JP2006137903A5 - - Google Patents
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- JP2006137903A5 JP2006137903A5 JP2004330432A JP2004330432A JP2006137903A5 JP 2006137903 A5 JP2006137903 A5 JP 2006137903A5 JP 2004330432 A JP2004330432 A JP 2004330432A JP 2004330432 A JP2004330432 A JP 2004330432A JP 2006137903 A5 JP2006137903 A5 JP 2006137903A5
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すなわち、本発明は、ビフェニルテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、ジフェニルスルフィドテトラカルボン酸二無水物、ペリレンテトラカルボン酸二無水物、ナフタレンテトラカルボン酸二無水物、無水フタル酸、無水トリメリット酸、スチレン−無水マレイン酸共重合樹脂、及びｐ−フェニルスチレン−無水マレイン酸共重合樹脂から選ばれる少なくとも１種類の酸無水物基を有する化合物（Ａ）と、
酸無水物基に反応しうる官能基と３つ以上の不飽和二重結合とを有する化合物（Ｂ）と、を反応させてなる官能基を有する化合物（Ｃ）にさらに、
前記化合物（Ｃ）の有する官能基に反応しうる官能基を有する化合物（Ｇ）と反応させてなる化合物（Ｄ）を含んでなる感光性組成物であり、
感光後の屈折率が、１．５３以上である感光性組成物に関する。
That is, the present invention relates to biphenyltetracarboxylic dianhydride, diphenylsulfonetetracarboxylic dianhydride, diphenylsulfidetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, phthalic anhydride A compound (A) having at least one acid anhydride group selected from acid, trimellitic anhydride, styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin ;
Compound (C) having a functional group obtained by reacting a compound (B) having a functional group capable of reacting with an acid anhydride group and three or more unsaturated double bonds,
A photosensitive composition comprising a compound (D) obtained by reacting with a compound (G) having a functional group capable of reacting with the functional group of the compound (C);
The present invention relates to a photosensitive composition having a refractive index after exposure of 1.53 or more.
また本発明は、ビフェニルテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、ジフェニルスルフィドテトラカルボン酸二無水物、ペリレンテトラカルボン酸二無水物、ナフタレンテトラカルボン酸二無水物、無水フタル酸、無水トリメリット酸、スチレン−無水マレイン酸共重合樹脂、及びｐ−フェニルスチレン−無水マレイン酸共重合樹脂から選ばれる少なくとも１種類の酸無水物基を有する化合物（Ａ）と、
酸無水物基に反応しうる官能基と３つ以上の不飽和二重結合とを有する化合物（Ｂ）と、を反応させてなる官能基を有する化合物（Ｃ）にさらに、
前記化合物（Ｃ）の有する官能基に反応しうる官能基を有する化合物（Ｇ）と反応させることを特徴とする感光性組成物の製造方法に関する。
The present invention also includes biphenyl tetracarboxylic dianhydride, diphenyl sulfone tetracarboxylic dianhydride, diphenyl sulfide tetracarboxylic dianhydride, perylene tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride, phthalic anhydride. , Compound (A) having at least one acid anhydride group selected from trimellitic anhydride, styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin ;
Compound (C) having a functional group obtained by reacting a compound (B) having a functional group capable of reacting with an acid anhydride group and three or more unsaturated double bonds,
The present invention relates to a method for producing a photosensitive composition, characterized by reacting with a compound (G) having a functional group capable of reacting with a functional group of the compound (C).
＜官能基を有する化合物（Ｃ）＞
化合物（Ｃ）は、ビフェニルテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、ジフェニルスルフィドテトラカルボン酸二無水物、ペリレンテトラカルボン酸二無水物、ナフタレンテトラカルボン酸二無水物、無水フタル酸、無水トリメリット酸、スチレン−無水マレイン酸共重合樹脂、及びｐ−フェニルスチレン−無水マレイン酸共重合樹脂から選ばれる少なくとも１種類の酸無水物基を有する化合物（Ａ）の酸無水物基と、化合物（Ｂ）の酸無水物基と反応しうる官能基とを反応させたものである。化合物（Ｃ）はカルボキシル基を有するが、化合物（Ｂ）の種類によっては、化合物（Ｃ）は、さらに水酸基も有する場合がある。化合物（Ｃ）と反応する化合物（Ｄ）は、カルボキシル基と水酸基のいずれか、あるいは両方と反応しうる。そのため、本発明では、官能基を有する化合物（Ｃ）と称する。
<Compound having a government functional group (C)>
Compound (C) includes biphenyl tetracarboxylic dianhydride, diphenyl sulfone tetracarboxylic dianhydride, diphenyl sulfide tetracarboxylic dianhydride, perylene tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride, phthalic anhydride Acid anhydride group of compound (A) having at least one acid anhydride group selected from acid, trimellitic anhydride, styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin And a functional group capable of reacting with the acid anhydride group of the compound (B). Although the compound (C) has a carboxyl group, the compound (C) may further have a hydroxyl group depending on the type of the compound (B). The compound (D) that reacts with the compound (C) can react with either or both of a carboxyl group and a hydroxyl group. Therefore, in this invention, it calls the compound (C) which has a functional group.
＜酸無水物基を有する化合物（Ａ）＞
化合物（Ａ）は、ビフェニルテトラカルボン酸二無水物、ジフェニルスルホンテトラカルボン酸二無水物、ジフェニルスルフィドテトラカルボン酸二無水物、ペリレンテトラカルボン酸二無水物、ナフタレンテトラカルボン酸二無水物、無水フタル酸、無水トリメリット酸、スチレン−無水マレイン酸共重合樹脂、及びｐ−フェニルスチレン−無水マレイン酸共重合樹脂である。これらは２種以上の混合物であってもよい。
<Compound (A) having an acid anhydride group>
Compound (A) includes biphenyl tetracarboxylic dianhydride, diphenyl sulfone tetracarboxylic dianhydride, diphenyl sulfide tetracarboxylic dianhydride, perylene tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride, phthalic anhydride Acid, trimellitic anhydride, styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin . These may be a mixture of two or more.
