JP2006156263A - Sample holder and analyzer using it - Google Patents

Sample holder and analyzer using it Download PDF

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JP2006156263A
JP2006156263A JP2004347963A JP2004347963A JP2006156263A JP 2006156263 A JP2006156263 A JP 2006156263A JP 2004347963 A JP2004347963 A JP 2004347963A JP 2004347963 A JP2004347963 A JP 2004347963A JP 2006156263 A JP2006156263 A JP 2006156263A
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sample
storage medium
information
sample holder
holder
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Shoji Tomita
将司 富田
Hiroyuki Suzuki
浩之 鈴木
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
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<P>PROBLEM TO BE SOLVED: To realize sure information transmission and easy handling, in an analyzer including SEM and TEM devices which is used in off-line inspection separated from a semiconductor fabrication line and for which transmission of information and a reasonable handling means become problematic. <P>SOLUTION: In this application for solving the above issue, sample pieces are handled based on the sample holder unit; a plurality of meshes for mounting the sample pieces thereon are allowed to be attached; an SEM and a TEM are used in common; each sample piece holder is provided with a storage medium; and specific information of the sample pieces such as processes, an ID and coordinates of a wafer and information associated therewith are stored and associated with one another. Thereby, sure information transmission from the online inspection to off-line inspection and handling are facilitated. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、同一の試料ホルダ(試料台)を複数の分析装置で使用できる試料ホルダ及び、それを使用する分析装置に係り、特にライン検査を含む半導体製造プロセスにおける半導体製造装置及び検査,加工装置に用いられる試料ホルダ、及び分析装置に関する。   The present invention relates to a sample holder in which the same sample holder (sample stage) can be used in a plurality of analyzers, and an analyzer using the sample holder, and more particularly to a semiconductor manufacturing apparatus and inspection / processing apparatus in a semiconductor manufacturing process including line inspection. The present invention relates to a sample holder and an analyzer used in the above.

