度を５０℃以上とするのは、生産性、特に熱処理時間を考慮した設定であり、工業生産に適した時間内で粒状晶で平均結晶粒径０．３μｍ以上を生成させるためで、そのためには５０℃以上とすることが必要である。
また、ＬＭＰ値を７０００以上とするのは、より工業的に適した加熱温度と熱処理時間で、少なくともエッチング領域（銅箔表面からの深さＸまで）を粒状晶で平均結晶粒径０．３μｍ以上の銅箔に形成するためである。
In the present invention, in order to produce an electrolytic copper foil having at least a surface composed of granular crystals and an average particle size of an etching region of 0.3 μm or more, electrolytic copper produced in an atmosphere having a heat treatment temperature of 50 ° C. or more Hold the foil. In particular, an excellent untreated electrolytic copper foil can be obtained by performing a heat treatment at 50 ° C. or higher so that the LMP value shown in Formula 1 is 7000 or higher.
Formula 1: LMP = (T + 273) (20 + Logt)
T is temperature (° C.), t is time (Hr)
Here, the heat treatment temperature is set to 50 ° C. or more in consideration of productivity, particularly heat treatment time, and an average crystal grain size of 0.3 μm or more is generated with granular crystals within a time suitable for industrial production. For this reason, it is necessary to set the temperature to 50 ° C. or higher.
Also, the LMP value is set to 7000 or more at a more industrially suitable heating temperature and heat treatment time, and at least the etching region (up to the depth X from the copper foil surface) is a granular crystal with an average crystal grain size of 0.3 μm. It is for forming in the above copper foil.
なお、エッチング粗化後にて、Ｎｉ，Ｚｎ、クロメート、シラン処理、有機系防錆処理等の表面処理を適宜行っても良い。
本発明銅箔のエッチング粗化表面は、両面ともに均一な凹凸が一様に形成されており、活物質との密着性に優れた表面である。
このようにして得られた表面エッチング粗化銅箔は、必要に応じて防錆等の表面処理を行うことで、負極活物質を堆積する集電体として適したＬｉ電池電極用の負極材料となる。
In addition, after etching roughening, surface treatment such as Ni, Zn, chromate, silane treatment, and organic rust prevention treatment may be appropriately performed.
The roughened etching surface of the copper foil of the present invention is a surface that is uniformly formed with unevenness on both sides and has excellent adhesion to the active material.
The surface-etched roughened copper foil thus obtained has a negative electrode material for a Li battery electrode suitable as a current collector for depositing a negative electrode active material by performing surface treatment such as rust prevention as necessary. Become.
以上の説明は、本発明の一般的な説明をする目的でなされたものであり、何ら限定的意味を持つものではない。 The above description is made for the purpose of providing a general description of the present invention, and has no limiting meaning.
以下、本発明を実施例により、より具体的に説明する。 Hereinafter, the present invention will be described more specifically with reference to examples.
Ｔｉ板をバフ研磨にてその表面を表面粗度Ｒｚ＝１．５μｍとしたドラムをカソードとして、それぞれのめっき浴、条件にて未処理電解銅箔を作成した。これをエッチング処理した後にクロメート処理を施してＬｉ電池集電体用銅箔とした。なお、一部においてエッチング処理前に加熱処理を施した。 An untreated electrolytic copper foil was prepared in each plating bath and conditions using a drum having a surface roughness Rz = 1.5 μm as a cathode by buffing the Ti plate. This was subjected to an etching treatment, followed by a chromate treatment to obtain a copper foil for a Li battery current collector. In some cases, heat treatment was performed before the etching treatment.
