JP2005281818A - Barrel plating equipment - Google Patents

Barrel plating equipment Download PDF

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JP2005281818A
JP2005281818A JP2004100139A JP2004100139A JP2005281818A JP 2005281818 A JP2005281818 A JP 2005281818A JP 2004100139 A JP2004100139 A JP 2004100139A JP 2004100139 A JP2004100139 A JP 2004100139A JP 2005281818 A JP2005281818 A JP 2005281818A
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barrel
plating
plated
electrode
opening
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JP4410013B2 (en
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Takefumi Yoshikawa
武文 吉川
Shoji Ishihara
章次 石原
Makoto Origasa
誠 折笠
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Taiyo Kagaku Kogyo Co Ltd
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Taiyo Kagaku Kogyo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide barrel plating equipment in which the conditions of the whole of works and media for energizing in a barrel are properly held, and consequently uniform plating can be applied to the whole of the works. <P>SOLUTION: The position of each partition part 11e for either face and the other face in the adjoining two faces in a cylindrical part 11 of a barrel 10 is shifted axially, thus the phenomenon in which during the rotation of the barrel, a recess in accordance with the position of each partition part 11e is generated on the surfaces of lumps 15 (works W and media M for energizing) present near the bottom in the barrel 10 along the rotary direction of the barrel is prevented. In this way, the conditions of the whole of the lumps 15 (the works W and the media M for energizing) in the barrel 10 are properly held, and consequently uniform plating treatment can be applied to the whole of the works W. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、電子部品等に金属膜を形成するバレルメッキ装置に関するものである。   The present invention relates to a barrel plating apparatus for forming a metal film on an electronic component or the like.

バレルメッキ装置は、支持部材に回転自在に支持された筒状のバレルと、バレル内に配置されその両端を支持部材に非回転で支持された電極とを備えており、被メッキ物及び被メッキ物への通電を補助する通電媒介物が投入されたバレルをメッキ液中で回転させ、且つ、電極に通電することにより被メッキ物に対して所期のメッキ処理を行う。前記バレルには一般に断面多角形の筒部を有するものが使用され、該バレルの多角形筒部の各面にはメッシュ部材を露出させるための開口部が設けれられている。
特許第2769722号公報
The barrel plating apparatus includes a cylindrical barrel that is rotatably supported by a support member, and electrodes that are disposed in the barrel and are supported by the support member in a non-rotating manner. An intended plating process is performed on an object to be plated by rotating a barrel loaded with an energization medium for assisting energization of the object in the plating solution and energizing the electrodes. The barrel generally has a cylindrical section having a polygonal cross section, and an opening for exposing the mesh member is provided on each surface of the polygonal cylindrical section of the barrel.
Japanese Patent No. 2769722

前記バレルの多角形筒部の各面における開口部は1つでも構わないが、通常はバレル回転時にメッシュ部材が被メッキ物及び通電媒介物の重量等によって大きく変形することを防止するために、各面の開口部を仕切部によって軸方向に分割して複数の開口部を各面に設けるような構造が採用されている。   In order to prevent the mesh member from being greatly deformed by the weight of the object to be plated and the current-carrying medium during the rotation of the barrel, there may be one opening on each surface of the polygonal cylindrical portion of the barrel. A structure is employed in which the openings on each surface are divided in the axial direction by partitioning portions and a plurality of openings are provided on each surface.

しかし、各面における仕切部の軸方向位置を同じにすると、各面の複数の開口部から露出するメッシュ部材それぞれが外側に膨らむように変形すること等を理由として、バレル回転時に被メッキ物及び通電媒介物の表面に仕切部の位置に応じた凹みがバレル回転方向に沿って発生し、該凹みよってバレル内の被メッキ物及び通電媒介物の全体の状態が歪になって被メッキ物全体に対するメッキ処理が不均一になる恐れがある。   However, if the axial positions of the partitioning portions on each surface are the same, the mesh members exposed from the plurality of openings on each surface are deformed so as to bulge outward, etc. A dent corresponding to the position of the partitioning portion is generated on the surface of the energization medium along the barrel rotation direction, and the dent causes the entire state of the plating object in the barrel and the energization medium to be distorted. There is a risk that the plating process will be uneven.

本発明は前記事情に鑑みて創作されたもので、その目的とするところは、バレル内の被メッキ物及び通電媒介物の全体の状態を適正に維持して、被メッキ物全体に均一なメッキ処理を行うことができるバレルメッキ装置を提供することにある。   The present invention was created in view of the above circumstances, and the object of the present invention is to maintain the entire state of the object to be plated and the current-carrying medium in the barrel appropriately, and to uniformly plate the entire object to be plated. An object of the present invention is to provide a barrel plating apparatus capable of performing processing.

前記目的を達成するため、本発明は、断面多角形の筒部とその両端の端部とを有し、筒部の各面にメッシュ部材を露出させるための開口部を有するバレルを回転自在に備えたバレルメッキ装置において、筒部の隣り合う2つの面の一方の面にはn数(nは2以上の整数)の第一の開口部が仕切部を介して軸方向に設けられ、他方の面にはn−1数の第2の開口部が仕切部を介して軸方向に設けられると共に第2の開口部よりも軸方向長さが短い第3の開口部が第2の開口部の軸方向両側に1つ宛設けられており、一方の面の仕切部と他方の面の仕切部の位置が軸方向にずれている、ことをその特徴とする。   In order to achieve the above object, the present invention has a cylindrical section having a polygonal cross section and end portions at both ends thereof, and a barrel having openings for exposing mesh members on each surface of the cylindrical section. In the barrel plating apparatus provided, an n-number (n is an integer of 2 or more) first openings are provided on one surface of two adjacent surfaces of the cylindrical portion in the axial direction via the partition portion, and the other N-1 number of second openings are provided in the axial direction through the partitioning portion on the surface of the surface, and a third opening having a shorter axial length than the second opening is the second opening. One is provided on both sides in the axial direction, and the position of the partitioning portion on one surface and the partitioning portion on the other surface is shifted in the axial direction.

本発明によれば、断面多角形の筒部の隣り合う2つの面の一方の面に設けられた仕切部の位置と他方の面に設けられた仕切部の位置とが軸方向にずれているので、バレル回転時に被メッキ物及び通電媒介物の表面に前記仕切部の位置に応じた凹みがバレル回転方向に沿って発生することを抑制でき、これによりバレル内の被メッキ物及び通電媒介物の全体の状態が歪になることを防止して、換言すれば、バレル内の被メッキ物及び通電媒介物の全体の状態を適正に維持して被メッキ物全体に均一なメッキ処理を行うことができる。   According to the present invention, the position of the partition portion provided on one surface of two adjacent surfaces of the cylindrical portion having a polygonal section is shifted from the position of the partition portion provided on the other surface in the axial direction. Therefore, it is possible to suppress the occurrence of a dent corresponding to the position of the partition portion along the barrel rotation direction on the surface of the object to be plated and the current-carrying medium during the barrel rotation. In other words, the entire state of the plate is prevented from becoming distorted, in other words, the entire state of the object to be plated and the current-carrying medium in the barrel is properly maintained, and the entire object to be plated is uniformly plated. Can do.

