JP2006114929A - 研磨方法 - Google Patents
研磨方法 Download PDFInfo
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- JP2006114929A JP2006114929A JP2005357898A JP2005357898A JP2006114929A JP 2006114929 A JP2006114929 A JP 2006114929A JP 2005357898 A JP2005357898 A JP 2005357898A JP 2005357898 A JP2005357898 A JP 2005357898A JP 2006114929 A JP2006114929 A JP 2006114929A
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- electropolishing
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Abstract
【解決手段】ウエハ表面に凹凸のパターンが形成され、その凹部を埋め込むように該ウエハ表面に形成された金属膜32を研磨する研磨方法において、前記金属膜32の研磨を電解研磨と化学的機械研磨もしくは化学的バフ研磨とを交互に行うことを特徴とする。
【選択図】図1
Description
Claims (4)
- ウエハ表面に凹凸のパターンが形成され、その凹部を埋め込むように該ウエハ表面に形成された金属膜を研磨する研磨方法において、
前記金属膜の研磨を電解研磨と化学的機械研磨もしくは化学的バフ研磨とを交互に行う
ことを特徴とする研磨方法。 - 前記電解研磨は、前記金属膜表面を粗な状態にし、
前記化学的機械研磨もしくは化学的バフ研磨は前記電解研磨により荒らした前記金属膜表面を平滑にする
ことを特徴とする請求項1記載の研磨方法。 - 前記複数工程の電解研磨のうち最終工程における電解研磨の終点は、前記金属膜を電解研磨した際に得られる電流波形の変化によって判定する
ことを特徴とする請求項1記載の研磨方法。 - 前記電解研磨の終点は、前記電流波形の変化を微分して求める
ことを特徴とする請求項3記載の研磨方法。
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JP2005357898A JP4442555B2 (ja) | 2005-12-12 | 2005-12-12 | 研磨方法 |
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JP2005357898A JP4442555B2 (ja) | 2005-12-12 | 2005-12-12 | 研磨方法 |
Related Parent Applications (1)
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JP2001366341A Division JP3807295B2 (ja) | 2001-11-30 | 2001-11-30 | 研磨方法 |
Publications (2)
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JP2006114929A true JP2006114929A (ja) | 2006-04-27 |
JP4442555B2 JP4442555B2 (ja) | 2010-03-31 |
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JP2005357898A Expired - Fee Related JP4442555B2 (ja) | 2005-12-12 | 2005-12-12 | 研磨方法 |
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JP4442555B2 (ja) | 2010-03-31 |
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