実施例１
硫酸銅五水和物２８０ｇ／ｌ、硫酸８０ｇ／ｌ、塩素イオン３５ｐｐｍを含む硫酸酸性硫酸銅電解液に平均分子量３０００の低分子量ゼラチン１５ｐｐｍ、ヒドロキシエチルセルロ−ス３ｐｐｍ、３−メルカプト−１−プロパンスルホン酸ナトリウム１ｐｐｍを添加し、電解液温度３０℃、流速０.２ｍ／分、電流密度３０Ａ／ｄｍ２の条件で、１８μｍ厚の未処理銅箔を製箔した。
この未処理銅箔のＲｚはＭ面で１．０μｍ、Ｓ面で１．４μｍであった。得られた未処理銅箔は粒状晶をもち、このＭ面から２μｍまでの範囲の結晶粒径は、平均で０．４μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は６％であった。また、Ｓ面から２μｍまでの範囲の結晶粒径は、平均で０．３μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は５％であった。この箔につき、両面を平均２μｍエッチング処理した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の箔の表面粗度Ｒｚは、Ｍ面で1．8μｍ、Ｓ面で１．７μｍであった。
Example 1
Copper sulfate sulfate pentahydrate 280 g / l, sulfuric acid 80 g / l, sulfuric acid acidic copper sulfate electrolyte containing 35 ppm of chlorine ion, low molecular weight gelatin with average molecular weight of 3000 ppm, hydroxyethyl cellulose 3 ppm, 3-mercapto-1-propane 1 ppm of sodium sulfonate was added, and an untreated copper foil having a thickness of 18 μm was formed under the conditions of an electrolyte temperature of 30 ° C., a flow rate of 0.2 m / min, and a current density of 30 A / dm 2 .
Rz of this untreated copper foil was 1.0 μm on the M surface and 1.4 μm on the S surface. The obtained untreated copper foil has granular crystals, and the average crystal grain size in the range from the M-plane to 2 μm is 0.4 μm. The crystal grain size in the range of 1 μm or more is 6%. there were. The average crystal grain size in the range from the S plane to 2 μm was 0.3 μm, and the crystal grain size in the range of 1 μm or more was 5%. About this foil, both surfaces were etched on average by 2 μm. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The surface roughness Rz of the foil after etching was 1.8 μm on the M surface and 1.7 μm on the S surface.
実施例２
硫酸銅五水和物２８０ｇ／ｌ、硫酸１００ｇ／ｌ、塩素イオン３５ｐｐｍを含む硫酸酸性硫酸銅電解液に平均分子量３０００の低分子量ゼラチン７ｐｐｍ、ヒドロキシエチルセルロ−ス３ｐｐｍ、３−メルカプト−１−プロパンスルホン酸ナトリウム１ｐｐｍを添加し、電解液温度５５℃、流速０.３ｍ／分、電流密度５０Ａ／ｄｍ２の条件で、１８μｍ厚の未処理銅箔を製箔した。
この未処理銅箔のＲｚはＭ面で１．５μｍ、Ｓ面で１．４μｍであった。
得られた銅箔は粒状晶をもち、このＭ面から２μｍまでの範囲の結晶粒径は、平均で０．５μｍであり、この範囲の１μｍ以上の結晶粒径は１２％であった。また、Ｓ面から２μｍまでの範囲の結晶粒径は平均で０．３μｍであり、この範囲の１μｍ以上の結晶粒径は１０％であった。この箔につき、両面を平均２μｍエッチング処理した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の銅箔のＲｚは、Ｍ面で２．２μｍ、Ｓ面で２．０μｍであった。
Example 2
Copper sulfate pentahydrate 280 g / l, sulfuric acid 100 g / l, sulfuric acid acidic copper sulfate electrolyte containing 35 ppm of chlorine ions, low molecular weight gelatin with an average molecular weight of 3000 ppm, hydroxyethyl cellulose 3 ppm, 3-mercapto-1-propane 1 ppm of sodium sulfonate was added, and an untreated copper foil having a thickness of 18 μm was formed under the conditions of an electrolyte temperature of 55 ° C., a flow rate of 0.3 m / min, and a current density of 50 A / dm 2 .
Rz of this untreated copper foil was 1.5 μm on the M surface and 1.4 μm on the S surface.
The obtained copper foil had granular crystals, and the average crystal grain size in the range from the M-plane to 2 μm was 0.5 μm, and the crystal grain size of 1 μm or more in this range was 12%. The average crystal grain size in the range from the S plane to 2 μm was 0.3 μm, and the crystal grain size in the range of 1 μm or more was 10%. About this foil, both surfaces were etched on average by 2 μm. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The Rz of the copper foil after etching was 2.2 μm on the M surface and 2.0 μm on the S surface.
