JP2005274724A - Storage container for photomask blank and its supporting method - Google Patents

Storage container for photomask blank and its supporting method Download PDF

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JP2005274724A
JP2005274724A JP2004084954A JP2004084954A JP2005274724A JP 2005274724 A JP2005274724 A JP 2005274724A JP 2004084954 A JP2004084954 A JP 2004084954A JP 2004084954 A JP2004084954 A JP 2004084954A JP 2005274724 A JP2005274724 A JP 2005274724A
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photomask blank
container
spring member
photomask
support member
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Masataka Watanabe
政孝 渡辺
Chikayasu Fukushima
慎泰 福島
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a storage container for a photomask blank and its supporting method by which the photomask blank can be conveyed while generation of a particle causing a defect is prevented as much as possible, the highly accurate photomask blank hardly having the defect can be provided, thereby a photomask having a finer pattern can be highly accurately formed and fine pattern exposure is made possible. <P>SOLUTION: In the storage container for the photomask blank provided with a container main body and a lid body for storing the photomask blank in its interior, wherein a supporting member made of synthetic resin and a spring member made of synthetic resin are respectively provided on the inner surfaces of a pair of facing wall parts of the container and one mutually facing both side surfaces of the photomask blank are supported by the both members by using elastic force generated by pressurization of these members to the photomask blank to store the photomask blank, the elastic force of the the spring member is so set that pressurizing force given to the both side surfaces of the photomask blank by the supporting member and the spring member is 1.96 to 117.6 N. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、半導体集積回路等の製造などに用いられるフォトマスクブランクの収納容器及び支持方法、特に、欠陥の発生に影響するパーティクルの発生を低減したフォトマスクブランクの収納容器及び支持方法に関する。   The present invention relates to a photomask blank storage container and support method used for manufacturing semiconductor integrated circuits and the like, and more particularly to a photomask blank storage container and support method in which the generation of particles affecting the occurrence of defects is reduced.

IC及びLSI等の半導体集積回路の製造をはじめとして、広範囲な用途に用いられているフォトマスクは、基本的には透光性基板上にクロムやモリブデンシリコンなどを主成分とする遮光膜を、所定のパターンに形成したものである。近年では半導体集積回路の高集積化などの市場要求に伴ってパターンの微細化が急速に進んできた。このパターンの微細化に伴い、微小な欠陥のないフォトマスクブランクを提供することが求められている。   Photomasks used in a wide range of applications, including the manufacture of semiconductor integrated circuits such as IC and LSI, basically have a light-shielding film mainly composed of chromium, molybdenum silicon, etc. on a translucent substrate. It is formed in a predetermined pattern. In recent years, pattern miniaturization has rapidly progressed with market demands such as higher integration of semiconductor integrated circuits. With the miniaturization of this pattern, it is required to provide a photomask blank without a minute defect.

これまでにも、フォトマスクブランクの製造工程、例えば、石英基板の上に膜を成膜する工程、成膜後の洗浄工程、レジスト塗布工程などにおいて発生する微小な欠陥を与えるパーティクルなどを低減する方法として様々な方法が提案され、欠陥が極めて少ないフォトマスクを製造し得る技術が確立されてきた。   Up to now, the photomask blank manufacturing process, for example, the process of forming a film on a quartz substrate, the cleaning process after the film formation, the particles that give minute defects generated in the resist coating process, etc. are reduced. Various methods have been proposed, and a technique capable of manufacturing a photomask with extremely few defects has been established.

しかしながら、このような方法で厳密に管理して製造された極めて欠陥の少ないフォトマスクブランクであっても、次工程であるフォトマスク製造工程に供する場合、一般的には、フォトマスクブランクを製造する工場からフォトマスクを製造する工場への搬送を伴うため、フォトマスクブランクを所定の容器に収納して搬送するが、この搬送の際に欠陥の増加が発生してしまい、その結果、フォトマスクの欠陥修正が必要になったり、欠陥により露光不良が発生したりしてしまうという問題が起こっていた。   However, even if the photomask blank is manufactured with such a method and is strictly controlled, when the photomask blank is used for the next photomask manufacturing process, the photomask blank is generally manufactured. Since it involves transport from the factory to the factory that manufactures the photomask, the photomask blank is stored in a predetermined container and transported. However, an increase in defects occurs during this transport, and as a result, There has been a problem that a defect needs to be corrected or an exposure failure occurs due to the defect.

特に、パターンの更なる微細化要求に対応するには、従来は問題とならなかった微細なパーティクルであってもその低減が必要となる。   In particular, in order to meet the demand for further miniaturization of patterns, it is necessary to reduce even fine particles that have not been a problem in the past.

