JP2005310236A - Wavelength selective polarization hologram element - Google Patents

Wavelength selective polarization hologram element Download PDF

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JP2005310236A
JP2005310236A JP2004123937A JP2004123937A JP2005310236A JP 2005310236 A JP2005310236 A JP 2005310236A JP 2004123937 A JP2004123937 A JP 2004123937A JP 2004123937 A JP2004123937 A JP 2004123937A JP 2005310236 A JP2005310236 A JP 2005310236A
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wavelength
optical
polarization hologram
retardation film
substrate
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Yusuke Kanda
裕介 神田
Hiroshi Shiraiwa
弘 白岩
Kenji Otani
健二 大谷
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a compact and inexpensive optical element by utilizing a wavelength plate of a phase difference film being thinner than a wavelength plate of a single crystal substrate since thinning the substrate is hard in mass production by an optical element utilizing the wavelength plate of a single crystal substrate in miniaturization of an optical pickup. <P>SOLUTION: A wavelength selective opening limit element is formed at a side plane of a single crystal substrate having high double diffraction, a polarization hologram element is formed at the opposite plane so that a pattern is overlapped. Thereby, an optical element of two substrate constitution having three functions is obtained by making one substrate have functions of wavelength selective opening limit and polarization hologram and sticking it with thin phase difference film wavelength plate. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、光記録媒体に対して光を照射して情報の記録や再生を行う光ヘッド装置に搭載されるに適した波長選択性開口素子、位相差素子、回折素子及び光ヘッド装置に関するものである。   The present invention relates to a wavelength-selective aperture element, a phase difference element, a diffraction element, and an optical head device suitable for being mounted on an optical head device that records and reproduces information by irradiating light onto an optical recording medium. It is.

CD(コンパクトディスク)とDVD(デジタルビデオディスク)などの光ディスクに記録・再生を行うため光ヘッド装置が用いられる。光ヘッド装置には、レーザー光源から光検出器に至る光路の途中に、偏光を利用した光利用効率の高い偏光ホログラムや、異なる波長の光をその波長に応じて透過もしくは回折させたりする波長選択性開口制限素子や、1/4λもしくは5/4λ波長板などの光学素子で構成されている光ピックアップがある。前記波長板としては、水晶やLiNbO3(以降LN基板と省略)などの単結晶基板の他に図4のように合成樹脂シートを延伸した位相差フィルム402を光学的な平坦性や形状維持のため2枚の透明基板401で挟んだ波長板がある。(例えば特許文献1参照)
複屈折を有する単結晶基板を用いて波長選択性開口制限機能を合わせ持つ回折素子、例えば図5のように、水晶の波長板508に波長選択性の開口膜506を形成したものと偏光性ホログラム層505を構成したLN基板508とを貼り合わせた波長選択性ホログラム素子が発表されているが(例えば非特許文献1参照)、光ピックアップの小型化や薄型化対応のため前記水晶508や前記LN基板508の厚みを薄くすれば研磨等の加工歩留まりが低下しコスト的に不利であった。
An optical head device is used to perform recording / reproduction on an optical disc such as a CD (compact disc) and a DVD (digital video disc). For optical head devices, in the middle of the optical path from the laser light source to the photodetector, a polarization hologram with high light utilization efficiency using polarized light, or wavelength selection that transmits or diffracts light of different wavelengths according to the wavelength There are optical pickups composed of optical elements such as directional aperture limiting elements and 1 / 4λ or 5 / 4λ wavelength plates. As the wave plate, in addition to a single crystal substrate such as quartz or LiNbO 3 (hereinafter abbreviated as LN substrate), a retardation film 402 obtained by stretching a synthetic resin sheet as shown in FIG. 4 is used to maintain optical flatness and shape. There is a wave plate sandwiched between two transparent substrates 401. (For example, see Patent Document 1)
A diffractive element having a wavelength-selective aperture limiting function using a single crystal substrate having birefringence, for example, a polarizing plate having a wavelength-selective aperture film 506 formed on a quartz wavelength plate 508 as shown in FIG. A wavelength-selective hologram element in which the LN substrate 508 constituting the layer 505 is bonded has been announced (see, for example, Non-Patent Document 1), but the crystal 508 and the LN are used to reduce the size and thickness of the optical pickup. If the thickness of the substrate 508 is reduced, the processing yield such as polishing is lowered, which is disadvantageous in cost.