実施例３
実施例１の未処理銅箔を８０℃で１日間の加熱処理（ＬＭＰ＝７５４７）を行った。加熱処理後の銅箔は粒状晶をもち、このＭ面から２μｍまでの範囲の結晶粒径は、平均で０．８μｍであり、この範囲の１μｍ以上の結晶粒径は１８％であった。また、Ｓ面から２μｍまでの範囲の結晶粒径は平均で０．７μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は１７％であった。この箔につき、両面を平均２μｍのエッチング処理した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の銅箔のＲｚは、Ｍ面で２．５μｍ、Ｓ面で２．４μｍであった。
Example 3
The untreated copper foil of Example 1 was heat-treated at 80 ° C. for 1 day (LMP = 7547). The copper foil after the heat treatment had granular crystals, and the crystal grain size in the range from the M plane to 2 μm was 0.8 μm on average, and the crystal grain size in the range of 1 μm or more was 18%. The average crystal grain size in the range from the S-plane to 2 μm was 0.7 μm, and the crystal grain size in the range of 1 μm or more was 17%. This foil was subjected to an etching process with an average of 2 μm on both sides. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The Rz of the copper foil after etching was 2.5 μm on the M surface and 2.4 μm on the S surface.
実施例４
実施例１の未処理銅箔を２００℃で５時間の加熱（ＬＭＰ＝９７９０）を行った。加熱処理後の銅箔は粒状晶をもち、このＭ面から２μｍまでの範囲の結晶径は、平均で０．９μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は２３％であった。また、Ｓ面から２μｍまでの範囲の結晶粒径は、平均で１．５μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は１７％であった。この箔につき、両面を平均１．５μｍのエッチング処理した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の銅箔のＲｚは、Ｍ面で２．１μｍ、Ｓ面で２．１μｍであった。
Example 4
The untreated copper foil of Example 1 was heated at 200 ° C. for 5 hours (LMP = 9790). The copper foil after the heat treatment had a granular crystal, and the average crystal diameter in the range from the M plane to 2 μm was 0.9 μm, and the crystal grain having a crystal grain size of 1 μm or more in this range was 23%. . The average crystal grain size in the range from the S plane to 2 μm was 1.5 μm, and the crystal grain size in the range of 1 μm or more was 17%. About this foil, both sides were etched at an average of 1.5 μm. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The Rz of the copper foil after etching was 2.1 μm on the M surface and 2.1 μm on the S surface.
比較例１
実施例１の条件にて１４μｍ厚の電解銅箔を製箔し、エッチング（粗化）処理を行わなかった。
Comparative Example 1
An electrolytic copper foil having a thickness of 14 μm was formed under the conditions of Example 1, and no etching (roughening) treatment was performed.
比較例２
実施例４と同様に加熱され処理を施した２１μｍ厚の銅箔を、エッチング量を平均３．５μｍとした以外は実施例４と同様に処理した。
エッチング後の銅箔のＲｚはＭ面で、３．７μｍ、Ｓ面で３．３μｍであった。
Comparative Example 2
A 21 μm-thick copper foil heated and treated in the same manner as in Example 4 was treated in the same manner as in Example 4 except that the average etching amount was 3.5 μm.
The Rz of the copper foil after etching was 3.7 μm on the M plane and 3.3 μm on the S plane.
比較例３
電解液として、銅９０ｇ／ｌ、硫酸１００ｇ／ｌ、塩素イオン２０ｐｐｍ、加水分解したニカワ３００ｐｐｍを含む電解液に更に加水分解前のニカワを２ｐｐｍ添加したものを使用し、液温度５５℃、電流密度は５５Ａ／ｄｍ2の条件で、１８μｍ厚の柱状晶の未処理銅箔を製造した。
この未処理銅箔のＲｚはＭ面で１．１μｍ、Ｓ面で６．８μｍであった。
得られた銅箔は柱状晶をもち、このＭ面から２μｍまでの範囲の結晶粒径は平均で２．４μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は１２％であった。また、Ｓ面から２μｍまでの範囲の結晶粒径は平均で０．５μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は９％であった。この箔につき、両面を平均深さ２μｍのエッチング処理を施した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の銅箔のＲｚは、Ｍ面で８．３μｍ、Ｓ面で３．５μｍであった
Comparative Example 3
As an electrolytic solution, an electrolytic solution containing 90 g / l of copper, 100 g / l of sulfuric acid, 20 ppm of chlorine ions and 300 ppm of hydrolyzed glue was further added with 2 ppm of non-hydrolyzed glue, liquid temperature 55 ° C., current density Produced an untreated copper foil of 18 μm thick columnar crystals under the condition of 55 A / dm 2 .
Rz of this untreated copper foil was 1.1 μm on the M surface and 6.8 μm on the S surface.