半導体デバイスの高集積化に伴い、電子素子の分析や観察,評価の手段として、観察分解能が高い透過型電子顕微鏡(以下TEMと呼ぶ)や高分解能走査型電子顕微鏡(以下
SEMと呼ぶ)が用いられている。TEMおよびSEM用の試料作製方法として、例えば特許文献1記載の集束イオンビーム(以下FIBと呼ぶ)加工を利用する手段が考案されている。この手段は、試料片を貼り付けたサイドエントリ型試料ステージを試料ステージ微動手段に装填,真空容器内へ導入する。なお、サイドエントリ型試料ステージは、真空容器内を大気に曝すことなく、真空容器外からの出し入れが可能である。この後、試料片の所望の観察部位を含む領域を、数μmから十数μmの所望の大きさにFIB加工した後、探針移動機構を駆動し、探針を該当する試料片に接触させて摘出し、一旦保持後、サイドエントリ型試料ステージを導入する。サイドエントリ型試料ステージの交換後、探針移動機構の探針に保持されている試料片をTEM用試料片ホルダにデポジション膜を形成することで固着する。固着後、真空容器から引き抜き、TEM装置へ装填することでTEM観察を行う手段である。この手段においては、ダイシング装置等を用いてウェーハを割断して高分解能SEMやTEM等の観察試料を作成していた。しかし、近年、チップ当たりのコスト低減の観点から、ウェーハの大口径化が進んでおり、ウェーハ単価が高額となりウェーハ割断による破棄は非常に不経済となる。また、ウェーハ割断により検査対象以外のチップも不良となり歩留まりも悪くなる。そのため、ウェーハを割らずに欠陥箇所のみ観察,分析し、ウェーハを生産工程に戻すインラインサンプリング技術の実現が求められていた。これを実現する手段として、例えば特許文献2記載の微小試料加工観察装置が考案されている。この装置は、欠陥検査装置より得た欠陥座標へ移動し、電子ビーム光学系で所定の欠陥の観察を行う。そして、集束イオンビーム光学系を用いて、所望の観察部位を含む領域を、数μmから十数μmの所望の大きさに加工し、探針移動機構を駆動し、探針を該当する試料片に接触させて摘出し、一旦保持する。その後、サイドエントリ型試料ステージと脱着可能なカートリッジを、試料ステージを移動させることによりビーム直下に移動させる。そして、移動機構の探針に保持されている試料片をカートリッジに取り付けられてあるメッシュにデポジション膜を形成することで固着する。固着後、カートリッジ移載手段により、カートリッジステーションへ移動され、TEM装置へ装填することでTEM観察を行う手段である。この手段によりウェーハを割断することなくTEM試料の作成が行える。しかし、この手段においてもTEM観察を製造ラインに組み込んでの計測は困難であり、ラインから外れたオフライン検査となるため、試料のプロセス,固有情報(以下IDと呼ぶ),座標等、試料片の特定の情報や付随する情報の管理が難しい。TEM試料の合理的な取り扱い手段として従来、TEM試料の関連情報をコード化して試料に書き込む機能を備えた集束イオンビーム装置が特許文献3に記載されている。この手法は試料を特定する情報および試料に付随する情報を入力すると、その情報をコード化したマークに変換し、そのマークをTEM試料表面に加工する手法である。
Along with the high integration of semiconductor devices, transmission electron microscopes (hereinafter referred to as TEM) and high-resolution scanning electron microscopes (hereinafter referred to as SEM) having high observation resolution are used as means for analyzing, observing and evaluating electronic elements. It has been. As a sample preparation method for TEM and SEM, for example, means utilizing a focused ion beam (hereinafter referred to as FIB) processing described in Patent Document 1 has been devised. In this means, a side entry type sample stage with a sample piece attached is loaded into a sample stage fine movement means and introduced into a vacuum vessel. The side entry type sample stage can be taken in and out of the vacuum vessel without exposing the inside of the vacuum vessel to the atmosphere. After this, the region including the desired observation part of the sample piece is FIB processed to a desired size of several μm to several tens of μm, and then the probe moving mechanism is driven to bring the probe into contact with the corresponding sample piece. After removing and holding, a side entry type sample stage is introduced. After replacement of the side entry type sample stage, the sample piece held by the probe of the probe moving mechanism is fixed by forming a deposition film on the TEM sample piece holder. After fixing, it is a means for TEM observation by pulling out from the vacuum container and loading it into a TEM apparatus. In this means, an observation sample such as a high-resolution SEM or TEM is prepared by cleaving the wafer using a dicing apparatus or the like. However, in recent years, from the viewpoint of cost reduction per chip, the diameter of the wafer has been increased, and the unit price of the wafer becomes high, and discarding due to wafer cleaving becomes very uneconomical. In addition, the chips other than the inspection target are defective due to the wafer cleaving, and the yield is also deteriorated. Therefore, realization of an in-line sampling technique for observing and analyzing only defective portions without breaking the wafer and returning the wafer to the production process has been demanded. As means for realizing this, for example, a micro sample processing and observation apparatus described in Patent Document 2 has been devised. This apparatus moves to the defect coordinates obtained from the defect inspection apparatus, and observes a predetermined defect with an electron beam optical system. Then, using the focused ion beam optical system, a region including a desired observation site is processed into a desired size of several μm to several tens of μm, the probe moving mechanism is driven, and the probe is moved to the corresponding sample piece. To remove and hold once. After that, the side entry type sample stage and the removable cartridge are moved directly below the beam by moving the sample stage. Then, the sample piece held by the probe of the moving mechanism is fixed by forming a deposition film on the mesh attached to the cartridge. After fixing, the cartridge is transferred to the cartridge station by the cartridge transfer means and loaded into the TEM apparatus to perform TEM observation. By this means, a TEM sample can be created without cleaving the wafer. However, even with this means, it is difficult to perform measurement by incorporating TEM observation into the production line, and since it is an off-line inspection that is off the line, the sample process, specific information (hereinafter referred to as ID), coordinates, etc. It is difficult to manage specific information and accompanying information. Conventionally, Patent Document 3 discloses a focused ion beam apparatus having a function of coding related information of a TEM sample and writing it on the sample as a rational means for handling the TEM sample. In this method, when information specifying a sample and information accompanying the sample are input, the information is converted into a coded mark, and the mark is processed on the surface of the TEM sample.