図1〜図13は本発明の一実施形態を示すもので、図1はバレルメッキ装置の上面図、図2は図1のA−A線矢視図、図3は図1のB−B線断面図、図4は図3のC方向矢視図、図5は図3のD−D線断面図、図6は図5のE−E線断面図、図7は図6のF−F線断面図、図8は図6のG−G線断面図、図9は図5の櫛形電極支持部分の断面図、図10は図9のH−H線断面図、図11は櫛形電極の組み付け方法説明図、図12及び図13はバレル内での被メッキ物及び通電媒介物の流動状態を説明する図である。   1 to 13 show an embodiment of the present invention. FIG. 1 is a top view of a barrel plating apparatus, FIG. 2 is a view taken along line AA in FIG. 1, and FIG. 4 is a sectional view taken along the direction C of FIG. 3, FIG. 5 is a sectional view taken along the line DD in FIG. 3, FIG. 6 is a sectional view taken along the line EE in FIG. FIG. 8 is a sectional view taken along the line GG of FIG. 6, FIG. 9 is a sectional view of the comb-shaped electrode supporting portion of FIG. 5, FIG. 10 is a sectional view taken along the line H-H of FIG. FIG. 12 and FIG. 13 are diagrams for explaining the flow state of the object to be plated and the energization medium in the barrel.

このバレルメッキ装置は、上面を開口したメッキ槽1と、メッキ槽1にメッキ液PLを供給するための給液パイプ2と、メッキ槽1から排出されるメッキ液PLを収集し排液パイプ2に送り込むための合流ケース3と、合流ケース3に収集されたメッキ液PLを排出するための排液パイプ4と、メッキ槽1の内部に配置され、アノード材AMを収容するアノードケース5と、スクリーン7と、図示しないバレルハンガーによりメッキ槽1の内部に配置されるバレル10と、バレル10の内部に配置された櫛形電極20と、バレル10の軸方向両側に配置された支持部材30とを備えている。   This barrel plating apparatus collects the plating liquid PL discharged from the plating tank 1 and the drainage pipe 2 that collects the plating liquid PL discharged from the plating tank 1. A merging case 3 to be fed into the merging case, a drainage pipe 4 for discharging the plating solution PL collected in the merging case 3, an anode case 5 disposed inside the plating tank 1 and containing the anode material AM, A screen 7, a barrel 10 disposed inside the plating tank 1 by a barrel hanger (not shown), a comb-shaped electrode 20 disposed inside the barrel 10, and support members 30 disposed on both axial sides of the barrel 10 I have.

メッキ槽1はメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックやプラスチックコーティングが施された金属材料等からなる上面を開口した直方体形状の絶縁性容器であり、側壁の1面の上部両側にはメッキ液PLを排出するための排出口1aが設けられている。   The plating tank 1 is a rectangular parallelepiped insulating container made of a plastic material such as polyvinyl chloride resistant to the plating solution PL or a metal material coated with a plastic coating. Discharge ports 1a for discharging the plating solution PL are provided on both sides.

給液パイプ2は一端2aが閉じられた円筒形状を成し、メッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成されている。また、給液パイプ2の円筒部2bにはメッキ液PLをメッキ槽1内に供給する複数の給液口2cが設けられている。この給液パイプ2は一端2aを下に向けてメッキ槽1内の底面近傍まで挿入されており、他端は図示しないメッキ液循環装置に接続されている。   The liquid supply pipe 2 has a cylindrical shape with one end 2a closed, and is made of a plastic such as polyvinyl chloride having resistance to the plating liquid PL. The cylindrical portion 2 b of the liquid supply pipe 2 is provided with a plurality of liquid supply ports 2 c for supplying the plating liquid PL into the plating tank 1. The liquid supply pipe 2 is inserted to the vicinity of the bottom surface in the plating tank 1 with one end 2a facing down, and the other end is connected to a plating liquid circulation device (not shown).

合流ケース3は側壁の1面をメッキ槽1の側壁により形成された矩形容器状を成し、メッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成されている。この合流ケース3内にはメッキ槽1の排出口1aが連通していて、排出口1aから排出されるメッキ液PLが合流ケース3内に流入するようになっている。また、合流ケース3の底面は中央部に向かって下方に傾斜し、底面の中央部には排液パイプ4に接続される排出口3aが設けられている。   The merging case 3 forms a rectangular container having one side wall formed by the side wall of the plating tank 1 and is made of plastic such as polyvinyl chloride having resistance to the plating solution PL. A discharge port 1 a of the plating tank 1 communicates with the junction case 3, and the plating solution PL discharged from the discharge port 1 a flows into the junction case 3. Further, the bottom surface of the merging case 3 is inclined downward toward the central portion, and a discharge port 3a connected to the drainage pipe 4 is provided in the central portion of the bottom surface.

排液パイプ4はメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成され、一端を合流ケース3の排出口3aの下端に接続され、他端は図示しないメッキ液循環装置に接続されている。   The drainage pipe 4 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL, one end is connected to the lower end of the discharge port 3a of the merging case 3, and the other end is connected to a plating solution circulation device (not shown). Has been.

アノードケース5はチタン等の導電性金属材料から形成されており、アノードAMを収容するケース部5aと、メッキ槽1に両端を固定された吊り下げバー5bに吊り下げるためのフック部5cとを備えている。アノードケース5はメッキ槽1内の側壁近傍に配置されて、ケース部5aには導線6が接続されている。また、ケース部5aは上部を開口した直方体形状を成し、最も大きな2つの側面には矩形状のメッシュ窓5dが設けられている。   The anode case 5 is made of a conductive metal material such as titanium, and includes a case portion 5a that accommodates the anode AM, and a hook portion 5c that is suspended from a suspension bar 5b that is fixed to the plating tank 1 at both ends. I have. The anode case 5 is disposed in the vicinity of the side wall in the plating tank 1, and a conducting wire 6 is connected to the case portion 5a. The case portion 5a has a rectangular parallelepiped shape with an upper opening, and rectangular mesh windows 5d are provided on the two largest side surfaces.