The obtained copper foil had columnar crystals. The average crystal grain size in the range from the M plane to 2 μm was 2.4 μm, and the crystal grain size in the range of 1 μm or more was 12%. The average crystal grain size in the range from the S plane to 2 μm was 0.5 μm, and 9% of the crystal grains had a crystal grain size of 1 μm or more in this range. This foil was etched on both sides with an average depth of 2 μm. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The Rz of the copper foil after etching was 8.3 μm on the M surface and 3.5 μm on the S surface.
比較例４
比較例３と同様の条件で、２２μｍ厚の未処理銅箔を製造した。
この未処理銅箔のＲｚはＭ面で１．１μｍ、Ｓ面で９．４μｍであった。
得られた銅箔は柱状晶をもち、このＭ面から４μｍまでの範囲の結晶粒径は平均で３．４μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は１０％であった。また、Ｓ面から４μｍまでの範囲の結晶粒径は平均で２．７μｍであり、この範囲の結晶粒径１μｍ以上の結晶粒は８％であった。この箔につき、両面を平均深さ４μｍのエッチング処理を施した。エッチング処理はメック社製ＣＺ８１０１を用いてスプレー式で行った。
エッチング後の銅箔のＲｚは、Ｍ面で１０．２μｍ、Ｓ面で４．５μｍであった
Comparative Example 4
Under the same conditions as in Comparative Example 3, an untreated copper foil having a thickness of 22 μm was produced.
Rz of this untreated copper foil was 1.1 μm on the M surface and 9.4 μm on the S surface.
The obtained copper foil had columnar crystals. The average crystal grain size in the range from the M-plane to 4 μm was 3.4 μm, and the crystal grain size in the range of 1 μm or more was 10%. The average crystal grain size in the range from the S plane to 4 μm was 2.7 μm, and the crystal grain size in the range of 1 μm or more was 8%. This foil was etched on both sides with an average depth of 4 μm. The etching process was performed by a spray method using CZ8101 manufactured by MEC.
The Rz of the copper foil after etching was 10.2 μm on the M surface and 4.5 μm on the S surface.
電池の製造
正極
ＬｉＣｏＯ２粉末９０重量％、黒鉛粉末７重量％、ポリフッ化ビニリデン粉末３重量％を混合してＮ−メチルピロリドンをエタノールに溶解した溶液を添加して混練し、正極剤ペーストを調整した。このペーストを厚み１５μｍのアルミ箔に均一に塗着した後窒素雰囲気中で乾燥してエタノールを揮散せしめ、ついでロール圧延を行って、全体の厚みが１００μｍであるシートを作成した。このシートを巾４３ｍｍ、長さ２９０ｍｍに切断した後その一端にアルミ箔のリード端子を超音波溶接で取り付け正極とした。
Manufacture of the battery 90% by weight of the positive electrode LiCoO 2 powder, 7% by weight of the graphite powder and 3% by weight of the polyvinylidene fluoride powder were added and a solution prepared by dissolving N-methylpyrrolidone in ethanol was added and kneaded to prepare the positive electrode agent paste. did. The paste was uniformly applied to an aluminum foil having a thickness of 15 μm, dried in a nitrogen atmosphere to evaporate ethanol, and then roll-rolled to prepare a sheet having an overall thickness of 100 μm. This sheet was cut into a width of 43 mm and a length of 290 mm, and then an aluminum foil lead terminal was attached to one end thereof by ultrasonic welding to form a positive electrode.
負極
天然黒鉛粉末（平均粒径１０μｍ）９０重量％、ポリフッ化ビニリデン粉末１０重量％を混合し、Ｎ−メチルピロリドンをエタノールに溶解した溶液を添加して混練しペーストを作成した。ついで、このペーストを実施例、比較例で作成したエッチング処理銅箔の両面に塗着した。塗着後の銅箔を窒素雰囲気中で乾燥し溶剤を揮散せしめ、ついで、ロール圧延して全体の厚みが１００μｍであるシートを成型した。このシートを巾４３ｍｍ、長さ２８５ｍｍに切断した後その一端にニッケル箔のリードを超音波溶接して取り付け、負極とした。
Negative electrode Natural graphite powder (average particle size 10 μm) 90% by weight and polyvinylidene fluoride powder 10% by weight were mixed, and a solution in which N-methylpyrrolidone was dissolved in ethanol was added and kneaded to prepare a paste. Subsequently, this paste was applied to both surfaces of the etched copper foil prepared in Examples and Comparative Examples. The coated copper foil was dried in a nitrogen atmosphere to volatilize the solvent, and then roll-rolled to form a sheet having a total thickness of 100 μm. The sheet was cut into a width of 43 mm and a length of 285 mm, and then a nickel foil lead was ultrasonically attached to one end of the sheet to form a negative electrode.
