JP2005349806A - Photofabrication method and apparatus therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photofabrication method and an apparatus, which utilize, of UV contained in light from a light source, the UV of a predetermined wavelength that is effective to the curing of a photocurable resin composition and which prevent or suppress the degradation by UV of a liquid crystal drawing mask used in the photofabrication to prolong the service life of the mask. <P>SOLUTION: The photofabrication method and the apparatus are provided, which method and apparatus, in forming a photocured resin layer by irradiating a light on a shaping surface consisting of a UV-curable resin composition and by the UV of a predetermined wavelength contained in the light, on one hand reflect the UV of the predetermined wavelength used for forming the photocured resin layer and introduce it to the liquid crystal drawing mask and on the other utilize a UV separation apparatus that makes the UV other than the predetermined wavelength transmit and separates it out of the system to remove, and which, while utilizing highly efficiently the UV of the predetermined wavelength, suppress the deterioration of the liquid crystal drawing mask by UV to attain an extended life. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an optical modeling method and an apparatus therefor for performing modeling by photocuring a photocurable resin composition with ultraviolet rays. More specifically, the present invention achieves a longer life of the liquid crystal drawing mask by suppressing deterioration due to ultraviolet rays or ultraviolet rays and infrared rays of the liquid crystal drawing mask used as the drawing mask, and further, the modeling surface through the liquid crystal drawing mask. The present invention relates to an optical modeling method and apparatus for manufacturing a high-quality optically shaped object excellent in appearance and dimensional accuracy with high modeling accuracy and high modeling speed with high productivity while uniforming the intensity distribution of light irradiated on .

  In recent years, an optical modeling method and apparatus for manufacturing a three-dimensional model by curing a photocurable resin based on data input to a three-dimensional CAD has been put into practical use. This stereolithography technology includes a model for verifying the appearance design in the middle of design, a model for checking the functionality of parts, a resin mold for manufacturing a mold, a base model for manufacturing a mold, etc. It attracts attention because it can easily form such complex three-dimensional objects.

  In manufacturing a modeled object by the optical modeling method, a method using a modeling bath is widely used, and as a procedure, a liquid photocurable resin is put in the modeling bath so that a desired pattern can be obtained on the liquid surface. A spot-shaped ultraviolet laser beam controlled by a computer is selectively irradiated to be photocured to a predetermined thickness to form a cured resin layer, and the cured resin layer is moved downward in the modeling bath to form a modeling bath. The photocurable resin liquid is flowed onto the cured resin layer to form a layer of the photocurable resin liquid, and the cured resin layer is formed by irradiating the photocurable resin liquid layer with a spot-like ultraviolet laser beam. A method of forming and repeating the above steps until a three-dimensional object having a predetermined shape and size is obtained is widely adopted.

  However, in the case of the above-described conventional method using spot-shaped ultraviolet laser light, a so-called planar photocured pattern is formed by moving one spot-shaped laser light while irradiating the surface of the photocurable resin. Since it is a stippling method, it takes a long time for modeling, and there is a problem that productivity is low. Moreover, since the ultraviolet laser device used as the light source is extremely expensive, this type of optical three-dimensional modeling apparatus is made expensive.

  In order to eliminate the above-described problems of the prior art using spot laser light, a light source that is less expensive than a spot laser light irradiation device, such as a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a mercury lamp, a metal halide lamp, or a xenon lamp Using a light source such as a high-intensity discharge lamp (High Intensity Dis-charge Lamp) (HID lamp), a drawing mask is placed downstream of the light source, and the cross-sectional shape pattern to be formed is drawn through the drawing mask. A three-dimensional model is formed by repeating the process of irradiating a modeling surface made of the photocurable resin composition with a corresponding light to form a cured resin layer having a predetermined cross-sectional shape pattern corresponding to the mask image of the drawing mask. Has been developed. At that time, as a drawing mask, there is known a method of performing optical modeling using a liquid crystal drawing mask in which a plurality of minute liquid crystal shutters capable of shielding and transmitting light in a minute dot area are arranged in a line or a plane. (For example, see Patent Documents 1 to 4).

  In optical three-dimensional modeling, light is transmitted through a liquid crystal drawing mask using the above-described conventional technique for manufacturing a three-dimensional model by spotting using spot laser light and a relatively inexpensive light source such as a high-intensity discharge lamp. In any of the above-described conventional modeling techniques for forming a photocured resin layer by irradiating light onto a modeling surface made of a curable resin composition, an ultraviolet curable resin composition is used as the photocurable resin composition. In general, a resin layer photocured by ultraviolet laser light or ultraviolet light contained in light from a light source is widely used. The reasons for this are as follows: (1) UV light has a short wavelength and does not penetrate deeply into the modeling surface, making it easy to adjust the depth of penetration of the light beam into the modeling surface. (2) On the other hand, visible light and infrared rays have long wavelengths and penetrate deep into the modeling surface, so it is difficult to adjust the penetration depth of the light into the modeling surface. It is difficult to form a photocured resin layer having a predetermined thickness and a uniform thickness, and accordingly, it is difficult to produce a three-dimensional modeled article having excellent dimensional accuracy; (3) cured with ultraviolet rays In addition, when an ultraviolet curable resin composition that is not cured by visible light or infrared light is used, an optical modeling operation can be performed even in a bright place, whereas when a photocurable resin composition that is cured by visible light is used, light irradiation is performed. The part which is not done It is hardened by visible light inside and cannot be photocured to a predetermined shape pattern, and it is necessary to perform modeling work in a dark room, which is extremely inferior in handling property of the photocurable resin composition and workability at the time of modeling. (4) When a photocurable resin composition that is cured by infrared rays is used, it is difficult to form a photocured shape pattern having a predetermined sharp outline, and it is difficult to obtain a molded article having excellent dimensional accuracy. It is done.

  Among the above-described modeling techniques for forming a resin layer photocured by ultraviolet rays using an ultraviolet curable resin composition as a photocurable resin composition, photocuring was performed by irradiating the modeling surface with light through a liquid crystal drawing mask. As described above, the technology for forming the resin layer has an area that can be cured at a time, compared to the technology that forms the resin layer that is photocured by irradiating the modeling surface with spot-like ultraviolet laser light and irradiating it with a stippling method. Since it is large, it is excellent in that the modeling speed is high and an inexpensive light source can be used as compared with a laser emitting device. However, when the present inventor repeated research on the optical modeling technology for forming a resin layer photocured by ultraviolet rays using a liquid crystal drawing mask, the liquid crystal drawing mask deteriorates early due to ultraviolet rays contained in the light from the light source, There is a drawback that the mask function (that is, the light shielding and translucency function in the minute dot area) is easily lost within a short period of time, and in order to make the optical modeling technique using the liquid crystal drawing mask practically effective, the liquid crystal It has been found that it is necessary to prevent the early deterioration of the drawing mask due to ultraviolet rays and to extend its life.

  The liquid crystal itself has been widely used in recent years as a liquid crystal display in personal computers, mobile phones, large televisions, and the like, and is also used in the field of liquid crystal projectors. In these applications, a light source that emits light including ultraviolet rays, such as a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, or a xenon lamp, is usually used for display by liquid crystal. Therefore, in these fields, the prevention of deterioration of the liquid crystal due to ultraviolet rays has been studied, but in these fields, the light rays used for the liquid crystal display are mainly visible rays, and ultraviolet rays are hardly used. Attempts have been made exclusively to extend the life of liquid crystals by cutting all ultraviolet rays and short-wavelength visible rays close to ultraviolet rays. As such a conventional technique, for example, for use in a liquid crystal projector or the like that cuts light having a wavelength of 430 nm or less (cuts all ultraviolet rays having a wavelength of 400 nm or less and visible light having a short wavelength of 400 to 430 nm). UV absorbing filter glass is known (see Patent Document 5).

  However, in the optical modeling technique using a liquid crystal drawing mask, as described above, from the viewpoints of the handleability and workability of the photocurable resin composition at the time of optical modeling, and the dimensional accuracy of the resulting optical modeling object, photocuring Since it is necessary to form a photocured resin layer having a predetermined shape pattern on the modeling surface by ultraviolet rays contained in the light from the light source using the ultraviolet curable resin composition as the curable resin composition, the light from the light source If all the ultraviolet rays contained in are cut, stereolithography itself cannot be performed. Therefore, the conventional technology as described in the above-mentioned patent document 5 (in order to suppress deterioration of liquid crystals due to ultraviolet rays), which is intended for liquid crystal displays and liquid crystal projectors such as personal computers, mobile phones, and large televisions. Conventional technology for cutting off ultraviolet rays) cannot be adopted in stereolithography technology, and it is necessary to develop technology for improving durability against ultraviolet rays, which is specific to stereolithography technology using a liquid crystal drawing mask. That is, an optical modeling technique for manufacturing a three-dimensional three-dimensional object using ultraviolet rays using a liquid crystal drawing mask and an optical modeling technique for manufacturing a two-dimensional object (modeling pattern) (for example, using a liquid crystal drawing mask). Common to both resist technology).

  In performing stereolithography by irradiating ultraviolet rays through a liquid crystal drawing mask, from the viewpoint of suppressing deterioration of the liquid crystal drawing mask due to ultraviolet rays, ultraviolet rays having a predetermined wavelength used for curing the photocurable resin composition are transmitted. On the other hand, it is conceivable to use a filter that absorbs and / or reflects ultraviolet rays having a wavelength other than the predetermined wavelength that is not used for curing the photocurable resin composition. However, when an attempt was made to use an ultraviolet filter that transmits only ultraviolet rays having a predetermined wavelength in order to carry out the same, an ultraviolet filter having a predetermined wavelength that is used for curing a photocurable resin composition is known as a conventionally known ultraviolet filter. The transmittance of the light is about 85% at the highest, and 15% or more of the ultraviolet ray having the predetermined wavelength is lost by being absorbed and / or reflected by the filter, and the predetermined wavelength included in the light from the light source It has been found that it is difficult to efficiently and effectively use ultraviolet rays. When the utilization rate of ultraviolet rays having a predetermined wavelength is lowered, there is a problem in that it becomes difficult to form a clear cured image, and it becomes necessary to use an expensive light source with higher energy intensity.