本発明は、上記問題点を解決するためになされたものであり、フォトマスクブランクの搬送による欠陥の増加を防止して、欠陥の少ない極めて高品質のフォトマスクブランクを提供するため、フォトマスクブランクを収納し、欠陥の原因となるパーティクルの発生を可及的に防止してフォトマスクブランクを搬送することができるフォトマスクブランクの収納容器及び支持方法を提供することを目的とする。   The present invention has been made in order to solve the above-mentioned problems, and in order to provide an extremely high-quality photomask blank with few defects by preventing an increase in defects due to conveyance of the photomask blank. It is an object of the present invention to provide a photomask blank storage container and a support method capable of transporting the photomask blank while preventing the generation of particles that cause defects as much as possible.

従来、半導体製造等に用いられるレジストを塗布したフォトマスクブランクを容器に収納して搬送する際に欠陥が増加する原因は、収納容器自体の汚れによるものか、又は容器の蓋開閉時の蓋と容器本体との摩擦により発生するパーティクルによるものと考えられてきた。   Conventionally, the cause of the increase in defects when storing and transporting a photomask blank coated with a resist used in semiconductor manufacturing etc. in a container is due to contamination of the storage container itself, or a lid when opening and closing the lid of the container It has been thought to be due to particles generated by friction with the container body.

しかしながら、容器の汚れや摩擦により発生するパーティクルによる影響を可能な限り取り除いても、搬送の前後において欠陥が増加していることがわかった。このような容器では、通常、フォトマスクブランクが搬送時に動いて塗布したレジスト膜が容器内面等に接触して傷付くことがないようにするために、樹脂等の材料により形成された固定冶具を用いフォトマスクブランクの外周面で固定して、動かないようにする方法が採られる。   However, it was found that defects were increased before and after transport even if the influence of particles generated by dirt and friction of the container was removed as much as possible. In such a container, a fixing jig formed of a material such as a resin is usually used so that the resist film applied by moving the photomask blank during transportation does not come into contact with and damage the inner surface of the container. A method is adopted in which the photomask blank is fixed on the outer peripheral surface so as not to move.

本発明者は、この点に注目して、鋭意検討を重ねた結果、搬送時に、収納されたフォトマスクブランクに与えられる振動等により発生する力によって、フォトマスクブランクと樹脂等の材料により形成された固定冶具との間に擦れが発生し、これによって硬度の高いフォトマスクブランクが、硬度の低い樹脂を削り取ってしまうことによりパーティクルが発生していることを知見した。   As a result of intensive investigations by paying attention to this point, the inventor is formed of a material such as a photomask blank and a resin by a force generated by vibration or the like applied to the stored photomask blank during transportation. It was found that rubbing occurred between the fixing jig and the high-hardness photomask blank, which caused particles to be generated by scraping off the low-hardness resin.

そこで、本発明者は、更に検討を重ねた結果、上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備する容器内部にフォトマスクブランクを収納する際に、容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持することにより、フォトマスクブランクを収納し、この支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定すれば、搬送の際に発生する振動等により生ずるフォトマスクブランクと固定冶具、即ちフォトマスクブランクと支持部材及びバネ部材との擦れによるパーティクルの発生を低減して、フォトマスクブランクを搬送することができることを見出し、本発明をなすに至った。   Therefore, as a result of further studies, the inventor has a rectangular box-shaped container body that is open at the top, and a lid that covers the upper opening and is detachably attached to the upper end of the container body. When a photomask blank is stored inside the container, a synthetic resin support member and a synthetic resin spring member are respectively provided on the inner surfaces of a pair of opposing wall portions of the container, and these members press the photomask blank. The photomask blank is accommodated by supporting both sides of the photomask blank opposite to each other by the above-described members by the elastic force to be applied, and the support member and the spring member are respectively applied to the both sides of the photomask blank. If the spring force of the spring member is set so that the pressing force is 1.96 to 117.6 N, a photomask blur generated by vibration or the like generated during conveyance Click the fixture, i.e. to reduce the generation of particles due to rubbing between the photomask blank and the supporting member and the spring member, it found that it is possible to transport the photomask blank, the present invention has been accomplished.

即ち、本発明は、上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備し、内部にフォトマスクブランクを収納する容器であって、該容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持することにより、フォトマスクブランクを収納する容器において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定したことを特徴とするフォトマスクブランクの収納容器、及び
上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備し、内部にフォトマスクブランクを収納する容器内部でフォトマスクブランクを支持する方法であって、上記容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持する方法において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定して支持することを特徴とするフォトマスクブランクの支持方法を提供する。
That is, the present invention comprises a rectangular box-shaped container body that is open at the top, and a lid that covers the upper opening and is detachably attached to the upper end of the container body. A container to be stored, and a synthetic resin support member and a synthetic resin spring member are provided on the inner surfaces of a pair of opposing wall portions of the container, respectively, and the elastic force by which these members press the photomask blank By supporting the two opposite side surfaces of the photomask blank with the two members, the pressing force that the support member and the spring member respectively apply to the both side surfaces of the photomask blank in the container for storing the photomask blank. The photomask blank container and the upper part are open, wherein the spring force of the spring member is set to be 1.96 to 117.6N A rectangular box-shaped container body, and a lid that covers the upper open portion and is detachably attached to the upper end of the container body, and the photomask blank is stored inside the container that houses the photomask blank. A synthetic resin support member and a synthetic resin spring member are provided on the inner surfaces of a pair of opposing walls of the container, respectively, and the elastic force by which these members press the photomask blank is provided. In the method of supporting one side surfaces of the photomask blank facing each other by the two members, the pressing force applied to the both side surfaces of the photomask blank by the support member and the spring member is 1.96 to 117.6 N, respectively. Thus, there is provided a photomask blank supporting method, characterized in that the spring force of the spring member is set and supported.