一方、一機能一素子型の光ピックアップでは部品点数も多くなり調整も複雑になるため、光ピックアップの小型化や簡略化を行うためには、機能の複合化が必要となる。薄型化と機能の複合化のため、図6のように位相差フィルムの波長板を利用した波長選択性開口制限素子も紹介されているが(例えば特許文献2参照)、位相差フィルムは熱や溶剤により変形や溶解し易いため開口制限素子や偏光性回折素子を前記位相差フィルム上に直接構成することが難しく、開口制限素子と偏光ホログラム素子を各々異なる基板に形成して、どちらか1つの基板を位相差フィルムと貼り合わせて他方の光学素子基板を光軸が一致するよう配置した構成(例えば図7のように、偏光ホログラム層705と波長板704を貼り合わせて開口制限素子714をその手前に配置)の光ピックアップが紹介されている。(例えば特許文献3参照)
また、図8のように開口制限素子807を形成した基板と偏光ホログラム層803を形成した基板と波長板802で一体化された光学素子も紹介されている。(例えば特許文献3参照)
しかしながら、従来の光学素子構成では少なくとも2つ以上の基板と位相差フィルムが必要であり、光学素子の小型化・薄型化が難しかった。
特開2000−31078号公報(第6頁、図1) 特開2001−126294号公報(第6項、図2) 特開2002−40257号公報(第7項、図4、図7) National Technical Report Vol.43 No.3 Jun.1997 59頁
On the other hand, the single-function, single-element type optical pickup requires a large number of parts and complicated adjustments, so that it is necessary to combine functions in order to reduce the size and simplify the optical pickup. A wavelength-selective aperture limiting element using a retardation film wave plate as shown in FIG. 6 has been introduced to reduce the thickness and function (see, for example, Patent Document 2). Since it is easily deformed or dissolved by a solvent, it is difficult to directly configure the aperture limiting element and the polarizing diffraction element on the retardation film. The aperture limiting element and the polarization hologram element are formed on different substrates, A configuration in which the substrate is bonded to the retardation film and the other optical element substrate is disposed so that the optical axes thereof coincide with each other (for example, as shown in FIG. 7, the polarization hologram layer 705 and the wave plate 704 are bonded to each other to form the aperture limiting element 714 An optical pickup (located in front) is being introduced. (For example, see Patent Document 3)
Further, as shown in FIG. 8, an optical element integrated with a substrate on which an aperture limiting element 807 is formed, a substrate on which a polarization hologram layer 803 is formed, and a wave plate 802 is also introduced. (For example, see Patent Document 3)
However, the conventional optical element configuration requires at least two substrates and a retardation film, and it has been difficult to reduce the size and thickness of the optical element.
JP 2000-31078 A (6th page, FIG. 1) JP 2001-126294 A (Section 6, FIG. 2) JP 2002-40257 (Section 7, FIG. 4, FIG. 7) National Technical Report Vol. 43 No. 3 Jun. 1997, p. 59

上記のように単結晶基板の波長板を利用した光学素子では基板厚みを薄くすることが量産上難しく、また単結晶基板の波長板に比べ薄い位相差フィルムの波長板を利用した光学素子も少なくとも2枚以上の基板と構成されるため、薄型化とコストダウンに課題があった。   As described above, it is difficult to reduce the thickness of the optical element using the wave plate of the single crystal substrate in mass production, and at least an optical element using the wave plate of the retardation film that is thinner than the wave plate of the single crystal substrate is used. Since it is composed of two or more substrates, there are problems in thinning and cost reduction.

本発明の目的は、光ピックアップの小型化に適した薄型の波長選択性開口機能と偏光ホログラム素子を有する波長板を安価に供給することである。   An object of the present invention is to inexpensively supply a wavelength plate having a thin wavelength selective aperture function and a polarization hologram element suitable for downsizing an optical pickup.

