JP2005319371A - High temperature chamber apparatus comprising a plurality of separatable chamber elements - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a large-size high-temperature vacuum chamber apparatus, satisfying all requirements in view that it is required that vacuum degree and temperature in a working area quickly arrives at desired values in order to efficiently treat a large substance to be treated, in which it is required that temperature distribution in the working area can maintain uniformness during working and heat irradiation efficiency to an object to be treated such as a glass substrate can maintain unison in all positions of front and rear ends, left and right ends and a central part of the substrate in an apparatus for treating a product having a large dimension. <P>SOLUTION: The high-temperature chamber apparatus is provided with a heating means inside in order to heat-treat the object to be treated such as the glass substrate and is constituted by mutually joining a plurality of separatable chamber elements formed by dividing the chamber apparatus in the shape of round slice. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a high temperature chamber apparatus, and more particularly to a vacuum chamber apparatus configured by connecting a plurality of chamber elements equipped with heaters therein. More specifically, the present invention relates to a high-temperature vacuum chamber apparatus that is optimal for performing a high-temperature vacuum processing operation inside a vacuum chamber configured by connecting a plurality of chamber elements with a heater built therein.

  In general, high temperature is required for liquid crystal color filter manufacturing, liquid crystal TFT substrate manufacturing, plasma display (PDP) material annealing and baking, PDP material annealing, organic electric luminescence (EL) substrate drying, etc. The vacuum chamber apparatus constitutes an essential apparatus.

  Conventionally, a high-temperature vacuum chamber apparatus used for the above-described operation or the like is, for example, as shown schematically in FIG. 9, a strong heat-resistant steel material for maintaining the strength of the high-temperature vacuum chamber apparatus 1 and the steel material. It has a frame 2 made of a heat insulating material that blocks heat, and a vacuum chamber, that is, a work area 3 is formed inside the frame 2. In the work area 3, a plurality of objects to be processed 4 such as glass substrates are laminated at a predetermined interval, and the plurality of objects to be processed 4 are simultaneously annealed and / or heated.

Furthermore, in order to perform a more preferable annealing treatment or heat treatment, it may be desired to maintain the internal temperature condition of the work area 3 at a constant value during the treatment work. For this purpose, it is also known that heating means (not shown) is arranged around the frame 2 to heat the work area 3. As means for that purpose, the present applicant has previously divided heaters around the outer periphery of the frame 2 as means for heating the work area 3 from the outside as means for maintaining the internal temperature condition of the work area 3 constant. And a special heater means (Patent Document 2) mounted inside the frame 2 as means for heating the work area 3 from the inside.
Japanese Patent Application No. 2003-393974 Japanese Patent Application No. 2003-301070

  However, recent advances in technology have shifted the size of the glass substrate used from so-called 6th generation to 7th generation. For this reason, for example, it is not sufficient to be able to process a glass substrate having a size of 1500 (mm) × 1800 (mm) so far, and processing of a glass substrate of 1800 (mm) × 2300 (mm) larger than this is possible. There has been a demand for the development of possible chamber devices.

  In an apparatus for processing such a large-sized product, the temperature distribution in the work area can maintain uniformity during the work, and the heat irradiation efficiency for the object to be processed such as a glass substrate is not affected by the front and rear ends and the left and right ends of the substrate It is required that identity can be maintained at all positions in the center and the center. Further, in order to efficiently process such a large object 4 to be processed, it is necessary to quickly reach the desired degree of vacuum and temperature in the work area.

  However, a large-sized high-temperature vacuum chamber apparatus that satisfies all such requirements has not existed so far. That is, when multiple such objects to be processed are stacked and processed, a considerably large thermal gradient is generated on the object to be processed in the intermediate layer, and accurate processing cannot be performed. Similarly, a thermal gradient is generated between the center and the central part, and different characteristics are formed between the peripheral part and the central part, and the quality is not constant, and it takes a lot of time to put multiple objects into and out of the chamber. This is because the temperature efficiency in the chamber is extremely lowered, and the time for obtaining an appropriate vacuum state is prolonged. Accordingly, the problem to be solved by the present invention is to freely handle a large-sized object to be processed such as a seventh-generation glass substrate, and further to a large-sized object to be processed from the seventh generation that will occur after that. Another object of the present invention is to provide a high-accuracy high-temperature vacuum chamber apparatus capable of reliably performing high-temperature vacuum processing operations.

