JP2006124545A - Method for producing aromatic polyamide resin - Google Patents
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本発明は純度の高い芳香族ポリアミド樹脂の製造方法に関する。 The present invention relates to a method for producing a highly pure aromatic polyamide resin.
ポリアミド樹脂、特に主鎖に芳香族基を含有するポリアミド樹脂は、耐熱性、機械強度等に優れた特性を持ち、さまざまな工業用途に応用が期待されている。これらポリアミド樹脂は一般にジカルボン酸とジアミン、及び/または構造中にカルボン酸とアミノ基を1つずつ有する化合物を原料とし、縮合反応により得られるが、反応を進行させるために加えられる縮合剤や触媒、添加剤、あるいは反応中に生成する副生成物等に由来するイオン性の不純物を含有するため、電気的絶縁性を求められる用途への使用が制限されている。特に、アミンとカルボン酸を芳香族亜リン酸エステルとピリジン誘導体の存在下で縮合させる方法は広く行われている縮合反応であるが、本法で合成されたポリアミド樹脂中には芳香族亜リン酸エステルに由来するリン系のイオン性不純物が残りやすい。特許文献1において、調製されたポリアミド樹脂を洗浄性の良い微粉末として取り出すことにより不純物の少ないポリアミド樹脂を製造する方法が考案されたが、ますます高度化する電気絶縁性の要求水準を満足させるまでには至っていない。また、特許文献2においてはポリアミド樹脂を反応溶液から微粉末として析出させ、反応溶液から単離されたポリアミド樹脂の微粉末から低分子量成分を水蒸気洗浄した後、更に溶剤に溶解し有機アミン化合物等の塩基性化合物を添加して処理し、再度微粉末として析出させる方法が記載されている。この場合は微粉末の水蒸気洗浄が不均一系での洗浄であり、突沸やその結果として収率の低下などの問題が指摘されている。また、原料の有機アミンがポリアミド樹脂の微粉末中に残存し、その後の樹脂組成物の物性に悪影響を与える点も問題視されている。 Polyamide resins, particularly polyamide resins containing aromatic groups in the main chain, have excellent heat resistance and mechanical strength, and are expected to be applied to various industrial applications. These polyamide resins are generally obtained by a condensation reaction using a dicarboxylic acid and a diamine and / or a compound having one carboxylic acid and an amino group in the structure as raw materials, but a condensing agent or catalyst added to advance the reaction. In addition, since it contains ionic impurities derived from additives or by-products generated during the reaction, its use in applications requiring electrical insulation is limited. In particular, the method of condensing an amine and a carboxylic acid in the presence of an aromatic phosphite and a pyridine derivative is a widely used condensation reaction, but the polyamide resin synthesized by this method contains an aromatic phosphite. Phosphorus ionic impurities derived from acid esters are likely to remain. Patent Document 1 devised a method for producing a polyamide resin with less impurities by taking out the prepared polyamide resin as fine powder with good cleaning properties, but it satisfies the increasingly required level of electrical insulation. It has not yet reached. Further, in Patent Document 2, a polyamide resin is precipitated as a fine powder from a reaction solution, a low molecular weight component is washed with water vapor from a fine powder of a polyamide resin isolated from the reaction solution, and further dissolved in a solvent to dissolve an organic amine compound, etc. A method is described in which a basic compound is added, treated and precipitated again as a fine powder. In this case, water vapor cleaning of fine powder is cleaning in a non-uniform system, and problems such as bumping and a decrease in yield as a result have been pointed out. Another problem is that the raw material organic amine remains in the fine powder of the polyamide resin, which adversely affects the physical properties of the subsequent resin composition.
本発明は、高度な電気絶縁性を要する分野の材料としても使用できるレベルまで不純物が少ない芳香族ポリアミド樹脂を簡略でしかも安全な工程で製造する方法を提供することを目的としたものである。 An object of the present invention is to provide a method for producing an aromatic polyamide resin with few impurities to a level that can be used as a material in a field requiring a high degree of electrical insulation in a simple and safe process.
本発明者らは上記課題を解決するため鋭意検討の結果、芳香族ポリアミド樹脂が含有する不純物を効率よく除去する方法を開発し、本発明を完成した。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have developed a method for efficiently removing impurities contained in an aromatic polyamide resin and completed the present invention.
すなわち本発明は
(1)下記式(A)
That is, the present invention provides (1) the following formula (A)
(式中Ar3は二価の芳香族基を表す。)
で表される芳香族ジアミンと下記式(B)
(In the formula, Ar 3 represents a divalent aromatic group.)
An aromatic diamine represented by the following formula (B)
(式中Ar2はフェノール性水酸基を有する二価の芳香族基を表す。)
で表される芳香族ジカルボン酸
並びに必要により
下記式(C)
(In the formula, Ar 2 represents a divalent aromatic group having a phenolic hydroxyl group.)
