JP2006190535A5 - - Google Patents

Claims (4)

  After exposing a precursor having at least a physical development nucleus layer and a silver halide emulsion layer in this order on a substrate, while carrying the precursor, a development process and a silver halide emulsion layer removal process are performed, A processing method for forming a conductive pattern on a substrate, wherein the surface having a physical development nucleus layer and a silver halide emulsion layer is conveyed in a non-contact state at least during development processing. Method.   The development process comprises immersion development and aerial development, the total development time is 60 seconds or more, and the ratio of the immersion development time to the total development time is in the range of 0.5 to 0.9. The processing method described.   The processing method according to claim 1, wherein the developing process is performed after reversing the transport direction of the precursor. A processing apparatus used in the processing method according to claim 1, wherein the unwinding shaft holding the roll-shaped precursor, the developing tank, the aerial developing unit, and the precursor before the precursor reaches the developing tank. A reversing roller for reversing the conveying direction of the body, a water washing treatment section for removing the silver halide emulsion layer of the precursor, a rinsing section, a drying section, and a treated and dried precursor in a roll form And a means for driving and rotating the take-up shaft, from the time when the precursor enters the developer in the developer tank to the time when the aerial development ends. The processing apparatus is characterized in that the surface having the physical development nucleus layer and the silver halide emulsion layer is conveyed in a non-contact state.