  In the present invention, a high-temperature chamber apparatus equipped with a heating means for heat-treating an object to be processed such as a glass substrate, and a high-temperature chamber constituted by joining a plurality of chamber elements divided into a ring shape to each other An apparatus is disclosed. Further, it is disclosed that the high temperature chamber apparatus includes a vacuum means. In addition, a plurality of high-temperature vacuum chamber devices comprising a plurality of chamber elements, which are equipped with a heating vacuum means for heat-treating an object to be processed such as a glass substrate and divided in a ring shape, are joined together in the front-rear direction. The upper and lower chamber elements corresponding to each of the plurality of chamber elements constituting the high-temperature vacuum chamber are connected to each other in the vertical direction, and the vertical elements are integrated into the front and rear as necessary. A stacked high temperature vacuum chamber apparatus that can be separated in a direction is disclosed. Furthermore, a loader for loading an object to be processed such as a glass substrate, a plurality of stacked high-temperature vacuum chamber devices for high-temperature vacuum processing the object to be processed supplied from the loader, and an object for unloading the processed object An unloader, a robot mechanism for sequentially supplying objects to be processed from the loader to each stacked high-temperature vacuum chamber apparatus, and carrying out processed objects from the respective chamber apparatuses to the unloader, and a control for controlling these apparatuses and mechanisms. A laminated laminated high-temperature vacuum chamber device comprising a panel and each of the laminated high-temperature vacuum chamber devices, wherein each of the laminated high-temperature vacuum chamber devices is equipped with a heating vacuum means and divided into a plurality of chamber elements in the front-rear direction. A plurality of high-temperature vacuum chamber devices that are joined together are stacked in a vertical direction, and each high-temperature vacuum chamber is From the stacked high-temperature vacuum chamber device that can connect the vertical chamber elements corresponding to each of the plurality of chamber elements constituting the bar, and separate the vertical elements together in the front-rear direction as necessary. A composite laminated high temperature vacuum chamber apparatus is disclosed.

  In the present invention, since the volume of the high-temperature vacuum chamber apparatus for processing an object to be processed is small, a desired temperature and vacuum atmosphere can be obtained quickly, and the return time to normal temperature and normal pressure is short. Therefore, the capacity of the vacuum pump to be used may be small, and the processing time for one cycle is shortened. Further, since the chamber elements constituting the apparatus can be separated from each other in the front-rear direction, maintenance such as repair cleaning inside the apparatus can be performed very easily. In addition, the present invention is not limited to heat treatment and / or vacuum treatment of an object to be processed such as a glass substrate called fifth generation or sixth generation, and by increasing the number of chamber elements, a large seventh generation or eighth generation A workpiece can be processed easily and quickly. In addition, since each chamber element and chamber device are small and easy to access, the chamber element and chamber device can be easily transported and moved, and welding work from outside can be easily performed if necessary. It can be done.

  The technical idea of the present invention can usually be most usefully exhibited in a high-temperature vacuum chamber apparatus, but other than this, the same effect can be obtained in a high-temperature and high-pressure chamber apparatus. However, in the following, specific examples relating to the high temperature vacuum chamber apparatus will be described.

  FIG. 1 is a longitudinal sectional view showing an embodiment of a high-temperature vacuum chamber apparatus 10 according to the present invention. In the figure, a high-temperature vacuum chamber apparatus 10 has a known frame body 12 made of a strong heat-resistant steel material and a heat insulating material that cuts off heat from the steel material in order to maintain the strength of the chamber apparatus, A high-temperature vacuum chamber or work area 14 is formed inside the frame 12. In this apparatus 10, a single object to be processed 16 such as a glass substrate is preferably opened by a robot mechanism (not shown) in the form of a single wafer in front of the work area 14. Then, it is supplied to a predetermined position of the support base 20 installed in the work area 14.

