JP2005502211A5 - - Google Patents
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- JP2005502211A5 JP2005502211A5 JP2003525958A JP2003525958A JP2005502211A5 JP 2005502211 A5 JP2005502211 A5 JP 2005502211A5 JP 2003525958 A JP2003525958 A JP 2003525958A JP 2003525958 A JP2003525958 A JP 2003525958A JP 2005502211 A5 JP2005502211 A5 JP 2005502211A5
- Authority
- JP
- Japan
- Prior art keywords
- delivery unit
- unit according
- laser
- analysis module
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005540 biological transmission Effects 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 3
- 230000010287 polarization Effects 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000010926 purge Methods 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
Applications Claiming Priority (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/943,343 | 2001-08-29 | ||
| US09/943,343 US6567450B2 (en) | 1999-12-10 | 2001-08-29 | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US10/000,991 | 2001-11-14 | ||
| US10/000,991 US6795474B2 (en) | 2000-11-17 | 2001-11-14 | Gas discharge laser with improved beam path |
| US10/006,913 | 2001-11-29 | ||
| US10/006,913 US6535531B1 (en) | 2001-11-29 | 2001-11-29 | Gas discharge laser with pulse multiplier |
| US10/036,676 US6882674B2 (en) | 1999-12-27 | 2001-12-21 | Four KHz gas discharge laser system |
| US10/036,676 | 2001-12-21 | ||
| US10/036,727 | 2001-12-21 | ||
| US10/036,727 US6865210B2 (en) | 2001-05-03 | 2001-12-21 | Timing control for two-chamber gas discharge laser system |
| US10/141,216 US6693939B2 (en) | 2001-01-29 | 2002-05-07 | Laser lithography light source with beam delivery |
| US10/141,216 | 2002-05-07 | ||
| PCT/US2002/026400 WO2003021732A1 (en) | 2001-08-29 | 2002-08-19 | Laser lithography light source with beam delivery |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007260176A Division JP4705082B2 (ja) | 2001-08-29 | 2007-10-03 | ビームデリバリーを備えたレーザリソグラフィー光源 |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2005502211A JP2005502211A (ja) | 2005-01-20 |
| JP2005502211A6 JP2005502211A6 (ja) | 2005-04-14 |
| JP2005502211A5 true JP2005502211A5 (enExample) | 2006-01-05 |
| JP4290001B2 JP4290001B2 (ja) | 2009-07-01 |
Family
ID=27555374
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003525958A Expired - Lifetime JP4290001B2 (ja) | 2001-08-29 | 2002-08-19 | ビームデリバリーを備えたレーザリソグラフィー光源 |
| JP2007260176A Expired - Lifetime JP4705082B2 (ja) | 2001-08-29 | 2007-10-03 | ビームデリバリーを備えたレーザリソグラフィー光源 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007260176A Expired - Lifetime JP4705082B2 (ja) | 2001-08-29 | 2007-10-03 | ビームデリバリーを備えたレーザリソグラフィー光源 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6693939B2 (enExample) |
| EP (1) | EP1421653A4 (enExample) |
| JP (2) | JP4290001B2 (enExample) |
| KR (1) | KR100909018B1 (enExample) |
| CA (1) | CA2458111A1 (enExample) |
| IL (1) | IL160585A0 (enExample) |
| WO (1) | WO2003021732A1 (enExample) |
Families Citing this family (74)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7856044B2 (en) * | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
| US6839372B2 (en) * | 2000-11-17 | 2005-01-04 | Cymer, Inc. | Gas discharge ultraviolet laser with enclosed beam path with added oxidizer |
| US6912052B2 (en) * | 2000-11-17 | 2005-06-28 | Cymer, Inc. | Gas discharge MOPA laser spectral analysis module |
| US7190707B2 (en) | 2001-01-29 | 2007-03-13 | Cymer, Inc. | Gas discharge laser light source beam delivery unit |
| US6690704B2 (en) * | 2001-04-09 | 2004-02-10 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
| US7009140B2 (en) * | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
