JP2006080550A - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP2006080550A
JP2006080550A JP2005303795A JP2005303795A JP2006080550A JP 2006080550 A JP2006080550 A JP 2006080550A JP 2005303795 A JP2005303795 A JP 2005303795A JP 2005303795 A JP2005303795 A JP 2005303795A JP 2006080550 A JP2006080550 A JP 2006080550A
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Japan
Prior art keywords
shower plate
processing chamber
gas supply
vacuum processing
region
Prior art date
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Pending
Application number
JP2005303795A
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English (en)
Japanese (ja)
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JP2006080550A5 (enExample
Inventor
Hitoshi Tamura
仁 田村
Takeshi Miya
豪 宮
Kotaro Fujimoto
幸太郎 藤本
Akitaka Makino
昭孝 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi Ltd
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi High Technologies Corp, Hitachi Ltd, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2005303795A priority Critical patent/JP2006080550A/ja
Publication of JP2006080550A publication Critical patent/JP2006080550A/ja
Publication of JP2006080550A5 publication Critical patent/JP2006080550A5/ja
Pending legal-status Critical Current

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  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2005303795A 2005-10-19 2005-10-19 プラズマ処理装置 Pending JP2006080550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005303795A JP2006080550A (ja) 2005-10-19 2005-10-19 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005303795A JP2006080550A (ja) 2005-10-19 2005-10-19 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001361897A Division JP3757159B2 (ja) 2001-11-28 2001-11-28 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2006080550A true JP2006080550A (ja) 2006-03-23
JP2006080550A5 JP2006080550A5 (enExample) 2006-06-15

Family

ID=36159697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005303795A Pending JP2006080550A (ja) 2005-10-19 2005-10-19 プラズマ処理装置

Country Status (1)

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JP (1) JP2006080550A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113871281A (zh) * 2020-06-30 2021-12-31 东京毅力科创株式会社 等离子体处理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113871281A (zh) * 2020-06-30 2021-12-31 东京毅力科创株式会社 等离子体处理装置

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