JP2005302825A5 - - Google Patents

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Publication number
JP2005302825A5
JP2005302825A5 JP2004113142A JP2004113142A JP2005302825A5 JP 2005302825 A5 JP2005302825 A5 JP 2005302825A5 JP 2004113142 A JP2004113142 A JP 2004113142A JP 2004113142 A JP2004113142 A JP 2004113142A JP 2005302825 A5 JP2005302825 A5 JP 2005302825A5
Authority
JP
Japan
Prior art keywords
exposure
scanning
light
exposure apparatus
measuring means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004113142A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005302825A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004113142A priority Critical patent/JP2005302825A/ja
Priority claimed from JP2004113142A external-priority patent/JP2005302825A/ja
Priority to EP05252159A priority patent/EP1584983A3/en
Priority to US11/101,311 priority patent/US7130021B2/en
Publication of JP2005302825A publication Critical patent/JP2005302825A/ja
Publication of JP2005302825A5 publication Critical patent/JP2005302825A5/ja
Withdrawn legal-status Critical Current

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JP2004113142A 2004-04-07 2004-04-07 露光装置 Withdrawn JP2005302825A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004113142A JP2005302825A (ja) 2004-04-07 2004-04-07 露光装置
EP05252159A EP1584983A3 (en) 2004-04-07 2005-04-06 Exposure apparatus, and device manufacturing method
US11/101,311 US7130021B2 (en) 2004-04-07 2005-04-07 Exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004113142A JP2005302825A (ja) 2004-04-07 2004-04-07 露光装置

Publications (2)

Publication Number Publication Date
JP2005302825A JP2005302825A (ja) 2005-10-27
JP2005302825A5 true JP2005302825A5 (cg-RX-API-DMAC7.html) 2007-05-24

Family

ID=34909506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004113142A Withdrawn JP2005302825A (ja) 2004-04-07 2004-04-07 露光装置

Country Status (3)

Country Link
US (1) US7130021B2 (cg-RX-API-DMAC7.html)
EP (1) EP1584983A3 (cg-RX-API-DMAC7.html)
JP (1) JP2005302825A (cg-RX-API-DMAC7.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006039895A1 (de) 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US20090091730A1 (en) * 2007-10-03 2009-04-09 Nikon Corporation Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
SG10201602750RA (en) * 2007-10-16 2016-05-30 Nikon Corp Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) * 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2009192271A (ja) 2008-02-12 2009-08-27 Canon Inc 位置検出方法、露光装置、及びデバイス製造方法
CN105606344B (zh) * 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3610175B2 (ja) * 1996-10-29 2005-01-12 キヤノン株式会社 投影露光装置及びそれを用いた半導体デバイスの製造方法
US6333777B1 (en) * 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP3262039B2 (ja) 1997-07-18 2002-03-04 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
EP1184727A1 (en) * 2000-09-01 2002-03-06 Asm Lithography B.V. Lithographic apparatus
KR100583692B1 (ko) * 2000-09-01 2006-05-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 작동 방법, 리소그래피 장치, 디바이스제조방법, 및 이것에 의해 제조된 디바이스
DE10046218B4 (de) * 2000-09-19 2007-02-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法

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