JP2006128098A - Coating liquid for forming transparent conductive film, transparent conductive film, and manufacturing method thereof - Google Patents

Coating liquid for forming transparent conductive film, transparent conductive film, and manufacturing method thereof Download PDF

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JP2006128098A
JP2006128098A JP2005286266A JP2005286266A JP2006128098A JP 2006128098 A JP2006128098 A JP 2006128098A JP 2005286266 A JP2005286266 A JP 2005286266A JP 2005286266 A JP2005286266 A JP 2005286266A JP 2006128098 A JP2006128098 A JP 2006128098A
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conductive film
transparent conductive
coating liquid
forming
coating
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Yoshihiro Otsuka
大塚良広
Masaya Yukinobu
行延雅也
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Sumitomo Metal Mining Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating liquid for forming a transparent conductive film capable of the pattern formation (trimming) and laser baking of the transparent conductive film by applying laser beams. <P>SOLUTION: The coating liquid for forming the transparent conductive film is obtained by dissolving an organic coloring matter to solution comprising acetylacetoneindium, an organic metal compound for dopant, a cellulose derivative, alkylphenol and/or alkenylphenol, and dibasic acid ester and/or benzyl acetate. After a substrate is coated with the coating liquid before drying, trimming is made by applying laser beams as needed, baking is made at a temperature of 400°C or higher, or laser baking is made, thus forming the transparent conductive film pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、透明導電膜形成用塗布液及び透明導電膜に関する。さらに詳しくは、ガラスやセラミックス等の耐熱基板上に、透明性と導電性を兼ね備えた微細な透明導電膜パターンを形成することができる塗布液、及び該塗布液を用いて形成された透明導電膜に関する。   The present invention relates to a coating liquid for forming a transparent conductive film and a transparent conductive film. More specifically, a coating liquid capable of forming a fine transparent conductive film pattern having both transparency and conductivity on a heat-resistant substrate such as glass or ceramics, and a transparent conductive film formed using the coating liquid About.

液晶ディスプレイ、エレクトロルミネッセンス、プラズマディスプレイ等の表示素子透明電極、タッチパネル、太陽電池等の透明電極、熱線反射、電磁波シールド、帯電防止、防曇等の機能性コーティングに用いられる透明導電膜の形成材料としては、錫ドープ酸化インジウム(以下、「ITO」と表記する場合がある)に代表される酸化インジウム系透明導電材料が知られている。   As a transparent conductive film used for functional coatings such as liquid crystal displays, electroluminescence, plasma display, etc., transparent electrodes, touch panels, solar batteries, transparent electrodes, heat ray reflection, electromagnetic shielding, antistatic, antifogging, etc. Indium oxide-based transparent conductive materials represented by tin-doped indium oxide (hereinafter sometimes referred to as “ITO”) are known.

ここで、ITO透明導電膜の製造方法としては、真空蒸着法、スパッタリング法、化学蒸着法等の物理的手法が広く用いられている。これらの方法は、透明性と導電性に優れた均一なITO透明導電膜を基板上に形成することができる。しかしながら、これに使用する膜形成装置は真空容器をベースとするため非常に高価であり、また基板成膜毎に製造装置内の成分ガス圧を精密に制御しなければならないため、製造コストと量産性に問題がある。   Here, physical methods such as a vacuum deposition method, a sputtering method, and a chemical vapor deposition method are widely used as a method for producing the ITO transparent conductive film. These methods can form a uniform ITO transparent conductive film excellent in transparency and conductivity on a substrate. However, the film forming apparatus used for this is very expensive because it is based on a vacuum vessel, and the component gas pressure in the manufacturing apparatus must be precisely controlled every time the substrate is formed. There is a problem with sex.

上記の問題を解決する製造方法として、インジウム化合物と錫化合物を溶剤に溶解させた透明導電膜形成用塗布液を用いて基板上に塗布する方法(以下、「塗布法」と表記する場合がある)が検討されている。この方法では、塗布、乾燥、焼成という簡単な製造工程でITO透明導電膜が形成される。   As a manufacturing method for solving the above-mentioned problem, a method of applying on a substrate using a coating solution for forming a transparent conductive film in which an indium compound and a tin compound are dissolved in a solvent (hereinafter sometimes referred to as “coating method”). ) Is being considered. In this method, the ITO transparent conductive film is formed by a simple manufacturing process of coating, drying, and baking.

上記塗布法では、インジウム化合物及び錫化合物を含む塗布液として従来種々の塗布液が開発されており、例えば、特許文献1には、ハロゲンイオンまたはカルボキシル基を含む硝酸インジウムとアルキル硝酸錫の混合液が、特許文献2には、アルコキシル基などを含む有機インジウム化合物と有機錫化合物の混合物が、特許文献3には、硝酸インジウムと有機錫化合物の混合物が、特許文献4には、硝酸インジウム、硝酸錫等の無機化合物混合物が、特許文献5には、ジカルボン酸硝酸インジウムなどの有機硝酸インジウムとアルキル硝酸錫などの混合物が、特許文献6には、アセチルアセトンを配位した有機インジウム錯体と錫錯体からなる混合溶液が、特許文献7には上記と同様の有機化合物混合溶液が、特許文献8にも同様な有機化合物混合物がそれぞれ開示されている。
これらの特許文献に見られるように、従来の塗布液の多くはインジウムや錫の硝酸塩、ハロゲン化物からなる有機または無機化合物、あるいは金属アルコキシドなどの有機金属化合物等が用いられている。しかし、硝酸塩やハロゲン化物を用いた塗布液は、焼成時において窒素酸化物や塩素などの腐食性ガスが発生するため、設備腐食や環境汚染を生ずるといった問題がある。また、金属アルコキシドを用いた塗布液では、原料が加水分解し易いため、塗布液の安定性に問題がある。また、上記有機金属化合物を用いた塗布液の多くは、基板に対する濡れ性が悪く、不均一膜が形成されやすいといった問題もあった。
In the coating method, various coating solutions have been developed as coating solutions containing an indium compound and a tin compound. For example, Patent Document 1 discloses a mixed solution of indium nitrate containing halogen ions or carboxyl groups and tin alkyl nitrate. However, Patent Document 2 discloses a mixture of an organic indium compound containing an alkoxyl group and an organic tin compound, Patent Document 3 includes a mixture of indium nitrate and an organic tin compound, and Patent Document 4 includes indium nitrate and nitric acid. A mixture of inorganic compounds such as tin is disclosed in Patent Document 5 from a mixture of organic indium nitrate such as indium dicarboxylate and alkyl tin nitrate, and Patent Document 6 includes an organic indium complex coordinated with acetylacetone and a tin complex. The organic compound mixed solution similar to the above is disclosed in Patent Document 7 and the same organic compound is also disclosed in Patent Document 8. Object mixture is disclosed, respectively.
As can be seen from these patent documents, most of the conventional coating solutions use indium or tin nitrates, organic or inorganic compounds made of halides, or organometallic compounds such as metal alkoxides. However, a coating solution using nitrate or halide has a problem that corrosive gases such as nitrogen oxides and chlorine are generated during firing, resulting in equipment corrosion and environmental pollution. Moreover, in the coating liquid using a metal alkoxide, since a raw material is easy to hydrolyze, there exists a problem in stability of a coating liquid. In addition, many of the coating solutions using the organometallic compound have a problem that wettability with respect to the substrate is poor and a non-uniform film is easily formed.

