JP2006060248A5 - - Google Patents

Claims (9)

Includes a projection optical system for projecting a pattern of an original onto a substrate, with the gap filled with liquid between a final surface and the substrate of the projection optical system, an exposure apparatus for exposing a substrate,
A substrate stage that holds and moves the substrate;
Supply means for supplying the liquid to the gap from a plurality of supply ports ;
An open / close valve that switches whether or not to supply liquid from each of the plurality of supply ports ,
An exposure apparatus characterized by sequentially opening an opening / closing valve corresponding to a supply nozzle that enters a substrate downward as the substrate moves . The exposure apparatus according to claim 1, further comprising a same surface plate provided on an outer side of the substrate held on the substrate stage and having an upper surface substantially the same height as the upper surface of the substrate. An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
A substrate stage that holds and moves the substrate;
Supply means for supplying the liquid to the gap from a plurality of supply ports;
An on-off valve for switching whether or not to supply liquid from each of the plurality of supply ports;
Provided on the outside of the substrate held by the substrate stage, and having an upper surface substantially the same height as the upper surface of the substrate, and a moving coplanar plate,
An exposure apparatus that switches whether or not to supply liquid from each of the plurality of supply ports corresponding to an outer edge of the moving same-surface plate by using the opening / closing valve. The switch valve according to claim 1 or 2, wherein the open / close valve switches whether or not to supply liquid by each of the supply nozzles based on whether or not the substrate exists below each of the supply nozzles. Item 3. The exposure apparatus according to Item 2. 5. The exposure apparatus according to claim 1, wherein each of the supply ports is arranged in a plurality of rows. 6. The exposure apparatus according to claim 1, further comprising a recovery unit that recovers the liquid in the gap from a recovery port disposed outside the supply port. The exposure apparatus according to claim 1, wherein the supply unit includes any of a bubble jet (registered trademark) nozzle, a thermal jet nozzle, and a piezo jet nozzle. Further comprising an original stage that moves while holding the original,
8. The substrate according to claim 1, wherein the substrate is exposed through a pattern of the original while the original and the substrate are scanned and moved with respect to the projection optical system. 9. Exposure device. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 8,
And developing the substrate exposed in the step.