JP2005511273A - 不均一触媒の反応蒸留を行うため、特に疑似イオノンを製造するための装置 - Google Patents
不均一触媒の反応蒸留を行うため、特に疑似イオノンを製造するための装置 Download PDFInfo
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- JP2005511273A JP2005511273A JP2003548992A JP2003548992A JP2005511273A JP 2005511273 A JP2005511273 A JP 2005511273A JP 2003548992 A JP2003548992 A JP 2003548992A JP 2003548992 A JP2003548992 A JP 2003548992A JP 2005511273 A JP2005511273 A JP 2005511273A
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Abstract
Description
直径0.3mの塔セクションが、Montz社製のタイプB1が90°オフセットされて配置された2個の規則蒸留充填物を備えており、この規則充填物の高さは23cmである。触媒微粒子は、ルーズ充填物により規則蒸留充填物に導入された。供給容量、及び導入中の及び触媒除去の取り扱い容易性が決定された。使用した触媒粒子は、γ−Al2O3及びTiO2の円筒形固体あった。γ−Al2O3の円筒形固体は1.5mmの直径及び1〜4mmの高さを有するもので、2mmの等価粒径を有している。TiO2の円筒形固体は4mmの直径及び2〜10mmの高さを有するもので、5mmの等価粒径を有している。
上述のタイプB1−125.80及びタイプB1−250.60の規則充填物を用いた。
直径0.1mの塔セクションにおいて、圧力低下の測定を、窒素/イソプロパノールの試験混合物を用いて行った。このために、触媒床を塔セクションに導入し、所定量のイソプロパノールで濡らした(1つの滴下位置)。これに対する向流として、所定量の窒素を規則充填物/床を介して底部から頂部まで通過させた。実験では、規則充填物又は床の単位高さ当たりの特定の気圧低下を測定し、フラッディング点を決定した。使用した触媒微粒子は、γ−Al2O3の円筒形固体であった。円筒形固体(d=1.5mm、h=1〜4mm)の等価粒径は2mmであった。その後、構造化充填物に導入された床の特定の圧力低下及びフラッディング点を測定した。
B01/0732PCBR
45cmの床高さで、0.038Pa10.5のFファクター(1000L/hのガス流速に対応)及び0.178m3/m2hの液体ローディング(1.4L/hの液体流速に対応)において、3.33mbar/mの特定の圧力低下を測定した。規則充填物は、0.0575Pa10.5のFファクター(1500L/hのガス流速に対応)から0.178m3/m2hの一定の液体ローディングでフラッドを始めた。
Montz社製のBS−250.60の構造化充填物の90°オフセットされた2層に導入された床
46cmの床高さで、0.038Pa10.5のFファクター(1000L/hのガス流速に対応)及び0.178m3/m2hの液体ローディング(1.4L/hの液体流速に対応)において、1.09mbar/mの特定の圧力低下を測定した。規則充填物は、0.114Pa10.5のFファクター(3000L/hのガス流速に対応)から0.178m3/m2hの一定の液体ローディングでフラッドを始めた。従って、最大ガスローディングは、規則充填物に導入されなかった床と比較して、2のファクターだけ増加することができた。
例えば、図2に示されたシート状金属規則充填物2は、相互に平行に配列された直線状波形5を有し、波形はシート状金属規則充填物2を波形表面6に細分化する。波形端部5から波形端部5に測定された波形表面6の幅は「a」で示され、2個の連続する波形端部5間の距離は「c」で示され、そして波形の高さは「h」で示される。このようなシート状金属規則充填物から作製された規則充填物のガス流の流体直径(hydraulic diameter of gas flow)は下記式を用いて計算される:
実験の装備は、図4の概略図に相当する。反応蒸留塔7は、分離領域8のそれぞれにおいて、各場合、合計高さが23cmになるまで、Montz社製のタイプA3−500の構造化織物充填物の1セグメントを詰めた。反応ゾーン9は、蒸留塔の下部領域に、30mmの特定の素子高さのMontz-PakタイプB1−1000の1つの層が装備された。この層は触媒バリヤーとして働き、これにより触媒微粒子が下側分離領域に少量ずつ落下することはなかった。この層の上に、212mmの素子高さを有するMontz-PakのタイプB1−250.60の3つの層が設けられた。これらの層に、触媒がルースパッキング(loose packing;ゆる詰め)で導入された。3121gの触媒を、この場合、700kg/m3の嵩密度で詰められた。使用された触媒は、1.5mmの粒径及び1〜4mmの高さを有するγ−Al2O3上に5%のプラセオジムが設けられた円筒形固体であった。この円筒形固体は、γ−Al2O3にプラセオジムの水溶液を含浸させ、次いでか焼することにより得た。塔は、通常の間隔で、熱電対及びサンプリング箇所を装備され、これにより塔の温度分布及び濃度分布が測定された。