特許文献9には、これらの問題点を改良した塗布液としてアセチルアセトンインジウム、アセチルアセトン錫、ヒドロキシプロピルセルロース、アルキルフェノール及び/又はアルケニルフェノール、二塩基酸エステル及び/又は酢酸ベンジルを含有する透明導電膜形成用塗布液が開示されている。この塗布液は、アセチルアセトンインジウム、アセチルアセトン錫の混合溶液にヒドロキシプロピルセルロースを含有させることによって塗布液の基板に対する濡れ性を改善すると同時に、粘性剤であるヒドロキシプロピルセルロースの含有量によって塗布液の粘度を調整し、スピンコート、スプレーコート、ワイヤーバーコート、ディップコート、スクリーン印刷等の各種塗布法の採用を可能にしている。   Patent Document 9 discloses a transparent conductive film-forming solution containing acetylacetone indium, acetylacetone tin, hydroxypropylcellulose, alkylphenol and / or alkenylphenol, dibasic acid ester and / or benzyl acetate as a coating solution that improves these problems. A coating solution is disclosed. This coating solution improves the wettability of the coating solution to the substrate by containing hydroxypropyl cellulose in a mixed solution of acetylacetone indium and acetylacetone tin, and at the same time, the viscosity of the coating solution is controlled by the content of hydroxypropylcellulose as a viscosity agent. It is possible to use various coating methods such as spin coating, spray coating, wire bar coating, dip coating, and screen printing.

更にスピンコート、スプレーコート、ディップコート用の改良塗布液として、特許文献10には、有機インジウム化合物(アセチルアセトンインジウム、オクチル酸インジウム)と、有機錫(アセチルアセトン錫、オクチル酸錫)と、有機溶剤とを含み、その有機溶剤にアルキルフェノール及び/又はアルケニルフェノールを溶解したアセチルアセトン溶液、アルキルフェノール及び/又はアルケニルフェノールを溶解したアセチルアセトン溶液をアルコールで希釈した液を用いる透明導電膜形成用塗布液も開示されている。   Furthermore, as an improved coating solution for spin coating, spray coating, and dip coating, Patent Document 10 discloses an organic indium compound (acetylacetone indium, indium octylate), organic tin (acetylacetone tin, tin octylate), and an organic solvent. And a transparent conductive film forming coating solution using a solution obtained by diluting an acetylacetone solution in which an alkylphenol and / or alkenylphenol is dissolved with an alcohol. .

上記の改良塗布液を用いれば、塗布液の塗布を、例えばスクリーン印刷等のパターン印刷で行ったり、あるいは形成された透明導電膜をウェットエッチングすることによって、任意の透明導電膜パターンを作製することができる。前者は塗布の段階で任意パターンを形成する方法であり、低コストかつ簡便に透明導電膜パターンが作製できるが、微細パターンの作製が困難という問題がある。一方、後者は透明導電膜を形成してから任意パターンを形成する方法であり、微細な透明導電膜パターンを作製することができるが、レジスト塗布、エッチング、レジスト除去といった煩雑な工程を要するため、製造コストに問題がある。   If the above-described improved coating solution is used, the coating solution is applied by pattern printing such as screen printing, or an arbitrary transparent conductive film pattern is produced by wet etching the formed transparent conductive film. Can do. The former is a method of forming an arbitrary pattern at the application stage, and a transparent conductive film pattern can be easily produced at low cost, but there is a problem that it is difficult to produce a fine pattern. On the other hand, the latter is a method of forming an arbitrary pattern after forming a transparent conductive film, and a fine transparent conductive film pattern can be produced, but it requires complicated steps such as resist coating, etching, and resist removal. There is a problem in manufacturing cost.

そこで、積層セラミックコンデンサ等の電極の微細加工で用いられるような強力なレーザーを照射して、照射部分の塗膜を消失させ、微細パターンを形成させる方法が考えられるが、従来の透明導電膜材料(透明導電膜形成用塗布液を塗布・乾燥した膜、又は透明導電膜自体)は、一般のレーザー波長300〜1200nmの領域に吸収がなかったため、この方法が適用できなかった。
また、上記塗布液を用いてITO透明導電膜を得る方法において、塗布、乾燥後の焼成にレーザー照射を用いれば、より簡便に焼成処理を行うことが可能となり、更には、パターン照射すればレーザー照射部分のみを透明導電膜に転化できるため、微細パターニングも可能となるが、上述と同様の理由により、適用できなかった。
特公昭57−138108号公報 特公昭61−26679号公報 特開平4−255768号公報 特開昭57−36714号公報 特開昭57−212268号公報 特公昭63−25448号公報 特公平2−20706号公報 特公昭63−19046号公報 特開平6−203658号公報 特開平6−325637号公報
Therefore, a method of irradiating a powerful laser used in microfabrication of an electrode such as a multilayer ceramic capacitor to eliminate the coating film of the irradiated portion and forming a fine pattern is considered. This method could not be applied to the film having a transparent conductive film forming coating solution applied and dried, or the transparent conductive film itself, because there was no absorption in a general laser wavelength region of 300 to 1200 nm.
Moreover, in the method of obtaining an ITO transparent conductive film using the above coating liquid, if laser irradiation is used for baking after coating and drying, it becomes possible to perform baking more easily, and further laser irradiation if pattern irradiation is performed. Since only the irradiated portion can be converted into a transparent conductive film, fine patterning is also possible, but for the same reason as above, it could not be applied.
Japanese Patent Publication No.57-138108 Japanese Patent Publication No. 61-26679 JP-A-4-255768 JP 57-36714 A Japanese Patent Laid-Open No. 57-212268 Japanese Patent Publication No. 63-25448 Japanese Patent Publication No. 2-20706 Japanese Patent Publication No.63-19046 JP-A-6-203658 JP-A-6-325637

本発明の目的は、微細パターン形成が可能で、透明性と導電性を兼ね備えたITO等の透明導電膜及びその製造方法、またその透明導電膜を低コストかつ簡便に形成できる透明導電膜形成用塗布液を提供することにある。     An object of the present invention is to form a transparent conductive film, such as ITO, which can form a fine pattern and has both transparency and conductivity, and a method for producing the same, and to form the transparent conductive film at low cost and easily. It is to provide a coating solution.

発明者等は、アセチルアセトンインジウム、ドーパント用有機金属化合物、ヒドロキシプロピルセルロースを、アルキルフェノール及び/又はアルケニルフェノールと、二塩基酸エステル及び/又は酢酸ベンジルに溶解させた透明導電膜形成用塗布液に、レーザー光線を吸収する有機色素を含有させることによって、レーザー光線によって塗布膜をパターニング(トリミング)やレーザー焼成することが可能となり、また、この塗布液を塗布、乾燥、焼成して得られる透明導電膜は透明性と導電性が良好であることを見出し、本発明に至った。     The inventors have applied a laser beam to a coating solution for forming a transparent conductive film in which acetylacetone indium, an organometallic compound for dopant, and hydroxypropyl cellulose are dissolved in alkylphenol and / or alkenylphenol, dibasic acid ester and / or benzyl acetate. By containing an organic dye that absorbs the light, the coating film can be patterned (trimming) or laser baked by a laser beam, and the transparent conductive film obtained by applying, drying and baking the coating liquid is transparent. And the present inventors have found that the conductivity is good and have reached the present invention.

すなわち、上記の目的を達成するための本発明に係る透明導電膜形成用塗布液は、アセチルアセトンインジウム、ドーパント用有機金属化合物、セルロース誘導体、有機色素、アルキルフェノール及び/又はアルケニルフェノール、二塩基酸エステル及び/又は酢酸ベンジルを含有する透明導電膜形成用塗布液であって、アセチルアセトンインジウムとドーパント用有機金属化合物との合計含有量が1〜30重量%、セルロース誘導体の含有量が0.1〜5重量%、有機色素の含有量が0.05〜2重量%であることを特徴とするものである。     That is, the coating liquid for forming a transparent conductive film according to the present invention for achieving the above-described object comprises indium acetylacetone, an organometallic compound for a dopant, a cellulose derivative, an organic dye, an alkylphenol and / or alkenylphenol, a dibasic acid ester, and A coating liquid for forming a transparent conductive film containing benzyl acetate, wherein the total content of indium acetylacetone and the organometallic compound for the dopant is 1 to 30% by weight, and the content of the cellulose derivative is 0.1 to 5% by weight %, And the organic dye content is 0.05 to 2% by weight.

