JP2005255581A5 - - Google Patents
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- JP2005255581A5 JP2005255581A5 JP2004067262A JP2004067262A JP2005255581A5 JP 2005255581 A5 JP2005255581 A5 JP 2005255581A5 JP 2004067262 A JP2004067262 A JP 2004067262A JP 2004067262 A JP2004067262 A JP 2004067262A JP 2005255581 A5 JP2005255581 A5 JP 2005255581A5
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- JP
- Japan
- Prior art keywords
- group
- complex
- acid residue
- residue
- aryl
- Prior art date
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- 239000002131 composite material Substances 0.000 claims description 14
- 239000013335 mesoporous material Substances 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 12
- 229910052751 metal Inorganic materials 0.000 claims 7
- 239000002184 metal Substances 0.000 claims 7
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000003118 aryl group Chemical group 0.000 claims 6
- 229910052742 iron Inorganic materials 0.000 claims 6
- 239000003446 ligand Substances 0.000 claims 6
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 6
- 229910052707 ruthenium Inorganic materials 0.000 claims 6
- -1 alkenyl diamine Chemical class 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims 2
- 125000004070 6 membered heterocyclic group Chemical group 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 125000003368 amide group Chemical group 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000004104 aryloxy group Chemical group 0.000 claims 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 2
- 125000002843 carboxylic acid group Chemical group 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000002883 imidazolyl group Chemical group 0.000 claims 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 125000002524 organometallic group Chemical group 0.000 claims 2
- 238000001179 sorption measurement Methods 0.000 claims 2
- 125000001174 sulfone group Chemical group 0.000 claims 2
- 125000000542 sulfonic acid group Chemical group 0.000 claims 2
- 125000000101 thioether group Chemical group 0.000 claims 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical group Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims 2
- 230000003100 immobilizing effect Effects 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004067262A JP4518242B2 (ja) | 2004-03-10 | 2004-03-10 | 錯体複合材料及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004067262A JP4518242B2 (ja) | 2004-03-10 | 2004-03-10 | 錯体複合材料及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005255581A JP2005255581A (ja) | 2005-09-22 |
| JP2005255581A5 true JP2005255581A5 (OSRAM) | 2007-03-01 |
| JP4518242B2 JP4518242B2 (ja) | 2010-08-04 |
Family
ID=35081669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004067262A Expired - Fee Related JP4518242B2 (ja) | 2004-03-10 | 2004-03-10 | 錯体複合材料及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4518242B2 (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007077100A (ja) * | 2005-09-15 | 2007-03-29 | Nagoya Institute Of Technology | エポキシ化合物の製造方法 |
| JP4753176B2 (ja) * | 2005-09-21 | 2011-08-24 | 株式会社豊田中央研究所 | 錯体複合材料及びその製造方法 |
| JP5132888B2 (ja) * | 2006-01-30 | 2013-01-30 | 株式会社 資生堂 | pH応答性シランカップリング剤およびそれで処理した表面処理物 |
| US8592336B2 (en) | 2006-04-11 | 2013-11-26 | Agency For Science, Technology And Research | Catalysts for ring-closing metathesis |
| WO2007117221A1 (en) * | 2006-04-11 | 2007-10-18 | Agency For Science, Technology And Research | Catalysts for ring closing metathesis |
| US8507630B2 (en) | 2008-03-07 | 2013-08-13 | National Institute Of Advanced Industrial Science And Technology | Organic inorganic composite material and utilization thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1331032B1 (en) * | 2002-01-24 | 2008-03-19 | Haldor Topsoe A/S | Process for the immobilisation of a homogeneous catalyst, and catalytic material |
| JP2005238060A (ja) * | 2004-02-25 | 2005-09-08 | Doshisha | 有機化合物酸化触媒および有機化合物の酸化方法 |
-
2004
- 2004-03-10 JP JP2004067262A patent/JP4518242B2/ja not_active Expired - Fee Related
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