特許第2774884号公報Japanese Patent No. 2774884 特開2002−365182号公報JP 2002-365182 A 特開2004−164966号公報JP 2004-164966 A

半導体製造ラインの歩留まりを向上するためには、短ターンアラウンドタイム検査・解析技術が非常に重要となる。しかし、近年半導体素子の微細化に伴い高分解能SEMや
TEMによる高分解能観察が求められており、半導体製造プロセス途中にあるウェーハをプロセスから抜き取り、そこから所望の微小領域をTEM観察用の試料として切り出し薄肉化して観察している。そのため、TEM観察を製造ラインに組み込んでの計測は困難であり、ラインから外れたオフライン検査となる。そのためウェーハのプロセス,ID,座標等の試料片の特定の情報や付随する情報の管理が難しい。また、TEM試料は、試料サイズが小さく、その取り扱いは非常に困難である。そのため、TEM試料のオンライン検査からオフライン検査への情報の伝達,合理的な取り扱い手段の開発が求められている。
In order to improve the yield of the semiconductor manufacturing line, a short turnaround time inspection / analysis technique is very important. However, with the recent miniaturization of semiconductor elements, high-resolution observation by high-resolution SEM or TEM has been demanded, and a wafer in the middle of the semiconductor manufacturing process is extracted from the process, and a desired minute region is used as a sample for TEM observation. Cut out and thinned for observation. For this reason, it is difficult to perform measurement by incorporating TEM observation into the production line, resulting in off-line inspection off the line. Therefore, it is difficult to manage the specific information of the sample piece such as the wafer process, ID, coordinates, and the accompanying information. In addition, the TEM sample has a small sample size and is very difficult to handle. For this reason, there is a demand for the transmission of information from on-line inspection of TEM samples to off-line inspection and the development of rational handling means.

本発明の目的は、複数の分析装置で使用できる共通の試料ホルダを使用しても、ウェーハのプロセス,ID,座標等の試料片の特定の情報や付随する情報を複数の分析装置にまたがって管理できる試料ホルダ及びそれを用いた分析装置を提供することにある。   The object of the present invention is to use a common sample holder that can be used by a plurality of analyzers, and to specify specific information of a sample piece such as a wafer process, ID, and coordinates, and accompanying information across a plurality of analyzers. An object of the present invention is to provide a sample holder that can be managed and an analyzer using the same.

上記目的を達成するための本発明の構成は以下の通りである。   The configuration of the present invention for achieving the above object is as follows.

少なくとも荷電粒子線加工装置,透過型荷電粒子線観察装置を含む複数の分析装置と共用可能な試料ホルダであって、該試料ホルダに保持された試料に関する、少なくとも試料が採取された座標の情報を含む試料情報を記憶する記憶媒体を備えた試料ホルダ。   A sample holder that can be used in common with a plurality of analyzers including at least a charged particle beam processing device and a transmission type charged particle beam observation device, and at least information on coordinates at which the sample is collected about the sample held in the sample holder. A sample holder comprising a storage medium for storing sample information.

特にSEM,TEM等の高倍率で試料を観察可能な分析装置に対し本発明は好適である。   In particular, the present invention is suitable for an analyzer capable of observing a sample at a high magnification such as SEM and TEM.

それら分析装置において共用(共有)可能な記憶媒体付き試料(片)ホルダは、ウェーハのプロセス,ID,座標等の試料片を特定する情報や試料片に付随する情報,解析結果,取得画像等を、試料ホルダに備えてある記憶媒体に直接記憶させることができる。記憶媒体の識別IDと、該記憶媒体に記憶された情報を紐付けて、上位コンピュータにおいて記憶することによってオフライン検査での情報管理を容易にすることができる。また、
TEMの試料片は直径約3mm程度のメッシュに取り付けられたものであり、微小で取り扱いが非常に難しいが、長さ約5cm程度の試料片ホルダ単位で管理するため、試料片の取り扱いを容易にすることができる。本発明のSEMおよびTEMと共有可能な記憶媒体付き試料片ホルダを使用することにより、SEMおよびTEMの試料片の取り扱いを容易にし、今までオフライン検査であったSEMやTEMによる解析もオンライン検査のごとく情報を整理することができる。これにより、半導体製造ラインの歩留まりを向上するための短ターンアラウンドタイム検査・解析に大きく貢献する。また、試料片ホルダに複数のメッシュを貼り付けることによってSEMおよびTEMと共有の試料片ホルダとすることができる。
A sample (piece) holder with a storage medium that can be shared (shared) in these analyzers is used to identify information such as wafer process, ID, coordinates, etc., information associated with the sample piece, analysis results, acquired images, etc. , And can be directly stored in a storage medium provided in the sample holder. Information management in the offline inspection can be facilitated by associating the identification ID of the storage medium with the information stored in the storage medium and storing it in the host computer. Also,
The TEM sample piece is attached to a mesh with a diameter of about 3 mm and is very difficult to handle. However, since it is managed in units of about 5 cm in length, it is easy to handle the sample piece. can do. By using the specimen holder with a storage medium that can be shared with the SEM and TEM of the present invention, the handling of the specimen specimen of the SEM and TEM is facilitated, and the analysis by the SEM and TEM, which has been an off-line inspection until now, can be performed on-line Information can be organized like this. This greatly contributes to the short turnaround time inspection and analysis for improving the yield of the semiconductor production line. Moreover, it can be set as a sample piece holder shared with SEM and TEM by sticking a some mesh to a sample piece holder.