And, if necessary, the following formula (C)
(式中Ar1は二価の芳香族基を表す。)
で表される芳香族ジカルボン酸
とを芳香族亜リン酸エステルの存在下に溶剤中で縮合した後、加熱下で反応溶液中に水を添加して残存する芳香族亜リン酸エステルを加水分解した後、更に水の添加を続け、樹脂を含む油層と水層とが層分離を始めた段階で静置し、上層の水層を除去することによりイオン性不純物や有機低分子量不純物等を除去する工程を含むことを特徴とする下記式(1)
(In the formula, Ar 1 represents a divalent aromatic group.)
Is condensed in a solvent in the presence of an aromatic phosphite, and water is added to the reaction solution under heating to hydrolyze the remaining aromatic phosphite. After that, continue to add water, leave the oil layer containing the resin and the water layer at the stage where layer separation began, and remove the ionic impurities and organic low molecular weight impurities by removing the upper water layer Formula (1) characterized by including the process to do
(式中、m、nは平均値で、m+n=2〜200である。nは0.1以上の正数である。Ar1、Ar3及びAr2は式(A)、式(B)及び式(C)におけるのと同じ意味をそれぞれ表す。)
で表される芳香族ポリアミド樹脂の製造方法(2)式(A)の化合物として、ジアミノジフェニルエーテルを、式(B)の化合物として、ヒドロキシイソフタル酸を、また、式(C)の化合物として、イソフタル酸を使用する、上記(1)記載の製造方法
(3)反応触媒としてピリジン誘導体を使用する、上記(1)または(2)記載の製造方法
を提供するものである。
(In the formula, m and n are average values, and m + n = 2 to 200. n is a positive number of 0.1 or more. Ar 1 , Ar 3, and Ar 2 are the formulas (A) and (B). And the same meaning as in formula (C).
(2) As a compound of formula (A), diaminodiphenyl ether as a compound of formula (B), hydroxyisophthalic acid as a compound of formula (C), and isophthalate as a compound of formula (C) The production method according to (1) or (2), wherein an acid is used and the pyridine derivative is used as the reaction catalyst (3) as a reaction catalyst.
本発明の製法によれば、不純物の少ない芳香族ポリアミド樹脂を効率的にしかも安全に製造することが出来る。 According to the production method of the present invention, an aromatic polyamide resin with less impurities can be produced efficiently and safely.
本発明の芳香族ポリアミド樹脂の製造方法においては、芳香族ジアミン(式(A))を、芳香族ジカルボン酸(式(B)及び式(C))の総モル数に対して過剰になるように仕込んで縮合する。 In the method for producing an aromatic polyamide resin of the present invention, the aromatic diamine (formula (A)) is excessive with respect to the total number of moles of the aromatic dicarboxylic acid (formula (B) and formula (C)). Charge and condense.
式(A)で表される芳香族ジアミンの例としてはジアミノベンゼン、ジアミノトルエン、ジアミノフェノール、ジアミノメチルベンゼン、ジアミノメシチレン、ジアミノクロロベンゼン、ジアミノニトロベンゼンまたはジアミノアゾベンゼン等のジアミノベンゼン類;ジアミノナフタレン等のジアミノナフタレン類;ジアミノビフェニルまたはジアミノジメトキシビフェニル等のジアミノビフェニル類;ジアミノジフェニルエーテルまたはジアミノジメチルジフェニルエーテル等のジアミノジフェニルエール類、メチレンジアニリン、メチレンビス(メトキシアニリン)、メチレンビス(ジメトキシアニリン)、メチレンビス(エチルアニリン)、メチレンビス(ジエトキシアニリン)、メチレンビス(エトキシアニリン)、メチレンビス(ジエトキシアニリン)、メチレンビス(ジブロモアニリン)、イソプロピリデンジアニリンまたはヘキサフルオロイソプロピリデンジアニリン等のアニリン類、ジアミノベンゾフェノン等のジアミノジメチルベンゾフェノン等のジアミノベンゾフェノン類;ジアミノアントラキノン、ジアミノジフェニルチオエーテル、ジアミノジフェニルスルホキシドやジアミノフルオレンなどが挙げられ、中でもジアミノジフェニルエーテル類またはメチレンビス(ジエチルアニリン)が好ましい。芳香族ジアミンの使用量は、下記する芳香族ジカルボン酸1モルに対して、通常1.001〜1.5モルである。 Examples of the aromatic diamine represented by the formula (A) include diaminobenzenes such as diaminobenzene, diaminotoluene, diaminophenol, diaminomethylbenzene, diaminomesitylene, diaminochlorobenzene, diaminonitrobenzene and diaminoazobenzene; diamino such as diaminonaphthalene Naphthalenes; diaminobiphenyls such as diaminobiphenyl or diaminodimethoxybiphenyl; diaminodiphenyl ales such as diaminodiphenyl ether or diaminodimethyldiphenyl ether, methylene dianiline, methylene bis (methoxyaniline), methylene bis (dimethoxyaniline), methylene bis (ethylaniline), Methylenebis (diethoxyaniline), methylenebis (ethoxyaniline), methylenebis ( Ethoxyaniline), methylenebis (dibromoaniline), aniline such as isopropylidene dianiline or hexafluoroisopropylidenedianiline, diaminobenzophenones such as diaminodimethylbenzophenone such as diaminobenzophenone; diaminoanthraquinone, diaminodiphenylthioether, diaminodiphenyl sulfoxide, Examples include diaminofluorene, among which diaminodiphenyl ethers or methylenebis (diethylaniline) are preferable. The usage-amount of aromatic diamine is 1.001-1.5 mol normally with respect to 1 mol of aromatic dicarboxylic acids mentioned below.