  The work area 14 further includes a plurality of heater bodies 22 as heat supply sources and a heating unit that is disposed above the heater bodies 22 and an umbrella or a reflector 24 for concentrating the heat from the heater bodies 22 downward. Means are arranged. As the heater main body 22 and the reflecting plate 24, those disclosed in the above-mentioned Patent Document 2 may be appropriately used. In the figure, the depth dimension L of the work area 14 is large enough to accommodate the length dimension of the seventh generation glass substrate.

  FIG. 2 is a cross-sectional view taken along the arrow 2-2 in FIG. Here, the width direction dimension W of the work area 14 has a dimension that can freely accommodate the width dimension of the seventh generation glass substrate.

  As easily understood from FIGS. 1 and 2, the work area 14 of the high-temperature vacuum chamber apparatus 10 of the present invention has a size capable of freely accommodating and processing an object to be processed such as a seventh generation glass substrate. It has a substantially rectangular cross section. Of course, when processing an object to be processed which is larger (for example, 7th generation or 8th generation), the above dimensions W and L need to be large enough to accommodate these objects, and if When processing a smaller object (for example, 5th generation or 6th generation), it is a matter of course that more effective work can be achieved by reducing the dimensions W and L accordingly. The same applies to the following embodiments. As will be apparent to those skilled in the art, although not shown in the drawing, a vacuum device is connected to the chamber device 10, and the inside of the work area 14 can be freely evacuated to a predetermined value as necessary. It can be made.

  Thus, in the chamber apparatus 10 of the present invention, after the workpiece 16 is supplied to the inside of the work area 14, the door 18 is sealed, and the heater body 22 and a vacuum device (not shown) are activated, thereby entering the work area 14. Desired processing such as annealing and / or heating is performed on the supplied object 16 to be processed. That is, in the high-temperature vacuum chamber apparatus 10 of the present invention, only a single object to be processed 16 supplied by the single wafer method is processed in one cycle process. This makes it possible to perform a desired process that can provide substantially uniform characteristics over the entire surface of each object to be processed. In this respect, it differs from a known similar apparatus in which a plurality of laminated glass substrates are simultaneously processed in one cycle process. Furthermore, the chamber apparatus 10 of the present invention can be formed with a plurality of legs as indicated by reference numeral 26 as necessary. In the drawing, these leg portions are provided at positions corresponding to the upper and lower portions of the frame body 12, respectively.

  As described above, since the chamber apparatus 10 of the present invention accommodates only one single-wafer type workpiece at a time, if the height dimension H of the work area 14 of the chamber apparatus 10 is about 250 mm, for example. It is enough. For this reason, the working area 14 of the high-temperature vacuum chamber apparatus 10 of the present invention has a volume of about 1.56 cubic meters as a whole, assuming that the L and W dimensions are, for example, 2500 mm and 2500 mm, respectively. When this is compared with the working area of a stacked chamber apparatus that stacks and processes a plurality of known sheets, if the number of stacked layers is assumed to be 40 as used in many apparatuses, the stacking height Therefore, the volume of the entire work area is from 2500 × 2500 × 1800 (mm) to about 11.25 cubic meters. That is, the working area volume of the apparatus of the present invention is about one-tenth of the conventional stacked working area volume. This means that the amount of vacuum used is about 1/10, and the thermal efficiency is about 10 times. For this reason, in the chamber apparatus of the present invention, a predetermined degree of vacuum can be obtained in about one-tenth of the time so far, and at the same time, the time for returning from the degree of vacuum to normal pressure can be reduced to about one-tenth. Therefore, the working time of one object to be processed can be completed in a very short time, and the processing quality is extremely excellent.

  As described above, the high-temperature vacuum chamber apparatus 10 of the present invention includes the work area 14 having a depth of 2500 mm, a width of 2500 mm, and a height of 250 mm, for example. For this reason, for example, when the heater main body 22 in the work area is damaged, it is very difficult for the worker to work by entering the space whose vertical dimension is only 250 mm when repairing. Furthermore, since the depth dimension (L) is 2500 mm, even if the front and rear doors are opened and the hands are extended from both sides, the operator's hand cannot reach that part depending on the part. It is practically impossible to work.

