JP2006198525A - Substrate cleaning device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a new substrate cleaning device for cleaning a substrate such as glass substrate, which is typified by a glass substrate for liquid crystal. <P>SOLUTION: The substrate cleaning device is provided with a substrate supporter for conveying the substrate with its one surface oriented upwardly, a reservoir tank positioned under the substrate and formed of a flat plate forming a flat surface directed upward with a distance D from the one surface and side plates forming side faces surrounding a liquid reserving space capable of reserving a liquid between the flat plate and the substrate and having a clearance between the top ends of the side plates and the other surface, an ultrasonic wave oscillator oscillating ultrasonic waves directed upwardly from the flat surface, a lower liquid feeder feeding a first liquid to the liquid reserving space, and an upper liquid feeder feeding a second liquid to the one surface of the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a substrate cleaning apparatus for cleaning a substrate. In particular, the present invention relates to a substrate cleaning apparatus characterized by a structure that removes impurities adhering to the substrate by sonic vibration.

There are cases where it is desired to clean the surface of a substrate such as a glass substrate to remove substances attached to the surface.
For example, the liquid crystal glass substrate is washed in the manufacturing process of the liquid crystal screen.
In order to improve the manufacturing yield of the liquid crystal screen, the surface of the substrate is cleaned in order to remove impurities from the surface.
For example, there is a method of flowing cleaning water on which an ultrasonic wave of about 750 KHz is placed on the upper surface of the substrate.
The substance attached to the surface of the substrate is removed by ultrasonic and shower cleaning.

However, the above method has the following problems.
For example, as the frequency of ultrasonic waves increases, the gas dissolved in the cleaning liquid becomes bubbles and is easily generated. A large amount of minute bubbles are generated from the surface of the diaphragm that oscillates ultrasonic waves, and attenuates the vibration energy of the ultrasonic waves. In addition, since minute bubbles are tightly attached to the surface of the diaphragm and form a reflecting surface on the surface of the diaphragm, the diaphragm may be in an idling state and the piezoelectric element may be damaged. As a countermeasure, water is supplied so that the cleaning liquid is strongly applied, or it is allowed to flow on the surface of the diaphragm. In this way, damage to the piezoelectric element can be prevented, but a larger amount of minute bubbles are generated in the flowing water, further attenuating the ultrasonic energy.

  For example, when the frequency is increased, the impact force due to vibration is reduced. Although it does not damage the surface of delicate objects to be cleaned, the cleaning power is weakened. When the size of the foreign matter to be removed is on the order of microns, a large removal energy is required per unit area required. Therefore, it is necessary to select an ultrasonic frequency that can remove foreign matters without damaging the surface of the object to be cleaned.

  For example, when a liquid carrying ultrasonic waves on the order of MHz is applied to a substrate to be transported in a spray form, the width dimension in the transport direction of the spray is about 10 mm. A sufficient cleaning effect cannot be expected. For example, even if five spray generators are arranged, the width dimension in the transport direction of the surface that receives the spray is only about 50 mm, and a sufficient cleaning effect cannot be expected.

JP 2002-159922 A JP 2001-198538 A

  The present invention has been devised in view of the above-described problems, and an object of the present invention is to provide a new substrate cleaning apparatus for cleaning a substrate such as a glass substrate represented by an increasingly larger glass substrate for liquid crystal.

  In order to achieve the above object, a substrate cleaning apparatus for cleaning a substrate according to the present invention includes a substrate support device that supports a substrate in a posture with one surface facing upward, and conveys the substrate in a predetermined conveyance direction, and a substrate below the substrate. A flat plate that forms a flat surface that is positioned and parallel to the one surface at a distance D and faces upward, and a side surface that encloses a liquid storage space capable of storing liquid between the flat surface and the other surface of the substrate are formed. And an ultrasonic wave that oscillates ultrasonic waves upward from the plane, and a storage tank having a side plate having a small gap so as not to contact each other between the upper end portion and the other surface. An oscillation device; a lower liquid supply device that supplies a first liquid to the liquid storage space; and an upper liquid supply device that supplies a second liquid to one surface of a substrate, wherein the lower liquid supply device includes: The first liquid stationed in the liquid storage space The first liquid can be supplied to the liquid storage space so that the gas in the atmosphere does not enter the liquid storage space from the gap. .

  With the configuration of the present invention, the substrate support device supports the substrate in a posture in which one surface is directed upward, and conveys the substrate in a predetermined conveyance direction, and the flat plate of the storage tank is located below the substrate and is spaced from the one surface. Forming a plane parallel and facing upward across D, the side plate of the storage tank forming a side surface surrounding a liquid storage space capable of storing liquid between the plane and the other surface of the substrate, and an upper end portion; A gap having a slight dimension is provided between the other surface and the other surface so that the ultrasonic oscillation device oscillates ultrasonic waves upward from the plane, and the upper liquid supply device is connected to one side of the substrate. The second liquid is supplied to the surface of the substrate, and the lower liquid supply device causes the first liquid stationed in the liquid storage space to always come into contact with the other surface of the substrate and overflow from the gap. Do not mix into the liquid storage space from the gap Since the first liquid is supplied to the liquid storage space, the ultrasonic wave oscillated from the flat plate reaches the other surface of the substrate using the first liquid stored in the liquid storage space as a medium, passes through the substrate, and passes through the substrate. One surface is reached, the other surface of the substrate and one surface of the substrate are vibrated, the foreign matter attached to one surface of the substrate is peeled off and washed away by the second liquid, and the foreign matter attached to the other surface of the substrate The substrate can be cleaned by peeling off and flowing with the first liquid.