本発明は、複屈折を有する単結晶基板の片面に偏光ホログラム素子を作製しその反対の面に波長選択性開口制限素子を両面のパターンが重なるように形成して、位相差フィルムの波長板と接着剤で貼り合わせることにより、薄型で2つの部材で構成された波長選択性偏光ホログラム機能を有する波長板を供給する。   In the present invention, a polarization hologram element is produced on one side of a single crystal substrate having birefringence, and a wavelength selective aperture limiting element is formed on the opposite side so that the patterns on both sides overlap, By laminating with an adhesive, a thin wave plate having a wavelength-selective polarization hologram function composed of two members is supplied.

本発明の位相差フィルムの波長板を用いた波長選択性偏光ホログラム素子は、従来の波長選択性開口制限機能と偏光ホログラム機能を有した波長板に比べ、機能の複合化と構成部材の削減により薄くかつ安く作製できる。   The wavelength-selective polarization hologram element using the retardation film wave plate of the present invention has a combined function and a reduced number of components compared to a conventional wavelength plate having a wavelength-selective aperture limiting function and a polarization hologram function. Thin and inexpensive.

波長板として単結晶基板より薄く安い位相差フィルムの波長板を用い、複屈折を有する単結晶基板の両面にそれぞれ波長選択性開口制限素子と偏光ホログラム素子を構成することで従来に比べ構成基板の削減ができ、両者を貼り合わせることで小型・薄型の波長選択性偏光ホログラム機能を有する波長板が得られる。   A wave plate made of a retardation film that is thinner and cheaper than a single crystal substrate is used as a wave plate, and a wavelength selective aperture limiting element and a polarization hologram element are respectively formed on both surfaces of a single crystal substrate having birefringence. It can be reduced, and by bonding them together, a small and thin wavelength plate having a wavelength selective polarization hologram function can be obtained.

以下、図面を参照して本発明の実施の形態を説明する。   Embodiments of the present invention will be described below with reference to the drawings.

(実施の形態1)
図1は、第1の実施形態における位相差フィルムを用いた波長選択性偏光ホログラム素子を示したもので、(a)は光学素子を図中上側から見た平面図、(b)は光学素子の一構成例を示す断面図、(c)は光学素子の他の構成例を示す断面図である。図1に示すように、片方の面に波長選択性多層膜開口制限層106を構成した複屈折を有する単結晶基板108の反対面に偏光ホログラム層107が構成して、位相差フィルム105と接着剤104で貼り合わせる。波長選択性開口制限機能を有する単結晶基板108は、中央部を構成する第1領域101と、中央部を囲む第2領域102とを有し、前記第2領域102に断面が凹凸形状の同心円を多層膜で形成することにより、特定の波長の光を透過、または回折させることができる。この波長選択性開口制限機能は、第1図(c)のように前記第2領域102に多層膜開口制限層109を成膜することでも可能になる。この波長選択性開口制限機能には、平坦型多層膜開口制限層109も回折原理を利用した凹凸型(格子型)106でも機能的には問題ないが、透過率の高い凹凸型(格子型)106が望ましい。
(Embodiment 1)
FIG. 1 shows a wavelength-selective polarization hologram element using a retardation film in the first embodiment, wherein (a) is a plan view of the optical element viewed from the upper side in the figure, and (b) is an optical element. Sectional drawing which shows one structural example, (c) is sectional drawing which shows the other structural example of an optical element. As shown in FIG. 1, a polarization hologram layer 107 is formed on the opposite surface of a single-crystal substrate 108 having birefringence, in which a wavelength-selective multilayer film opening limiting layer 106 is formed on one surface, and is adhered to the retardation film 105. Bonding with the agent 104. A single crystal substrate 108 having a wavelength-selective aperture limiting function has a first region 101 that forms a central portion and a second region 102 that surrounds the central portion, and the second region 102 has a concentric circular cross section. Can be made to transmit or diffract light of a specific wavelength. This wavelength-selective aperture limiting function can also be achieved by forming a multilayer aperture limiting layer 109 in the second region 102 as shown in FIG. For this wavelength-selective aperture limiting function, there is no functional problem with either the flat multilayer aperture limiting layer 109 or the concave / convex type (grating type) 106 using the diffraction principle, but the concave / convex type (grating type) with high transmittance. 106 is desirable.