  In addition, liquid crystal drawing masks tend to be deteriorated even by infrared rays having a large heating effect, although not as much as ultraviolet rays. From this point, in the optical modeling technique using a liquid crystal drawing mask, the deterioration of the liquid crystal drawing mask due to ultraviolet rays is suppressed. There is a need for the development of a technology that can prevent or suppress deterioration due to infrared rays and further extend the life of the liquid crystal drawing mask.

  Furthermore, when performing optical modeling using a liquid crystal drawing mask, in addition to preventing deterioration of the liquid crystal drawing mask due to ultraviolet rays, high-quality optical modeling objects that are superior in appearance, dimensional accuracy, strength uniformity, etc. In order to manufacture with high accuracy, it is required that the intensity distribution of the light irradiated to the modeling surface through the liquid crystal drawing mask is uniform, but the ultraviolet rays irradiated to the modeling surface and prevention of deterioration of the liquid crystal drawing mask due to ultraviolet rays In the current situation, there is no known prior art that can simultaneously achieve uniform intensity distribution.

Japanese Patent Laid-Open No. 62-288844 Japanese Patent Laid-Open No. 3-227222 JP 7-2905789 A JP-A-8-112863 JP 2003-48749 A

An object of the present invention is to provide a UV modeling resin that uses an ultraviolet curable resin composition and uses a liquid crystal drawing mask to form a resin layer photocured by ultraviolet rays contained in light from a light source. By suppressing deterioration due to UV light or infrared light and infrared light and extending the durability life of the liquid crystal drawing mask, at the same time, it is possible to effectively and efficiently use ultraviolet light of a predetermined wavelength contained in the light from the light source without waste. An optical modeling method and apparatus capable of manufacturing a photo-cured model with high modeling accuracy and at a high modeling speed with high productivity and low cost while preventing occurrence of curing unevenness and strength unevenness are provided. That is.
Furthermore, the object of the present invention is to suppress the deterioration of the liquid crystal drawing mask due to ultraviolet rays and infrared rays, and to effectively use the ultraviolet rays of a predetermined wavelength with high efficiency, and the intensity of light irradiated to the modeling surface through the liquid crystal drawing mask. It is an object of the present invention to provide an optical modeling method and apparatus capable of producing an optical modeling object with uniform distribution, further excellent modeling accuracy, and further reduced curing unevenness and strength unevenness.
In particular, the object of the present invention is to use an inexpensive light source such as a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a mercury lamp, a metal halide lamp, a xenon lamp, etc. without using an expensive ultraviolet laser device, Or while suppressing the deterioration of the liquid crystal drawing mask due to ultraviolet rays and infrared rays and realizing a long life of the liquid crystal drawing mask, at the same time, efficiently using ultraviolet rays of a predetermined wavelength contained in the light from the above-mentioned inexpensive light source with high efficiency In addition, while achieving uniform light intensity distribution, it is a practical technology that can produce high-quality shaped objects that have high modeling accuracy and that are free of curing unevenness and intensity unevenness at a high modeling speed and economically. Is to provide.

  In order to achieve the above object, the present inventor has intensively studied. As a result, light modeling is performed through a process of irradiating a modeling surface made of an ultraviolet curable resin composition through a liquid crystal drawing mask and forming a photocured resin layer having a predetermined shape pattern by ultraviolet rays contained in the light. In manufacturing a product, not all of the ultraviolet light contained in the light from the light source is used as it is to form a resin layer that is photocured as it is, but a photocured resin layer is formed using only ultraviolet rays of a predetermined wavelength, It was conceived that the exposure of the liquid crystal drawing mask by ultraviolet rays having a wavelength different from that of the ultraviolet rays should be prevented. As a result of further investigation, the selection (separation) of ultraviolet rays having a predetermined wavelength and ultraviolet rays having different wavelengths from each other at that time is allowed to pass only ultraviolet rays having a predetermined wavelength and absorb other ultraviolet rays. Rather than using the above-described UV filter to reflect, UV screening that reflects and separates and removes UV light of a predetermined wavelength used for photocuring and transmits UV light having a wavelength different from that of the predetermined wavelength. It has been found that when the apparatus is used, almost all of the ultraviolet rays having a predetermined wavelength used for photocuring can be effectively used for curing the photocurable resin composition without causing a reduction in energy intensity.

  The present inventor, as the above-described ultraviolet screening device, reflects the ultraviolet ray having a predetermined wavelength used for curing the photocurable resin composition on the inner wall surface of a hollow transparent cylindrical body, and what is the ultraviolet ray having the predetermined wavelength? An attempt was made to produce and use a cylindrical body provided with an ultraviolet screening film layer that transmits and separates ultraviolet rays having different wavelengths. As a result, when light was introduced from the opening on the inlet side of the cylindrical body, the ultraviolet light having the predetermined wavelength used for photocuring was not absorbed by the cylindrical body and provided on the inner wall surface of the cylindrical body. It is derived from the opening on the outlet side of the cylindrical body while maintaining the original light intensity while being sequentially reflected at a reflectance close to 100% by the ultraviolet screening film layer, and at that time, on the outlet side of the cylindrical body The intensity distribution of the ultraviolet light having the predetermined wavelength derived from the opening is made uniform, while ultraviolet light having a wavelength different from that of the predetermined wavelength is transmitted from the side wall of the cylindrical body to the outside of the cylindrical body. It has been found that the ultraviolet ray separation device based on the cylindrical body can be efficiently separated to the outside, and is thus extremely effective when performing optical modeling using a liquid crystal drawing mask.

  In addition, the present inventor can design the above-described ultraviolet screening apparatus so that it can transmit infrared rays in combination with transmission of ultraviolet rays having a wavelength different from the ultraviolet rays having the predetermined wavelength. It has been found that the exposure of the liquid crystal drawing mask by both ultraviolet rays and infrared rays having different wavelengths from the ultraviolet rays of the wavelength can be prevented, thereby further extending the usable life of the liquid crystal drawing mask.

  The present inventor uses an ultra-high pressure mercury lamp or a high-pressure mercury lamp as a light source, and emits light by ultraviolet light having a wavelength of 365 nm (commonly called “i-line”) contained in the light emitted from the ultra-high pressure mercury lamp or the high-pressure mercury lamp. When the cured resin layer is formed and ultraviolet rays with a wavelength of 340 nm or less are separated and removed by the ultraviolet ray sorting device arranged upstream of the liquid crystal drawing mask, the deterioration of the liquid crystal drawing mask due to ultraviolet rays is more effective while maintaining a high photocuring speed. The present invention has been completed on the basis of these various findings.

That is, the present invention
(1) Controlled through a liquid crystal drawing mask in which a plurality of minute liquid crystal shutters capable of light shielding and translucency in a minute dot area are arranged in a linear or planar manner on a modeling surface made of a photocurable resin composition After irradiating light to form a photocured resin layer having a predetermined shape pattern, a photocurable resin composition for one layer is applied on the photocured resin layer to form a modeling surface, A target three-dimensional model is a step of further forming a photocured resin layer having a predetermined shape pattern by irradiating light under control through a liquid crystal drawing mask on a modeling surface made of a photocurable resin composition. It is an optical modeling method that is repeated until it is formed, using an ultraviolet curable resin composition as a photocurable resin composition, and a photocurable resin composition at a position between a light emitting means and a liquid crystal drawing mask. UV light of a predetermined wavelength used for photocuring An ultraviolet ray sorting device that transmits and separates and removes ultraviolet rays having a wavelength different from the ultraviolet ray having the predetermined wavelength, and the ultraviolet ray sorting device allows the photocurable resin to be included in the light from the light source. Reflecting ultraviolet rays of a predetermined wavelength used for photocuring of the composition to guide the reflected ultraviolet rays of the predetermined wavelength toward the liquid crystal drawing mask, and simultaneously selecting ultraviolet rays having a wavelength different from that of the predetermined wavelength. By passing through the device and separating / removing it as unnecessary light, the ultraviolet light of the predetermined wavelength reflected by the ultraviolet screening device is liquid crystal while preventing exposure of the liquid crystal drawing mask by ultraviolet light having a wavelength different from that of the predetermined wavelength. An optical modeling method characterized in that a photocured resin layer having a predetermined shape pattern is formed by irradiating a modeling surface through a drawing mask.

And this invention,
(2) Controlled through a liquid crystal drawing mask in which a plurality of minute liquid crystal shutters capable of light shielding and translucency in a minute dot area are arranged linearly or planarly on a modeling surface made of a photocurable resin composition An optical modeling method including a step of irradiating light to form a photocured resin layer having a predetermined shape pattern, using an ultraviolet curable resin composition as a photocurable resin composition, and a light emitting means Reflects ultraviolet rays having a predetermined wavelength used for photocuring the photocurable resin composition at a position between the liquid crystal drawing mask and transmits and separates and removes ultraviolet rays having a wavelength different from that of the predetermined wavelength. An ultraviolet ray sorting device is arranged, and the ultraviolet ray sorting device reflects ultraviolet rays having a predetermined wavelength used for photocuring of the photocurable resin composition among the ultraviolet rays contained in the light from the light source, and reflects the reflected predetermined wavelength. purple At the same time as guiding the outside line in the direction of the liquid crystal drawing mask, the ultraviolet ray having a wavelength different from the ultraviolet ray having the predetermined wavelength is transmitted through the ultraviolet ray sorting device to be separated and removed as unnecessary light. While preventing exposure of the liquid crystal drawing mask by different ultraviolet rays, the photocured resin layer having a predetermined shape pattern by irradiating the modeling surface with the ultraviolet rays of the predetermined wavelength reflected by the ultraviolet ray sorter through the liquid crystal drawing mask It is an optical modeling method characterized by forming.

