JP2006134927A - Method of forming level difference circuit and its wiring board - Google Patents

Method of forming level difference circuit and its wiring board Download PDF

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JP2006134927A
JP2006134927A JP2004319196A JP2004319196A JP2006134927A JP 2006134927 A JP2006134927 A JP 2006134927A JP 2004319196 A JP2004319196 A JP 2004319196A JP 2004319196 A JP2004319196 A JP 2004319196A JP 2006134927 A JP2006134927 A JP 2006134927A
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copper
plating
conductor
wiring board
thickness
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Ryoji Sugiura
良治 杉浦
Hideki Yoshida
英樹 吉田
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Lincstech Circuit Co Ltd
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Hitachi AIC Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that a request is toned up which needs a printed circuit board having three dimensional level difference circuit into a loading area in which component elements of the printed circuit board is carried. <P>SOLUTION: A plurality of stages of thickness conductors (level difference circuit) with different thicknesses formed of "a partial solder of different species metals other than a panel copper plating and copper" are superposed partially to the flat identical substrate side in a small area in which the component elements of a wiring board is carried, and a method are provided for forming three-dimensional level difference circuit used as stepped and its wiring board. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、段差回路をプリント配線基板に形成するあたり、平坦な同一基材面にパネル銅めっきと、部分的にめっきをするパターンめっきとで導電回路を形成するための段差回路形成方法および配線基板に関するもので、特に三次元的な立体回路を有するプリント配線基板の所定箇所に操作機能や接点機能を有する回路形成をするプリント配線基板およびその段差回路形成方法に関するものである。   The present invention relates to a step circuit forming method and a wiring for forming a conductive circuit by panel copper plating and pattern plating for partially plating on the same flat substrate surface when forming a step circuit on a printed wiring board. More particularly, the present invention relates to a printed wiring board for forming a circuit having an operation function and a contact function at a predetermined position of a printed wiring board having a three-dimensional solid circuit, and a stepped circuit forming method thereof.

従来はプリント配線基板に段差回路をを形成する場合、平坦な同一基材面の回路導体の厚みは、ほぼ均一に形成し導体幅を変化させる設計値とすることにより平面的な導電回路とするものである。
また、多層プリント配線基板では、各層の回路導体の厚みを変えることはあるが同一層内の回路導体の厚みを三次元的な立体回路とすることはない。例えば、同一基材面や同一層内に同一構成からなる回路導体の厚みを故意に5μm以上異なる設計値として接点エリアや操作エリアに段差回路を回路形成するプリント配線基板の要求がなかった。
Conventionally, when a step circuit is formed on a printed wiring board, a flat conductive circuit is formed by setting the thickness of the circuit conductor on the same flat base material surface to be substantially uniform and changing the conductor width. Is.
In the multilayer printed wiring board, the thickness of the circuit conductor in each layer may be changed, but the thickness of the circuit conductor in the same layer is not changed to a three-dimensional solid circuit. For example, there has been no demand for a printed wiring board for forming a stepped circuit in a contact area or an operation area by intentionally changing the thickness of circuit conductors having the same configuration on the same base surface or in the same layer by 5 μm or more.

三次元的な段差回路を形成する回路形成方法として合成樹脂成形品の表面に段差回路をを形成する方法がある。
その一例として、特開平8−148809号公報に開示されている合成樹脂成形品の回路形成方法がある。
これは、合成樹脂成形品の外形表面が立体的な表面形状を有するものであり、立体的に成形した合成樹脂成形品の外形表面に金属被覆加工を行い回路導体を形成するものである。この合成樹脂成形品の外形表面の回路導体の厚みは、ほぼ均一に合成樹脂成形品の表面に平面的(二次元的)に導体を形成し導電回路とするものである。
この合成樹脂成形品の立体的回路導体を形成する合成樹脂成形品は薄形化、両面化、大判化、側面端子化などが困難である。
特開平8−148809号公報。
As a circuit forming method for forming a three-dimensional step circuit, there is a method of forming a step circuit on the surface of a synthetic resin molded product.
As an example, there is a circuit forming method for a synthetic resin molded product disclosed in Japanese Patent Laid-Open No. 8-148809.
In this method, the outer surface of the synthetic resin molded article has a three-dimensional surface shape, and the outer surface of the three-dimensionally molded synthetic resin molded article is subjected to metal coating to form a circuit conductor. The thickness of the circuit conductor on the outer surface of the synthetic resin molded product is such that a conductor is formed on the surface of the synthetic resin molded product in a planar (two-dimensional) manner to form a conductive circuit.
The synthetic resin molded product forming the three-dimensional circuit conductor of the synthetic resin molded product is difficult to be thinned, double-sided, large-sized, and side terminals.
JP-A-8-148809.

プリント配線基板に搭載する各種機能を有する部品は多様化しており三次元的な導体厚みの異なる段差回路を有するプリント配線基板を必要とする要求が高まってきた。
この導体厚みの異なる段差回路を形成するには、段差回路の数と同数の銅めっきとエッチングが必要となっていた。
The parts having various functions to be mounted on the printed wiring board are diversified, and the demand for a printed wiring board having stepped circuits having different three-dimensional conductor thicknesses has increased.
In order to form stepped circuits having different conductor thicknesses, the same number of copper platings and etchings as the number of stepped circuits are required.

