JP2005256170A5 - - Google Patents
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- JP2005256170A5 JP2005256170A5 JP2005034896A JP2005034896A JP2005256170A5 JP 2005256170 A5 JP2005256170 A5 JP 2005256170A5 JP 2005034896 A JP2005034896 A JP 2005034896A JP 2005034896 A JP2005034896 A JP 2005034896A JP 2005256170 A5 JP2005256170 A5 JP 2005256170A5
- Authority
- JP
- Japan
- Prior art keywords
- nickel strike
- strike plating
- plating solution
- extraction device
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
ニッケルストライクめっき槽２中の亜鉛を含むニッケルストライクめっき液８の一部は、抽出装置４に供給され、ここで酸性有機リン化合物を含有する抽出液と接触して、亜鉛は抽出液（有機溶媒相）中に抽出される。ここで用いる抽出装置４は特に限定されないが、亜鉛を含有するニッケルストライクめっき液８と抽出液とを連続的に接触させる装置、例えば、多段ミキサーセトラーや上下動式カラムなどの連続抽出装置を用いることが好ましい。また、抽出温度は特に限定されず、室温で十分であるが、好ましくは１０℃〜５０℃である。そして、抽出処理されたニッケルストライクめっき液８は、ニッケルストライクめっき槽２に戻され、ニッケルストライクめっき液８として再使用される。
また、抽出処理されたニッケルストライクめっき液８をニッケルストライクめっき槽２に戻す際、親油性フィルターで濾過することによって、めっき液の組成を変えずに油分を除去することができる。親油性フィルターとしては、親油性を有するものであればよく、例えば、ポリプロピレンフィルター、ポリエチレンフィルター、テフロン（登録商標）フィルターが挙げられる。親油性フィルターの孔径は、０．１〜５０μｍが好ましく、この範囲内であれば、効率よく油分を除去することができる。
ここでの抽出装置４に供給される亜鉛含有ニッケルストライクめっき液の量は、めっき速度やめっき品質を考慮して適宜決定すればよいが、ニッケルストライクめっき液中の亜鉛濃度が好ましくは３００ｐｐｍ以下、より好ましくは２００ｐｐｍ以下となるようにすればよい。また、所望のめっき速度やめっき品質が得られる範囲内で抽出装置４に供給される亜鉛含有ニッケルストライクめっき液の量をより少なくすることで、抽出装置４および逆抽出装置５そのものをコンパクトにすることができる上に、親油性フィルターの交換サイクルを延ばすことができるという利点もある。
A part of the nickel strike plating solution 8 containing zinc in the nickel strike plating tank 2 is supplied to the extraction device 4, where it contacts with the extract containing the acidic organic phosphorus compound, and the zinc is extracted from the extract (organic solvent). Phase). The extraction device 4 used here is not particularly limited, but a device for continuously contacting the nickel strike plating solution 8 containing zinc and the extraction solution, for example, a continuous extraction device such as a multistage mixer settler or a vertically moving column is used. It is preferable. The extraction temperature is not particularly limited, and room temperature is sufficient, but is preferably 10 ° C to 50 ° C. The extracted nickel strike plating solution 8 is returned to the nickel strike plating bath 2 and reused as the nickel strike plating solution 8.
Further, when the extracted nickel strike plating solution 8 is returned to the nickel strike plating tank 2, the oil content can be removed without changing the composition of the plating solution by filtering with an oleophilic filter. Any lipophilic filter may be used as long as it has lipophilicity, and examples thereof include a polypropylene filter, a polyethylene filter, and a Teflon (registered trademark) filter. The pore size of the lipophilic filter is preferably 0.1 to 50 μm, and if it is within this range, the oil can be efficiently removed.