Furthermore, the present invention provides
(3) The light according to (1) or (2), wherein the ultraviolet screening device further has a function of uniformizing an intensity distribution of light including ultraviolet light having the predetermined wavelength that is irradiated onto a modeling surface through a liquid crystal drawing mask. Modeling method; and
(4) The ultraviolet ray sorting device reflects 95% or more of the ultraviolet ray having the predetermined wavelength used for forming the photocured resin layer and transmits 85% or more of the ultraviolet ray having a shorter wavelength than the ultraviolet ray having the predetermined wavelength. The optical shaping method according to any one of (1) to (3), which is an ultraviolet ray sorting device that separates and removes unnecessary light;
It is.

And this invention,
(5) An ultraviolet screening film in which the ultraviolet screening device reflects the ultraviolet light having the predetermined wavelength and transmits the ultraviolet light having a wavelength different from that of the predetermined wavelength on the inner wall surface of the hollow transparent cylindrical body having both ends opened. An ultraviolet ray sorting device having a layer formed thereon, and introducing the light from the opening on the inlet side of the cylindrical body of the ultraviolet ray sorting device to use the ultraviolet rays of the predetermined wavelength to be used for curing the photocurable resin. The ultraviolet ray selection film layer formed on the inner wall surface of the cylindrical body sequentially reflects the light within the cylindrical body while uniforming the light intensity distribution and leading out from the opening on the outlet side of the cylindrical body. The optical shaping method according to any one of (1) to (4) described above, wherein different ultraviolet rays are transmitted from the side wall of the cylindrical body to the outside of the cylindrical body for separation and removal; and
(6) The UV screening film layer formed on the inner wall surface of the cylindrical body of the UV screening device is a film of alternating non-absorbing dielectric material having a high refractive index and non-absorbing dielectric material having a low refractive index. The optical shaping method according to (5), further comprising: a dielectric multilayer coating coated on the substrate;
It is.

Furthermore, the present invention provides
(7) The ultraviolet ray sorting device further has a function of transmitting 85% or more of light having a wavelength of 780 nm or more and separating and removing it as unnecessary light, thereby further exposing the liquid crystal drawing mask by light having a wavelength of 780 nm or more. The optical modeling method according to any one of (1) to (6) above, which is to be prevented or suppressed;
(8) The ultraviolet ray having the predetermined wavelength for forming the photocured resin layer has a light intensity capable of quickly curing the ultraviolet curable resin composition among the ultraviolet rays contained in the light from the light source. And the optical shaping method according to any one of (1) to (7), wherein the deterioration effect on the liquid crystal drawing mask is relatively small ultraviolet rays;
(9) The optical shaping method according to any one of (1) to (8), wherein the ultraviolet ray having the predetermined wavelength for forming the photocured resin layer is an ultraviolet ray having a wavelength in the range of 300 to 390 nm; ,
(10) The optical shaping method according to any one of (1) to (9), wherein a high-intensity discharge lamp is used as a light source;
It is.

And this invention,
(11) An ultraviolet curable resin composition that is at least cured by ultraviolet light having a wavelength of 365 nm or in the vicinity thereof but is not cured by visible light or infrared light having a wavelength of 400 nm or more is used as the light curable resin composition, A high-pressure mercury lamp is used, and as an ultraviolet ray sorting device, 85% or more of ultraviolet rays having a wavelength of 365 nm or less and having a wavelength of 365 nm or less reflected in a wavelength 365 nm included in the light emitted from the ultra-high pressure mercury lamp or the light radiated from the high-pressure mercury lamp. % Of the UV light screening device is disposed at the upstream side of the liquid crystal drawing mask to prevent or suppress the exposure of the liquid crystal drawing mask by ultraviolet light having a wavelength of 340 nm or less, while the photocured resin layer is formed at a wavelength of 365 nm or in the vicinity thereof. Stereolithography according to any one of the above (1) to (10) formed by ultraviolet rays Is the method.

Furthermore, the present invention provides
(12) Means for forming a modeling surface comprising a photocurable resin composition;
A light emitting means for radiating light containing ultraviolet rays of a predetermined wavelength and ultraviolet rays of other wavelengths for curing the photocurable resin composition;
A liquid crystal drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged in a line or a plane; and
An ultraviolet ray sorter disposed between the light emitting means and the liquid crystal drawing mask, which reflects the ultraviolet ray having the predetermined wavelength for curing the photocurable resin composition, but transmits and separates the ultraviolet ray having a wavelength other than the predetermined wavelength;
Is an optical modeling apparatus.

And this invention,
(13) An ultraviolet ray that reflects the ultraviolet ray having the predetermined wavelength on the inner wall surface of the hollow transparent cylindrical body opened at both ends, and transmits and separates the ultraviolet ray having a wavelength different from the ultraviolet ray having the predetermined wavelength. The stereolithography apparatus according to (12), comprising an ultraviolet ray sorting device on which a sorting film layer is formed;
(14) The dielectric multi-layer coating film layer in which the ultraviolet screening film layer formed on the inner wall surface of the cylindrical body of the ultraviolet screening device is alternately coated in multiple layers with a dielectric material having a high refractive index and a dielectric material having a low refractive index. The optical modeling apparatus according to (13), which is
(15) The optical shaping apparatus according to any one of (12) to (14), wherein the ultraviolet ray sorting apparatus further has a function of transmitting 85% or more of light having a wavelength of 780 nm or more and separating the light as unnecessary light;
(16) The optical modeling apparatus according to any one of (12) to (15), wherein the light source is a high-intensity discharge lamp;
It is.

In the case of the present invention, while suppressing the deterioration of the liquid crystal drawing mask due to ultraviolet rays or the deterioration of ultraviolet rays and infrared rays and extending the durable life of the liquid crystal drawing mask, the target photocured shaped article or photocured shaped pattern, etc. Can be manufactured with high modeling accuracy, high curing speed, high productivity, and low cost while preventing the occurrence of curing unevenness and strength unevenness.
Further, in the case of the present invention, among the ultraviolet rays contained in the light emitted from the light emitting means such as the light source, the ultraviolet rays having a predetermined wavelength used for the optical modeling are reduced to 100% without causing a decrease in the energy intensity. Since it can be effectively used for optical modeling while maintaining at a close rate, a clear photocured product excellent in modeling accuracy can be efficiently formed.

  Further, in the present invention, as the ultraviolet ray sorting device, the ultraviolet ray having a predetermined wavelength used for photocuring of the photocurable resin composition is reflected on the inner wall surface of the hollow transparent cylindrical body having both ends opened. In the case of using an ultraviolet screening device in which an ultraviolet screening film layer that transmits ultraviolet light having a wavelength different from that of ultraviolet light is used, it is possible to simultaneously achieve uniform intensity distribution of the ultraviolet light having the predetermined wavelength used for stereolithography. Thus, it is possible to prevent the occurrence of curing unevenness, strength unevenness and the like in the optical modeling object, and to simultaneously form the optical modeling object having excellent modeling accuracy and dimensional accuracy.

  According to the present invention, an inexpensive light source such as a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a mercury lamp, a metal halide lamp, or a xenon lamp is used without using an expensive ultraviolet laser device as the light source. The above-mentioned high-quality shaped article is obtained while suppressing deterioration of the liquid crystal drawing mask due to ultraviolet rays or ultraviolet rays and infrared rays by using ultraviolet rays having a predetermined wavelength among ultraviolet rays contained in light emitted from the light source of And photocured shape patterns can be produced economically at a high modeling speed.

The present invention is described in detail below.
In the present invention,
(1) Under control through a liquid crystal drawing mask in which a plurality of minute liquid crystal shutters capable of shielding and transmitting light in a minute dot area are linearly or planarly arranged on a modeling surface made of an ultraviolet curable resin composition After forming a photocured resin layer having a predetermined shape pattern by irradiating light, an ultraviolet curable resin composition for one layer is applied on the photocured resin layer to form a modeling surface, A target three-dimensional model is a step of further forming a photocured resin layer having a predetermined shape pattern by irradiating light under control through a liquid crystal drawing mask on a modeling surface made of an ultraviolet curable resin composition. Repetitively producing a three-dimensional model until it is formed; or
(2) A product (for example, a resist or the like) having a photocured resin layer having a predetermined shape pattern by irradiating light on a modeling surface made of an ultraviolet curable resin composition under control through the liquid crystal drawing mask described above Products).

  The above-described modeling technique (1) related to the manufacture of a three-dimensional model is generally a modeling table surface by placing a modeling table in a modeling bath filled with a liquid ultraviolet curable resin composition and lowering the modeling table. 1 layer of a liquid ultraviolet curable resin composition layer is formed, and a photocured resin layer (hereinafter referred to as “photocured layer”) having a predetermined pattern and thickness by irradiating light under control through a liquid crystal drawing mask. The molding table is further lowered to form a liquid ultraviolet curable resin composition layer for one layer on the surface of the photocured layer, and light is controlled through a liquid crystal drawing mask. Can be carried out by adopting a modeling bath method in which a step of integrally laminating and forming a photocured layer having a predetermined pattern and thickness is repeated.

  In addition, the above-described modeling technique (1) related to the manufacture of a three-dimensional model is, for example, a modeling table is arranged in a gas atmosphere, and one layer of liquid, paste, powder, or thin film is formed on the modeling table surface. After applying a UV curable resin composition of the above and irradiating light under control through a liquid crystal drawing mask to form a photocured layer having a predetermined pattern and thickness, a liquid for one layer is formed on the photocured layer surface, A step of applying a paste-form, powder-form or thin-film-form ultraviolet curable resin composition and irradiating light under control through a liquid crystal drawing mask to integrally form a photocured layer having a predetermined pattern and thickness. It is also possible to adopt a method that is repeated. In the case of this method, the modeling table or the photocuring layer is faced upward, an ultraviolet curable resin composition is applied to the upper surface, and the photocuring layer is sequentially laminated by irradiating light through a liquid crystal drawing mask. The method may be adopted, or the modeling table or photo-curing layer is placed vertically or diagonally, an ultraviolet curable resin layer is applied on the modeling table surface or the photo-curing layer surface, and light is irradiated through a liquid crystal drawing mask. A method of sequentially laminating and forming photocuring layers may be employed, or an ultraviolet curable resin layer composition may be disposed on the modeling table surface or the photocuring layer surface with the modeling table or photocuring layer disposed downward. A method may be employed in which light is irradiated through a liquid crystal drawing mask and a photo-curing layer is sequentially stacked below. In applying the ultraviolet curable resin composition to the modeling table surface or the photocured layer surface, for example, an appropriate method such as blade coating, cast coating, roller coating, transfer coating, brush coating, spray coating, etc. can be adopted. .