本発明によれば、欠陥の原因となるパーティクルの発生を可及的に防止してフォトマスクブランクを搬送することができ、欠陥が極めて少ない高精度のフォトマスクブランクを提供することができる。これにより微細なパターンを有するフォトマスクを高精度に形成することができ、微細なパターン露光が可能となる。   ADVANTAGE OF THE INVENTION According to this invention, generation | occurrence | production of the particle | grains causing a defect can be prevented as much as possible, a photomask blank can be conveyed, and a highly accurate photomask blank with very few defects can be provided. As a result, a photomask having a fine pattern can be formed with high accuracy, and fine pattern exposure is possible.

発明を実施するための最良の形態及び実施例BEST MODE FOR CARRYING OUT THE INVENTION

以下、本発明につき、図面を参照して更に詳しく説明する。
本発明のフォトマスクブランクの収納容器は、上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備し、内部にフォトマスクブランク、好ましくは6インチ(約152.4mm)角のフォトマスクブランク、例えば、石英基板等の樹脂より高硬度の基板に遮光膜等を形成したフォトマスクブランク、特に、上記遮光膜等の上に更にレジスト膜を形成したフォトマスクブランクを収納する容器であって、該容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持することにより、フォトマスクブランクを収納する容器において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定したものである。
Hereinafter, the present invention will be described in more detail with reference to the drawings.
The photomask blank storage container of the present invention comprises a rectangular box-shaped container body that is open at the top, and a lid that covers the upper opening and is detachably attached to the upper end of the container body. A photomask blank, preferably a 6-inch (about 152.4 mm) square photomask blank, for example, a photomask blank in which a light-shielding film or the like is formed on a substrate having a hardness higher than that of a resin such as a quartz substrate, particularly the light-shielding film or the like A container for storing a photomask blank on which a resist film is further formed, and provided with a support member made of a synthetic resin and a spring member made of a synthetic resin on the inner surfaces of a pair of wall portions facing each other, These members support one side surfaces of the photomask blank opposite to each other by the elastic force that presses the photomask blank, thereby allowing the photomask blank to In the container for storing the blank, the elastic force of the spring member is set so that the pressing force that the support member and the spring member respectively apply to both side surfaces of the photomask blank is 1.96 to 117.6N. It is.

このような容器としては、例えば、図1〜4に示されるような容器が挙げられる。この容器は、6インチ角のフォトマスクブランクの収納容器を示すものである。この容器1は、内部に支持部材21を備え、上下方向中央部より上部が中央部及び下部より横方向(前後左右方向)に幅広に形成された上方が開放した高さが約4.25インチ(約108.0mm)程度の四角箱形の容器本体11と、内部に2つのバネ部材22,22を備える高さが3.25インチ(約82.6mm)程度の四角箱形の蓋体12とからなる。そして、容器本体11と蓋体12とは、蓋体12を容器本体11に被着させたときに、容器本体11の上部外側面と蓋体12の下部内側面とが接触する大きさに形成されている。   An example of such a container is a container as shown in FIGS. This container represents a 6-inch square photomask blank storage container. The container 1 includes a support member 21 therein, and the upper part is wider than the center part in the vertical direction and wider in the lateral direction (front and rear, left and right direction) than the lower part. A rectangular box-shaped container body 11 having a height of about 108.0 mm and a rectangular box-shaped lid body 12 having a height of about 3.25 inches (about 82.6 mm) having two spring members 22 and 22 inside. It consists of. The container body 11 and the lid body 12 are formed in such a size that the upper outer surface of the container body 11 and the lower inner surface of the lid body 12 are in contact with each other when the lid body 12 is attached to the container body 11. Has been.

容器本体11には、その内部から上方へ突出するように、合成樹脂からなる断面凹形状の支持部材21が、その外側面の非突出部分及び底板212の下面と容器本体11の内面とが各々接触するように配設されている。そして、容器本体11の内底面には、支持部材21の外側面の幅方向にその幅で離間する係止突条111,111が設けられており、この係止突条111,111により、支持部材21がその外側面の幅方向に動かないように固定されている。   The container body 11 includes a support member 21 having a concave cross section made of synthetic resin so as to protrude upward from the inside thereof, a non-projecting portion of the outer side surface, a lower surface of the bottom plate 212, and an inner surface of the container body 11 respectively. It arrange | positions so that it may contact. The inner bottom surface of the container body 11 is provided with locking ridges 111 and 111 that are separated by the width in the width direction of the outer surface of the support member 21, and are supported by the locking ridges 111 and 111. The member 21 is fixed so as not to move in the width direction of the outer surface.