ところで、三次元的な導体厚みの異なる段差回路を有するプリント配線基板を特殊装置や特殊システムでない従来のプリント配線基板製造方法で形成するためには、回路形成用の感光性ドライフィルムを使用し、導体厚みの低い方から1段ずつ銅めっきとエッチングによる回路形成を繰り返し、三次元的な段差回路を積み上げて形成する方法があるが、段差回路の数と同数の銅めっきとエッチングが必要となり、この銅めっきとエッチングに耐えられる(めっき用マスクとエッチング用マスク)感光性ドライフィルムがなく品質信頼性の確保が困難であった。
また、銅めっきとエッチングによる回路形成を繰り返し行うため各段差回路のズレ、変形、位置精度不良、導体厚みバラツキ、及び作業効率が悪かった。
さらに銅めっきの上にニッケル、金、銀、ロジューム等のめっきを施す場合、各段差回路の銅めっきと前記の異種金属めっきとの密着不良が発生する。
By the way, in order to form a printed wiring board having a step circuit with different three-dimensional conductor thickness by a conventional printed wiring board manufacturing method that is not a special apparatus or a special system, a photosensitive dry film for circuit formation is used, There is a method of repeating the formation of circuits by copper plating and etching step by step from the lower conductor thickness, and stacking and forming three-dimensional step circuits, but the same number of copper plating and etching as the number of step circuits is required, Since there was no photosensitive dry film that could withstand this copper plating and etching (plating mask and etching mask), it was difficult to ensure quality reliability.
In addition, since circuit formation by copper plating and etching is repeatedly performed, the deviation of each step circuit, deformation, poor positional accuracy, conductor thickness variation, and work efficiency are poor.
Further, when plating such as nickel, gold, silver, and rhodium is performed on the copper plating, poor adhesion between the copper plating of each step circuit and the above-described dissimilar metal plating occurs.

上記の課題を解決するために請求項1、請求項2の発明は、部品を搭載するプリント配線基板において、平坦で水平な同一基材面に(銅+銅以外の異種金属めっき)からなる異なる厚み導体を複数段の階段状に設けたプリント配線基板とするものである。
つまり、(銅+銅以外の異種金属めっき)からなる異なる厚み導体を少なくても2段の階段状に連接して形成するプリント配線基板である。
この連接して階段状に形成した異なる厚み導体相互は所望する目的により電気的に接続しても、独立回路としても良い。
In order to solve the above-mentioned problems, the inventions of claim 1 and claim 2 differ in that the printed wiring board on which the component is mounted is made of (different metal plating other than copper + copper) on the same flat and horizontal substrate surface. A printed wiring board is provided in which thick conductors are provided in a plurality of steps.
That is, it is a printed wiring board formed by connecting at least two steps of different thickness conductors made of different metal plating other than copper + copper.
The different thickness conductors that are connected and formed stepwise may be electrically connected or may be an independent circuit depending on the desired purpose.

請求項1の発明は、プリント配線基板の平坦で水平な同一基材面に(銅+銅以外の異種金属めっき)の少なくても二種の金属からなる一段の厚み導体を繰り返し重ねて複数段の厚み導体を形成した配線基板とするものである。   According to the first aspect of the present invention, there is provided a plurality of stages in which a single-layer thickness conductor made of at least two kinds of metals is repeatedly stacked on the same flat and horizontal base material surface of a printed wiring board. The wiring board is formed with a thick conductor.

請求項2の発明は、前記請求項1において、(銅+銅以外の異種金属めっき)の少なくても二種の金属からなる一段の厚み導体を繰り返し前段より高く重ねて複数段の厚み導体が前段の厚み導体の上に部分的に重なって、前段より高い階段状に連接して形成した配線基板とするものである。   A second aspect of the present invention is that in the first aspect of the present invention, a plurality of thick conductors are formed by repeatedly stacking at least one stage thick conductor made of at least two kinds of metals (copper + dissimilar metal plating other than copper) higher than the preceding stage. The wiring board is formed so as to be partially overlapped on the thick conductor in the previous stage and connected in a staircase pattern higher than the previous stage.

請求項3の発明は、段差回路をプリント配線基板に形成するあたり、平坦な同一基材面に(パネル銅めっき+銅以外の異種金属による部分パターンめっき)で二種の金属からなる第一段の厚み導体を形成する工程と、前記第一段の厚み導体を覆う(パネル銅めっき+銅以外の異種金属による部分パターンめっき)からなる第二段の厚み導体を形成する工程と、前記第二段の厚み導体を覆う(パネル銅めっき+銅以外の異種金属による部分パターンめっき)からなる第三段の厚み導体を形成する工程と、前記の銅以外の異種金属の所定形状の部分パターンめっきをエッチング用マスクとするエッチング工程とで、(銅+銅以外の異種金属めっき)からなる少なくても複数段の厚み導体を形成する回路形成方法である。   In the invention of claim 3, when the step circuit is formed on the printed wiring board, the first stage made of two kinds of metals on the same flat base material surface (panel copper plating + partial pattern plating with different metal other than copper). A step of forming a thick conductor of the first layer, a step of forming a second step of thick conductor consisting of covering the first stage thick conductor (panel copper plating + partial pattern plating with a different metal other than copper), and the second A step of forming a third-stage thick conductor comprising covering the step-thick conductor (panel copper plating + partial pattern plating with a different metal other than copper), and partial pattern plating of a predetermined shape of the different metal other than copper. It is a circuit formation method for forming at least a plurality of stages of thick conductors made of (copper + different kinds of metal plating other than copper) by an etching step as an etching mask.

また、所望する厚み導体を形成する部分的なパターンめっきにおいて、ニッケル、金、銀、ロジュームの何れか一つを含む銅以外の異種金属の部分的に形成したパターンめっきをエッチング用マスクとする回路形成方法でもある。つまり該銅以外の異種金属は耐エッチング液の作用と接点機能、操作機能選択、動作状態選択、部品搭載などに適した性能を持つ異種金属被膜であることが必要となる。   In addition, in partial pattern plating for forming a desired thickness conductor, a circuit in which pattern plating formed partially of a different metal other than copper including any one of nickel, gold, silver, and rhodium is used as an etching mask It is also a forming method. In other words, the dissimilar metal other than copper is required to be a dissimilar metal film having performance suitable for the action of the etchant and the contact function, operation function selection, operation state selection, component mounting, and the like.