前記複屈折を有する単結晶基板108の波長選択性開口制限機能を構成した面と反対面にフォトリソグラフィ技術を利用しプロトン交換と位相補償溝エッチングにより格子状に偏光ホログラム層107をパターンで形成する。この時、前記波長選択性開口制限機能を有する素子と前記偏光ホログラム素子とのパターンが同じ位置に重なるよう形成する。前記位相差フィルムの波長板105と複屈折を有する単結晶基板108の波長選択性開口制限素子側とを接着剤で貼り合わせる。接着剤104と位相差フィルム105との接着界面での反射損失を防ぐため、前記接着剤104は前記位相差フィルム105の屈折率とほぼ同じ屈折率のものを使用することが望ましい。また、空気層と接する前記位相差フィルム105の表面には、反射損失を防ぐため反射防止膜103を施すことが望ましい。また、接着界面での反射損失を防ぐため、波長選択性開口制限素子の多層膜106もしくは108の最終層と前記接着剤の屈折率が同じなるよう膜設計をすることが望ましい。   A polarization hologram layer 107 is formed in a pattern in a lattice shape by proton exchange and phase compensation groove etching on the surface opposite to the surface of the single crystal substrate 108 having the birefringence that constitutes the wavelength selective aperture limiting function. . At this time, the pattern having the wavelength-selective aperture limiting function and the polarization hologram element are formed so as to overlap at the same position. The wavelength plate 105 of the retardation film and the wavelength selective aperture limiting element side of the single crystal substrate 108 having birefringence are bonded together with an adhesive. In order to prevent reflection loss at the adhesive interface between the adhesive 104 and the retardation film 105, it is desirable to use the adhesive 104 having a refractive index substantially the same as the refractive index of the retardation film 105. Further, it is desirable to provide an antireflection film 103 on the surface of the retardation film 105 in contact with the air layer in order to prevent reflection loss. In order to prevent reflection loss at the adhesive interface, it is desirable to design the film so that the refractive index of the adhesive is the same as the final layer of the multilayer film 106 or 108 of the wavelength selective aperture limiting element.

先述前記第2領域102にのみ多層膜106があると第1領域101との間に段差が生じ、第1領域101と第2領域102の境界付近の位相差フィルム105が平坦でなく歪んだ状態で貼り合わされてしまい透過波面収差が悪化するため、第1領域101にも所定の透過率が得られるような多層膜を形成して接着面側の凹凸をできるだけ緩和することが望ましい。波長板としては、ポリオレフィン、ポリカーボネイト、ポリイミド、ポリアリレートなどの高分子樹脂を延伸により複屈折を持たせて位相差を有する位相差フィルムを用いることができる。   When the multilayer film 106 exists only in the second region 102 described above, a step is generated between the first region 101 and the retardation film 105 near the boundary between the first region 101 and the second region 102 is not flat and distorted. As a result, the transmitted wavefront aberration is deteriorated, so that it is desirable to form a multilayer film in the first region 101 so as to obtain a predetermined transmittance so as to reduce the unevenness on the bonding surface side as much as possible. As the wave plate, a retardation film having a phase difference by stretching birefringence of a polymer resin such as polyolefin, polycarbonate, polyimide, polyarylate or the like can be used.

接着剤の材料としては、アクリル系、エポキシ系、ウレタン系、ポリエステル系、ポリイミド系などのものが使用できるが、硬化時に位相差フィルムの膨張・収縮による内部応力を緩和・抑制するため熱硬化型よりもUV硬化型の方が望ましい。   Acrylic, epoxy, urethane, polyester, and polyimide materials can be used as the adhesive material, but it is thermosetting to relieve and suppress internal stress due to expansion and contraction of the retardation film during curing. The UV curable type is more preferable than that.

上記のような光学素子を形成することにより、波長選択性開口制限機能と偏光ホログラム機能と位相差発生の3つの機能を併せ持つ薄型の光学素子を構成できる。本実施形態では、複屈折を有する単結晶基板と位相差フィルムと合計2枚の部品構成により、光学素子の部品点数を削減でき小型化が図れる。   By forming the optical element as described above, a thin optical element having the three functions of wavelength selective aperture limiting function, polarization hologram function, and phase difference generation can be configured. In the present embodiment, the number of components of the optical element can be reduced and the size can be reduced by a total of two component configurations including a single crystal substrate having birefringence and a retardation film.