スクリーン7はメッキ槽1の内側壁に設けられた断面コの字型の取付枠7aに着脱自在に差し込まれていて、メッキ槽1内を中央のメッキ室1bとその両側のアノード室1cとに区画している。このスクリーン7はメッキ液PLに対して耐性を有するポリエステル等のプラスチックから形成されたメッシュ部7bをメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成された外枠部7cで保持した矩形板状のフィルターである。メッキ処理の際にバレル10の回転によってメッキ室1bのメッキ液PLに対流が生じるが、スクリーン7の存在によって各アノード室1cにはその影響が及び難いため、アノード室1cの下側に溜まるスライムやスラッジと称される泥状物質が分散して排出口1aから排出され排液パイプ4を通じてメッキ液循環装置に送り込まれることを防止できる。   The screen 7 is detachably inserted into a U-shaped mounting frame 7a provided on the inner wall of the plating tank 1, and the inside of the plating tank 1 is divided into a central plating chamber 1b and anode chambers 1c on both sides thereof. It is partitioned. The screen 7 holds a mesh portion 7b formed of plastic such as polyester resistant to the plating solution PL with an outer frame portion 7c formed of plastic such as polyvinyl chloride resistant to the plating solution PL. This is a rectangular plate filter. During the plating process, convection occurs in the plating solution PL in the plating chamber 1b due to the rotation of the barrel 10. However, since the presence of the screen 7 hardly affects each anode chamber 1c, the slime that accumulates below the anode chamber 1c. It is possible to prevent muddy substances called sludge and sludge from being dispersed and discharged from the discharge port 1a and fed into the plating solution circulation device through the drainage pipe 4.

バレル10は横長矩形状の6つの面を有する断面6角形状の筒部11と、筒部11の両端を閉じる端部12とからなり、筒部11の内面には被メッキ物W及び通電媒介物Mの通過を阻止し、且つ、メッキ液PLの通過を許容するメッキ液PLに対して耐性を有するポリエステル等のプラスチックから形成されたメッシュ部材11aが貼り付けられている。また、筒部11の1つの面は被メッキ物W及び通電媒介物Mを出し入れするための蓋部13として着脱自在になっている。   The barrel 10 includes a cylindrical portion 11 having a hexagonal cross section having six horizontally long rectangular surfaces, and end portions 12 that close both ends of the cylindrical portion 11. A mesh member 11a made of a plastic such as polyester that is resistant to the plating solution PL that blocks the passage of the object M and allows the passage of the plating solution PL is attached. In addition, one surface of the cylindrical portion 11 is detachable as a lid portion 13 for taking in and out the object to be plated W and the energization medium M.

筒部11の6つの面それぞれは、横長矩形状の枠部11bと、枠部11bの内側に軸方向と直交する向きで設けられた複数の仕切部11eと、仕切部11eによって軸方向に区画された複数の開口部11c、11dとから成り、各開口部11c、11dからはメッシュ部材11aが露出している。因みに、隣接する2つの面は枠部11bの一部を共有しており、枠部11b及び仕切部11eはメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成されている。   Each of the six surfaces of the cylinder portion 11 is divided in the axial direction by a horizontally long rectangular frame portion 11b, a plurality of partition portions 11e provided inside the frame portion 11b in a direction orthogonal to the axial direction, and the partition portions 11e. The mesh member 11a is exposed from each of the openings 11c and 11d. Incidentally, two adjacent surfaces share a part of the frame part 11b, and the frame part 11b and the partition part 11e are made of a plastic such as polyvinyl chloride having resistance to the plating solution PL.

図4に示すように、筒部11の6つの面のうち周方向の1番目と3番目と5番目の3つの面にあっては2つの仕切部11eによって大きさが等しい3つの開口部11cが形成されている。また、2番目と4番目と6番目の3つの面には3つの仕切部11eによって前記開口部11cと等しい大きさの2つの開口部11cが中央に形成され、これよりも軸方向長さが短い2つの開口部11dがその軸方向両側に1つ宛形成されている。   As shown in FIG. 4, three openings 11 c having the same size by two partition portions 11 e on the first, third, and fifth surfaces in the circumferential direction among the six surfaces of the cylindrical portion 11. Is formed. In addition, two openings 11c having the same size as the opening 11c are formed in the center on the second, fourth, and sixth surfaces by three partitions 11e, and the axial length is longer than this. Two short openings 11d are formed on both sides in the axial direction.

また、1番目と3番目と5番目の各面における2つの仕切部11eの位置と、2番目と4番目と6番目の各面における3つの仕切部11eの位置は、軸方向にずれている。詳しくは、1番目と3番目と5番目の各面における2つの仕切部11eは、2番目と4番目と6番目の各面における2つの開口部11cの軸方向中央に相当する位置にあり、また、2番目と4番目と6番目の各面における3つの仕切部11dは、1番目と3番目と5番目の各面における3つの開口部11cの軸方向中央に相当する位置にある。   The positions of the two partition portions 11e on the first, third, and fifth surfaces and the positions of the three partition portions 11e on the second, fourth, and sixth surfaces are shifted in the axial direction. . Specifically, the two partition portions 11e on the first, third, and fifth surfaces are at positions corresponding to the axial center of the two openings 11c on the second, fourth, and sixth surfaces, Further, the three partition portions 11d on the second, fourth, and sixth surfaces are at positions corresponding to the axial center of the three openings 11c on the first, third, and fifth surfaces.

各端部12は中央部に断面円形の支持孔12aを有し、支持孔12aはバレル10の両端に配置されたボス31にメッキ液PLに対して耐性を有するフッ素系等のプラスチックから形成されたブッシュ32を介して回転自在に支持されている。また、各端部12はメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから形成されている。   Each end 12 has a support hole 12a having a circular cross section at the center, and the support hole 12a is formed of a fluorine-based plastic having resistance to the plating solution PL on the bosses 31 disposed at both ends of the barrel 10. The bush 32 is supported rotatably. Each end 12 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL.

因みに、ボス31はメッキ液PLに対して耐性を有するポリプロピレンやポリアセタール等のプラスチックから形成され、断面円形状の内孔31aを有する円筒形状の筒状部31bと、筒状部31bから半径方向外側に延びるフランジ部31cとを有する。このボス31は筒状部31bを支持部材30に設けた断面円形状の孔30aに挿入されフランジ部31cを支持部材30の外側面にボルト30bによって固定されている。   Incidentally, the boss 31 is formed of a plastic such as polypropylene or polyacetal having resistance to the plating solution PL, and has a cylindrical cylindrical portion 31b having a circular cross-section inner hole 31a and a radially outer side from the cylindrical portion 31b. And a flange portion 31c extending in the direction. The boss 31 is inserted into a hole 30 a having a circular cross section provided with a cylindrical portion 31 b in the support member 30, and the flange portion 31 c is fixed to the outer surface of the support member 30 with bolts 30 b.

また、バレル10の各端部12の内面には筒部11の内面から離れた位置にバレル回転方向に沿うように、詳しくは、バレル10の回転中心を基準とし等角度間隔(120度間隔)をおいて3個の部分突起14が設けられている。各部分突起14はメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから成り、端部12に接する底面が長方形であり、バレル10の回転方向に長手を有する。   Further, the inner surface of each end portion 12 of the barrel 10 is spaced apart from the inner surface of the cylindrical portion 11 along the barrel rotation direction, and more specifically, equiangular intervals (120 degree intervals) with respect to the rotation center of the barrel 10. Three partial protrusions 14 are provided. Each partial protrusion 14 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL, has a rectangular bottom surface in contact with the end 12, and has a longitudinal direction in the rotation direction of the barrel 10.