In addition, the modeling technique of (2) described above is, for example, an ultraviolet curable resin composition on an appropriate base material (metal, plastic, fabric, paper, ceramic, glass, wood, composite of two or more thereof). Form a layer of objects, and irradiate light under control through a liquid crystal drawing mask in which a plurality of micro liquid crystal shutters that can shield and transmit light in a micro dot area are arranged in a line or plane, It can be used to form a photocured resin layer having a predetermined shape pattern. Therefore, the modeling technique (2) can be used for the production of, for example, a resist or other product having a photocured resin layer having a predetermined shape pattern on a substrate.
Among these, this invention can be used especially effectively for the manufacturing technique of the three-dimensional molded item of said (1).

The liquid crystal drawing mask used in the present invention is a linear liquid crystal drawing mask in which a plurality of minute liquid crystal shutters capable of shielding and transmitting light in a minute dot area are arranged in a linear shape (for example, the X direction or the Y direction), or a planar shape. Any of a square or rectangular planar liquid crystal drawing mask arranged in parallel in the (X-Y direction) may be used, and among these, it is preferable to use a planar liquid crystal drawing mask from the viewpoint of modeling speed (modeling efficiency). The number of micro liquid crystal shutters (image elements) arranged on the linear liquid crystal drawing mask or the planar liquid crystal drawing mask is not particularly limited, and conventionally known ones can be used. As a liquid crystal shutter (liquid crystal display element), for example, QVGA (number of pixels = 320 dots × 240 dots), VGA (number of pixels = 640 × 480 dots), SVGA (number of pixels = 800 × 600 dots), UXGA (number of pixels) = 1024 × 768 dots), QSXGA (number of pixels = 2560 × 2648 dots), and the like, and these liquid crystal shutters have been widely sold.
Although there is some difference in the degree of deterioration of the liquid crystal drawing mask due to ultraviolet rays due to differences in the type of liquid crystal that makes up the liquid crystal drawing mask, the material of other parts that make up the liquid crystal drawing mask, the structure of the liquid crystal drawing mask, etc. In the case of the present invention, any liquid crystal drawing mask can be prevented from deteriorating and the usable life can be extended.

  In carrying out the optical modeling of the present invention, a photocured resin layer of one layer is formed by irradiating the modeling surface made of the ultraviolet curable resin composition through the liquid crystal drawing mask with the liquid crystal drawing mask stationary. It may be formed, or the mask image of the liquid crystal drawing mask is intermittently changed during the formation of the photocured resin layer for one layer, and the photocured resin layer is formed by moving the liquid crystal drawing mask to the next position. Alternatively, the liquid crystal drawing mask may be synchronized with the change of the mask image of the liquid crystal drawing mask continuously like a television image or movie when forming a photo-cured resin layer for one layer. It may be moved continuously to form a photo-cured resin layer for one layer, or two or more of the above-described methods may be adopted for stereolithography.

  In the present invention, an ultraviolet laser emitting device (for example, an Ar laser emitting device, a He-Cd laser emitting device, an LD laser emitting device, etc.) can also be used as a light source, but an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, A high-intensity discharge lamp (HID lamp) such as a xenon lamp or a halogen lamp is preferably used. Among them, as will be described later, the ultra-high pressure mercury lamp and the high-pressure mercury lamp contain ultraviolet rays having a light intensity capable of forming a photocured resin layer in a short time, and are used for forming a photocured resin layer. It is preferably used from the standpoint that it is easy to separate and remove ultraviolet rays having other wavelengths, and an ultra-high pressure mercury lamp is particularly preferably used.

The shape, size and number of the light source are not particularly limited, and the shape and dimensions of the liquid crystal drawing mask can be appropriately selected according to the shape and size of the shape pattern of the photocured resin layer to be formed, The light source may be, for example, a dot shape, a spherical shape, a rod shape, or a planar shape.
As an ultraviolet ray sorting apparatus, ultraviolet rays having a predetermined wavelength used for photocuring of the photocurable resin composition (hereinafter simply referred to as “ An ultraviolet screening film layer that reflects ultraviolet rays having a predetermined wavelength (which may be referred to as “ultraviolet rays other than the predetermined wavelength”) is reflected. In the case of using the ultraviolet ray sorting device, the light source having such a shape and size that the light from the light emitting means such as the light source can be satisfactorily introduced into the cylindrical body from the entrance side opening of the cylindrical body of the ultraviolet ray sorting device, etc. It is recommended to use the light emitting means.

The light source may be movably provided on the back side of the UV sorting device together with a liquid crystal drawing mask or the like. Alternatively, the light source may be used for the purpose of improving modeling accuracy, improving modeling speed, reducing the weight of the device, and improving maintainability. The light from the light source is guided to the back of the ultraviolet ray sorting device through the optical fiber, light guide and other light transmission means, and the light is emitted from the optical fiber, light guide and other light transmission means, The ultraviolet rays contained in the light are sorted by an ultraviolet ray sorting device, ultraviolet rays other than the predetermined wavelength are separated and removed from the system, and ultraviolet rays of the predetermined wavelength are irradiated to the modeling surface through the liquid crystal drawing mask. May be.
Moreover, you may employ | adopt the system which condenses and raises light energy using a some light source for the improvement of modeling speed. In particular, when an optical fiber or a light guide is used, there is an advantage that a plurality of light sources can be easily condensed.

  In the present invention, the ultraviolet rays contained in the light emitted from the light emitting means such as the light source are not directly used for forming the photocured resin layer, and the ultraviolet rays having a predetermined wavelength are reflected between the light emitting means and the liquid crystal drawing mask. In addition, an ultraviolet ray sorting device that transmits ultraviolet rays having a wavelength other than the predetermined wavelength is arranged, and the ultraviolet ray sorting device reflects ultraviolet rays having a predetermined wavelength out of the ultraviolet rays contained in the light from the light source. Is guided to the direction of the liquid crystal drawing mask, and at the same time, ultraviolet rays other than the predetermined wavelength are transmitted and separated and removed as unnecessary light to prevent exposure of the liquid crystal drawing mask by ultraviolet rays other than the predetermined wavelength while the ultraviolet rays of the predetermined wavelength are liquid crystal A modeling surface is irradiated through a drawing mask to form a photocured resin layer having a predetermined pattern.

  Light emitted from a light emitting means such as a light source is sandwiched between ultraviolet rays having a predetermined wavelength used for forming a photocured resin layer, ultraviolet rays having a longer wavelength than ultraviolet rays having a predetermined wavelength, and ultraviolet rays having a predetermined wavelength. When ultraviolet rays having a short wavelength are included, both the ultraviolet rays having the long wavelength and the ultraviolet rays having the short wavelength are transmitted through the ultraviolet ray sorter to separate and remove, thereby preventing or suppressing the exposure of the liquid crystal drawing mask by both. Is more preferable from the viewpoint of suppressing deterioration of the liquid crystal drawing mask, but in some cases, depending on the energy intensity of the ultraviolet light having a long wavelength and the ultraviolet light having a short wavelength, the liquid crystal drawing mask with ultraviolet light having a wavelength other than the predetermined wavelength may be used. In order to prevent efficient deterioration, only one ultraviolet ray having high energy intensity may be separated by passing through the ultraviolet ray sorting device.

As the ultraviolet ray sorting device, ultraviolet rays having a predetermined wavelength are reflected at a high rate, preferably at a rate of 95% or more and guided toward the liquid crystal drawing mask, and ultraviolet rays other than the predetermined wavelength are transmitted at a high rate, preferably 85. Any apparatus that can be transmitted at a rate of at least% and can be separated / removed as unnecessary light can be used. Among them, as an ultraviolet ray sorting device, there is a hollow transparent cylindrical body opened at both ends, and an ultraviolet ray sorting that reflects ultraviolet rays of a predetermined wavelength on the inner wall surface of the cylindrical body and at the same time transmits ultraviolet rays other than the predetermined wavelength. An ultraviolet screening device in which a film layer is formed is preferably used. When this ultraviolet ray sorting device is used, out of the light incident from the opening on the inlet side of the cylindrical body, ultraviolet rays having a predetermined wavelength enter the cylindrical body by the ultraviolet ray sorting film layer formed on the inner wall surface of the cylindrical body. Reflected one after another from the side to the outlet side and finally led out from the opening on the outlet side of the cylindrical body, and at the same time, ultraviolet rays other than the predetermined wavelength are transmitted through the wall of the cylindrical body and separated out of the cylindrical body Of the ultraviolet rays contained in the light emitted from the light emitting means such as the light source after being removed, the ultraviolet ray having a predetermined wavelength has an energy intensity close to the initial energy intensity of the ultraviolet ray having the predetermined wavelength (generally 95% or more) It is derived from the opening on the outlet side of the cylindrical body while maintaining (energy intensity).
As a result, when irradiating the modeling surface with ultraviolet rays having a predetermined wavelength derived from the opening on the outlet side of the cylindrical body of the ultraviolet ray sorting device, the exposure of the liquid crystal drawing mask with ultraviolet rays having a wavelength other than the predetermined wavelength is performed. Thus, deterioration of the liquid crystal drawing mask can be greatly reduced, and ultraviolet rays having a predetermined wavelength contained in light emitted from light emitting means such as a light source can be effectively used with high efficiency.
Moreover, while the ultraviolet rays having a predetermined wavelength included in the light incident on the cylindrical body are reflected one after another by the ultraviolet ray selection film layer formed on the inner wall surface of the cylindrical body, the ultraviolet rays are directed toward the opening on the outlet side of the cylindrical body. Since the light intensity distribution is made uniform and ultraviolet rays with a predetermined wavelength without light intensity unevenness are irradiated to the modeling surface through the liquid crystal drawing mask, a uniform photocured layer without intensity unevenness and curing unevenness is formed on the modeling surface. Can be formed.