また、本発明は(銅+異種金属めっき)の少なくても二つの異なる金属からなる一つの段の厚み導体を繰り返し重ねて積み上げた複数段の厚み導体は、それぞれの厚み導体相互がそれぞれ独立してても部分的に重なって接していても良い。
さらにこの回路形成において、異種金属めっきは例えば(ニッケル+金)として2種類の異種金属めっきとすることもできる。
Further, according to the present invention, a plurality of thick conductors obtained by repeatedly stacking and stacking one stage of thick conductors made of at least two different metals (copper + dissimilar metal plating) are independent of each other. Or may be partially overlapping and touching.
Further, in this circuit formation, the dissimilar metal plating can be, for example, two kinds of dissimilar metal plating as (nickel + gold).

例えば、段差回路をプリント配線基板に形成するあたり、平坦で水平な同一基材面にパネル銅めっき+銅以外の異種金属による所定形状のパターンめっきで第一の厚み導体を形成する工程と、前記第一の厚み導体に連接してパネル銅めっき+銅以外の異種金属による所定形状のパターンめっきで第二の厚み導体を形成する工程と、前記第二の厚み導体に連接してパネル銅めっき+銅以外の異種金属による所定形状のパターンめっきで第三の厚み導体を形成する工程と、前記の第1〜第3の銅以外の異種金属によるパターンめっき被膜をエッチング用マスクとするエッチング工程とで、同一基材面に所望する3段(種類)の厚み導体を形成するものである。   For example, when forming a step circuit on a printed wiring board, a step of forming a first thickness conductor by pattern plating of a predetermined shape with a different metal other than panel copper plating + copper on the same flat and horizontal base material surface; Panel copper plating connected to the first thickness conductor + a step of forming a second thickness conductor by pattern plating of a predetermined shape using a different metal other than copper, and panel copper plating connected to the second thickness conductor + A step of forming a third thickness conductor by pattern plating of a predetermined shape using a different metal other than copper, and an etching step using the pattern plating film of a different metal other than the first to third copper as an etching mask. The desired three-stage (type) of thick conductor is formed on the same base material surface.

また、(パネル銅めっき+所定形状の銅以外の異種金属によるパターンめっき)を位置をずらして繰り返し積み上げることにより段数を増加することができる。さらに配線基板の基材面の片面、両面に複数段の段差回路を立体的に形成できる。
本願のプリント配線基板は両面外層導体を電気的に直接接続する貫通導通穴(めっきスルーホール)や非貫通導通穴を配置し部品搭載面側のみに三次元的な段差回路を回路形成できる。
また、プリント配線基板は内層回路を有する多層配線基板の外層面の片面、両面に段差回路を形成しても良い。
Further, the number of stages can be increased by repeatedly stacking (panel copper plating + pattern plating with different metal other than copper having a predetermined shape) while shifting the position. Furthermore, a plurality of step circuits can be three-dimensionally formed on one side and both sides of the substrate surface of the wiring board.
The printed wiring board of the present application is provided with through conduction holes (plating through holes) and non-through conduction holes that directly connect the double-sided outer layer conductors, and a three-dimensional step circuit can be formed only on the component mounting surface side.
The printed wiring board may be formed with step circuits on one side and both sides of the outer layer surface of the multilayer wiring board having the inner layer circuit.

請求項1の発明は、段差の異なる少なくても2段以上の厚み導体を平坦な同一基材面に(銅+銅以外の異種金属めっき)を重ねて積み上げた配線基板を各段差回路のズレ、変形、位置精度不良、導体厚みバラツキ等がなく、高品質で薄形、小型、高密度の接点部や操作部に適用する三次元的な立体回路を形成できる。及び従来の合成樹脂成形品では0.5mm以下の薄板化は強度的に不可であったが、本発明の配線基板では板厚0.05mmの薄板が可能であり、作業効率良く製造したプリント配線基板を電子部品メーカや機器メーカに供給できる。
本発明の(銅めっきとエッチング)に耐えられる(銅めっき用マスクとエッチング用マスク)に感光性ドライフィルムを使用せずに異種金属めっきをエッチング用レジストマスクとするため、厚い銅めっきのエッチングにも耐えられ、品質信頼性の確保が可能となる。
According to the first aspect of the present invention, a wiring board in which at least two or more thickness conductors having different steps are stacked on each other on the same flat base material (copper and different metal plating other than copper) is stacked. It is possible to form a three-dimensional three-dimensional circuit to be applied to a high-quality, thin, small, and high-density contact portion and operation portion without deformation, poor positional accuracy, and conductor thickness variation. In addition, in the conventional synthetic resin molded product, it was impossible to reduce the thickness to 0.5 mm or less, but the wiring board of the present invention can be as thin as 0.05 mm, and printed wiring manufactured with high work efficiency. The board can be supplied to electronic component manufacturers and equipment manufacturers.
Since the dissimilar metal plating is used as a resist mask for etching without using a photosensitive dry film to withstand (copper plating and etching) of the present invention (copper plating mask and etching mask), etching of thick copper plating is possible. Can withstand quality and ensure quality reliability.