また、本発明に係る他の透明導電膜形成用塗布液は、本発明に係る透明導電膜形成用塗布液において、前記該有機色素が波長300〜1200nmの領域に吸収をもつことを特徴とし、前記アセチルアセトンインジウムとドーパント用有機金属化合物の合計含有量が5〜20重量%であることを特徴とし、前記アセチルアセトンインジウムとドーパント用有機金属化合物の含有割合がアセチルアセトンインジウム/ドーパント用有機金属化合物の重量比=99/1〜80/20であることを特徴とし、前記ドーパント用有機金属化合物が有機錫化合物であることを特徴とし、更にはその有機錫化合物が、アセチルアセトン錫であることを特徴とし、前記セルロース誘導体が、ヒドロキシプロピルセルロースであることを特徴とするものである。     Another transparent conductive film forming coating liquid according to the present invention is characterized in that, in the transparent conductive film forming coating liquid according to the present invention, the organic dye has absorption in a wavelength region of 300 to 1200 nm. The total content of the acetylacetone indium and the organometallic compound for dopant is 5 to 20% by weight, and the content ratio of the acetylacetone indium and the organometallic compound for dopant is a weight ratio of acetylacetone indium / the organometallic compound for dopant. = 99/1 to 80/20, characterized in that the organometallic compound for dopant is an organotin compound, and further, the organotin compound is acetylacetone tin, The cellulose derivative is characterized by being hydroxypropylcellulose

本発明の目的を達成するための透明導電膜の製造方法は、前記した組成の透明導電膜成形用塗布液を基板上に塗布し、乾燥した後、400℃以上の温度で焼成することを特徴とするものである。また、この場合に、該塗布液の基板上への塗布をスクリーン印刷法またはワイヤーバーコート法で行うことも特徴とするものである。本発明に係る他の透明導電膜の製造方法は、前記した組成の透明導電膜成形用塗布液を基板上に塗布し、乾燥した後、レーザー焼成することを特徴とするものである。     A method for producing a transparent conductive film for achieving the object of the present invention is characterized in that a transparent conductive film forming coating solution having the above composition is applied onto a substrate, dried, and then fired at a temperature of 400 ° C. or higher. It is what. In this case, the application of the coating solution onto the substrate is also performed by a screen printing method or a wire bar coating method. Another method for producing a transparent conductive film according to the present invention is characterized in that a transparent conductive film-forming coating solution having the composition described above is applied onto a substrate, dried, and then laser-fired.

本発明の目的を達成するための透明導電膜は、前記した組成の透明導電膜成形用塗布液及び、前記した透明導電膜の製造方法によって得られたものであることを特徴とするものである。     The transparent conductive film for achieving the object of the present invention is obtained by the transparent conductive film-forming coating liquid having the composition described above and the method for producing the transparent conductive film described above. .

本発明に係る導電膜形成用塗布液によれば、レーザー光線を吸収する有機色素を含有していることから、レーザー光線照射によって塗布膜(塗布・乾燥した膜)をパターニング(トリミング)やレーザー焼成(パターンレーザー焼成も含む)することが可能である。また、この塗布液を塗布、乾燥、焼成(加熱、又はレーザー照射)して得られる透明導電膜は透明性と導電性が良好であり、ディスプレイ、タッチパネル、太陽電池等において、透明性と導電性を兼ね備えた微細な透明導電膜パターンを要する透明電極に適用できるので、工業的に有用である。     Since the coating liquid for forming a conductive film according to the present invention contains an organic dye that absorbs a laser beam, the coating film (coated / dried film) is patterned (trimmed) or laser baked (patterned) by laser beam irradiation. Including laser firing). In addition, the transparent conductive film obtained by applying, drying, and baking (heating or laser irradiation) this coating solution has good transparency and conductivity, and in displays, touch panels, solar cells, etc., transparency and conductivity. This is industrially useful because it can be applied to a transparent electrode that requires a fine transparent conductive film pattern.

以下、本発明の実施の形態について詳細に説明する。
本発明の透明導電膜形成用塗布液は、インジウム化合物としてアセチルアセトンインジウム(以下、「AcAcIn」と表記する場合がある)、ドーパント用有機金属化合物として例えばアセチルアセトン錫(以下、「AcAcSn」と表記する場合がある)、バインダーとしてセルロース誘導体、溶剤としてアルキルフェノール及び/又はアルケニルフェノールと二塩基酸エステル及び/又は酢酸ベンジルを含有する塗布液に、所定の波長領域に吸収をもった有機色素を添加している。
したがって、上記透明導電膜形成用塗布液をガラス等の基板上に塗布、乾燥して得られる乾燥膜も、添加された有機色素と同じ波長領域に吸収を有している。
上記ドーパント用有機金属化合物としては、例えば、有機錫化合物、有機亜鉛化合物、有機タングステン化合物、有機チタン化合物、有機ジルコニア化合物等、が適用できるが、要は最終的に酸化インジウムに酸化物としてドーピングされた場合に透明導電材料としての機能を発揮できれば良く、これらに限定されない。これらの中でも有機錫化合物が透明性と導電性に優れるITOを形成できるため好ましい。有機錫化合物としては、例えば上記アセチルアセトン錫、オクチル酸錫、シュウ酸錫、蟻酸錫等が挙げられるが、錫を有効にドープできれば良く、これらに限定されない。
Hereinafter, embodiments of the present invention will be described in detail.
The coating liquid for forming a transparent conductive film of the present invention is a case where acetylacetone indium (hereinafter sometimes referred to as “AcAcIn”) is used as the indium compound, and acetylacetone tin (hereinafter referred to as “AcAcSn”) is used as the organometallic compound for the dopant. An organic dye having absorption in a predetermined wavelength region is added to a coating solution containing a cellulose derivative as a binder and alkylphenol and / or alkenylphenol and a dibasic acid ester and / or benzyl acetate as a solvent. .
Therefore, the dry film obtained by applying and drying the transparent conductive film-forming coating solution on a substrate such as glass also has absorption in the same wavelength region as the added organic dye.
As the dopant organometallic compound, for example, an organotin compound, an organozinc compound, an organotungsten compound, an organotitanium compound, an organozirconia compound, and the like can be applied. However, the indium oxide is finally doped as an oxide. However, the present invention is not limited to this as long as it can function as a transparent conductive material. Among these, an organic tin compound is preferable because it can form ITO having excellent transparency and conductivity. Examples of the organic tin compound include, but are not limited to, acetylacetone tin, tin octylate, tin oxalate, tin formate and the like, as long as tin can be effectively doped.

この乾燥膜に、添加された有機色素と同じ波長領域帯の波長を有する強力なレーザー光線を照射すると、レーザー光線を吸収して瞬間的な温度上昇が起り、照射した部分が消失する。すなわち、透明導電膜形成用塗布液を基板上に塗布、乾燥した後、不要な部分に強力なレーザー光線を照射することによって塗布膜のトリミングを行うことが可能となる。また、レーザー照射強度を、適度に調整することにより、上記乾燥膜の焼成に用いることもできる。この場合、パターン照射すればレーザー照射部分のみを透明導電膜に転化できるため、微細パターニングも可能となる。   When this dry film is irradiated with a powerful laser beam having a wavelength in the same wavelength range as the added organic dye, the laser beam is absorbed and an instantaneous temperature rise occurs, and the irradiated portion disappears. That is, after the coating liquid for forming a transparent conductive film is coated on a substrate and dried, the coating film can be trimmed by irradiating unnecessary portions with a powerful laser beam. Moreover, it can also use for baking of the said dry film by adjusting laser irradiation intensity | strength moderately. In this case, if pattern irradiation is performed, only the laser irradiation portion can be converted into a transparent conductive film, so that fine patterning is also possible.

