JP2005316471A5 - - Google Patents
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- JP2005316471A5 JP2005316471A5 JP2005126863A JP2005126863A JP2005316471A5 JP 2005316471 A5 JP2005316471 A5 JP 2005316471A5 JP 2005126863 A JP2005126863 A JP 2005126863A JP 2005126863 A JP2005126863 A JP 2005126863A JP 2005316471 A5 JP2005316471 A5 JP 2005316471A5
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- printing plate
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Claims (5)
(i)赤外吸収剤、
(ii)第一の疎水性結合剤中に分散されている疎水性熱可塑性重合体粒子を含んでなる第一の層、および
(iii)第二の疎水性結合剤を含んでなる、該第一の層と該親水性支持体との間の第二の層
を含んでなるコーティングを含んでなるネガ−作用性平版印刷版前駆体であって、該第一の疎水性結合剤がフェノール系樹脂でありそして該第二の疎水性結合剤が少なくとも1個のスルホンアミド基を含んでなる重合体であることを特徴とする前駆体。 On a support having a hydrophilic surface or provided with a hydrophilic layer,
(I) an infrared absorber,
(Ii) a first layer comprising hydrophobic thermoplastic polymer particles dispersed in a first hydrophobic binder, and (iii) a second hydrophobic binder, A negative working lithographic printing plate precursor comprising a coating comprising a second layer between one layer and the hydrophilic support, wherein the first hydrophobic binder is phenolic A precursor characterized in that it is a resin and the second hydrophobic binder is a polymer comprising at least one sulfonamide group.
R7、R8、R9およびR10は各々独立して水素、ハロゲン、ヒドロキシル、アルコキシおよび場合により置換されていてもよいアルキルもしくはアリール基を表し、
R11は水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、式−C(=N)−NH−R12の基または炭素数1〜20の同素もしくは複素環式基を表し、ここでチアゾリル基は除外され、
R12は水素または場合により置換されていてもよいアルキルもしくはアリール基を表す]
により表される単量体単位を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。 The second hydrophobic binder is of formula IIa or IIb:
R 7 , R 8 , R 9 and R 10 each independently represent hydrogen, halogen, hydroxyl, alkoxy and an optionally substituted alkyl or aryl group;
R 11 is hydrogen, optionally substituted alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, formula —C (═N) —NH—R 12 Or an allocyclic or heterocyclic group having 1 to 20 carbon atoms, wherein a thiazolyl group is excluded,
R 12 represents hydrogen or an optionally substituted alkyl or aryl group]
The negative-acting lithographic printing plate precursor according to claim 1, comprising a monomer unit represented by:
Arは場合により置換されていてもよい芳香族炭化水素環を表し、
n=0または1であり、
R13およびR14は各々独立して水素または炭素数12までの炭化水素基を表し、
kは0〜3の間の整数であり、
Xは単結合または2価の連結基を表し、
Yは−NRj−SO2−または−SO2−NRk−により表される2価のスルホンアミド基であり、ここでRjおよびRkは各々独立して水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、または式−C(=N)−NH−R15の基を表し、ここでR15は水素または場合により置換されていてもよいアルキルもしくはアリール基を表わし、
Zは末端基または2−、3−もしくは4−価の連結基を表わし、ここでZの残りの1〜3個の結合はYに連結されている]
により表される単量体単位を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。 The second hydrophobic binder is of formula III:
Ar represents an optionally substituted aromatic hydrocarbon ring;
n = 0 or 1;
R 13 and R 14 each independently represent hydrogen or a hydrocarbon group having up to 12 carbon atoms;
k is an integer between 0 and 3,
X represents a single bond or a divalent linking group,
Y is a divalent sulfonamide group represented by —NR j —SO 2 — or —SO 2 —NR k —, wherein R j and R k are each independently hydrogen, optionally substituted. May represent an alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, or a group of formula —C (═N) —NH—R 15 , wherein R 15 is Represents hydrogen or an optionally substituted alkyl or aryl group,
Z represents a terminal group or a 2-, 3- or 4-valent linking group, wherein the remaining 1-3 bonds of Z are linked to Y]
The negative-acting lithographic printing plate precursor according to claim 1, comprising a monomer unit represented by:
R16は水素または炭素数12までの炭化水素基を表し、
X1は単結合または2価の連結基を表し、
Y1は−NRj−SO2−または−SO2−NRk−により表される2価のスルホンアミド基であり、ここでRjおよびRkは各々独立して水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、または式−C(=N)−NH−R15の基を表し、ここでR15は水素または場合により置換されていてもよいアルキルもしくはアリール基を表わし、
Z1は末端基または2−、3−もしくは4−価の連結基であり、ここでZ1の残りの1〜3個の結合はY1に連結されている]
により表される単量体単位を含んでなる重合体を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。 The second hydrophobic binder is represented by formula IV:
R 16 represents hydrogen or a hydrocarbon group having up to 12 carbon atoms,
X 1 represents a single bond or a divalent linking group,
