JP2005502211A5 - - Google Patents

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Publication number
JP2005502211A5
JP2005502211A5 JP2003525958A JP2003525958A JP2005502211A5 JP 2005502211 A5 JP2005502211 A5 JP 2005502211A5 JP 2003525958 A JP2003525958 A JP 2003525958A JP 2003525958 A JP2003525958 A JP 2003525958A JP 2005502211 A5 JP2005502211 A5 JP 2005502211A5
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JP
Japan
Prior art keywords
delivery unit
unit according
laser
analysis module
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003525958A
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English (en)
Japanese (ja)
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JP2005502211A (ja
JP4290001B2 (ja
JP2005502211A6 (ja
Filing date
Publication date
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Priority claimed from US10/141,216 external-priority patent/US6693939B2/en
Application filed filed Critical
Publication of JP2005502211A publication Critical patent/JP2005502211A/ja
Publication of JP2005502211A6 publication Critical patent/JP2005502211A6/ja
Publication of JP2005502211A5 publication Critical patent/JP2005502211A5/ja
Publication of JP4290001B2 publication Critical patent/JP4290001B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003525958A 2001-08-29 2002-08-19 ビームデリバリーを備えたレーザリソグラフィー光源 Expired - Lifetime JP4290001B2 (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US09/943,343 2001-08-29
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/000,991 2001-11-14
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 2001-11-29
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/036,676 2001-12-21
US10/036,727 2001-12-21
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/141,216 US6693939B2 (en) 2001-01-29 2002-05-07 Laser lithography light source with beam delivery
US10/141,216 2002-05-07
PCT/US2002/026400 WO2003021732A1 (en) 2001-08-29 2002-08-19 Laser lithography light source with beam delivery

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007260176A Division JP4705082B2 (ja) 2001-08-29 2007-10-03 ビームデリバリーを備えたレーザリソグラフィー光源

Publications (4)

Publication Number Publication Date
JP2005502211A JP2005502211A (ja) 2005-01-20
JP2005502211A6 JP2005502211A6 (ja) 2005-04-14
JP2005502211A5 true JP2005502211A5 (enExample) 2006-01-05
JP4290001B2 JP4290001B2 (ja) 2009-07-01

Family

ID=27555374

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003525958A Expired - Lifetime JP4290001B2 (ja) 2001-08-29 2002-08-19 ビームデリバリーを備えたレーザリソグラフィー光源
JP2007260176A Expired - Lifetime JP4705082B2 (ja) 2001-08-29 2007-10-03 ビームデリバリーを備えたレーザリソグラフィー光源

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007260176A Expired - Lifetime JP4705082B2 (ja) 2001-08-29 2007-10-03 ビームデリバリーを備えたレーザリソグラフィー光源

Country Status (7)

Country Link
US (1) US6693939B2 (enExample)
EP (1) EP1421653A4 (enExample)
JP (2) JP4290001B2 (enExample)
KR (1) KR100909018B1 (enExample)
CA (1) CA2458111A1 (enExample)
IL (1) IL160585A0 (enExample)
WO (1) WO2003021732A1 (enExample)

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JP6242917B2 (ja) * 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器
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