請求項2の発明は、請求項1の効果のほかに、各構成する(銅めっき+異種金属めっき)の厚みを自由に設定することができ、段数も複数段を自由に連接して形成できるから電子部品メーカや機器メーカの要求に応じ広く供給できる。
また、銅以外の異種金属めっきをエッチング用マスクとするため、異種金属めっきを必要に応じて接点機能や操作機能の他に部品搭載の性能(ワイヤーボンデング、バンプ接続、面付接続、ディスクリート部品接続など)要求に応じて形成できる信頼性が高いプリント配線基板を安価に供給できる。
According to the invention of claim 2, in addition to the effect of claim 1, the thickness of each component (copper plating + different metal plating) can be freely set, and the number of stages can be formed by freely connecting a plurality of stages. Can be widely supplied according to the demands of electronic parts manufacturers and equipment manufacturers.
Also, since different types of metal plating other than copper are used as etching masks, in addition to contact and operation functions, different metal plating can be used for component mounting performance (wire bonding, bump connection, surface connection, discrete components). A highly reliable printed wiring board that can be formed on demand can be supplied at low cost.

以下、図3、図4を参照して本発明の配線基板の製造工程を説明する。
まず、図3に基づいて本発明実施例1の配線基板の前半製造工程を説明する。
図3(a)は両面に銅箔3a(9μm,18μm,35μm)が張り付けられた銅張積層板2(基材厚0.1mmとした)である。
なお、乳液状の接着剤が塗布された絶縁基材を使用しアディテブめっきで絶縁基材の両面にパターン銅めっき導体(3)を形成しても可能であるが加工費が高くなる。
図3(b)は銅張積層板2の所定の箇所にNCドリリングマシンやレーザーマシンにより、穴明け加工を施して貫通穴4aとする。
Hereinafter, the manufacturing process of the wiring board of the present invention will be described with reference to FIGS.
First, the first half manufacturing process of the wiring board according to the first embodiment of the present invention will be described with reference to FIG.
FIG. 3A shows a copper-clad laminate 2 (with a base material thickness of 0.1 mm) in which copper foils 3a (9 μm, 18 μm, and 35 μm) are attached to both surfaces.
Although it is possible to form the patterned copper plating conductor (3) on both sides of the insulating base material by additive plating using an insulating base material coated with an emulsion adhesive, the processing cost becomes high.
In FIG. 3B, a predetermined portion of the copper-clad laminate 2 is drilled by an NC drilling machine or a laser machine to form a through hole 4a.

次に図3(c)に示すように所定の箇所に形成された貫通穴4aの内壁と銅張積層板2の両面にある銅箔3aの全面にパネル銅めっき(めっき厚15μm)を施し第1のパネル銅めっき導体(3b)を形成することにより貫通導通穴4(めっきスル−ホ−ル)を形成する。
その後、図3(d)に示すように銅張積層板2の両面にドライフィルムをラミネートし所定模様(画像)のパターンフィルムマスクを重ねて露光し現像することにより異種金属めっき用の所定形状のめっきマスク6を形成する。
その次に図3(e)に示すようにこの銅張積層板2に形成した第1のパネル銅めっき導体(3b)の上に銅以外の異種金属によるパターンめっきをして所定箇所にめっきマスク6以外に部分的に所定形状の第1の異種金属めっき導体(5a)を部分的に形成する。
Next, as shown in FIG. 3 (c), panel copper plating (plating thickness 15 μm) is applied to the entire inner surface of the through hole 4a formed at a predetermined location and the entire surface of the copper foil 3a on both sides of the copper clad laminate 2. A through-conduction hole 4 (plating through hole) is formed by forming one panel copper plating conductor (3b).
Thereafter, as shown in FIG. 3 (d), a dry film is laminated on both sides of the copper clad laminate 2, and a pattern film mask of a predetermined pattern (image) is overlaid and exposed and developed to form a predetermined shape for dissimilar metal plating. A plating mask 6 is formed.
Next, as shown in FIG. 3 (e), the first panel copper-plated conductor (3b) formed on the copper-clad laminate 2 is subjected to pattern plating with a different metal other than copper, and a plating mask at a predetermined position. In addition to 6, a first dissimilar metal plating conductor (5a) having a predetermined shape is partially formed.

それから図3(f)に示すように第1の異種金属めっき導体(5a)を形成した後、めっきマスク6であるドライフィルムを剥離する。
つまり本例は貫通導通穴4と上部表面の所定箇所に所定形状の第1の異種金属めっき導体(5a)(本例では電解金めっきで厚み0.5μmの部分金めっき)を形成したが、この第1の異種金属めっき導体(5a)は両面に形成してもよい。
これまでの工程で平坦な同一基材面に(銅箔+パネル銅めっき+銅以外の異種金属による部分パターンめっき)からなる第1の厚み導体を形成するものである。従って、本例では第1の厚み導体の導体厚みは約30μm〜35μmとした。
Then, after forming the first dissimilar metal plating conductor (5a) as shown in FIG. 3 (f), the dry film as the plating mask 6 is peeled off.
That is, in this example, the first dissimilar metal plating conductor (5a) having a predetermined shape was formed at a predetermined location on the through conduction hole 4 and the upper surface (in this example, a partial gold plating with a thickness of 0.5 μm by electrolytic gold plating). The first dissimilar metal plating conductor (5a) may be formed on both sides.
The first thick conductor made of (copper foil + panel copper plating + partial pattern plating with a different metal other than copper) is formed on the same flat base material surface in the steps so far. Therefore, in this example, the conductor thickness of the first thick conductor is about 30 μm to 35 μm.