上記有機色素の波長領域帯は、波長300〜1200nmの領域に吸収を有する有機色素であることが好ましい。
波長300nm未満の領域では、ガラス基板がレーザー光線を吸収し、熱衝撃により割れ易くなるので好ましくない。
また、波長1200nmを超えた領域では、その領域に出力波長を有する工業的に適当なレーザー(低価格、高出力)が見当たらず、また波長があまりに長くなると光ファイバーも用いることができないため好ましくない。
より具体的には、YAGレーザー(波長:1064nm、532nm[第2高調波])等の固体レーザー、GaAlAs系(波長:810nm)等の半導体レーザー等の各種レーザーの出力波長領域である、波長500nm、800nm、1000nm近辺の波長領域に吸収を有する有機色素であることが好ましい。
また、上記有機色素は、塗布・乾燥後の焼成工程において透明導電膜が形成される過程で燃焼・消失する必要があり、各種有機染料等が考えられるが、これらの条件を満たすものであれば特に限定されない。
有機色素としては、例えば、オリエント化学製のVALIFAST RED3304(極大吸収波長530nm)、VLIFAST RED 3306(極大吸収波長500nm)、VALIFAST RED 3320(極大吸収波長515nm)、VALIFAST BROWN 2402(極大吸収波長430nm)、NUBIAN BLACK PC-0850(極大吸収波長575nm)、VALIFAST BLUE 2620(極大吸収波長670nm)等、アビシア製のPRO-JET 800NP(極大吸収波長775nm)、PRO-JET 825LDI(極大吸収波長780nm)、PRO-JET 830NP(極大吸収波長810nm)、PRO-JET 950NP(極大吸収波長940nm)等、山本化成製のYKR-2200(極大吸収波長985nm)、YKR-3080(極大吸収波長1015nm)、チバ・スペシャリティ・ケミカルズ製のORASOL BLUE-GN(極大吸収波長670nm)等の有機色素を用いることができる。
The wavelength region band of the organic dye is preferably an organic dye having absorption in a wavelength region of 300 to 1200 nm.
When the wavelength is less than 300 nm, the glass substrate absorbs the laser beam and is easily broken by thermal shock, which is not preferable.
Also, in the region exceeding the wavelength of 1200 nm, an industrially suitable laser (low price, high output) having an output wavelength is not found in that region, and if the wavelength is too long, an optical fiber cannot be used.
More specifically, a wavelength of 500 nm, which is an output wavelength region of various lasers such as a solid-state laser such as a YAG laser (wavelength: 1064 nm, 532 nm [second harmonic]), a semiconductor laser such as a GaAlAs system (wavelength: 810 nm), or the like. An organic dye having absorption in a wavelength region near 800 nm or 1000 nm is preferable.
In addition, the above organic dye must burn and disappear in the process of forming a transparent conductive film in the baking process after coating and drying, and various organic dyes can be considered. There is no particular limitation.
Examples of the organic dye include VALIFAST RED3304 (maximum absorption wavelength 530 nm), VLIFAST RED 3306 (maximum absorption wavelength 500 nm), VALIFAST RED 3320 (maximum absorption wavelength 515 nm), VALIFAST BROWN 2402 (maximum absorption wavelength 430 nm) manufactured by Orient Chemical, NUBIAN BLACK PC-0850 (maximum absorption wavelength 575 nm), VALIFAST BLUE 2620 (maximum absorption wavelength 670 nm), etc., PRO-JET 800NP (maximum absorption wavelength 775 nm), PRO-JET 825LDI (maximum absorption wavelength 780 nm), PRO-JET JET 830NP (maximum absorption wavelength 810 nm), PRO-JET 950NP (maximum absorption wavelength 940 nm), etc., Yamamoto Kasei YKR-2200 (maximum absorption wavelength 985 nm), YKR-3080 (maximum absorption wavelength 1015 nm), Ciba Specialty Chemicals An organic dye such as ORASOL BLUE-GN (maximum absorption wavelength: 670 nm) manufactured by the company can be used.

有機色素は、レーザー照射による上記乾燥膜のパターニング(トリミング)やレーザー焼成(パターンレーザー焼成も含む)をするために必要であり、0.05〜2重量%であることが好ましい。含有量が0.05重量%未満であると、レーザー光線を吸収し難くなりトリミング性や焼成効果(レーザー照射時の乾燥膜の温度上昇)が損なわれる。また2重量%より多いと、焼成工程において色素が燃焼消失して多孔質のITO膜を形成するため、膜強度や導電性が損なわれる。   The organic dye is necessary for patterning (trimming) and laser firing (including pattern laser firing) of the dried film by laser irradiation, and is preferably 0.05 to 2% by weight. When the content is less than 0.05% by weight, it becomes difficult to absorb the laser beam, and the trimming property and the firing effect (temperature rise of the dry film during laser irradiation) are impaired. On the other hand, when the content is more than 2% by weight, the dye is burnt and lost in the baking step to form a porous ITO film, so that the film strength and conductivity are impaired.

AcAcInとAcAcSn等のドーパント用有機金属化合物は、基板上に透明導電性被膜を形成させるための主たる化合物原料であり、その合計含有量は1〜30重量%の範囲であることが好ましく、更に好ましくは5〜20重量%とするのが良い。含有量が1重量%未満であるとITO膜の膜厚が薄くなり十分な導電性が得られず、30重量%より多いと膜に亀裂(クラック)が発生して導電性が損なわれる。また、AcAcInとドーパント用有機金属化合物の含有割合は、AcAcIn/ドーパント用有機金属化合物重量比=99/1〜80/20程度が好ましく、更に好ましくは95/5〜85/15が良く、この重量比外であるとキャリア密度、あるいはキャリア移動度が減少して導電性が急激に悪化するので好ましくない。   Organometallic compounds for dopants such as AcAcIn and AcAcSn are main compound raw materials for forming a transparent conductive film on a substrate, and the total content is preferably in the range of 1 to 30% by weight, more preferably Is preferably 5 to 20% by weight. If the content is less than 1% by weight, the film thickness of the ITO film becomes thin and sufficient conductivity cannot be obtained. If the content is more than 30% by weight, the film is cracked and the conductivity is impaired. The content ratio of AcAcIn and the organometallic compound for dopant is preferably about AcAcIn / organometallic compound for dopant = 99/1 to 80/20, more preferably 95/5 to 85/15. If the ratio is out of the range, the carrier density or the carrier mobility is decreased, and the conductivity is rapidly deteriorated.

