JP4410013B2 - Barrel plating equipment - Google Patents

Description

  The present invention relates to a barrel plating apparatus for forming a metal film on an electronic component or the like.

The barrel plating apparatus includes a cylindrical barrel that is rotatably supported by a support member, and electrodes that are disposed in the barrel and are supported by the support member in a non-rotating manner. An intended plating process is performed on an object to be plated by rotating a barrel loaded with an energization medium for assisting energization of the object in the plating solution and energizing the electrodes. The barrel generally has a cylindrical section having a polygonal cross section, and an opening for exposing the mesh member is provided on each surface of the polygonal cylindrical section of the barrel.
Japanese Patent No. 2769722

  In order to prevent the mesh member from being greatly deformed by the weight of the object to be plated and the current-carrying medium during the rotation of the barrel, there may be one opening on each surface of the polygonal cylindrical portion of the barrel. A structure is employed in which the openings on each surface are divided in the axial direction by partitioning portions and a plurality of openings are provided on each surface.

  However, if the axial positions of the partitioning portions on each surface are the same, the mesh members exposed from the plurality of openings on each surface are deformed so as to bulge outward, etc. A dent corresponding to the position of the partitioning portion is generated on the surface of the energization medium along the barrel rotation direction, and the dent causes the entire state of the plating object in the barrel and the energization medium to be distorted. There is a risk that the plating process will be uneven.

  The present invention was created in view of the above circumstances, and the object of the present invention is to maintain the entire state of the object to be plated and the current-carrying medium in the barrel appropriately, and to uniformly plate the entire object to be plated. An object of the present invention is to provide a barrel plating apparatus capable of performing processing.

In order to achieve the above object, the present invention has a cylindrical section having a polygonal cross section and end portions at both ends thereof, and a barrel having openings for exposing mesh members on each surface of the cylindrical section. In the barrel plating apparatus provided, the barrel portion of the barrel has a hexagonal cross section having six rectangular surfaces in the circumferential direction, and the first, third and fifth surfaces in the circumferential direction among the six surfaces . Is provided with an n number (n is an integer of 2 or more) of first openings in the axial direction through the partitioning portion, and n−1 number of the first, fourth and sixth surfaces in the circumferential direction . Two openings are provided in the axial direction via the partition, and third openings having a shorter axial length than the second openings are provided on both sides in the axial direction of the n-1 second openings. one has been addressed provided, the circumferential direction of the first and third and fifth in the second position and the circumferential direction of the partition portion in the plane and the fourth and sixth And the position of the partition portion is displaced in the axial direction of it and its characterized.

According to the present invention, the cylindrical portion of the barrel has a hexagonal cross section having six rectangular surfaces in the circumferential direction, and the positions of the partition portions on the first, third, and fifth surfaces in the circumferential direction. Since the positions of the partition portions on the second, fourth, and sixth surfaces in the circumferential direction are shifted in the axial direction, the surface of the object to be plated and the current-carrying medium correspond to the position of the partition portion when the barrel rotates. It is possible to suppress the generation of the dent along the barrel rotation direction, thereby preventing the entire state of the plated object and the current-carrying medium in the barrel from becoming distorted, in other words, the plated object in the barrel. The entire state of the object and the current-carrying medium can be properly maintained, and uniform plating can be performed on the entire object to be plated.

  1 to 13 show an embodiment of the present invention. FIG. 1 is a top view of a barrel plating apparatus, FIG. 2 is a view taken along line AA in FIG. 1, and FIG. 4 is a sectional view taken along the direction C of FIG. 3, FIG. 5 is a sectional view taken along the line DD in FIG. 3, FIG. 6 is a sectional view taken along the line EE in FIG. FIG. 8 is a sectional view taken along the line GG of FIG. 6, FIG. 9 is a sectional view of the comb-shaped electrode supporting portion of FIG. 5, FIG. 10 is a sectional view taken along the line H-H of FIG. FIG. 12 and FIG. 13 are diagrams for explaining the flow state of the object to be plated and the energization medium in the barrel.