反応ゾーン9で使用される触媒は、γ−Al2O3上に5%のPrが設けられた円筒状固体(d=1.5mm、h=1〜4mm)であった。システムの圧力は3バールに、そして還流比は3kg/kgに設定した。底部温度は92.5℃であった。得られた塔の底部流れIIIは、62.14質量%のアセトン、0.71質量%の水、0.45質量%のメシチルオキシド、0.95質量%のジアセトンアルコール、9.14質量%のシトラール、24.43質量%の擬イオノン及び2.18質量%の高沸点物を含む735.6g/hの粗生成物であった。塔頂で、95.8質量%のアセトン及び4.2質量%の水からなる323.2g/hの留出物(流れIV)を取り出した。
Claims (11)
- 塔内部に中間空間を形成する規則充填物又は不規則充填物を有する不均一微粒触媒の存在下に、反応蒸留を行うための塔であって、触媒微粒子が、中間空間に導入、分配され、そして重力作用下に緩やかに排出されるように、規則充填物又は不規則充填物を通るガス流の流体直径と触媒微粒子の等価直径との比が、2〜20、好ましくは5〜10にされていることを特徴とする塔。
- 規則充填物が構造化充填物である請求項1に記載の塔。
- 構造化充填物がクロスチャンネル充填物である請求項2に記載の塔。
- 規則充填物又は不規則充填物が水平表面部分を有する請求項1〜3のいずれかに記載の塔。
- 規則充填物が、線状の波形を有する塔に垂直設置するシート状金属規則充填物から形成され、その線状波形はシート状金属規則充填物を波形表面に細分化しており、そしてその波形表面の水平に対する傾斜角が90°〜45°、好ましくは60°である請求項4に記載の塔。
- 規則充填物又は不規則充填物は、その表面で流れ抵抗が減少しており、好ましくは、規則充填物又は不規則充填物の穿孔及び/又は粗さのため、あるいは規則充填物をエクスパンドメタルとして構成することによりは流れ抵抗が減少している請求項1〜5のいずれかに記載の塔。
- 規則充填物がしわ状又は波形の層から形成され、及び各場合、2個のしわ状又は波形の層の間に1個の平坦中間層が配置され、且つこの平坦中間層が規則充填物の端部に伸びていないか、あるいは規則充填物の端部領域で高いガス透過率を、特に孔を有している請求項2〜6のいずれかに記載の塔。
- 規則充填物が、線状の波形を有する塔に垂直設置するためにシート状金属規則充填物から形成され、その線状波形はシート状金属規則充填物を波形表面に細分化し且つ波形端部から波形端部までを測定した幅a及び穿孔を有し、そしてその穿孔の60%以上の割合Xが、各波形表面の下側波形端部から0.4a以下の距離bを有している請求項2〜7のいずれかに記載の塔。
- 塔内部に中間空間を形成する規則充填物又は不規則充填物を有する不均一微粒触媒の存在下に、反応蒸留を行うための塔であって、
該塔が、規則充填物又は不規則充填物の比表面積が異なる、交互に配列された第1及び第2の部分領域有し、且つ
第1の部分領域では、規則充填物又は不規則充填物を通るガス流の流体直径と触媒微粒子の等価直径との比が、2〜20、好ましくは5〜10にされ、これにより触媒微粒子が、中間空間に導入、分配され、そして重力作用下に緩やかに排出され、そして第2の部分領域では、規則充填物又は不規則充填物を通るガス流の流体直径と触媒微粒子の等価直径との比が、1未満にされ、これにより触媒が第2の部分領域には導入されないようにされていることを特徴とする塔。 - 塔を、そのガス負荷及び液体負荷に関して、フラッディング限界ローディングが50〜95%、好ましくは70〜80%の最大値に到達するように、操作する工程を含む、請求項1〜9のいずれかに記載の塔で反応蒸留をする方法。
- 不均一触媒反応蒸留、特に酸又はアルカリ−触媒平衡反応を行うために、特に好ましくはアルミニウム−オキシド−担持プラセオジム触媒の存在下にシトラール及びアセトンをアルドール化することにより疑似イオノンを製造するために、請求項1〜9のいずれかに記載の塔又は請求項10に記載の方法を使用する方法。
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DE10159821A DE10159821A1 (de) | 2001-12-06 | 2001-12-06 | Vorrichtung und Verfahren zur Durchführung von heterogen katalysierter Reaktivdestillationen, insbesondere zur Herstellung von Pseudoionen |
PCT/EP2002/013796 WO2003047747A1 (de) | 2001-12-06 | 2002-12-05 | Vorrichtung und verfahren zur durchführung von heterogen katalysierten reaktivdestillationen, insbesondere zur herstellung von pseudoionon |