各部分突起14は、バレル10の回転中心から遠い側に配置された台形状で平らな突起面14aと、バレル10の回転中心から近い側に配置された台形状で平らな突起面14bと、突起14の長手方向の一端に配置された三角形状で平らな突起面14cと、他端に配置された三角形状で平らな突起面14dとから構成されている。さらに、各部分突起14のバレル10の回転方向と直交する方向のE−E断面は三角形であり、F−F断面は台形であり、各突起面14a、14b、14c、14dと端部12内面との成す角度θ1、θ2、θ3、θ4はいずれも90°以下となっている。また、各部分突起14のバレル回転中心から遠い突起面14aと端部12内面との成す角度θ1とバレル回転中心から近い突起面14bと端部12内面との成す角度θ2との関係はθ1<θ2となっている。   Each partial projection 14 includes a trapezoidal flat projection surface 14 a disposed on the side far from the rotation center of the barrel 10, a trapezoidal flat projection surface 14 b disposed on the side closer to the rotation center of the barrel 10, and The projection 14 is composed of a triangular flat projection surface 14c arranged at one end in the longitudinal direction and a triangular flat projection surface 14d arranged at the other end. Furthermore, the EE cross section of each partial projection 14 in the direction orthogonal to the rotation direction of the barrel 10 is a triangle, the FF cross section is a trapezoid, and each projection surface 14a, 14b, 14c, 14d and the inner surface of the end 12 The angles θ1, θ2, θ3, and θ4 formed by are all 90 ° or less. Further, the relationship between the angle θ1 formed between the projection surface 14a far from the barrel rotation center of each partial projection 14 and the inner surface of the end portion 12 and the angle θ2 formed between the projection surface 14b near the barrel rotation center and the inner surface of the end portion 12 is θ1 < θ2.

櫛形電極20はバレル10内に配置された陰極であり、被メッキ物W及び通電媒介物Mの撹拌及び電圧の印加を行う複数本の棒状の電極棒21と、各電極棒21が軸方向に間隔をおいて固定された1本の棒状の電極支持部22と、電極支持部22の電極棒21の両側に1本ずつ固定された棒状の撹拌部材23とを備えている。   The comb-shaped electrode 20 is a cathode disposed in the barrel 10, and includes a plurality of rod-shaped electrode rods 21 for stirring the object to be plated W and the current-carrying medium M and applying a voltage, and each electrode rod 21 in the axial direction. One rod-shaped electrode support part 22 fixed at intervals is provided, and a rod-shaped stirring member 23 fixed on each side of the electrode bar 21 of the electrode support part 22 is provided.

各電極棒21は内部に真鍮等の導電材料から成る電極部材21aを有し、電極部材21aは一端に被メッキ物W及び通電媒介物Mに通電するための先端が半球状を成す電極部21bが設けられ、他端には雄螺子21cが設けられている。また、各電極棒21は電極部21b及び雄螺子21cを除きメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックの絶縁材21dにより被覆され、全体が円柱状を成し全てが同じ長さを有している。また、電極部21bと絶縁材21dとの間にはメッキ液PLに対して耐性を有するシリコンゴム等から成るシール21eを介装されている。   Each electrode rod 21 has an electrode member 21a made of a conductive material such as brass, and the electrode member 21a has an electrode portion 21b having a hemispherical tip for energizing the object W to be plated and the current-carrying medium M at one end. Is provided, and a male screw 21c is provided at the other end. Each electrode rod 21 is covered with a plastic insulating material 21d such as polyvinyl chloride having resistance to the plating solution PL except for the electrode portion 21b and the male screw 21c. Have Further, a seal 21e made of silicon rubber or the like having resistance to the plating solution PL is interposed between the electrode portion 21b and the insulating material 21d.

電極支持部22は内部に真鍮等の導電材料から成る導電軸22aを有し、導電軸22aは複数の雌螺子穴22bが軸方向にほぼ等間隔で設けられ、導電軸22aの両端は導線24にそれぞれ接続されている。尚、導線24は導電軸22aとの接続部を除きメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックから成る絶縁材24aで被覆されている。また、導電軸22aは雌螺子穴22b及び導線24との接続部を除きメッキ液PLに対して耐性を有するポリ塩化ビニル等のプラスチックの絶縁材22c、22d、22eにより被覆されている。   The electrode support portion 22 includes a conductive shaft 22a made of a conductive material such as brass. The conductive shaft 22a has a plurality of female screw holes 22b provided at substantially equal intervals in the axial direction. Are connected to each. The conductive wire 24 is covered with an insulating material 24a made of a plastic such as polyvinyl chloride having resistance to the plating solution PL except for a connection portion with the conductive shaft 22a. Further, the conductive shaft 22a is covered with plastic insulating materials 22c, 22d, and 22e such as polyvinyl chloride that are resistant to the plating solution PL except for the connection portion with the female screw hole 22b and the conductive wire 24.

詳しくは、電極支持部22のバレル10内に配置される部分は絶縁材22cにより被覆され、絶縁材22cから突出した導電軸22aの両端は絶縁材22d、22eでそれぞれ被覆されている。絶縁材22cは図6に示すように上部に2つの斜面22fを有する断面形状に形成されている。絶縁材22d、22eは断面円形状に形成され、絶縁材22cと絶縁材22dとの間及び絶縁材22cと絶縁材22eとの間にはメッキ液に対して耐性を有するシリコンゴム等から成るシール22gが介装されている。   Specifically, a portion of the electrode support portion 22 disposed in the barrel 10 is covered with an insulating material 22c, and both ends of the conductive shaft 22a protruding from the insulating material 22c are covered with insulating materials 22d and 22e, respectively. As shown in FIG. 6, the insulating material 22c is formed in a cross-sectional shape having two inclined surfaces 22f at the top. The insulating materials 22d and 22e are formed in a circular cross section, and a seal made of silicon rubber or the like that is resistant to the plating solution between the insulating materials 22c and 22d and between the insulating materials 22c and 22e. 22g is interposed.

また、絶縁材22d、22eは支持部材30に固定されたボス31の筒状部31bに形成された断面円形状の内孔31aに挿入されている。また、絶縁材22cの両端には係合穴22hが設けられ、これと対向するボス31の筒状部31bの一端には係合穴31dが設けられ、両係合穴22h、31dに円柱状または角柱状を成す回転防止ピン31eが挿入されている。つまり、櫛形電極20は、電極支持部22の絶縁材22cとボス31の筒状部31bとを係合する回転防止ピン31eによって、バレル10内に回転不能に配置されている。因みに、回転防止ピン31eはメッキ液PLに対して耐性を有するチタン等の金属から成る。   The insulating materials 22d and 22e are inserted into an inner hole 31a having a circular cross section formed in the cylindrical portion 31b of the boss 31 fixed to the support member 30. In addition, engagement holes 22h are provided at both ends of the insulating material 22c, an engagement hole 31d is provided at one end of the cylindrical portion 31b of the boss 31 facing the insulation hole 22c, and both engagement holes 22h and 31d are cylindrical. Alternatively, a rotation prevention pin 31e having a prismatic shape is inserted. That is, the comb-shaped electrode 20 is non-rotatably disposed in the barrel 10 by the anti-rotation pin 31 e that engages the insulating material 22 c of the electrode support portion 22 and the cylindrical portion 31 b of the boss 31. Incidentally, the rotation prevention pin 31e is made of a metal such as titanium having resistance to the plating solution PL.

