JP2005507954A5 - - Google Patents

Download PDF

Info

Publication number
JP2005507954A5
JP2005507954A5 JP2002583701A JP2002583701A JP2005507954A5 JP 2005507954 A5 JP2005507954 A5 JP 2005507954A5 JP 2002583701 A JP2002583701 A JP 2002583701A JP 2002583701 A JP2002583701 A JP 2002583701A JP 2005507954 A5 JP2005507954 A5 JP 2005507954A5
Authority
JP
Japan
Prior art keywords
cleaning agent
cleaning
carbon
hydrochlorofluoroether
hydrobromofluorocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002583701A
Other languages
English (en)
Japanese (ja)
Other versions
JP4160403B2 (ja
JP2005507954A (ja
Filing date
Publication date
Priority claimed from US09/841,340 external-priority patent/US6394107B1/en
Application filed filed Critical
Publication of JP2005507954A publication Critical patent/JP2005507954A/ja
Publication of JP2005507954A5 publication Critical patent/JP2005507954A5/ja
Application granted granted Critical
Publication of JP4160403B2 publication Critical patent/JP4160403B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002583701A 2001-04-24 2002-02-12 気相反応器用湿式洗浄剤としてのフッ素化ケトンの使用法 Expired - Fee Related JP4160403B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/841,340 US6394107B1 (en) 2001-04-24 2001-04-24 Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components
PCT/US2002/004087 WO2002086191A1 (en) 2001-04-24 2002-02-12 Use of fluorinated ketones as wet cleaning agents for vapor reactors

Publications (3)

Publication Number Publication Date
JP2005507954A JP2005507954A (ja) 2005-03-24
JP2005507954A5 true JP2005507954A5 (cg-RX-API-DMAC7.html) 2005-12-22
JP4160403B2 JP4160403B2 (ja) 2008-10-01

Family

ID=25284615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002583701A Expired - Fee Related JP4160403B2 (ja) 2001-04-24 2002-02-12 気相反応器用湿式洗浄剤としてのフッ素化ケトンの使用法

Country Status (6)

Country Link
US (1) US6394107B1 (cg-RX-API-DMAC7.html)
EP (1) EP1381709A1 (cg-RX-API-DMAC7.html)
JP (1) JP4160403B2 (cg-RX-API-DMAC7.html)
KR (1) KR20030090784A (cg-RX-API-DMAC7.html)
CN (1) CN1505693A (cg-RX-API-DMAC7.html)
WO (1) WO2002086191A1 (cg-RX-API-DMAC7.html)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6540930B2 (en) * 2001-04-24 2003-04-01 3M Innovative Properties Company Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
US6423673B1 (en) * 2001-09-07 2002-07-23 3M Innovation Properties Company Azeotrope-like compositions and their use
JP3958080B2 (ja) * 2002-03-18 2007-08-15 東京エレクトロン株式会社 プラズマ処理装置内の被洗浄部材の洗浄方法
US6923278B2 (en) * 2002-05-06 2005-08-02 Pride Mobility Products Corporation Adjustable anti-tip wheels for power wheelchair
US7250114B2 (en) * 2003-05-30 2007-07-31 Lam Research Corporation Methods of finishing quartz glass surfaces and components made by the methods
US20050011859A1 (en) * 2003-07-15 2005-01-20 Bing Ji Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications
US20050161061A1 (en) * 2003-09-17 2005-07-28 Hong Shih Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
US7252780B2 (en) * 2004-05-26 2007-08-07 E.I. Du Pont De Nemours And Company 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant and heat transfer compositions comprising a fluoroether
US20100108094A1 (en) * 2005-07-29 2010-05-06 Junichi Ishikawa Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance
US7385089B2 (en) * 2005-12-23 2008-06-10 3M Innovative Properties Company Fluorochemical ketone compounds and processes for their use
WO2007100886A2 (en) * 2006-02-28 2007-09-07 E. I. Du Pont De Nemours And Company Azeotropic compositions comprising fluorinated compounds for cleaning applications
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
DE202009018213U1 (de) 2009-06-12 2011-06-09 Abb Technology Ag Dielektrisches Isolationsmedium
WO2010142346A1 (en) * 2009-06-12 2010-12-16 Abb Technology Ag Dielectric insulation medium
DE202009018239U1 (de) 2009-06-12 2011-06-01 Abb Technology Ag Schalteinrichtung mit dielektrischem Isolationsmedium
DE202009009305U1 (de) 2009-06-17 2009-11-05 Ormazabal Gmbh Schalteinrichtung für Mittel-, Hoch- oder Höchstspannung mit einem Füllmedium
DE112009005222B4 (de) 2009-09-11 2022-12-29 Hitachi Energy Switzerland Ag Transformator mit einem Wärmerohr und Verfahren zur Herstellung eines Transformators
BR112012008890A2 (pt) 2009-10-19 2018-05-08 Abb Technology Ag transformador
BR112013014849A2 (pt) 2010-12-14 2016-10-18 Abb Research Ltd "meio de isolamento dielétrico, uso de um monoéter fluorídrico, uso do meio de isolamento dielétrico e aparelho para a geração, distribuição e uso de energia elétrica".
ES2554907T3 (es) 2010-12-14 2015-12-28 Abb Technology Ag Medio dieléctrico aislante
WO2012080269A1 (en) * 2010-12-16 2012-06-21 Abb Technology Ag Dielectric insulation medium
FR2975820B1 (fr) * 2011-05-24 2013-07-05 Schneider Electric Ind Sas Melange de decafluoro-2-methylbutan-3-one et d'un gaz vecteur comme milieu d'isolation electrique et/ou d'extinction des arcs electriques en moyenne tension
US8545639B2 (en) * 2011-10-31 2013-10-01 Lam Research Corporation Method of cleaning aluminum plasma chamber parts
RU2472767C1 (ru) * 2011-11-25 2013-01-20 Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" Способ получения перфторэтилизопропилкетона
WO2013087700A1 (en) 2011-12-13 2013-06-20 Abb Technology Ag Sealed and gas insulated high voltage converter environment for offshore platforms
RU2607897C1 (ru) * 2015-09-10 2017-01-11 Федеральное государственное унитарное предприятие "Российский научный центр "Прикладная химия" Способ получения перфторэтилизопропилкетона
US20170282220A1 (en) * 2016-04-01 2017-10-05 Tyco Fire & Security Gmbh Method and System for Liquid Cleaning of Smoke Sensor Heads
EP3689980A1 (en) * 2019-01-31 2020-08-05 3M Innovative Properties Company Fluoropolymer compositions