バインダーとしては、基板に対する濡れ性が改善されると同時に塗布液の粘度調整を行うことができ、かつ焼成温度以下で燃焼する材料であれば良い。このような材料としてセルロース誘導体が有効であり、メチルセルロース、エチルセルロース、ヒドロキシプロピルセルロース(以下、「HPC」と表記する場合がある)等が挙げられるが、中でもHPCが好ましい。HPCを用いれば0.1〜5重量%の含有量で十分な濡れ性(ハジキ抑制)が得られると同時に、低粘度から高粘度まで広範囲の粘度調整を行うことができる。また、HPCの燃焼開始温度は300℃程度であり、従って塗布、乾燥後の基板を400℃以上の温度で焼成すればHPCが熱分解するので、生成するITO粒子の粒成長を阻害せず、良好な導電性をもった膜を形成することができる。
ここで、HPCの含有量が0.1重量%未満だと、基板に対する濡れ性が悪化し、塗布後の乾燥工程において塗布液のハジキを生じて不均一膜を形成したり、あるいは焼成すると膜に亀裂が発生するなど、成膜性が損なわれる。一方、HPCの含有量が5重量%より多くなると、塗布液中にゲル状のHPCが残留し易くなると同時に、膜の緻密化が抑制されるため、多孔質のITO膜を形成して導電性が損なわれる。
また、セルロース誘導体として、例えばHPCの代わりにエチルセルロースを用いた場合は、塗布液の粘度はHPCを用いた場合の大略1/100となり、パターン印刷性、膜厚均一性等の印刷性がやや劣る。
As the binder, any material may be used as long as the wettability with respect to the substrate is improved and the viscosity of the coating solution can be adjusted, and the material burns at a firing temperature or lower. A cellulose derivative is effective as such a material, and examples thereof include methyl cellulose, ethyl cellulose, hydroxypropyl cellulose (hereinafter sometimes referred to as “HPC”), and among them, HPC is preferable. When HPC is used, sufficient wettability (restraint) is obtained at a content of 0.1 to 5% by weight, and at the same time, a wide range of viscosity adjustment from low viscosity to high viscosity can be performed. Also, the combustion start temperature of HPC is about 300 ° C. Therefore, if the substrate after coating and drying is baked at a temperature of 400 ° C. or higher, HPC is thermally decomposed, so that it does not hinder the grain growth of the generated ITO particles, A film having good conductivity can be formed.
Here, when the HPC content is less than 0.1% by weight, the wettability with respect to the substrate deteriorates, and the coating liquid repels in the drying process after coating, forming a non-uniform film, or film when fired. The film formability is impaired, for example, cracks occur. On the other hand, if the HPC content is more than 5% by weight, gel-like HPC is likely to remain in the coating solution and at the same time densification of the film is suppressed. Is damaged.
In addition, for example, when ethyl cellulose is used as the cellulose derivative instead of HPC, the viscosity of the coating solution is approximately 1/100 when HPC is used, and the printability such as pattern printability and film thickness uniformity is slightly inferior. .

溶剤としては、AcAcIn、AcAcSn等のドーパント用有機金属化合物、セルロース誘導体を良く溶解するアルキルフェノール及び/又はアルケニルフェノールと、二塩基酸エステル及び/又は酢酸ベンジルの混合溶液を用いる。アルキルフェノール、アルケニルフェノールとしては、クレゾール類、パラターシャリーブチルフェノール、オクチルフェノール、ノニルフェノール、カシューナット殻液[3−ペンタデカデシールフェノール]等が挙げられる。二塩基酸エステルとしては、コハク酸エステル、グルタル酸エステル、アジピン酸エステル等が挙げられる。   As the solvent, a mixed solution of an organometallic compound for dopants such as AcAcIn and AcAcSn, an alkylphenol and / or alkenylphenol that dissolves cellulose derivatives well, and a dibasic acid ester and / or benzyl acetate is used. Examples of the alkylphenol and alkenylphenol include cresols, para-tert-butylphenol, octylphenol, nonylphenol, cashew nut shell liquid [3-pentadedecydeal phenol] and the like. Examples of the dibasic acid ester include succinic acid ester, glutaric acid ester, and adipic acid ester.

本発明の透明導電膜形成用塗布液は、前記のインジウム化合物、ドーパント用有機金属化合物、バインダー、有機色素を溶剤に加熱溶解させることによって作製することができる。加熱溶解は、加熱温度を60〜200℃として0.5〜12時間攪拌することにより行われる。加熱温度が60℃よりも低いと溶解が進まず、アセチルアセトンインジウムやドーパント用有機金属化合物としてのアセチルアセトン錫が析出しやすくなり特性が低下してしまい、200℃よりも高いと溶剤の蒸発が顕著となりと塗布液組成が変化してしまうので好ましくない。有機色素については、溶解性が良いものは加熱溶解後の冷却溶液に添加して攪拌溶解させても良い。   The coating liquid for forming a transparent conductive film of the present invention can be prepared by heating and dissolving the indium compound, the organometallic compound for dopant, the binder, and the organic dye in a solvent. Heating dissolution is performed by stirring at 0.5 to 12 hours at a heating temperature of 60 to 200 ° C. When the heating temperature is lower than 60 ° C, dissolution does not proceed, and acetylacetone indium and acetylacetone tin as an organic metal compound for dopant are liable to be precipitated and the characteristics are deteriorated. When the heating temperature is higher than 200 ° C, evaporation of the solvent becomes remarkable. And the coating liquid composition changes, which is not preferable. As for organic dyes, those having good solubility may be added to the cooled solution after dissolution by heating and dissolved by stirring.

また、本発明の透明導電膜は、前記透明導電膜形成用塗布液を基板上に塗布、乾燥し、必要に応じパターニング(レーザートリミング)し、その後、加熱焼成やレーザー焼成することにより製造する。レーザー照射によるパターンレーザー焼成も可能である。   The transparent conductive film of the present invention is produced by applying the transparent conductive film-forming coating solution onto a substrate, drying, patterning (laser trimming) as necessary, and then heating and baking. Pattern laser firing by laser irradiation is also possible.

塗布方法としては、塗布液の粘度をセルロース誘導体の種類や含有量及び溶剤の種類によって数mPa・s〜数十万mPa・sと大幅に調整することができるので、スピンコート、スプレーコート、ワイヤーバーコート、ディップコート、スクリーン印刷、インクジェット印刷といった各種塗布方法が適用できる。
例えば、高粘度タイプのHPCとフェノール類とを組合せれば、ワイヤーバーコートやスクリーン印刷に好適な120k〜300kmPa・s程度の高粘度塗布液が得られる。また、低粘度タイプのHPCを用いた塗布液を更にアルコール類等の溶剤で希釈することも可能で、この場合スピンコート、スプレーコート、ディップコートに好適な数mPa・s程度の低粘度塗布液が得られる。溶剤の沸点や粘度を最適化すれば、インクジェット印刷に適した塗布液を得ることも可能であり、例えば、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールモノブチルエーテルアセテート、ジエチレングリコールジエチルエーテル等のジエチレングリコール誘導体を、前記溶剤であるアルキルフェノール及び/又はアルケニルフェノールと、二塩基酸エステル及び/又は酢酸ベンジルの一部と置換えて得ることができる。
As the coating method, the viscosity of the coating liquid can be adjusted to several mPa · s to several hundred thousand mPa · s depending on the type and content of the cellulose derivative and the type of solvent, so that spin coating, spray coating, wire Various coating methods such as bar coating, dip coating, screen printing, and ink jet printing can be applied.
For example, when a high-viscosity type HPC and phenols are combined, a high-viscosity coating solution of about 120 k to 300 kmPa · s suitable for wire bar coating and screen printing can be obtained. In addition, it is possible to further dilute a coating solution using a low-viscosity type HPC with a solvent such as alcohols. Is obtained. By optimizing the boiling point and viscosity of the solvent, it is also possible to obtain a coating solution suitable for inkjet printing, for example, diethylene glycol derivatives such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol diethyl ether, It can be obtained by substituting a part of dibasic acid ester and / or benzyl acetate with alkylphenol and / or alkenylphenol which is a solvent.

尚、上記パターニング(レーザートリミング)は、塗布液を塗布した基板を80〜180℃の温度で10〜60分乾燥した後、有機色素の光線吸収波長に相当するレーザー光線を照射して、照射部の瞬間的な加熱による破壊除去により行われる。レーザー焼成の場合は、照射部が破壊しないようにレーザー光線の照射強度を調整して行われる。レーザー光線は、上述のように、例えば、光線波長が500nm、800nm、1000nm付近のものを用いるが、一般に用いられるレーザーであれば特にこれらに制限されない。   In the patterning (laser trimming), the substrate coated with the coating liquid is dried at a temperature of 80 to 180 ° C. for 10 to 60 minutes, and then irradiated with a laser beam corresponding to the light absorption wavelength of the organic dye. This is done by destructive removal by instantaneous heating. In the case of laser firing, the irradiation intensity of the laser beam is adjusted so that the irradiated part is not destroyed. As described above, for example, a laser beam having a light wavelength of around 500 nm, 800 nm, or 1000 nm is used, but the laser beam is not particularly limited as long as it is a commonly used laser.