The cylindrical body in the ultraviolet screening device described above can be formed of a transparent and high light transmittance material such as glass or methacrylic resin, and among these, it is preferable from the viewpoint of heat resistance and the like. . Examples of the glass forming the cylindrical body include “Pyrex” (registered trademark), borosilicate crown glass, synthetic quartz glass, “Zerodur” (registered trademark), titanium silicate glass, optical crown glass, sapphire glass, and selenium zinc. Glass etc. can be mentioned.
Further, the ultraviolet screening film layer formed on the inner wall surface of the cylindrical body may be a film made of a material that reflects ultraviolet rays having a predetermined wavelength at a high rate and transmits ultraviolet rays other than the predetermined wavelength at a high rate. The ultraviolet screening film layer may be a single layer film layer or a multilayer film layer. Among them, the ultraviolet screening film layer includes a non-absorbing dielectric material having a high refractive index (for example, Al ₂ O ₃ , HfO ₂ , ZrO _2, etc.) and a non-absorbing dielectric material having a low refractive index (for example, MgF). ₂ , SiO _2, etc.) are preferably coated with a dielectric multilayer coating in which the films are alternately coated in a multilayer. In the case of such a dielectric multi-layer coating, ultraviolet rays having a predetermined wavelength are successively reflected on the inner wall surface of the cylindrical body due to the interference of light and proceed to the opening on the outlet side of the cylindrical body, while other than the predetermined wavelength. Ultraviolet rays pass through the wall of the cylindrical body and are separated and removed outside the cylindrical body. Examples of the dielectric multilayer coating described above include an ultraviolet distinguishing film layer used in a “cold mirror” manufactured by Koshin Kogyo Kogyo Co., Ltd.
In the case of using an ultraviolet screening device provided with a cylindrical body in which the dielectric multilayer film coating is formed on the inner wall surface of a transparent glass cylindrical body, a wavelength of 365 nm and ultraviolet rays in the vicinity thereof (ultraviolet rays of a predetermined wavelength) Is almost successively reflected in the cylindrical body and derived from the opening on the outlet side of the cylindrical body with an efficiency of 95% or more, while 90% or more of ultraviolet rays other than the predetermined wavelength (especially ultraviolet rays having a wavelength of 340 nm or less). Passes through the wall surface of the cylindrical body and is separated and removed from the outside of the cylindrical body.

  As used herein, the efficiency (%) of ultraviolet light having a predetermined wavelength used for forming a photocured resin layer is included in light emitted from a light emitting means such as a light source and incident on an ultraviolet sorting device. It means the percentage of the total energy (total light intensity) of ultraviolet rays of a predetermined wavelength reflected from the ultraviolet screening device and derived from the ultraviolet screening device with respect to the total energy (total light intensity) of ultraviolet rays of a predetermined wavelength. Further, the transmittance (%) of ultraviolet rays other than the predetermined wavelength is the total energy (total light intensity) of ultraviolet rays other than the predetermined wavelength included in the light emitted from the light emitting means such as a light source and incident on the ultraviolet sorting device. It means% of the total energy (total light intensity) of ultraviolet rays other than a predetermined wavelength that are transmitted through the ultraviolet ray sorting device and emitted to the outside of the ultraviolet ray sorting device.

  In the above-described ultraviolet screening apparatus based on a hollow and transparent cylindrical body that is preferably used as the ultraviolet screening apparatus in the present invention, the shape of the cylindrical body is not particularly limited, for example, a rectangular cylindrical body, Any of a square cylindrical body, a cylindrical body, an elliptical cylindrical body, a polygonal cylindrical body, a triangular cylindrical body, and the like may be used. Among them, when a rectangular or square cylindrical body is employed, out of light from a light source or the like incident on the cylindrical body, ultraviolet rays of a predetermined wavelength used for curing the photocurable resin composition are in the cylindrical body. When being led out from the opening on the outlet side of the cylindrical body while being successively reflected by the ultraviolet screening film layer formed on the inner wall surface, the cross-sectional shape at the time of deriving the ultraviolet light of the predetermined wavelength is the transverse of the cylindrical body Since it becomes a rectangle or square similar to the surface shape and matches the shape of a liquid crystal drawing mask that is generally rectangular or square, ultraviolet rays of a predetermined wavelength can be smoothly and smoothly irradiated onto the modeling surface through the liquid crystal drawing mask. it can.

  The length of the cylindrical body, the dimension of the hollow part of the cylindrical body (cross-sectional dimension), the wall thickness, etc. are not limited, and the type, shape, dimensions, etc. of the light emitting means such as the light source used are not limited. Can be decided accordingly. Generally, the cylindrical body has a length from the opening on the inlet side to the opening on the outlet side of 1 cm to 5 m, and the inner diameter of the hollow portion (the length of the diagonal line when the hollow portion is square) is 10 μm. Those having a thickness of ˜30 cm and a wall thickness of 10 μm to 50 mm are preferably employed from the viewpoints of the handleability of the apparatus, the reflection efficiency of ultraviolet rays having a predetermined wavelength, the absorption efficiency of ultraviolet rays other than the predetermined wavelength, the number of reflections, and the like.

  As the ultraviolet ray having a predetermined wavelength used for forming the photocured resin layer, the curing wavelength of the ultraviolet curable resin composition (particularly, the type of photopolymerization initiator and photosensitizer contained in the ultraviolet curable resin composition, light Absorption wavelengths of polymerization initiators and photosensitizers, among them, the optimum absorption wavelength), UV curing characteristics of resin components, monomer components, and other components that constitute UV curable resin compositions (especially the light wavelengths that cause photocuring) It is preferable to determine in consideration comprehensively according to each situation such as the type of light source, the type of ultraviolet light contained in the light source, the spectral distribution, and the intensity thereof. In particular, as the ultraviolet ray having the predetermined wavelength for forming the photocured resin layer, the light intensity (light energy) that can quickly cure the ultraviolet curable resin composition among the ultraviolet rays contained in the light from the light source. It is preferable to use ultraviolet rays having a relatively low deterioration effect on the liquid crystal drawing mask.

  In general, as the wavelength of ultraviolet rays becomes shorter, the deterioration effect on the liquid crystal drawing mask increases, the number of usable photocurable resin compositions decreases, and the number of optical parts and materials that can be used inexpensively and favorably decreases. Therefore, the ultraviolet ray used for forming the photocured resin layer preferably has a wavelength in the range of 300 to 390 nm, more preferably in the range of 330 to 390 nm, and more preferably in the range of 350 to 390 nm. Is more preferable. Therefore, the light source includes ultraviolet rays having a light intensity capable of satisfactorily curing the ultraviolet curable resin composition in the wavelength range of 300 to 390 nm, of which 330 to 390 nm, particularly 350 to 390 nm, A light source having a spectral distribution capable of sorting ultraviolet rays in the above wavelength range and ultraviolet rays of less than 300 nm (among them, ultraviolet rays of less than 330 nm, particularly less than 350 nm) is preferably used. Specific examples of such a light source include high-intensity discharge lamps (HID lamps) such as ultra-high pressure mercury lamps, high-pressure mercury lamps, low-pressure mercury lamps, metal halide lamps, xenon lamps, and halogen lamps. Among them, an ultrahigh pressure mercury lamp or a high pressure mercury lamp is preferably used.

In the present invention, an ultra-high pressure mercury lamp preferably used as a light source has a spectral distribution comprising a plurality of peaks clearly separated from each other as shown in FIG. 1, and the high-pressure mercury lamp is also as shown in FIG. It has a spectral distribution consisting of a plurality of peaks clearly separated from each other. As shown in FIGS. 1 and 2, the light emitted from the ultra-high pressure mercury lamp and the high-pressure mercury lamp independently has a high-intensity ultraviolet peak suitable for curing the photocurable resin composition at a wavelength of 365 nm and its vicinity. And there is no other ultraviolet peak between 365 nm and 400 nm, and most of the ultraviolet light other than 365 nm is distributed in the wavelength range of 0 to 340 nm.
Therefore, using an ultra-high pressure mercury lamp or a high-pressure mercury lamp as a light source, using an ultraviolet curable resin composition that is at least cured by ultraviolet light having a wavelength of 365 nm or in the vicinity thereof and not cured by visible light or infrared light having a wavelength of 400 nm or more, Among the light emitted from these mercury lamps, ultraviolet screening means for reflecting ultraviolet light having a wavelength of 365 nm or its vicinity and light having a wavelength longer than that and transmitting ultraviolet light having a wavelength of 340 nm or less to separate and remove the light outside the system. Is placed on the upstream side of the liquid crystal drawing mask (between the light emitting means such as the light source and the liquid crystal drawing mask), and the photo-cured resin layer is allowed to pass through the 365 nm or near ultraviolet rays through the liquid crystal drawing mask. It can be formed quickly and smoothly, and at the same time the wavelength is shorter than that, making it a liquid crystal drawing mask. The majority of large UV degradation effect of separating and removing before reaching the liquid crystal image drawing mask, it is possible to more effectively suppress the deterioration of the liquid crystal image drawing mask with ultraviolet.

  When comparing ultra-high pressure mercury lamps with high-pressure mercury lamps, the ultra-high pressure mercury lamp has a shorter arc length than the high-pressure mercury lamp and the lamp itself is downsized. There is an advantage that installation is easy without taking up space, and there is an advantage that the radiant energy is large in addition to that, and therefore, an ultra-high pressure mercury lamp is more preferably used.

  In the present invention, for the purpose of improving modeling accuracy, improving modeling speed, reducing the weight of the apparatus, improving maintainability, reducing the cost of the apparatus, and the like, the type of light source disposed on the upstream side (back side) of the liquid crystal drawing mask, Depending on the shape, number, shape and size of the liquid crystal drawing mask, etc., a means for guiding the light from the light source to the liquid crystal drawing mask satisfactorily (for example, a condensing lens, a Fresnel lens, etc.) and the liquid crystal drawing mask Means (for example, a projection lens, a projector lens, etc.) for irradiating a mask image (light image that has passed through a liquid crystal drawing mask) to a predetermined position on a modeling surface made of an ultraviolet curable resin composition with high modeling accuracy may be disposed. preferable.