  Therefore, in this high-temperature vacuum chamber apparatus 10, as shown in FIG. 3, a plurality of chamber elements 10A, 10B divided in a ring shape in the direction intersecting the axis in the depth direction, that is, the length direction indicated by the dimension L. It has a structure that can be separated into 10C. FIG. 4 shows a state in which the chamber elements 10A, 10B, and 10C are separated and separated from each other. In the illustrated example, each chamber element constituting the high-temperature vacuum chamber apparatus 10 has a length a, b, c, respectively, and is composed of three chamber elements 10A, 10B, 10C. However, the present invention is not limited to this, and as necessary, two or two or more may be used to ensure that the worker can reach all the parts inside each element. It can be divided into 4 or more.

  The chamber apparatus 10 is divided into a plurality of chamber elements because the height inside the chamber apparatus 10 is as low as about 250 mm, so that an operator cannot enter the interior and perform repair work, cleaning work, etc. This is to compensate for this. Therefore, the length a, b, c of each element is generally about 1000 mm or less, for example, so that a desired operation can be easily performed over the entire area by reaching out from both sides of each element. It is desirable to make it. Of course, it is not necessary for all of the elements to have a uniform length. For example, the element is difficult to access to the inside of the element because the door is obstructed (for example, the element 10A in FIG. 4), or one side is a sealing wall. In the case where there is an element that is difficult to access to one end side of the element (for example, the element 10C in FIG. 4), the length (a or c) can be easily accessed from both sides to the inside (for example, the element 10B in FIG. 4). It is also possible to make it shorter than the length (b).

  Further, a flange 28 having an enlarged diameter is preferably formed on the joint surfaces of the chamber elements 10A, 10B, and 10C. Further, these flanges 28 are provided with connecting means (not shown) such as bolts and nuts for connecting the respective elements so as not to be separated from each other. Preferably, about four connecting means are arranged with an interval of 90 degrees, for example. Further, it is desirable that a sealing means 30 such as an O-ring is disposed on at least one of these flanges 28 so as not to be detached from the joint surface when each element is pulled apart. When the high-temperature vacuum chamber apparatus 10 is formed, the elements 10A, 10B, and 10C are brought into close contact with each other as shown in FIG. 3, and the connecting means provided on the flanges are operated to integrate the elements. In this way, the chamber elements are hermetically bonded to each other via sealing means 30 to provide a suitable high temperature vacuum chamber. On the other hand, when it is desired to separate these elements 10A, 10B, and 10C for repair cleaning and other purposes as shown in FIG. 4, the connecting means provided on the flanges of the opposing elements are released, and the elements are If they are separated from each other, a desired operation can be easily performed.

  Of course, inside each chamber element 10A, 10B, 10C shown in FIG. 4, when these elements are brought into close contact with each other as shown in FIG. 3, as shown in FIG. Furthermore, it is easily understood by those skilled in the art that members for forming the reflector 24 are arranged, and further, as described above, a vacuum device is connected to the chamber device 10 although not shown. Like. The chamber elements 10A, 10B, and 10C are provided on at least the lower surface side of each element so that each element can smoothly perform a sliding motion for separation when the elements are moved toward and away from each other. Are provided with leg portions 26 having the same height. These legs 26 are provided at the center of gravity of each element so that each element can be maintained in an upright state when each element is separated. It is desirable that the stabilizing member 32 is integrally provided. Of course, when the interior of each chamber element is actually repaired and cleaned, it is possible to separately provide support assisting means for supporting one side and / or both sides of each element and the lower surface side.