本発明において、これらの化合物を単独使用または併用で使用できる。また、反応中に脱水反応を経由して無水物と成りうるポリカルボン酸、ポリカルボン酸エステル、ポリカルボン酸ハーフエステルなどは、本発明で言う２つ以上のカルボン酸無水物基を有する化合物に含まれる。 In the present invention, these compounds can be used alone or in combination. In addition, polycarboxylic acid, polycarboxylic acid ester, polycarboxylic acid half ester and the like that can be converted into an anhydride via a dehydration reaction during the reaction are compounds having two or more carboxylic acid anhydride groups referred to in the present invention. included.
なかでも、ビフェニル骨格を有するビフェニルテトラカルボン酸二無水物、ｐ−フェニルスチレン−無水マレイン酸共重合樹脂などは、本発明において、ビフェニル骨格を分子内に効率よく導入できる化合物であり、特に好ましい。 In kana, biphenyltetracarboxylic acid dianhydride having a biphenyl skeleton, p- phenyl styrene - such as maleic acid copolymer resin in the present invention is a compound capable of introducing efficiently a biphenyl skeleton in the molecule, particularly preferred .
表１
Claims (8)
酸無水物基に反応しうる官能基と３つ以上の不飽和二重結合とを有する化合物（Ｂ）と、を反応させてなる官能基を有する化合物（Ｃ）にさらに、
前記化合物（Ｃ）の有する官能基に反応しうる官能基を有する化合物（Ｇ）と反応させてなる化合物（Ｄ）を含んでなる感光性組成物であり、
感光後の屈折率が、１．５３以上である感光性組成物。 Biphenyltetracarboxylic dianhydride, diphenylsulfonetetracarboxylic dianhydride, diphenylsulfidetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, phthalic anhydride, trimellitic anhydride A compound (A) having at least one acid anhydride group selected from styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin ;
Compound (C) having a functional group obtained by reacting a compound (B) having a functional group capable of reacting with an acid anhydride group and three or more unsaturated double bonds,
A photosensitive composition comprising a compound (D) obtained by reacting with a compound (G) having a functional group capable of reacting with the functional group of the compound (C);
A photosensitive composition having a refractive index after exposure of 1.53 or more.
酸無水物基に反応しうる官能基と３つ以上の不飽和二重結合とを有する化合物（Ｂ）と、を反応させてなる官能基を有する化合物（Ｃ）にさらに、
前記化合物（Ｃ）の有する官能基に反応しうる官能基を有する化合物（Ｇ）と反応させることを特徴とする感光性組成物の製造方法。 Biphenyltetracarboxylic dianhydride, diphenylsulfonetetracarboxylic dianhydride, diphenylsulfidetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, phthalic anhydride, trimellitic anhydride A compound (A) having at least one acid anhydride group selected from styrene-maleic anhydride copolymer resin, and p-phenylstyrene-maleic anhydride copolymer resin ;
Compound (C) having a functional group obtained by reacting a compound (B) having a functional group capable of reacting with an acid anhydride group and three or more unsaturated double bonds,
A method for producing a photosensitive composition comprising reacting with a compound (G) having a functional group capable of reacting with a functional group of the compound (C).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004330432A JP4934957B2 (en) | 2004-11-15 | 2004-11-15 | Method for producing photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004330432A JP4934957B2 (en) | 2004-11-15 | 2004-11-15 | Method for producing photosensitive composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006137903A JP2006137903A (en) | 2006-06-01 |
| JP2006137903A5 true JP2006137903A5 (en) | 2007-08-09 |
| JP4934957B2 JP4934957B2 (en) | 2012-05-23 |
Family
ID=36618916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004330432A Active JP4934957B2 (en) | 2004-11-15 | 2004-11-15 | Method for producing photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4934957B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007169380A (en) * | 2005-12-20 | 2007-07-05 | Toyo Ink Mfg Co Ltd | Curable high-refractive index material and laminated body from the curable high-refractive index material |
| JP6412813B2 (en) * | 2015-02-25 | 2018-10-24 | 富士フイルム株式会社 | Polarizing plate protective film, polarizing plate, image display device, and manufacturing method of polarizing plate protective film |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0570528A (en) * | 1991-09-11 | 1993-03-23 | Nippon Steel Corp | Alkali-soluble photopolymer and alkali-developable photopolymer composition containing same |
| JPH08123027A (en) * | 1994-10-18 | 1996-05-17 | Toagosei Co Ltd | Photo-soldering resist |
| JP2000063327A (en) * | 1998-08-17 | 2000-02-29 | Toyo Ink Mfg Co Ltd | Production of reactive hemiacetalate, reactive hemiacetalate produced thereby and its hardened material |
| JP2000143735A (en) * | 1998-08-31 | 2000-05-26 | Toyo Ink Mfg Co Ltd | Curing composition, formation of cured film using the same and cured product |
| US6399672B1 (en) * | 1999-06-02 | 2002-06-04 | Sartomer Technologies Co., Inc. | Oil soluble metal-containing compounds, compositions and methods |
| JP2005298665A (en) * | 2004-04-12 | 2005-10-27 | Toyo Ink Mfg Co Ltd | High refractive index material |
-
2004
- 2004-11-15 JP JP2004330432A patent/JP4934957B2/en active Active
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