JP2009061359A - Ultrasonic cleaning apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning apparatus capable of suppressing increase of a cleaning solution for a large sized glass substrate and avoiding decrease of cleaning efficiency by ultrasonic waves. <P>SOLUTION: The ultrasonic cleaning apparatus comprises an ultrasonic nozzle 10 for ultrasonic cleaning, transportation rollers 40 for transporting an object 50 to be cleaned, a cleaning solution supply nozzle 30 for supplying a cleaning solution 60, and a cleaning solution tank 20 for temporarily storing the cleaning solution 60 and the ultrasonic nozzle 10 and the cleaning solution supply nozzle 30 are set above the object 50 to be cleaned which is transported by the transportation rollers 40 and the cleaning solution tank 20 is set under the object 50 to be cleaned. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an ultrasonic cleaning apparatus, and more particularly to an ultrasonic cleaning apparatus that maximizes ultrasonic energy on both surfaces of an object to be cleaned that is covered with a cleaning liquid.

  FIG. 2 is a side view showing the structure of the cleaning device described in Patent Document 1. As shown in FIG. In FIG. 2, the substrate 1 to be cleaned is placed on the transport roller 2 and transported in the direction of the arrow indicated by A. The high-pressure nozzle 3 disposed above the surface to be cleaned 1 a of the substrate to be cleaned 1 is disposed at an angle with respect to the surface to be cleaned 1 a of the substrate 1 to be cleaned. The cleaning liquid 5 is jetted at high speed from the slit-like jet port 4 of the high-pressure nozzle 3 in the direction of the arrow indicated by B which is the direction opposite to the transport direction of the substrate 1 to be cleaned.

  An ultrasonic nozzle 7 is arranged on the back surface 1 b side of the substrate 1 to be cleaned, perpendicular to the lower surface of the substrate 1 to be cleaned. From the ultrasonic nozzle 7, the liquid 8 to which ultrasonic waves are applied is ejected in the normal direction of the back surface 1 b of the substrate 1 to be cleaned. By jetting the liquid 8 in this manner, the back surface 1b of the substrate 1 to be cleaned is cleaned, and at the same time, the particles 6 attached to the surface 1a to be cleaned are vibrated by ultrasonic waves applied to the liquid 8, Can surface. The floating particles 6 are removed from the surface of the substrate 1 to be cleaned by the high-speed flow of the cleaning liquid 5 ejected from the high-pressure nozzle 3.

  A reflective plate 9 is arranged in parallel with the substrate to be cleaned 1 above the substrate to be cleaned 1 on the surface to be cleaned 1 a side of the substrate to be cleaned 1. Further, the reflecting plate 9 is for stabilizing the film thickness of the cleaning liquid 5 on the substrate 1 to be cleaned, and for reflecting the ultrasonic wave applied to the liquid 8 ejected from the ultrasonic nozzle 7. The liquid 8 is arranged so as to be orthogonal to the extension line of the liquid 8 ejected from the ultrasonic nozzle 7. The cleaning liquid 5 ejected from the high-pressure nozzle 3 flows between the substrate to be cleaned 1 and the reflection plate 9. At this time, the spraying speed and the spraying amount of the cleaning liquid 5 sprayed from the high pressure nozzle 3 are adjusted so that the space between the substrate to be cleaned 1 and the reflection plate 9 is filled with the cleaning liquid.

However, the ultrasonic nozzle 7 is positioned below the substrate 1 to be cleaned and sprays the liquid 8 to which the ultrasonic wave is applied to the substrate 1 to be cleaned. The required flow rate of the liquid 8 is increased, leading to an increase in factory utilities. Further, since the cleaning liquid 5 is supplied by the high-pressure nozzle 3, the ultrasonic waves are drowned out and the cleaning effect is halved.
JP 2005-131602 A

  The present invention has been made to solve such a problem, and an object of the present invention is to provide an ultrasonic cleaning apparatus that suppresses an increase in the cleaning liquid and does not reduce the cleaning effect of ultrasonic waves on a large glass substrate. There is to do.