  Several embodiments of the substrate cleaning apparatus according to the present invention will be described below. The present invention includes a mode in which any of the embodiments described below or two or more of them are combined.

Furthermore, in the substrate cleaning apparatus according to the embodiment of the present invention, the liquid storage space is a space having a constant cross-sectional shape extending in the vertical direction.
With the configuration of the above-described embodiment, since a certain cross section of the liquid storage space extends in the vertical direction, the ultrasonic wave oscillated from the flat plate is suppressed from being attenuated by the interference of the side plate, and the liquid storage space The first liquid stored in the substrate reaches the substrate as a medium, and foreign matters can be efficiently removed from the surface of the substrate.

Furthermore, in the substrate cleaning apparatus according to the embodiment of the present invention, an integral multiple of ¼ of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave substantially matches the distance D.
With the configuration of the above embodiment, since an integral multiple of ¼ of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave substantially matches the distance D, the ultrasonic wave oscillated from the flat plate is It is possible to mutually interfere with the reflected waves reflected on one surface of the substrate, vibrate one surface of the substrate more efficiently, and efficiently remove foreign matters from the substrate.

Furthermore, in the substrate cleaning apparatus according to the embodiment of the present invention, the sum of 1/4 of the wavelength λ and an integral multiple of 1/2 of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave is obtained. The distance D substantially coincides with the distance D.
With the configuration of the above embodiment, the sum of 1/4 of the wavelength λ and an integral multiple of 1/2 of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave substantially matches the distance D. Therefore, the ultrasonic wave oscillated from the flat plate mutually interferes with the reflected wave reflected on one surface of the substrate, vibrates one surface of the substrate more efficiently, and can effectively remove foreign matters from the substrate.

Furthermore, the substrate cleaning apparatus according to the embodiment of the present invention is made of an elastic material sandwiched between a lower end portion of the side plate and a plane of the flat plate so that the storage tank does not contact the side plate and the flat plate. It has a gap member.
According to the configuration of the above embodiment, the gap member made of an elastic material sandwiched between the lower end portion of the side plate and the plane of the flat plate prevents the storage tank from contacting the side plate and the flat plate. Therefore, the ultrasonic wave maintaining a desired vibration pattern can be oscillated from the plane, and foreign matters can be efficiently removed from the substrate.

Furthermore, in the substrate cleaning apparatus according to the embodiment of the present invention, the ultrasonic oscillator surrounds a vibrator fixed to the lower surface of the flat plate and a gas layer covering the vibrator and supports an edge of the flat plate. A cover structure and a support structure that supports the vibrator cover structure via an elastic body;
With the configuration of the above embodiment, the vibrator is fixed to the lower surface of the flat plate, the vibrator covering structure surrounds the gas layer covering the vibrator and supports the flat plate, and the support structure elastically supports the vibrator covering structure. Since it is supported through the body, the vibration energy is less attenuated, and the vibrator can oscillate an ultrasonic wave having a desired vibration pattern from a plane, and foreign substances can be efficiently removed from the substrate.

Furthermore, the substrate cleaning apparatus according to an embodiment of the present invention has an elongated shape in which the liquid storage space extends in a direction intersecting the transport direction and protrudes from both edges of the substrate, and the side plate extends in the transport direction in the side surface. A front side plate and a rear side plate facing each other, and a right side plate and a left side plate facing each other in a direction crossing the transport direction, and an upper end portion of the right side plate is a position of the other surface of the substrate The upper end of the left side plate is higher than the position of the other surface of the substrate.
With the configuration of the above embodiment, the liquid storage space has an elongated shape that extends in a direction intersecting the transport direction and protrudes from both edges of the substrate, and the front side plate and the rear side plate face the side surface in the transport direction. The right side plate and the left side plate face each other in the direction intersecting the transport direction, and the upper end portion of the right side plate is higher than the position of the other surface of the substrate, and the upper end portion of the left side plate Is higher than the position of the other surface of the substrate, the first liquid that has entered the liquid storage space contacts both edges of the other surface of the substrate, and the first liquid overflows in the transport direction from the gap, and the substrate It can be washed without leaving the edges of

Further, in the substrate cleaning apparatus according to the embodiment of the present invention, the upper liquid supply device is configured such that one of the substrates is viewed from above the linear liquid or gas continuously extending from one edge of the substrate to the other edge. A spray nozzle that sprays the front surface in the transport direction with respect to the liquid storage space on the surface of the substrate, and a second liquid supply nozzle that causes the second liquid to flow on one surface of the substrate.
According to the configuration of the above embodiment, the spray nozzle is transported more than the liquid storage space on one surface of the substrate when the linear liquid or gas continuously extending from one edge of the substrate to the other edge is viewed from above. Since the second liquid supply nozzle flows the second liquid on one surface of the substrate, the second liquid flows on one surface of the substrate in the transport direction and is sprayed on the one surface. Therefore, the liquid layer having a predetermined thickness can be maintained on one surface, and the substrate can be efficiently cleaned.