本発明の試料片ホルダは、SEMとTEMに共有可能でかつオフライン検査での情報管理が容易になるため、半導体製造ラインの歩留まりを向上するための短ターンアラウンドタイム検査・解析に大きく貢献する。   The sample piece holder of the present invention can be shared between SEM and TEM and facilitates information management in off-line inspection, and thus greatly contributes to short turnaround time inspection and analysis for improving the yield of the semiconductor manufacturing line.

本発明は、同一の試料ホルダ(試料台)を複数の分析装置で使用できる試料ホルダ及び、それを使用する分析装置に適用可能である。以下の実施例では半導体試料を分析するためのTEM,SEM装置を例にして説明したが、他の分析装置、例えば、質量分析装置,オージェ電子分光装置等でも、分析する試料を共通の試料ホルダに載置して分析する分析装置であれば適用できる。試料ホルダを共用する分析装置はそれぞれ、上位コンピュータと電気的に接続され、それぞれの情報(試料ホルダに設けられた記憶媒体から読み取った情報を含む)を共有管理することが望ましい。   The present invention is applicable to a sample holder that can use the same sample holder (sample stage) in a plurality of analyzers, and an analyzer that uses the sample holder. In the following embodiments, a TEM and SEM apparatus for analyzing a semiconductor sample have been described as an example. However, in other analysis apparatuses such as a mass spectrometer and an Auger electron spectrometer, the sample to be analyzed is a common sample holder. Any analyzer that can be mounted and analyzed can be applied. It is desirable that each analysis apparatus sharing the sample holder is electrically connected to a host computer, and each piece of information (including information read from a storage medium provided in the sample holder) is shared and managed.