また、この支持部材21の側壁211,211の内側面211a,211aの間隔は6インチより狭く(16mm程度狭く)形成されると共に、内側面211a,211aには、対向する複数組(図の場合は5組)の断面コ字状の溝211c,211cが、内側面211a,211aの上下端に亘って形成されている。更に、この溝211c,211cは、幅がフォトマスクブランクpの厚さより若干広く、また深さが、対向する各々の溝211c,211cの底面の間隔が6インチよりやや広く(0.6mm程度広く)なるように形成されている。   Further, the interval between the inner side surfaces 211a and 211a of the side walls 211 and 211 of the support member 21 is formed to be narrower than 6 inches (narrow by about 16 mm), and the inner side surfaces 211a and 211a have a plurality of opposing groups (in the case of the figure). 5 sets) of grooves 211c and 211c having a U-shaped cross section are formed across the upper and lower ends of the inner side surfaces 211a and 211a. Further, the grooves 211c and 211c are slightly wider than the thickness of the photomask blank p, and the depth is slightly wider than the bottom of each of the grooves 211c and 211c facing each other than 6 inches (about 0.6 mm wider). ).

そして、容器1にフォトマスクブランクpを収納する際、フォトマスクブランクpは、フォトマスクブランクpの4隅のうちの隣接する2隅を溝211c,211cに合わせ、溝211c,211cの上端から溝211c,211cにガイドされて挿入される。これにより、フォトマスクブランクpは、溝211c,212cにガイドされて、溝211c,211cの下端において、フォトマスクブランクpの4つの外周面のうち任意の一組の平行面の一方の面全体が、支持部材21の底板212の上面212bに当接するようになっている。   When the photomask blank p is stored in the container 1, the photomask blank p is aligned with the two adjacent corners of the four corners of the photomask blank p in the grooves 211c and 211c, and the grooves are formed from the upper ends of the grooves 211c and 211c. 211c and 211c are guided and inserted. As a result, the photomask blank p is guided by the grooves 211c and 212c, and at the lower end of the grooves 211c and 211c, one entire surface of one set of parallel surfaces of the four outer peripheral surfaces of the photomask blank p is formed. The upper surface 212b of the bottom plate 212 of the support member 21 is in contact with the upper surface 212b.

一方、蓋体12は、上記容器本体11の上方開放部を覆って容器本体上端部に着脱自在に被着され、蓋体12内部には、蓋体12を容器本体11に被着したときに、支持部材21の側壁211,211の上方となる位置に、合成樹脂からなる2つのバネ部材22,22が各々設けられている。このバネ部材22,22は図5に示されるように、上板221と、この上板221の一端から下方に上板221と直交するように設けられた側板222と、上板221と側板222とが交差する位置から上板221とは反対の方向に設けられたフォトマスクブランクpの厚さよりやや幅広で、長さが1インチ程度の複数の支持片223(図の場合は5つ)とからなり、支持片223は上板221の上面に対して角度θ(図5の場合約15°)下方に傾けて配設されている。この場合、2つのバネ部材22,22は、支持片223,223を向かい合わせて、各々の側板222,222の間隔が6インチより広く(2.5mm程度広く)なるようにして、各々の上板221,221の上面を蓋体12の天板の内面に接着させて、蓋体12の内部に取り付けられている。   On the other hand, the lid 12 is detachably attached to the upper end of the container body so as to cover the upper open portion of the container body 11, and when the lid 12 is attached to the container body 11 inside the lid 12. Two spring members 22 and 22 made of synthetic resin are provided at positions above the side walls 211 and 211 of the support member 21, respectively. As shown in FIG. 5, the spring members 22, 22 include an upper plate 221, a side plate 222 provided so as to be orthogonal to the upper plate 221 downward from one end of the upper plate 221, and the upper plate 221 and the side plate 222. A plurality of support pieces 223 (five in the figure) having a width slightly larger than the thickness of the photomask blank p provided in a direction opposite to the upper plate 221 from a position where the crossing and the upper plate 221 are opposite to each other. The support piece 223 is disposed to be inclined downward with respect to the upper surface of the upper plate 221 by an angle θ (about 15 ° in the case of FIG. 5). In this case, the two spring members 22, 22 face each other with the support pieces 223, 223 facing each other so that the distance between the side plates 222, 222 is larger than 6 inches (about 2.5 mm wider). The upper surfaces of the plates 221 and 221 are attached to the inner surface of the top plate of the lid 12 and attached to the inside of the lid 12.

