JP2005336358A - Anisotropic electroconductive adhesive and heat seal connector - Google Patents

Anisotropic electroconductive adhesive and heat seal connector Download PDF

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JP2005336358A
JP2005336358A JP2004158132A JP2004158132A JP2005336358A JP 2005336358 A JP2005336358 A JP 2005336358A JP 2004158132 A JP2004158132 A JP 2004158132A JP 2004158132 A JP2004158132 A JP 2004158132A JP 2005336358 A JP2005336358 A JP 2005336358A
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epoxy resin
microcapsules
adhesive
resin
microcapsule
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Jiro Koyama
次郎 小山
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an anisotropic electroconductive adhesive and heat seal connector that can be used for hours at normal temperature and is easy to handle. <P>SOLUTION: A pair of flexible insulating base materials 1, 1A are equipped and the electrode circuits 2, 2A are formed on the counter-face surface of the pair of the insulating base material and an anisotropic electroconductive adhesive 3 is placed between the pair of the electrode circuit and they are thermocompression bonded to form the adhesive layer 3A. The anisotropic electroconductive adhesive 3 is prepared from the microcapsules 32 that includes an epoxy resin 31 in each capsules, a hardening agent 33 for hardening the epoxy resin 31, a high molecule compound 34 having film-forming properties and electroconductive particles 35 and the average particle size of the microcapsules 32 is controlled in the range of from 20 to 100 μm and the wall film thickness of the capsules is set in the range of from 0.5 to 3.0 μm. Thereby the preserving properties can be sustained until the thermocompression bonding operation in no need of refrigeration. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、LCD(LCDパネル)やPDP等からなる電子部品とこの電子部品用の駆動回路を備えた回路基板とを電気的に接続する異方導電性接着剤及びヒートシールコネクタに関するものである。   The present invention relates to an anisotropic conductive adhesive and a heat seal connector for electrically connecting an electronic component such as an LCD (LCD panel) or a PDP and a circuit board having a drive circuit for the electronic component. .

近年の電子機器は高機能化、高性能化が要求され、そのため異方導電性接着剤が少なからず使用されているが、この異方導電性接着剤は、一般に絶縁性接着剤に導電粒子を含有することにより調製される(特許文献1、2参照)。
絶縁性接着剤としては、高い接続信頼性を得ることのできるエポキシ系の熱硬化性樹脂が主に使用されている。硬化剤には、短時間硬化のニーズを満たすため、イミダゾール系やアミン系の材料をマイクロカプセル化した潜在性の硬化剤が使用されている。
特開2003−272440号公報 特開平10−219222号公報
In recent years, electronic devices are required to have higher functionality and higher performance, and therefore anisotropic conductive adhesives are used in many ways. In general, anisotropic conductive adhesives are generally made of insulating adhesives with conductive particles. It is prepared by containing (see Patent Documents 1 and 2).
As the insulating adhesive, an epoxy-based thermosetting resin that can obtain high connection reliability is mainly used. As the curing agent, a latent curing agent obtained by microencapsulating an imidazole-based or amine-based material is used in order to satisfy the need for short-time curing.
JP 2003-272440 A JP-A-10-219222

しかしながら、潜在性の硬化剤は、マイクロカプセル化しているにも関わらず、カプセルの壁の耐溶剤性が低いため、常温での可使時間が短く、冷凍保管しなければならないという大きな問題がある。また、膜状に成形する際、硬化反応が進行しないよう低温で乾燥させなければならないという問題もある。   However, although the latent curing agent is microencapsulated, since the solvent resistance of the capsule wall is low, there is a big problem that the pot life at normal temperature is short and it must be stored frozen. . In addition, there is also a problem that when forming into a film shape, it must be dried at a low temperature so that the curing reaction does not proceed.

本発明は上記に鑑みなされたもので、常温で長時間使用することができ、取り扱いの容易な異方導電性接着剤及びヒートシールコネクタを提供することを目的としている。   The present invention has been made in view of the above, and an object thereof is to provide an anisotropic conductive adhesive and a heat seal connector that can be used at room temperature for a long time and are easy to handle.

本発明者は、上記問題点を解決するため、検討を重ねた結果、エポキシ樹脂を内包するマイクロカプセルと硬化剤とを離隔させ、マイクロカプセルの平均粒径と壁の膜厚とをそれぞれ調整することにより、熱圧着時まで安定した保存性を得ることができるとともに、熱圧着後には接続信頼性に優れる異方導電性接着剤を得ることを見出し、本発明を完成させた。   As a result of repeated studies to solve the above problems, the present inventor separates the microcapsules encapsulating the epoxy resin and the curing agent, and adjusts the average particle diameter of the microcapsules and the film thickness of the wall, respectively. Thus, the present inventors have found that an anisotropic conductive adhesive having a stable storage property until thermocompression bonding and having excellent connection reliability after thermocompression bonding can be obtained.

すなわち、本発明においては上記課題を解決するため、エポキシ樹脂を内包するマイクロカプセルと、このマイクロカプセルのエポキシ樹脂を硬化させる硬化剤と、成膜性を有する高分子化合物と、導電粒子とを備え、マイクロカプセルの平均粒径を20〜100μmの範囲とするとともに、このマイクロカプセルの壁の膜厚を0.5〜3.0μmの範囲としたことを特徴としている。
なお、マイクロカプセルの壁を形成する樹脂のガラス転移温度を60〜150℃の範囲とすることができる。
That is, in order to solve the above-described problems, the present invention includes a microcapsule encapsulating an epoxy resin, a curing agent that cures the epoxy resin of the microcapsule, a polymer compound having film-forming properties, and conductive particles. The average particle size of the microcapsules is in the range of 20 to 100 μm, and the film thickness of the wall of the microcapsules is in the range of 0.5 to 3.0 μm.
In addition, the glass transition temperature of resin which forms the wall of a microcapsule can be made into the range of 60-150 degreeC.