図1は本発明の実施形態を示す試料作成装置の上面図である。本実施例の試料作成装置は試料室1,試料交換室2,試料片ホルダ移動室3,大気試料搬送室4がある。試料室内部は真空状態に保持されており、ウェーハ5を積載し、駆動する試料ステージ6が収納されてある。試料室上部にはウェーハから試料片を取り出し、試料片ホルダへの移動を行う探針移動機構7,デポジション膜形成用デポガス源8からなる試料片分離手段、主にウェーハから試料片を切り出す集束イオンビームをウェーハに照射するイオンビーム源,イオンビーム照射系からなるイオンビーム光学系9,イオンビームの照射によって発生する二次粒子を検出する二次粒子検出器10,ウェーハ表面を観察する電子ビームを照射する電子源,電子ビーム照射系からなる電子ビーム光学系11,電子ビーム照射により発生する二次粒子を検出する二次粒子検出器10がある。試料室側面には気密遮蔽可能なゲートバルブ12を介して試料ステージにウェーハを移動するウェーハ移動機構を収納する試料交換室2が隣接する。本実施例では半導体ウェーハは試料ホルダ13に保持された状態で試料ステージに試料ホルダ13毎移動される。カセット14から試料交換室2へのウェーハの移動は大気試料搬送装置15を用いて行われる。試料交換室2には気密遮蔽可能な小型ゲートバルブ16を介して隣接して試料片ホルダ移動室3が設置してある。試料片ホルダ移動室には複数の試料片ホルダ17を収納する試料片ホルダトレイ18,試料片ホルダ
17を把持し、試料片ホルダトレイ18と試料ホルダ13間を移動し、試料片ホルダ17を試料ホルダ13へ搭載する試料片ホルダ搬送機構19を収納している。この試料片ホルダ17に記憶媒体を取り付けてあり、また、試料片ホルダトレイ18に試料片ホルダ17に取り付けてある記憶媒体を認識できる手段が取り付けられていることに本発明の特徴がある。以上の構成を取ることにより、ウェーハのプロセス,ID,座標等の試料片を特定する情報や試料片に付随する情報,解析結果,取得画像を、試料片ホルダに備えてある記憶媒体に直接記憶させる。もしくは、記憶媒体とそれらの情報を紐付けて、上位コンピュータにおいて記憶することによって、オフライン検査での試料片の取り扱いや情報管理を容易にする。これにより、今までオフライン検査であったSEMやTEMによる解析もオンライン検査のごとく情報を整理することができ、半導体製造ラインの歩留まりを向上するための短ターンアラウンドタイム検査・解析に大きく貢献する。
FIG. 1 is a top view of a sample preparation apparatus showing an embodiment of the present invention. The sample preparation apparatus of this embodiment includes a sample chamber 1, a sample exchange chamber 2, a sample piece holder moving chamber 3, and an atmospheric sample transfer chamber 4. The inside of the sample chamber is kept in a vacuum state, and a sample stage 6 on which the wafer 5 is loaded and driven is stored. In the upper part of the sample chamber, a sample piece is taken out from the wafer and moved to the sample piece holder, a sample piece separating means comprising a probe moving mechanism 7 and a deposition gas source 8 for deposition film formation, focusing mainly for cutting out the sample piece from the wafer. An ion beam source for irradiating the wafer with an ion beam, an ion beam optical system 9 comprising an ion beam irradiation system, a secondary particle detector 10 for detecting secondary particles generated by the irradiation of the ion beam, and an electron beam for observing the wafer surface , An electron beam optical system 11 comprising an electron beam irradiation system, and a secondary particle detector 10 for detecting secondary particles generated by the electron beam irradiation. Adjacent to the side surface of the sample chamber is a sample exchange chamber 2 that houses a wafer moving mechanism for moving the wafer to the sample stage via a gate valve 12 that can be hermetically shielded. In this embodiment, the semiconductor wafer is moved by the sample holder 13 to the sample stage while being held by the sample holder 13. The movement of the wafer from the cassette 14 to the sample exchange chamber 2 is performed using an air sample transfer device 15. A sample piece holder moving chamber 3 is installed adjacent to the sample exchange chamber 2 via a small gate valve 16 capable of hermetically shielding. The sample piece holder moving chamber holds the sample piece holder tray 18 for storing a plurality of sample piece holders 17 and the sample piece holder 17, moves between the sample piece holder tray 18 and the sample holder 13, and moves the sample piece holder 17 to the sample. A sample piece holder transport mechanism 19 to be mounted on the holder 13 is accommodated. The present invention is characterized in that a storage medium is attached to the sample piece holder 17 and a means for recognizing the storage medium attached to the sample piece holder 17 is attached to the sample piece holder tray 18. By adopting the above configuration, information for specifying the sample piece such as wafer process, ID, coordinates, etc., information associated with the sample piece, analysis results, and acquired image are directly stored in the storage medium provided in the sample piece holder. Let Alternatively, the storage medium and the information thereof are associated with each other and stored in the host computer, thereby facilitating the handling and information management of the sample piece in the off-line inspection. As a result, the analysis by SEM or TEM, which has been an off-line inspection until now, can organize information as in the on-line inspection, and greatly contributes to the short turnaround time inspection / analysis for improving the yield of the semiconductor manufacturing line.