図4に基づいて本発明実施例1の配線基板の後半の製造工程を説明する。
図4(g)は前記で説明したように[銅箔3a+第1のパネル銅めっき導体(3b)+銅以外の第1の異種金属めっき導体(5a)]で第一の厚み導体7となるめっき処理を施した後、この上と貫通導通穴4内に全面的に被覆する全面にパネル銅めっきを施し、第2のパネル銅めっき導体(3c)を形成する。この第2のパネル電解銅めっき厚みは20μmとした。
次に図4(h)に示すように、図3(d)と同様に銅張積層板2の第2のパネル銅めっき導体(3c)の上部にドライフィルムをラミネートし所定模様のパターンフィルムマスクを重ねて露光し現像することにより次の異種金属めっき用の所定形状の第2のめっきマスク6を形成する。
The latter half of the manufacturing process of the wiring board according to the first embodiment of the present invention will be described based on FIG.
FIG. 4G shows the [first copper conductor 3a + first panel copper-plated conductor (3b) + first dissimilar metal-plated conductor (5a) other than copper] as the first thickness conductor 7 as described above. After the plating process is performed, panel copper plating is performed on the entire surface of the through conduction hole 4 and the second panel copper plating conductor (3c). The thickness of the second panel electrolytic copper plating was 20 μm.
Next, as shown in FIG. 4 (h), a dry film is laminated on top of the second panel copper plating conductor (3c) of the copper clad laminate 2 in the same manner as in FIG. Then, a second plating mask 6 having a predetermined shape for the next dissimilar metal plating is formed.

その後図4(i)に示すように銅張積層板2に形成した第2のパネル銅めっき導体(3c)の上で、かつ第2のめっきマスク6が形成されている以外の箇所に部分的に異種金属によるパターンめっき(本例では電解金めっきで厚み0.5μm)をしてめっきマスク6以外に部分的に所定形状の第2の異種金属めっき導体(5b)を形成する。
それから図4(j)に示すように第2の異種金属めっき導体(5b)を形成した後、めっきマスク6であるドライフィルムを剥離する。
従って[銅箔3a+第1のパネル銅めっき導体(3b)+第2のパネル銅めっき導体(3c)+異種金属めっき導体(5b)]からなる平坦部の第二の厚み導体8のベース導体厚みは約50μm〜55μmとなった。
Thereafter, as shown in FIG. 4 (i), a portion of the second panel copper-plated conductor (3c) formed on the copper-clad laminate 2 is partially applied to a portion other than where the second plating mask 6 is formed. Then, pattern plating with a dissimilar metal (in this example, electrolytic gold plating with a thickness of 0.5 μm) is performed to form a second dissimilar metal plating conductor (5b) having a predetermined shape in addition to the plating mask 6.
Then, after forming a second dissimilar metal plating conductor (5b) as shown in FIG. 4 (j), the dry film as the plating mask 6 is peeled off.
Accordingly, the thickness of the base conductor of the second thickness conductor 8 of the flat portion made of [copper foil 3a + first panel copper plating conductor (3b) + second panel copper plating conductor (3c) + dissimilar metal plating conductor (5b)]. Was about 50 μm to 55 μm.

その後、図4(k)に示すように銅張積層板2の所定箇所に部分的に所定形状で形成された第1の異種金属めっき導体(5a)と第2の異種金属めっき導体(5b)をエッチング用マスクとして、不要な銅めっきと銅箔を一回のエッチング処理で除去して所定形状の(金属銅+銅以外の異種金属めっき)からなる(第一の厚み導体7と第二の厚み導体8)の異なる2段(2種類)の厚み導体を階段状に近接又は連接して形成することができる。
この異種金属めっきを厚み0.3μm以上にするとフィルムマスクでは不安定で耐えられない厚い金属銅(例:銅厚50μm以上)を溶解除去するエッチングにも耐えられ、品質信頼性の確保が可能となる。
なお、エッチング処理で2種類以上の厚み導体を階段状に形成してから段差導体の側面(厚み側面)や貫通導通穴4の端面の銅金属が露呈している部分を異種金属めっきで被覆するため第3の異種金属めっきを施してもよい。
Thereafter, as shown in FIG. 4 (k), a first dissimilar metal plating conductor (5a) and a second dissimilar metal plating conductor (5b) partially formed in a predetermined shape at a predetermined portion of the copper clad laminate 2 Is used as an etching mask, and unnecessary copper plating and copper foil are removed by a single etching process to form a predetermined shape (metal copper + metal plating other than copper) (first thickness conductor 7 and second metal plating). Two steps (two types) of thickness conductors having different thickness conductors 8) can be formed adjacent to or connected in a staircase pattern.
If this dissimilar metal plating is 0.3 μm or more in thickness, it can withstand etching that dissolves and removes thick metal copper (eg, copper thickness of 50 μm or more) that is unstable and unbearable with a film mask, and can ensure quality reliability. Become.
In addition, after forming two or more types of thick conductors in a stepped manner by etching, the side surfaces (thickness side surfaces) of the step conductors and the exposed portions of the copper metal on the end surfaces of the through-conduction holes 4 are covered with different metal plating. Therefore, a third dissimilar metal plating may be performed.

この銅以外の異種金属めっきは所望する厚み導体を形成する部分的なパターンめっきをするためニッケル、金、銀、ロジュームの何れか一つを含む金属が良好で該異種金属めっきを所定の模様に形成したパターンめっきをエッチング用マスクとする回路形成方法でもある。
配線基板の片面側のみに段差の異なる2段(2種類)以上の厚み導体を立体的に形成し、反対面(裏面)には通常配線基板と同じく段差のない信号回路、配線回路を主体に平面回路を形成してもよい。
This dissimilar metal plating other than copper performs partial pattern plating to form a desired thickness conductor, so that a metal containing any one of nickel, gold, silver, and rhodium is good, and the dissimilar metal plating is made into a predetermined pattern. It is also a circuit formation method using the formed pattern plating as an etching mask.
Two-level (two types) or more thick conductors with different steps are three-dimensionally formed on only one side of the wiring board, and the other side (back side) is mainly composed of signal circuits and wiring circuits with no steps similar to normal wiring boards. A planar circuit may be formed.