  This barrel plating apparatus collects the plating liquid PL discharged from the plating tank 1 and the drainage pipe 2 that collects the plating liquid PL discharged from the plating tank 1. A merging case 3 to be fed into the merging case, a drainage pipe 4 for discharging the plating solution PL collected in the merging case 3, an anode case 5 disposed inside the plating tank 1 and containing the anode material AM, A screen 7, a barrel 10 disposed inside the plating tank 1 by a barrel hanger (not shown), a comb-shaped electrode 20 disposed inside the barrel 10, and support members 30 disposed on both axial sides of the barrel 10 I have.

  The plating tank 1 is a rectangular parallelepiped insulating container made of a plastic material such as polyvinyl chloride resistant to the plating solution PL or a metal material coated with a plastic coating. Discharge ports 1a for discharging the plating solution PL are provided on both sides.

  The liquid supply pipe 2 has a cylindrical shape with one end 2a closed, and is made of a plastic such as polyvinyl chloride having resistance to the plating liquid PL. The cylindrical portion 2 b of the liquid supply pipe 2 is provided with a plurality of liquid supply ports 2 c for supplying the plating liquid PL into the plating tank 1. The liquid supply pipe 2 is inserted to the vicinity of the bottom surface in the plating tank 1 with one end 2a facing down, and the other end is connected to a plating liquid circulation device (not shown).

  The merging case 3 forms a rectangular container having one side wall formed by the side wall of the plating tank 1 and is made of plastic such as polyvinyl chloride having resistance to the plating solution PL. A discharge port 1 a of the plating tank 1 communicates with the junction case 3, and the plating solution PL discharged from the discharge port 1 a flows into the junction case 3. Further, the bottom surface of the merging case 3 is inclined downward toward the central portion, and a discharge port 3a connected to the drainage pipe 4 is provided in the central portion of the bottom surface.

  The drainage pipe 4 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL, one end is connected to the lower end of the discharge port 3a of the merging case 3, and the other end is connected to a plating solution circulation device (not shown). Has been.

  The anode case 5 is made of a conductive metal material such as titanium, and includes a case portion 5a that accommodates the anode AM, and a hook portion 5c that is suspended from a suspension bar 5b that is fixed to the plating tank 1 at both ends. I have. The anode case 5 is disposed in the vicinity of the side wall in the plating tank 1, and a conducting wire 6 is connected to the case portion 5a. The case portion 5a has a rectangular parallelepiped shape with an upper opening, and rectangular mesh windows 5d are provided on the two largest side surfaces.

  The screen 7 is detachably inserted into a U-shaped mounting frame 7a provided on the inner wall of the plating tank 1, and the inside of the plating tank 1 is divided into a central plating chamber 1b and anode chambers 1c on both sides thereof. It is partitioned. The screen 7 holds a mesh portion 7b formed of plastic such as polyester resistant to the plating solution PL with an outer frame portion 7c formed of plastic such as polyvinyl chloride resistant to the plating solution PL. This is a rectangular plate filter. During the plating process, convection occurs in the plating solution PL in the plating chamber 1b due to the rotation of the barrel 10. However, since the presence of the screen 7 hardly affects each anode chamber 1c, the slime that accumulates below the anode chamber 1c. It is possible to prevent muddy substances called sludge and sludge from being dispersed and discharged from the discharge port 1a and fed into the plating solution circulation device through the drainage pipe 4.

  The barrel 10 includes a cylindrical portion 11 having a hexagonal cross section having six horizontally long rectangular surfaces, and end portions 12 that close both ends of the cylindrical portion 11. A mesh member 11a made of a plastic such as polyester that is resistant to the plating solution PL that blocks the passage of the object M and allows the passage of the plating solution PL is attached. In addition, one surface of the cylindrical portion 11 is detachable as a lid portion 13 for taking in and out the object to be plated W and the energization medium M.

  Each of the six surfaces of the cylinder portion 11 is divided in the axial direction by a horizontally long rectangular frame portion 11b, a plurality of partition portions 11e provided inside the frame portion 11b in a direction orthogonal to the axial direction, and the partition portions 11e. The mesh member 11a is exposed from each of the openings 11c and 11d. Incidentally, two adjacent surfaces share a part of the frame part 11b, and the frame part 11b and the partition part 11e are made of a plastic such as polyvinyl chloride having resistance to the plating solution PL.

