JP2006003775A5 - - Google Patents
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- Publication number
- JP2006003775A5 JP2006003775A5 JP2004182264A JP2004182264A JP2006003775A5 JP 2006003775 A5 JP2006003775 A5 JP 2006003775A5 JP 2004182264 A JP2004182264 A JP 2004182264A JP 2004182264 A JP2004182264 A JP 2004182264A JP 2006003775 A5 JP2006003775 A5 JP 2006003775A5
- Authority
- JP
- Japan
- Prior art keywords
- display substrate
- less
- metal plate
- resin layer
- adhesion layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 claims 6
- 239000002184 metal Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 230000003746 surface roughness Effects 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910000599 Cr alloy Inorganic materials 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 239000000788 chromium alloy Substances 0.000 claims 1
- 230000009477 glass transition Effects 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004182264A JP2006003775A (ja) | 2004-06-21 | 2004-06-21 | ディスプレイ用基板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004182264A JP2006003775A (ja) | 2004-06-21 | 2004-06-21 | ディスプレイ用基板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006003775A JP2006003775A (ja) | 2006-01-05 |
| JP2006003775A5 true JP2006003775A5 (https=) | 2007-02-01 |
Family
ID=35772194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004182264A Pending JP2006003775A (ja) | 2004-06-21 | 2004-06-21 | ディスプレイ用基板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006003775A (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102576735B (zh) | 2009-09-30 | 2016-01-20 | 大日本印刷株式会社 | 挠性装置用基板、挠性装置用薄膜晶体管基板、挠性装置、薄膜元件用基板、薄膜元件、薄膜晶体管、薄膜元件用基板的制造方法、薄膜元件的制造方法及薄膜晶体管的制造方法 |
| JP2011233858A (ja) * | 2010-04-09 | 2011-11-17 | Dainippon Printing Co Ltd | 薄膜素子用基板の製造方法、薄膜素子の製造方法、薄膜トランジスタの製造方法、薄膜素子、および薄膜トランジスタ |
| KR101772661B1 (ko) | 2010-11-29 | 2017-09-13 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
| WO2015005263A1 (ja) * | 2013-07-11 | 2015-01-15 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子及びその製造方法 |
| JP7120262B2 (ja) * | 2020-02-06 | 2022-08-17 | 大日本印刷株式会社 | 蒸着マスク準備体の製造方法、フレーム付き蒸着マスク準備体の製造方法、及びフレーム付き蒸着マスク準備体 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09179106A (ja) * | 1995-12-21 | 1997-07-11 | Dainippon Printing Co Ltd | 薄型ディスプレイ用基板とこれを使用したフィルム液晶ディスプレイおよびフィールドエミッションディスプレイ |
| JPH10293293A (ja) * | 1997-04-18 | 1998-11-04 | Dainippon Printing Co Ltd | ディスプレイ用可撓性基板およびその製造方法 |
| US6825068B2 (en) * | 2000-04-18 | 2004-11-30 | E Ink Corporation | Process for fabricating thin film transistors |
| JP2003280553A (ja) * | 2002-03-22 | 2003-10-02 | Sharp Corp | アクティブマトリクス基板 |
| JP2004148566A (ja) * | 2002-10-29 | 2004-05-27 | Fuji Photo Film Co Ltd | ガスバリア性フィルム並びに該ガスバリア性フィルムからなる基板、該ガスバリア性フィルムを有する画像表示素子 |
-
2004
- 2004-06-21 JP JP2004182264A patent/JP2006003775A/ja active Pending
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