JP2005510755A - チャープファイバブラッググレーティングを形成するための方法 - Google Patents

チャープファイバブラッググレーティングを形成するための方法 Download PDF

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Publication number
JP2005510755A
JP2005510755A JP2003548011A JP2003548011A JP2005510755A JP 2005510755 A JP2005510755 A JP 2005510755A JP 2003548011 A JP2003548011 A JP 2003548011A JP 2003548011 A JP2003548011 A JP 2003548011A JP 2005510755 A JP2005510755 A JP 2005510755A
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JP
Japan
Prior art keywords
grating
segment
segments
phase mask
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003548011A
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English (en)
Japanese (ja)
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JP2005510755A5 (https=
Inventor
ウンルー、ジェイムズ、オーエン
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Photronics Inc
Original Assignee
Photronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Photronics Inc filed Critical Photronics Inc
Publication of JP2005510755A publication Critical patent/JP2005510755A/ja
Publication of JP2005510755A5 publication Critical patent/JP2005510755A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
    • G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Optical Integrated Circuits (AREA)
JP2003548011A 2001-08-28 2002-08-22 チャープファイバブラッググレーティングを形成するための方法 Pending JP2005510755A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/940,947 US6567588B2 (en) 2001-08-28 2001-08-28 Method for fabricating chirped fiber bragg gratings
PCT/US2002/026951 WO2003046628A1 (en) 2001-08-28 2002-08-22 Method for fabricating chirped fiber bragg gratings

Publications (2)

Publication Number Publication Date
JP2005510755A true JP2005510755A (ja) 2005-04-21
JP2005510755A5 JP2005510755A5 (https=) 2005-11-17

Family

ID=25475697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003548011A Pending JP2005510755A (ja) 2001-08-28 2002-08-22 チャープファイバブラッググレーティングを形成するための方法

Country Status (6)

Country Link
US (2) US6567588B2 (https=)
EP (1) EP1430343A4 (https=)
JP (1) JP2005510755A (https=)
AU (1) AU2002332649A1 (https=)
CA (1) CA2458886C (https=)
WO (1) WO2003046628A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001242313A (ja) * 2000-02-28 2001-09-07 Dainippon Printing Co Ltd 光ファイバー加工用位相マスクの製造方法及びその光ファイバー加工用位相マスクを使用して作製されたブラッグ回折格子付き光ファイバー
JP3829325B2 (ja) * 2002-02-07 2006-10-04 日本電気株式会社 半導体素子およびその製造方法並びに半導体装置の製造方法
US20050042523A1 (en) * 2003-08-20 2005-02-24 Banqiu Wu Endpoint detection of plasma-assisted etch process
US7909396B2 (en) * 2004-01-08 2011-03-22 Audiovox Corporation Automobile entertainment system
US7435533B2 (en) * 2004-06-14 2008-10-14 Photronics, Inc. Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
US7396617B2 (en) * 2004-06-14 2008-07-08 Photronics, Inc. Photomask reticle having multiple versions of the same mask pattern with different biases
WO2006014376A1 (en) * 2004-07-02 2006-02-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Deformable mirror apparatus
US9005848B2 (en) * 2008-06-17 2015-04-14 Photronics, Inc. Photomask having a reduced field size and method of using the same
US9005849B2 (en) * 2009-06-17 2015-04-14 Photronics, Inc. Photomask having a reduced field size and method of using the same
US9435944B2 (en) 2011-10-11 2016-09-06 Baker Hughes Incorporated Phase mask period control
RU2707663C1 (ru) * 2019-01-18 2019-11-28 Федеральное государственное бюджетное учреждение науки Институт Ядерной Физики им. Г.И. Будкера Сибирского отделения (ИЯФ СО РАН) Способ изготовления брэгговской структуры с гофрировкой поверхности

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5499134A (en) 1994-08-24 1996-03-12 Imra America Optical pulse amplification using chirped Bragg gratings
US5718738A (en) 1996-11-04 1998-02-17 Lucent Technologies Inc. Method for making continuously chirped fiber bragg gratings
JP3526215B2 (ja) * 1997-07-03 2004-05-10 大日本印刷株式会社 光ファイバー加工用位相マスク及びその製造方法
US6160261A (en) 1998-01-20 2000-12-12 Hoshino; Hiroyuki Method for producing chired in-fiber Bragg grating
JP2001242313A (ja) 2000-02-28 2001-09-07 Dainippon Printing Co Ltd 光ファイバー加工用位相マスクの製造方法及びその光ファイバー加工用位相マスクを使用して作製されたブラッグ回折格子付き光ファイバー
US6833954B2 (en) * 2000-09-20 2004-12-21 Teraxion Inc. Lithographic method for manufacturing a mask used in the fabrication of a fiber Bragg grating
US6778733B2 (en) * 2001-01-05 2004-08-17 Teraxion Inc. Lithographic fabrication of phase mask for fiber Bragg gratings

Also Published As

Publication number Publication date
WO2003046628A1 (en) 2003-06-05
CA2458886C (en) 2010-02-16
US20030048988A1 (en) 2003-03-13
US6868209B2 (en) 2005-03-15
EP1430343A4 (en) 2007-04-18
AU2002332649A1 (en) 2003-06-10
EP1430343A1 (en) 2004-06-23
US6567588B2 (en) 2003-05-20
CA2458886A1 (en) 2003-06-05
WO2003046628A8 (en) 2004-04-29
US20030128929A1 (en) 2003-07-10

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