式(B)のフェノール性水酸基を有する芳香族ジカルボン酸の例としては、ヒドロキシイソフタル酸、ジヒドロキシイソフタル酸等のヒドロキシイソフタル酸類;ヒドロキシテレフタル酸、ジヒドロキシテレフタル酸等のヒドロキシテレフタル酸類等が挙げられる。式(C)のフェノール性水酸基を有しない芳香族ジカルボン酸の例としてはフタル酸、イソフタル酸、テレフタル酸等のフタル酸類、ベンゼン二酢酸、ベンゼンジプロピオン酸、ビフェニルジカルボン酸、オキシジ安息香酸、チオジ安息香酸、ジチオジ安息香酸、ジチオビス(ニトロ安息香酸)、カルボニルジ安息香酸、スルホニルジ安息香酸、ナフタレンジカルボン酸、メチレンジ安息香酸、イソプロピリデンジ安息香酸、ヘキサフルオロイソプロピリデン安息香酸等の安息香酸類、ナフタレンジカルボン酸、ピリジンジカルボン酸、などが挙げられる。本発明においては、これら芳香族ジカルボン酸のうち、式(B)の芳香族ジカルボン酸を必須とするが、式(C)の芳香族ジカルボン酸を併用するほうが、硬化物に柔軟性を与えやすく、好ましい。併用する場合、式(B)と式(C)の芳香族ジカルボン酸の構造は、両者ともイソフタル酸骨格を有する組み合わせが好ましい。式(B)のジカルボン酸と式(C)の芳香族ジカルボン酸は、ジカルボン酸成分中に水酸基が含まれる割合が通常0.5モル%以上、好ましくは1モル%以上、特に好ましくは、5モル%以上となる範囲で両者を使用する。なお、本発明により得られる芳香族ポリアミド樹脂を溶剤に溶解して、ワニスとして使用する場合、溶剤の蒸発除去は、水酸基を有するジカルボン酸の含有量が少ない方が好ましいが、一方で、接着剤としての接着力の面では、前記において水酸基の含有割合が30〜60モル%となる範囲が好ましい。なお、以下において単に芳香族ジカルボン酸といった場合は、式(B)と式(C)の芳香族ジカルボン酸の両者をさす。 Examples of the aromatic dicarboxylic acid having a phenolic hydroxyl group of the formula (B) include hydroxyisophthalic acids such as hydroxyisophthalic acid and dihydroxyisophthalic acid; hydroxyterephthalic acids such as hydroxyterephthalic acid and dihydroxyterephthalic acid, and the like. Examples of aromatic dicarboxylic acids having no phenolic hydroxyl group of formula (C) include phthalic acids such as phthalic acid, isophthalic acid, terephthalic acid, benzenediacetic acid, benzenedipropionic acid, biphenyldicarboxylic acid, oxydibenzoic acid, thiodi Benzoic acids such as benzoic acid, dithiodibenzoic acid, dithiobis (nitrobenzoic acid), carbonyldibenzoic acid, sulfonyldibenzoic acid, naphthalenedicarboxylic acid, methylenedibenzoic acid, isopropylidenedibenzoic acid, hexafluoroisopropylidenebenzoic acid, naphthalene Examples thereof include dicarboxylic acid and pyridinedicarboxylic acid. In the present invention, among these aromatic dicarboxylic acids, the aromatic dicarboxylic acid of the formula (B) is essential, but the combined use of the aromatic dicarboxylic acid of the formula (C) makes it easier to give the cured product flexibility. ,preferable. When used in combination, the structures of the aromatic dicarboxylic acids of the formula (B) and the formula (C) are preferably a combination having an isophthalic acid skeleton. In the dicarboxylic acid of the formula (B) and the aromatic dicarboxylic acid of the formula (C), the proportion of the hydroxyl group contained in the dicarboxylic acid component is usually 0.5 mol% or more, preferably 1 mol% or more, particularly preferably 5 Both are used within a range of at least mol%. In addition, when the aromatic polyamide resin obtained by the present invention is dissolved in a solvent and used as a varnish, it is preferable that the solvent is removed by evaporation because the content of the dicarboxylic acid having a hydroxyl group is small. In terms of adhesive strength, a range in which the hydroxyl group content is 30 to 60 mol% is preferable. In the following description, the term “aromatic dicarboxylic acid” refers to both of the aromatic dicarboxylic acids of the formula (B) and the formula (C).
