JP2006013387A5 - - Google Patents

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Publication number
JP2006013387A5
JP2006013387A5 JP2004192091A JP2004192091A JP2006013387A5 JP 2006013387 A5 JP2006013387 A5 JP 2006013387A5 JP 2004192091 A JP2004192091 A JP 2004192091A JP 2004192091 A JP2004192091 A JP 2004192091A JP 2006013387 A5 JP2006013387 A5 JP 2006013387A5
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JP
Japan
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JP2004192091A
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JP4477434B2 (ja
JP2006013387A (ja
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Priority to JP2004192091A priority Critical patent/JP4477434B2/ja
Priority claimed from JP2004192091A external-priority patent/JP4477434B2/ja
Publication of JP2006013387A publication Critical patent/JP2006013387A/ja
Publication of JP2006013387A5 publication Critical patent/JP2006013387A5/ja
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Publication of JP4477434B2 publication Critical patent/JP4477434B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2004192091A 2004-06-29 2004-06-29 荷電粒子線露光装置およびデバイス製造方法 Expired - Fee Related JP4477434B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004192091A JP4477434B2 (ja) 2004-06-29 2004-06-29 荷電粒子線露光装置およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004192091A JP4477434B2 (ja) 2004-06-29 2004-06-29 荷電粒子線露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006013387A JP2006013387A (ja) 2006-01-12
JP2006013387A5 true JP2006013387A5 (ja) 2007-08-16
JP4477434B2 JP4477434B2 (ja) 2010-06-09

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ID=35780225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004192091A Expired - Fee Related JP4477434B2 (ja) 2004-06-29 2004-06-29 荷電粒子線露光装置およびデバイス製造方法

Country Status (1)

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JP (1) JP4477434B2 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8546767B2 (en) * 2010-02-22 2013-10-01 Ims Nanofabrication Ag Pattern definition device with multiple multibeam array
JP6293435B2 (ja) * 2013-08-08 2018-03-14 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP6383228B2 (ja) * 2014-09-19 2018-08-29 株式会社ニューフレアテクノロジー マルチ荷電粒子ビームのビーム位置測定方法及びマルチ荷電粒子ビーム描画装置
US9892885B2 (en) * 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool
JP6834429B2 (ja) * 2016-08-03 2021-02-24 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びその調整方法
JP7082927B2 (ja) * 2018-08-27 2022-06-09 株式会社Ｓｃｒｅｅｎホールディングス 露光装置

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