また、本発明においては上記課題を解決するため、可撓性の基材に導体層を形成し、この導体層の対電気接合物用の接続領域に、請求項1又は2記載の異方導電性接着剤を塗布して接着層を形成したことを特徴としている。   In the present invention, in order to solve the above-mentioned problem, a conductive layer is formed on a flexible base material, and the anisotropic conductive material according to claim 1 or 2 is formed in a connection region for an electric junction of the conductive layer. The adhesive layer is formed by applying a functional adhesive.

ここで、特許請求の範囲における電気接合物には、少なくともFPC、LCD、PDP、ITO、回路基板、ガラス基板、表示パネル等のガラス、LSIチップ等が含まれる。接続領域は、導体層の一部でも良いし、全部でも良く、単数複数を特に問うものではない。   Here, the electrical junction in the claims includes at least FPC, LCD, PDP, ITO, circuit board, glass substrate, glass such as a display panel, LSI chip, and the like. The connection region may be a part of the conductor layer or all of the conductor layer, and the connection region is not particularly limited.

本発明によれば、マイクロカプセルの平均粒径が20〜100μmの範囲であり、平均粒径が20μm以上なので、マイクロカプセルの機械的な破壊に高い圧力を必要とせず、マイクロカプセルの破壊に伴い、電気接合物自体の損傷を招くことが少ない。また、平均粒径が100μm以下なので、マイクロカプセルが安易に破壊せず、この結果、異方導電性接着剤の性能を損なうことも少ない。   According to the present invention, since the average particle size of the microcapsules is in the range of 20 to 100 μm and the average particle size is 20 μm or more, high pressure is not required for mechanical destruction of the microcapsules, and with the destruction of the microcapsules. The electrical joint itself is less likely to be damaged. Further, since the average particle size is 100 μm or less, the microcapsules are not easily broken, and as a result, the performance of the anisotropic conductive adhesive is hardly impaired.

また、マイクロカプセルの壁の膜厚が0.5〜3.0μmの範囲であり、膜厚が0.5μm以上なので、マイクロカプセルからエポキシ樹脂が溶出し、保存安定性の損なわれるのを減少させることができる。また、膜厚が30μm以下なので、マイクロカプセルの破壊に困難を生じることがなく、接続安定性の低下を防ぐことができる。   In addition, since the film thickness of the microcapsule wall is in the range of 0.5 to 3.0 μm and the film thickness is 0.5 μm or more, the epoxy resin is eluted from the microcapsule and decreases the loss of storage stability. be able to. Further, since the film thickness is 30 μm or less, there is no difficulty in the destruction of the microcapsules, and the connection stability can be prevented from being lowered.

さらに、マイクロカプセルの壁を形成する樹脂のガラス転移温度が60〜150℃の範囲なので、室温で保存する際は安定し、熱圧着の際には壁が溶融破壊されるので、エポキシ樹脂の均一性が高まり、接続安定性が向上する。   Furthermore, since the glass transition temperature of the resin forming the wall of the microcapsule is in the range of 60 to 150 ° C., it is stable when stored at room temperature, and the wall is melted and destroyed during thermocompression bonding. The connection stability is improved.

本発明によれば、常温で長時間使用することができ、取り扱いの容易な異方導電性接着剤及びヒートシールコネクタを提供することができるという効果がある。   ADVANTAGE OF THE INVENTION According to this invention, there exists an effect that it can be used for a long time at normal temperature, and the anisotropic conductive adhesive and heat seal connector which are easy to handle can be provided.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態におけるヒートシールコネクタは、図1に示すように、可撓性を有する上下一対の絶縁基材1・1Aを備え、この一対の絶縁基材1・1Aの対向面には電極回路2・2Aをそれぞれ形成し、この一対の電極回路2・2Aの間に、異方導電性接着剤3を介在して熱圧着し、接着層3Aを形成するようにしている。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. A heat seal connector according to the present embodiment includes a pair of upper and lower insulating base materials 1 and 1A having flexibility as shown in FIG. Electrode circuits 2 and 2A are respectively formed on the opposing surfaces of the pair of insulating bases 1 and 1A, and an anisotropic conductive adhesive 3 is interposed between the pair of electrode circuits 2 and 2A and thermocompression bonded. Thus, the adhesive layer 3A is formed.

各絶縁基材1・1Aは、例えば耐熱性や耐放射線性に優れる薄いポリエステルやポリイミド製の樹脂フィルムを使用して薄い矩形に成形される。   Each of the insulating bases 1 and 1A is formed into a thin rectangle using, for example, a thin polyester or polyimide resin film having excellent heat resistance and radiation resistance.

異方導電性接着剤3は、少なくともエポキシ樹脂31を内包するマイクロカプセル32と、このマイクロカプセル32のエポキシ樹脂31を硬化させる硬化剤33と、成膜性を有する高分子化合物34と、導電粒子35とを備えている。   The anisotropic conductive adhesive 3 includes a microcapsule 32 containing at least an epoxy resin 31, a curing agent 33 for curing the epoxy resin 31 of the microcapsule 32, a polymer compound 34 having film-forming properties, and conductive particles. 35.

エポキシ樹脂31を内包するマイクロカプセル32としては、例えば液状あるいは固体のビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂等からなるエポキシ樹脂を公知のカプセル化法によりカプセル化されたものがあげられる。公知のカプセル化法としては、界面重合法やin−situ重合法に代表される化学的方法、コアセルベーション法、液中乾燥法等の物理化学的方法、メカノフュージョン、メカノケミカル等の機械的方法、スプレードライ法、高速気流中衝撃方法等が該当する。   As the microcapsule 32 enclosing the epoxy resin 31, for example, an epoxy resin made of a liquid or solid bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, phenol novolac type epoxy resin, or the like is known. Encapsulated by the above. Known encapsulation methods include chemical methods represented by interfacial polymerization methods and in-situ polymerization methods, physicochemical methods such as coacervation methods and in-liquid drying methods, and mechanical methods such as mechanofusion and mechanochemicals. The method, spray drying method, impact method in high-speed air current, etc. are applicable.