Furthermore, in the substrate cleaning apparatus according to the present invention, the first liquid is a degassed liquid.
Since the degassed liquid fills the liquid storage space, the gas dissolved in the first liquid is unlikely to become bubbles, and the ultrasonic wave oscillated from the flat plate reaches the substrate with little attenuation, so that the substrate is efficiently cleaned. it can.

As described above, another substrate cleaning apparatus according to the present invention has the following effects due to its configuration.
The substrate is transported with one surface facing upward, a flat plate that oscillates ultrasonic waves is disposed below the substrate, and a liquid storage space is formed by surrounding the other surface of the substrate and the flat plate with a side plate. Since the first liquid is supplied to the storage space, the first liquid is caused to overflow from a slight gap between the other surface of the substrate and the upper end portion of the side plate, and the second liquid is caused to flow on one surface of the substrate. The ultrasonic wave oscillated from the flat plate reaches the other surface of the substrate using the first liquid stored in the liquid storage space as a medium, passes through the substrate and reaches one surface of the substrate, and the other surface of the substrate. When one surface of the substrate is vibrated, the foreign matter adhering to the one surface of the substrate is peeled off and washed away by the second liquid, and the foreign matter attached to the other surface of the substrate is peeled off and washed away by the first liquid, Can be washed.
In addition, since a certain cross section of the liquid storage space extends in the vertical direction, the ultrasonic wave oscillated from the flat plate is suppressed from being attenuated by the interference of the side plate, and is stored in the liquid storage space. One liquid can reach the substrate as a medium, and foreign matters can be efficiently removed from the surface of the substrate.
Further, since an integral multiple of ¼ of the wavelength λ in the first liquid corresponding to the frequency substantially matches the distance D, the ultrasonic wave oscillated from the flat plate is reflected on one surface of the substrate. It is possible to effectively interfere with one of the surfaces of the substrate by efficiently interfering with the reflected waves, and to remove foreign substances from the substrate more efficiently.
In addition, since the sum of an integral multiple of 1/4 of the wavelength λ and 1/2 of the wavelength λ in the liquid corresponding to the frequency substantially matches the distance D, the ultrasonic wave oscillated from the flat plate is It can interfere with the reflected waves reflected on one surface of the substrate, vibrate one surface of the substrate more efficiently, and remove foreign matters from the substrate more efficiently.
Moreover, since the gap member made of an elastic material sandwiched between the lower end portion of the side plate and the flat surface of the flat plate prevents the side plate and the flat plate of the storage tank from contacting each other, the vibration of the flat plate is caused by the side plate. It is possible to oscillate ultrasonic waves that maintain a desired vibration pattern from the plane without being restricted, and to efficiently remove foreign substances from the substrate.
In addition, the vibrator is fixed to the lower surface of the flat plate, the vibrator covering structure surrounds the gas layer covering the vibrator and supports the edge of the flat plate, and the support structure supports the vibrator covering structure via the elastic body. Therefore, the vibrator can oscillate ultrasonic waves having a desired vibration pattern from a plane, and foreign matters can be efficiently removed from the substrate.
Further, the liquid storage space has an elongated shape that protrudes from both edges of the substrate in a direction intersecting the transport direction, the front side plate and the rear side plate face the side surface in the transport direction, and the right side plate The left side plate faces the side in the direction intersecting the transport direction, the upper end of the right side plate is higher than the position of the other surface of the substrate, and the upper end of the left side plate is the upper surface of the other surface of the substrate. Since the first liquid that has entered the liquid storage space comes into contact with the other surface of the substrate up to both edges, the first liquid overflows in the transport direction from the gap without leaving the edge of the substrate. Can be washed.
In addition, a linear liquid or gas continuously extending from one edge of the substrate to the other edge is sprayed to a position in front of the transport direction from the liquid storage space on one surface of the substrate as viewed from above,
Since the second liquid is caused to flow on one surface of the substrate, the second liquid flows on one surface of the substrate in the transport direction and is blocked by the linear liquid or gas sprayed on the one surface, and has a predetermined thickness. The liquid layer can be maintained on one surface, and the substrate can be efficiently cleaned.
Since the degassed liquid is used as the first liquid, the substrate can be efficiently cleaned.
Accordingly, a new substrate cleaning apparatus for cleaning a substrate such as a glass substrate can be provided.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

  FIG. 1 is an overall view of a substrate cleaning line according to an embodiment of the present invention. FIG. 2 is a side sectional view of the substrate cleaning apparatus according to the embodiment of the present invention. FIG. 3 is a line system diagram of the substrate cleaning apparatus according to the embodiment of the present invention. FIG. 4 is a front view of the substrate cleaning apparatus according to the embodiment of the present invention. FIG. 5 is a plan view of the substrate cleaning apparatus according to the embodiment of the present invention. FIG. 6 is an operation diagram of the substrate cleaning apparatus according to the embodiment of the present invention.