図2は本発明のSEMとTEMに共有可能で関連情報記憶媒体を有する試料片ホルダ
17の実施形態の一例を示す図である。試料片を取り付けるメッシュ20は、メッシュオサエ21と試料片ホルダ17で挟み込むことによって保持してある。メッシュオサエ21は勾配面を持ち、その面を弾性支持されたメッシュオサエ21と同じ勾配面を持ったスライダ22によってメッシュオサエ21は押し付けられ、メッシュ20を保持している。試料片ホルダ17には、記憶媒体としてICチップ23を備え付けることによって、例えば、ウェーハのプロセス,ID,座標等の試料片を特定する情報や試料片に付随する情報,解析結果,取得画像を記憶させる。もしくは、記憶媒体とそれらの情報を紐付けて、上位コンピュータにおいて記憶することによって、オフライン検査での試料片の取り扱いや情報管理を容易にする。また、本発明は真空中で使用するため、各部材は放出ガス量が少ない部材を用いる。さらに、各部材が帯電及び磁化してしまうと、装置の仕様に悪影響を及ぼすので帯電及び磁化しにくい材料を用いるか、帯電処理,脱磁処理等を行うことが望ましい。
FIG. 2 is a diagram showing an example of an embodiment of the sample piece holder 17 having a related information storage medium that can be shared by the SEM and TEM of the present invention. The mesh 20 to which the sample piece is attached is held by being sandwiched between the mesh spring 21 and the sample piece holder 17. The mesh leather 21 has a slope surface, and the mesh leather 21 is pressed by a slider 22 having the same slope surface as the mesh leather 21 elastically supported on the surface, thereby holding the mesh 20. By providing an IC chip 23 as a storage medium, the sample piece holder 17 stores, for example, information for specifying the sample piece such as a wafer process, ID, coordinates, information associated with the sample piece, analysis result, and acquired image. Let Alternatively, the storage medium and the information thereof are associated with each other and stored in the host computer, thereby facilitating the handling and information management of the sample piece in the off-line inspection. Moreover, since this invention is used in a vacuum, each member uses a member with a small amount of released gas. Furthermore, if each member is charged and magnetized, it adversely affects the specifications of the apparatus. Therefore, it is desirable to use a material that is difficult to be charged and magnetized, or to perform a charging process, a demagnetizing process, or the like.

図3は本発明の実施形態を示す図である。尚、図2の実施形態と異なるのは記憶媒体のみであり、他の点については図2の実施形態と同様であるため説明は省略する。図3の実施形態の試料片ホルダには、記憶媒体の例としてICタグ24を備え付けることによって本発明を実施した例である。   FIG. 3 is a diagram showing an embodiment of the present invention. The only difference from the embodiment of FIG. 2 is the storage medium, and the other points are the same as in the embodiment of FIG. The sample piece holder of the embodiment of FIG. 3 is an example in which the present invention is implemented by providing an IC tag 24 as an example of a storage medium.

図4は本発明の実施形態を示す図である。尚、図2の実施形態と異なるのは記憶媒体のみであり、他の点については図2の実施形態と同様であるため説明は省略する。図4の実施形態の試料片ホルダには、記憶媒体の例として磁気記憶装置25を備え付けることによって本発明を実施した例である。   FIG. 4 is a diagram showing an embodiment of the present invention. The only difference from the embodiment of FIG. 2 is the storage medium, and the other points are the same as in the embodiment of FIG. The sample piece holder of the embodiment of FIG. 4 is an example in which the present invention is implemented by providing a magnetic storage device 25 as an example of a storage medium.

図5は本発明の実施形態を示す図である。尚、図2の実施形態と異なるのは記憶媒体のみであり、他の点については図2の実施形態と同様であるため説明は省略する。図5の実施形態の試料片ホルダには、記憶媒体の例としてバーコード26を備え付けることによって本発明を実施した例である。この場合バーコード26に記憶することはできないので、半導体製造工場の上位コンピュータにおいてこのバーコード26とウェーハのプロセス,ID,座標等の試料片を特定する情報や試料片に付随する情報,解析結果,取得画像を紐付けて記憶させることにより課題を解決することができる。   FIG. 5 is a diagram showing an embodiment of the present invention. The only difference from the embodiment of FIG. 2 is the storage medium, and the other points are the same as in the embodiment of FIG. The sample piece holder of the embodiment of FIG. 5 is an example in which the present invention is implemented by providing a barcode 26 as an example of a storage medium. In this case, since it cannot be stored in the barcode 26, information identifying the sample piece such as the barcode 26 and wafer process, ID, coordinates and the like, information associated with the sample piece, and analysis result in the host computer of the semiconductor manufacturing factory. The problem can be solved by associating and storing the acquired images.