そして、支持片223,223は、蓋体12を容器本体11に被着させたときに、上述した支持部材21に形成された溝211cの上方に各々が位置するように等間隔に形成され、また、この支持片223,223の先端の幅方向両端部には、係止爪223a,223aがフォトマスクブランクpの厚さとほぼ同じ間隔で離間させて、下方に向けて設けられており、蓋体12を容器本体11に被着させたとき、支持部材21の溝211c,211cに挿入されなかった2隅が、この係止爪223a,223aの間に挿入され、係止爪223a,223aによりフォトマスクブランクpの厚さ方向の動きが規制されるようになっている。   The support pieces 223 and 223 are formed at equal intervals so that each of the support pieces 223 and 223 is positioned above the groove 211c formed in the support member 21 described above when the lid 12 is attached to the container body 11. Further, locking claws 223a and 223a are provided at both ends in the width direction at the front ends of the support pieces 223 and 223 so as to be spaced downward at substantially the same interval as the thickness of the photomask blank p, When the body 12 is attached to the container body 11, the two corners that are not inserted into the grooves 211c and 211c of the support member 21 are inserted between the locking claws 223a and 223a, and the locking claws 223a and 223a The movement of the photomask blank p in the thickness direction is regulated.

更に、蓋体12を容器本体11に被着させたときに、このバネ部材22の支持片223は、その下面223bと、上述したフォトマスクブランクpの平行面の他方の面(支持部材21の底板212の上面212bと当接した一方の面に対する他方の面)と当接するようになっており、下面223bの側板222との接合部から支持部材21の底板212の上面212bへの距離がほぼ6インチになるようになっている。   Further, when the lid 12 is attached to the container main body 11, the support piece 223 of the spring member 22 has its lower surface 223b and the other surface of the parallel surface of the photomask blank p described above (of the support member 21). The other surface of the bottom plate 212 is in contact with the upper surface 212b of the bottom plate 212. The distance from the joint of the lower surface 223b with the side plate 222 to the upper surface 212b of the bottom plate 212 of the support member 21 is approximately the same. It has become 6 inches.

なお、蓋体12の対向する一組の内側面の下端中央部には、蓋体12の内方に向けて各々係止片121,121が設けられており、この係止片121,121は、蓋体12を容器本体11に被着させたときに、容器本体11の幅広に形成された上部の対向する一組の外側面の下端中央部に設けられた係止溝112,112に係合し、蓋体12が容器本体11にロックされて固定されるようになっている。   In addition, locking pieces 121 and 121 are respectively provided toward the inner side of the lid body 12 at the center of the lower end of the pair of inner surfaces facing the lid body 12. When the lid 12 is attached to the container body 11, it engages with the locking grooves 112, 112 provided at the center of the lower ends of the pair of opposed outer surfaces of the upper portion formed in the wide width of the container body 11. The lid 12 is locked and fixed to the container body 11.

次に、フォトマスクブランクを支持して収納する方法について説明する。
まず、上述した容器本体11の支持部材21に、フォトマスクブランクpを、その4隅のうちの隣接する2隅を溝211c,211cに合わせて、溝211c,211cの上端から溝211c,211cに挿入する。次いで、蓋体12を容器本体11に被着させるが、この際、蓋体12に設けられた係止片121,121の間隔は容器本体11上部の外壁よりも狭くなっているため、容器本体11は、蓋体12の係止片121,121の間隔を若干押し広げるようにして蓋体12内部に押し込まれる。
Next, a method for supporting and storing the photomask blank will be described.
First, the photomask blank p is placed on the support member 21 of the container body 11 described above, and the two adjacent corners of the four corners are aligned with the grooves 211c and 211c, so that the upper ends of the grooves 211c and 211c are changed to the grooves 211c and 211c. insert. Next, the lid 12 is attached to the container main body 11. At this time, the interval between the locking pieces 121, 121 provided on the lid 12 is narrower than the outer wall of the upper portion of the container main body 11. 11 is pushed into the lid 12 so as to slightly widen the gap between the locking pieces 121 and 121 of the lid 12.

容器本体11が更に押し込まれると、フォトマスクブランクpの支持部材21の溝211c,211cに挿入されなかった2つの隅が、各々支持片223,223の各々の先端に設けられた係止爪223a,223a間に挿入されると共に、支持片223,223の下面223b,223bに当接する。この状態から容器本体11が更に押し込まれると、支持片223,223が上方に撓むと共に、フォトマスクブランクpに対して弾発力が生じ、この弾発力によって、収納されたフォトマスクブランクpは、上記支持部材21とバネ部材22,22の支持片223,223とによって、フォトマスクブランクpの互いに対向する一方の両側面で押圧され、挟持されて支持される。   When the container body 11 is further pushed in, the locking claws 223a provided at the tips of the support pieces 223 and 223 are the two corners that are not inserted into the grooves 211c and 211c of the support member 21 of the photomask blank p, respectively. , 223a and abut against the lower surfaces 223b, 223b of the support pieces 223, 223. When the container body 11 is further pushed in from this state, the support pieces 223 and 223 are bent upward, and a resilient force is generated with respect to the photomask blank p. Due to this resilient force, the stored photomask blank p is stored. Are pressed and supported by the support member 21 and the support pieces 223 and 223 of the spring members 22 and 22 on both side surfaces of the photomask blank p facing each other.