各撹拌部材23はメッキ液PLに対して耐性を有するポリ塩化ビニル等の非導電性材料から円柱状に形成されており、先端に半球部23aを有し、他端に雄螺子23bを有する。また、各撹拌部材23は電極棒21と比較し短く形成されている。   Each stirring member 23 is formed in a cylindrical shape from a non-conductive material such as polyvinyl chloride having resistance to the plating solution PL, and has a hemispherical portion 23a at the tip and a male screw 23b at the other end. Each stirring member 23 is formed shorter than the electrode rod 21.

前記の櫛形電極20をバレル10内に配置するときには、図11に示すように、先ず、支持部材30の孔30a及びバレル10の端部12の孔12a(ブッシュ32の内孔)を通じてバレル10内に電極支持部22を挿入し、次に、バレル10内で電極支持部22の雌螺子穴22bの両端に撹拌部材23を螺合し、その他の雌螺子穴22bに電極棒21を螺合する。この螺合時には電極支持部22と電極棒21との間、並びに、電極支持部22と撹拌部材23との間にメッキ液PLに対して耐性のあるシリコンゴム等から成るシール25を介装する。次に、電極支持部22の両端を被覆する絶縁材22d、22eをボス31に設けた筒状部31bの内孔31aに挿入すると共に係合穴22hに一端を差し込んだ回転防止ピン31eの他端をボス31側の係合穴31dに差し込み、次に、ボス31を支持部材30にボルト30bにより固定する。   When the comb-shaped electrode 20 is arranged in the barrel 10, first, as shown in FIG. 11, first, in the barrel 10 through the hole 30 a of the support member 30 and the hole 12 a of the end portion 12 of the barrel 10 (inner hole of the bush 32). Then, the electrode support portion 22 is inserted in the barrel 10, and the stirring member 23 is screwed into both ends of the female screw hole 22b of the electrode support portion 22 in the barrel 10, and the electrode rod 21 is screwed into the other female screw holes 22b. . At the time of this screwing, a seal 25 made of silicon rubber or the like that is resistant to the plating solution PL is interposed between the electrode support portion 22 and the electrode rod 21 and between the electrode support portion 22 and the stirring member 23. . Next, the insulating materials 22d and 22e covering both ends of the electrode support portion 22 are inserted into the inner holes 31a of the cylindrical portion 31b provided on the boss 31 and the other end of the rotation prevention pin 31e with one end inserted into the engagement hole 22h. The end is inserted into the engagement hole 31d on the boss 31 side, and then the boss 31 is fixed to the support member 30 with a bolt 30b.

以下に、前述のバレルメッキ装置によって、被メッキ物W、例えば電子部品用チップに設けられた下地金属膜上にニッケル膜や錫膜や銅膜や半田膜等の金属膜を形成する方法について説明する。   The following describes a method for forming a metal film such as a nickel film, a tin film, a copper film, or a solder film on a base metal film provided on an object to be plated W, for example, an electronic component chip, using the barrel plating apparatus described above. To do.

先ず、メッキ槽1に給液パイプ2を通じてメッキ液PLを供給し、メッキ槽1に設けた排出口1aから余剰のメッキ液PLを排出することにより、メッキ槽1内のメッキ液PLの濃度及び液位を一定に保つ。尚、排出されたメッキ液PLは合流ケース3及び排出パイプ4を通じてメッキ液循環装置に送り込まれ、メッキ液循環装置で濃度調節及び浄化をされた後、給液パイプ2を通じてメッキ槽1に供給される。   First, the plating liquid PL is supplied to the plating tank 1 through the liquid supply pipe 2, and the excess plating liquid PL is discharged from the discharge port 1 a provided in the plating tank 1, whereby the concentration of the plating liquid PL in the plating tank 1 and Keep the liquid level constant. The discharged plating solution PL is sent to the plating solution circulation device through the merging case 3 and the discharge pipe 4, and after being adjusted and purified by the plating solution circulation device, is supplied to the plating tank 1 through the solution supply pipe 2. The

アノードケース5のケース部5aにはメッキの種類に対応した所定のアノード材AMを収容し、アノードケース5のフック部5cを吊り下げバー5bに吊り下げることにより、ケース部5a内のアノード材AMをメッキ液PLに浸漬する。また、所定量の被メッキ物W及び通電媒介物Mをバレル10内に投入し、図示しないバレルハンガーで支持部材30を移動させ、メッキ槽1内のメッキ液PLに支持部材30と共にバレル10を浸漬する。   A predetermined anode material AM corresponding to the type of plating is accommodated in the case portion 5a of the anode case 5, and the hook portion 5c of the anode case 5 is suspended from the suspension bar 5b, so that the anode material AM in the case portion 5a is suspended. Is immersed in the plating solution PL. Also, a predetermined amount of the object to be plated W and energization medium M are put into the barrel 10, the support member 30 is moved by a barrel hanger (not shown), and the barrel 10 together with the support member 30 is placed in the plating solution PL in the plating tank 1. Immerse.

次に、メッキ槽1内のメッキ液PLに浸漬されたバレル10を図3に矢印で示す方向に所定速度、例えば約8回転/1分間の速度で回転させながら、アノードケース5及び櫛形電極20に導線6、24を通じて所定の電圧を印加することにより、所期のメッキ処理を行う。   Next, while rotating the barrel 10 immersed in the plating solution PL in the plating tank 1 in a direction indicated by an arrow in FIG. 3 at a predetermined speed, for example, about 8 rotations / minute, the anode case 5 and the comb electrode 20 By applying a predetermined voltage through the conductors 6 and 24, a desired plating process is performed.

このバレル回転時には図3に示すように被メッキ物W及び通電媒介部Mはバレル10の底付近で集積して塊15となってバレル回転方向と同方向に流動する。塊15の表層に被メッキ物Wが浮き出るように通電媒介物Mは比重、形状、大きさが調整されているため、被メッキ物Wは塊15の表面に浮き出て、主に通電媒介物Mで構成される中心部15a及び主に被メッキ物Wで構成される表層部15bとが形成される。   At the time of this barrel rotation, as shown in FIG. 3, the workpiece W and the current-carrying mediator M accumulate near the bottom of the barrel 10 to form a lump 15 and flow in the same direction as the barrel rotation direction. Since the specific gravity, shape, and size of the energization medium M are adjusted so that the object to be plated W floats on the surface layer of the lump 15, the object W to be plated floats on the surface of the lump 15 and mainly the energization medium M. And a surface layer portion 15b mainly composed of an object to be plated W are formed.