The substrate cleaning device 104 is a device for cleaning the substrate.
First, an example of the substrate cleaning line 100 in which the substrate cleaning apparatus 104 is incorporated will be described.
The substrate cleaning line 100 includes an entire receiving tank 101, a brush cleaning device 102, an ultrasonic shower device 103, a substrate cleaning device 104, and a pure water shower device 105.
The brush cleaning device 102, the ultrasonic shower device 103, the substrate cleaning device 104, and the pure water shower device 105 are sequentially arranged in the transport direction.
The substrate 10 is transported in the transport direction over the entire receiving tank 101.
The substrate 10 is cleaned by passing through the brush cleaning device 102, the ultrasonic shower device 103, the substrate cleaning device 104, and the pure water shower device 105 in this order.
The brush cleaning device 102 is a device that cleans the surface of the substrate with a brush.
The ultrasonic shower apparatus 103 is an apparatus that cleans the surface of the substrate with cleaning water on which MHz-level ultrasonic waves are placed.
The pure water shower apparatus 105 is an apparatus that cleans the surface of the substrate by applying pure water to the surface of the substrate.

  The substrate cleaning device 104 includes a substrate support device 30, a storage tank 40, an ultrasonic oscillation device 50, a lower liquid supply device 60, and an upper liquid supply device 70.

The substrate support device 30 is a device that supports the substrate 10 while maintaining a posture in which one surface 11 faces upward, and conveys the substrate 10 in a predetermined conveyance direction.
For example, the substrate support device 30 includes a conveyance roller 31, a guide roller 32, and a drive mechanism (not shown).
The conveying roller 31 is a plurality of disk-shaped members having a horizontal rotation axis and having the upper circumferential position aligned at a predetermined horizontal position. The transport roller 31 is rotated by a drive mechanism (not shown). The other surface 12 of the substrate 10 contacts the upper part of the transport roller.
The guide roller 32 is a plurality of disk-shaped members that have a vertical rotation axis and are arranged in the transport direction at a predetermined interval in a direction orthogonal to the transport direction. The predetermined interval coincides with the width dimension of the substrate 10. The circumferential portion of the guide roller 32 is in contact with the side surface of the substrate 10 in the width direction.
When the driving mechanism rotates the transport roller 31, the side portion of the substrate 10 is guided by the guide roller 32, and the substrate 10 moves in the transport direction.

The storage tank 40 is a tank that can store the first liquid 21 in contact with the other surface 12 of the substrate 10, and includes a flat plate 41, a side plate 42, and a gap member 45.
The flat plate 41 is made of a member that is positioned below the substrate 10 and forms a flat surface 43 that is parallel to the one surface 11 with a distance D and directed upward.
For example, the flat plate 41 is a metal or resin plate material having a constant quadrilateral shape that is long in a direction intersecting the transport direction.
A plurality of stud bolts 46 are welded to predetermined positions on the lower surface of the flat plate 41.
For example, a plurality of stud bolts are arranged in a staggered manner with a pitch distance slightly larger than the numerical value of the upper diameter of the vibrator 51 described later.

The side plate 42 forms a side surface 44 surrounding the liquid storage space H capable of storing a liquid between the flat surface 43 and the other surface 12 of the substrate 10, and does not contact each other between the upper end portion and the other surface 12. This is a member provided with a gap G having a slight dimension.
For example, a few dimensions are 1-2 mm.
The interval G coincides with the vertical distance between the upper end portion of the side plate 42 and the upper portion of the circumference of the conveyance roller 31.
Even if the liquid storage space H is a space having a certain cross-sectional shape extending in the vertical direction.
For example, the side plate 42 is a long member made of metal or resin having an L-shaped cross section. The L-shaped upper wall surface forms the side surface 44. The L-shaped lower part forms a flange for mounting.
The liquid storage space H may have an elongated shape that extends in a direction intersecting the transport direction and protrudes from both edges of the substrate 10.
For example, the side plate 42 includes a front side plate 42a, a rear side plate 42b, a right side plate 42c, and a left side plate 42d.
The front side plate 42a and the rear side plate 42b are L-shaped longitudinal members facing each other with the side surface 44 facing in the transport direction.
The right side plate 42c and the left side plate 42d are L-shaped long members facing each other with the side surface 44 facing in a direction intersecting the transport direction.
The front side plate 42a, the rear side plate 42b, the right side plate 42c, and the left side plate 42d connect each other and surround the liquid storage space H.
The upper end portion of the right side plate 42c may be higher than the position of the other surface of the substrate, and the upper end portion of the left side plate 42d may be higher than the position of the other surface of the substrate.

The gap member 45 is a member made of an elastic material sandwiched between the lower end portion of the side plate 42 and the periphery of the flat plate 42 so that the side plate 42 and the flat plate 41 do not contact each other.
For example, the gap member 45 is a resin plate having a predetermined thickness. For example, the gap member 45 is a rubber plate having a thickness of 5 mm.
A rubber plate is sandwiched between the periphery of the flat plate 41 and the lower portion of the L-shaped side plate 42.

The ultrasonic oscillating device 50 is a device that oscillates ultrasonic waves upward from the plane 43.
For example, the ultrasonic oscillating device 50 includes a vibrator 51, a vibrator covering structure 52, a support structure 53, and an elastic body 54.
The vibrator 51 is fixed to the lower surface of the flat plate 41. For example, the vibrator 51 has a structure in which a disk-shaped piezo element is sandwiched between a head and a backup ring. The vibrator 51 includes a terminal that can apply a voltage to the piezo element.
An internal thread is provided on the head. The female screw is screwed into the stud bolt 46 of the flat plate 41.
For example, when an alternating voltage having a predetermined frequency is applied to the terminal, the head and the flat plate vibrate at a predetermined frequency.

