CN103076724A - 基于双光束干涉的投影物镜波像差在线检测装置和方法 - Google Patents
基于双光束干涉的投影物镜波像差在线检测装置和方法 Download PDFInfo
- Publication number
- CN103076724A CN103076724A CN2013100410590A CN201310041059A CN103076724A CN 103076724 A CN103076724 A CN 103076724A CN 2013100410590 A CN2013100410590 A CN 2013100410590A CN 201310041059 A CN201310041059 A CN 201310041059A CN 103076724 A CN103076724 A CN 103076724A
- Authority
- CN
- China
- Prior art keywords
- projection objective
- wave aberration
- objective lens
- lens
- phase grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004075 alteration Effects 0.000 title claims abstract description 71
- 238000001514 detection method Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title abstract description 17
- 230000001427 coherent effect Effects 0.000 claims abstract description 38
- 238000012360 testing method Methods 0.000 claims abstract description 38
- 210000001747 pupil Anatomy 0.000 claims description 27
- 238000005286 illumination Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000005070 sampling Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000005259 measurement Methods 0.000 abstract description 19
- 238000004364 calculation method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 8
- 238000001459 lithography Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000004422 calculation algorithm Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310041059.0A CN103076724B (zh) | 2013-02-01 | 2013-02-01 | 基于双光束干涉的投影物镜波像差在线检测装置和方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310041059.0A CN103076724B (zh) | 2013-02-01 | 2013-02-01 | 基于双光束干涉的投影物镜波像差在线检测装置和方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103076724A true CN103076724A (zh) | 2013-05-01 |
CN103076724B CN103076724B (zh) | 2014-10-29 |
Family
ID=48153295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310041059.0A Expired - Fee Related CN103076724B (zh) | 2013-02-01 | 2013-02-01 | 基于双光束干涉的投影物镜波像差在线检测装置和方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103076724B (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105022232A (zh) * | 2014-04-15 | 2015-11-04 | 上海微电子装备有限公司 | 波像差测量装置的误差校准方法 |
WO2016107614A1 (zh) * | 2014-12-31 | 2016-07-07 | 上海微电子装备有限公司 | 用于套刻误差检测的装置和方法 |
CN106895963A (zh) * | 2017-04-09 | 2017-06-27 | 南京东利来光电实业有限责任公司 | 大数值孔径浸油镜头检测装置及方法 |
CN113049224A (zh) * | 2019-12-27 | 2021-06-29 | 上海微电子装备(集团)股份有限公司 | 测量装置及其测量方法 |
CN115574847A (zh) * | 2022-09-30 | 2023-01-06 | 常州莱特康光电科技有限公司 | 光纤光栅结构检测方法 |
CN116819884A (zh) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | 掩模倾斜角度测量装置及曝光设备 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1272621A (zh) * | 1999-04-30 | 2000-11-08 | 日本电气株式会社 | 测量象差引起的位置移动和/或畸变的方法装置 |
WO2006115292A1 (en) * | 2005-04-25 | 2006-11-02 | Canon Kabushiki Kaisha | Measuring apparatus, exposure apparatus and method, and device manufacturing method |
CN101299132A (zh) * | 2008-05-27 | 2008-11-05 | 上海微电子装备有限公司 | 一种用于光刻设备对准系统的对准标记及其使用方法 |
CN101551594A (zh) * | 2009-04-30 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | 基于二极照明的光刻机投影物镜奇像差的检测系统和方法 |
JP2010206033A (ja) * | 2009-03-04 | 2010-09-16 | Nikon Corp | 波面収差計測装置、該装置の校正方法、及び露光装置 |
CN102368139A (zh) * | 2011-11-07 | 2012-03-07 | 中国科学院长春光学精密机械与物理研究所 | 一种高精度系统波像差检测方法 |
CN102768471A (zh) * | 2011-05-05 | 2012-11-07 | 上海微电子装备有限公司 | 测量投影物镜波像差的装置及方法 |
JP2012253163A (ja) * | 2011-06-02 | 2012-12-20 | Nikon Corp | 波面収差計測装置、波面収差計測方法、露光装置、露光方法、およびデバイス製造方法 |
JP2013004547A (ja) * | 2011-06-11 | 2013-01-07 | Nikon Corp | 波面収差計測装置およびその校正方法、露光装置、露光方法、並びにデバイス製造方法 |
-
2013
- 2013-02-01 CN CN201310041059.0A patent/CN103076724B/zh not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1272621A (zh) * | 1999-04-30 | 2000-11-08 | 日本电气株式会社 | 测量象差引起的位置移动和/或畸变的方法装置 |