芳香族ジカルボン酸と芳香族ジアミンの縮合反応は、縮合剤としての芳香族亜リン酸エステルの存在下に行う。また、この際ピリジン誘導体を触媒として使用するのが好ましい。 The condensation reaction of the aromatic dicarboxylic acid and the aromatic diamine is performed in the presence of an aromatic phosphite as a condensing agent. At this time, it is preferable to use a pyridine derivative as a catalyst.
ここで用いられる芳香族亜リン酸エステルとしては、亜リン酸トリフェニル、亜リン酸ジフェニル、亜リン酸トリ−o−トリル、亜リン酸ジ−o−トリル、亜リン酸トリ−m−トリル、亜リン酸ジ−m−トリル、亜リン酸トリ−p−トリル、亜リン酸ジ−p−トリル、亜リン酸トリ−p−クロロフェニルなどが挙げられる。芳香族亜リン酸エステルの使用量は、芳香族ジアミンと芳香族ジカルボン酸の合計1モルに対して、通常0.6〜1.5モル、好ましくは0.7〜1.2モルである。 The aromatic phosphite used here includes triphenyl phosphite, diphenyl phosphite, tri-o-tolyl phosphite, di-o-tolyl phosphite, tri-m-tolyl phosphite. , Di-m-tolyl phosphite, tri-p-tolyl phosphite, di-p-tolyl phosphite, tri-p-chlorophenyl phosphite and the like. The usage-amount of aromatic phosphite is 0.6-1.5 mol normally with respect to a total of 1 mol of aromatic diamine and aromatic dicarboxylic acid, Preferably it is 0.7-1.2 mol.
ピリジン誘導体としては、ピリジン、2−ピコリン、3−ピコリン、4−ピコリン、2,4−ルチジン、2,6−ルチジン、3,5−ルチジンなどが挙げられる。ピリジン誘導体の使用量は、芳香族ジアミンと芳香族ジカルボン酸の合計1モルに対して、通常1.0〜5.0モル、好ましくは2.0〜4.0モルである。 Examples of pyridine derivatives include pyridine, 2-picoline, 3-picoline, 4-picoline, 2,4-lutidine, 2,6-lutidine, and 3,5-lutidine. The usage-amount of a pyridine derivative is 1.0-5.0 mol normally with respect to a total of 1 mol of aromatic diamine and aromatic dicarboxylic acid, Preferably it is 2.0-4.0 mol.
また、より大きい分子量の芳香族ポリアミド樹脂を得るために、塩化リチウム等の無機塩類を添加し反応を行うこともできる。無機塩類の使用量は、芳香族ジアミンと芳香族ジカルボン酸の合計1モルに対して、通常0.01〜0.5モル、好ましくは0.05〜0.3モルである。 In addition, in order to obtain an aromatic polyamide resin having a higher molecular weight, an inorganic salt such as lithium chloride can be added to carry out the reaction. The usage-amount of inorganic salt is 0.01-0.5 mol normally with respect to 1 mol in total of aromatic diamine and aromatic dicarboxylic acid, Preferably it is 0.05-0.3 mol.
反応は溶媒中に芳香族ジカルボン酸、芳香族ジアミン及び縮合剤並びに必要によりピリジン誘導体及び無機塩類を仕込んで行う。溶媒としては、芳香族ポリアミド樹脂と溶媒和を起こす溶媒であれば特に制限は無いが、具体例としてはN,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン、ジメチルスルホキシド等やこれらの混合溶媒が挙げられるが、特にN−メチル−2−ピロリドンが好ましい。また溶媒の使用量は、生成する芳香族ポリアミド樹脂の濃度が2〜50重量%となる量が好ましいが、生産効率と操作性の良い溶液粘度とを考慮すると5〜30重量%となる量が特に好ましい。縮合反応における反応温度は通常60〜150℃、好ましくは70〜120℃、反応時間は通常1〜15時間、好ましくは2〜10時間である。 The reaction is carried out by charging an aromatic dicarboxylic acid, an aromatic diamine, a condensing agent and, if necessary, a pyridine derivative and an inorganic salt in a solvent. The solvent is not particularly limited as long as it is a solvent that solvates with the aromatic polyamide resin. Specific examples include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, and dimethyl. Examples thereof include sulfoxide and mixed solvents thereof, and N-methyl-2-pyrrolidone is particularly preferable. The amount of the solvent used is preferably such that the concentration of the aromatic polyamide resin to be produced is 2 to 50% by weight, but considering the production efficiency and the solution viscosity with good operability, the amount to be 5 to 30% by weight. Particularly preferred. The reaction temperature in the condensation reaction is usually 60 to 150 ° C., preferably 70 to 120 ° C., and the reaction time is usually 1 to 15 hours, preferably 2 to 10 hours.
こうして得られる芳香族ポリアミドは通常下記式(1)で表される。 The aromatic polyamide thus obtained is usually represented by the following formula (1).