  5 and 6 are views similar to FIGS. 3 and 4, respectively, showing another embodiment. The present invention is an apparatus for processing objects to be processed such as a glass substrate supplied into a chamber, that is, a work area in a single wafer type one by one, and stacking a plurality of objects to be processed at once in the same work area. It is not a device that performs a desired process. Therefore, it is possible to perform a very excellent processing work in terms of performance, but it cannot be said that work efficiency is excellent. Therefore, the laminated high temperature vacuum chamber apparatus 40 shown in this embodiment has been developed as a means for increasing the working efficiency. 3 and 4 differs from the embodiment disclosed in FIGS. 3 and 4 in that there are several high-temperature vacuum chamber devices 42, 44, and 46 having the same functions and configurations as the high-temperature vacuum chamber device 10 shown in FIGS. The stacked high temperature vacuum chamber apparatus 40 is configured by stacking in stages. 5 and 6 are stacked in three stages, it will be understood that more chambers can be stacked.

  Each of the high-temperature vacuum chamber devices 42, 44, 46 forming the laminated high-temperature vacuum chamber device 40 according to this embodiment has substantially the same object configuration effect as the high-temperature vacuum chamber device 10 shown in FIGS. Have. That is, the first high-temperature vacuum chamber apparatus 42 includes, for example, a plurality of chamber elements 42A, 42B, and 42C, and the second high-temperature vacuum chamber apparatus 44 includes the same number of chamber elements 44A, 44B, and 44C. ing. The third high-temperature vacuum chamber device 46 is also composed of the same number of elements 46A, 46B, 46C. Furthermore, the first chamber elements (42A, 44A, 46A), the second chamber elements (42B, 44B, 46B), and the third chamber elements (42C, 44C) of the chamber devices 42, 44, 46, respectively. , 46C) are connected to each other in the vertical direction via the legs 48 similar to those described in the embodiment of FIGS.

  Here, each chamber element 42A-C, 44A-C, 46A-C which comprises each high temperature vacuum chamber apparatus 42,44,46 is the chamber element described in FIG.3 and FIG.4, respectively. Since it is substantially the same as the configuration of 10A to 10C, it will not be described in detail in order to prevent duplication of description. The number of elements can be increased or decreased as necessary, as in the case of the above-described embodiment.

  However, the first chamber element group (42A, 44A, 46A), the second chamber element group (42B, 44B, 46B) and the third chamber element group (42C, 44C, 46C) of each of these chamber devices are: It can be separated in conjunction with each other. In order to facilitate this separation work, it is desirable that a sliding device 50 such as a caster device is provided on the lower surface of the stabilizing member 49 provided on the lowermost leg portion 48. This is because the chamber elements are connected in the vertical direction, so that the weight of the individual chamber elements to be moved increases, and the movement can be performed as easily as possible.

  When the stacked high-temperature vacuum chamber apparatus 40 shown in FIGS. 5 and 6 is used, a high-temperature vacuum chamber apparatus 42 in which objects to be processed such as a glass substrate are sequentially stacked by a robot mechanism (not shown) is preferably used. 44 and 46 are supplied into the work area, and then a desired heat treatment and / or vacuum treatment is sequentially performed. After the processing work is completed, the processed objects are sequentially taken out from the work area. By such a continuous procedure, work efficiency is increased.

  If any of the elements constituting the high-temperature vacuum chamber apparatus 42, 44, 46 needs to be repaired or cleaned, the connection means provided on the flange portion is released as in the above-described embodiment. Each chamber element group is separated as shown in FIG. After that, repair of a predetermined element is performed. When the repair or the like is completed, the respective element groups are brought into contact again to lock the connecting means.

  7 and 8 show still another embodiment. This embodiment provides a high-temperature vacuum processing apparatus that can further improve the working efficiency by further improving the embodiment of FIGS. 5 and 6 disclose a single stacked high-temperature vacuum chamber device 40 composed of, for example, three high-temperature vacuum chamber devices 42, 44 and 46. In this embodiment, a plurality of ( A composite laminated high-temperature vacuum chamber apparatus 60 having a plurality of laminated high-temperature vacuum chambers (two in the example shown in the figure) is configured by laminating four high-temperature vacuum chambers in the illustrated example.