| US6928093B2 (en) * | 2002-05-07 | 2005-08-09 | Cymer, Inc. | Long delay and high TIS pulse stretcher |
| US7897947B2 (en) * | 2007-07-13 | 2011-03-01 | Cymer, Inc. | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7415056B2 (en) * | 2006-03-31 | 2008-08-19 | Cymer, Inc. | Confocal pulse stretcher |
| US7518787B2 (en) * | 2006-06-14 | 2009-04-14 | Cymer, Inc. | Drive laser for EUV light source |
| US7088758B2 (en) | 2001-07-27 | 2006-08-08 | Cymer, Inc. | Relax gas discharge laser lithography light source |
| US8653437B2 (en) | 2010-10-04 | 2014-02-18 | Cymer, Llc | EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods |
| US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7016388B2 (en) * | 2002-05-07 | 2006-03-21 | Cymer, Inc. | Laser lithography light source with beam delivery |
| EP1502334B1 (en) * | 2002-05-07 | 2009-12-23 | Cymer, Inc. | High power deep ultraviolet laser with long life optics |
| US8654438B2 (en) | 2010-06-24 | 2014-02-18 | Cymer, Llc | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
| US7308013B2 (en) | 2002-11-05 | 2007-12-11 | Lambda Physik Ag | Excimer or molecular fluorine laser system with precision timing |
| US20040202220A1 (en) * | 2002-11-05 | 2004-10-14 | Gongxue Hua | Master oscillator-power amplifier excimer laser system |
| US7277188B2 (en) * | 2003-04-29 | 2007-10-02 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7184204B2 (en) * | 2003-07-01 | 2007-02-27 | Lambda Physik Ag | Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime |
| US6894785B2 (en) * | 2003-09-30 | 2005-05-17 | Cymer, Inc. | Gas discharge MOPA laser spectral analysis module |
| US6873418B1 (en) | 2003-09-30 | 2005-03-29 | Cymer, Inc. | Optical mountings for gas discharge MOPA laser spectral analysis module |
| JP4416481B2 (ja) * | 2003-11-18 | 2010-02-17 | ギガフォトン株式会社 | 光学的パルス伸長器および露光用放電励起ガスレーザ装置 |
| US7321468B2 (en) | 2003-12-15 | 2008-01-22 | Carl Zeiss Laser Optics Gmbh | Method and optical arrangement for beam guiding of a light beam with beam delay |
| US7522650B2 (en) * | 2004-03-31 | 2009-04-21 | Cymer, Inc. | Gas discharge laser chamber improvements |
| US7006547B2 (en) * | 2004-03-31 | 2006-02-28 | Cymer, Inc. | Very high repetition rate narrow band gas discharge laser system |
| US20050286599A1 (en) * | 2004-06-29 | 2005-12-29 | Rafac Robert J | Method and apparatus for gas discharge laser output light coherency reduction |
| US7307688B2 (en) * | 2004-11-19 | 2007-12-11 | Asml Netherlands B.V. | Clamping device for optical elements, lithographic apparatus with optical elements in a clamping device, and method for manufacturing such apparatus |
| US20060222034A1 (en) * | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
| US7317536B2 (en) | 2005-06-27 | 2008-01-08 | Cymer, Inc. | Spectral bandwidth metrology for high repetition rate gas discharge lasers |
| US7633989B2 (en) * | 2005-06-27 | 2009-12-15 | Cymer, Inc. | High pulse repetition rate gas discharge laser |
| US7653095B2 (en) * | 2005-06-30 | 2010-01-26 | Cymer, Inc. | Active bandwidth control for a laser |
| US7317179B2 (en) * | 2005-10-28 | 2008-01-08 | Cymer, Inc. | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate |
| US7679029B2 (en) * | 2005-10-28 | 2010-03-16 | Cymer, Inc. | Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations |
| US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| EP1952493A4 (en) * | 2005-11-01 | 2017-05-10 | Cymer, LLC | Laser system |
| US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
| US7885309B2 (en) | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
| US7746913B2 (en) * | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| US7643529B2 (en) | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