(実施の形態2)
図2は、第2の実施形態2における位相差フィルムを用いた波長選択性偏光ホログラム素子を示したもので、(a)は光学素子を図中上側から見た平面図、(b)は光学素子の一構成例を示す断面図、(c)は光学素子の他の構成例を示す断面図である。図2において、図1と同じ構成要素については同じ符号を用い、説明を省略する。図2では、複屈折を有する単結晶基板の接着面を図1とは反対になる偏光ホログラム素子層107として位相差フィルム105と接着剤104で貼り合せている。このような複屈折を有する単結晶基板108と位相差フィルム105との2つの部品構成により、第1の実施形態と同様に、光学素子の部品点数を削減でき小型化が図れる。
(Embodiment 2)
FIG. 2 shows a wavelength-selective polarization hologram element using the retardation film in the second embodiment, wherein (a) is a plan view of the optical element viewed from the upper side in the figure, and (b) is optical. Sectional drawing which shows one structural example of an element, (c) is sectional drawing which shows the other structural example of an optical element. In FIG. 2, the same components as those in FIG. In FIG. 2, the adhesive surface of a single crystal substrate having birefringence is bonded with a retardation film 105 and an adhesive 104 as a polarization hologram element layer 107 opposite to that in FIG. With the two component configurations of the single crystal substrate 108 having the birefringence and the retardation film 105, the number of components of the optical element can be reduced and the size can be reduced as in the first embodiment.

図3に示すヘッド装置は、図1の実施形態1の光学素子を光学系に組み込んだものである。図3の光ヘッド装置において、DVD系ディスク用の波長650nmの半導体レーザー309とCD系光ディスク用の波長780nmの半導体レーザー308から各々波長選択性プリズム306に光が出射される。DVD用半導体レーザー309からの出射光は波長選択性プリズム306を透過して、集光レンズ305により平行光になり、偏光ホログラム層107を透過し、波長選択性多層膜開口制限層106を全面透過し、位相差フィルム105で直線偏光を円偏光に変わる。さらに、対物レンズ303で基材厚0.6mmのDVDディスク302の再生に適した光スポットを形成し、入射した円偏光の逆回転の円偏光でDVDディスク302より反射する。反射光は再度対物レンズ303を通り、位相差フィルム105で円偏光を直線偏光に変わり、波長選択性多層膜開口制限層106を全面透過し、偏光ホログラム層107で回折光となり、集光レンズ305で収束光になり、波長選択性プリズム306を透過してDVD用光検出器310に集光される。   The head device shown in FIG. 3 is obtained by incorporating the optical element of Embodiment 1 shown in FIG. 1 into an optical system. In the optical head device of FIG. 3, light is emitted to the wavelength selective prism 306 from a semiconductor laser 309 having a wavelength of 650 nm for DVD discs and a semiconductor laser 308 having a wavelength of 780 nm for CD optical discs. The light emitted from the DVD semiconductor laser 309 passes through the wavelength selective prism 306, becomes parallel light by the condenser lens 305, passes through the polarization hologram layer 107, and passes through the entire wavelength selective multilayer film aperture limiting layer 106. In the retardation film 105, the linearly polarized light is changed to circularly polarized light. Further, a light spot suitable for reproduction of the DVD disk 302 having a substrate thickness of 0.6 mm is formed by the objective lens 303 and reflected from the DVD disk 302 by the circularly polarized light that is reversely rotated by the incident circularly polarized light. The reflected light again passes through the objective lens 303, the circularly polarized light is changed to linearly polarized light by the retardation film 105, the entire surface is transmitted through the wavelength selective multilayer film aperture limiting layer 106, and is diffracted by the polarization hologram layer 107. The light becomes convergent light, passes through the wavelength selective prism 306, and is condensed on the DVD photodetector 310.