そして、蓋体12の移動端において、バネ部材22の支持片223は、ほぼ水平となり、支持片223の下面223bのほぼ全面がフォトマスクブランクpと当接するようになると共に、蓋体12に設けられた係止片121,121が容器本体11に設けられた係止溝112,112に係合し、蓋体12が容器本体11にロックされて、支持片223の弾発力が固定され、フォトマスクブランクpの互いに対向する一方の両側面が、支持部材21の底板212の上面212bと、支持片223の下面223bとで押圧され、挟持されて支持される。   At the moving end of the lid 12, the support piece 223 of the spring member 22 is substantially horizontal so that almost the entire lower surface 223 b of the support piece 223 comes into contact with the photomask blank p and is provided on the lid 12. The engaging pieces 121, 121 thus engaged are engaged with engaging grooves 112, 112 provided in the container body 11, the lid body 12 is locked to the container body 11, and the elastic force of the support piece 223 is fixed. One side surfaces of the photomask blank p facing each other are pressed and sandwiched and supported by the upper surface 212b of the bottom plate 212 of the support member 21 and the lower surface 223b of the support piece 223.

フォトマスクブランクは、上述したような方法により容器に支持されて収納されるが、本発明においては、上述したような、フォトマスクブランクが支持部材とバネ部材とで挟持されて支持された状態において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力(図1〜4に示される容器にフォトマスクブランクpを収納した場合においては、フォトマスクブランクpの外周面が、支持部材21の底板212の上面212b、及びバネ部材22の支持片223の下面223bに当接した部分における押圧力)が1.96〜117.6N、好ましくは1.96〜85N、より好ましくは2〜58.8Nとなるようにバネ部材の弾発力が設定される。このバネ部材の弾発力は、図1〜4に示される容器においては、上述したバネ部材22の支持片223の厚さ、傾斜角度θ、支持部材21の底板212の上面212bと、バネ部材22の支持片223の下面223bとの距離などを調節することにより設定が可能である。   The photomask blank is supported and stored in the container by the method as described above. However, in the present invention, in the state where the photomask blank is sandwiched and supported by the support member and the spring member as described above. The pressing force that the support member and the spring member respectively apply to both side surfaces of the photomask blank (in the case where the photomask blank p is stored in the container shown in FIGS. 1 to 4, the outer peripheral surface of the photomask blank p is The pressing force at the portion of the support member 21 in contact with the upper surface 212b of the bottom plate 212 and the lower surface 223b of the support piece 223 of the spring member 22) is 1.96 to 117.6N, preferably 1.96 to 85N, more preferably The spring force of the spring member is set to be 2 to 58.8N. In the container shown in FIGS. 1 to 4, the elastic force of the spring member includes the thickness of the support piece 223 of the spring member 22, the inclination angle θ, the upper surface 212 b of the bottom plate 212 of the support member 21, and the spring member. It can be set by adjusting the distance from the lower surface 223b of the 22 support pieces 223.

押圧力が117.6Nを超えるように設定すると、蓋体を容器本体に被着する際にフォトマスクブランクとバネ部材とが擦れ合った場合、バネ部材の弾発力が強すぎて、硬度の高いフォトマスクブランクが、硬度の低い樹脂を削り取ってしまってパーティクルが発生してしまう。また、過剰な押圧力を与えると、フォトマスクブランクが破損することもある。一方、押圧力が1.96N未満では、支持が不十分であるため、搬送時に、収納されたフォトマスクブランクに与えられる振動等により発生する力によって、フォトマスクブランクが大きく振動してしまい、これにより発塵してかえって欠陥が増加する。場合によっては、レジスト膜に修正不能な致命的なキズを与えてしまうこともある。   If the pressing force is set to exceed 117.6 N, when the photomask blank and the spring member rub against each other when the lid is attached to the container body, the spring member is too elastic and the hardness A high photomask blank scrapes off the low-hardness resin and generates particles. Further, if an excessive pressing force is applied, the photomask blank may be damaged. On the other hand, if the pressing force is less than 1.96 N, the support is insufficient, and the photomask blank vibrates greatly due to the force generated by the vibration applied to the stored photomask blank during transportation. As a result, dust is generated and defects are increased. In some cases, the resist film may be given fatal scratches that cannot be corrected.

