JP2006173317A5 - - Google Patents

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Publication number
JP2006173317A5
JP2006173317A5 JP2004362926A JP2004362926A JP2006173317A5 JP 2006173317 A5 JP2006173317 A5 JP 2006173317A5 JP 2004362926 A JP2004362926 A JP 2004362926A JP 2004362926 A JP2004362926 A JP 2004362926A JP 2006173317 A5 JP2006173317 A5 JP 2006173317A5
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JP
Japan
Prior art keywords
light receiving
optical system
exposure apparatus
light
processed
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JP2004362926A
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Japanese (ja)
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JP4612833B2 (en
JP2006173317A (en
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Priority to JP2004362926A priority Critical patent/JP4612833B2/en
Priority claimed from JP2004362926A external-priority patent/JP4612833B2/en
Publication of JP2006173317A publication Critical patent/JP2006173317A/en
Publication of JP2006173317A5 publication Critical patent/JP2006173317A5/ja
Application granted granted Critical
Publication of JP4612833B2 publication Critical patent/JP4612833B2/en
Expired - Fee Related legal-status Critical Current
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Claims (7)

レチクルのパターンを被処理体に投影する投影光学系を備え、前記投影光学系と前記被処理体との間の少なくとも一部に供給される液体を介して前記被処理体を露光する露光装置であって、
前記投影光学系及び前記液体を通過した光を受光する受光デバイスを有する受光ユニットを備え、
前記受光ユニットは、
前記受光デバイスの受光面側に配置され、前記投影光学系及び前記液体を通過した光を透過する窓材と、
前記窓材を透過した光を透過及び反射して前記受光デバイスに導く偏向手段と、を有し、
前記偏向手段は、円錐面又は曲面を持ち、その円錐面又は曲面で前記窓材を透過した光を反射することを特徴とする露光装置。 An exposure apparatus that includes a projection optical system that projects a reticle pattern onto an object to be processed, and that exposes the object to be processed via a liquid supplied to at least a portion between the projection optical system and the object to be processed. There,
A light receiving unit that having a light receiving device for receiving the light passing through the projection optical system and the liquid,
The light receiving unit is
A window member that is disposed on the light receiving surface side of the light receiving device and transmits light that has passed through the projection optical system and the liquid ;
And transmitting and reflecting light transmitted through the front Kimadozai have a, a deflection means for directing the light receiving device,
The exposure apparatus has a conical surface or a curved surface, and reflects light transmitted through the window member by the conical surface or the curved surface . 前記円錐面又は曲面は、前記窓材を透過した光を全反射することを特徴とする請求項１記載の露光装置。 It said conical surface or a curved surface, the exposure apparatus according to claim 1, wherein that you all reflect light transmitted through the window material. レチクルのパターンを被処理体に投影する投影光学系を備え、前記投影光学系と前記被処理体との間の少なくとも一部に供給される液体を介して前記被処理体を露光する露光装置であって、
前記投影光学系及び前記液体を通過した光を受光するラインセンサを有する受光ユニットを備え、
前記受光ユニットは、
前記ラインセンサの受光面側に配置され、前記投影光学系及び前記液体を通過した光を透過する窓材を有し、
前記窓材の前記ラインセンサ側の面は、前記ラインセンサの複数の画素に対応して形成された複数の凹面を含み、
前記窓材の前記ラインセンサ側の面の前記複数の凹面以外の平坦部に、遮光膜が形成されていることを特徴とする露光装置。 An exposure apparatus that includes a projection optical system that projects a reticle pattern onto an object to be processed, and that exposes the object to be processed via a liquid supplied to at least a portion between the projection optical system and the object to be processed. There,
A light receiving unit having a line sensor for receiving the light passing through the projection optical system and the liquid;
The light receiving unit is
A window member that is disposed on the light receiving surface side of the line sensor and transmits light that has passed through the projection optical system and the liquid;
It said line sensor-side surface of the window material comprises a plurality of concave surfaces formed corresponding to the plurality of pixels of the line sensor,
An exposure apparatus , wherein a light shielding film is formed on a flat portion other than the plurality of concave surfaces of the surface of the window member on the line sensor side . 前記凹面は、円錐面又は球面であることを特徴とする請求項３記載の露光装置。 The concave surface is an exposure apparatus according to claim 3, characterized in that the conical surface or a spherical surface. 前記受光ユニットの検出結果に基づいて、前記被処理体上の光量を制御する制御部を有することを特徴とする請求項１乃至４のうちいずれか一項記載の露光装置。 Based on the detection result of the previous SL light receiving unit, the exposure apparatus according to any one of claims 1 to 4, characterized in that a control unit for controlling the amount of light on the object to be processed. 前記受光ユニットの検出結果に基づいて、前記被処理体の位置又は前記投影光学系の結像位置を制御する制御部を有することを特徴とする請求項１乃至４のうちいずれか一項記載の露光装置。 Based on the detection result of the previous SL light receiving unit, wherein the workpiece position or the projection any one of claims 1 to 4, characterized in that a control unit for controlling the imaging position of the optical system of the exposure apparatus. 請求項１乃至６のいずれか一項記載の露光装置を用いて被処理体を露光するステップと、
露光された前記被処理体を現像するステップとを有することを特徴とするデバイス製造方法。 Exposing the object to be processed using the exposure apparatus according to any one of claims 1 to 6 ;
And developing the exposed object to be processed.
JP2004362926A 2004-12-15 2004-12-15 Exposure apparatus and device manufacturing method Expired - Fee Related JP4612833B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004362926A JP4612833B2 (en) 2004-12-15 2004-12-15 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004362926A JP4612833B2 (en) 2004-12-15 2004-12-15 Exposure apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2006173317A JP2006173317A (en) 2006-06-29
JP2006173317A5 true JP2006173317A5 (en) 2008-02-07
JP4612833B2 JP4612833B2 (en) 2011-01-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004362926A Expired - Fee Related JP4612833B2 (en) 2004-12-15 2004-12-15 Exposure apparatus and device manufacturing method

Country Status (1)

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JP (1) JP4612833B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4466300B2 (en) * 2003-09-29 2010-05-26 株式会社ニコン Exposure apparatus, exposure method, device manufacturing method, and measurement apparatus
JP4513299B2 (en) * 2003-10-02 2010-07-28 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
JP4515209B2 (en) * 2003-10-02 2010-07-28 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method

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