KR100909018B1 - 레이저 리소그래피 빔송출 광원 - Google Patents

레이저 리소그래피 빔송출 광원 Download PDF

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KR100909018B1
KR100909018B1 KR1020047003063A KR20047003063A KR100909018B1 KR 100909018 B1 KR100909018 B1 KR 100909018B1 KR 1020047003063 A KR1020047003063 A KR 1020047003063A KR 20047003063 A KR20047003063 A KR 20047003063A KR 100909018 B1 KR100909018 B1 KR 100909018B1
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South Korea
Prior art keywords
laser
pulse
module
enclosure
optical element
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Korean (ko)
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KR20040047802A (ko
Inventor
클레네브라이언씨.
다스팔라시피.
그로베스티븐엘.
에르쇼브알렉산더아이.
스미스스코트티.
팬시아오지앙제이.
샌드스트롬리차드엘.
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사이머 인코포레이티드
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Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Application filed by 사이머 인코포레이티드 filed Critical 사이머 인코포레이티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm

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  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020047003063A 2001-08-29 2002-08-19 레이저 리소그래피 빔송출 광원 Expired - Lifetime KR100909018B1 (ko)

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Application Number Priority Date Filing Date Title
US09/943,343 2001-08-29
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/000,991 2001-11-14
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 2001-11-29
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/036,676 2001-12-21
US10/036,727 2001-12-21
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/141,216 US6693939B2 (en) 2001-01-29 2002-05-07 Laser lithography light source with beam delivery
US10/141,216 2002-05-07
PCT/US2002/026400 WO2003021732A1 (en) 2001-08-29 2002-08-19 Laser lithography light source with beam delivery

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Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US6912052B2 (en) * 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US7190707B2 (en) 2001-01-29 2007-03-13 Cymer, Inc. Gas discharge laser light source beam delivery unit
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7415056B2 (en) * 2006-03-31 2008-08-19 Cymer, Inc. Confocal pulse stretcher
US7518787B2 (en) * 2006-06-14 2009-04-14 Cymer, Inc. Drive laser for EUV light source
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US7016388B2 (en) * 2002-05-07 2006-03-21 Cymer, Inc. Laser lithography light source with beam delivery
EP1502334B1 (en) * 2002-05-07 2009-12-23 Cymer, Inc. High power deep ultraviolet laser with long life optics
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US7308013B2 (en) 2002-11-05 2007-12-11 Lambda Physik Ag Excimer or molecular fluorine laser system with precision timing
US20040202220A1 (en) * 2002-11-05 2004-10-14 Gongxue Hua Master oscillator-power amplifier excimer laser system
US7277188B2 (en) * 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7184204B2 (en) * 2003-07-01 2007-02-27 Lambda Physik Ag Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
US6894785B2 (en) * 2003-09-30 2005-05-17 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6873418B1 (en) 2003-09-30 2005-03-29 Cymer, Inc. Optical mountings for gas discharge MOPA laser spectral analysis module
JP4416481B2 (ja) * 2003-11-18 2010-02-17 ギガフォトン株式会社 光学的パルス伸長器および露光用放電励起ガスレーザ装置
US7321468B2 (en) 2003-12-15 2008-01-22 Carl Zeiss Laser Optics Gmbh Method and optical arrangement for beam guiding of a light beam with beam delay
US7522650B2 (en) * 2004-03-31 2009-04-21 Cymer, Inc. Gas discharge laser chamber improvements
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7307688B2 (en) * 2004-11-19 2007-12-11 Asml Netherlands B.V. Clamping device for optical elements, lithographic apparatus with optical elements in a clamping device, and method for manufacturing such apparatus
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7746913B2 (en) * 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
JP4763471B2 (ja) * 2006-02-07 2011-08-31 株式会社小松製作所 レーザチャンバのウィンドウ劣化判定装置および方法
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7443903B2 (en) * 2006-04-19 2008-10-28 Mobius Photonics, Inc. Laser apparatus having multiple synchronous amplifiers tied to one master oscillator
US7507976B2 (en) * 2006-05-31 2009-03-24 Asml Netherlands B.V. Lithographic apparatus, beam delivery systems, prisms and device manufacturing method
US7433372B2 (en) 2006-06-05 2008-10-07 Cymer, Inc. Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
DE102008003288A1 (de) 2008-01-05 2009-07-09 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Überwachung des in einer Projektionsbelichtungsanlage verwendeten Lichts
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US8284815B2 (en) * 2008-10-21 2012-10-09 Cymer, Inc. Very high power laser chamber optical improvements
JP2012506634A (ja) * 2008-10-21 2012-03-15 サイマー インコーポレイテッド ２チャンバガス放電レーザにおけるレーザ制御の方法及び装置
EP2204695B1 (en) 2008-12-31 2019-01-02 ASML Holding N.V. Etendue adjuster for a pulsed beam
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
JP6242917B2 (ja) * 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー ビーム反転モジュールおよびそのようなビーム反転モジュールを有する光パワー増幅器
WO2015092855A1 (ja) 2013-12-16 2015-06-25 ギガフォトン株式会社 レーザ装置
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
US9709897B2 (en) 2015-10-28 2017-07-18 Cymer, Llc Polarization control of pulsed light beam
US9762023B2 (en) * 2015-12-21 2017-09-12 Cymer, Llc Online calibration for repetition rate dependent performance variables
WO2017158694A1 (ja) * 2016-03-14 2017-09-21 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
JP6762364B2 (ja) * 2016-07-26 2020-09-30 ギガフォトン株式会社 レーザシステム
US20240170905A1 (en) * 2021-04-01 2024-05-23 Asml Netherlands B.V. Laser system
CN114406470B (zh) * 2022-01-26 2025-02-14 中国航空制造技术研究院 排气管筒体与法兰的双光束激光焊接方法
WO2025202787A1 (en) * 2024-03-29 2025-10-02 Cymer, Llc Adjustable mounting apparatus for optical element
CN118869073B (zh) * 2024-09-26 2024-11-29 武汉英飞光创科技有限公司 一种光模块的测试装置、方法及电子设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US4911711A (en) * 1986-12-05 1990-03-27 Taunton Technologies, Inc. Sculpture apparatus for correcting curvature of the cornea
US5156943A (en) * 1987-10-25 1992-10-20 Whitney Theodore R High resolution imagery systems and methods
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5309456A (en) * 1992-10-30 1994-05-03 The United States Of America As Represented By The United States Department Of Energy Pulse stretcher
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5980513A (en) * 1994-04-25 1999-11-09 Autonomous Technologies Corp. Laser beam delivery and eye tracking system
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
IL112546A (en) * 1995-02-06 1999-04-11 Oramir Semiconductor Ltd Laser pulse extender
US5863017A (en) 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
US5771260A (en) * 1996-10-04 1998-06-23 Excimer Laser Systems, Inc. Enclosure system for laser optical systems and devices
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US5991324A (en) 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US6151349A (en) 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
SE519397C2 (sv) * 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6359922B1 (en) * 1999-10-20 2002-03-19 Cymer, Inc. Single chamber gas discharge laser with line narrowed seed beam

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser

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JP4705082B2 (ja) 2011-06-22
US6693939B2 (en) 2004-02-17
CA2458111A1 (en) 2003-03-13
KR20040047802A (ko) 2004-06-05
JP4290001B2 (ja) 2009-07-01
US20020191654A1 (en) 2002-12-19
WO2003021732A1 (en) 2003-03-13
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IL160585A0 (en) 2004-07-25
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