なお、本発明の収納容器及び支持方法を好適に適用し得る容器の一例として、図1〜4に示されるような容器を提示したが、本発明の容器及び支持方法を好適に適用し得る容器は、上記図示されたような容器に限定されるものではなく、その構成は、本発明の要旨を変更しない範囲で適宜変更することが可能である。   In addition, although the container as shown in FIGS. 1-4 was shown as an example of the container which can apply the storage container and support method of this invention suitably, the container which can apply the container and support method of this invention suitably Is not limited to the container as illustrated above, and its configuration can be changed as appropriate without departing from the scope of the present invention.

以下、本発明について、更に具体的な実験例を挙げて説明する。   Hereinafter, the present invention will be described with further specific experimental examples.

[実験例]
6インチ角石英基板に70.0nmのクロム遮光膜をスパッタリングにより形成し、更にその上に400.0nmの露光用レジストを塗布したフォトマスクブランクを、図1〜4に示されるような容器に5枚収納し、バネ部材の弾発力を変えることにより、支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力を表1に示される値となるようにバネ部材の弾発力を設定してフォトマスクブランクを支持したものを7個準備し、これらを搬送した。搬送はトラックによる国内輸送であり、輸送距離は約10kmである。
[Experimental example]
A photomask blank, in which a 70.0 nm chromium light-shielding film is formed on a 6-inch square quartz substrate by sputtering, and a 400.0 nm exposure resist is coated thereon, is placed in a container as shown in FIGS. The elastic force of the spring member is adjusted so that the pressing force that the support member and the spring member respectively apply to both side surfaces of the photomask blank becomes the values shown in Table 1 by storing the sheets and changing the elastic force of the spring member. 7 were prepared to support the photomask blank, and these were conveyed. The transportation is domestic transportation by truck, and the transportation distance is about 10 km.

この場合、フォトマスクブランクと支持部材とが当接した部分の面積は、フォトマスクブランクの外周面の任意の一面に相当し、約9.68×10-42である。なお、支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力は、容器本体にフォトマスクブランクを収納し、蓋体を容器本体に被着して容器を閉止する操作を、重量計に積載した状態で実施し、この閉止操作に要した力を上記重量計による測定値から求める方法で測定した。 In this case, the area of the portion where the photomask blank and the support member are in contact corresponds to any one of the outer peripheral surfaces of the photomask blank and is about 9.68 × 10 −4 m 2 . In addition, the pressing force that the support member and the spring member respectively apply to both side surfaces of the photomask blank is an operation of storing the photomask blank in the container body, attaching the lid to the container body, and closing the container. The measurement was carried out in a state of being loaded on a meter, and the force required for this closing operation was measured by a method for obtaining from the measured value by the above-mentioned weigh scale.

各々の容器に収納されていたフォトマスクブランク上の、輸送前後の0.2〜1.0μm径のパーティクル数をArFレーザー光走査型欠陥検査装置により計数し、そのパーティクル(欠陥)増加数を平均した値を表1に、押圧力に対して欠陥増加数の平均値をプロットしたグラフを図6に示す。   The number of particles with a diameter of 0.2 to 1.0 μm before and after transportation on the photomask blank stored in each container was counted by an ArF laser beam scanning defect inspection apparatus, and the number of increase in the number of particles (defects) was averaged. Table 1 shows the measured values, and FIG. 6 shows a graph in which the average number of defect increases is plotted against the pressing force.

Figure 2005274724
Figure 2005274724

押圧力が1.96N未満である押圧力が1Nの場合、輸送後のフォトマスクブランクは、輸送時に、十分に支持されていなかったために、フォトマスクブランクが容器内でがたついて、これにより発塵したため欠陥が増加した。   When the pressing force is less than 1.96 N and the pressing force is 1 N, the photomask blank after transportation is not sufficiently supported at the time of transportation. Increased defects due to dust.