The vibrator covering structure 52 is a structure that supports the edge of the flat plate 41 by surrounding a gas layer that covers the vibrator 51.
For example, the vibrator covering structure 52 is a structure made of a thin plate provided so as to surround the plurality of vibrators 51 and a thin plate covering the lower part.
The thin plate provided so as to surround the periphery may have a contour shape having the same dimensions as the contour shape of the side plate 42 of the storage tank 40 as viewed from above.

The support structure 53 is a structure that supports the vibrator covering structure 52 via the elastic body 54.
For example, the support structure bag 53 includes a support bar that supports the vibrator covering structure 52 in the vertical direction, a support bar that supports the vibrator covering structure 52 in the transport direction, and a support bar that supports the vibrator cover structure 52 in a direction that intersects the transport direction.
Each support bar contacts an inner wall of a liquid receiving tank 80 described later via an elastic body 54.
For example, the elastic body 54 is a rubber block.
In this way, when an alternating voltage of the KHz order is applied to the terminal, the vibrator vibrates at a frequency of the KHz order, and most of the vibration energy becomes a sound wave. The sound wave passes through the second liquid stored in the liquid storage space H through the flat plate 41 and is emitted upward.

The lower liquid supply device 60 is a device that supplies the first liquid 21 to the liquid storage space H.
In the lower liquid supply device 60, the first liquid 21 stationed in the liquid storage space H is always in contact with the other surface 12 of the substrate 10 and overflows from the gap G, and atmospheric gas flows from the gap G to the liquid storage space H. The first liquid can be supplied to the liquid storage space H so as not to be mixed into the liquid storage space H.
For example, the lower liquid supply device 60 includes a first liquid supply nozzle 61, a first liquid line 62, an on-off valve 63, and an electromagnetic on-off valve 64.
The first liquid supply nozzle 61 is a nozzle that is provided in the storage tank 40 and can supply the first liquid from the outside to the liquid storage space H.
For example, the first liquid supply nozzle 61 is a plurality of through holes formed in the lower portion of the side plate 42. A plurality of through holes are provided at a predetermined pitch along the longitudinal direction at the corners of the L-shaped longitudinal member that is the front side plate or the rear side plate.
The 1st liquid line 62 is piping which connects the 1st liquid supply nozzle 61 and the deaeration line 91 mentioned later.
The on-off valve 63 is a valve that can adjust the opening degree provided in the middle of the first liquid line 62.
The electromagnetic on-off valve 64 is a valve that opens and closes by an electrical signal provided in the middle of the first liquid line 62.
When the opening degree of the on-off valve 63 is adjusted in advance to a desired level and the electromagnetic on-off valve 64 is opened, the liquid in the deaeration line 91 passes through the first liquid line 62 and is stored in the liquid from the first liquid supply nozzle 61. It flows into space H.

The upper liquid supply device 70 is a device that supplies the second liquid to one surface of the substrate.
For example, the upper liquid supply device 70 includes a spray nozzle 71, a second liquid supply nozzle 72, a gas line 73, an on-off valve 74, an air valve 75, a second liquid line 76, an on-off valve 77, and an electromagnetic on-off valve 78. The
The spray nozzle 71 includes a front spray nozzle 71f and a rear spray nozzle 71r.
The front spray nozzle 71f is more transported than the liquid storage space H on one surface 11 of the substrate 10 when viewed from above the linear liquid or gas continuously extending from one edge of the substrate 10 to the other edge. It is a nozzle sprayed to the position ahead.
The liquid may be the second liquid or pure water.
The front spray nozzle 71f may be a nozzle that sprays a linear liquid or gas having a predetermined angle with respect to a line perpendicular to the transport direction.

The rear spray nozzle 71r conveys the linear second liquid or gas continuously extending from one edge of the substrate 10 to the other edge more than the liquid storage space H on one surface 11 of the substrate 10 when viewed from above. It is a nozzle sprayed at a position rearward in the direction.
Here, it demonstrates that the spray nozzle 71 sprays clean gas.

The gas line 73 includes a front gas line that communicates the clean gas source and the front spray nozzle 71f, and a rear gas line that communicates the clean gas source and the rear spray nozzle 71r.
The on-off valve 74 is a valve that can adjust the opening degree provided in the middle of the gas line 73.
The air valve 75 is a valve that opens and closes by an electrical signal provided in the middle of the gas line 73.
When the opening degree of the opening / closing valve 74 is adjusted in advance to a desired level and the air valve 75 is opened, the clean gas passes through the gas line 73 and passes through one of the substrates 10 from the front blowing nozzle 71f and the rear blowing nozzle 71r. Sprayed onto the surface 11.

The second liquid supply nozzle 72 is a nozzle that allows the second liquid 22 to flow on one surface 11 of the substrate 10. The second liquid supply nozzle 72 supplies the second liquid 22 to a position where the liquid storage space H on the one surface 11 of the substrate 10 is seen from above.
The 2nd liquid line 76 is piping which connects the deaeration line 91 and the 2nd liquid supply nozzle 72 of the deaeration apparatus 90 mentioned later.
The on-off valve 77 is a valve that can adjust the opening degree provided in the middle of the second liquid line 76.
The electromagnetic on-off valve 78 is a valve that opens and closes by an electrical signal provided in the middle of the second liquid line 76.
When the opening degree of the on-off valve 77 is adjusted in advance to a desired level and the electromagnetic on-off valve 78 is opened, the liquid in the deaeration line 91 passes through the second liquid line 76 and passes through the second liquid supply nozzle 72 to the substrate 10. Flows on one of the surfaces 11.
The second liquid 22 flows from the second liquid supply nozzle 72 to the one surface 11 of the substrate 10, and is sandwiched between the gas sprayed by the front spray nozzle 71f and the gas sprayed by the rear spray nozzle 71r.