バレル10の筒部11の各面には仕切部11eを介して複数の開口部11c、11dが設けられているため、図12及び図13に示すように、静止状態で考えれば、前記塊15の下側に位置する面の開口部11c、11dに存するメッシュ部材11aは外側に膨らむように変形し、この変形及びメッキ液の流れ等を理由として塊15の表面に仕切部11eの位置に応じた凹みがバレル回転方向に沿って発生し得る。   Since a plurality of openings 11c and 11d are provided on each surface of the cylindrical portion 11 of the barrel 10 via a partition portion 11e, the lump 15 is considered in a stationary state as shown in FIGS. The mesh member 11a existing in the openings 11c and 11d on the lower surface is deformed so as to bulge outward, and due to this deformation and the flow of the plating solution, etc., depending on the position of the partition 11e on the surface of the lump 15 Recesses can occur along the barrel rotation direction.

しかし、バレル10の筒部11の隣り合う2つの面の一方の面と他方の面の仕切部11eの位置が軸方向にずれているため、バレル10の回転によって塊15の下側に位置する面が変わると先に述べた凹みの位置も仕切部11eの位置に応じて順次変化することから、バレル回転時には前記のような凹みが塊15の表面に生じ難い。依って、従来のように凹みを原因としてバレル10内の塊15(被メッキ物W及び通電媒介物M)の全体の状態が歪になることはなく、換言すれば、バレル10内の塊15(被メッキ物W及び通電媒介物M)の全体の状態を適正な状態に維持することができる。   However, since the positions of one of the two adjacent surfaces of the cylindrical portion 11 of the barrel 10 and the partition portion 11e on the other surface are shifted in the axial direction, the barrel 10 is positioned below the lump 15 due to the rotation of the barrel 10. If the surface changes, the position of the dent described above also changes sequentially according to the position of the partitioning portion 11e. Therefore, such a dent is unlikely to occur on the surface of the lump 15 during barrel rotation. Therefore, the entire state of the lump 15 (the workpiece W and the current-carrying medium M) in the barrel 10 is not distorted due to the dent as in the prior art. In other words, the lump 15 in the barrel 10 is not distorted. It is possible to maintain the entire state of the object to be plated W and the energization medium M in an appropriate state.

また、バレル10の筒部11の断面6角形状であることから、バレル回転時には櫛形電極20の各電極棒21の先端と筒部11の内面とのクリアランスは筒部11の向きに応じて変化するが、各電極棒21の先端がバレル10の筒部11の各面に存する仕切部11eと向き合わないように配置されているため、各電極棒21の先端と筒部11の内面とのクリアランスが狭くなったときに両者の間に存する被メッキ物Wに過大な力が加わることを回避することができる。   Further, since the cylindrical portion 11 of the barrel 10 has a hexagonal cross section, the clearance between the tip of each electrode bar 21 of the comb-shaped electrode 20 and the inner surface of the cylindrical portion 11 changes according to the direction of the cylindrical portion 11 when the barrel rotates. However, since the tip of each electrode rod 21 is arranged so as not to face the partition portion 11e existing on each surface of the tube portion 11 of the barrel 10, the clearance between the tip of each electrode rod 21 and the inner surface of the tube portion 11 is arranged. It can be avoided that an excessive force is applied to the workpiece W existing between the two when the thickness becomes narrow.

さらに、前記櫛形電極20は、電極支持部22にバレル軸方向に間隔をおいて設けられた複数の電極棒21と、複数の電極棒21のバレル軸方向両側にそれぞれ設けられた非導電性撹拌部材23とを有しているので、バレル回転時において複数の電極棒21と撹拌部材23は前記塊15に差し込まれた状態となり、バレル10の回転に伴って前記塊15には各電極棒21と撹拌部材23に対応した窪みがそれぞれ生じる。この各窪みの生成によってその周囲の被メッキ物W及び通電媒介物Mが窪みに落ち込むような作用が生じ、この作用により被メッキ物W及び通電媒介物Mの分散が抑制されると共に前記塊15の表面に被メッキ物Wがほぼ均等に浮き出た状態が保たれる。   Further, the comb-shaped electrode 20 includes a plurality of electrode bars 21 provided on the electrode support portion 22 at intervals in the barrel axis direction, and non-conductive stirring provided on both sides of the plurality of electrode bars 21 in the barrel axis direction. Since the plurality of electrode rods 21 and the stirring member 23 are inserted into the lump 15 when the barrel rotates, each electrode rod 21 is placed in the lump 15 as the barrel 10 rotates. And depressions corresponding to the stirring member 23 are generated. The formation of the recesses causes the surrounding object W and energization medium M to fall into the depressions, and this action suppresses the dispersion of the object W and the energization medium M and the lump 15. The state in which the object to be plated W is almost uniformly raised on the surface is maintained.

とりわけ、撹拌部材23は電極棒21に比して短く前記塊15に浅く差し込まれるため、撹拌部材23に依る分散抑制作用は前記塊15の主として表面の被メッキ物Wに作用し、これにより撹拌部材23にはバレル10の端部12内面に近い部分に存する被メッキ物Wのみを端部12内面から内側に寄せる働きを積極的にさせることができる。この撹拌部材23は非導電性であるため電極棒21のような役目を果たさないが、該撹拌部材23によって前記塊15の中心にある通電媒介物Mの形態が乱されることはないので、撹拌部材23の近傍に位置する被メッキ物Wに対するメッキ処理は他の被メッキ物Wに対するメッキ処理と同様に行うことができる。   In particular, since the stirring member 23 is shorter than the electrode rod 21 and is inserted shallowly into the lump 15, the dispersion suppressing action by the stirring member 23 mainly acts on the workpiece W on the surface of the lump 15, thereby stirring. The member 23 can be made to positively move only the workpiece W existing in the portion near the inner surface of the end portion 12 of the barrel 10 from the inner surface of the end portion 12 to the inside. Since the stirring member 23 is non-conductive, it does not serve as the electrode rod 21, but the stirring member 23 does not disturb the form of the energization medium M at the center of the lump 15. The plating process for the object to be plated W located in the vicinity of the stirring member 23 can be performed in the same manner as the plating process for the other objects to be plated W.

さらに、バレル10の端部12内面の筒部11の内面から離れた位置にバレル回転方向に沿うように複数の部分突起14を設けてあるので、バレル回転時には前記塊15の端部12内面付近の被メッキ物W及び通電媒介物Mに各部分突起14が順を追って接触し、これにより該被メッキ物W及び通電媒介物Mが除々に撹拌されると共に内側に寄せられるような作用を受ける。つまり、バレル10内の被メッキ物W及び通電媒介物Mの全体の状態を乱すことなくバレル10内の被メッキ物W及び通電媒介物Mの撹拌が促進される。   Further, since a plurality of partial projections 14 are provided along the barrel rotation direction at a position away from the inner surface of the cylindrical portion 11 on the inner surface of the end portion 12 of the barrel 10, the vicinity of the inner surface of the end portion 12 of the lump 15 is provided during the barrel rotation. The partial protrusions 14 sequentially contact the object to be plated W and the current-carrying medium M so that the object W and the current-matter medium M are gradually stirred and brought to the inside. . In other words, stirring of the object to be plated W and the energization medium M in the barrel 10 is promoted without disturbing the overall state of the object to be plated W and the energization medium M in the barrel 10.

