JP2006156984A5 - - Google Patents

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Publication number
JP2006156984A5
JP2006156984A5 JP2005313837A JP2005313837A JP2006156984A5 JP 2006156984 A5 JP2006156984 A5 JP 2006156984A5 JP 2005313837 A JP2005313837 A JP 2005313837A JP 2005313837 A JP2005313837 A JP 2005313837A JP 2006156984 A5 JP2006156984 A5 JP 2006156984A5
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JP
Japan
Prior art keywords
laser
laser beam
lens
homogenizer
irradiation
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Application number
JP2005313837A
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English (en)
Japanese (ja)
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JP5116232B2 (ja
JP2006156984A (ja
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Priority to JP2005313837A priority Critical patent/JP5116232B2/ja
Priority claimed from JP2005313837A external-priority patent/JP5116232B2/ja
Publication of JP2006156984A publication Critical patent/JP2006156984A/ja
Publication of JP2006156984A5 publication Critical patent/JP2006156984A5/ja
Application granted granted Critical
Publication of JP5116232B2 publication Critical patent/JP5116232B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005313837A 2004-10-29 2005-10-28 レーザ照射装置およびレーザ照射方法 Expired - Fee Related JP5116232B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005313837A JP5116232B2 (ja) 2004-10-29 2005-10-28 レーザ照射装置およびレーザ照射方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004317057 2004-10-29
JP2004317057 2004-10-29
JP2005313837A JP5116232B2 (ja) 2004-10-29 2005-10-28 レーザ照射装置およびレーザ照射方法

Publications (3)

Publication Number Publication Date
JP2006156984A JP2006156984A (ja) 2006-06-15
JP2006156984A5 true JP2006156984A5 (cg-RX-API-DMAC7.html) 2008-11-20
JP5116232B2 JP5116232B2 (ja) 2013-01-09

Family

ID=36634820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005313837A Expired - Fee Related JP5116232B2 (ja) 2004-10-29 2005-10-28 レーザ照射装置およびレーザ照射方法

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JP (1) JP5116232B2 (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101301282B1 (ko) 2006-12-29 2013-08-27 엘지디스플레이 주식회사 비정질 실리콘 결정화용 레이저 조사 장치
KR101242094B1 (ko) * 2008-01-07 2013-03-11 가부시키가이샤 아이에이치아이 레이저 어닐링 방법 및 장치
US8014427B1 (en) 2010-05-11 2011-09-06 Ultratech, Inc. Line imaging systems and methods for laser annealing
JP5148730B2 (ja) * 2011-05-18 2013-02-20 昭和オプトロニクス株式会社 ファイバ転送レーザ光学系
CN106663391B (zh) 2013-12-02 2019-09-03 株式会社半导体能源研究所 显示装置及其制造方法
DE102022125106A1 (de) * 2022-09-29 2024-04-04 Trumpf Laser Gmbh Optische Anordnung für eine Laserbearbeitungsanlage

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156017A (ja) * 1999-11-29 2001-06-08 Semiconductor Energy Lab Co Ltd レーザー装置及びレーザー光を用いた熱処理方法並びに半導体装置の作製方法

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