CD用半導体レーザー308からの出射光は波長選択性プリズム306で反射して、集光レンズ305により多少発散光になり、偏光ホログラム層107を透過し、波長選択性多層膜開口制限層106で開口制限を受け、位相差フィルム105を透過する。さらに、対物レンズ303で基材厚1.2mmのCDディスク301の再生に適した光スポットを形成し、DVDディスク301で反射する。反射光は再度対物レンズ303を通り、位相差フィルムと波長選択性多層膜開口制限層106を透過し、偏光ホログラム層107で回折光となり、集光レンズ305で収束光になり、波長選択性プリズム306を透過してCD用光検出器308に集光される。   The light emitted from the semiconductor laser 308 for CD is reflected by the wavelength selective prism 306, becomes slightly divergent light by the condenser lens 305, passes through the polarization hologram layer 107, and is opened by the wavelength selective multilayer opening restriction layer 106. The retardation film 105 passes through the restriction. Further, a light spot suitable for reproduction of the CD disk 301 having a substrate thickness of 1.2 mm is formed by the objective lens 303 and reflected by the DVD disk 301. The reflected light again passes through the objective lens 303, passes through the retardation film and the wavelength-selective multilayer opening limiting layer 106, becomes diffracted light at the polarization hologram layer 107, becomes convergent light at the condenser lens 305, and is a wavelength-selective prism. The light passes through 306 and is collected on the CD photodetector 308.

本例は第1の実施の形態における位相差フィルム105の波長板を用いた波長選択性偏光ホログラム素子(図1)の具体例である。前記光学素子を構成する部材、材料及び作成方法を以下に説明する。高い複屈折を有する単結晶基板108として両面を光学研磨した厚さ0.3mmのLN基板を使用した。LN基板の片面に、フォトリソグラフィ技術を利用して所定の形状にパターニングした後、プロトン交換と位相補償溝エッチングにより格子状に偏光ホログラム層107を形成し、最終面に反射防止膜103を形成した。偏光ホログラム層107のパターンは、光ヘッド装置の光学系と光検出器308と310の位置関係(配置)により決めた。前記LN基板上の偏光ホログラム層107のパターンに重なるように、フォトリソグラフィ技術を利用して波長選択性多層膜開口制限素子のパターニングを行い、第2領域102に断面が凹凸形状の同心円を多層膜106で形成する。前記多層膜の厚みは、波長650nmの光が透過し、波長の780nmの光が回折するように、また、前記多層膜106の最終層と接着剤104の屈折率が同じなるように設計した。位相差フィルムには、樹脂シートを延伸したポリオレフィンのフィルムの片面に反射防止膜103を施した厚み0.12mmの位相差フィルムを105使用した。前記フィルムは、半導体レーザー光など、透過する光に対するλ/4、5/4λ、λ/2のいずれかの波長の位相差を発生するように形成されている。前記位相差フィルム105と前記LN基板を反射防止膜のない面同士(LN基板は波長選択性開口制限素子側)が接着面になるように接着剤104で貼り合わせた。接着剤にはアクリル系のUV硬化タイプを使用し、接着剤104による位相差フィルム表面の浸食を抑制するため、接着剤を塗布して両基板の光軸合わせ調整後直ぐにUV照射した。最後に、前記接着後の基板をダイサーにより所定の寸法になるよう四角に切断した。   This example is a specific example of the wavelength selective polarization hologram element (FIG. 1) using the wave plate of the retardation film 105 in the first embodiment. The members, materials, and production methods constituting the optical element will be described below. As the single crystal substrate 108 having a high birefringence, an LN substrate having a thickness of 0.3 mm whose both surfaces were optically polished was used. After patterning into a predetermined shape using photolithography technology on one side of the LN substrate, a polarization hologram layer 107 was formed in a lattice shape by proton exchange and phase compensation groove etching, and an antireflection film 103 was formed on the final surface . The pattern of the polarization hologram layer 107 was determined by the positional relationship (arrangement) between the optical system of the optical head device and the photodetectors 308 and 310. The wavelength selective multilayer film aperture limiting element is patterned using a photolithography technique so as to overlap the pattern of the polarization hologram layer 107 on the LN substrate, and concentric circles having a concavo-convex cross section are formed in the second region 102 as a multilayer film. 106. The thickness of the multilayer film was designed so that light with a wavelength of 650 nm was transmitted and light with a wavelength of 780 nm was diffracted, and the final layer of the multilayer film 106 and the refractive index of the adhesive 104 were the same. As the retardation film, a retardation film having a thickness of 0.12 mm in which an antireflection film 103 was applied on one side of a polyolefin film obtained by stretching a resin sheet was used. The film is formed so as to generate a phase difference of any one of λ / 4, 5 / 4λ, and λ / 2 with respect to transmitted light such as semiconductor laser light. The retardation film 105 and the LN substrate were bonded together with an adhesive 104 so that the surfaces without the antireflection film (the LN substrate was the wavelength-selective aperture limiting element side) became an adhesive surface. An acrylic UV curing type was used as the adhesive, and in order to suppress erosion of the retardation film surface by the adhesive 104, the adhesive was applied and UV irradiation was performed immediately after adjusting the optical axes of both substrates. Finally, the bonded substrate was cut into squares with a dicer so as to have a predetermined size.