図6は図1で示した本発明の実施形態の中で使用される試料片ホルダトレイ18を示したものである。試料片ホルダトレイ18には複数の試料片ホルダ17が収納可能で、試料片ホルダ17に備え付けてある記憶媒体認識手段27を備え付けてある。この構成をとることにより、試料片ホルダを装置から排出したときに、試料片に必要な情報を紐付けることができる。同様に、試料片ホルダトレイ18に備え付けてある記憶媒体認識手段27をTEMやSEMに備え付けることにより、装置に試料片を入れることなく、試料片の情報を取得でき、後戻り作業なく確実に試料片の検査が行える。また、試料片の関連する情報を参照しながらの検査が可能になり、検査,解析の効率も向上する。   FIG. 6 shows a sample piece holder tray 18 used in the embodiment of the present invention shown in FIG. A plurality of sample piece holders 17 can be stored in the sample piece holder tray 18, and storage medium recognition means 27 provided for the sample piece holder 17 is provided. By adopting this configuration, necessary information can be associated with the sample piece when the sample piece holder is discharged from the apparatus. Similarly, by attaching the storage medium recognition means 27 provided in the sample piece holder tray 18 to the TEM or SEM, information on the sample piece can be acquired without putting the sample piece into the apparatus, and the sample piece can be reliably obtained without returning work. Can be inspected. In addition, inspection can be performed while referring to related information on the sample piece, and the efficiency of inspection and analysis is improved.

本発明が実施される半導体検査解析装置の例の上面図。1 is a top view of an example of a semiconductor inspection / analysis apparatus in which the present invention is implemented. 本発明の試料片ホルダの構成図。The block diagram of the sample piece holder of this invention. 同じく他の実施例となる試料片ホルダの構成図。The block diagram of the sample piece holder which becomes another Example similarly. 同じく他の実施例となる試料片ホルダの構成図。The block diagram of the sample piece holder which becomes another Example similarly. 同じく他の実施例となる試料片ホルダの構成図。The block diagram of the sample piece holder which becomes another Example similarly. 図1の半導体検査解析装置の試料片ホルダトレイの構成図。The block diagram of the sample piece holder tray of the semiconductor test | inspection analyzer of FIG.

符号の説明Explanation of symbols

1…試料室、2…試料交換室、3…試料片ホルダ移動室、4…大気試料搬送室、5…試料、6…試料ステージ、7…探針移動機構、8…デポジション膜形成用デポガス源、9…イオンビーム光学系、10…二次粒子検出器、11…電子ビーム光学系、12…ゲートバルブ、13…試料ホルダ、14…カセット、15…大気試料搬送装置、16…小型ゲートバルブ、17…試料片ホルダ、18…試料片ホルダトレイ、19…試料片ホルダ搬送機構、20…メッシュ、21…メッシュオサエ、22…スライダ、23…ICチップ、24…ICタグ、25…磁気記憶装置、26…バーコード、27…記憶媒体認識手段。   DESCRIPTION OF SYMBOLS 1 ... Sample chamber, 2 ... Sample exchange chamber, 3 ... Sample piece holder moving chamber, 4 ... Air | atmosphere sample conveyance chamber, 5 ... Sample, 6 ... Sample stage, 7 ... Probe moving mechanism, 8 ... Deposition gas for deposition film formation Source: 9 ... Ion beam optical system, 10 ... Secondary particle detector, 11 ... Electron beam optical system, 12 ... Gate valve, 13 ... Sample holder, 14 ... Cassette, 15 ... Air sample transport device, 16 ... Small gate valve , 17 ... Sample piece holder, 18 ... Sample piece holder tray, 19 ... Sample piece holder transport mechanism, 20 ... Mesh, 21 ... Mesh fly, 22 ... Slider, 23 ... IC chip, 24 ... IC tag, 25 ... Magnetic storage device , 26 ... Bar code, 27 ... Storage medium recognition means.