The liquid receiving tank 80 is a tank that receives the first liquid 21 overflowing from the gap G between the storage tank 40 and the other surface 12 of the substrate 10.
For example, the liquid receiving tank 80 is a container 81 having a thin plate structure that has an opening located below the storage tank 40 and is squeezed downward. The second liquid accumulated in the liquid receiving tank 80 can be discharged from a liquid outlet 82 provided in the lower part.

The deaeration device 90 is a device that degass and cleans the liquid.
For example, the deaeration device 90 includes a deaeration line 91, an electromagnetic on-off valve 92, an on-off valve 93, a vacuum decylinder 94, a strainer 95, a pump 96, a check valve 97, a pressure alarm 98, and a filter 99. .
The deaeration line 91 is a pipe that communicates the liquid outlet 82 with the first liquid line 62 and the second liquid line 76.
An electromagnetic on-off valve 92, on-off valve 93, vacuum decylinder 94, strainer 95, pump 96, check valve 97, pressure alarm 98 and filter 99 are provided in the middle of the deaeration line 91.
The electromagnetic on-off valve 92 is a valve that opens and closes with an electrical signal.
The on-off valve 93 is a valve that can adjust the opening degree.
The vacuum decylinder 94 is a cylindrical body that stores liquid inside and communicates the upper part with a vacuum line.
The strainer 95 is a piping element that removes liquid foreign substances.
The pump 96 is a mechanical element that pressurizes the liquid in the vacuum decylinder 94 and flows it to the deaeration line 91.
The check valve 97 is a piping element that prevents the backflow of liquid in the deaeration line 91.
The pressure alarm 98 is a device that detects the pressure of the deaeration line 91 and outputs an alarm signal when the set pressure is reached.
The filter 99 is a piping element that filters out liquid foreign substances that pass through the deaeration line 91.

The liquid accumulated in the liquid receiving tank 80 is adjusted to a predetermined flow rate from the liquid outlet 82, and enters the vacuum decylinder 94. Since the liquid has a negative pressure in the vacuum decylinder 84, it is dissolved in the liquid. The gas is foamed and removed.
The degassed liquid is pressurized by the pump 96, passes through the filter 99, and is sent to the lower liquid supply device 60 and the upper liquid supply device 70.

Next, the operation of the substrate cleaning apparatus 104 according to the embodiment of the present invention will be described with reference to the drawings.
FIG. 6 is an operation diagram of the substrate cleaning apparatus according to the embodiment of the present invention, and shows a state where the substrate 10 passes through the substrate cleaning apparatus 104.
The lower liquid supply device 60 supplies the first liquid 21 to the liquid storage space H of the storage tank 40.
The first liquid 21 accumulates in the liquid storage space H and overflows from the upper end of the side plate 42 in the front-rear direction along the transport direction.
The substrate 10 is supported by the substrate support device 30 and moves in the transport direction.
The side of the substrate 10 is guided by the guide roller 32 and is moved in the transport direction by the transport roller 31.
The other surface 12 of the substrate 10 is located on the storage tank 40.
The first liquid 21 accumulated in the liquid storage space H comes into contact with the other surface 12 of the substrate 10 and overflows from the gap G between the other surface 12 and the upper end portion of the side plate 42.
Since the lower liquid supply device 60 continuously supplies the first liquid to the liquid storage space H, the liquid storage space H is filled with the first liquid 21 without gas in the atmosphere being mixed into the liquid storage space H. .

An alternating voltage having a predetermined frequency is applied to the terminal of the vibrator 51.
The vibrator 51 vibrates at a predetermined frequency, and the flat plate 41 vibrates at a predetermined frequency.
A sound wave having a predetermined frequency is emitted to the liquid storage space H, and the substrate 10 is shaken at the predetermined frequency using the first liquid 21 as a medium.
Foreign matter adhering to one surface 11 and the other surface 12 of the substrate 10 is removed.
The predetermined frequency may be 5 KHz or more and 500 KHz or less.
With such a frequency, the gas dissolved in the first liquid 21 is unlikely to become bubbles. Accordingly, the attenuation of the ultrasonic wave using the first liquid 21 as a medium is small, and it efficiently propagates from the flat plate to the substrate.
The predetermined frequency may be 20 KHz.
With such a frequency, the gas dissolved in the first liquid 21 is particularly difficult to become bubbles. Therefore, the attenuation of the ultrasonic wave using the first liquid 21 as a medium is particularly small, and it efficiently propagates from the flat plate to the substrate.
An integer multiple of ¼ of the wavelength λ in the first liquid corresponding to this frequency may be substantially coincident with the distance D.
This is expressed as follows.
D = 1 / 4λ × n
In this way, the amplitude of vibration is increased on one surface 11 of the substrate 10 and the removal of foreign matter adhering to the one surface 11 is facilitated.
The frequency of the ultrasonic wave is 5 KHz or more and 500 KHz or less, and the sum of an integral multiple of 1/4 of the wavelength λ and 1/2 of the wavelength λ in the first liquid corresponding to this frequency is the distance D. You may make it substantially correspond.
This is expressed as follows.
D = 1 / 4λ + 1 / 4λ × n
In this way, the vibration amplitude is particularly large on the one surface 11 of the substrate 10, and it becomes easier to remove foreign substances adhering to the one surface 11.

