JP2006019464A5 - - Google Patents
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- Publication number
- JP2006019464A5 JP2006019464A5 JP2004195131A JP2004195131A JP2006019464A5 JP 2006019464 A5 JP2006019464 A5 JP 2006019464A5 JP 2004195131 A JP2004195131 A JP 2004195131A JP 2004195131 A JP2004195131 A JP 2004195131A JP 2006019464 A5 JP2006019464 A5 JP 2006019464A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004195131A JP4458958B2 (ja) | 2004-07-01 | 2004-07-01 | 微細パターン形成方法および微細パターン形成装置 |
| PCT/JP2005/011925 WO2006003921A1 (ja) | 2004-07-01 | 2005-06-29 | 微細パターン形成方法および微細パターン形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004195131A JP4458958B2 (ja) | 2004-07-01 | 2004-07-01 | 微細パターン形成方法および微細パターン形成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006019464A JP2006019464A (ja) | 2006-01-19 |
| JP2006019464A5 true JP2006019464A5 (US07906523-20110315-C00004.png) | 2007-08-09 |
| JP4458958B2 JP4458958B2 (ja) | 2010-04-28 |
Family
ID=35782729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004195131A Expired - Fee Related JP4458958B2 (ja) | 2004-07-01 | 2004-07-01 | 微細パターン形成方法および微細パターン形成装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4458958B2 (US07906523-20110315-C00004.png) |
| WO (1) | WO2006003921A1 (US07906523-20110315-C00004.png) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4951981B2 (ja) * | 2006-01-23 | 2012-06-13 | 凸版印刷株式会社 | インプリント用モールド及びその製造方法 |
| KR100755007B1 (ko) * | 2006-03-22 | 2007-09-04 | (주) 비앤피 사이언스 | 나노 임프린트 리소그래피 방법 및 장치 |
| JP5072247B2 (ja) * | 2006-03-27 | 2012-11-14 | キヤノン株式会社 | リソグラフィ装置及び方法、並びに、デバイス製造方法 |
| KR100815113B1 (ko) | 2007-02-16 | 2008-03-20 | 한국과학기술원 | 몰드와 광경화성 수지의 수평 운동을 이용한 미세 구조물의제조 방법 |
| JP5371349B2 (ja) | 2008-09-19 | 2013-12-18 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
| JP5776491B2 (ja) * | 2011-10-24 | 2015-09-09 | 信越化学工業株式会社 | フォトマスク用、レチクル用又はナノインプリント用のガラス基板及びその製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100335070B1 (ko) * | 1999-04-21 | 2002-05-03 | 백승준 | 압축 성형 기법을 이용한 미세 패턴 형성 방법 |
| US6873087B1 (en) * | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
| JP2002063741A (ja) * | 2001-07-12 | 2002-02-28 | Hitachi Ltd | 光ディスク |
| US7687007B2 (en) * | 2002-06-20 | 2010-03-30 | Obducat Ab | Mold for nano imprinting |
| AU2003251262A1 (en) * | 2002-08-27 | 2004-03-19 | Obducat Ab | Device for transferring a pattern to an object |
| JP3783054B2 (ja) * | 2002-10-24 | 2006-06-07 | 独立行政法人産業技術総合研究所 | アクティブダブルジョイント式加圧機構 |
-
2004
- 2004-07-01 JP JP2004195131A patent/JP4458958B2/ja not_active Expired - Fee Related
-
2005
- 2005-06-29 WO PCT/JP2005/011925 patent/WO2006003921A1/ja active Application Filing