  As shown in FIG. 4, three openings 11 c having the same size by two partition portions 11 e on the first, third, and fifth surfaces in the circumferential direction among the six surfaces of the cylindrical portion 11. Is formed. In addition, two openings 11c having the same size as the opening 11c are formed in the center on the second, fourth, and sixth surfaces by three partitions 11e, and the axial length is longer than this. Two short openings 11d are formed on both sides in the axial direction.

  The positions of the two partition portions 11e on the first, third, and fifth surfaces and the positions of the three partition portions 11e on the second, fourth, and sixth surfaces are shifted in the axial direction. . Specifically, the two partition portions 11e on the first, third, and fifth surfaces are at positions corresponding to the axial center of the two openings 11c on the second, fourth, and sixth surfaces, Further, the three partition portions 11d on the second, fourth, and sixth surfaces are at positions corresponding to the axial center of the three openings 11c on the first, third, and fifth surfaces.

  Each end 12 has a support hole 12a having a circular cross section at the center, and the support hole 12a is formed of a fluorine-based plastic having resistance to the plating solution PL on the bosses 31 disposed at both ends of the barrel 10. The bush 32 is supported rotatably. Each end 12 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL.

  Incidentally, the boss 31 is formed of a plastic such as polypropylene or polyacetal having resistance to the plating solution PL, and has a cylindrical cylindrical portion 31b having a circular cross-section inner hole 31a and a radially outer side from the cylindrical portion 31b. And a flange portion 31c extending in the direction. The boss 31 is inserted into a hole 30 a having a circular cross section provided with a cylindrical portion 31 b in the support member 30, and the flange portion 31 c is fixed to the outer surface of the support member 30 with bolts 30 b.

  Further, the inner surface of each end portion 12 of the barrel 10 is spaced apart from the inner surface of the cylindrical portion 11 along the barrel rotation direction, and more specifically, equiangular intervals (120 degree intervals) with respect to the rotation center of the barrel 10. Three partial protrusions 14 are provided. Each partial protrusion 14 is made of a plastic such as polyvinyl chloride having resistance to the plating solution PL, has a rectangular bottom surface in contact with the end 12, and has a longitudinal direction in the rotation direction of the barrel 10.

  Each partial projection 14 includes a trapezoidal flat projection surface 14 a disposed on the side far from the rotation center of the barrel 10, a trapezoidal flat projection surface 14 b disposed on the side closer to the rotation center of the barrel 10, and The projection 14 is composed of a triangular flat projection surface 14c arranged at one end in the longitudinal direction and a triangular flat projection surface 14d arranged at the other end. Furthermore, the EE cross section of each partial projection 14 in the direction orthogonal to the rotation direction of the barrel 10 is a triangle, the FF cross section is a trapezoid, and each projection surface 14a, 14b, 14c, 14d and the inner surface of the end 12 The angles θ1, θ2, θ3, and θ4 formed by are all 90 ° or less. Further, the relationship between the angle θ1 formed between the projection surface 14a far from the barrel rotation center of each partial projection 14 and the inner surface of the end portion 12 and the angle θ2 formed between the projection surface 14b near the barrel rotation center and the inner surface of the end portion 12 is θ1 < θ2.

  The comb-shaped electrode 20 is a cathode disposed in the barrel 10, and includes a plurality of rod-shaped electrode rods 21 for stirring the object to be plated W and the current-carrying medium M and applying a voltage, and each electrode rod 21 in the axial direction. One rod-shaped electrode support part 22 fixed at intervals is provided, and a rod-shaped stirring member 23 fixed on each side of the electrode bar 21 of the electrode support part 22 is provided.