(式中、m、nは平均値で、m+n=2〜200である。nは0.1以上の正数である。Ar1及びAr3は二価の芳香族基を、また、Ar2はフェノール性水酸基を有する二価の芳香族基をそれぞれ表す。)
上記式(1)において、mとnの値は芳香族ジアミンと芳香族ジカルボン酸の仕込み比によって決定され、通常平均値でn+m=2〜200であり、好ましくは5〜150である。
この、好ましい平均重合度を有する芳香族ポリアミド樹脂の固有粘度値(30℃における0.5g/dlのN,N−ジメチルアセトアミド溶液で測定)は0.1〜4.0dl/gの範囲にある。一般に好ましい平均重合度を有するか否かは、固有粘度を参照することにより判断する。固有粘度が0.1dl/gより小さいと、成膜性や芳香族ポリアミド樹脂としての性質出現が不十分であるため、好ましくない場合がある。逆に固有粘度が4.0dl/gより大きいと、重合度が高すぎ溶剤溶解性が悪くなり、かつ成形加工性が悪くなるといった問題が発生する恐れがある。
(In the formula, m and n are average values, and m + n = 2 to 200. n is a positive number of 0.1 or more. Ar 1 and Ar 3 are divalent aromatic groups, and Ar 2. Represents a divalent aromatic group having a phenolic hydroxyl group.)
In the said Formula (1), the value of m and n is determined by the preparation ratio of aromatic diamine and aromatic dicarboxylic acid, and is normal average value n + m = 2-200, Preferably it is 5-150.
The intrinsic viscosity value (measured with a 0.5 g / dl N, N-dimethylacetamide solution at 30 ° C.) of the aromatic polyamide resin having a preferable average degree of polymerization is in the range of 0.1 to 4.0 dl / g. . In general, whether or not the polymer has a preferable average degree of polymerization is determined by referring to the intrinsic viscosity. When the intrinsic viscosity is less than 0.1 dl / g, the film formability and the appearance of properties as an aromatic polyamide resin are insufficient, which may not be preferable. On the other hand, if the intrinsic viscosity is larger than 4.0 dl / g, there is a possibility that the degree of polymerization is so high that the solvent solubility is deteriorated and the molding processability is deteriorated.
本発明の製造方法では、縮合反応終了後に反応系内に水を添加し、芳香族亜リン酸エステルを加水分解する。水の添加は、撹拌下に通常60〜110℃、好ましくは70〜100℃に加熱して行う。水の添加は撹拌下において油層と水層とが層分離を起こし始めるまで続けるが、反応液の総重量に対して通常10〜200重量%、好ましくは20〜150重量%で充分である。なお、加水分解が充分行われるように、水の添加は必要量全量を一度に添加するのではなく、通常、30分〜15時間、好ましくは1〜10時間かけて滴下するのが好ましい。この水の滴下工程において芳香族亜リン酸エステルは、リン酸イオン及びフェノール類へ加水分解される。 In the production method of the present invention, after completion of the condensation reaction, water is added to the reaction system to hydrolyze the aromatic phosphite. The addition of water is usually performed by heating to 60 to 110 ° C., preferably 70 to 100 ° C. with stirring. The addition of water is continued until stirring until the oil layer and the aqueous layer begin to separate, but usually 10 to 200% by weight, preferably 20 to 150% by weight, is sufficient based on the total weight of the reaction solution. In order to sufficiently perform hydrolysis, it is preferable that water is added dropwise usually over 30 minutes to 15 hours, preferably 1 to 10 hours, rather than adding all of the necessary amount at once. In this water dropping step, the aromatic phosphite is hydrolyzed to phosphate ions and phenols.
層分離が始まった時点で撹拌を止め静置し、上層(水層)と下層(樹脂を含む油層)とに分離した時点で、上層の水層を除去する。この場合、通常油層は粘度が高くスラリー状になっているのでデカンテーションなどによって容易に水層は除去できる。またポンプなどで系外に送液することも可能である。水層中にはリン酸、亜リン酸、触媒、フェノール類、ピリジン誘導体などの不純物及び溶剤の一部が含まれている。 When the layer separation starts, the stirring is stopped and the mixture is allowed to stand, and when the upper layer (water layer) and the lower layer (oil layer containing resin) are separated, the upper aqueous layer is removed. In this case, since the oil layer usually has a high viscosity and is in a slurry state, the water layer can be easily removed by decantation or the like. It is also possible to send liquid outside the system with a pump or the like. The aqueous layer contains impurities such as phosphoric acid, phosphorous acid, catalysts, phenols, pyridine derivatives, and a part of the solvent.
水層を除去して残された油層は溶剤も一部取り除かれており、粘度が上昇して扱いにくいため、再度有機溶剤を加えて希釈する。この場合使用し得る有機溶剤はN,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン、ジメチルスルホキシドなどである。使用する溶剤の量は粘度が十分に下がる範囲であれば特に規定はされないが、通常油層の重量に対して5〜100重量%であり、好ましくは10〜80重量%である。 The oil layer left after the removal of the aqueous layer has some of the solvent removed, and the viscosity increases and is difficult to handle. Therefore, the organic solvent is added again for dilution. In this case, the organic solvent which can be used is N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide and the like. The amount of the solvent to be used is not particularly limited as long as the viscosity is sufficiently lowered, but is usually 5 to 100% by weight, preferably 10 to 80% by weight, based on the weight of the oil layer.