加熱焼成は、必要に応じパターニング(レーザートリミング)された乾燥膜付基板を焼成炉に入れて400〜800℃に加熱し、15〜60分保持することにより行われる。焼成温度は基材の耐熱温度にもよるが、ITO透明導電膜の導電性は、焼成温度が高いほどITO粒子の粒成長が促進され向上するため、膜の導電性の観点からすると、高いほど好ましい。焼成雰囲気については、バインダーおよび有機色素の燃焼分解のため、まず、酸素を含む雰囲気(例えば、大気雰囲気)で行う必要があるが、窒素雰囲気での焼成を併用すればキャリア密度が増加して大幅に導電性が向上する。
レーザー焼成も同様に、必要に応じパターニング(レーザートリミング)された乾燥膜にレーザー光線を照射し、照射部を例えば数百℃以上になるように設定して行われる。雰囲気については、加熱焼成と同様である。レーザー焼成では、パターン照射して照射部分のみを透明導電膜に転化し、未照射部分の乾燥膜を除去(例えば溶剤等での溶解)すれ方法でも微細パターニングを得ることができる。
[実施例]
Heating and baking are performed by putting a substrate with a dry film patterned (laser trimming) as necessary into a baking furnace, heating to 400 to 800 ° C., and holding for 15 to 60 minutes. Although the firing temperature depends on the heat-resistant temperature of the base material, the conductivity of the ITO transparent conductive film increases as the firing temperature increases, so that the grain growth of the ITO particles is promoted and improved. preferable. Regarding the firing atmosphere, it is necessary to first carry out in an oxygen-containing atmosphere (for example, air atmosphere) for burning and decomposing the binder and the organic dye, but if the firing in a nitrogen atmosphere is used in combination, the carrier density increases greatly. The conductivity is improved.
Similarly, laser firing is performed by irradiating a dry film patterned (laser trimming) with a laser beam as necessary, and setting the irradiated portion to be, for example, several hundred degrees Celsius or higher. About atmosphere, it is the same as that of heat-firing. In laser firing, fine patterning can also be obtained by a pattern irradiation method in which only an irradiated portion is converted into a transparent conductive film, and a dry film in an unirradiated portion is removed (for example, dissolution in a solvent or the like).
[Example]

以下、本発明の実施例について具体的に説明するが、本発明はこれら実施例に限定されるものではない。   Examples of the present invention will be specifically described below, but the present invention is not limited to these examples.

アセチルアセトンインジウム9.10g、アセチルアセトン錫0.90g、パラターシャリーブチルフェノール34.96g、二塩基酸エステル(デュポンジャパン製)52.44gを混合し、130℃に加温して90分間攪拌して溶解させた後、ヒドロキシプロピルセルロース2.60gを加えて90分間攪拌して溶解させた(A液)。   9.10 g acetylacetone indium, 0.90 g acetylacetone tin, 34.96 g paratertiary butylphenol, 52.44 g dibasic acid ester (manufactured by DuPont Japan) are mixed, heated to 130 ° C. and stirred for 90 minutes to dissolve. After that, 2.60 g of hydroxypropylcellulose was added and dissolved by stirring for 90 minutes (solution A).

有機色素としてオリエント化学製のVALIFAST RED 3304(極大吸収波長530nm)を用い、パラターシャリーブチルフェノール40重量部と二塩基酸エステル60重量部の混合溶液に溶解させ、VALIFAST RED 3304を1重量%含有する有機色素溶液を調製した(B液)。   VALIFAST RED 3304 (maximum absorption wavelength 530 nm) manufactured by Orient Chemical is used as an organic dye, dissolved in a mixed solution of 40 parts by weight of paratertiary butylphenol and 60 parts by weight of dibasic acid ester, and 1% by weight of VALIFAST RED 3304 is contained. An organic dye solution was prepared (Liquid B).

A液4gとB液1gを混合し、アセチルアセトンインジウムとアセチルアセトン錫を8重量%、ヒドロキシプロピルセルロースを2.08重量%、有機色素としてVALIFAST RED3304を0.2重量%含有する透明導電膜形成用塗布液を調製した。この塗布液をソーダライムガラス基板上にワイヤーバーコートし、実施例1に係る塗布膜付きのガラス基板を得た。   4g of liquid A and 1g of liquid B are mixed, coating for forming transparent conductive film containing 8% by weight of acetylacetone indium and acetylacetone tin, 2.08% by weight of hydroxypropylcellulose, and 0.2% by weight of VALIFAST RED3304 as an organic dye A liquid was prepared. This coating solution was wire bar coated on a soda lime glass substrate to obtain a glass substrate with a coating film according to Example 1.

有機色素としてオリエント化学製のVALIFAST RED 3306(極大吸収波長500nm)を用いた以外は実施例1と同様に行い、実施例2に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 2 was obtained in the same manner as in Example 1 except that VALIFAST RED 3306 (maximum absorption wavelength: 500 nm) manufactured by Orient Chemical was used as the organic dye.

有機色素としてオリエント化学製のVALIFAST RED 3320(極大吸収波長515nm)を用いた以外は実施例1と同様に行い、実施例3に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 3 was obtained in the same manner as in Example 1 except that VALIFAST RED 3320 (maximum absorption wavelength 515 nm) manufactured by Orient Chemical was used as the organic dye.

有機色素としてオリエント化学製のVALIFAST BLACK 1807(極大吸収波長580nm)を用いた以外は実施例1と同様に行い、実施例4に係る塗布膜付きガラス基板を得た。   A glass substrate with a coating film according to Example 4 was obtained in the same manner as in Example 1 except that VALIFAST BLACK 1807 (maximum absorption wavelength 580 nm) manufactured by Orient Chemical was used as the organic dye.

有機色素としてオリエント化学製のVALIFAST BROWN 2402(極大吸収波長430nm)を用いた以外は実施例1と同様に行い、実施例5に係る塗布膜付きガラス基板を得た。   A glass substrate with a coating film according to Example 5 was obtained in the same manner as in Example 1 except that VALIFAST BROWN 2402 (maximum absorption wavelength: 430 nm) manufactured by Orient Chemical was used as the organic dye.

有機色素としてオリエント化学製のNUBIAN BLACK PC-0850(極大吸収波長575nm)を用いた以外は実施例1と同様に行い、実施例6に係る塗布膜付きガラス基板を得た。   A glass substrate with a coating film according to Example 6 was obtained in the same manner as in Example 1 except that NUBIAN BLACK PC-0850 (maximum absorption wavelength 575 nm) manufactured by Orient Chemical was used as the organic dye.

有機色素としてアビシア製のPRO-JET 800NP(極大吸収波長775nm)を用いた以外は実施例1と同様に行い、実施例7に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 7 was obtained in the same manner as in Example 1 except that Avicia PRO-JET 800NP (maximum absorption wavelength 775 nm) was used as the organic dye.

有機色素としてアビシア製のPRO-JET 825LDI(極大吸収波長780nm)を用いた以外は実施例1と同様に行い、実施例8に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 8 was obtained in the same manner as in Example 1 except that PRO-JET 825LDI (maximum absorption wavelength 780 nm) manufactured by Avisia was used as the organic dye.

有機色素としてアビシア製のPRO-JET 830NP(極大吸収波長810nm)を用いた以外は実施例1と同様に行い、実施例9に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 9 was obtained in the same manner as in Example 1 except that Avicia PRO-JET 830NP (maximum absorption wavelength 810 nm) was used as the organic dye.

有機色素としてアビシア製のPRO-JET 950NP(極大吸収波長940nm)を用いた以外は実施例1と同様に行い、実施例10に係る塗布膜付きのガラス基板を   A glass substrate with a coating film according to Example 10 was prepared in the same manner as in Example 1 except that PRO-JET 950NP (maximum absorption wavelength 940 nm) manufactured by Avisia was used as the organic dye.