WO2006115292A1 (en) * | 2005-04-25 | 2006-11-02 | Canon Kabushiki Kaisha | Measuring apparatus, exposure apparatus and method, and device manufacturing method |
CN101299132A (zh) * | 2008-05-27 | 2008-11-05 | 上海微电子装备有限公司 | 一种用于光刻设备对准系统的对准标记及其使用方法 |
JP2010206033A (ja) * | 2009-03-04 | 2010-09-16 | Nikon Corp | 波面収差計測装置、該装置の校正方法、及び露光装置 |
CN101551594A (zh) * | 2009-04-30 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | 基于二极照明的光刻机投影物镜奇像差的检测系统和方法 |
CN102768471A (zh) * | 2011-05-05 | 2012-11-07 | 上海微电子装备有限公司 | 测量投影物镜波像差的装置及方法 |
JP2012253163A (ja) * | 2011-06-02 | 2012-12-20 | Nikon Corp | 波面収差計測装置、波面収差計測方法、露光装置、露光方法、およびデバイス製造方法 |
JP2013004547A (ja) * | 2011-06-11 | 2013-01-07 | Nikon Corp | 波面収差計測装置およびその校正方法、露光装置、露光方法、並びにデバイス製造方法 |
CN102368139A (zh) * | 2011-11-07 | 2012-03-07 | 中国科学院长春光学精密机械与物理研究所 | 一种高精度系统波像差检测方法 |
Non-Patent Citations (2)
Title |
---|
HANS VAN DER LAAN ET AL: "Aerial image measurement method for fast aberration set up and elimination pupil verification", 《PROC.SPIE》 * |
WEI LIU ET AL: "Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination", 《OPTICAL EXPRESS》 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105022232A (zh) * | 2014-04-15 | 2015-11-04 | 上海微电子装备有限公司 | 波像差测量装置的误差校准方法 |
WO2016107614A1 (zh) * | 2014-12-31 | 2016-07-07 | 上海微电子装备有限公司 | 用于套刻误差检测的装置和方法 |
US10268125B2 (en) | 2014-12-31 | 2019-04-23 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Device and method for detecting overlay error |
CN106895963A (zh) * | 2017-04-09 | 2017-06-27 | 南京东利来光电实业有限责任公司 | 大数值孔径浸油镜头检测装置及方法 |
CN106895963B (zh) * | 2017-04-09 | 2024-01-26 | 南京东利来光电实业有限责任公司 | 大数值孔径浸油镜头检测装置及方法 |
CN113049224A (zh) * | 2019-12-27 | 2021-06-29 | 上海微电子装备(集团)股份有限公司 | 测量装置及其测量方法 |
CN113049224B (zh) * | 2019-12-27 | 2023-02-17 | 上海微电子装备(集团)股份有限公司 | 测量装置及其测量方法 |
CN115574847A (zh) * | 2022-09-30 | 2023-01-06 | 常州莱特康光电科技有限公司 | 光纤光栅结构检测方法 |
CN116819884A (zh) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | 掩模倾斜角度测量装置及曝光设备 |
CN116819884B (zh) * | 2023-08-31 | 2023-11-14 | 光科芯图(北京)科技有限公司 | 掩模倾斜角度测量装置及曝光设备 |
Also Published As
Publication number | Publication date |
---|---|
CN103076724B (zh) | 2014-10-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6462025B2 (ja) | 回折光学素子、及びこの回折光学素子を用いた測定方法及びシステム | |
US8593642B2 (en) | Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device | |
US10697852B2 (en) | Measuring method and measuring system for interferometrically measuring the imaging quality | |
US8345262B2 (en) | Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface | |
CN103076724B (zh) | 基于双光束干涉的投影物镜波像差在线检测装置和方法 | |
JP2004061515A (ja) | 光学系による偏光状態への影響を決定する方法及び装置と、分析装置 | |
CN108431694B (zh) | 波前分析的装置与方法 | |
JP2004532990A (ja) | 非球面光学面および波面を測定するための装置および方法 | |
KR20140138174A (ko) | Euv 렌즈의 결상 품질을 측정하기 위한 측정 시스템 | |
US20120249985A1 (en) | Measurement of an imaging optical system by superposition of patterns | |
CN106197311B (zh) | 一种柱面及柱面汇聚镜的检测方法及装置 | |
CN102620842B (zh) | 一种检测小孔衍射球面波光学面形的检测装置 | |
CN101464637B (zh) | 光刻机投影物镜波像差测量装置及方法 | |
WO2016183874A1 (zh) | 数字相移点衍射干涉仪及光学系统波像差测量方法 | |
CN100535760C (zh) | 投影物镜的在线检测装置 | |
CN100492179C (zh) | 干涉仪 | |
CN203133474U (zh) | 投影物镜波像差在线检测装置 | |
CN110927116B (zh) | 一种测量标记结构的方法、装置及系统 | |
US11982521B2 (en) | Measurement of a change in a geometrical characteristic and/or position of a workpiece | |
CN205991783U (zh) | 一种柱面及柱面汇聚系统的检测装置 | |
Burge et al. | Optical alignment with computer-generated holograms | |
JP2005183415A (ja) | シアリング干渉測定方法及びシアリング干渉計 | |
CN114894099A (zh) | 一种大量程高精度阶梯光栅机械拼接位移检测系统及方法 | |
JP2000097651A (ja) | 非球面形状測定方法及び装置 | |
Jozwicki et al. | Influence of optical imaging on measurements using heterodyne interferometry |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200805 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200805 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141029 Termination date: 20220201 |