  Each electrode rod 21 has an electrode member 21a made of a conductive material such as brass, and the electrode member 21a has an electrode portion 21b having a hemispherical tip for energizing the object W to be plated and the current-carrying medium M at one end. Is provided, and a male screw 21c is provided at the other end. Each electrode rod 21 is covered with a plastic insulating material 21d such as polyvinyl chloride having resistance to the plating solution PL except for the electrode portion 21b and the male screw 21c. Have Further, a seal 21e made of silicon rubber or the like having resistance to the plating solution PL is interposed between the electrode portion 21b and the insulating material 21d.

  The electrode support portion 22 includes a conductive shaft 22a made of a conductive material such as brass. The conductive shaft 22a has a plurality of female screw holes 22b provided at substantially equal intervals in the axial direction. Are connected to each. The conductive wire 24 is covered with an insulating material 24a made of a plastic such as polyvinyl chloride having resistance to the plating solution PL except for a connection portion with the conductive shaft 22a. Further, the conductive shaft 22a is covered with plastic insulating materials 22c, 22d, and 22e such as polyvinyl chloride that are resistant to the plating solution PL except for the connection portion with the female screw hole 22b and the conductive wire 24.

  Specifically, a portion of the electrode support portion 22 disposed in the barrel 10 is covered with an insulating material 22c, and both ends of the conductive shaft 22a protruding from the insulating material 22c are covered with insulating materials 22d and 22e, respectively. As shown in FIG. 6, the insulating material 22c is formed in a cross-sectional shape having two inclined surfaces 22f at the top. The insulating materials 22d and 22e are formed in a circular cross section, and a seal made of silicon rubber or the like that is resistant to the plating solution between the insulating materials 22c and 22d and between the insulating materials 22c and 22e. 22g is interposed.

  The insulating materials 22d and 22e are inserted into an inner hole 31a having a circular cross section formed in the cylindrical portion 31b of the boss 31 fixed to the support member 30. In addition, engagement holes 22h are provided at both ends of the insulating material 22c, an engagement hole 31d is provided at one end of the cylindrical portion 31b of the boss 31 facing the insulation hole 22c, and both engagement holes 22h and 31d are cylindrical. Alternatively, a rotation prevention pin 31e having a prismatic shape is inserted. That is, the comb-shaped electrode 20 is non-rotatably disposed in the barrel 10 by the anti-rotation pin 31 e that engages the insulating material 22 c of the electrode support portion 22 and the cylindrical portion 31 b of the boss 31. Incidentally, the rotation prevention pin 31e is made of a metal such as titanium having resistance to the plating solution PL.

  Each stirring member 23 is formed in a cylindrical shape from a non-conductive material such as polyvinyl chloride having resistance to the plating solution PL, and has a hemispherical portion 23a at the tip and a male screw 23b at the other end. Each stirring member 23 is formed shorter than the electrode rod 21.

  When the comb-shaped electrode 20 is arranged in the barrel 10, first, as shown in FIG. 11, first, in the barrel 10 through the hole 30 a of the support member 30 and the hole 12 a of the end portion 12 of the barrel 10 (inner hole of the bush 32). Then, the electrode support portion 22 is inserted in the barrel 10, and the stirring member 23 is screwed into both ends of the female screw hole 22b of the electrode support portion 22 in the barrel 10, and the electrode rod 21 is screwed into the other female screw holes 22b. . At the time of this screwing, a seal 25 made of silicon rubber or the like that is resistant to the plating solution PL is interposed between the electrode support portion 22 and the electrode rod 21 and between the electrode support portion 22 and the stirring member 23. . Next, the insulating materials 22d and 22e covering both ends of the electrode support portion 22 are inserted into the inner holes 31a of the cylindrical portion 31b provided on the boss 31 and the other end of the rotation prevention pin 31e with one end inserted into the engagement hole 22h. The end is inserted into the engagement hole 31d on the boss 31 side, and then the boss 31 is fixed to the support member 30 with a bolt 30b.

  The following describes a method for forming a metal film such as a nickel film, a tin film, a copper film, or a solder film on a base metal film provided on an object to be plated W, for example, an electronic component chip, using the barrel plating apparatus described above. To do.