  In the present invention, an ultraviolet curable resin composition that is cured by ultraviolet rays and is not cured by visible light and infrared rays is preferably used as the photocurable resin composition. The ultraviolet curable resin composition may be in any form such as liquid, paste, powder, and thin film, and is particularly preferably in the form of liquid from the viewpoint of handleability during optical modeling.

  In the present invention, as an ultraviolet curable resin composition, various oligomers conventionally used in stereolithography that is cured by ultraviolet rays, such as urethane acrylate oligomers, epoxy acrylate oligomers, ester acrylate oligomers, and polyfunctional epoxy resins; Isobornyl acrylate, isobornyl methacrylate, dicyclopentenyl acrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethyl acrylate, dicyclopentenyloxyethyl methacrylate, dicyclopentanyl acrylate, dicyclopetanyl methacrylate, bornyl Acrylate, bornyl methacrylate, 2-hydroxyethyl acrylate, cyclohexyl acrylate, 2-hydroxypropyl acrylate, pheno Acrylic compounds such as ciethyl acrylate, morpholine acrylamide, morpholine methacrylamide, and acrylamide, and various monofunctional vinyl compounds such as N-vinyl pyrrolidone, N-vinyl caprolactam, vinyl acetate, and styrene; trimethylolpropane triacrylate, ethylene oxide Modified trimethylolpropane triacrylate, ethylene glycol diacrylate, tetraethylene glycol diacrylate, polyethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, dicyclopenta Nyl diacrylate, polyester diacrylate, ethylene oxide modified bisphenol A diacrylate, Polyfunctional vinyl compounds such as taerythritol triacrylate, pentaerythritol tetraacrylate, propylene oxide modified trimethylolpropane triacrylate, propylene oxide modified bisphenol A diacrylate, tris (acryloxyethyl) isocyanurate; hydrogenated bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-meta-dioxane, bis (3,4 -Epoxycyclohexylmethyl) A photopolymerization initiator having a photopolymerization initiating action in the wavelength region of ultraviolet rays, and one or more of various epoxy compounds such as adipate, and the like. If necessary, an ultraviolet curable resin composition containing a sensitizer or the like can be used.

  The type of light source used (particularly the spectral distribution of the light emitted from the light source in the ultraviolet wavelength region), the wavelength of the ultraviolet light used to form the photocured resin layer (predetermined wavelength), and not used to form the photocured resin layer It is preferable to adjust the curing wavelength of the ultraviolet curable resin composition by ultraviolet rays according to the wavelength of the ultraviolet rays to be separated and removed. Adjustment of the curing wavelength by ultraviolet rays of the ultraviolet curable resin composition includes, for example, the type of photopolymerization initiator (particularly optimum ultraviolet absorption wavelength) to be blended in the ultraviolet curable resin composition, and the ultraviolet curable resin composition. This can be done by selecting the type and composition of the polymer or monomer, the type of the sensitizer, the type or composition of the other components.

  Although not limited in any way, examples of the photopolymerization initiator that can be used in the ultraviolet curable resin composition used in the present invention include isobutyl benzoin ether (optimum UV absorption 240 to 270 nm), isopropyl benzoin ether (240 to the same). 270 nm), benzoin ethyl ether, benzoin methyl ether (300-380 nm) and other benzoin ether photopolymerization initiators; 1-phenyl-1,2-propanedione-2- (o-ethoxycarbonyl) oxime (250- Α-acyloxime ester photopolymerization initiators such as 400 nm); benzyl ketal photopolymerization initiators such as 2,2-methoxy-2-phenylacetophenone (250 to 350 nm) and hydroxycyclohexyl phenyl ketone (250 to 319 nm) Agent: Diethoxy Cetophenone (240-350 nm), 2,2-dimethoxy-1,2-diphenylethane-1-one (310-390 nm), 2-hydroxy-2-methyl-1-phenyl-propan-1-one (same) 200-300 nm) and other acetophenone derivative-based photopolymerization initiators; benzophenine (240-350 nm), chlorothioxanthone (275-400 nm), 2-chlorothioxanthone (200-400 nm), isopropylthioxanthone (250-400 nm) Benzoyl-based photopolymerization initiators such as 2-methylthioxanthone (250 to 400 nm) and halogen-substituted alkyl-aryl ketone (240 to 360 nm).

  The type of light source used for stereolithography (spectral distribution in the ultraviolet region of the light emitted from the light source), the wavelength of the ultraviolet light used to form the photocured resin layer, and separation without using the photocured resin layer A more suitable photopolymerization initiator may be selected according to the wavelength of the ultraviolet rays to be removed and blended in the ultraviolet curable resin composition. Using an ultra-high pressure mercury lamp or a high-pressure mercury lamp as a light source, a resin layer photocured by ultraviolet rays having a wavelength of 365 nm or the vicinity thereof is formed, and optical shaping is performed by the above-described method of separating and removing ultraviolet rays having a wavelength of 340 nm or less. When performing, 2,2-dimethoxy-1,2-diphenylethane-1-one [eg, “Irgacure (registered trademark) 651” manufactured by Ciba Specialty Chemical Co., Ltd.], 2-hydroxy-2-methyl-1- It is preferable to use an ultraviolet curable resin composition containing a photopolymerization initiator such as phenyl-propan-1-one [for example, “Darocur (registered trademark) 1173” manufactured by Ciba Specialty Chemicals, etc.].

  The ultraviolet curable resin composition used in the present invention may further include a leveling agent, a surfactant other than a phosphate ester-based surfactant, an organic polymer modifier, an organic plasticizer, solid fine particles, if necessary. Contains one or more fillers such as inorganic fine particles such as carbon black fine particles, polystyrene fine particles, polyethylene fine particles, polypropylene fine particles, organic polymer fine particles such as acrylic resin fine particles, and synthetic rubber fine particles. You may do it. When a filler is contained, it is possible to improve dimensional accuracy by reducing volume shrinkage during curing, improve mechanical properties and heat resistance, and the like.

Hereinafter, the present invention will be described in detail with reference to FIGS. 3 and 4, but the present invention is not limited to those shown in FIGS. 3 and 4.
FIG. 3 is a specific example schematically showing the entire optical modeling apparatus used for the optical modeling of the present invention, and FIG. 4 shows the main part of the optical modeling apparatus used for the optical modeling of the present invention (the light source and the ultraviolet sorting apparatus). A specific example of (part) is shown. 4, (a) is a cross-sectional view in the longitudinal direction, and (b) to (d) in FIG. 4 are cross-sectional views taken along the line XX in FIG. 4 (a) (transverse cross-sectional view of the ultraviolet ray sorting device). It is.
3 and 4, 1 is a light source such as an ultra-high pressure mercury lamp, 2 is an ultraviolet ray sorting device, 3 is a convex lens (for condensing on a Fresnel lens), 4 is a reflecting mirror, 5 is a Fresnel lens, and 6 is a liquid crystal drawing. A mask, 7 is a projection lens, and 8 is a modeling surface made of an ultraviolet curable resin composition.
Further, in FIGS. 3 and 4, as shown in FIG. 4, the ultraviolet ray sorter 2 has a predetermined wavelength ultraviolet ray formed on the hollow transparent cylindrical body 2a opened at both ends and the inner wall surface 2b of the cylindrical body 2a. And the ultraviolet ray selecting film layer 2c that transmits ultraviolet rays having a wavelength different from that of the predetermined wavelength.

As shown in FIG. 3, the light from the light source 1 enters the ultraviolet ray sorter 2 through the opening on the entrance side, and among the light rays contained in the light from the light source, the predetermined light used for forming a photocured resin layer. The ultraviolet ray having the wavelength is reflected by the ultraviolet ray sorting film layer 2c formed on the inner wall surface 2b of the cylindrical body 2a of the ultraviolet ray sorting device 2, and is sequentially reflected in the ultraviolet ray sorting device 2 toward the opening on the outlet side. Derived from the opening. At this time, the ultraviolet rays having a predetermined wavelength are reflected on the cylindrical body 2a of the ultraviolet ray sorter 2 in order, and the intensity distribution is made uniform while proceeding toward the opening on the outlet side. In the ultraviolet ray having a predetermined wavelength derived from the opening on the exit side, for example, the light intensity is substantially equal at the center and the peripheral part of the light beam. On the other hand, among the light rays included in the light from the light source, ultraviolet rays having a wavelength other than the predetermined wavelength that are not used for forming the photocured resin layer are transmitted through the side wall portion of the cylindrical body 2a of the ultraviolet ray sorting device 2 and separated outside. Removed.
Next, the ultraviolet rays having a predetermined wavelength led out from the opening on the exit side while reflecting inside the cylindrical body 2 a of the ultraviolet ray sorting device 2 are changed in direction by the reflection mirror 4, passed through the Fresnel lens 5, and the back portion of the liquid crystal drawing mask 6. Led to. At this stage, the ultraviolet rays other than the predetermined wavelength contained in the light from the light source 1 are completely separated and removed, or the amount thereof is greatly reduced. Is prevented or suppressed. The ultraviolet ray having a predetermined wavelength guided to the back of the liquid crystal drawing mask 6 passes through the liquid crystal drawing mask 6 in a predetermined pattern corresponding to the mask image of the liquid crystal drawing mask 6, passes through the projection lens 7, and is received from the ultraviolet curable resin composition. A photocured resin layer having a predetermined shape pattern corresponding to the mask image of the liquid crystal drawing mask 6 is irradiated on the modeling surface 8 to be formed on the modeling surface 8.