Y 1 is a divalent sulfonamide group represented by —NR j —SO 2 — or —SO 2 —NR k —, wherein R j and R k are each independently hydrogen, optionally substituted. Represents an alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, or a group of formula —C (═N) —NH—R 15 where R 15 Represents hydrogen or an optionally substituted alkyl or aryl group;
Z 1 is terminal group or 2-, 3- or 4-valent linking group, wherein the remaining 1 to 3 bonds of Z 1 are linked to Y 1]
A negative working lithographic printing plate precursor according to claim 1 comprising a polymer comprising monomer units represented by
(ii)コーティングを熱および/または赤外線に像通りに露出し、それにより該コーティングが水性アルカリ性溶液により浸透および/または可溶性化される能力を減少させ、
(iii)像通りに露出された前駆体を該水性アルカリ性溶液で現像し、それにより露出されなかった領域を溶解させる
段階を含んでなるネガ作用性平版印刷版の製造方法。 (I) preparing a negative working printing plate precursor according to any one of claims 1 to 8,
(Ii) exposing the coating imagewise to heat and / or infrared, thereby reducing the ability of the coating to penetrate and / or solubilize with an aqueous alkaline solution;
(Iii) A process for producing a negative working lithographic printing plate comprising the step of developing the imagewise exposed precursor with the aqueous alkaline solution, thereby dissolving the unexposed areas.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04101766 | 2004-04-27 | ||
EP04102654A EP1604818B1 (en) | 2004-06-11 | 2004-06-11 | Negative working, heat-sensitive lithographic printing plate precursor |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005316471A JP2005316471A (en) | 2005-11-10 |
JP2005316471A5 true JP2005316471A5 (en) | 2008-06-05 |
JP4674110B2 JP4674110B2 (en) | 2011-04-20 |
Family
ID=35443885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005126863A Expired - Fee Related JP4674110B2 (en) | 2004-04-27 | 2005-04-25 | Negative-acting heat-sensitive lithographic printing plate precursor |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4674110B2 (en) |
CN (1) | CN1690850B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4899986B2 (en) * | 2007-03-28 | 2012-03-21 | Jsr株式会社 | Two-layer laminated film and pattern forming method using the same |
EP2420383B1 (en) * | 2010-08-20 | 2013-10-16 | Agfa Graphics N.V. | Digital system for creating a flexographic printmaster |
JP6517016B2 (en) * | 2014-12-26 | 2019-05-22 | 大日本印刷株式会社 | Triarylmethane compounds |
WO2018003405A1 (en) * | 2016-06-29 | 2018-01-04 | 富士フイルム株式会社 | Positive photosensitive resin composition, positive lithographic printing plate, and method for manufacturing lithographic printing plates |
EP3587113B1 (en) * | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
EP3815900A1 (en) * | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4445820A1 (en) * | 1994-12-21 | 1996-06-27 | Hoechst Ag | Process for developing irradiated, radiation-sensitive recording materials |
DE69700352T2 (en) * | 1996-04-09 | 2000-04-06 | Agfa Gevaert Nv | Heat-sensitive recording element and method for the production of planographic printing plates therewith |
DE19803564A1 (en) * | 1998-01-30 | 1999-08-05 | Agfa Gevaert Ag | Polymers with units of N-substituted maleimide and their use in radiation-sensitive mixtures |
GB9811813D0 (en) * | 1998-06-03 | 1998-07-29 | Horsell Graphic Ind Ltd | Polymeric compounds |
JP2001056549A (en) * | 1999-08-18 | 2001-02-27 | Fuji Photo Film Co Ltd | Image recording material |
EP1216831B1 (en) * | 2000-12-13 | 2003-10-29 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
US6641976B2 (en) * | 2001-03-20 | 2003-11-04 | Agfa-Gevaert | Method of making a negative-working heat-sensitive lithographic printing plate precursor |
EP1243410A1 (en) * | 2001-03-20 | 2002-09-25 | Agfa-Gevaert | Method of making a heat-sensitive lithographic printing plate precursor |
JP2003063165A (en) * | 2001-08-27 | 2003-03-05 | Fuji Photo Film Co Ltd | Original plate for lithographic printing plate |
JP2004034355A (en) * | 2002-06-28 | 2004-02-05 | Fuji Photo Film Co Ltd | Original plate for lithography |
-
2005
- 2005-04-25 JP JP2005126863A patent/JP4674110B2/en not_active Expired - Fee Related
- 2005-04-27 CN CN2005100670574A patent/CN1690850B/en not_active Expired - Fee Related
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