  First, the plating liquid PL is supplied to the plating tank 1 through the liquid supply pipe 2, and the excess plating liquid PL is discharged from the discharge port 1 a provided in the plating tank 1, whereby the concentration of the plating liquid PL in the plating tank 1 and Keep the liquid level constant. The discharged plating solution PL is sent to the plating solution circulation device through the merging case 3 and the discharge pipe 4, and after being adjusted and purified by the plating solution circulation device, is supplied to the plating tank 1 through the solution supply pipe 2. The

  A predetermined anode material AM corresponding to the type of plating is accommodated in the case portion 5a of the anode case 5, and the hook portion 5c of the anode case 5 is suspended from the suspension bar 5b, so that the anode material AM in the case portion 5a is suspended. Is immersed in the plating solution PL. Also, a predetermined amount of the object to be plated W and energization medium M are put into the barrel 10, the support member 30 is moved by a barrel hanger (not shown), and the barrel 10 together with the support member 30 is placed in the plating solution PL in the plating tank 1. Immerse.

  Next, while rotating the barrel 10 immersed in the plating solution PL in the plating tank 1 in a direction indicated by an arrow in FIG. 3 at a predetermined speed, for example, about 8 rotations / minute, the anode case 5 and the comb electrode 20 By applying a predetermined voltage through the conductors 6 and 24, a desired plating process is performed.

  At the time of this barrel rotation, as shown in FIG. 3, the workpiece W and the current-carrying mediator M accumulate near the bottom of the barrel 10 to form a lump 15 and flow in the same direction as the barrel rotation direction. Since the specific gravity, shape, and size of the energization medium M are adjusted so that the object to be plated W floats on the surface layer of the lump 15, the object W to be plated floats on the surface of the lump 15 and mainly the energization medium M. And a surface layer portion 15b mainly composed of an object to be plated W are formed.

  Since a plurality of openings 11c and 11d are provided on each surface of the cylindrical portion 11 of the barrel 10 via a partition portion 11e, the lump 15 is considered in a stationary state as shown in FIGS. The mesh member 11a existing in the openings 11c and 11d on the lower surface is deformed so as to bulge outward, and due to this deformation and the flow of the plating solution, etc., depending on the position of the partition 11e on the surface of the lump 15 Recesses can occur along the barrel rotation direction.

  However, since the positions of one of the two adjacent surfaces of the cylindrical portion 11 of the barrel 10 and the partition portion 11e on the other surface are shifted in the axial direction, the barrel 10 is positioned below the lump 15 due to the rotation of the barrel 10. If the surface changes, the position of the dent described above also changes sequentially according to the position of the partitioning portion 11e. Therefore, such a dent is unlikely to occur on the surface of the lump 15 during barrel rotation. Therefore, the entire state of the lump 15 (the workpiece W and the current-carrying medium M) in the barrel 10 is not distorted due to the dent as in the prior art. In other words, the lump 15 in the barrel 10 is not distorted. It is possible to maintain the entire state of the object to be plated W and the energization medium M in an appropriate state.

  Further, since the cylindrical portion 11 of the barrel 10 has a hexagonal cross section, the clearance between the tip of each electrode bar 21 of the comb-shaped electrode 20 and the inner surface of the cylindrical portion 11 changes according to the direction of the cylindrical portion 11 when the barrel rotates. However, since the tip of each electrode rod 21 is arranged so as not to face the partition portion 11e existing on each surface of the tube portion 11 of the barrel 10, the clearance between the tip of each electrode rod 21 and the inner surface of the tube portion 11 is arranged. It can be avoided that an excessive force is applied to the workpiece W existing between the two when the thickness becomes narrow.

  Further, the comb-shaped electrode 20 includes a plurality of electrode bars 21 provided on the electrode support portion 22 at intervals in the barrel axis direction, and non-conductive stirring provided on both sides of the plurality of electrode bars 21 in the barrel axis direction. Since the plurality of electrode rods 21 and the stirring member 23 are inserted into the lump 15 when the barrel rotates, each electrode rod 21 is placed in the lump 15 as the barrel 10 rotates. And depressions corresponding to the stirring member 23 are generated. The formation of the recesses causes the surrounding object W and energization medium M to fall into the depressions, and this action suppresses the dispersion of the object W and the energization medium M and the lump 15. The state in which the object to be plated W is almost uniformly raised on the surface is maintained.