次いで、希釈された油層を貧溶媒に加え芳香族ポリアミド樹脂を析出させる。貧溶媒としては芳香族ポリアミド樹脂と溶媒和を起こし難い液体であれば特に制限は無いが、具体例としては水、メタノール、エタノールなどやこれらの混合溶媒が挙げられる。その使用量は析出した芳香族ポリアミド樹脂が操作上問題なく濾別できる範囲で出来るだけ少量であることが望ましく、反応に用いられた溶媒(前記希釈溶媒も含む)1重量部に対して0.5〜50重量部が好ましく、特に1〜10重量部が好ましい。 Next, the diluted oil layer is added to a poor solvent to precipitate an aromatic polyamide resin. The poor solvent is not particularly limited as long as it is a liquid that does not easily solvate with the aromatic polyamide resin, but specific examples include water, methanol, ethanol, and a mixed solvent thereof. The amount used is preferably as small as possible within the range in which the precipitated aromatic polyamide resin can be filtered out without any problem in operation, and is 0. 0 part by weight with respect to 1 part by weight of the solvent (including the dilution solvent) used in the reaction. 5 to 50 parts by weight is preferable, and 1 to 10 parts by weight is particularly preferable.
希釈された油層と貧溶媒の混合は反応液中に撹拌下で貧溶媒を徐々に添加しても良いし、貧溶媒中に撹拌下で油層の希釈液を添加しても良い。送液ポンプ、コンプレッサー及び2流体ノズル、あるいは送液ポンプ及び1流体ノズルを用いて油層の希釈液を貧溶媒中に噴霧する方法は、適度な粒径の芳香族ポリアミド樹脂が容易に析出するため好ましい。油層の希釈液と貧溶媒の混合を行う温度は通常0〜100℃、好ましくは20〜80℃である。 In mixing the diluted oil layer and the poor solvent, the poor solvent may be gradually added to the reaction solution with stirring, or the diluted solution of the oil layer may be added to the poor solvent with stirring. In the method of spraying the diluted liquid of the oil layer into the poor solvent using the liquid feed pump, the compressor and the two-fluid nozzle, or the liquid feed pump and the one-fluid nozzle, the aromatic polyamide resin having an appropriate particle diameter easily precipitates. preferable. The temperature at which the oil layer diluent and the poor solvent are mixed is usually 0 to 100 ° C, preferably 20 to 80 ° C.
貧溶媒との混合により析出した芳香族ポリアミド樹脂は、濾別により単離され、水でケーキ洗浄することによりイオン性不純物が除去される。このケーキを乾燥することにより芳香族ポリアミド樹脂が得られるが、更に水溶性有機溶剤で洗浄することによりイオン性不純物をより低減することが出来る。 The aromatic polyamide resin precipitated by mixing with a poor solvent is isolated by filtration, and ionic impurities are removed by washing the cake with water. An aromatic polyamide resin can be obtained by drying the cake, but ionic impurities can be further reduced by washing with a water-soluble organic solvent.
用い得る水溶性有機溶剤としてはメタノール、エタノール、n−プロパノール、イソプロパノールなどのアルコール類やアセトンなどが挙げられ、これらは単独で、または混合して用いられるが、メタノールが特に好ましい。 Examples of the water-soluble organic solvent that can be used include alcohols such as methanol, ethanol, n-propanol, and isopropanol, and acetone. These may be used alone or in combination, with methanol being particularly preferred.
水溶性有機溶剤での洗浄は、上記で濾別により単離されたポリアミド樹脂ケーキを濾過器上で洗浄しても効果があるが、ウエット状態、すなわち良溶媒と貧溶媒を含んだ芳香族ポリアミド樹脂ケーキまたはこのケーキをいったん乾燥により良溶媒及び貧溶媒を除いた芳香族ポリアミド樹脂と上記水溶性有機溶剤とを新たに容器に仕込み、撹拌懸濁させた後、再度濾別することにより、更に優れた精製効果を発揮する。この場合の水溶性有機溶剤の使用量は、正味のポリアミド樹脂1重量部に対して1〜100重量部、好ましくは2〜50重量部であり、撹拌の温度は常温から懸濁液の沸点が好ましく、特に沸点での撹拌が好ましい。また、撹拌時間は0.1〜24時間、好ましくは、1〜5時間である。更に通常この操作は常圧下で行われるが、加圧化で行うことも出来る。 Washing with a water-soluble organic solvent is effective even if the polyamide resin cake isolated by filtration is washed on a filter, but it is wet, that is, an aromatic polyamide containing a good solvent and a poor solvent. The resin cake or the aromatic polyamide resin from which the good solvent and the poor solvent have been removed by drying and the water-soluble organic solvent are newly charged in a container, suspended by stirring, and then filtered again to further remove the cake. Excellent purification effect. In this case, the water-soluble organic solvent is used in an amount of 1 to 100 parts by weight, preferably 2 to 50 parts by weight, based on 1 part by weight of the net polyamide resin, and the stirring temperature is from room temperature to the boiling point of the suspension. Stirring at the boiling point is particularly preferable. The stirring time is 0.1 to 24 hours, preferably 1 to 5 hours. Furthermore, this operation is usually performed under normal pressure, but can also be performed by pressurization.