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3185734A (en) * 1960-10-25 1965-05-25 Du Pont Novel polyfluoro-substituted ketones and their preparation from polyfluoro acid fluorides
NL7711424A (nl) * 1976-10-23 1978-04-25 Hoechst Ag Werkwijze voor de bereiding van fluor bevattende ketonen.
WO1990006296A1 (en) * 1988-12-02 1990-06-14 Minnesota Mining And Manufacturing Company Direct fluorination process for making perfluorinated organic substances
JP2763083B2 (ja) * 1993-06-01 1998-06-11 工業技術院長 フッ素系洗浄溶剤組成物
US5466877A (en) * 1994-03-15 1995-11-14 Minnesota Mining And Manufacturing Company Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones
JP2869432B2 (ja) * 1996-10-04 1999-03-10 工業技術院長 溶剤及びそれを用いる物品表面の清浄化方法
JP2952414B2 (ja) * 1997-09-22 1999-09-27 工業技術院長 溶剤及びそれを用いる物品表面の清浄化方法
US5998671A (en) * 1998-05-15 1999-12-07 Alliedsignal Inc. Fluorinated ketones and method for making same
JP4398091B2 (ja) * 1998-05-26 2010-01-13 東京エレクトロン株式会社 半導体処理装置の部品の洗浄液及び洗浄方法
JP3141325B2 (ja) * 1999-01-14 2001-03-05 工業技術院長 溶剤およびそれを用いる物品表面の清浄化方法
JP4322346B2 (ja) * 1999-02-26 2009-08-26 東京エレクトロン株式会社 成膜装置のクリーニング方法

Similar Documents

Publication Publication Date Title
JP2005507954A5 (cg-RX-API-DMAC7.html)
JP2004536448A5 (cg-RX-API-DMAC7.html)
JP2004525238A5 (cg-RX-API-DMAC7.html)
MY130650A (en) Compositions for removing etching residue and use thereof
Gross et al. An equation‐of‐state contribution for polar components: dipolar molecules
TWI266969B (en) Removing solution
JPH0586241B2 (cg-RX-API-DMAC7.html)
ATE310838T1 (de) Verwendung von perfluorketonen als reinigungs-, ätz- und dotierungsgase für gasphasenreaktoren
Chakma et al. Numerical simulation and investigation of system parameters of sonochemical process
JP2002508439A (ja) ペルフルオロブチルメチルエーテルを含む組成物及びその組成物の使用
JP2010535698A5 (cg-RX-API-DMAC7.html)
JP2009513348A5 (cg-RX-API-DMAC7.html)
JP2005222633A (ja) 磁気ディスクおよびその製造方法
MY145556A (en) Method for purifying hydrogen chloride
Tebbji et al. Inhibition effect of two organic compounds pyridine–pyrazole type in acidic corrosion of steel
JP2004534060A (ja) ポリ塩化アルカンの脱塩化水素化安定化
EP1447716A3 (en) Lithographic apparatus with gas flushing system
FR2850114B1 (fr) Nouvelles compositions contenant des hydrocarbures fluores et des solvants oxygenes
JP2006512448A5 (cg-RX-API-DMAC7.html)
TW200736842A (en) Coating and developing method, coating and developing apparatus, and recording medium
TW200508554A (en) Improved flushing for refrigeration system components
Wiśniewski et al. Pearson's hard-soft acid-base principle as a means of interpreting the reactivity of carbon materials
Trasca et al. Lattice model of gas condensation within nanopores
JP4107720B2 (ja) 半導体製造装置における汚染物の洗浄方法
Irving et al. Interaction of functionalized benzene molecules with carbon nanopores