マイクロカプセル32は、上記反応に加え、反応系の攪拌スピード、噴霧ノズル径、圧力等を厳密に選定して制御することにより、所定の粒径とされる。また、マイクロカプセル32の壁は、芯物質であるエポキシ樹脂31と壁材との濃度比や配合比、反応物質に対する芯物質と壁物質の濃度、あるいは種々の反応条件(触媒量、pH、温度、時間)を厳密に選定して制御することにより、所定の厚さとされる。   In addition to the above reaction, the microcapsule 32 has a predetermined particle size by strictly selecting and controlling the stirring speed, spray nozzle diameter, pressure, and the like of the reaction system. In addition, the wall of the microcapsule 32 has a concentration ratio and a compounding ratio between the epoxy resin 31 as a core material and the wall material, a concentration of the core material and the wall material with respect to the reaction material, or various reaction conditions (amount of catalyst, pH, temperature). , Time) is strictly selected and controlled to obtain a predetermined thickness.

マイクロカプセル32の平均粒径は、20〜100μmの範囲に調整される。これは、マイクロカプセル32の平均粒径が20μm未満の場合には、マイクロカプセル32の破壊強度が高くなるので、熱圧着してもマイクロカプセル32が破壊されず、エポキシ樹脂31の硬化が進行しないため、電気的にも機械的にも接続信頼性が低下するからである。逆に、平均粒径が100μmを超える場合には、接着剤の調整や印刷等の製造工程でマイクロカプセル32が簡単に破壊され、硬化剤33との反応が進行して保存安定性が損なわれるからである。   The average particle diameter of the microcapsules 32 is adjusted to a range of 20 to 100 μm. This is because, when the average particle size of the microcapsules 32 is less than 20 μm, the breaking strength of the microcapsules 32 is increased, so that the microcapsules 32 are not broken even when thermocompression bonded, and the curing of the epoxy resin 31 does not proceed. This is because the connection reliability decreases both electrically and mechanically. On the other hand, when the average particle size exceeds 100 μm, the microcapsule 32 is easily broken in the manufacturing process such as adjustment of the adhesive and printing, and the reaction with the curing agent 33 proceeds to impair storage stability. Because.

また、マイクロカプセル32の壁の膜厚が0.5〜3.0μmの範囲に設定される。これは、壁の膜厚が0.5μm未満の場合には、内包されたエポキシ樹脂31の流動性に影響を及ぼし、粒子間の凝集が増え、粒子の分散性が悪化するので、熱圧着によりマイクロカプセル32を破壊しても、エポキシ樹脂31が不均一な状態で硬化して接続信頼性が低下するからである。   Further, the film thickness of the wall of the microcapsule 32 is set in the range of 0.5 to 3.0 μm. This is because when the wall thickness is less than 0.5 μm, it affects the fluidity of the encapsulated epoxy resin 31, increases the aggregation between particles, and deteriorates the dispersibility of the particles. This is because even if the microcapsule 32 is broken, the epoxy resin 31 is cured in a non-uniform state and connection reliability is lowered.

逆に、壁の膜厚が3.0μmよりも大きい場合には、接着に関与しない壁材の割合が多くなるため、接着性に欠けるとともに、壁材の強度が必要以上に強くなり、熱圧着時にマイクロカプセル32が破壊され難くなり、接続信頼性の低下を招くという理由に基づく。   On the contrary, when the wall thickness is larger than 3.0 μm, the ratio of the wall material not involved in the bonding increases, so that the adhesiveness is lacking and the strength of the wall material becomes stronger than necessary, and the thermocompression bonding is performed. This is based on the reason that sometimes the microcapsule 32 is not easily broken and the connection reliability is lowered.

マイクロカプセル32の壁を形成する樹脂のガラス転移温度は、60〜150℃の範囲に設定される。この壁用の樹脂としては、例えば、ポリメチルメタクリレート(PMMA)、ポリスチレン、ポリアミド、ポリビニルアルコール(PVA)、ポリビニルクロライド(PVC)、ポリエチレン、ポリプロピレン等が適している。マイクロカプセル32の壁は、材質の異なる2層、3層以上の多層の複合膜でも良い。   The glass transition temperature of the resin forming the wall of the microcapsule 32 is set in the range of 60 to 150 ° C. As the wall resin, for example, polymethyl methacrylate (PMMA), polystyrene, polyamide, polyvinyl alcohol (PVA), polyvinyl chloride (PVC), polyethylene, polypropylene and the like are suitable. The wall of the microcapsule 32 may be a multilayer composite film having two, three or more layers of different materials.

なお、熱硬化性樹脂と見られているものでも、合成条件を工夫することにより、三次元網状化せずに線状構造をとる高分子としてガラス転移温度が60〜150℃の樹脂を製造できることは公知であるから、係る樹脂をマイクロカプセル32の壁に使用しても良い。   In addition, even if it is regarded as a thermosetting resin, it is possible to produce a resin having a glass transition temperature of 60 to 150 ° C. as a polymer having a linear structure without forming a three-dimensional network by devising synthesis conditions. Is known, such a resin may be used for the wall of the microcapsule 32.

硬化剤33としては、エポキシ樹脂用の通常の硬化剤が使用される。例えば、アミン系化合物、イミダゾール系化合物、フェノール系化合物、メルカプト化合物、カルボン酸系化合物、水酸基含有化合物、イソシアネート類等があげられる。特に、反応速度の速いアミン系化合物、イミダゾール系化合物、メルカプト化合物が好ましい。硬化剤33には、促進剤として各種の酸やアミン類等が混合される。   As the curing agent 33, an ordinary curing agent for epoxy resin is used. Examples thereof include amine compounds, imidazole compounds, phenol compounds, mercapto compounds, carboxylic acid compounds, hydroxyl group-containing compounds, isocyanates, and the like. In particular, amine compounds, imidazole compounds, and mercapto compounds having a high reaction rate are preferable. The curing agent 33 is mixed with various acids and amines as accelerators.