The upper liquid supply device 70 supplies the second liquid 22 to the one surface 11 of the substrate 10.
Foreign matter floating from one surface 11 of the substrate 10 is caused to flow into the second liquid 22.
The second liquid 22 is caused to flow from the two liquid supply nozzle 72 to one surface 11 of the substrate 10. The second liquid 22 is pushed by the gas 23 sprayed by the front spray nozzle 71f and the rear spray nozzle 71r, accumulates on the one surface 11 of the substrate 10 with a predetermined thickness, and moves in the transport direction.
The second liquid 22 is guided by the gas 23 sprayed from the front spray nozzle 71 f and moves to the edge of the substrate 10. The second liquid 22 falls from one surface 11 of the substrate 10 and is received by the whole receiving tank 101.

The first liquid 21 and a part of the second liquid 22 are accumulated in the liquid receiving tank 80.
The liquid enters the vacuum decylinder 94 from the liquid outlet 82 through the electromagnetic opening / closing valve 92 and the opening / closing valve 93. The gas dissolved in the liquid becomes bubbles and is pulled by the vacuum pipe.
The degassed liquid passes through the on-off valve 93 and the strainer 95 and enters the pump 96.
The liquid is pressurized by the pump 96, enters the filter 99 through the check valve 97, and foreign matter is filtered.
Thereafter, the liquid is sent to the lower liquid supply device 60 or the upper liquid supply device 70.

If the substrate processing apparatus and the substrate processing method according to the above-described embodiment are used, the following effects are exhibited.
The substrate 10 is transported with one surface 11 facing upward, and the liquid 21 stored in the storage tank 40 whose bottom is closed by the flat plate 41 is brought into contact with the other surface 12 of the substrate, and the liquid 21 is continuously supplied. Since the gas is supplied to the storage tank 40 and overflows from the gap between the other surface 12 and the storage tank 40, the atmosphere gas is not mixed into the parking tank 40, and the ultrasonic wave is generated from the surface 43 of the flat plate 41. The substrate 10 vibrates and foreign matter adhering to the surface of the substrate 10 can be removed.
In addition, since the surface of the substrate 10 and the flat surface 43 of the flat plate 41 are parallel to each other by a distance D, the vibration irradiated from the flat surface 43 is efficiently transmitted to the substrate 10 and the substrate 10 can be shaken.
Further, since the liquid 22 is flowed on the one surface 11 of the substrate 10, the foreign matter removed from the one surface 11 can be flowed.
Further, since the second liquid accumulated in the liquid residence space H overflows from the gap G, the foreign matter removed from the other surface can also flow.
Further, since the frequency of the ultrasonic wave is set to 5 KHz or more and 500 KHz or less, the substrate 10 can be vibrated efficiently with little attenuation of the liquid propagating.
In addition, since the integral multiple of ¼ of the wavelength λ in the liquid corresponding to the frequency substantially coincides with the distance D, the amplitude of vibration on one surface of the substrate 10 is large, and foreign matter is removed. It can be done efficiently.
In addition, since the sum of an integral multiple of 1/4 of the wavelength λ and 1/2 of the wavelength λ in the liquid corresponding to the frequency is substantially equal to the distance D, vibration on one surface of the substrate 10 Is large, and foreign substances can be removed efficiently.
Further, the storage tank 40 is composed of a side plate 42 that surrounds the liquid storage space H, a gap member 45, and a flat plate 41 that is a bottom surface of the liquid storage space, and the gap member 45 made of an elastic material having a predetermined thickness is connected to the side plate 42. Since it is sandwiched between the flat plate 41, the side plate 42 does not vibrate, and the vibration energy of the ultrasonic wave propagating through the liquid accumulated in the liquid parking space H is difficult to attenuate.
Further, since the vibrator covering structure 52 surrounds the air layer covering the vibrator 51 fixed to the flat plate 41, most of the vibration energy of the vibration generated by the vibrator 51 is transferred from the flat surface 43 of the flat plate 41 to the reservoir 40. Radiated into the accumulated liquid, the substrate 10 can be vibrated efficiently.
Further, since the vibrator covering structure 52 is supported via the elastic body 54, the vibration energy generated by the vibrator 51 does not flow to the outside through the support structure 53, and the vibration generated by the vibrator 51. Most of the energy can be consumed by vibrating the flat plate 41.
Further, the height of the side plate 42 that forms the side surface 44 that is wider than the length in the direction intersecting the transport direction of the substrate 10 and that faces the direction intersecting the transport direction among the side surfaces surrounding the liquid stay space H. Is higher than the other surface 12 of the substrate 10, so that the liquid accumulated in the parking tank 40 contacts from one edge of the substrate 10 to the other edge, overflows in the front-rear direction along the transport direction, and is transported. The entire surface of the substrate 10 can be cleaned.
Further, since a linear gas extending from one edge of the substrate 10 to the other edge is blown to the front position and the rear position of the one surface 11 of the substrate 10 in the conveying direction, and the liquid flows between them, As a result, the position above the liquid residence space on one surface 11 of the substrate 10 can be intensively cleaned.