  The ultrasonic cleaning apparatus of the present invention includes an ultrasonic nozzle for ultrasonic cleaning, a transport roller for transporting an object to be cleaned, a cleaning liquid supply nozzle for supplying a cleaning liquid, and a cleaning liquid tank for temporarily storing the cleaning liquid. The sonic nozzle and the cleaning liquid supply nozzle are positioned above the object to be cleaned conveyed by the conveying roller, and the cleaning liquid tank is positioned below the object to be cleaned.

  The ultrasonic nozzle of the ultrasonic cleaning apparatus of the present invention has a transmission case having a vibrator, a radiation plate, a cooling water supply port, and a cooling water discharge port, and the inside of the transmission case is filled with cooling water. Features.

  The depth of the cleaning liquid tank of the ultrasonic cleaning apparatus of the present invention is ¼ of the ultrasonic wavelength of the ultrasonic nozzle.

  The cleaning liquid tank of the ultrasonic cleaning apparatus of the present invention has a cleaning liquid supply port at the bottom, and the cleaning liquid supplied from the cleaning liquid supply port overflows from the top after being stored in the cleaning liquid tank.

  The bottom surface of the transmission case of the ultrasonic nozzle facing the top surface of the object to be cleaned of the ultrasonic cleaning apparatus of the present invention has an upward inclined surface with respect to the traveling direction of the object to be cleaned.

  ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the ultrasonic cleaning apparatus which suppresses the increase in a washing | cleaning liquid with respect to a large sized glass substrate, and the cleaning effect by an ultrasonic wave does not fall.

  Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is an apparatus configuration diagram showing an ultrasonic cleaning apparatus according to the present invention. In FIG. 1, an ultrasonic cleaning apparatus 100 stores an ultrasonic nozzle 10 for ultrasonic cleaning, a transport roller 40 that transports an object 50 to be cleaned, a cleaning liquid supply nozzle 30 that supplies a cleaning liquid 60, and a cleaning liquid 60. And a cleaning liquid tank 20.

  The ultrasonic nozzle 10 has a transmission case 11 including a vibrator 15, a radiation plate 14, a cooling water supply port 12, and a cooling water discharge port 13. The ultrasonic nozzle 10 and the cleaning liquid supply nozzle 30 are positioned above the object to be cleaned 50 conveyed by the conveying roller 40, and the cleaning liquid tank 20 is positioned below the object to be cleaned 50. The bottom surface of the transmission case 11 of the ultrasonic nozzle 10 facing the upper surface of the object to be cleaned 50 has an inclined surface (predetermined angle α) upward with respect to the traveling direction of the object to be cleaned 50. Further, the transmission case 11 includes a cooling water supply port 12 and a cooling water discharge port 13, and the bottom surface may be glass or the same thin metal plate as the transmission case 11. The cleaning liquid tank 20 has a depth of ¼ of the ultrasonic wavelength of the ultrasonic nozzle 10, and has a cleaning liquid supply port 21. The bottom surface is made of glass in order to effectively reflect ultrasonic waves. There may be.

  When cleaning is started, the object to be cleaned 50 advances on the transport roller 40 in the transport direction. The gaps between the object to be cleaned 10 and the transmission case 11 and the gap between the object to be cleaned 10 and the cleaning liquid tank 20 have gaps that do not contact each other. Therefore, the cleaning liquid 60 supplied from the cleaning liquid supply nozzle 30 can fill this gap with a small supply amount. The cleaning liquid 60 supplied from the cleaning liquid supply port 21 once accumulates in the cleaning liquid tank 20 and then overflows from the upper part, but can similarly fill the void with a small supply amount.