具体的には、図12及び図13に示すように、被メッキ物Wとして多角柱体等の非球形状のものを用い、且つ、この被メッキ物Wの最大長さよりも小さい直径を有する球状の通電媒介物Mを用いてメッキ処理を行う場合は、部分突起14との接触によりバレル10の内側に向けて寄せられた被メッキ物W及び通電媒介物Mのうち被メッキ物Wの方がバレル10の内側に移動し留まるような作用が得られることから、端部12内面付近に被メッキ物Wが残留したり内面に貼り付くことを効果的に抑制することができる。   Specifically, as shown in FIGS. 12 and 13, a non-spherical shape such as a polygonal column is used as the object to be plated W, and a spherical shape having a diameter smaller than the maximum length of the object to be plated W. When the plating process is performed using the current-carrying medium M, the object W to be plated and the medium W to be plated brought toward the inside of the barrel 10 by the contact with the partial protrusion 14 are the objects W to be plated. Since the action of moving and staying inside the barrel 10 is obtained, it is possible to effectively suppress the object to be plated W from remaining near the inner surface of the end portion 12 or sticking to the inner surface.

さらに、各部分突起14を構成する各突起面14a、14b、14c、14dと端部12内面との成す角度θ1、θ2、θ3、θ4を90°以下としたので、被メッキ物W及び通電媒介物Mを部分突起14が通過する際の抵抗が少なく被メッキ物Wの変形や損傷を生じずらい。また、部分突起14上に被メッキ物Wが残留しずらいため、部分突起14に乗り上げて残留することによるメッキ不良を効果的に抑制することができる。   Furthermore, since the angles θ1, θ2, θ3, and θ4 formed by the projection surfaces 14a, 14b, 14c, and 14d constituting the partial projections 14 and the inner surface of the end portion 12 are set to 90 ° or less, the workpiece W and the energization medium There is little resistance when the partial protrusion 14 passes through the object M, and deformation or damage of the object to be plated W is difficult to occur. In addition, since the object to be plated W hardly remains on the partial protrusion 14, it is possible to effectively suppress plating defects caused by remaining on the partial protrusion 14.

さらに、各部分突起14の回転中心から遠い突起面14aと端部12との成す角度θ1と回転中心から近い突起面14bと端部12との成す角度θ2との関係をθ1<θ2としているため、蓋部13を空けてバレル10内部の被メッキ物W及び通電媒介物Mを取り出す際、部分突起14に残着する被メッキ物Wを容易に発見することができる。   Furthermore, the relationship between the angle θ1 formed between the projection surface 14a far from the rotation center of each partial projection 14 and the end portion 12 and the angle θ2 formed between the projection surface 14b close to the rotation center and the end portion 12 is θ1 <θ2. When the object to be plated W and the current-carrying medium M inside the barrel 10 are taken out by opening the lid 13, the object to be plated W remaining on the partial protrusion 14 can be easily found.

このように、前述のバレルメッキ装置によれば、バレル10の筒部11の隣り合う2つの面の一方の面と他方の面の仕切部11eの位置を軸方向にずらすことにより、バレル回転時にバレル10内の底付近に存する塊15(被メッキ物W及び通電媒介物M)の表面に仕切部11eの位置に応じた凹みがバレル回転方向に沿って発生することを防止し、これによりバレル10内の塊15(被メッキ物W及び通電媒介物M)の全体の状態を適正な状態に維持して被メッキ物W全体に均一なメッキ処理を行うことができる。   Thus, according to the barrel plating apparatus described above, by shifting the position of one of the two adjacent surfaces of the cylindrical portion 11 of the barrel 10 and the partition portion 11e on the other surface in the axial direction, the barrel is rotated. It is possible to prevent a depression corresponding to the position of the partition portion 11e from being generated along the barrel rotation direction on the surface of the lump 15 (the object to be plated W and the current-carrying medium M) existing near the bottom in the barrel 10. The entire state of the lump 15 (the object to be plated W and the energization medium M) in 10 can be maintained in an appropriate state, and the entire object to be plated W can be uniformly plated.

また、バレル10の筒部11の各面に設ける開口部11cの大きさを同じにし、且つ、周方向の奇数番目の面よりも開口部11cの数が少ない偶数番目の面については開口部11cの軸方向両側に開口部11cよりも軸方向長さが短い開口部11dを設けてあるので、偶数番目の面における開口部11cの大きさを奇数番目の面の開口部11cよりも大きくすることによる不利益、即ち、メッシュ部材11aの変形量が大きくなることを原因として同部分における被メッキ物W及び通電媒介物Mの状態が歪になることを防止して、前記作用効果をより的確に得ることができる。   Further, the opening 11c provided on each surface of the cylindrical portion 11 of the barrel 10 has the same size, and the opening 11c is provided for even-numbered surfaces having a smaller number of openings 11c than the odd-numbered surfaces in the circumferential direction. Since the openings 11d that are shorter in the axial direction than the openings 11c are provided on both sides in the axial direction, the size of the openings 11c in the even-numbered surfaces is made larger than the openings 11c in the odd-numbered surfaces. , That is, the deformation of the mesh member 11a is increased, so that the state of the object to be plated W and the current-carrying medium M in the same portion is prevented from becoming distorted, and the above-described effects are more accurately achieved. Obtainable.

さらに、バレル10の筒部11として6つの面を有する断面6角形状のものを用い、周方向の奇数番目の面と偶数番目の面の仕切部の位置が軸方向で異なるようにしてあるので、バレル10の回転によって塊15(被メッキ物W及び通電媒介物M)の下側に位置する面が変わるときに仕切部11eの位置も順次変化させて、前記作用効果をより的確に得ることができる。   Furthermore, as the cylindrical portion 11 of the barrel 10, a hexagonal section having six surfaces is used, and the positions of the partition portions of the odd-numbered and even-numbered surfaces in the circumferential direction are different in the axial direction. When the surface located below the lump 15 (the workpiece W and the energization medium M) is changed by the rotation of the barrel 10, the position of the partition portion 11e is also sequentially changed to obtain the above-mentioned effect more accurately. Can do.

さらに、櫛形電極20の各電極棒21の先端がバレル10の筒部11の各面に存する仕切部11eと向き合わないように配置されているため、各電極棒21の先端と筒部10の内面とのクリアランスが狭くなったときに両者の間に存する被メッキ物Wに過大な力が加わることを回避して、バレル回転時に被メッキ物Wが変形や損傷等を受けることを回避することができる。   Furthermore, since the tip of each electrode rod 21 of the comb-shaped electrode 20 is arranged so as not to face the partition portion 11e existing on each surface of the tube portion 11 of the barrel 10, the tip of each electrode rod 21 and the inner surface of the tube portion 10 are arranged. To avoid applying excessive force to the object to be plated W existing between them when the clearance between the two and the clearance becomes narrow, and to avoid the object to be plated being deformed or damaged during the rotation of the barrel. it can.