以上のようにして製造した正極と負極の間に厚み２５μｍのポリプロピレン製のセパレータを挟んで全体を巻き、これを軟鋼表面にニッケルめっきされた電池缶に収容して負極のリード端子を缶底にスポット溶接した。ついで、絶縁材の上蓋を置き、ガスケットを挿入後正極のリード端子とアルミ製安全弁とを超音波溶接して接続し、炭酸プロピレンと炭酸ジエチルと炭酸エチレンからなる非水電解液を電池缶の中に注入した後、前記安全弁に蓋を取り付け、外形１４ｍｍ、高さ５０ｍｍの密閉構造のリチウムイオン２次電池を組み立てた。 The whole was wound with a polypropylene separator having a thickness of 25 μm sandwiched between the positive electrode and the negative electrode manufactured as described above, and this was accommodated in a battery can plated with nickel on the mild steel surface, and the lead terminal of the negative electrode was placed on the bottom of the can Spot welded. Next, place the top cover of the insulating material, insert the gasket, and connect the lead terminal of the positive electrode and the aluminum safety valve by ultrasonic welding to connect the non-aqueous electrolyte consisting of propylene carbonate, diethyl carbonate and ethylene carbonate in the battery can. Then, a lid was attached to the safety valve, and a lithium ion secondary battery having an outer shape of 14 mm and a height of 50 mm was assembled.
電池特性の測定
上記作成の電池につき、充電電流５０ｍＡで４．２Ｖになるまで充電し、５０ｍＡで２．５Ｖになるまで放電するサイクルを１サイクルとする充放電サイクル試験を行った。初回充電時の電池容量とサイクル寿命を表１に示した。なお、サイクル寿命は、電池の放電容量が３００ｍＡｈを割り込んだときのサイクル数である。
結果を下記表１に示す。表１において、
Measurement of Battery Characteristics A charge / discharge cycle test was performed on the above-prepared battery, which was charged to 4.2 V at a charging current of 50 mA and discharged to 2.5 V at 50 mA. Table 1 shows the battery capacity and cycle life at the first charge. The cycle life is the number of cycles when the discharge capacity of the battery is below 300 mAh.
The results are shown in Table 1 below. In Table 1,
〔表１〕
表１より明らかなように、実施例の銅箔を負極集電体材料として用いた電池は、いずれも、初回充電時の電池容量が４００ｍＡｈを超え，かつ、サイクル寿命も４５０サイクルを超えており、高容量、長寿命の電池になっている。
なお、実施例１の未処理銅箔はエッチングを施す領域の、１μｍ以上の結晶粒が面積比で１０％以下であり、初回充電時の電池容量が４５９ｍＡｈ、サイクル寿命４７８サイクルと他の実施例に比べてその性能がやや見劣りするが実用的には優れたものとなっている。
しかし、この実施例１の未処理銅箔を熱処理した実施例３、実施例４の銅箔で作成したＬｉ電池の性能は極めて優れたものとなっている。
一方、比較例においては、初回充電時の電池容量が４２０ｍＡｈを割り込み、サイクル寿命も４００サイクルに達していない。このように、実施例で作成の銅箔を用いた負極集電体による電池に比べて比較例で作成の銅箔を用いた電池はその性能において劣ったものになっている。
As is clear from Table 1, all the batteries using the copper foil of the example as the negative electrode current collector material had a battery capacity of more than 400 mAh at the first charge and a cycle life of more than 450 cycles. High capacity, long battery life.
The untreated copper foil of Example 1 is a region where etching is performed, crystal grains of 1 μm or more are 10% or less in area ratio, the battery capacity at the time of initial charge is 459 mAh, the cycle life is 478 cycles, and other examples. The performance is slightly inferior to that of, but it is practically superior.
However, the performance of the Li battery made from the copper foils of Examples 3 and 4 obtained by heat-treating the untreated copper foil of Example 1 is extremely excellent.