  In particular, since the stirring member 23 is shorter than the electrode rod 21 and is inserted shallowly into the lump 15, the dispersion suppressing action by the stirring member 23 mainly acts on the workpiece W on the surface of the lump 15, thereby stirring. The member 23 can be made to positively move only the workpiece W existing in the portion near the inner surface of the end portion 12 of the barrel 10 from the inner surface of the end portion 12 to the inside. Since the stirring member 23 is non-conductive, it does not serve as the electrode rod 21, but the stirring member 23 does not disturb the form of the energization medium M at the center of the lump 15. The plating process for the object to be plated W located in the vicinity of the stirring member 23 can be performed in the same manner as the plating process for the other objects to be plated W.

  Further, since a plurality of partial projections 14 are provided along the barrel rotation direction at a position away from the inner surface of the cylindrical portion 11 on the inner surface of the end portion 12 of the barrel 10, the vicinity of the inner surface of the end portion 12 of the lump 15 is provided during the barrel rotation. The partial protrusions 14 sequentially contact the object to be plated W and the current-carrying medium M so that the object W and the current-matter medium M are gradually stirred and brought to the inside. . In other words, stirring of the object to be plated W and the energization medium M in the barrel 10 is promoted without disturbing the overall state of the object to be plated W and the energization medium M in the barrel 10.

  Specifically, as shown in FIGS. 12 and 13, a non-spherical shape such as a polygonal column is used as the object to be plated W, and a spherical shape having a diameter smaller than the maximum length of the object to be plated W. When the plating process is performed using the current-carrying medium M, the object W to be plated and the medium W to be plated brought toward the inside of the barrel 10 by the contact with the partial protrusion 14 are the objects W to be plated. Since the action of moving and staying inside the barrel 10 is obtained, it is possible to effectively suppress the object to be plated W from remaining near the inner surface of the end portion 12 or sticking to the inner surface.

  Furthermore, since the angles θ1, θ2, θ3, and θ4 formed by the projection surfaces 14a, 14b, 14c, and 14d constituting the partial projections 14 and the inner surface of the end portion 12 are set to 90 ° or less, the workpiece W and the energization medium There is little resistance when the partial protrusion 14 passes through the object M, and deformation or damage of the object to be plated W is difficult to occur. In addition, since the object to be plated W hardly remains on the partial protrusion 14, it is possible to effectively suppress plating defects caused by remaining on the partial protrusion 14.

  Furthermore, the relationship between the angle θ1 formed between the projection surface 14a far from the rotation center of each partial projection 14 and the end portion 12 and the angle θ2 formed between the projection surface 14b close to the rotation center and the end portion 12 is θ1 <θ2. When the object to be plated W and the current-carrying medium M inside the barrel 10 are taken out by opening the lid 13, the object to be plated W remaining on the partial protrusion 14 can be easily found.

  Thus, according to the barrel plating apparatus described above, by shifting the position of one of the two adjacent surfaces of the cylindrical portion 11 of the barrel 10 and the partition portion 11e on the other surface in the axial direction, the barrel is rotated. It is possible to prevent a depression corresponding to the position of the partition portion 11e from being generated along the barrel rotation direction on the surface of the lump 15 (the object to be plated W and the current-carrying medium M) existing near the bottom in the barrel 10. The entire state of the lump 15 (the object to be plated W and the energization medium M) in 10 can be maintained in an appropriate state, and the entire object to be plated W can be uniformly plated.

  Further, the opening 11c provided on each surface of the cylindrical portion 11 of the barrel 10 has the same size, and the opening 11c is provided for even-numbered surfaces having a smaller number of openings 11c than the odd-numbered surfaces in the circumferential direction. Since the openings 11d that are shorter in the axial direction than the openings 11c are provided on both sides in the axial direction, the size of the openings 11c in the even-numbered surfaces is made larger than the openings 11c in the odd-numbered surfaces. , That is, the deformation of the mesh member 11a is increased, so that the state of the object to be plated W and the current-carrying medium M in the same portion is prevented from becoming distorted, and the above-described effects are more accurately achieved. Obtainable.