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DE10238140A1 (de) * | 2002-08-15 | 2004-02-26 | Basf Ag | Kontinuierliches Verfahren zur Herstellung von Carbonylverbindungen |
TWI351306B (en) * | 2003-05-16 | 2011-11-01 | Sulzer Chemtech Ag | Method of mass transfer of a material or heat |
KR20060054397A (ko) | 2003-08-01 | 2006-05-22 | 바스프 악티엔게젤샤프트 | 에틸렌아민의 제조 방법 |
DE102004033183A1 (de) * | 2004-07-09 | 2006-02-02 | Basf Ag | Mehrkanalpackung |
DE102005004854A1 (de) * | 2005-02-01 | 2006-08-17 | Basf Ag | Verfahren zur Herstellung von Bis(3-aminopropyl)amin (Dipropylentriamin, DPTA) |
PT2066583E (pt) * | 2006-09-19 | 2010-12-07 | Basf Se | Processo para a produção de cloro num reactor de leito fluidizado |
KR20090061050A (ko) * | 2006-09-19 | 2009-06-15 | 바스프 에스이 | 유동층 반응기에서 방향족 아민을 제조하는 방법 |
US8119554B2 (en) * | 2007-10-08 | 2012-02-21 | Basf Se | Use of shaped bodies having catalytic properties as reactor internals |
US8451077B2 (en) * | 2008-04-22 | 2013-05-28 | International Business Machines Corporation | MEMS switches with reduced switching voltage and methods of manufacture |
EP2409961B1 (de) | 2010-07-21 | 2013-11-27 | DSM IP Assets B.V. | Verfahren zur Herstellung von Pseudojonon |
RU2480274C2 (ru) * | 2010-12-30 | 2013-04-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный машиностроительный университет (МАМИ)" | Регулярная насадка для тепло-массообменных аппаратов |
RU2480273C2 (ru) * | 2010-12-30 | 2013-04-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный машиностроительный университет (МАМИ)" | Регулярная насадка для тепло-массообменных аппаратов |
JP6180704B2 (ja) | 2011-12-12 | 2017-08-16 | 日本リファイン株式会社 | 気液接触装置 |
DE102012012785A1 (de) | 2012-06-22 | 2013-12-24 | Wolfgang Hölderich | Verfahren zur Herstellung von Pseudojonon |
CN103191693A (zh) * | 2013-04-10 | 2013-07-10 | 凯瑞化工股份有限公司 | 开窗导流式催化剂填料 |
GB201402782D0 (en) | 2014-02-17 | 2014-04-02 | Johnson Matthey Davy Technologies Ltd | Process |
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US20050016830A1 (en) | 2005-01-27 |
DE50210664D1 (de) | 2007-09-20 |
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