尚、前述の実施形態では、バレル10の筒部11として断面6角形状のものを用い、その奇数番目の面にあっては3つの開口部11cを形成し、且つ、偶数番目の面にあっては2つの開口部11cを形成したものを示したが、奇数番目の面にm数(mは3以上の整数)の開口部11cを形成し、且つ、偶数番目の面にm−1数の開口部11cを形成する場合でも前記同様の作用効果を得ることができる。   In the above-described embodiment, the cylindrical portion 11 of the barrel 10 has a hexagonal cross section, and three openings 11c are formed on the odd-numbered surface, and the cylindrical portion 11 has an even-numbered surface. Although two openings 11c are formed, m number of openings 11c (m is an integer of 3 or more) are formed on odd-numbered surfaces, and m-1 numbers are formed on even-numbered surfaces. Even when the opening 11c is formed, the same effect as described above can be obtained.

また、バレル10として断面6角形状の筒部11を有するものを示したが、筒部11として断面4角形状や断面5角形形状のものや断面7角形以上のものを用いた場合でも前記同様の作用効果を得ることができる。   Also, the barrel 10 having the hexagonal cross section 11 is shown, but the same as the above even when the cylinder 11 has a quadrangular cross section, a pentagonal cross section, or a heptagonal cross section. The effect of this can be obtained.

本発明の一実施形態を示すバレルメッキ装置の上面図である。It is a top view of the barrel plating apparatus which shows one Embodiment of this invention. 図1のA−A線矢視図である。It is an AA arrow line view of FIG. 図1のB−B線断面図である。It is the BB sectional view taken on the line of FIG. 図3のC方向矢視図である。It is a C direction arrow directional view of FIG. 図3のD−D線断面図である。It is the DD sectional view taken on the line of FIG. 図5のE−E線断面図である。It is the EE sectional view taken on the line of FIG. 図6のF−F線断面図である。It is the FF sectional view taken on the line of FIG. 図6のG−G線断面図である。It is the GG sectional view taken on the line of FIG. 図5の櫛形電極支持部分の断面図である。It is sectional drawing of the comb-shaped electrode support part of FIG. 図9のH−H線断面図である。It is the HH sectional view taken on the line of FIG. 櫛形電極の組み付け方法説明図である。It is explanatory drawing of the assembly method of a comb-shaped electrode. バレル内での被メッキ物及び通電媒介物の流動状態を説明する図である。It is a figure explaining the flow state of the to-be-plated thing and the electricity supply medium in a barrel. バレル内での被メッキ物及び通電媒介物の流動状態を説明する図である。It is a figure explaining the flow state of the to-be-plated thing and the electricity supply medium in a barrel.

符号の説明Explanation of symbols

10…バレル、11…筒部、11a…メッシュ部材、11b…枠部、11c…開口部、11d…開口部、11e…仕切部、12…端部、20…櫛形電極、21…電極棒、22…電極支持部、23…撹拌部材、30…支持部材、31…ボス、31a…筒状部、32…ブッシュ。   DESCRIPTION OF SYMBOLS 10 ... Barrel, 11 ... Tube part, 11a ... Mesh member, 11b ... Frame part, 11c ... Opening part, 11d ... Opening part, 11e ... Partition part, 12 ... End part, 20 ... Comb electrode, 21 ... Electrode rod, 22 ... Electrode support part, 23 ... Stirring member, 30 ... Support member, 31 ... Boss, 31a ... Cylindrical part, 32 ... Bush.

Claims (4)

断面多角形の筒部とその両端の端部とを有し、筒部の各面にメッシュ部材を露出させるための開口部を有するバレルを回転自在に備えたバレルメッキ装置において、
筒部の隣り合う2つの面の一方の面にはn数(nは2以上の整数)の第一の開口部が仕切部を介して軸方向に設けられ、他方の面にはn−1数の第2の開口部が仕切部を介して軸方向に設けられると共に第2の開口部よりも軸方向長さが短い第3の開口部が第2の開口部の軸方向両側に1つ宛設けられており、一方の面の仕切部と他方の面の仕切部の位置が軸方向にずれている、
ことを特徴とするバレルメッキ装置。
In a barrel plating apparatus having a barrel portion having a polygonal cross section and end portions at both ends thereof, and having a barrel having an opening for exposing a mesh member on each surface of the barrel portion,
An n number (n is an integer of 2 or more) of first openings is provided on one surface of two adjacent surfaces of the cylindrical portion in the axial direction via a partition portion, and n-1 is provided on the other surface. A plurality of second openings are provided in the axial direction through the partitioning part, and one third opening having a shorter axial length than the second opening is provided on both axial sides of the second opening. The position of the partitioning part on one surface and the partitioning part on the other surface is shifted in the axial direction.
A barrel plating apparatus characterized by that.
筒部は4以上の偶数の面を有する、
ことを特徴とする請求項1に記載のバレルメッキ装置。
The tube portion has an even number of 4 or more,
The barrel plating apparatus according to claim 1.
第1の開口部と第2の開口部は等しい大きさを有する、
ことを特徴とする請求項1または2に記載のバレルメッキ装置。
The first opening and the second opening have the same size;
The barrel plating apparatus according to claim 1 or 2, wherein the apparatus is a barrel plating apparatus.
バレル内には複数本の電極棒を有する櫛形電極が設けられていて、各電極棒の先端が筒部の各面に存する仕切部と向き合わないように配置されている、
ことを特徴とする請求項1〜3の何れか1項に記載のバレルメッキ装置。
A comb-shaped electrode having a plurality of electrode rods is provided in the barrel, and the tip of each electrode rod is disposed so as not to face the partition portion existing on each surface of the cylindrical portion.
The barrel plating apparatus according to claim 1, wherein the apparatus is a barrel plating apparatus.
JP2004100139A 2004-03-30 2004-03-30 Barrel plating equipment Expired - Lifetime JP4410013B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210017191A (en) * 2019-08-07 2021-02-17 삼성전기주식회사 Barrel plating apparatus and electrode structure used for the same
CN115350664A (en) * 2022-09-22 2022-11-18 南京工业大学 Drum-type DBD insulating ceramic powder cladding device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210017191A (en) * 2019-08-07 2021-02-17 삼성전기주식회사 Barrel plating apparatus and electrode structure used for the same
KR102404317B1 (en) * 2019-08-07 2022-06-07 삼성전기주식회사 Barrel plating apparatus and electrode structure used for the same
CN115350664A (en) * 2022-09-22 2022-11-18 南京工业大学 Drum-type DBD insulating ceramic powder cladding device
CN115350664B (en) * 2022-09-22 2023-06-02 南京工业大学 Drum-type DBD insulating ceramic powder cladding device

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