  The composite laminated high-temperature vacuum chamber apparatus 60 includes a loader 64 for loading an object to be processed 62 such as a glass substrate, and a plurality of laminated high-temperature vacuum chamber apparatuses for high-temperature vacuum processing the object to be processed 62 supplied from the loader 64. 66, 68, an unloader 70 for carrying out processed objects, and an object 62 to be processed are sequentially supplied from the loader 64 to the stacked high-temperature vacuum chamber devices 66 and 68, and the processed objects are supplied to the respective chamber devices 66. And a robot mechanism 72 that is carried out from the unloader 60 to the unloader 60, and a control panel 74 that controls these devices and mechanisms. The loader 64 and the unloader 70 are sandwiched between the robot mechanism 72, 2 Two stacked high temperature vacuum chamber devices 66 and 68 are in opposition.

  In this embodiment, the stacked high temperature vacuum chamber apparatus comprises two devices 66, 68 disposed opposite each other, but it is obvious to those skilled in the art that the number is not limited to two. Let's go. Each stacked high-temperature vacuum chamber device 66, 68 has four high-temperature vacuum chamber devices 66A, 66B, 66C, 66D and 68A, 68B, 68C, 68D in the illustrated example. The chamber apparatus (although not shown in FIG. 8) is composed of a plurality of separable chamber elements divided in a ring shape as shown in FIGS. 5 and 6, respectively. Here, these chamber elements and the high-temperature vacuum chamber apparatus have substantially the same object constitution effects as those disclosed in FIGS. The robot mechanism 72 is rotatable about one axis and is movable in the vertical direction on one axis, and the object to be processed 62 to be processed is transferred to each chamber device 66A constituting each stacked chamber device 66, 68. After supplying to 66B, 66C, 66D and 68A, 68B, 68C, 68D and performing a predetermined process, the processed object is carried out from there and transferred to the unloader 70.

  In this embodiment, as shown in FIG. 8, the stacked high-temperature vacuum chamber devices 66 and 68 have a high-temperature vacuum chamber device stacked in four stages. However, the present invention is not limited to this, and three or four or more stages may be used. Further, a vacuum device 76 is connected to each chamber device through a valve means (not shown) (in FIG. 8, the vacuum device 76 is connected only to one stacked chamber device for the sake of brevity. Is shown). In the figure, reference numerals 78 and 80 denote cover members that surround the stacked high-temperature vacuum chamber devices 66 and 68. However, these cover members are not always necessary. In FIG. 8, for the sake of clarity, the high temperature vacuum chamber devices 66A, 66B, 66C, 66D and 68A, 68B, 68C, 68D (as shown in FIG. 5) are connected in the vertical direction. The legs are omitted.

  In the composite laminated high temperature vacuum chamber apparatus 60 of the present invention, if it is discovered that repair or cleaning or the like should be performed in the high temperature vacuum chamber apparatus constituting the laminated high temperature vacuum chamber apparatus 66, 68, The predetermined cover member 78 or 80 is removed, then the connection means of each element constituting each high temperature vacuum chamber apparatus is opened, and each high temperature vacuum chamber apparatus is divided into each element in the same manner as shown in FIG. Thus, work such as repairing or cleaning a desired portion can be completed quickly. After the work is completed, the operation state can be easily restored by the reverse procedure.

  The apparatus according to the present invention can rapidly perform high-temperature vacuum processing not only on objects to be processed having existing dimensions but also on objects to be processed such as glass substrates that are considerably larger than that. In addition, since the object to be processed is processed by the single wafer method, the high-temperature vacuum processing operation is extremely high quality, and there is no overlap of the object to be processed during the operation, so a uniform finishing operation is possible over the entire surface. is there. Also, the maintenance of the apparatus itself can be performed very easily and quickly. For this reason, it is a high-temperature processing apparatus indispensable for processing the seventh generation object. Although the present invention has been described as a high-temperature vacuum chamber device, it can also be used as a high-temperature pressure chamber, and at that time, a connection device that can strongly connect the chamber elements may be used. Also, if an eighth generation glass substrate larger than the seventh generation glass substrate is processed, for example, the depth dimension L and the width dimension W in FIGS. Accordingly, the number of chamber elements may be increased. Therefore, the apparatus of the present invention can appropriately cope with the processing of most objects to be processed regardless of the dimensions of the objects to be processed.