これらの硬化剤33は、特に溶剤の影響のない異方導電接着剤の配合に使用されるのであれば、潜在性を付与するためにマイクロカプセル化することができる。例えば、市販の潜在性硬化剤であるノバキュア〔旭化成エポキシ株式会社製〕、アミキュア〔味の素ファインテクノ株式会社製〕、フジキュア〔富士化成工業株式会社製〕等を使用することができる。   These curing agents 33 can be microencapsulated in order to provide a potential if they are used for blending anisotropic conductive adhesives that are not particularly affected by solvents. For example, commercially available latent curing agents such as NovaCure (Asahi Kasei Epoxy Co., Ltd.), Amicure (Ajinomoto Fine Techno Co., Ltd.), FujiCure (Fuji Kasei Kogyo Co., Ltd.) and the like can be used.

これは、保存時の硬化剤33による吸湿を防止し、しかも、高温の保存条件にも十分耐え得る異方導電性接着剤3となるので、有効である。但し、硬化時間を遅延させるおそれがあるので、選択には注意を要する。
また、溶剤の影響が多少あっても、製膜時におけるインクのポットライフを若干ながら向上させることができるので、異方導電性接着剤3やヒートシールコネクタの製造に有効である。
This is effective because the anisotropic conductive adhesive 3 prevents moisture absorption by the curing agent 33 during storage and can sufficiently withstand high temperature storage conditions. However, care should be taken when selecting because there is a risk of delaying the curing time.
Further, even if there is some influence of the solvent, the pot life of the ink during film formation can be slightly improved, which is effective for manufacturing the anisotropic conductive adhesive 3 and the heat seal connector.

マイクロカプセル32と硬化剤33の配合量は、マイクロカプセル32のエポキシ樹脂内包率とエポキシ樹脂31のエポキシ当量とを考慮しながら決定される。通常、第3アミンを除くアミン系化合物、フェノール系化合物、カルボン酸系化合物等の不可重合型の硬化剤33は、エポキシ当量に見合う量を配合し、イミダゾール系化合物のような触媒型の硬化剤33は、これよりも少なめに配合する。   The blending amount of the microcapsule 32 and the curing agent 33 is determined in consideration of the epoxy resin encapsulation rate of the microcapsule 32 and the epoxy equivalent of the epoxy resin 31. Usually, the non-polymerizable curing agent 33 such as an amine compound, a phenol compound, a carboxylic acid compound and the like excluding a tertiary amine is blended in an amount corresponding to the epoxy equivalent, and a catalytic curing agent such as an imidazole compound. 33 is blended slightly less than this.

例えば、エポキシ当量184〜194のエポキシ樹脂には、DETA(ジエチレントリアミン)を20〜60質量部程度配合するが、マイクロカプセル化したエポキシ樹脂には、係る値にエポキシ樹脂内包率、例えば90%をかけた18〜54質量部を配合すれば良い。   For example, about 20 to 60 parts by mass of DETA (diethylenetriamine) is blended in an epoxy resin having an epoxy equivalent of 184 to 194, but the epoxy encapsulating rate, for example, 90%, is applied to the value for the microencapsulated epoxy resin. What is necessary is just to mix | blend 18-54 mass parts.

高分子化合物34は、特に限定されるものではないが、例えばエチレン−酢酸ビニル共重合体、カルボキシル変性エチレン−酢酸ビニル共重合体、エチレン−イソボチルアクリレート共重合体、ポリアミド、ポリエステル、ポリメチルメタクリレート、ポリビニルエーテル、ポリビニルブチラール、ポリウレタン、スチレン−ブタジエン−スチレン(SBS)共重合体、カルボキシル変性SBS共重合体、スチレン−エチレン−ブチレン−スチレン(SEBS)共重合体、マレイン酸変性SEBS共重合体、ポリブタジエンゴム、クロロプレンゴム(CR)カルボキシル変性CR、スチレン−ブタジエンゴム、イソブチレン−イソプレン共重合体、アクリロニトリル−ブタジエンゴム(NBR)、カルボキシ変性NBR、アミン変性NBR、エポキシ樹脂、フェノキシ樹脂、フェノール樹脂、シリコーンゴム、アクリルゴム等から選択される1又は2種以上の組み合わせにより得られるものがあげられる。   The polymer compound 34 is not particularly limited, but for example, ethylene-vinyl acetate copolymer, carboxyl-modified ethylene-vinyl acetate copolymer, ethylene-isobotyl acrylate copolymer, polyamide, polyester, polymethyl Methacrylate, polyvinyl ether, polyvinyl butyral, polyurethane, styrene-butadiene-styrene (SBS) copolymer, carboxyl-modified SBS copolymer, styrene-ethylene-butylene-styrene (SEBS) copolymer, maleic acid-modified SEBS copolymer , Polybutadiene rubber, chloroprene rubber (CR) carboxyl-modified CR, styrene-butadiene rubber, isobutylene-isoprene copolymer, acrylonitrile-butadiene rubber (NBR), carboxy-modified NBR, amine-modified NBR, Epoxy resins, phenoxy resins, phenol resins, silicone rubber, those obtained by one or a combination of two or more selected from acrylic rubber and the like.

導電粒子35としては、金、銀、ニッケル、銅、パラジウム、ステンレス、真鍮、ハンダ等の金属粒子、タングステンカーバイト、シリカカーバイト等のセラミック粒子、カーボン粒子、表面が金属により被覆されたプラスチック粒子、あるいはこれらの組み合わせ等が使用される。   The conductive particles 35 include metal particles such as gold, silver, nickel, copper, palladium, stainless steel, brass, and solder, ceramic particles such as tungsten carbide and silica carbide, carbon particles, and plastic particles whose surfaces are coated with metal. Or a combination of these is used.