有機色素として山本化成製のYKR-2200(極大吸収波長985nm)を用いた以外は実施例1と同様に行い、実施例11に係る塗布膜付きのガラス基板を得た。   A glass substrate with a coating film according to Example 11 was obtained in the same manner as in Example 1 except that YKR-2200 (maximum absorption wavelength: 985 nm) manufactured by Yamamoto Kasei was used as the organic dye.

有機色素として山本化成製のYKR-3080(極大吸収波長1015nm)を用いた以外は実施例1と同様に行い、実施例12に係る塗布膜付きガラス基板を得た。   A glass substrate with a coating film according to Example 12 was obtained in the same manner as in Example 1 except that YKR-3080 (maximum absorption wavelength: 1015 nm) manufactured by Yamamoto Kasei was used as the organic dye.

有機色素としてチバ・スペシャリティ・ケミカルズ製のORASOL BLUE-GN(極大吸収波長670nm)を用いた以外は実施例1と同様に行い、実施例13に係る塗布膜付きガラス基板を得た。   A glass substrate with a coating film according to Example 13 was obtained in the same manner as in Example 1 except that ORASOL BLUE-GN (maximum absorption wavelength: 670 nm) manufactured by Ciba Specialty Chemicals was used as the organic dye.

有機色素としてオリエント化学製のVALIFAST BLUE 2620(極大吸収波長670nm)を用いた以外は実施例1と同様に行い、実施例14に係る塗布膜付きのガラス基板を得た。

(比較例1)
A glass substrate with a coating film according to Example 14 was obtained in the same manner as in Example 1 except that VALIFAST BLUE 2620 (maximum absorption wavelength: 670 nm) manufactured by Orient Chemical was used as the organic dye.

(Comparative Example 1)

A液4.0gをパラターシャリーブチルフェノール40重量部と二塩基酸エステル60重量部の混合溶液1.0gと混合し、アセチルアセトンインジウムとアセチルアセトン錫を8重量%、ヒドロキシプロピルセルロースを2.08重量%含有する透明導電膜形成用塗布液を調製し、ソーダライムガラス基板上にワイヤーバーコートして、比較例1に係る塗布膜付きのガラス基板を得た。   4.0 g of liquid A is mixed with 1.0 g of a mixed solution of 40 parts by weight of para-tert-butylphenol and 60 parts by weight of dibasic acid ester, 8% by weight of acetylacetone indium and acetylacetone tin, and 2.08% by weight of hydroxypropylcellulose. The coating liquid for transparent conductive film formation which contains was prepared, the bar | burr bar coating was carried out on the soda-lime glass substrate, and the glass substrate with the coating film which concerns on the comparative example 1 was obtained.

このようにして得られた各実施例に係る塗布膜付きガラス基板と比較例に係る塗布膜付きガラス基板を120℃で30分間乾燥し、日立製作所製分光計(U−4000)を用いて極大吸収波長における光線透過率を測定した。その結果を表1に示す。   The glass substrate with a coating film according to each example obtained in this manner and the glass substrate with a coating film according to a comparative example were dried at 120 ° C. for 30 minutes, and the maximum was obtained using a spectrometer (U-4000) manufactured by Hitachi, Ltd. The light transmittance at the absorption wavelength was measured. The results are shown in Table 1.

尚、上述の透過率は、膜のみの透過率であって、以下の様にして求めている。すなわち、
膜の透過率(%)
=[(透明導電性基材ごと測定した透過率)/(ガラス基板の透過率)]×100
The above-described transmittance is the transmittance of only the membrane, and is determined as follows. That is,
Membrane permeability (%)
= [(Transmittance measured for each transparent conductive substrate) / (transmittance of glass substrate)] × 100

Figure 2006128098
Figure 2006128098

表1における実施例1〜14に係る乾燥膜においては、それぞれ波長300〜1200nmの領域において光線透過率が低下した乾燥膜が形成されており、各波長に相当するレーザー光線を照射すると、そのレーザー光線を吸収するため、塗布膜のパターニング(トリミング)やレーザー焼成が可能である。一方、比較例1に係る乾燥膜では、波長300〜1200nmの領域における光線透過率がほぼ100%であり、レーザー光線を照射しても透過してしまうので塗布膜のパターニング(トリミング)やレーザー焼成ができない。   In the dry film | membrane which concerns on Examples 1-14 in Table 1, the dry film | membrane with which the light transmittance fell in the area | region of wavelength 300-1200 nm is formed, respectively, When irradiating the laser beam corresponding to each wavelength, the laser beam will be irradiated. Since it absorbs, patterning (trimming) of the coating film and laser baking are possible. On the other hand, in the dry film according to Comparative Example 1, the light transmittance in the wavelength region of 300 to 1200 nm is almost 100%, and it is transmitted even when irradiated with a laser beam. Can not.

次に、上記の各実施例に係る乾燥膜と比較例1に係る乾燥膜を550℃で30分間焼成し、形成した透明導電膜の表面抵抗値、可視光線透過率とヘイズ値、使用した有機色素の極大吸収波長における光線透過率を、それぞれ三菱化学製の表面抵抗計(MCP−T350)、村上色彩技術研究所製ヘイズメーター(HR−200)、日立製作所製分光計(U−4000)を用いて測定した。その結果を表2に示す。
実施例12に係る乾燥膜に対し、レーザー光線をパターン照射しレーザー焼成した後、有機溶剤で未照射部分の乾燥膜を除去し、パターン透明導電膜を得た。この透明導電膜の膜特性は、表2の実施例12の結果と同程度であった。
Next, the dried film according to each of the above examples and the dried film according to Comparative Example 1 were baked at 550 ° C. for 30 minutes, the surface resistance value, visible light transmittance and haze value of the formed transparent conductive film, and the organic used. The light transmittance at the maximum absorption wavelength of the dye was measured with a surface resistance meter (MCP-T350) manufactured by Mitsubishi Chemical, a haze meter (HR-200) manufactured by Murakami Color Research Laboratory, and a spectrometer (U-4000) manufactured by Hitachi, Ltd. And measured. The results are shown in Table 2.
The dry film according to Example 12 was irradiated with a laser beam in a pattern and baked with a laser beam, and then the unirradiated part of the dry film was removed with an organic solvent to obtain a patterned transparent conductive film. The film characteristics of this transparent conductive film were similar to the results of Example 12 in Table 2.

Figure 2006128098
Figure 2006128098

実施例の有機色素を0.05〜2重量%含有する透明導電膜形成用塗布液は、透明性や導電性を損なうことなく、透明導電膜が形成されることがわかる。     It turns out that the transparent electrically conductive film is formed, without impairing transparency and electroconductivity, for the coating liquid for forming a transparent electrically conductive film containing 0.05 to 2% by weight of the organic dye of the example.

本発明の透明導電膜形成用塗布液を用いれば、乾燥膜の段階で、レーザー光線を吸収するため、レーザー照射によるパターニング(トリミング)やレーザー焼成が可能であり、かつ、塗布液中の有機色素は焼成工程で燃焼除去されるため、従来と同等の透明性と導電性を有した透明導電膜を形成することができる。


If the coating liquid for forming a transparent conductive film of the present invention is used, a laser beam is absorbed at the stage of a dry film, so that patterning (trimming) and laser firing by laser irradiation are possible, and the organic dye in the coating liquid is Since it is burned and removed in the firing step, a transparent conductive film having transparency and conductivity equivalent to those of the conventional one can be formed.