Claims (6)

少なくとも荷電粒子線加工装置,透過型荷電粒子線観察装置を含む複数の分析装置と共用可能な試料ホルダであって、
該試料ホルダに保持された試料に関する、少なくとも試料が採取された座標の情報を含む試料情報を記憶する記憶媒体を備えたことを特徴とする試料ホルダ。
A sample holder that can be shared with a plurality of analyzers including at least a charged particle beam processing device and a transmission type charged particle beam observation device,
A sample holder comprising a storage medium for storing sample information about the sample held by the sample holder, including at least information of coordinates at which the sample is collected.
請求項1に記載の試料ホルダにおいて、
前記試料情報は更に、試料のプロセス,ウェーハの識別情報,チップの識別情報のいずれかを含むことを特徴とする試料ホルダ。
The sample holder according to claim 1,
The sample holder further includes any one of a sample process, wafer identification information, and chip identification information.
請求項1記載の試料ホルダにおいて、
前記記憶媒体が半導体記憶媒体であることを特徴とする試料ホルダ。
The sample holder according to claim 1, wherein
A sample holder, wherein the storage medium is a semiconductor storage medium.
請求項1記載の試料ホルダにおいて、
前記記憶媒体が磁気記憶媒体であることを特徴とする試料片ホルダ。
The sample holder according to claim 1, wherein
The sample piece holder, wherein the storage medium is a magnetic storage medium.
請求項1記載の試料ホルダにおいて、
前記記憶媒体が光学式読み取り装置で印刷パターンを読み込む記録媒体であることを特徴とする試料ホルダ。
The sample holder according to claim 1, wherein
A sample holder, wherein the storage medium is a recording medium for reading a print pattern with an optical reader.
請求項1〜5のいずれかに記載の試料ホルダの記憶媒体に記録された情報を読み込む記憶媒体読み取り手段を、試料ホルダトレイに備えたことを特徴とする分析装置。
6. An analyzer comprising a sample holder tray provided with storage medium reading means for reading information recorded on the storage medium of the sample holder according to claim 1.
JP2004347963A 2004-12-01 2004-12-01 Sample holder and analyzer using it Pending JP2006156263A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007324128A (en) * 2006-05-29 2007-12-13 Fei Co Sample carrier, and sample holder
US7834315B2 (en) 2007-04-23 2010-11-16 Omniprobe, Inc. Method for STEM sample inspection in a charged particle beam instrument
CN102798563A (en) * 2012-09-04 2012-11-28 北京汽车股份有限公司 Electrochemical sample clamp
CN105223215A (en) * 2015-11-16 2016-01-06 南京大学 A kind of gas electronic diffraction instrument installed in environment transmission electron microscope
CN106783494A (en) * 2016-12-06 2017-05-31 北京工业大学 A kind of transmission electron microscope sample bar vacuum storage and test device
CN107315020A (en) * 2017-07-31 2017-11-03 中国科学院宁波材料技术与工程研究所 A kind of chip fixing structure in situ of example of transmission electron microscope bar
US11268915B2 (en) 2018-05-15 2022-03-08 Hitachi High-Tech Corporation Charged particle beam device, method for processing sample, and observation method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007324128A (en) * 2006-05-29 2007-12-13 Fei Co Sample carrier, and sample holder
US7834315B2 (en) 2007-04-23 2010-11-16 Omniprobe, Inc. Method for STEM sample inspection in a charged particle beam instrument
USRE46350E1 (en) 2007-04-23 2017-03-28 Omniprobe, Inc. Method for stem sample inspection in a charged particle beam instrument
CN102798563A (en) * 2012-09-04 2012-11-28 北京汽车股份有限公司 Electrochemical sample clamp
CN105223215A (en) * 2015-11-16 2016-01-06 南京大学 A kind of gas electronic diffraction instrument installed in environment transmission electron microscope
CN106783494A (en) * 2016-12-06 2017-05-31 北京工业大学 A kind of transmission electron microscope sample bar vacuum storage and test device
CN107315020A (en) * 2017-07-31 2017-11-03 中国科学院宁波材料技术与工程研究所 A kind of chip fixing structure in situ of example of transmission electron microscope bar
CN107315020B (en) * 2017-07-31 2023-08-04 中国科学院宁波材料技术与工程研究所 In-situ chip fixing structure of transmission electron microscope sample rod
US11268915B2 (en) 2018-05-15 2022-03-08 Hitachi High-Tech Corporation Charged particle beam device, method for processing sample, and observation method

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