導電粒子35の絶縁性接着剤に対する配合量は、絶縁性接着剤100容量部に対して0.01〜100容量部、好ましくは1〜10容量部の範囲とされる。これは、配合量が0.01容量部未満の場合には、導通不良を招きやすく、逆に配合量が100容量部を超える場合には、絶縁不良を招きやすいからである。   The blending amount of the conductive particles 35 with respect to the insulating adhesive is 0.01 to 100 parts by volume, preferably 1 to 10 parts by volume with respect to 100 parts by volume of the insulating adhesive. This is because when the blending amount is less than 0.01 part by volume, conduction failure tends to occur, and conversely when the blending amount exceeds 100 volume parts, insulation failure tends to occur.

本実施形態における異方導電性接着剤3には、粘着付与剤としてロジン、ロジン誘導体、テルペン樹脂、テルペンフェノール樹脂、石油樹脂、クマロン−インデン樹脂、スチレン系樹脂、イソプレン系樹脂、アルキルフェノール樹脂、キシレン樹脂等の1種又は2種以上、反応性助剤等が適宜添加される。また、架橋剤としてのポリオール、イソシアネート類、メラミン樹脂、尿素樹脂、ウトロピン樹脂、アミン類、酸無水物、過酸化物、金属酸化物、トリフルオロ酢酸クロム塩等の有機金属塩、チタン、ジルコニア、アルミニウム等のアルコキシド、ジブチル錫ジオキサイド等の有機金属酸化物、2.2−ジエトキシアセトンフェノン、ベンジル等の光開始剤、アミン類、リン化合物、塩素化合物等の増感剤が適宜添加される。さらに、硬化剤、加硫剤、劣化防止剤、耐熱添加剤、熱伝導向上剤、軟化剤、着色剤、各種のカップリング剤、金属不活性剤等も選択的に添加される。   In the anisotropic conductive adhesive 3 in this embodiment, rosin, rosin derivative, terpene resin, terpene phenol resin, petroleum resin, coumarone-indene resin, styrene resin, isoprene resin, alkylphenol resin, xylene are used as tackifiers. One or more resins such as a resin, a reactive aid, and the like are appropriately added. In addition, polyols, isocyanates, melamine resins, urea resins, utropine resins, amines, acid anhydrides, peroxides, metal oxides, trifluoroacetic acid chromium salts and other organic metal salts such as titanium, zirconia, Alkoxides such as aluminum, organometallic oxides such as dibutyltin dioxide, photoinitiators such as 2.2-diethoxyacetonephenone and benzyl, and sensitizers such as amines, phosphorus compounds and chlorine compounds are appropriately added. . Further, a curing agent, a vulcanizing agent, a deterioration preventing agent, a heat resistance additive, a heat conduction improver, a softening agent, a colorant, various coupling agents, a metal deactivator, and the like are selectively added.

上記によれば、マイクロカプセル32の平均粒径と壁の膜厚とをそれぞれ調整し、マイクロカプセル32を硬化剤33と離隔させるので、冷凍保管しなくても熱圧着時まで安定した保存性を得ることができる。また、熱圧着後には接続信頼性に優れる異方導電性接着剤3を得ることができる。   According to the above, since the average particle diameter of the microcapsule 32 and the film thickness of the wall are adjusted, and the microcapsule 32 is separated from the curing agent 33, stable storage properties are maintained until thermocompression bonding without being stored frozen. Can be obtained. Moreover, the anisotropic conductive adhesive 3 excellent in connection reliability can be obtained after thermocompression bonding.

次に、図2は本発明の第2の実施形態を示すもので、この場合には、可撓性を有する絶縁基材1を備え、この絶縁基材1の表面長手方向には、複数本の導電パターン4を所定の間隔をおいて並設し、複数本の導電パターン4の非接続部5には、絶縁レジスト層6を積層配置するとともに、複数本の導電パターン4の接続部7、換言すれば、両端部には、異方導電性接着剤3をそれぞれ塗布して対電気接合物8用の接着層3Aを形成するようにしている。   Next, FIG. 2 shows a second embodiment of the present invention. In this case, a flexible insulating base material 1 is provided, and a plurality of insulating base materials 1 are provided in the longitudinal direction of the surface of the insulating base material 1. The conductive patterns 4 are arranged in parallel at a predetermined interval, and the insulating resist layer 6 is laminated on the non-connection portions 5 of the plurality of conductive patterns 4, and the connection portions 7 of the plurality of conductive patterns 4 are arranged. In other words, the anisotropic conductive adhesive 3 is applied to both ends so as to form the adhesive layer 3A for the electrical junction 8.

複数本の導電パターン4としては、有機バインダーに0.01〜10μm程度の粒径を有する銀粉、銅粉、カーボンブラック、グラファイト等の導電性付与剤を混合した導電ペーストがスクリーン印刷されたもの、金属箔をエッチングしてパターン化されたもの等があげられる。勿論、これ以外にも他の導電性のパターンを使用することができる。各導電パターン4の高さは、1〜50μm程度であり、導電パターン4が精細なほど低い導電パターン4の製造が容易になる。   As the plurality of conductive patterns 4, a screen-printed conductive paste in which a conductive imparting agent such as silver powder, copper powder, carbon black, and graphite having a particle size of about 0.01 to 10 μm is mixed with an organic binder, Examples thereof include a pattern obtained by etching a metal foil. Of course, other conductive patterns can be used. The height of each conductive pattern 4 is about 1 to 50 μm, and the finer the conductive pattern 4 is, the easier the manufacture of the lower conductive pattern 4 is.