上記、懸濁処理を行った後、ポリアミド樹脂を濾別し、通常更に上記水溶性有機溶剤を用いてケーキ洗浄を行い、次いで場合により更に水でケーキ洗浄を行った後、乾燥することにより目的のイオン性不純物の少ないポリアミド樹脂を得ることが出来る。 After the above suspension treatment, the polyamide resin is filtered off, usually further washed with a cake using the above water-soluble organic solvent, and then optionally further washed with water and then dried. Thus, a polyamide resin with less ionic impurities can be obtained.
本発明の製法により得られるポリアミド樹脂はフェノール性水酸基、アミノ基などの官能基を有するためエポキシ樹脂、硬化剤、硬化触媒、シアネート樹脂などと組み合わせることにより、硬化性樹脂組成物として使用することが出来る。具体的な用途例としては、リジッド基板材料、フレキシブル基板材料、ビルドアップ基板材料、半導体用封止材、ソルダーレジスト、塗料、接着剤などが挙げられる。 Since the polyamide resin obtained by the production method of the present invention has a functional group such as a phenolic hydroxyl group and an amino group, it can be used as a curable resin composition by combining with an epoxy resin, a curing agent, a curing catalyst, a cyanate resin and the like. I can do it. Specific examples of applications include rigid substrate materials, flexible substrate materials, build-up substrate materials, semiconductor encapsulants, solder resists, paints, and adhesives.
次に本発明を更に実施例により具体的に説明するが、以下において部は特に断わりのない限り重量部である。 EXAMPLES Next, the present invention will be described more specifically with reference to examples. In the following, parts are parts by weight unless otherwise specified.
実施例1
温度計、冷却管、分留管、撹拌機を取り付けたフラスコに窒素パージを施しながら、5−ヒドロキシイソフタル酸64.2部、イソフタル酸39.0部、3,4’−ジアミノジフェニルエーテル120部、塩化リチウム6.4部、N−メチルピロリドン680.4部、ピリジン136.1部を加え撹拌溶解させた後、亜リン酸トリフェニル295部を加えて95℃で4時間縮合反応をさせ、ポリアミド樹脂の反応液(A)を得た。この反応液(A)に撹拌しながら、90℃で水670部を3時間かけて滴下し、更に90℃で1時間撹拌し、60℃にまで冷却して30分静置した。上層が水層、下層が油層(樹脂層)に層分離したため、上層をデカンテーションによって除去した。廃水の量は620部であった。油層(樹脂層)にN,N−ジメチルホルムアミド620部を加えて希釈した。このポリアミド溶液を撹拌された水3000部中に2流体ノズルを用いて噴霧し粒径5〜50μmの微粉として析出させ析出物を濾別した。得られたウェットケーキをメタノール1600部に分散させ撹拌下で2時間還流した。次いでメタノールを濾別し水1600部で洗浄し、乾燥することにより、下記式(2)
Example 1
While performing a nitrogen purge on a flask equipped with a thermometer, condenser, fractionator, and stirrer, 64.2 parts 5-hydroxyisophthalic acid, 39.0 parts isophthalic acid, 120 parts 3,4'-diaminodiphenyl ether, After adding 6.4 parts of lithium chloride, 680.4 parts of N-methylpyrrolidone and 136.1 parts of pyridine, stirring and dissolving, 295 parts of triphenyl phosphite was added and subjected to a condensation reaction at 95 ° C. for 4 hours. A resin reaction liquid (A) was obtained. While stirring this reaction liquid (A), 670 parts of water was added dropwise at 90 ° C. over 3 hours, further stirred at 90 ° C. for 1 hour, cooled to 60 ° C. and allowed to stand for 30 minutes. Since the upper layer was separated into an aqueous layer and the lower layer was separated into an oil layer (resin layer), the upper layer was removed by decantation. The amount of waste water was 620 parts. The oil layer (resin layer) was diluted by adding 620 parts of N, N-dimethylformamide. This polyamide solution was sprayed into 3000 parts of stirred water using a two-fluid nozzle, and precipitated as fine powder having a particle size of 5 to 50 μm, and the precipitate was separated by filtration. The obtained wet cake was dispersed in 1600 parts of methanol and refluxed for 2 hours with stirring. Next, methanol was filtered off, washed with 1600 parts of water, and dried to obtain the following formula (2).
