JP2005316471A5 - - Google Patents

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JP2005316471A5
JP2005316471A5 JP2005126863A JP2005126863A JP2005316471A5 JP 2005316471 A5 JP2005316471 A5 JP 2005316471A5 JP 2005126863 A JP2005126863 A JP 2005126863A JP 2005126863 A JP2005126863 A JP 2005126863A JP 2005316471 A5 JP2005316471 A5 JP 2005316471A5
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Prior art keywords
group
optionally substituted
printing plate
aryl
hydrogen
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JP2005126863A
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Japanese (ja)
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JP4674110B2 (en
JP2005316471A (en
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Priority claimed from EP04102654A external-priority patent/EP1604818B1/en
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Claims (5)

親水性表面を有するかまたは親水性層が設けられている支持体上に、
(i)赤外吸収剤、
(ii)第一の疎水性結合剤中に分散されている疎水性熱可塑性重合体粒子を含んでなる第一の層、および
(iii)第二の疎水性結合剤を含んでなる、該第一の層と該親水性支持体との間の第二の層
を含んでなるコーティングを含んでなるネガ−作用性平版印刷版前駆体であって、該第一の疎水性結合剤がフェノール系樹脂でありそして該第二の疎水性結合剤が少なくとも1個のスルホンアミド基を含んでなる重合体であることを特徴とする前駆体。
On a support having a hydrophilic surface or provided with a hydrophilic layer,
(I) an infrared absorber,
(Ii) a first layer comprising hydrophobic thermoplastic polymer particles dispersed in a first hydrophobic binder, and (iii) a second hydrophobic binder, A negative working lithographic printing plate precursor comprising a coating comprising a second layer between one layer and the hydrophilic support, wherein the first hydrophobic binder is phenolic A precursor characterized in that it is a resin and the second hydrophobic binder is a polymer comprising at least one sulfonamide group.
第二の疎水性結合剤が下記式IIaまたはIIb:
Figure 2005316471
[式中、
、R、RおよびR10は各々独立して水素、ハロゲン、ヒドロキシル、アルコキシおよび場合により置換されていてもよいアルキルもしくはアリール基を表し、
11は水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、式−C(=N)−NH−R12の基または炭素数1〜20の同素もしくは複素環式基を表し、ここでチアゾリル基は除外され、
12は水素または場合により置換されていてもよいアルキルもしくはアリール基を表す]
により表される単量体単位を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。
The second hydrophobic binder is of formula IIa or IIb:
Figure 2005316471
[Where:
R 7 , R 8 , R 9 and R 10 each independently represent hydrogen, halogen, hydroxyl, alkoxy and an optionally substituted alkyl or aryl group;
R 11 is hydrogen, optionally substituted alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, formula —C (═N) —NH—R 12 Or an allocyclic or heterocyclic group having 1 to 20 carbon atoms, wherein a thiazolyl group is excluded,
R 12 represents hydrogen or an optionally substituted alkyl or aryl group]
The negative-acting lithographic printing plate precursor according to claim 1, comprising a monomer unit represented by:
第二の疎水性結合剤が下記式III:
Figure 2005316471
[式中、
Arは場合により置換されていてもよい芳香族炭化水素環を表し、
n=0または1であり、
13およびR14は各々独立して水素または炭素数12までの炭化水素基を表し、
kは0〜3の間の整数であり、
Xは単結合または2価の連結基を表し、
Yは−NR−SO−または−SO−NR−により表される2価のスルホンアミド基であり、ここでRおよびRは各々独立して水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、または式−C(=N)−NH−R15の基を表し、ここでR15は水素または場合により置換されていてもよいアルキルもしくはアリール基を表わし、
Zは末端基または2−、3−もしくは4−価の連結基を表わし、ここでZの残りの1〜3個の結合はYに連結されている]
により表される単量体単位を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。
The second hydrophobic binder is of formula III:
Figure 2005316471
[Where:
Ar represents an optionally substituted aromatic hydrocarbon ring;
n = 0 or 1;
R 13 and R 14 each independently represent hydrogen or a hydrocarbon group having up to 12 carbon atoms;
k is an integer between 0 and 3,
X represents a single bond or a divalent linking group,
Y is a divalent sulfonamide group represented by —NR j —SO 2 — or —SO 2 —NR k —, wherein R j and R k are each independently hydrogen, optionally substituted. May represent an alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, or a group of formula —C (═N) —NH—R 15 , wherein R 15 is Represents hydrogen or an optionally substituted alkyl or aryl group,
Z represents a terminal group or a 2-, 3- or 4-valent linking group, wherein the remaining 1-3 bonds of Z are linked to Y]
The negative-acting lithographic printing plate precursor according to claim 1, comprising a monomer unit represented by:
第二の疎水性結合剤が下記式IV:
Figure 2005316471
[式中、
16は水素または炭素数12までの炭化水素基を表し、
は単結合または2価の連結基を表し、
は−NR−SO−または−SO−NR−により表される2価のスルホンアミド基であり、ここでRおよびRは各々独立して水素、場合により置換されていてもよいアルキル、アルカノイル、アルケニル、アルキニル、シクロアルキル、複素環、アリール、ヘテロアリール、アラルキルもしくはヘテロアラルキル基、または式−C(=N)−NH−R15の基を表し、ここでR15は水素または場合により置換されていてもよいアルキルもしくはアリール基を表わし、
は末端基または2−、3−もしくは4−価の連結基であり、ここでZの残りの1〜3個の結合はYに連結されている]
により表される単量体単位を含んでなる重合体を含んでなる請求項1に記載のネガ−作用性平版印刷版前駆体。
The second hydrophobic binder is represented by formula IV:
Figure 2005316471
[Where:
R 16 represents hydrogen or a hydrocarbon group having up to 12 carbon atoms,
X 1 represents a single bond or a divalent linking group,
Y 1 is a divalent sulfonamide group represented by —NR j —SO 2 — or —SO 2 —NR k —, wherein R j and R k are each independently hydrogen, optionally substituted. Represents an alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocycle, aryl, heteroaryl, aralkyl or heteroaralkyl group, or a group of formula —C (═N) —NH—R 15 where R 15 Represents hydrogen or an optionally substituted alkyl or aryl group;
Z 1 is terminal group or 2-, 3- or 4-valent linking group, wherein the remaining 1 to 3 bonds of Z 1 are linked to Y 1]
A negative working lithographic printing plate precursor according to claim 1 comprising a polymer comprising monomer units represented by
(i)請求項1〜8のいずれかに記載のネガ作用性印刷版前駆体を準備し、
(ii)コーティングを熱および/または赤外線に像通りに露出し、それにより該コーティングが水性アルカリ性溶液により浸透および/または可溶性化される能力を減少させ、
(iii)像通りに露出された前駆体を該水性アルカリ性溶液で現像し、それにより露出されなかった領域を溶解させる
段階を含んでなるネガ作用性平版印刷版の製造方法。
(I) preparing a negative working printing plate precursor according to any one of claims 1 to 8,
(Ii) exposing the coating imagewise to heat and / or infrared, thereby reducing the ability of the coating to penetrate and / or solubilize with an aqueous alkaline solution;
(Iii) A process for producing a negative working lithographic printing plate comprising the step of developing the imagewise exposed precursor with the aqueous alkaline solution, thereby dissolving the unexposed areas.
JP2005126863A 2004-04-27 2005-04-25 Negative-acting heat-sensitive lithographic printing plate precursor Expired - Fee Related JP4674110B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04101766 2004-04-27
EP04102654A EP1604818B1 (en) 2004-06-11 2004-06-11 Negative working, heat-sensitive lithographic printing plate precursor