絶縁レジスト層6は、ポリアミド系、ポリエステル系、ポリイミド系、ポリウレタン系、アクリル系等の合成樹脂、各種の合成ゴム類、又はその混合物をベースに硬化剤、加硫剤、劣化防止剤等の添加物を必要に応じ添加して溶剤に溶解し、スクリーン印刷した層、ポリイミド、ポリエステル、塩化ビニル等のフィルムにアクリル系樹脂等の粘着剤やエポキシ樹脂等の接着剤が塗布され、貼着されたものがあげられる。   The insulating resist layer 6 is made of polyamide, polyester, polyimide, polyurethane, acrylic, or other synthetic resin, various synthetic rubbers, or a mixture thereof, and includes addition of a curing agent, a vulcanizing agent, a deterioration preventing agent, etc. A material was added as necessary and dissolved in a solvent, and a screen-printed layer, a film such as polyimide, polyester, and vinyl chloride was coated with an adhesive such as an acrylic resin or an adhesive such as an epoxy resin, and adhered. Things can be raised.

電気接合物8としては、例えば表示パネル等のガラスがあげられる。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても、上記実施形態と同様の作用効果が期待できるのは明らかである。
Examples of the electrical joint 8 include glass such as a display panel. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
In this embodiment, it is obvious that the same effect as the above embodiment can be expected.

以下、本発明に係る異方導電性接着剤及びヒートシールコネクタの実施例を比較例と共に説明する。   Examples of the anisotropic conductive adhesive and heat seal connector according to the present invention will be described below together with comparative examples.

実施例
(1)絶縁性接着剤溶液の調製
フェノキシ樹脂〔Inchem製 商品名PKHH〕100質量部、変性アミン系の硬化剤〔JER製 商品名エポメートRX221〕35質量部、エポキシ当量184〜194の液状ビスフェノールA型エポキシ樹脂〔ジャパンエポキシレジン製 商品名エピコート828〕をユリア樹脂/メラミン樹脂/ホルムアルデヒド混合物により内包したマイクロカプセル100質量部に、MEK:トルエン=3:7溶剤300質量部を加え、絶縁性接着剤溶液を調製した。
Example (1) Preparation of Insulating Adhesive Solution Phenoxy resin [trade name PKHH, manufactured by Inchem] 100 parts by mass, modified amine-based curing agent [trade name Epomate RX221, manufactured by JER] 35 parts by weight, liquid in an epoxy equivalent of 184 to 194 To 100 parts by mass of microcapsules encapsulating bisphenol A type epoxy resin (trade name Epicoat 828, manufactured by Japan Epoxy Resin Co., Ltd.) with a urea resin / melamine resin / formaldehyde mixture, 300 parts by mass of MEK: toluene = 3: 7 solvent is added to insulate. An adhesive solution was prepared.

マイクロカプセルは、平均粒径44μm、壁の膜の厚さ1.1μm、壁膜のガラス転移温度110℃のタイプとした。   The microcapsules were of a type having an average particle size of 44 μm, a wall film thickness of 1.1 μm, and a wall film glass transition temperature of 110 ° C.

(2)異方導電性接着剤の調製
上記絶縁性接着剤溶液の固形分100質量部に、表面がAuメッキされたニッケル粒子からなる導電粒子を10質量部加え、異方導電性接着剤を調製した。ニッケル粒子は平均粒径6μmとした。
(2) Preparation of anisotropic conductive adhesive To 100 parts by mass of the solid content of the insulating adhesive solution, 10 parts by mass of conductive particles made of nickel particles whose surface is Au-plated are added, and the anisotropic conductive adhesive is added. Prepared. The nickel particles had an average particle size of 6 μm.

(3)ヒートシールコネクタの作製
厚さ25μmのポリイミドフィルム上に、0.2mmピッチ(パターン/スペース=0.1mm/0.1mm)の回路パターンを有するFPCを形成し、このFPCの非接続部に絶縁レジスト層を積層配置するとともに、FPCの接続部に異方導電性接着剤をスクリーン印刷して接着層を形成し、この中間体を所定の寸法に切断してヒートシールコネクタを作製した。回路パターンは厚さ18μmの銅箔により形成した。異方導電性接着剤は、溶媒除去後のマイクロカプセルを除く部分の平均厚さが20μmになるようスクリーン印刷した。
(3) Production of heat seal connector An FPC having a circuit pattern of 0.2 mm pitch (pattern / space = 0.1 mm / 0.1 mm) is formed on a polyimide film having a thickness of 25 μm, and this FPC is not connected. In addition, an insulating resist layer was laminated and an anisotropic conductive adhesive was screen-printed on the connecting portion of the FPC to form an adhesive layer, and this intermediate was cut to a predetermined size to produce a heat seal connector. The circuit pattern was formed of a copper foil having a thickness of 18 μm. The anisotropic conductive adhesive was screen-printed so that the average thickness of the portion excluding the microcapsules after removing the solvent was 20 μm.

比較例1
(1)絶縁性接着剤溶液の調製
フェノキシ樹脂〔Inchem製 商品名PKHH〕100質量部、変性アミン系の硬化剤〔JER製 商品名エポメートRX221〕35質量部、エポキシ当量184〜194の液状ビスフェノールA型エポキシ樹脂〔ジャパンエポキシレジン製 商品名エピコート828〕をポリメチルメタクリレート(PMMA)により内包したマイクロカプセル120質量部に、MEK:トルエン=3:7溶剤300質量部を加え、絶縁性接着剤溶液を調製した。
Comparative Example 1
(1) Preparation of Insulating Adhesive Solution Phenoxy resin [trade name PKHH manufactured by Inchem] 100 parts by mass, modified amine-based curing agent [trade name Epomate RX221 manufactured by JER] 35 parts by weight, liquid bisphenol A having an epoxy equivalent of 184 to 194 To 120 parts by mass of microcapsules encapsulating type epoxy resin [trade name Epicoat 828 made by Japan Epoxy Resin] with polymethyl methacrylate (PMMA), 300 parts by mass of MEK: toluene = 3: 7 solvent is added, and the insulating adhesive solution is added. Prepared.