| JP4763471B2 (ja) * | 2006-02-07 | 2011-08-31 | 株式会社小松製作所 | レーザチャンバのウィンドウ劣化判定装置および方法 |
| US8158960B2 (en) * | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7443903B2 (en) * | 2006-04-19 | 2008-10-28 | Mobius Photonics, Inc. | Laser apparatus having multiple synchronous amplifiers tied to one master oscillator |
| US7507976B2 (en) * | 2006-05-31 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus, beam delivery systems, prisms and device manufacturing method |
| US7433372B2 (en) | 2006-06-05 | 2008-10-07 | Cymer, Inc. | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
| US7655925B2 (en) * | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
| DE102008003288A1 (de) | 2008-01-05 | 2009-07-09 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung des in einer Projektionsbelichtungsanlage verwendeten Lichts |
| US20090250637A1 (en) * | 2008-04-02 | 2009-10-08 | Cymer, Inc. | System and methods for filtering out-of-band radiation in EUV exposure tools |
| US8519366B2 (en) * | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
| US8284815B2 (en) * | 2008-10-21 | 2012-10-09 | Cymer, Inc. | Very high power laser chamber optical improvements |
| JP2012506634A (ja) * | 2008-10-21 | 2012-03-15 | サイマー インコーポレイテッド | 2チャンバガス放電レーザにおけるレーザ制御の方法及び装置 |
| EP2204695B1 (en) | 2008-12-31 | 2019-01-02 | ASML Holding N.V. | Etendue adjuster for a pulsed beam |
| US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| US8462425B2 (en) | 2010-10-18 | 2013-06-11 | Cymer, Inc. | Oscillator-amplifier drive laser with seed protection for an EUV light source |
| JP6242917B2 (ja) * | 2013-02-08 | 2017-12-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器 |
| WO2015092855A1 (ja) | 2013-12-16 | 2015-06-25 | ギガフォトン株式会社 | レーザ装置 |
| US9357625B2 (en) * | 2014-07-07 | 2016-05-31 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| US9709897B2 (en) | 2015-10-28 | 2017-07-18 | Cymer, Llc | Polarization control of pulsed light beam |
| US9762023B2 (en) * | 2015-12-21 | 2017-09-12 | Cymer, Llc | Online calibration for repetition rate dependent performance variables |
| WO2017158694A1 (ja) * | 2016-03-14 | 2017-09-21 | ギガフォトン株式会社 | レーザ装置及び極端紫外光生成システム |
| JP6762364B2 (ja) * | 2016-07-26 | 2020-09-30 | ギガフォトン株式会社 | レーザシステム |
| US20240170905A1 (en) * | 2021-04-01 | 2024-05-23 | Asml Netherlands B.V. | Laser system |
| CN114406470B (zh) * | 2022-01-26 | 2025-02-14 | 中国航空制造技术研究院 | 排气管筒体与法兰的双光束激光焊接方法 |
| WO2025202787A1 (en) * | 2024-03-29 | 2025-10-02 | Cymer, Llc | Adjustable mounting apparatus for optical element |
| CN118869073B (zh) * | 2024-09-26 | 2024-11-29 | 武汉英飞光创科技有限公司 | 一种光模块的测试装置、方法及电子设备 |
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| US5315611A (en) | 1986-09-25 | 1994-05-24 | The United States Of America As Represented By The United States Department Of Energy | High average power magnetic modulator for metal vapor lasers |
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-
2002
- 2002-05-07 US US10/141,216 patent/US6693939B2/en not_active Expired - Lifetime
- 2002-08-19 CA CA002458111A patent/CA2458111A1/en not_active Abandoned
- 2002-08-19 IL IL16058502A patent/IL160585A0/xx unknown
- 2002-08-19 KR KR1020047003063A patent/KR100909018B1/ko not_active Expired - Lifetime
- 2002-08-19 EP EP02759404A patent/EP1421653A4/en not_active Withdrawn
- 2002-08-19 WO PCT/US2002/026400 patent/WO2003021732A1/en not_active Ceased
- 2002-08-19 JP JP2003525958A patent/JP4290001B2/ja not_active Expired - Lifetime
-
2007
- 2007-10-03 JP JP2007260176A patent/JP4705082B2/ja not_active Expired - Lifetime
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