  A small amount of cooling water 16 is constantly supplied from the cooling water supply port 12, fills the inside of the transmission case 11, and then is discharged or circulated from the cooling water discharge port 13. This cooling water propagates the ultrasonic waves generated by the vibrator 15 and cools the heat generated by the vibrator 15. The bottom surface of the transmission case 11 is made of a material that easily transmits ultrasonic waves such as glass. For this reason, the ultrasonic wave propagated from the vibrator 15 via the radiation plate 14 is the glass on the bottom surface of the transmission case 11, the cleaning liquid 60 supplied from the cleaning liquid supply nozzle 30, the cleaning object 50 that is a large glass substrate, the cleaning liquid. The cleaning liquid 60 supplied from the supply port 21 is propagated, reflected at the bottom of the cleaning liquid tank 20, and reflected again by the radiation plate 14 to form the standing wave 17.

  Since the depth of the cleaning liquid tank 20 is ¼ of the wavelength, the portion with the largest amplitude of the standing wave 17 is positioned on both surfaces of the object to be cleaned 50, and the maximum cleaning effect can be obtained. The particles and bubbles cleaned and removed from the upper surface of the object to be cleaned 50 are easily directed toward the direction of travel of the object to be cleaned 50 because the lower surface of the transmission case 11 has an upward inclined surface (predetermined angle α). The generation of unwashed parts due to bubbles and residues is eliminated. The particles cleaned and removed on the lower surface of the object to be cleaned 50 overflow to the outside of the cleaning liquid tank 20 together with the cleaning liquid 60 and are discharged and removed. Moreover, you may provide the height adjustment part which adjusts the height of the washing | cleaning liquid tank 20 easily. This makes it possible to readjust the position of the standing wave 17 with the maximum amplitude to the position of the surface of the object 5 to be cleaned.

  As described above, according to the present invention, in cleaning a large glass substrate, the cleaning liquid may be an amount that fills the gaps between the object to be cleaned and the transmission case and between the object to be cleaned and the cleaning liquid tank tube, and the ultrasonic standing wave. Can be easily set to the position of the surface of the object to be cleaned. For this reason, it becomes possible to provide an ultrasonic cleaning apparatus that suppresses an increase in the cleaning liquid and does not cause a decrease in the cleaning effect by ultrasonic waves.

The apparatus block diagram which shows the ultrasonic cleaning apparatus by this invention. The side view which shows the structure of the conventional washing | cleaning apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Ultrasonic nozzle 11 Transmission case 12 Cooling water supply port 13 Cooling water discharge port 14 Radiation plate 15 Vibrator 16 Cooling water 17 Standing wave 20 Cleaning liquid tank 21 Cleaning liquid supply port 30 Cleaning liquid supply nozzle 40 Conveying roller 50 Object to be cleaned 60 Cleaning liquid 100 Ultrasonic cleaning equipment

Claims (5)

An ultrasonic nozzle for ultrasonic cleaning, a transport roller for transporting an object to be cleaned, a cleaning liquid supply nozzle for supplying a cleaning liquid, and a cleaning liquid tank for temporarily storing the cleaning liquid,
The ultrasonic cleaning apparatus, wherein the ultrasonic nozzle and the cleaning liquid supply nozzle are positioned above the object to be cleaned conveyed by the conveying roller, and the cleaning liquid tank is positioned below the object to be cleaned. .   2. The ultrasonic nozzle includes a transmission case having a vibrator, a radiation plate, a cooling water supply port, and a cooling water discharge port, and the inside of the transmission case is filled with cooling water. The ultrasonic cleaning apparatus described in 1.   The ultrasonic cleaning apparatus according to claim 1, wherein a depth of the cleaning liquid tank is ¼ of an ultrasonic wavelength of the ultrasonic nozzle.   The cleaning liquid tank comprises a cleaning liquid supply port at the bottom, and the cleaning liquid supplied from the cleaning liquid supply port overflows from the top after being stored in the cleaning liquid tank. Ultrasonic cleaning device.   The ultrasonic cleaning according to claim 2, wherein a bottom surface of the transmission case of the ultrasonic nozzle facing an upper surface of the object to be cleaned has an inclined surface upward with respect to a traveling direction of the object to be cleaned. apparatus.

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