マイクロカプセルは、平均粒径15μm、壁の膜の厚さ0.6μm、壁膜のガラス転移温度105℃のタイプとした。(2)異方導電性接着剤の調製と(3)ヒートシールコネクタの作製については、実施例と同様とした。   The microcapsules were of the type having an average particle size of 15 μm, a wall film thickness of 0.6 μm, and a wall film glass transition temperature of 105 ° C. (2) Preparation of anisotropic conductive adhesive and (3) Heat seal connector production were the same as in the examples.

比較例2
(1)絶縁性接着剤溶液の調製
フェノキシ樹脂〔Inchem製 商品名PKHH〕100質量部、変性アミン系の硬化剤〔JER製 商品名エポメートRX221〕35質量部、エポキシ当量184〜194の液状ビスフェノールA型エポキシ樹脂〔ジャパンエポキシレジン製 商品名エピコート828〕をポリメチルメタクリレート(PMMA)により内包したマイクロカプセル120質量部に、MEK:トルエン=3:7溶剤300質量部を加え、絶縁性接着剤溶液を調製した。
Comparative Example 2
(1) Preparation of Insulating Adhesive Solution Phenoxy resin [trade name PKHH manufactured by Inchem] 100 parts by mass, modified amine-based curing agent [trade name Epomate RX221 manufactured by JER] 35 parts by weight, liquid bisphenol A having an epoxy equivalent of 184 to 194 To 120 parts by mass of microcapsules encapsulating type epoxy resin [trade name Epicoat 828 made by Japan Epoxy Resin] with polymethyl methacrylate (PMMA), 300 parts by mass of MEK: toluene = 3: 7 solvent is added, and the insulating adhesive solution is added. Prepared.

マイクロカプセルは、平均粒径37μm、壁の膜の厚さ0.1μm、壁膜のガラス転移温度103℃のタイプとした。(2)異方導電性接着剤の調製と(3)ヒートシールコネクタの作製については、実施例と同様とした。   The microcapsules were of the type having an average particle size of 37 μm, a wall film thickness of 0.1 μm, and a wall film glass transition temperature of 103 ° C. (2) Preparation of anisotropic conductive adhesive and (3) Heat seal connector production were the same as in the examples.

比較例3
(1)絶縁性接着剤溶液の調製
フェノキシ樹脂〔Inchem製 商品名PKHH〕100質量部、変性アミン系の硬化剤〔JER製 商品名エポメートRX221〕35質量部、エポキシ当量184〜194の液状ビスフェノールA型エポキシ樹脂〔ジャパンエポキシレジン製 商品名エピコート828〕をユリア樹脂/メラミン樹脂/ホルムアルデヒド混合物により内包したマイクロカプセル60質量部に、MEK:トルエン=3:7溶剤300質量部を加え、絶縁性接着剤溶液を調製した。
Comparative Example 3
(1) Preparation of Insulating Adhesive Solution Liquid bisphenol A having 100 parts by mass of phenoxy resin [trade name PKHH manufactured by Inchem], 35 parts by weight of a modified amine-based curing agent [trade name Epomate RX221 manufactured by JER], and epoxy equivalents 184 to 194 Type epoxy resin [trade name Epicoat 828 made by Japan Epoxy Resin] with 60 parts by mass of microcapsules encapsulated in a urea resin / melamine resin / formaldehyde mixture, 300 parts by mass of MEK: toluene = 3: 7 solvent, and an insulating adhesive A solution was prepared.

マイクロカプセルは、平均粒径120μm、壁の膜の厚さ1.6μm、壁膜のガラス転移温度112℃のタイプとした。(2)異方導電性接着剤の調製と(3)ヒートシールコネクタの作製については、実施例と同様とした。   The microcapsules were of the type having an average particle size of 120 μm, a wall film thickness of 1.6 μm, and a wall film glass transition temperature of 112 ° C. (2) Preparation of anisotropic conductive adhesive and (3) Heat seal connector production were the same as in the examples.

比較例4
(1)絶縁性接着剤溶液の調製
フェノキシ樹脂〔Inchem製 商品名PKHH〕100質量部、変性アミン系の硬化剤〔JER製 商品名エポメートRX221〕35質量部、エポキシ当量184〜194の液状ビスフェノールA型エポキシ樹脂〔ジャパンエポキシレジン製 商品名エピコート828〕をユリア樹脂/メラミン樹脂/ホルムアルデヒド混合物により内包したマイクロカプセル60質量部に、MEK:トルエン=3:7溶剤300質量部を加え、絶縁性接着剤溶液を調製した。
Comparative Example 4
(1) Preparation of Insulating Adhesive Solution Phenoxy resin [trade name PKHH manufactured by Inchem] 100 parts by mass, modified amine-based curing agent [trade name Epomate RX221 manufactured by JER] 35 parts by weight, liquid bisphenol A having an epoxy equivalent of 184 to 194 Type epoxy resin [trade name Epicoat 828 made by Japan Epoxy Resin] with 60 parts by mass of microcapsules encapsulated in a urea resin / melamine resin / formaldehyde mixture, 300 parts by mass of MEK: toluene = 3: 7 solvent, and an insulating adhesive A solution was prepared.

マイクロカプセルは、平均粒径40μm、壁の膜の厚さ3.2μm、壁膜のガラス転移温度110℃のタイプとした。(2)異方導電性接着剤の調製と(3)ヒートシールコネクタの作製については、実施例と同様とした。   The microcapsules were of the type having an average particle size of 40 μm, a wall film thickness of 3.2 μm, and a wall film glass transition temperature of 110 ° C. (2) Preparation of anisotropic conductive adhesive and (3) Heat seal connector production were the same as in the examples.