また、本発明のプリント配線基板の製造方法では図4(j)に示す第2の異種金属めっき導体を形成し、第2の異種金属めっきマスク6であるドライフィルムを剥離した後、図4(g)で示すパネル銅めっき工程、図4(h)に示す異種金属めっき用のめっきマスクを形成する工程、図4(i)に示す異種金属めっき導体を形成する工程、図4(j)に示すめっきマスクであるドライフィルムを剥離する工程を繰り返し第三の厚み導体9のベース導体を形成した後で図4(k)に示す不要な金属銅(銅めっきと銅箔)を一回のエッチング処理をして第三の厚み導体9を形成しても良い。(図面は省略)
さらに図4(g)〜図4(j)の工程を順次繰り返し第四の厚み導体、第五の厚み導体と複数の厚さの異なる厚み導体を階段状、又は千鳥足状に形成することが可能である。
4 (j), the second dissimilar metal plating conductor shown in FIG. 4 (j) is formed, and the dry film as the second dissimilar metal plating mask 6 is peeled off. g), a step of forming a plating mask for dissimilar metal plating shown in FIG. 4 (h), a step of forming a dissimilar metal plating conductor shown in FIG. 4 (i), and FIG. 4 (j). After the process of peeling the dry film as the plating mask shown is repeated and the base conductor of the third thickness conductor 9 is formed, unnecessary metal copper (copper plating and copper foil) shown in FIG. The third thick conductor 9 may be formed by processing. (Drawing is omitted)
Furthermore, the fourth thickness conductor, the fifth thickness conductor and a plurality of thickness conductors having different thicknesses can be formed in a staircase pattern or a staggered pattern by sequentially repeating the steps of FIGS. 4 (g) to 4 (j). It is.

図1は、本発明の実施例1の2段(2種類)の厚み導体を有する配線基板の一部の拡大断面図である。
基材厚0.1mm、銅箔3a(18μm)の両面銅張積層板2の両面にパネル銅めっき(めっき厚15μm)を施し第1のパネル銅めっき導体(3b)を形成することにより貫通導通穴4(めっきスル−ホ−ル)を形成したものである。
FIG. 1 is an enlarged cross-sectional view of a part of a wiring board having two steps (two types) of thick conductors according to the first embodiment of the present invention.
Through-conduction by forming panel first copper plating conductor (3b) by applying panel copper plating (plating thickness 15μm) to both sides of double-sided copper clad laminate 2 of substrate thickness 0.1mm and copper foil 3a (18μm) Hole 4 (plating through hole) is formed.

配線基板の両面にある第1のパネル銅めっき導体(3b)からなる両面の外層導体はこの貫通導通穴4(めっきスル−ホ−ル)の内壁のスル−ホ−ルめっき導体である第1のパネル銅めっき導体(3b)と第1の異種金属めっき導体(5a)、および第2のパネル銅めっき導体(3c)と第2の異種金属めっき導体(5b)とで電気的に接続される。
ただし、図4(g)で示す第2のパネル銅めっき工程でドライフィルムを第2のパネル銅めっきマスクとして貫通導通穴4(スル−ホ−ル穴)や配線基板の裏面を銅めっきマスクして被覆して第2のパネル銅めっきを形成しなくてもよい。
The outer layer conductors on both sides made of the first panel copper plating conductors (3b) on both sides of the wiring board are first hole plating conductors on the inner wall of the through-conduction hole 4 (plating through hole). The panel copper plating conductor (3b) and the first dissimilar metal plating conductor (5a), and the second panel copper plating conductor (3c) and the second dissimilar metal plating conductor (5b) are electrically connected. .
However, in the second panel copper plating step shown in FIG. 4 (g), the dry film is used as the second panel copper plating mask, and the through-conduction holes 4 (through holes) and the back surface of the wiring board are masked with copper plating. The second panel copper plating may not be formed by coating.

本発明の実施例1のプリント配線基板1には[銅箔3a+第1の銅めっき導体(3b)+第1の異種金属めっき導体5a]で構成された第一の厚み導体7と、この第一の厚み導体7に近接又は連接して[銅箔3a+第1の銅めっき導体(3b)+第2の銅めっき導体(3c)+第2の異種金属めっき導体5b]で構成された第二の厚み導体8との異なる厚み導体を配線基板1の上面に2段の階段状に設けた配線基板1とするものである。   The printed wiring board 1 according to the first embodiment of the present invention includes a first thickness conductor 7 composed of [copper foil 3a + first copper plating conductor (3b) + first dissimilar metal plating conductor 5a], Second made of [copper foil 3a + first copper-plated conductor (3b) + second copper-plated conductor (3c) + second dissimilar metal-plated conductor 5b] adjacent to or connected to one thickness conductor 7 The wiring board 1 has a thickness conductor different from that of the thickness conductor 8 provided on the upper surface of the wiring board 1 in two steps.

また、第二の厚み導体8は[銅箔3a+第1の銅めっき導体(3b)+第1の異種金属めっき導体5a+第2の銅めっき導体(3c)+第2の異種金属めっき導体5b]でサンドエッチ状態で構成しても良い。(図面表示なし)
従って、(銅めっき+銅以外の異種金属めっき)の構成で厚みの異なる2種類以上の導体を部品素子を搭載する領域(エリア)内に集約して階段状に配置し、このエリア上に接点機能や操作機能、又は表示機能などをさせる機能部品を搭載するベースとなる配線基板1である。
The second thickness conductor 8 is [copper foil 3a + first copper plating conductor (3b) + first dissimilar metal plating conductor 5a + second copper plating conductor (3c) + second dissimilar metal plating conductor 5b]. It may be configured in a sand-etched state. (No drawing display)
Therefore, two or more kinds of conductors with different thicknesses in the (copper plating + different metal plating other than copper) configuration are concentrated in the area (area) where the component elements are mounted, arranged in a staircase pattern, and the contacts on this area This is a wiring board 1 serving as a base on which functional parts that perform functions, operation functions, display functions, and the like are mounted.