Publications (3)

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JP2005316471A JP2005316471A (en) 2005-11-10
JP2005316471A5 true JP2005316471A5 (en) 2008-06-05
JP4674110B2 JP4674110B2 (en) 2011-04-20

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CN (1) CN1690850B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4899986B2 (en) * 2007-03-28 2012-03-21 Jsr株式会社 Two-layer laminated film and pattern forming method using the same
EP2420383B1 (en) * 2010-08-20 2013-10-16 Agfa Graphics N.V. Digital system for creating a flexographic printmaster
JP6517016B2 (en) * 2014-12-26 2019-05-22 大日本印刷株式会社 Triarylmethane compounds
WO2018003405A1 (en) * 2016-06-29 2018-01-04 富士フイルム株式会社 Positive photosensitive resin composition, positive lithographic printing plate, and method for manufacturing lithographic printing plates
EP3587113B1 (en) * 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3815900A1 (en) * 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445820A1 (en) * 1994-12-21 1996-06-27 Hoechst Ag Process for developing irradiated, radiation-sensitive recording materials
DE69700352T2 (en) * 1996-04-09 2000-04-06 Agfa Gevaert Nv Heat-sensitive recording element and method for the production of planographic printing plates therewith
DE19803564A1 (en) * 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymers with units of N-substituted maleimide and their use in radiation-sensitive mixtures
GB9811813D0 (en) * 1998-06-03 1998-07-29 Horsell Graphic Ind Ltd Polymeric compounds
JP2001056549A (en) * 1999-08-18 2001-02-27 Fuji Photo Film Co Ltd Image recording material
EP1216831B1 (en) * 2000-12-13 2003-10-29 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6641976B2 (en) * 2001-03-20 2003-11-04 Agfa-Gevaert Method of making a negative-working heat-sensitive lithographic printing plate precursor
EP1243410A1 (en) * 2001-03-20 2002-09-25 Agfa-Gevaert Method of making a heat-sensitive lithographic printing plate precursor
JP2003063165A (en) * 2001-08-27 2003-03-05 Fuji Photo Film Co Ltd Original plate for lithographic printing plate
JP2004034355A (en) * 2002-06-28 2004-02-05 Fuji Photo Film Co Ltd Original plate for lithography

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