保存試験
実施例と比較例1〜4のヒートシールコネクタを40℃の恒温槽にそれぞれ1月、3月保存し、各ヒートシールコネクタを面積抵抗率50Ω/□の透明導電酸化膜基板(ITO)とPCBとの間に180℃、4MPa、20秒の条件下で熱圧着し、その後、ITOからの剥離強度と信頼性試験(85℃、85%RH、500時間)前後の抵抗値変化(500時間後の抵抗値−初期抵抗値)を測定し、表1、表2にまとめた。
Storage test The heat seal connectors of Examples and Comparative Examples 1 to 4 were stored in a constant temperature bath at 40 ° C. for January and March, respectively, and each heat seal connector was a transparent conductive oxide film substrate (ITO) with an area resistivity of 50Ω / □. And PCB were thermocompression bonded under conditions of 180 ° C., 4 MPa, 20 seconds, and then the peel strength from ITO and the resistance value change before and after the reliability test (85 ° C., 85% RH, 500 hours) (500 Resistance values after time-initial resistance values) were measured and summarized in Tables 1 and 2.

Figure 2005336358
Figure 2005336358

Figure 2005336358
Figure 2005336358

本発明に係る異方導電性接着剤及びヒートシールコネクタの実施形態を示す模式断面説明図である。It is a schematic cross section explanatory view showing an embodiment of an anisotropic conductive adhesive and a heat seal connector concerning the present invention. 本発明に係る異方導電性接着剤及びヒートシールコネクタの第2の実施形態を示す模式断面説明図である。It is a schematic cross-section explanatory drawing which shows 2nd Embodiment of the anisotropically conductive adhesive which concerns on this invention, and a heat seal connector.

符号の説明Explanation of symbols

1 絶縁基材
1A 絶縁基材
2 電極回路(導体層、接続領域)
2A 電極回路(導体層、接続領域)
3 異方導電性接着剤
3A 接着層
4 導電パターン(導体層)
5 非接続部
6 絶縁レジスト層
7 接続部(接続領域)
8 電気接合物
31 エポキシ樹脂
32 マイクロカプセル
33 硬化剤
34 高分子化合物
35 導電粒子
DESCRIPTION OF SYMBOLS 1 Insulation base material 1A Insulation base material 2 Electrode circuit (conductor layer, connection area)
2A electrode circuit (conductor layer, connection area)
3 Anisotropic conductive adhesive 3A Adhesive layer 4 Conductive pattern (conductor layer)
5 Non-connection part 6 Insulating resist layer 7 Connection part (connection area)
8 Electrical Joint 31 Epoxy Resin 32 Microcapsule 33 Curing Agent 34 Polymer Compound 35 Conductive Particles

Claims (3)

エポキシ樹脂を内包するマイクロカプセルと、このマイクロカプセルのエポキシ樹脂を硬化させる硬化剤と、成膜性を有する高分子化合物と、導電粒子とを備え、
マイクロカプセルの平均粒径を20〜100μmの範囲とするとともに、このマイクロカプセルの壁の膜厚を0.5〜3.0μmの範囲としたことを特徴とする異方導電性接着剤。
A microcapsule encapsulating an epoxy resin, a curing agent for curing the epoxy resin of the microcapsule, a polymer compound having film-forming properties, and conductive particles,
An anisotropic conductive adhesive, characterized in that the average particle size of the microcapsules is in the range of 20 to 100 μm, and the thickness of the wall of the microcapsules is in the range of 0.5 to 3.0 μm.
マイクロカプセルの壁を形成する樹脂のガラス転移温度を60〜150℃の範囲とした請求項1記載の異方導電性接着剤。   The anisotropic conductive adhesive according to claim 1, wherein the glass transition temperature of the resin forming the wall of the microcapsule is in the range of 60 to 150 ° C. 可撓性の基材に導体層を形成し、この導体層の対電気接合物用の接続領域に、請求項1又は2記載の異方導電性接着剤を塗布して接着層を形成したことを特徴とするヒートシールコネクタ。   A conductive layer is formed on a flexible base material, and the anisotropic conductive adhesive according to claim 1 or 2 is applied to a connection region for an electrical junction of the conductive layer to form an adhesive layer. Heat seal connector characterized by.
JP2004158132A 2004-05-27 2004-05-27 Anisotropic electroconductive adhesive and heat seal connector Pending JP2005336358A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165052A (en) * 2005-12-12 2007-06-28 Sumitomo Bakelite Co Ltd Anisotropic conductive film
JP2008097922A (en) * 2006-10-10 2008-04-24 Sumitomo Electric Ind Ltd Adhesive for electrode connection
WO2011055887A1 (en) * 2009-11-05 2011-05-12 (주)덕산테코피아 Conductive adhesive, method for manufacturing same, and electronic device including the conductive adhesive
JP2014120472A (en) * 2012-12-14 2014-06-30 Boe Technology Group Co Ltd Anisotropic conductive film and electronic device
WO2021051041A1 (en) * 2019-09-13 2021-03-18 Certain Teed Gypsum, Inc. Joint support including encapsulated adhesive

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165052A (en) * 2005-12-12 2007-06-28 Sumitomo Bakelite Co Ltd Anisotropic conductive film
JP4735229B2 (en) * 2005-12-12 2011-07-27 住友ベークライト株式会社 Anisotropic conductive film
JP2008097922A (en) * 2006-10-10 2008-04-24 Sumitomo Electric Ind Ltd Adhesive for electrode connection
JP4556936B2 (en) * 2006-10-10 2010-10-06 住友電気工業株式会社 Adhesive for electrode connection
WO2011055887A1 (en) * 2009-11-05 2011-05-12 (주)덕산테코피아 Conductive adhesive, method for manufacturing same, and electronic device including the conductive adhesive
JP2014120472A (en) * 2012-12-14 2014-06-30 Boe Technology Group Co Ltd Anisotropic conductive film and electronic device
US9796884B2 (en) 2012-12-14 2017-10-24 Boe Technology Group Co., Ltd. Anisotropic conductive adhesive film and electronic device
WO2021051041A1 (en) * 2019-09-13 2021-03-18 Certain Teed Gypsum, Inc. Joint support including encapsulated adhesive

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