本発明にかかる位相差フィルムの波長板を用いた波長選択性偏光分離素子は、光記録媒体に対して光を照射して情報の記録や再生を行う光ヘッド装置などに用いられる光学素子として有用である。   The wavelength-selective polarization separation element using the retardation film wave plate according to the present invention is useful as an optical element used in an optical head device for recording and reproducing information by irradiating light onto an optical recording medium. It is.

本発明の実施の形態1における位相差フィルムを用いた波長選択性偏光ホログラム素子を示したもので、(a)は光学素子を図中上側から見た平面図、(b)は光学素子の一構成例を示す断面図、(c)は光学素子の他の構成例を示す断面図1 shows a wavelength-selective polarization hologram element using a retardation film according to Embodiment 1 of the present invention, where (a) is a plan view of the optical element viewed from the upper side in the figure, and (b) is one of the optical elements. Sectional drawing which shows structural example, (c) is sectional drawing which shows the other structural example of an optical element. 本発明の実施の形態2における位相差フィルムを用いた波長選択性偏光ホログラム素子を示したもので、(a)は光学素子を図中上側から見た平面図、(b)は光学素子の一構成例を示す断面図、(c)は光学素子の他の構成例を示す断面図1 shows a wavelength-selective polarization hologram element using a retardation film according to Embodiment 2 of the present invention, where (a) is a plan view of the optical element viewed from the upper side in the figure, and (b) is an optical element. Sectional drawing which shows structural example, (c) is sectional drawing which shows the other structural example of an optical element. 本発明の光学素子の一構成例を光ヘッド装置に組み込んだ例を示す図The figure which shows the example which incorporated the structural example of the optical element of this invention in the optical head apparatus. 位相差フィルムの一構成例を示す断面図Sectional drawing which shows one structural example of retardation film 従来の水晶波長板を用いた波長選択性偏光ホログラム素子を示したもので、(a)は光学素子を図中上側から見た平面図、(b)は光学素子の一構成例を示す断面図The wavelength selective polarization hologram element using the conventional quartz wavelength plate is shown, (a) is the top view which looked at the optical element from the upper side in the figure, (b) is sectional drawing which shows one structural example of an optical element 従来の位相差フィルムを用いた波長選択性開口制限素子を示したもので、(a)は光学素子の一構成例を示す断面図、(b)は光学素子の他の構成例を示す断面図The wavelength selective aperture limiting element using the conventional phase difference film is shown, (a) is sectional drawing which shows one structural example of an optical element, (b) is sectional drawing which shows the other structural example of an optical element. 従来の位相差フィルムを用いた光学素子を光ヘッド装置に組み込んだ一例を示す図The figure which shows an example which incorporated the optical element using the conventional phase difference film in the optical head apparatus 従来の位相差フィルムを用いた光学素子の一構成例を示す断面図Sectional drawing which shows one structural example of the optical element using the conventional phase difference film