On the other hand, in the comparative example, the battery capacity at the time of initial charge interrupts 420 mAh, and the cycle life does not reach 400 cycles. Thus, the battery using the copper foil prepared in the comparative example is inferior in its performance as compared with the battery using the negative electrode current collector using the copper foil prepared in the example.
以上の結果のように、本発明の銅箔を用いた電池においては、初回充電時の電池容量が大きく、充放電サイクル寿命も優れており、高性能のＬｉ電池を提供することができる。 As described above, in the battery using the copper foil of the present invention, the battery capacity at the first charge is large, the charge / discharge cycle life is excellent, and a high-performance Li battery can be provided.
Claims (5)
〔式１〕 ＬＭＰ＝（Ｔ＋２７３）（２０＋Ｌｏｇｔ）
なお、式１においてＴは温度（℃）、ｔは時間（Ｈｒ）である。 A copper foil for a lithium secondary battery electrode, characterized by subjecting an electrolytic copper foil made of granular crystals to a heat treatment at 60 ° C. or higher and an LMP value satisfying Formula 1 of 7000 or higher, followed by an etching roughening treatment Manufacturing method.
[Formula 1] LMP = (T + 273) (20 + Logt)
In Equation 1, T is temperature (° C.) and t is time (Hr).
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008210564A (en) * | 2007-02-23 | 2008-09-11 | Mitsubishi Chemicals Corp | Current collector for nonaqueous electrolyte secondary battery, electrode for nonaqueous electrolyte secondary battery and its manufactueing method, and nonaqueous electrolyte secondary battery |
| CN101685853A (en) * | 2008-09-23 | 2010-03-31 | 深圳市比克电池有限公司 | Lithium ion battery preparation method |
| WO2011125557A1 (en) * | 2010-03-31 | 2011-10-13 | Jx日鉱日石金属株式会社 | Copper foil for lithium-ion battery collector body |
| WO2012091060A1 (en) * | 2010-12-27 | 2012-07-05 | 古河電気工業株式会社 | Lithium-ion secondary battery, electrode for secondary battery, and electrolytic copper foil for secondary battery electrode |
| WO2013002273A1 (en) * | 2011-06-28 | 2013-01-03 | 古河電気工業株式会社 | Lithium ion secondary cell, current collector constituting negative electrode of secondary cell, and electrolytic copper foil constituting negative-electrode current collector |
| JP2013242973A (en) * | 2012-05-17 | 2013-12-05 | Sh Copper Products Corp | Negative electrode collector copper foil for lithium ion secondary battery, negative electrode for lithium ion secondary battery, and lithium ion secondary battery |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09306504A (en) * | 1996-05-08 | 1997-11-28 | Sony Corp | Nonaqueous electrolyte secondary battery |
| JPH10195689A (en) * | 1996-12-27 | 1998-07-28 | Fukuda Metal Foil & Powder Co Ltd | Manufacture of finely perforated metallic foil |
| JPH11273683A (en) * | 1998-03-19 | 1999-10-08 | Furukawa Electric Co Ltd:The | Copper foil for negative electrode current collector of nonaqueous solvent secondary battery and its manufacture |
| JP2001283862A (en) * | 2000-03-30 | 2001-10-12 | Sanyo Electric Co Ltd | Nonaqueous electrolyte battery |
| JP2001357855A (en) * | 2000-06-14 | 2001-12-26 | Shin Kobe Electric Mach Co Ltd | Nonaqueous electrolyte secondary battery |
| JP2002216771A (en) * | 2001-01-23 | 2002-08-02 | Sumitomo Metal Steel Products Inc | Electrolytic metal foil for secondary battery negative electrode collector and its production |
| JP2002319407A (en) * | 2001-04-23 | 2002-10-31 | Sanyo Electric Co Ltd | Lithium secondary battery electrode and lithium secondary battery |
| JP2004296386A (en) * | 2003-03-28 | 2004-10-21 | Sanyo Electric Co Ltd | Anode for lithium secondary battery and its manufacturing method |
-
2005
- 2005-01-21 JP JP2005014150A patent/JP4630072B2/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09306504A (en) * | 1996-05-08 | 1997-11-28 | Sony Corp | Nonaqueous electrolyte secondary battery |
| JPH10195689A (en) * | 1996-12-27 | 1998-07-28 | Fukuda Metal Foil & Powder Co Ltd | Manufacture of finely perforated metallic foil |