The amount of the zinc-containing nickel strike plating solution supplied to the extraction device 4 here may be appropriately determined in consideration of the plating speed and plating quality, but the zinc concentration in the nickel strike plating solution is preferably 300 ppm or less, More preferably, it may be 200 ppm or less. Further, the extraction device 4 and the back extraction device 5 itself are made compact by reducing the amount of the zinc-containing nickel strike plating solution supplied to the extraction device 4 within a range in which a desired plating speed and plating quality can be obtained. In addition, it has the advantage that the lipophilic filter replacement cycle can be extended.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005034896A JP2005256170A (en) | 2004-02-12 | 2005-02-10 | Electroless nickel plating method and plated product thereby |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004035684 | 2004-02-12 | ||
| JP2005034896A JP2005256170A (en) | 2004-02-12 | 2005-02-10 | Electroless nickel plating method and plated product thereby |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005256170A JP2005256170A (en) | 2005-09-22 |
| JP2005256170A5 true JP2005256170A5 (en) | 2007-02-08 |
Family
ID=35082185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005034896A Pending JP2005256170A (en) | 2004-02-12 | 2005-02-10 | Electroless nickel plating method and plated product thereby |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005256170A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5176337B2 (en) * | 2006-05-12 | 2013-04-03 | 株式会社デンソー | Film structure and method for forming the same |
| TWI431150B (en) * | 2007-01-12 | 2014-03-21 | Uyemura C & Co Ltd | Method for surface treatment of aluminum or aluminum alloy |
| JP2012132078A (en) * | 2010-12-24 | 2012-07-12 | Univ Of Miyazaki | Regeneration treatment method of electroless nickel plating solution |
| CN103966580B (en) * | 2014-05-29 | 2016-05-25 | 青海大学 | A kind of magnesium borate crystal whisker strengthens the means of defence of AZ91 magnesium base composite material |
| CN105624656B (en) * | 2015-12-30 | 2018-05-01 | 大连大学 | A kind of chemical Ni-P plating/Ni-Mo-P-PTFE composite structure platings and preparation method thereof |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943984B2 (en) * | 1978-09-18 | 1984-10-25 | 日本鉱業株式会社 | Treatment method for nickel and cobalt-containing liquids containing zinc |
| MA19258A1 (en) * | 1980-08-28 | 1982-04-01 | Canada Cyanamid | PROCESS FOR SELECTIVE SEPARATION OF COBALT (II) FROM AQUEOUS SOLUTIONS. |
| JPS6144139A (en) * | 1984-03-23 | 1986-03-03 | Daihachi Kagaku Kogyosho:Kk | Separation of cobalt from aqueous solution containing cobalt and nickel |
| JPS62263938A (en) * | 1986-05-08 | 1987-11-16 | Kurita Water Ind Ltd | Separation of nickel ion from zinc ion |
| JP2701284B2 (en) * | 1988-01-27 | 1998-01-21 | 住友金属工業株式会社 | Treatment method for metal-containing water |
| JP2994473B2 (en) * | 1991-02-07 | 1999-12-27 | 富士通株式会社 | Magnesium alloy plating film structure |
| JPH0665751A (en) * | 1992-08-20 | 1994-03-08 | Showa Denko Kk | Electroless composite plating bath and plating method |
| JPH0762600A (en) * | 1993-07-22 | 1995-03-07 | Shin Etsu Chem Co Ltd | Method for continuously removing impurity metallic ion in plating bath and device therefor |
| JP3119545B2 (en) * | 1993-07-22 | 2000-12-25 | 信越化学工業株式会社 | Method for removing impurity metal ions from electroplating bath for Nd-Fe-B permanent magnet surface treatment and method for regenerating electroplating bath for Nd-Fe-B permanent magnet surface treatment |
| NL9400013A (en) * | 1994-01-06 | 1995-08-01 | Akzo Nobel Nv | Material for extracting metal ions from an aqueous solution. |
| JP3033455B2 (en) * | 1994-11-28 | 2000-04-17 | 上村工業株式会社 | Electroless nickel plating of aluminum |
| JPH09184026A (en) * | 1995-12-28 | 1997-07-15 | Nippon Chem Ind Co Ltd | Separation of cobalt in aged electroless nickel plating liquid |
| JPH11124588A (en) * | 1997-10-27 | 1999-05-11 | Nippon Parkerizing Co Ltd | Sliding member |
| JP3405278B2 (en) * | 1999-08-05 | 2003-05-12 | 有限会社ゼオテック研究所 | Charged aggregation filter coalescer type oil-water separator and system |
| JP2001049448A (en) * | 1999-08-09 | 2001-02-20 | C Uyemura & Co Ltd | Electroless nickel plating method |
| JP4681161B2 (en) * | 2000-07-14 | 2011-05-11 | 大阪瓦斯株式会社 | Plating film and plating coating using the same |
-
2005
- 2005-02-10 JP JP2005034896A patent/JP2005256170A/en active Pending
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