で表される芳香族ポリアミド樹脂190部を得た。この芳香族ポリアミド樹脂中に含まれる全リン量を硫酸・硝酸で湿式酸化分解後、モリブデン青―アスコルビン酸吸光光度法により定量したところ、650ppmであった。得られた芳香族ポリアミド樹脂の固有粘度は0.51dl/g(ジメチルアセトアミド溶液、30℃)であり、式中、mの値は約16、nの値は約24であった。また仕込み比率から計算されたフェノール性水酸基含有芳香族ポリアミド樹脂のエポキシ基に対する活性水素当量は565g/eqであった。 190 parts of an aromatic polyamide resin represented by the formula: The total amount of phosphorus contained in this aromatic polyamide resin was determined by molybdenum blue-ascorbic acid spectrophotometry after wet oxidative decomposition with sulfuric acid and nitric acid and found to be 650 ppm. The intrinsic viscosity of the obtained aromatic polyamide resin was 0.51 dl / g (dimethylacetamide solution, 30 ° C.). In the formula, the value of m was about 16, and the value of n was about 24. Moreover, the active hydrogen equivalent with respect to the epoxy group of the phenolic hydroxyl group containing aromatic polyamide resin calculated from the preparation ratio was 565 g / eq.
Claims (3)
で表される芳香族ジアミンと下記式(B)
で表される芳香族ジカルボン酸
並びに必要により
下記式(C)
で表される芳香族ジカルボン酸
とを芳香族亜リン酸エステルの存在下に溶剤中で縮合した後、加熱下で反応溶液中に水を添加して残存する芳香族亜リン酸エステルを加水分解した後、更に水の添加を続け、樹脂を含む油層と水層とが層分離を始めた段階で静置し、上層の水層を除去する工程を含むことを特徴とする下記式(1)
で表される芳香族ポリアミド樹脂の製造方法。 The following formula (A)
An aromatic diamine represented by the following formula (B)
And, if necessary, the following formula (C)
Is condensed in a solvent in the presence of an aromatic phosphite, and water is added to the reaction solution under heating to hydrolyze the remaining aromatic phosphite. After that, the addition of water is further continued, and the oil layer containing the resin and the aqueous layer are allowed to stand at the stage where the layer separation is started, and the step of removing the upper aqueous layer is included.
The manufacturing method of aromatic polyamide resin represented by these.
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JP2006335941A (en) * | 2005-06-03 | 2006-12-14 | Nippon Kayaku Co Ltd | Manufacturing process of aromatic polyamide resin varnish |
WO2011114665A1 (en) | 2010-03-15 | 2011-09-22 | 日本化薬株式会社 | Heat-resistant adhesive |
WO2015087964A1 (en) * | 2013-12-13 | 2015-06-18 | 日産化学工業株式会社 | Polymer purification method |
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JPH09176485A (en) * | 1995-12-27 | 1997-07-08 | Tomoegawa Paper Co Ltd | Resin composition for coating film and molded article of coating film using the same |
JP2002241494A (en) * | 2001-02-16 | 2002-08-28 | Nippon Kayaku Co Ltd | New semi-aromatic polyamide and its production method |
JP2004137496A (en) * | 2002-09-27 | 2004-05-13 | Nippon Kayaku Co Ltd | Adhesion assistant composition |
JP2006028367A (en) * | 2004-07-16 | 2006-02-02 | Nippon Kayaku Co Ltd | Polyamide resin and method for producing polyamide resin |
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JPH08127654A (en) * | 1994-10-31 | 1996-05-21 | Tomoegawa Paper Co Ltd | Production of polyamide resin |
JPH09176485A (en) * | 1995-12-27 | 1997-07-08 | Tomoegawa Paper Co Ltd | Resin composition for coating film and molded article of coating film using the same |
JP2002241494A (en) * | 2001-02-16 | 2002-08-28 | Nippon Kayaku Co Ltd | New semi-aromatic polyamide and its production method |
JP2004137496A (en) * | 2002-09-27 | 2004-05-13 | Nippon Kayaku Co Ltd | Adhesion assistant composition |
JP2006028367A (en) * | 2004-07-16 | 2006-02-02 | Nippon Kayaku Co Ltd | Polyamide resin and method for producing polyamide resin |
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JP2006335941A (en) * | 2005-06-03 | 2006-12-14 | Nippon Kayaku Co Ltd | Manufacturing process of aromatic polyamide resin varnish |
JP4521770B2 (en) * | 2005-06-03 | 2010-08-11 | 日本化薬株式会社 | Method for producing aromatic polyamide resin varnish |
WO2011114665A1 (en) | 2010-03-15 | 2011-09-22 | 日本化薬株式会社 | Heat-resistant adhesive |
WO2015087964A1 (en) * | 2013-12-13 | 2015-06-18 | 日産化学工業株式会社 | Polymer purification method |
JPWO2015087964A1 (en) * | 2013-12-13 | 2017-03-16 | 日産化学工業株式会社 | Polymer purification method |
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