符号の説明Explanation of symbols

101 第1領域
102 第2領域
103、503,604 反射防止膜
104、403、504、602、805 接着剤
105、402,603、704、802 位相差フィルム
106、506 格子型多層膜開口制限層
107、505、705、803 偏光ホログラム層
108 複屈折を有する単結晶基板
109 平坦型多層膜開口制限層
301 CDディスク
302 DVDディスク
303、702 対物レンズ
304 本発明の位相差フィルムを用いた波長選択性偏光ホログラム素子
305 集光レンズ
306 波長選択性プリズム
307 CD用半導体レーザー
308 CD用光検出器
309 DVD用半導体レーザー
310 DVD用光検出器
401 固定透明基板
507 LiNbO3基板
508 水晶基板
601 開口制限機能を有する透明基板
605、703、707、709、710、801、806 透明基板
701 光ディスク
708 偏光回折格子層
711、804 位相子層
712 等方性媒質
713 偏光ホログラム素子
714、807 開口制限素子
101 First region 102 Second region 103, 503, 604 Antireflection film 104, 403, 504, 602, 805 Adhesive 105, 402, 603, 704, 802 Retardation film 106, 506 Lattice type multilayer film opening restriction layer 107 , 505, 705, 803 Polarization hologram layer 108 Single crystal substrate having birefringence 109 Flat multilayer opening restriction layer 301 CD disc 302 DVD disc 303, 702 Objective lens 304 Wavelength selective polarization using the retardation film of the present invention Hologram element 305 Condensing lens 306 Wavelength selective prism 307 Semiconductor laser for CD 308 Photodetector for CD 309 Semiconductor laser for DVD 310 Photodetector for DVD 401 Fixed transparent substrate 507 LiNbO3 substrate 508 Crystal substrate 601 Has aperture limiting function Transparent substrate 605,703,707,709,710,801,806 transparent substrate 701 the optical disk 708 polarization grating layer 711,804 retarder layer 712 isotropic medium 713 polarizing hologram element 714,807 aperture limit element

Claims (3)

高い複屈折を有する単結晶基板の片面に波長選択性開口制限素子を形成し、かつその反対面に前記素子とパターンが重なるように偏光ホログラム素子を形成し、位相差フィルム波長板とを接着剤で貼り合わせた構成を特徴とする波長選択性偏光ホログラム素子。 A wavelength-selective aperture limiting element is formed on one surface of a single crystal substrate having high birefringence, and a polarization hologram element is formed on the opposite surface so that the pattern overlaps the element, and a retardation film wave plate is bonded to the retardation film A wavelength-selective polarization hologram element characterized by having a structure bonded together. 前記位相差フィルムが、ポリカーボネイト、ポリイミド、ポリアリレート、ポリエーテルスルホン、ポリオレフィン、ポリアクリレート、ポリエーテルイミドおよび高分子液晶よりなる群の少なくとも1つを含む請求項1に記載の波長選択性偏光ホログラム素子。 The wavelength-selective polarization hologram element according to claim 1, wherein the retardation film includes at least one selected from the group consisting of polycarbonate, polyimide, polyarylate, polyethersulfone, polyolefin, polyacrylate, polyetherimide, and polymer liquid crystal. . 半導体レーザーからの出射光を光記録媒体に導き、前記光記録媒体からの反射光を光検出器へ導く光ヘッド装置において、請求項1の光学素子が前記半導体レーザーから前記光記録媒体へ至る光路中、または前記光記録媒体から前記光検出器へ至る光路中に設置されている光ヘッド装置。 2. An optical head device for guiding emitted light from a semiconductor laser to an optical recording medium and guiding reflected light from the optical recording medium to a photodetector, wherein the optical element of claim 1 is an optical path from the semiconductor laser to the optical recording medium. Or an optical head device installed in an optical path from the optical recording medium to the photodetector.
JP2004123937A 2004-04-20 2004-04-20 Wavelength selective polarization hologram element Pending JP2005310236A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008021368A (en) * 2006-07-13 2008-01-31 Matsushita Electric Ind Co Ltd Manufacturing method of wavelength selective polarization hologram element
JP2014222260A (en) * 2013-05-13 2014-11-27 セイコーエプソン株式会社 Optical element, display device, and method for manufacturing optical element
CN111103758A (en) * 2019-12-28 2020-05-05 中国科学院长春光学精密机械与物理研究所 Amplitude/phase mixed type calculation holographic plate and preparation method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008021368A (en) * 2006-07-13 2008-01-31 Matsushita Electric Ind Co Ltd Manufacturing method of wavelength selective polarization hologram element
JP2014222260A (en) * 2013-05-13 2014-11-27 セイコーエプソン株式会社 Optical element, display device, and method for manufacturing optical element
CN111103758A (en) * 2019-12-28 2020-05-05 中国科学院长春光学精密机械与物理研究所 Amplitude/phase mixed type calculation holographic plate and preparation method thereof
CN111103758B (en) * 2019-12-28 2022-01-28 中国科学院长春光学精密机械与物理研究所 Amplitude/phase mixed type calculation holographic plate and preparation method thereof

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