つまり、厚みの異なる段差のある厚み導体を少なくても二段の階段状に近接又は連接して形成する配線基板1であり、第一の厚み導体7のエリア内に貫通導通穴4を配置し形成した例を示すものである。第二の厚み導体8は第一の厚み導体7に近接して形成してあるが、この部分を接点機能や操作機能、表示機能などをさせるための機能部品との組み合わせ要求により電気的に接続しても、接続しなくても良く、また第一の厚み導体7に第二の厚み導体8を部分的に重ねたり、第一の厚み導体7と第二の厚み導体8を同心状、偏心状に配置することもできる。   In other words, the wiring board 1 is formed by forming at least two stepped thickness conductors having different thicknesses in the vicinity of or connected in two steps, and the through-conduction hole 4 is disposed in the area of the first thickness conductor 7. The example which formed is shown. The second thickness conductor 8 is formed close to the first thickness conductor 7, but this portion is electrically connected by a combination request with a functional component for causing a contact function, an operation function, a display function, and the like. However, the second thick conductor 8 may be partially overlapped with the first thick conductor 7, or the first thick conductor 7 and the second thick conductor 8 may be concentric and eccentric. It can also be arranged in a shape.

図2は本発明の実施例2の三段の厚み導体を有する配線基板の断面図である。
まず、図2に示すように、図1の本発明の実施例1の第一の厚み導体7のエリア内に貫通導通穴4を配置し形成し、第二の厚み導体8は第一の厚み導体7に近接して形成して段差の異なる厚み導体を二段の階段状に近接して形成してある。
FIG. 2 is a cross-sectional view of a wiring board having three-stage thick conductors according to Example 2 of the present invention.
First, as shown in FIG. 2, the through-conduction hole 4 is arranged and formed in the area of the first thickness conductor 7 of the first embodiment of the present invention shown in FIG. 1, and the second thickness conductor 8 has the first thickness. Thickness conductors that are formed close to the conductor 7 and have different steps are formed close to two steps.

前記第二段の厚み導体を覆う(パネル銅めっき+銅以外の異種金属による部分パターンめっき)からなる第三段の厚み導体を形成する工程と、この他に[銅箔3a+第1の銅めっき導体(3b)+第2の銅めっき導体(3c)+第3の銅めっき導体(3d)+第3の異種金属めっき導体5c]で構成された第三の厚み導体9を平坦な同一基材面に段差の異なる厚み導体を3段の階段状に近接又は連接して形成した配線基板1である。   A step of forming a third-stage thick conductor consisting of covering the second-stage thick conductor (panel copper plating + partial pattern plating with a different metal other than copper); and in addition to this, [copper foil 3a + first copper plating The third thick conductor 9 composed of the conductor (3b) + second copper-plated conductor (3c) + third copper-plated conductor (3d) + third dissimilar metal-plated conductor 5c] This is a wiring board 1 in which thick conductors having different steps on the surface are formed close to or connected in three steps.

また、第三の厚み導体9を[銅箔3a+第1の銅めっき導体(3b)+第2の銅めっき導体(3c)+第2の異種金属めっき導体5b]の構成でなる第二の厚み導体8の上面にプラスして第3の銅めっき導体(3d)を重ねてパネル銅めっきを形成してから、前記の部分に部分的に第3の異種金属めっき導体5cを重ねる構成にして[銅箔3a+第1の銅めっき導体(3b)+第2の銅めっき導体(3c)+第2の異種金属めっき導体5b+第3の銅めっき導体(3d)+第3の異種金属めっき導体5c]を連接して形成し、この銅張積層板2の全体を一回でエッチングすることにより平面図視で同一のパターンエリア内に第二の厚み導体8と第三の厚み導体9とを部分的に重ね絶縁間隙なしに接触させ階段状に連接した段差部分を形成し、複雑な段差を有する段差構造が可能となる。
平面図視で同一種類の部品素子搭載エリア内のX−Y平面において、導体厚みの異なる複雑な段差を自由自在(ランダム)に配置する三次元の立体構造が可能となる。
Further, the third thickness conductor 9 has a second thickness composed of [copper foil 3a + first copper plating conductor (3b) + second copper plating conductor (3c) + second dissimilar metal plating conductor 5b]. A panel copper plating is formed by overlapping the third copper plating conductor (3d) in addition to the upper surface of the conductor 8, and then the third dissimilar metal plating conductor 5c is partially overlapped with the above portion [ Copper foil 3a + first copper plating conductor (3b) + second copper plating conductor (3c) + second dissimilar metal plating conductor 5b + third copper plating conductor (3d) + third dissimilar metal plating conductor 5c] Are connected to each other, and the entire copper-clad laminate 2 is etched at a time to partially form the second thickness conductor 8 and the third thickness conductor 9 in the same pattern area in plan view. Steps that are connected in a staircase pattern without any overlapping insulation gaps A step structure having steps is possible.
A three-dimensional structure in which complicated steps with different conductor thicknesses are freely (randomly) arranged on the XY plane in the same kind of component element mounting area in plan view is possible.

