JP2006013387A5 - - Google Patents
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- JP2006013387A5 JP2006013387A5 JP2004192091A JP2004192091A JP2006013387A5 JP 2006013387 A5 JP2006013387 A5 JP 2006013387A5 JP 2004192091 A JP2004192091 A JP 2004192091A JP 2004192091 A JP2004192091 A JP 2004192091A JP 2006013387 A5 JP2006013387 A5 JP 2006013387A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004192091A JP4477434B2 (ja) | 2004-06-29 | 2004-06-29 | 荷電粒子線露光装置およびデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004192091A JP4477434B2 (ja) | 2004-06-29 | 2004-06-29 | 荷電粒子線露光装置およびデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006013387A JP2006013387A (ja) | 2006-01-12 |
| JP2006013387A5 true JP2006013387A5 (enExample) | 2007-08-16 |
| JP4477434B2 JP4477434B2 (ja) | 2010-06-09 |
Family
ID=35780225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004192091A Expired - Fee Related JP4477434B2 (ja) | 2004-06-29 | 2004-06-29 | 荷電粒子線露光装置およびデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4477434B2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8546767B2 (en) * | 2010-02-22 | 2013-10-01 | Ims Nanofabrication Ag | Pattern definition device with multiple multibeam array |
| NL2006868C2 (en) * | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
| JP6293435B2 (ja) * | 2013-08-08 | 2018-03-14 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 |
| JP6383228B2 (ja) * | 2014-09-19 | 2018-08-29 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビームのビーム位置測定方法及びマルチ荷電粒子ビーム描画装置 |
| US9892885B2 (en) * | 2016-03-24 | 2018-02-13 | Kla-Tencor Corporation | System and method for drift compensation on an electron beam based characterization tool |
| JP6834429B2 (ja) * | 2016-08-03 | 2021-02-24 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びその調整方法 |
| JP7082927B2 (ja) * | 2018-08-27 | 2022-06-09 | 株式会社Ｓｃｒｅｅｎホールディングス | 露光装置 |
| JP7582000B2 (ja) * | 2021-03-22 | 2024-11-13 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びその調整方法 |
| US12154756B2 (en) * | 2021-08-12 | 2024-11-26 | Ims Nanofabrication Gmbh | Beam pattern device having beam absorber structure |
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2004
- 2004-06-29 JP JP2004192091A patent/JP4477434B2/ja not_active Expired - Fee Related