  In the above apparatus, the cross-sectional shape of the cylindrical body 2a of the ultraviolet ray sorting apparatus 2 is, for example, a rectangle as shown in FIG. 4B, a square as shown in FIG. 4C, and as shown in FIG. It may be any of a circle, an ellipse, a polygon, etc. although not shown. Among them, since the liquid crystal drawing mask 6 is generally rectangular or square in many cases, if the cross-sectional shape of the cylindrical body 2a is a rectangle as shown in (b) or a square as shown in (c), the cylinder Since the cross-sectional shape of the ultraviolet ray having a predetermined wavelength derived from the opening on the outlet side of the body 2a becomes a rectangle or a positive direction and matches the shape of the liquid crystal drawing mask 6, the modeling surface is interposed through the liquid crystal drawing mask 6. 8 can be irradiated uniformly with no ultraviolet rays.

  In the above, when the ultraviolet ray selection film layer 2c formed on the inner wall surface 2b of the cylindrical body 2a of the ultraviolet ray sorter 2 is one that reflects ultraviolet rays of a predetermined wavelength and transmits ultraviolet rays and infrared rays other than the predetermined wavelength. Since not only ultraviolet rays other than the predetermined wavelength but also infrared rays pass through the side wall portion of the cylindrical body 2a and are separated and removed, the exposure of the liquid crystal drawing mask 6 by ultraviolet rays and infrared rays other than the predetermined wavelength is eliminated, and the liquid crystal drawing The deterioration of the mask 6 is further prevented, and the durability life can be further extended.

  In the stereolithography apparatus of FIG. 3 described above, the mask image of the liquid crystal drawing mask 6 is information stored in advance in a computer corresponding to the shape pattern, structure, size, etc. of the stereolithography object intended for manufacture. Correspondingly, among the plurality of minute liquid crystal shutters arranged on the liquid crystal drawing mask 6, the liquid crystal shutter located at a position where light should pass is opened so as to allow light to pass therethrough, while being located at a position where light should be shielded. The liquid crystal shutter is closed to prevent the passage of light, and such an operation is designed to be repeated until a photocured resin layer having a predetermined cross-sectional shape is formed (when manufacturing a three-dimensional model). .

When the optical modeling apparatus of the present invention illustrated in FIGS. 3 and 4 is used, it not only absorbs ultraviolet rays other than a predetermined wavelength but also absorbs ultraviolet rays of a predetermined wavelength used for optical modeling (usually) Unlike the case of using an ultraviolet filter that reduces the intensity of ultraviolet rays of a predetermined wavelength, the light from the light source 1 is directly incident on the ultraviolet sorting device 2 and is included in the light from the light source 1. The total amount of ultraviolet rays with a predetermined wavelength contained in the light from the light source 1 or a quantity close to it while passing through the wall of the cylindrical body 2a to separate and remove ultraviolet rays with a wavelength other than the predetermined wavelength, or ultraviolet rays and infrared rays with a wavelength other than the predetermined wavelength. (Generally 95% or more) is led out from the opening on the outlet side of the cylindrical body 2a of the ultraviolet ray sorter 2. As a result, it is possible to perform optical modeling while effectively using ultraviolet rays of a predetermined wavelength included in the light from the light source 1 with high efficiency.
In the stereolithography apparatus shown in FIG. 3, the light from the light source 1 is guided to the liquid crystal drawing mask 6 through the ultraviolet screening device 2, the convex lens 3, the reflection mirror 4, and the Fresnel lens 5. After passing through the sorting device 2, it may be directly led to the liquid crystal drawing mask 6 through the Fresnel lens 5 as it is.

  The liquid crystal drawing mask 6 is not particularly limited, and a liquid crystal drawing mask having an appropriate shape can be employed according to the shape and dimensions (particularly the cross-sectional shape and dimensions thereof) of the optically shaped object to be manufactured. The liquid crystal drawing mask 6 may be, for example, a square, a rectangle, or another shape.

<< Test Example 1 >> [Endurance test of liquid crystal drawing mask against ultraviolet rays]
(1) The apparatus shown in FIG. 5 was used in order to perform a durability test against ultraviolet rays of the liquid crystal drawing mask. In the apparatus of FIG. 5, 1 is a light source [super-high pressure mercury lamp “YLT-MX200” manufactured by YELTY; output 200 W], 2 is an ultraviolet sorting device, 6 is a liquid crystal drawing mask (VGA manufactured by Casio Computer Co., Ltd.) (Liquid crystal), 9 indicates a quartz fiber [made by Welty, diameter 5 mm] for guiding the light from the light source 1. In the apparatus of FIG. 5, a cylindrical body made of hollow glass having a rectangular cross-sectional shape [“Pyrex” (registered trademark)] (inside dimension of hollow portion = 2 cm × 15 cm, cylindrical body as the ultraviolet ray sorting apparatus 2. Of non-absorbing dielectric material (Al ₂ O ₃ ) having a high refractive index and non-absorbing dielectric material (MgF ₂ ) having a low refractive index are alternately formed on the inner wall surface having a length of 18.5 cm. An apparatus coated with a dielectric multilayer film in which 30 layers were coated was used. This ultraviolet ray sorter 2 is capable of efficiently reflecting ultraviolet rays (i-line) having a wavelength of 365 nm and ultraviolet rays in the vicinity thereof with an efficiency of 97% or more from the opening on the outlet side of the cylindrical body while sequentially reflecting on the inner wall surface of the cylindrical body. On the other hand, it has a function of separating and removing ultraviolet rays and infrared rays having a wavelength of 340 nm or less through the side wall portion of the cylindrical body of the ultraviolet ray sorting device 2 with an efficiency of 85% or more.

(2) Using the apparatus shown in FIG. 5, the condition shown in FIG. 1 was adopted under the condition that the irradiation intensity of ultraviolet rays with a wavelength of 365 nm used for forming a photocured resin layer becomes 1900 mJ / sec on average. When the light from the light source 1 (super high pressure mercury lamp) having a distribution is continuously irradiated onto the liquid crystal drawing mask 6 through the quartz fiber 9 and the ultraviolet ray sorter 2, the cumulative irradiation illuminance of ultraviolet rays having a wavelength of 365 nm reaches 9400 J / cm ² . Even at this point, the liquid crystal drawing mask 6 can perform light shielding and light transmission (on-off drive) in a minute dot area as normal, and the cumulative irradiation illuminance of ultraviolet light having a wavelength of 365 nm reaches 12000 J / cm ² . when the, finally, the driving of the light shielding and light transmitting in a minute dot area (oN - oFF driving) is impossible defective portion (area of about 7 mm ²⁾ is generated in the liquid crystal image drawing mask surface .

(3) In the apparatus shown in FIG. 5, the ultraviolet sorting apparatus 2 is removed (not used) from the apparatus, and instead an infrared absorption filter [“KG 1” manufactured by Melles Griot; ultraviolet (i-line) with wavelength of 365 nm and its vicinity The transmittance of ultraviolet rays of 90% or more, the shielding rate (absorption rate) of light with a wavelength of 800 nm is about 50%, and the shielding rate (absorption rate) of infrared rays with a wavelength of 1000 nm or more is almost 100%. When the deterioration test by the ultraviolet rays of the liquid crystal drawing mask 6 was performed under the same conditions as in (2), when the cumulative irradiation illuminance of ultraviolet rays having a wavelength of 365 nm reached 2300 J / cm ² , When a defect portion (area of about 25 mm ² ) where light cannot be driven (on-off drive) occurs on the liquid crystal drawing mask surface and the test was continued as it was, the area of the defect portion was Cumulative irradiance is expanded to 75 mm ² at which point 7000J / cm ^2, was expanded significantly to the 125 mm ² at the time the cumulative irradiance reached 12000J / cm ^2.

(4) As is clear from the comparison of the results of (2) and (3) above, in the above (2), the ultraviolet rays used for forming the photocured resin layer using the ultraviolet ray sorting device 2 (wavelength 365 nm and In addition to guiding the ultraviolet rays in the vicinity thereof to the liquid crystal drawing mask 6, ultraviolet rays having wavelengths other than that (ultraviolet rays shorter than 365 nm) are cut to prevent the exposure of the liquid crystal drawing mask 6 by ultraviolet rays having a wavelength shorter than 365 nm. (3) The light irradiation was performed while exposing the liquid crystal drawing mask 7 to ultraviolet light having a wavelength of 365 nm and the vicinity thereof and ultraviolet light having a wavelength shorter than that without using the ultraviolet ray sorting device 2 by performing the light irradiation. Compared to the above, the life of the liquid crystal drawing mask 6 is greatly extended.

Example 1
(1) Optical stereolithography was manufactured using the optical modeling apparatus shown in FIG.
In the stereolithography apparatus of FIG. 3, the same light source 1, ultraviolet ray sorter 2 and liquid crystal drawing mask 6 as those used in Test Example 1 were used. The reflection mirror 4 was a “cold mirror” manufactured by Koshin Kogyo Co., Ltd., the Fresnel lens 5 was a Fresnel lens manufactured by this special optical resin, and the projection lens 7 was “EL-Nikkor” manufactured by Nikon Corporation. As the ultraviolet curable resin composition, “CPX-1000” [curing sensitivity: 2.5 mJ; ultraviolet curing wavelength: 365 nm; containing Irgacure (registered trademark) 651 as a photopolymerization initiator] was used.
(2) Using the optical modeling apparatus of FIG. 3 shown in (1) above, projection size onto the modeling surface 8 made of an ultraviolet curable resin composition = 40 mm × 30 mm, light energy intensity 2 on the modeling surface 8 Repeat the operation of forming a photocured resin layer by irradiating the modeling surface with light under the conditions of 0.5 mW / cm ² , irradiation time of 1 sec and irradiation depth of 0.1 mm, and length × width × height = A three-dimensional model having a size of 22 mm × 32 mm × 25 mm was manufactured (optical modeling time 1 hour).
(3) The three-dimensional structure obtained by the above (2) has a good appearance and excellent dimensional accuracy.