The present invention is not limited to the embodiments described above, and various modifications can be made without departing from the scope of the invention.
An example is provided in which a spray nozzle that blows linear gas continuously extending from one edge of a substrate to the other edge to a position in front of the liquid storage space in the transport direction when viewed from one surface of the substrate is described. However, the present invention is not limited to this, and for example, a spray nozzle for spraying a linear liquid may be provided.
Moreover, although the spray nozzle has been described in the example constituted by the front spray nozzle and the rear spray nozzle, it is not reduced to this, and the front spray nozzle may be provided only.

1 is an overall view of a substrate cleaning line according to an embodiment of the present invention. It is side surface sectional drawing of the board | substrate cleaning apparatus which concerns on embodiment of this invention. It is a line system diagram of a substrate cleaning device concerning an embodiment of the present invention. 1 is a front view of a substrate cleaning apparatus according to an embodiment of the present invention. It is a top view of the substrate cleaning device concerning the embodiment of the present invention. It is an operation view of the substrate cleaning apparatus according to the embodiment of the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Board | substrate 11 One surface 12 The other surface 21 1st liquid 22 2nd liquid 23 Gas 30 Substrate support device 31 Conveyance roller 32 Guide roller 40 Reservoir 41 Flat plate 42 Side plate 42a Front side plate 42b Rear side plate 42c Right side plate 42d Left side plate 43 Plane 44 Side 45 Gap member 46 Stud bolt 50 Ultrasonic oscillator 51 Vibrator 52 Vibrator cover structure 53 Support structure 54 Elastic body 60 Lower liquid supply device 61 First liquid supply nozzle 62 First liquid line 63 On-off valve 64 Electromagnetic on-off valve 70 Upper liquid supply device 71 Spray nozzle 71f Front spray nozzle 71f Rear spray nozzle 72 Second liquid supply nozzle 73 Gas line 74 On-off valve 75 Air valve 76 Second liquid line
77 On-off valve 78 Electromagnetic on-off valve 80 Liquid receiving tank 81 Container 82 Liquid outlet 90 Deaerator 91 Deaeration line 92 Electromagnetic on-off valve 93 On-off valve 94 Vacuum decylinder 95 Strainer 96 Pump 97 Check valve 98 Pressure alarm 99 Filter 100 Substrate cleaning line 101 Whole receiving tank 102 Brush cleaning device 103 Ultrasonic shower device 104 Substrate cleaning device 105 Pure water shower device

Claims (9)

A substrate cleaning apparatus for cleaning a substrate,
A substrate support device that supports the substrate in a posture in which one surface is directed upward and conveys the substrate in a predetermined conveyance direction;
A liquid storage space that can store liquid between the flat surface and the other surface of the substrate, which is located below the substrate and is parallel to the one surface at a distance D and forms a flat surface facing upward. A storage tank having a side plate that forms a surrounding side surface and is provided with a gap having a slight dimension so as not to contact each other between the upper end portion and the other surface;
An ultrasonic oscillator that oscillates ultrasonic waves upward from the plane;
A lower liquid supply device for supplying a first liquid to the liquid storage space;
An upper liquid supply device for supplying a second liquid to one surface of the substrate;
With
In the lower liquid supply device, the first liquid stationed in the liquid storage space always comes into contact with the other surface of the substrate and overflows from the gap, and atmospheric gas does not enter the liquid storage space from the gap. Similarly, the first liquid can be supplied to the liquid storage space.
A substrate cleaning apparatus. The liquid storage space is a space having a certain cross-sectional shape extending along the vertical direction,
The substrate cleaning apparatus according to claim 1. An integral multiple of ¼ of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave substantially matches the distance D;
The substrate cleaning apparatus according to claim 1. A sum of 1/4 of the wavelength λ and an integral multiple of 1/2 of the wavelength λ in the first liquid corresponding to the frequency of the ultrasonic wave substantially matches the distance D;
The substrate cleaning apparatus according to claim 1. The storage tank has a gap member made of an elastic material sandwiched between a lower end portion of the side plate and the flat surface of the flat plate so that the side plate and the flat plate do not come into contact with each other.
The substrate cleaning apparatus according to claim 1. The ultrasonic oscillating device surrounds the vibrator fixed to the lower surface of the flat plate, the gas layer covering the vibrator and supporting the edge of the flat plate, and the vibrator covering structure via an elastic body. A supporting structure for supporting,
The substrate cleaning apparatus according to claim 1. The liquid storage space has an elongated shape extending in a direction crossing the transport direction and protruding from both edges of the substrate,
The side plate has a front side plate and a rear side plate facing the side surface in the transport direction, a right side plate and a left side plate facing the side surface in a direction intersecting the transport direction,
The upper end of the right side plate is higher than the position of the other surface of the substrate,
The upper end of the left side plate is higher than the position of the other surface of the substrate;
The substrate cleaning apparatus according to claim 1. When the upper liquid supply device is viewed from above the linear liquid or gas continuously extending from one edge of the substrate to the other edge, it is more forward in the transport direction than the liquid storage space on one surface of the substrate. A spray nozzle for spraying to the position, and a second liquid supply nozzle for flowing the second liquid on one surface of the substrate,
The substrate cleaning apparatus according to claim 1. The first liquid is a degassed liquid;
The substrate cleaning apparatus according to claim 1.

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