本発明のフォトマスクブランクの収納容器であって、フォトマスクブランクを収納した状態を示す横断面図であり、(A)は図3(A)中のZ1−Z1線に沿った断面図、(B)は図3(A)中のZ2−Z2線に沿った断面図である。It is a storage container of the photomask blank of this invention, Comprising: It is a cross-sectional view which shows the state which accommodated the photomask blank, (A) is sectional drawing along the Z1-Z1 line | wire in FIG. FIG. 3B is a sectional view taken along line Z2-Z2 in FIG. 本発明のフォトマスクブランクの収納容器であって、フォトマスクブランクを収納した状態を示す縦断面図であり、(A)は図1(A)中のX1−X1線に沿った断面図、(B)は図1中のX2−X2線に沿った断面図である。FIG. 2 is a vertical cross-sectional view illustrating a state in which the photomask blank storage container of the present invention is stored, and (A) is a cross-sectional view taken along line X1-X1 in FIG. B) is a sectional view taken along line X2-X2 in FIG. 本発明のフォトマスクブランクの収納容器であって、フォトマスクブランクを収納した状態を示す縦断面図であり、(A)は図1(A)中のY1−Y1線に沿った断面図、(B)は図1中のY2−Y2線に沿った断面図である。FIG. 2 is a vertical cross-sectional view showing a photomask blank storage container of the present invention in a state in which the photomask blank is stored, (A) is a cross-sectional view taken along line Y1-Y1 in FIG. B) is a sectional view taken along line Y2-Y2 in FIG. 本発明のフォトマスクブランクの収納容器であって、(A)は図2(A)のフォトマスクブランクを収納して閉止する前の状態を示す縦断面図、(B)は図3(B)のフォトマスクブランクを収納して閉止する前の状態を示す縦断面図である。It is a storage container of the photomask blank of this invention, Comprising: (A) is a longitudinal cross-sectional view which shows the state before accommodating and closing the photomask blank of FIG. 2 (A), (B) is FIG. 3 (B). It is a longitudinal cross-sectional view which shows the state before accommodating the photomask blank of and closing. 図1〜4に示される収納容器のバネ部材を示す斜視図である。It is a perspective view which shows the spring member of the storage container shown by FIGS. 実験例における、押圧力に対する欠陥増加数の平均値をプロットしたグラフである。It is the graph which plotted the average value of the defect increase number with respect to pressing force in an experiment example.

符号の説明Explanation of symbols

1 容器
11 容器本体
12 蓋体
21 支持部材
22 バネ部材
223 支持片
p フォトマスクブランク

DESCRIPTION OF SYMBOLS 1 Container 11 Container main body 12 Cover body 21 Support member 22 Spring member 223 Support piece p Photomask blank

Claims (2)

上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備し、内部にフォトマスクブランクを収納する容器であって、該容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持することにより、フォトマスクブランクを収納する容器において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定したことを特徴とするフォトマスクブランクの収納容器。   A container for storing a photomask blank inside, comprising: a rectangular box-shaped container body whose upper part is opened; and a lid body that covers the upper opening part and is detachably attached to the upper end part of the container body. A synthetic resin support member and a synthetic resin spring member are provided on the inner surfaces of the pair of wall portions facing each other, and the photomask blanks are opposed to each other by the elastic force with which the members press the photomask blank. By supporting the both side surfaces by the both members, the pressing force that the support member and the spring member respectively apply to the both side surfaces of the photomask blank in the container for storing the photomask blank is 1.96 to 117. A photomask blank storage container, wherein the spring force of the spring member is set to 6N. 上方が開放した四角箱形の容器本体と、上記上方開放部を覆って容器本体上端部に着脱自在に被着される蓋体とを具備し、内部にフォトマスクブランクを収納する容器内部でフォトマスクブランクを支持する方法であって、上記容器の互いに対向する一対の壁部内面にそれぞれ合成樹脂製の支持部材と合成樹脂製のバネ部材とを設け、これら部材がフォトマスクブランクを押圧する弾発力によってフォトマスクブランクの互いに対向する一方の両側面を上記両部材によって支持する方法において、上記支持部材及びバネ部材が上記フォトマスクブランクの両側面に各々与える押圧力が1.96〜117.6Nとなるように上記バネ部材の弾発力を設定して支持することを特徴とするフォトマスクブランクの支持方法。
A rectangular box-shaped container body that is open at the top, and a lid that covers the upper opening and is detachably attached to the upper end of the container body. A method for supporting a mask blank, wherein a synthetic resin support member and a synthetic resin spring member are respectively provided on the inner surfaces of a pair of opposing wall portions of the container, and these members press the photomask blank. In the method in which one side surfaces of the photomask blank facing each other are supported by the two members by the generated force, the pressing force that the support member and the spring member respectively apply to both side surfaces of the photomask blank is 1.96 to 117. A method for supporting a photomask blank, comprising setting and supporting the elastic force of the spring member so as to be 6N.
JP2004084954A 2004-03-23 2004-03-23 Storage container for photomask blank and its supporting method Pending JP2005274724A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282040U (en) * 1988-12-15 1990-06-25
JPH0381945U (en) * 1989-12-12 1991-08-21
JPH09328188A (en) * 1996-06-12 1997-12-22 Hitachi Ltd Container case for substrate
JP2004010110A (en) * 2002-06-06 2004-01-15 Jsp Corp Box for carrying substrate
JP2004018021A (en) * 2002-06-17 2004-01-22 Sano Fuji Koki Co Ltd Spacer for storing glass dry plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282040U (en) * 1988-12-15 1990-06-25
JPH0381945U (en) * 1989-12-12 1991-08-21
JPH09328188A (en) * 1996-06-12 1997-12-22 Hitachi Ltd Container case for substrate
JP2004010110A (en) * 2002-06-06 2004-01-15 Jsp Corp Box for carrying substrate
JP2004018021A (en) * 2002-06-17 2004-01-22 Sano Fuji Koki Co Ltd Spacer for storing glass dry plate

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