| JPH11273683A (en) * | 1998-03-19 | 1999-10-08 | Furukawa Electric Co Ltd:The | Copper foil for negative electrode current collector of nonaqueous solvent secondary battery and its manufacture |
| JP2001283862A (en) * | 2000-03-30 | 2001-10-12 | Sanyo Electric Co Ltd | Nonaqueous electrolyte battery |
| JP2001357855A (en) * | 2000-06-14 | 2001-12-26 | Shin Kobe Electric Mach Co Ltd | Nonaqueous electrolyte secondary battery |
| JP2002216771A (en) * | 2001-01-23 | 2002-08-02 | Sumitomo Metal Steel Products Inc | Electrolytic metal foil for secondary battery negative electrode collector and its production |
| JP2002319407A (en) * | 2001-04-23 | 2002-10-31 | Sanyo Electric Co Ltd | Lithium secondary battery electrode and lithium secondary battery |
| JP2004296386A (en) * | 2003-03-28 | 2004-10-21 | Sanyo Electric Co Ltd | Anode for lithium secondary battery and its manufacturing method |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008210564A (en) * | 2007-02-23 | 2008-09-11 | Mitsubishi Chemicals Corp | Current collector for nonaqueous electrolyte secondary battery, electrode for nonaqueous electrolyte secondary battery and its manufactueing method, and nonaqueous electrolyte secondary battery |
| CN101685853A (en) * | 2008-09-23 | 2010-03-31 | 深圳市比克电池有限公司 | Lithium ion battery preparation method |
| KR101422376B1 (en) | 2010-03-31 | 2014-07-22 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Copper foil for lithium-ion battery collector body |
| WO2011125557A1 (en) * | 2010-03-31 | 2011-10-13 | Jx日鉱日石金属株式会社 | Copper foil for lithium-ion battery collector body |
| JP2011216336A (en) * | 2010-03-31 | 2011-10-27 | Jx Nippon Mining & Metals Corp | Copper foil for lithium ion battery collector body |
| CN102812585A (en) * | 2010-03-31 | 2012-12-05 | Jx日矿日石金属株式会社 | Copper foil for lithium-ion battery collector body |
| WO2012091060A1 (en) * | 2010-12-27 | 2012-07-05 | 古河電気工業株式会社 | Lithium-ion secondary battery, electrode for secondary battery, and electrolytic copper foil for secondary battery electrode |
| JP2012151106A (en) * | 2010-12-27 | 2012-08-09 | Furukawa Electric Co Ltd:The | Lithium ion secondary battery, negative electrode for the battery, and electrolytic copper foil for collector of the negative electrode for the battery |
| US9603245B2 (en) | 2010-12-27 | 2017-03-21 | Furukawa Electric Co., Ltd. | Lithium-ion secondary battery, electrode for the secondary battery, and electrolytic copper foil for electrode for the secondary battery |
| CN103314474A (en) * | 2010-12-27 | 2013-09-18 | 古河电气工业株式会社 | Lithium-ion secondary battery, electrode for secondary battery, and electrolytic copper foil for secondary battery electrode |
| TWI466367B (en) * | 2010-12-27 | 2014-12-21 | Furukawa Electric Co Ltd | A lithium ion secondary battery, an electrode for the secondary battery, an electrode for an electrolytic copper foil |
| JP5158918B2 (en) * | 2011-06-28 | 2013-03-06 | 古河電気工業株式会社 | Lithium ion secondary battery, current collector constituting the negative electrode of the secondary battery, and electrolytic copper foil constituting the negative electrode current collector |
| CN103460462A (en) * | 2011-06-28 | 2013-12-18 | 古河电气工业株式会社 | Lithium ion secondary cell, current collector constituting negative electrode of secondary cell, and electrolytic copper foil constituting negative-electrode current collector |
| WO2013002273A1 (en) * | 2011-06-28 | 2013-01-03 | 古河電気工業株式会社 | Lithium ion secondary cell, current collector constituting negative electrode of secondary cell, and electrolytic copper foil constituting negative-electrode current collector |
| JP2013242973A (en) * | 2012-05-17 | 2013-12-05 | Sh Copper Products Corp | Negative electrode collector copper foil for lithium ion secondary battery, negative electrode for lithium ion secondary battery, and lithium ion secondary battery |
| CN103682256A (en) * | 2013-12-27 | 2014-03-26 | 山东精工电子科技有限公司 | Coating method for lithium titanate battery cathode piece |
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