また、同一の部品素子搭載エリア内に第一の厚み導体7と第二の厚み導体8とを接触させ階段状に連接した段差部分を形成してもよく、また第一の厚み導体7と第二の厚み導体8と第三の厚み導体9とを全ての厚みの異なる厚み導体を接触させ階段状に連接した3段からなる段差部分を形成することもできる。つまり、傾斜のついた階段状の凹部が形成できる。(図面表示なし)   Further, the first thickness conductor 7 and the second thickness conductor 8 may be brought into contact with each other in the same component element mounting area to form a stepped portion connected in a staircase pattern. It is also possible to form a step portion consisting of three steps in which the second thickness conductor 8 and the third thickness conductor 9 are connected to all the thickness conductors having different thicknesses and connected in a staircase pattern. That is, an inclined stepped recess can be formed. (No drawing display)

この異種金属めっきは所望する厚み導体を形成する部分的なパターンめっきとしてニッケル、金、銀、ロジュームの何れか一つを含む、又は必要に応じてNiめっき−金めっき(Au)、Niめっき−銀めっき(Ag)などの追加めっき処理をすることもできる。
なお、必要に応じて各種選択し接点機能や操作機能の他に搭載部品の要求性能(ワイヤーボンデング、バンプ接続、面付接続、ディスクリート部品接続など)に対応し複雑な段差と接続ランド(面付ランド、ワイヤ−ボンデングランド、バンプ接続ランド等)を設けることもできる。
This dissimilar metal plating includes any one of nickel, gold, silver and rhodium as a partial pattern plating to form a desired thickness conductor, or if necessary, Ni plating-gold plating (Au), Ni plating- An additional plating process such as silver plating (Ag) can also be performed.
In addition to the contact function and operation function, various steps and connection lands (surfaces) can be selected to meet the required performance of mounted components (wire bonding, bump connection, surface connection, discrete component connection, etc.). An attached land, a wire-bonden ground, a bump connection land, etc.) can also be provided.

本発明実施例1の2段の厚み導体を有する配線基板の断面図である。It is sectional drawing of the wiring board which has a 2 step | paragraph thick conductor of Example 1 of this invention. 本発明実施例2の3段の厚み導体を有する配線基板の断面図である。It is sectional drawing of the wiring board which has a 3 step | paragraph thick conductor of Example 2 of this invention. 本発明実施例1の配線基板の前半の製造工程を説明する断面図である。It is sectional drawing explaining the manufacturing process of the first half of the wiring board of this invention Example 1. FIG. 本発明実施例1の配線基板の後半の製造工程を説明する断面図である。It is sectional drawing explaining the manufacturing process of the second half of the wiring board of this invention Example 1. FIG.

符号の説明Explanation of symbols

1…配線基板、2…銅張積層板、3…銅めっき導体、4…貫通導通穴、5…異種金属めっき導体、6…めっきマスク、7…第一の厚み導体、
8…第二の厚み導体、9…第三の厚み導体。
DESCRIPTION OF SYMBOLS 1 ... Wiring board, 2 ... Copper clad laminated board, 3 ... Copper plating conductor, 4 ... Through-conduction hole, 5 ... Dissimilar metal plating conductor, 6 ... Plating mask, 7 ... 1st thickness conductor,
8: Second thickness conductor, 9: Third thickness conductor.

Claims (3)

配線基板の平坦で水平な同一基材面に(銅+銅以外の異種金属めっき)の少なくても二種の金属からなる一段の厚み導体を繰り返し重ねて複数段の厚み導体を形成したことを特徴とする配線基板。   The fact that multiple thickness conductors were formed by repeatedly layering at least one thickness conductor consisting of at least two kinds of metals (copper + different metal plating other than copper) on the same flat and horizontal substrate surface of the wiring board. A characteristic wiring board. 前記請求項1において、繰り返し重ねて複数段の厚み導体が部分的に重なって階段状に連接して形成したことを特徴とする配線基板。   2. The wiring board according to claim 1, wherein a plurality of thick conductors are overlapped repeatedly and partially overlapped to form a stepped shape. 段差回路を配線基板に形成するあたり、平坦な同一基材面に(パネル銅めっき+銅以外の異種金属による部分パターンめっき)で二種の金属からなる第一段の厚み導体を形成する工程と、前記第一段の厚み導体を覆う(パネル銅めっき+銅以外の異種金属による部分パターンめっき)からなる第二段の厚み導体を形成する工程と、前記の銅以外の異種金属の所定形状の部分パターンめっきをエッチング用マスクとするエッチング工程とで、(銅+銅以外の異種金属めっき)からなる複数段の厚み導体を形成することを特徴とする回路形成方法。   When forming a step circuit on a wiring board, a step of forming a first-stage thick conductor made of two kinds of metals by (panel copper plating + partial pattern plating with different metal other than copper) on the same flat base material surface; A step of forming a second-stage thick conductor comprising covering the first-stage thickness conductor (panel copper plating + partial pattern plating with a different metal other than copper), and a predetermined shape of the different metal other than copper A circuit forming method, comprising: forming a plurality of thickness conductors made of (copper + dissimilar metal plating other than copper) in an etching step using partial pattern plating as an etching mask.
JP2004319196A 2004-11-02 2004-11-02 Method of forming level difference circuit and its wiring board Pending JP2006134927A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108696995A (en) * 2017-04-12 2018-10-23 北大方正集团有限公司 The preparation method and stepped circuit board of stepped circuit board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108696995A (en) * 2017-04-12 2018-10-23 北大方正集团有限公司 The preparation method and stepped circuit board of stepped circuit board
CN108696995B (en) * 2017-04-12 2019-12-31 北大方正集团有限公司 Preparation method of stepped circuit board and stepped circuit board

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