Claims (11)

アセチルアセトンインジウム、ドーパント用有機金属化合物、セルロース誘導体、有機色素、アルキルフェノール及び/又はアルケニルフェノール、二塩基酸エステル及び/又は酢酸ベンジルを含有する透明導電膜形成用塗布液であって、アセチルアセトンインジウムとドーパント用有機金属化合物との合計含有量が1〜30重量%、セルロース誘導体の含有量が0.1〜5重量%、有機色素の含有量が0.05〜2重量%であることを特徴とする透明導電膜形成用塗布液。   A coating liquid for forming a transparent conductive film containing indium acetylacetone, organometallic compound for dopant, cellulose derivative, organic dye, alkylphenol and / or alkenylphenol, dibasic acid ester and / or benzyl acetate, for indium acetylacetone and dopant Transparent, characterized in that the total content with the organometallic compound is 1 to 30% by weight, the content of the cellulose derivative is 0.1 to 5% by weight, and the content of the organic dye is 0.05 to 2% by weight Coating liquid for forming a conductive film. 前記該有機色素は、波長300〜1200nmの領域に吸収をもつことを特徴とする請求項1に記載の透明導電膜形成用塗布液。   The coating liquid for forming a transparent conductive film according to claim 1, wherein the organic dye has absorption in a wavelength region of 300 to 1200 nm. 前記アセチルアセトンインジウムとドーパント用有機金属化合物の合計含有量が5〜20重量%であることを特徴とする請求項1又は2に記載の透明導電膜形成用塗布液。   The total content of the said acetylacetone indium and the organometallic compound for dopants is 5 to 20 weight%, The coating liquid for transparent conductive film formation of Claim 1 or 2 characterized by the above-mentioned. 前記アセチルアセトンインジウムとドーパント用有機金属化合物の含有割合がアセチルアセトンインジウム/有機錫化合物の重量比=99/1〜80/20であることを特徴とする請求項1〜3のいずれか1項に記載の透明導電膜形成用塗布液。   The content ratio of the acetylacetone indium and the organometallic compound for dopant is a weight ratio of acetylacetone indium / organotin compound = 99/1 to 80/20, according to any one of claims 1 to 3. Coating liquid for forming transparent conductive film. 前記ドーパント用有機金属化合物が、有機錫化合物であることを特徴とする請求項1〜4のいずれか1項に記載の透明導電膜形成用塗布液。   The coating liquid for forming a transparent conductive film according to claim 1, wherein the organometallic compound for dopant is an organotin compound. 前記有機錫化合物が、アセチルアセトン錫であることを特徴とする請求項5に記載の透明導電膜形成用塗布液。   6. The coating liquid for forming a transparent conductive film according to claim 5, wherein the organic tin compound is acetylacetone tin. 前記セルロース誘導体が、ヒドロキシプロピルセルロースであることを特徴とする請求項1〜6のいずれか1項に記載の透明導電膜形成用塗布液。   The coating liquid for forming a transparent conductive film according to claim 1, wherein the cellulose derivative is hydroxypropylcellulose. 請求項1〜7のいずれか1項に記載の透明導電膜形成用塗布液を基板上に塗布し、乾燥した後、400℃以上の温度で焼成することを特徴とする透明導電膜の製造方法。   A method for producing a transparent conductive film, comprising: applying a coating liquid for forming a transparent conductive film according to any one of claims 1 to 7 on a substrate; drying the coating liquid; and firing at a temperature of 400 ° C or higher. . 請求項1〜7のいずれか1項に記載の透明導電膜形成用塗布液を基板上に塗布し、乾燥した後、レーザー焼成することを特徴とする透明導電膜の製造方法。   A method for producing a transparent conductive film, comprising applying the coating liquid for forming a transparent conductive film according to any one of claims 1 to 7 on a substrate, drying the resultant, and then performing laser firing. 前記透明導電膜形成用塗布液の基板上への塗布をスクリーン印刷法またはワイヤーバーコート法で行うことを特徴とする請求項8又は9に記載の透明導電膜の製造方法。   The method for producing a transparent conductive film according to claim 8 or 9, wherein the coating liquid for forming the transparent conductive film is applied on a substrate by a screen printing method or a wire bar coating method. 請求項8〜10のいずれか1項に記載の透明導電膜の製造方法で得られた透明導電膜。


The transparent conductive film obtained with the manufacturing method of the transparent conductive film of any one of Claims 8-10.


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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006313303A (en) * 2004-11-24 2006-11-16 Dainippon Printing Co Ltd Optical filter and display using the same
JP2008277249A (en) * 2006-12-21 2008-11-13 Fujifilm Corp Electrically conductive film, and manufacturing method thereof
WO2012015245A2 (en) * 2010-07-30 2012-02-02 주식회사 잉크테크 Transparent conductive film-preparing method and transparent film prepared therefrom
JP2012022833A (en) * 2010-07-13 2012-02-02 Fujifilm Corp Manufacturing method of conductive film
JP2014518589A (en) * 2011-04-12 2014-07-31 ダイパワー Sintering method for metal oxide compounds
JP2016171012A (en) * 2015-03-13 2016-09-23 東洋インキScホールディングス株式会社 Conductive paste for laser processing and use of the same
JP2016171013A (en) * 2015-03-13 2016-09-23 東洋インキScホールディングス株式会社 Conductive paste for laser processing and use of the same
JP2018117125A (en) * 2017-01-20 2018-07-26 エルジー エレクトロニクス インコーポレイティド Heterojunction solar battery and manufacturing method of the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02267812A (en) * 1989-04-06 1990-11-01 Kanegafuchi Chem Ind Co Ltd Manufacture of patterned tin oxide transparent conductive thin film and composite used therefor
JPH06203658A (en) * 1992-12-28 1994-07-22 Sumitomo Metal Mining Co Ltd Coating solution for stranparent conductive film formation
JP2002194287A (en) * 2000-12-27 2002-07-10 Sumitomo Osaka Cement Co Ltd Coating material for forming transparent electroconductive film and transparent electroconductive film and display
JP2004127820A (en) * 2002-10-04 2004-04-22 Toyobo Co Ltd Transparent conductive film, transparent conductive sheet, and touch panel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02267812A (en) * 1989-04-06 1990-11-01 Kanegafuchi Chem Ind Co Ltd Manufacture of patterned tin oxide transparent conductive thin film and composite used therefor
JPH06203658A (en) * 1992-12-28 1994-07-22 Sumitomo Metal Mining Co Ltd Coating solution for stranparent conductive film formation
JP2002194287A (en) * 2000-12-27 2002-07-10 Sumitomo Osaka Cement Co Ltd Coating material for forming transparent electroconductive film and transparent electroconductive film and display
JP2004127820A (en) * 2002-10-04 2004-04-22 Toyobo Co Ltd Transparent conductive film, transparent conductive sheet, and touch panel

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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JP2008277249A (en) * 2006-12-21 2008-11-13 Fujifilm Corp Electrically conductive film, and manufacturing method thereof
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JP2012022833A (en) * 2010-07-13 2012-02-02 Fujifilm Corp Manufacturing method of conductive film
WO2012015245A3 (en) * 2010-07-30 2012-04-05 주식회사 잉크테크 Transparent conductive film-preparing method and transparent film prepared therefrom
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US9269478B2 (en) 2010-07-30 2016-02-23 Inktec Co., Ltd. Transparent conductive film-preparing method and transparent film prepared therefrom
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JP2014518589A (en) * 2011-04-12 2014-07-31 ダイパワー Sintering method for metal oxide compounds
JP2016171012A (en) * 2015-03-13 2016-09-23 東洋インキScホールディングス株式会社 Conductive paste for laser processing and use of the same
JP2016171013A (en) * 2015-03-13 2016-09-23 東洋インキScホールディングス株式会社 Conductive paste for laser processing and use of the same
JP2018117125A (en) * 2017-01-20 2018-07-26 エルジー エレクトロニクス インコーポレイティド Heterojunction solar battery and manufacturing method of the same
US10249776B2 (en) 2017-01-20 2019-04-02 Lg Electronics Inc. Heterojunction solar cell and manufacturing method thereof

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