  Furthermore, as the cylindrical portion 11 of the barrel 10, a hexagonal section having six surfaces is used, and the positions of the partition portions of the odd-numbered and even-numbered surfaces in the circumferential direction are different in the axial direction. When the surface located below the lump 15 (the workpiece W and the energization medium M) is changed by the rotation of the barrel 10, the position of the partition portion 11e is also sequentially changed to obtain the above-mentioned effect more accurately. Can do.

  Furthermore, since the tip of each electrode rod 21 of the comb-shaped electrode 20 is arranged so as not to face the partition portion 11e existing on each surface of the tube portion 11 of the barrel 10, the tip of each electrode rod 21 and the inner surface of the tube portion 10 are arranged. To avoid applying excessive force to the object to be plated W existing between them when the clearance between the two and the clearance becomes narrow, and to avoid the object to be plated being deformed or damaged during the rotation of the barrel. it can.

  In the above-described embodiment, the cylindrical portion 11 of the barrel 10 has a hexagonal cross section, and three openings 11c are formed on the odd-numbered surface, and the cylindrical portion 11 has an even-numbered surface. Although two openings 11c are formed, m number of openings 11c (m is an integer of 3 or more) are formed on odd-numbered surfaces, and m-1 numbers are formed on even-numbered surfaces. Even when the opening 11c is formed, the same effect as described above can be obtained.

It is a top view of the barrel plating apparatus which shows one Embodiment of this invention. It is an AA arrow line view of FIG. It is the BB sectional view taken on the line of FIG. It is a C direction arrow directional view of FIG. It is the DD sectional view taken on the line of FIG. It is the EE sectional view taken on the line of FIG. It is the FF sectional view taken on the line of FIG. It is the GG sectional view taken on the line of FIG. It is sectional drawing of the comb-shaped electrode support part of FIG. It is the HH sectional view taken on the line of FIG. It is explanatory drawing of the assembly method of a comb-shaped electrode. It is a figure explaining the flow state of the to-be-plated thing and the electricity supply medium in a barrel. It is a figure explaining the flow state of the to-be-plated thing and the electricity supply medium in a barrel.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... Barrel, 11 ... Tube part, 11a ... Mesh member, 11b ... Frame part, 11c ... Opening part, 11d ... Opening part, 11e ... Partition part, 12 ... End part, 20 ... Comb electrode, 21 ... Electrode rod, 22 ... Electrode support part, 23 ... Stirring member, 30 ... Support member, 31 ... Boss, 31a ... Cylindrical part, 32 ... Bush.

Claims (3)

In a barrel plating apparatus having a barrel portion having a polygonal cross section and end portions at both ends thereof, and having a barrel having an opening for exposing a mesh member on each surface of the barrel portion,
The barrel portion of the barrel has a hexagonal cross section having six rectangular surfaces in the circumferential direction. Of the six surfaces, the first, third, and fifth surfaces in the circumferential direction have n numbers (n is 2). (The integer above) first openings are provided in the axial direction via the partition, and n-1 number of second openings are provided on the second, fourth, and sixth surfaces in the circumferential direction. A third opening having an axial length shorter than that of the second opening is provided on both sides of the n−1 number of second openings in the axial direction. the position of the partition portion in the circumferential direction of the first and third and fifth in the second position and the circumferential direction of the partition portion in the plane and the fourth and sixth surfaces are axially offset,
A barrel plating apparatus characterized by that. Each first opening has a size equal to each other, and each second opening has a size equal to the first opening,
The barrel plating apparatus according to claim 1. A comb-shaped electrode having a plurality of electrode rods is provided in the barrel, and the tip of each electrode rod is disposed so as not to face the partition portion existing on each surface of the cylindrical portion.
The barrel plating apparatus according to claim 1 or 2, wherein the apparatus is a barrel plating apparatus.

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