The longitudinal cross-sectional view which shows the outline of the high temperature vacuum chamber apparatus concerning a 1st Example. FIG. 2 is a cross-sectional view of the device of the present invention viewed along the arrow 2-2 in FIG. The side view of the high temperature vacuum chamber apparatus shown in FIG. The figure which shows the state which mutually pulled apart each element which comprises the high temperature vacuum chamber apparatus shown in FIG. The side view of the lamination | stacking high temperature vacuum chamber apparatus concerning a 2nd Example. The figure which shows the state which mutually separated each element mutually connected in the up-down direction of each high temperature vacuum chamber apparatus which comprises the lamination | stacking high temperature vacuum chamber apparatus shown in FIG. The whole top view of the composite lamination high temperature vacuum chamber device concerning the 3rd example. Sectional drawing of this invention seen along the arrow line 8-8 of FIG. Schematic of a known high temperature vacuum chamber apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 High temperature vacuum chamber apparatus 10A, 10B, 10C Chamber element 12 Frame 14 Work area (chamber)
16 Object to be treated 18 Door 20 Support base 22 Heater body 24 Reflector plate 26 Leg 28 Flange 30 Sealing means 32 Stabilizing member 40 Laminated high temperature vacuum chamber device 42 High temperature vacuum chamber device 42A, 42B, 42C Chamber element 44 High temperature vacuum chamber device 44A, 44B, 44C Chamber element 46 High temperature vacuum chamber device 46A, 46B, 46C Chamber element 48 Leg 49 Stabilizing member 50 Sliding device 60 Composite laminated high temperature vacuum chamber device 62 Object to be processed 64 Loader 66 Laminated high temperature vacuum chamber device 66A, 66B , 66C, 66D High temperature vacuum chamber 68 Stacked high temperature vacuum chamber device 68A, 68B, 68C, 68D High temperature vacuum chamber 70 Unloader 72 Robot mechanism 74 Control panel panel 76 Vacuum device 78 Cover member 8 Cover member

Claims (4)

  A high-temperature chamber apparatus equipped with a heating means for heat-treating an object to be processed such as a glass substrate, wherein a plurality of separable chamber elements divided in a ring shape are joined to each other. High temperature chamber device.   2. The high temperature chamber apparatus according to the above 1, wherein the apparatus includes a vacuum means.   A plurality of high-temperature vacuum chamber devices, which are equipped with a heating vacuum means inside to heat-treat an object to be processed such as a glass substrate, and are formed by joining a plurality of chamber elements separated in a ring shape in the front-rear direction. The upper and lower chamber elements corresponding to each of a plurality of chamber elements constituting each high-temperature vacuum chamber are connected to each other, and the vertical elements are integrated in the front-rear direction as necessary. A stacked high-temperature vacuum chamber device characterized by being separable. A loader 64 for loading an object to be processed 62 such as a glass substrate, a plurality of stacked high-temperature vacuum chamber apparatuses 66 and 68 for high-temperature vacuum processing the object to be processed 62 supplied from the loader 64, and a processed object An unloader 70 for unloading and a robot for sequentially supplying an object 62 to be processed from the loader 64 to the stacked high-temperature vacuum chamber devices 66 and 68 and unloading the processed object from the chamber devices 66 and 68 to the unloader 60. A composite laminated high temperature vacuum chamber device 60 comprising a mechanism 72,
Each of the stacked high-temperature vacuum chamber devices 66 and 68 includes a plurality of high-temperature vacuum chamber devices each having a plurality of chamber elements that are each provided with a heating vacuum means and divided in a ring shape in the front-rear direction. A plurality of chamber elements that are stacked in the vertical direction and that constitute the respective high-temperature vacuum chambers are connected to each other corresponding to the vertical chamber elements, and the vertical elements are integrated into the front and rear as necessary. A composite high-temperature vacuum chamber apparatus comprising a stacked high-temperature vacuum chamber apparatus that can be separated in a direction.

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