The stereolithography method and apparatus of the present invention prevents or suppresses deterioration of the liquid crystal drawing mask due to ultraviolet rays or ultraviolet rays and infrared rays, greatly extending the usable life of the expensive liquid crystal drawing mask, It is effective for economically producing a high-quality optically shaped object excellent in accuracy, mechanical properties, etc. at a high modeling speed, with good productivity, and at a lower cost than in the past.
The optical modeling method and apparatus of the present invention causes a reduction in the light intensity of almost the entire amount of ultraviolet rays having a predetermined wavelength used for curing the photocurable resin composition contained in light from a light emitting means such as a light source. Can be effectively used for optical modeling, and the optical intensity can be made while uniforming the intensity distribution of the ultraviolet rays of the predetermined wavelength by the ultraviolet ray sorting device to prevent the occurrence of curing unevenness and intensity unevenness in the photocured product. .
The stereolithography method and apparatus of the present invention can be effectively used for the production of various three-dimensional models ranging from small to large.
In the case of the method and apparatus of the present invention, models for precision parts, electrical / electronic parts, furniture, building structures, automotive parts, various containers, castings, molds, mother molds, etc., complex models Parts for designing simple heat transfer circuits, parts for analysis and planning of heat transfer behavior of complex structures, other various three-dimensional objects with complicated shapes and structures, and planar photocured resin layers such as lithographs Can be manufactured smoothly with high modeling speed and dimensional accuracy.

It is a figure which shows the spectral distribution of the light radiated | emitted from an ultra high pressure mercury lamp. It is a figure which shows the spectral distribution of the light radiated | emitted from a high pressure mercury lamp. It is a figure which shows an example of the optical modeling apparatus of this invention. It is a figure which shows an example of the principal part of the optical modeling apparatus of this invention. It is a figure which shows the test apparatus used by Test Example 1 (deterioration test by the ultraviolet-ray of a liquid crystal drawing mask).

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Light source 2 Ultraviolet sorter for reflecting and separating ultraviolet light having a predetermined wavelength and transmitting ultraviolet light having a wavelength other than the predetermined wavelength 3 Convex lens 4 Reflecting mirror 5 Fresnel lens 6 Liquid crystal drawing mask 7 Projection lens 8 Ultraviolet curable resin composition Surface made of objects 9 Quartz fiber

Claims (16)

  Light is irradiated under control through a liquid crystal drawing mask in which multiple micro liquid crystal shutters that can block and transmit light in a micro dot area are arranged in a linear or planar manner on a modeling surface made of a photocurable resin composition Then, after forming a photocured resin layer having a predetermined shape pattern, a photocurable resin composition for one layer is applied on the photocured resin layer to form a modeling surface, and the photocurability A target three-dimensional model is formed by further irradiating light on the modeling surface made of the resin composition under control through a liquid crystal drawing mask to further form a photocured resin layer having a predetermined shape pattern. The optical shaping method is repeated until the photocurable resin composition is used as a photocurable resin composition, and is used for photocuring the photocurable resin composition at a position between the light emitting means and the liquid crystal drawing mask. Reflects ultraviolet rays of a predetermined wavelength to be used Both are arranged with an ultraviolet ray sorting device that transmits and separates and removes ultraviolet rays having a wavelength different from the ultraviolet ray of the predetermined wavelength, and the ultraviolet ray sorting device allows the photocurable resin composition of the ultraviolet rays contained in the light from the light source. The ultraviolet ray having a predetermined wavelength used for photocuring is reflected to guide the reflected ultraviolet ray having the predetermined wavelength toward the liquid crystal drawing mask. The liquid crystal drawing mask reflects the ultraviolet light having the predetermined wavelength reflected by the ultraviolet ray sorter while preventing the exposure of the liquid crystal drawing mask by ultraviolet light having a wavelength different from the ultraviolet light having the predetermined wavelength. And forming a photocured resin layer having a predetermined shape pattern by irradiating the modeling surface through the optical modeling method.   Light is irradiated under control through a liquid crystal drawing mask in which multiple micro liquid crystal shutters that can block and transmit light in a micro dot area are arranged in a linear or planar manner on a modeling surface made of a photocurable resin composition A photo-forming method comprising a step of forming a photo-cured resin layer having a predetermined shape pattern, wherein an ultraviolet curable resin composition is used as the photo-curable resin composition, and a light emitting means and a liquid crystal drawing mask A UV sorting device that reflects UV light of a predetermined wavelength used for photocuring of the photocurable resin composition at a position between and a UV light having a wavelength different from that of the predetermined wavelength and separates and removes the UV light The ultraviolet ray sorting device reflects the ultraviolet ray having a predetermined wavelength used for photocuring the photocurable resin composition out of the ultraviolet ray contained in the light from the light source, and the reflected ultraviolet ray having the predetermined wavelength is reflected. At the same time, the ultraviolet rays having a wavelength different from the ultraviolet rays having the predetermined wavelength are transmitted through the ultraviolet ray sorting device to be separated and removed as unnecessary light. The photo-cured resin layer having a predetermined shape pattern is formed by irradiating the modeling surface through the liquid crystal drawing mask with the ultraviolet ray having the predetermined wavelength reflected by the ultraviolet ray sorter while preventing the exposure of the liquid crystal drawing mask by An optical modeling method characterized by that.   The optical modeling method according to claim 1, wherein the ultraviolet sorting device further has a function of uniformizing an intensity distribution of light including ultraviolet rays having the predetermined wavelength that is irradiated onto a modeling surface through a liquid crystal drawing mask.   The ultraviolet ray sorting device reflects 95% or more of the ultraviolet ray having the predetermined wavelength used for forming the photocured resin layer and transmits 85% or more of the ultraviolet ray having a shorter wavelength than the predetermined wavelength as unnecessary light. The stereolithography method according to any one of claims 1 to 3, which is an ultraviolet ray sorting device for separating and removing.   The ultraviolet ray sorting device forms an ultraviolet ray sorting film layer that reflects the ultraviolet ray having the predetermined wavelength and transmits the ultraviolet ray having a wavelength different from the ultraviolet ray having the predetermined wavelength on the inner wall surface of the hollow transparent cylindrical body having both ends opened. The ultraviolet ray of the predetermined wavelength, which is used for curing the photocurable resin by introducing light from the opening on the inlet side of the cylindrical body of the ultraviolet sorter. The ultraviolet ray selection film layer formed on the cylindrical body is led out from the opening on the outlet side of the cylindrical body while making the light intensity distribution uniform while sequentially reflecting in the cylindrical body, and ultraviolet light having a wavelength different from the ultraviolet light of the predetermined wavelength is derived. The optical modeling method according to any one of claims 1 to 4, wherein the cylindrical body is separated and removed by being transmitted from a side wall of the cylindrical body to the outside of the cylindrical body.   The UV screening film layer formed on the inner wall of the cylindrical body of the UV screening device is a multilayer coating of alternating non-absorbing dielectric material with high refractive index and non-absorbing dielectric material with low refractive index. The stereolithography method according to claim 5, comprising a dielectric multilayer coating applied.   The ultraviolet sorting device further has a function of separating and removing 85% or more of light having a wavelength of 780 nm or more as unnecessary light, thereby further preventing or suppressing exposure of the liquid crystal drawing mask by light having a wavelength of 780 nm or more. The optical modeling method according to any one of claims 1 to 6.   The liquid crystal has a light intensity capable of quickly curing the ultraviolet curable resin composition among the ultraviolet rays contained in the light from the light source, the ultraviolet ray having the predetermined wavelength for forming the photocured resin layer. The stereolithography method according to any one of claims 1 to 7, wherein the deterioration effect on the drawing mask is relatively small ultraviolet rays.   The stereolithography method according to any one of claims 1 to 8, wherein the ultraviolet ray having the predetermined wavelength for forming the photocured resin layer is an ultraviolet ray having a wavelength within a range of 300 to 390 nm.   The optical shaping method according to any one of claims 1 to 9, wherein a high-intensity discharge lamp is used as the light source.   As the photocurable resin composition, an ultraviolet curable resin composition that is at least cured by ultraviolet light having a wavelength of 365 nm or in the vicinity thereof but is not cured by visible light or infrared light having a wavelength of 400 nm or more is used. As an ultraviolet ray sorting device, it reflects 95% or more of the ultraviolet light in the wavelength 365 nm or the vicinity contained in the light emitted from the ultra high pressure mercury lamp or the high pressure mercury lamp, and 85% or more of the ultraviolet light having a wavelength of 340 nm or less. An ultraviolet sorting device that transmits light is disposed on the upstream side of the liquid crystal drawing mask, and a photocured resin layer is formed with ultraviolet light having a wavelength of 365 nm or its vicinity while preventing or suppressing exposure of the liquid crystal drawing mask to ultraviolet rays having a wavelength of 340 nm or less. The optical modeling method according to any one of claims 1 to 10. Means for forming a shaped surface comprising a photocurable resin composition;
A light emitting means for radiating light containing ultraviolet rays of a predetermined wavelength and ultraviolet rays of other wavelengths for curing the photocurable resin composition;
A liquid crystal drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged in a line or a plane; and
An ultraviolet ray sorter disposed between the light emitting means and the liquid crystal drawing mask, which reflects the ultraviolet ray having the predetermined wavelength for curing the photocurable resin composition, but transmits and separates the ultraviolet ray having a wavelength other than the predetermined wavelength;
An optical shaping apparatus comprising:   An ultraviolet screening film layer in which an ultraviolet screening device reflects ultraviolet light having the predetermined wavelength on the inner wall surface of a hollow transparent cylindrical body opened at both ends, and transmits and separates ultraviolet light having a wavelength different from that of the predetermined wavelength. The stereolithography apparatus according to claim 12, comprising an ultraviolet sorting device having a shape formed thereon.   The ultraviolet screening film layer formed on the inner wall surface of the cylindrical body of the ultraviolet screening device is a dielectric multilayer coating film layer in which a dielectric material having a high refractive index and a dielectric material having a low refractive index are alternately coated in multiple layers. Item 13. The optical modeling apparatus according to Item 13.   The optical modeling device according to any one of claims 12 to 14, wherein the ultraviolet ray sorting device further has a function of transmitting 85% or more of light having a wavelength of 780 nm or more and separating the light as unnecessary light. The optical modeling apparatus according to claim 12, wherein the light source is a high-intensity discharge lamp.

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